JPH0349012A - Manufacture of magnetic head - Google Patents
Manufacture of magnetic headInfo
- Publication number
- JPH0349012A JPH0349012A JP18394689A JP18394689A JPH0349012A JP H0349012 A JPH0349012 A JP H0349012A JP 18394689 A JP18394689 A JP 18394689A JP 18394689 A JP18394689 A JP 18394689A JP H0349012 A JPH0349012 A JP H0349012A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- magnetic head
- head
- thin film
- protective plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000010409 thin film Substances 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 238000003466 welding Methods 0.000 claims description 5
- 239000006060 molten glass Substances 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 abstract description 20
- 239000011521 glass Substances 0.000 abstract description 17
- 238000005530 etching Methods 0.000 abstract description 5
- 239000006185 dispersion Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- 125000006850 spacer group Chemical group 0.000 description 8
- 239000012790 adhesive layer Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 208000006673 asthma Diseases 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
工業」ｊ■Ｕ帽主旺
この発明は、主として磁気記録（書込み）用として用い
られる誘導型の薄膜磁気ヘッドの製造方法に関し、特に
磁気ヘッドパターン上に保護基板を溶着することを必要
とする薄膜磁気ヘッドの保護基板溶着工程に関する。[Detailed Description of the Invention] This invention relates to a method for manufacturing an inductive thin film magnetic head mainly used for magnetic recording (writing), and in particular to a method for welding a protective substrate onto a magnetic head pattern. The present invention relates to a protective substrate welding process for a thin film magnetic head that requires the following steps.
従来二皮孟
磁気ヘッドと記録媒体が接触して記録再生を行う方式の
磁気ヘッドでは、磁気ヘッドが長時間媒体と接触摺動す
ることによる磁気ヘッド摺動面の摩耗が問題となる。一
般的に薄膜磁気ヘッドは第５図に示すように、下部磁極
４上に絶縁層５を介してコイル導体６を配し、それに鎖
交するように上部磁極１を形成した構成をとるが、上下
部磁極１．４には、ＦｅＡｌＳｉ、 ＦｌｆＦｅ、アモ
ルファス合金等の金属材料を用いることが多い。このた
めセラミック材料である基板７に対し上下部磁極１．４
が偏摩耗を生じやすく、その結果磁気ヘッドの記録再生
特性の劣化を引き起こす。その対策として第２図に示す
ように耐摩耗性のよいセラミック基板をヘッド保護板８
として薄膜ヘッドパターン３の上に接着剤９を用いて接
着し、耐摩耗性を向上させることが一般的である。なお
、ここで用いる接着剤は大別して有機系接着剤と無機系
接着剤に分けることが出来る。In the conventional magnetic head of the type in which recording and reproducing are performed by contacting the magnetic head with the recording medium, wear of the sliding surface of the magnetic head due to the magnetic head sliding in contact with the medium for a long period of time becomes a problem. Generally, a thin film magnetic head has a structure in which a coil conductor 6 is disposed on a lower magnetic pole 4 via an insulating layer 5, and an upper magnetic pole 1 is formed to interlink with the coil conductor 6, as shown in FIG. The upper and lower magnetic poles 1.4 are often made of a metal material such as FeAlSi, FlfFe, or an amorphous alloy. For this reason, the upper and lower magnetic poles 1.4
tends to cause uneven wear, resulting in deterioration of the recording and reproducing characteristics of the magnetic head. As a countermeasure, a ceramic substrate with good wear resistance is installed on the head protection plate 8 as shown in Figure 2.
Generally, the thin film head pattern 3 is bonded to the thin film head pattern 3 using an adhesive 9 to improve wear resistance. Note that the adhesives used here can be roughly divided into organic adhesives and inorganic adhesives.
持っているので、その凹凸を解消し、十分強固して接着
するため、ヘッド摺動面１２に現れる有機系接着材層９
が厚くなる。有機系接着剤を用いると、その摩耗特性は
一般的に悪いため、磁気ヘッドが媒体上を走行して記録
再生を行うとき、磁気ヘッドの媒体摺動面１２の近傍に
ある接着剤層９がもっとも偏摩耗を引き起こし易くなる
。その結果、いわば、スペーシング損失を生じてしまい
、磁気ヘッドとしての記録再生特性が劣化してしまう。The organic adhesive layer 9 that appears on the head sliding surface 12 eliminates the unevenness and makes the adhesive strong enough.
becomes thicker. When an organic adhesive is used, its abrasion characteristics are generally poor, so when the magnetic head runs over the medium to perform recording and reproduction, the adhesive layer 9 near the medium sliding surface 12 of the magnetic head is damaged. However, it is most likely to cause uneven wear. As a result, a so-called spacing loss occurs, and the recording and reproducing characteristics of the magnetic head deteriorate.
そこでこの問題を解決するため、第６図（ａ）に示すよ
うに接着層を薄く出来るよう、摩耗特性の良い、厚い無
機材料の保護ｆｉｌＯ（例えばアルミナ）の層を磁気ヘ
ッドパターン３上に成膜する。In order to solve this problem, a thick layer of protective filO (for example, alumina) made of an inorganic material with good wear characteristics is formed on the magnetic head pattern 3 so that the adhesive layer can be made thinner, as shown in FIG. 6(a). To form a film.
つぎに磁気ヘッドパターンの凹凸を吸収するように第６
図（ｂ）のとおり、この保護膜を平面１１ａ −１１ｂ
で研磨し、接着時の有機系接着剤層１０ａが小さくなる
ようにして、有機系接着剤で接着する方法が考えられて
いる。しかしこの製造方法を用いると、以上述べたよう
な作業が長くかつ煩雑であり、工程が非常に長くなる欠
点がある。Next, a sixth
As shown in Figure (b), this protective film is
A method has been considered in which the organic adhesive layer 10a is bonded with an organic adhesive after polishing with a polishing agent so that the size of the organic adhesive layer 10a becomes smaller during bonding. However, using this manufacturing method has the disadvantage that the operations described above are long and complicated, and the process is extremely long.
一方、無機系接着剤（特にガラス）を用いて接着する場
合は薄膜磁気ヘッドの磁気特性が高温状態にさらされる
と劣化することを考慮して、磁気ファス材料の場合、約
５００℃以下）で接着する必要がある。On the other hand, when bonding using an inorganic adhesive (especially glass), take into account that the magnetic properties of the thin film magnetic head deteriorate when exposed to high temperatures. Needs to be glued.
この方法で接着する場合、ガラスを十分に強い強度で接
着するために、予め接着面に全面に、塗布またはスパッ
タリング等で成膜する方法が考えられている。しかし前
者の方法では、いったん粉末のガラスをスラリー状にし
て塗布後、媒体を蒸発させ、ガラスを溶解させる熱処理
時に、ガラス内部に気泡が生じ、出来上がった磁気ヘッ
ドの摺動面１２に穴が開いてしまうことが多い。また後
者の方法であるスパッタリングを行うことは、無機材料
の保護膜を成膜する方法と同様に、工程が長くなりコス
ト的に不利である。When bonding by this method, in order to bond glass with sufficient strength, a method has been considered in which a film is formed in advance on the entire surface of the bonding surface by coating or sputtering. However, in the former method, after applying powdered glass as a slurry, air bubbles are generated inside the glass during heat treatment to evaporate the medium and melt the glass, resulting in holes in the sliding surface 12 of the finished magnetic head. I often end up. Furthermore, the latter method, sputtering, is disadvantageous in terms of cost because it requires a long process, similar to the method of forming a protective film of an inorganic material.
したがって、コスト的に有利でかつ耐摩耗性を向上させ
る為には、ガラスを磁気ヘッドパターン３と保護板８の
間に流し込む手段がもっとも実用的である。しかし、薄
膜磁気ヘッドを形成した基板と保護板を直接つき合わせ
、そのつき合わせた隙間１３からガラスを流し込もうと
すると、磁気ヘッドパターンは、上部磁極１のコイルの
乗り越し部分１４がもっとも厚くなるので、隙間１３は
その対応部分で最も狭くなり、流体抵抗が増すことにな
り、ガラスが流れ込みにくくなる。その結果、この部分
以降１５に気泡が残ってしまい、十分な強度を得られな
（なることが多かった。このため従来は、磁気ヘッドの
厚さは可能なだけ薄く、シかし、十分なガラスの流れ込
むすきまをヘッドパターンと保護板の間に生じさせなけ
ればならないので、薄いセラミック板をスペーサーとし
て用いていた。つまり、第３図に示すように保護板８と
基板７との間にスペーサ１６を置き、すきま形成してい
た。Therefore, in order to be cost-effective and to improve wear resistance, the most practical method is to pour glass between the magnetic head pattern 3 and the protection plate 8. However, when the substrate on which the thin-film magnetic head is formed and the protective plate are directly brought into contact with each other and glass is poured into the gap 13 between the two, the magnetic head pattern becomes thickest at the overlapping portion 14 of the coil of the upper magnetic pole 1. Therefore, the gap 13 becomes narrowest at the corresponding portion, increasing fluid resistance and making it difficult for glass to flow into the gap 13. As a result, air bubbles remain in the area 15 after this part, making it difficult to obtain sufficient strength.For this reason, in the past, the thickness of the magnetic head was made as thin as possible; Since it is necessary to create a gap between the head pattern and the protection plate for the glass to flow into, a thin ceramic plate is used as a spacer.In other words, a spacer 16 is placed between the protection plate 8 and the substrate 7 as shown in FIG. There was a gap forming.
しかし、この方法ではスペーサを薄く加工するコストが
高く、かつ精度的にもスペーサの配置された近傍１７と
、基板７の中央の部分１８ではすきまが異なり個々のヘ
ッド間での隙間を正確にして保護板８を固定することが
出来なかった。However, with this method, the cost of processing the spacer thin is high, and in terms of accuracy, the gap is different between the vicinity 17 where the spacer is placed and the central part 18 of the substrate 7, making it difficult to accurately make the gap between the individual heads. The protection plate 8 could not be fixed.
２の
この発明は、上述の課題を解決するために、上部磁性体
磁極より厚く形成され、高さ位置決めパッドとなる薄膜
パターンを設けて、この薄膜パターンを基準面として保
護板と磁気ヘッドパターンとの隙間を設定し、その間隙
に溶融ガラスを流し込むことにより溶着することを、技
術的な手段としている。In order to solve the above-mentioned problem, this invention in No. 2 provides a thin film pattern that is thicker than the upper magnetic pole and serves as a height positioning pad, and uses this thin film pattern as a reference plane to connect the protective plate and the magnetic head pattern. The technical means is to set a gap between the glass and weld the glass by pouring the molten glass into the gap.
作月−
この発明によると、薄膜パターンで高さ位置決めパッド
を形成することにより、ヘッドそれぞれ磁気ヘッドの近
傍にスペーサが位置することになリ、磁気ヘッドパター
ンさ保護板の隙間がｊ個々の磁気ヘッド間でばらつ（こ
とがない。According to this invention, by forming a height positioning pad with a thin film pattern, a spacer is located near each magnetic head, and the gap between the magnetic head pattern and the protective plate is There is no variation between heads.
したがって、従来のセラミックスペーサよりも薄いすき
まを正確に形成することが出来る。Therefore, it is possible to accurately form a thinner gap than with conventional ceramic spacers.
夷息阻
以下に本発明を電子スチルカメラ用２ｃｈ薄膜磁気ヘツ
ドのヘッドパターンに実施した例を用いて説明する。Asthma Prevention The present invention will be explained below using an example in which the present invention is implemented in a head pattern of a 2-channel thin film magnetic head for an electronic still camera.
第１図に保護板溶着直前の電子スチルカメラ用２ｃｈ薄
膜磁気ヘツドのヘッドパターンの概略平面図を示す。高
さ位置決めパッドパターン２は全てのパターンエツチン
グ工程で残るように設定する。つまり各エツチング工程
で、本発明によるパターンをレジストパターンによりマ
スクするか、または本パターンがエツチングされないよ
うな条件でのエツチングを行う。FIG. 1 shows a schematic plan view of the head pattern of a 2-channel thin film magnetic head for an electronic still camera immediately before welding the protective plate. The height positioning pad pattern 2 is set to remain in all pattern etching steps. That is, in each etching step, the pattern according to the present invention is masked by a resist pattern, or etching is performed under conditions such that the pattern is not etched.
この結果、一般的な磁気ヘッドの構成では第２図の様に
、上部磁極のコイル乗越し部分１４が最も厚く成膜され
るが、本発明の実施例では上部磁極のコイル乗越し部分
１４よりも実施例のパターンが数μｍ高くなる。本実施
例では、コイル上の絶縁膜を平坦化するため削られた絶
縁膜の厚さぶんが、上部磁極のコイル乗越し部分１４よ
りも高くなっている。As a result, in the configuration of a general magnetic head, as shown in FIG. 2, the thickest film is formed on the coil overlapping portion 14 of the upper magnetic pole, but in the embodiment of the present invention, the film is thickest than the coil overlapping portion 14 of the upper magnetic pole. The pattern of the example is also several μm higher. In this embodiment, the thickness of the insulating film removed to flatten the insulating film on the coil is higher than the coil over-over portion 14 of the upper magnetic pole.
次にこの加工済みヘッド基板７をヘッド保護板８とつき
合わせる。このとき、保護板８とヘッドパターン３は高
さ位置決めパッドパターン２により、直接接触すること
がなく、ガラスが流れやすくなる。ガラスの接着条件は
従来とおなじく６２０℃で行った。Next, this processed head substrate 7 is brought into contact with the head protection plate 8. At this time, the protection plate 8 and the head pattern 3 do not come into direct contact with each other due to the height positioning pad pattern 2, making it easier for the glass to flow. The glass bonding conditions were 620°C, the same as in the past.
この結果、従来方法ではガラス接着した状態で第３図の
様に個々のヘッド間で保護板とヘッドパターンとの距離
が保護板のたわみにより、ばらついていたのに対し、奔
発明のヘッドの媒体摺動面１２における磁気ヘッド基板
７と保護板８のばらつきは第４図の様に、極めてすくな
くたった。As a result, in contrast to the conventional method where the distance between the protective plate and the head pattern varies between individual heads due to the deflection of the protective plate when the glass is bonded as shown in FIG. As shown in FIG. 4, the variation between the magnetic head substrate 7 and the protection plate 8 on the sliding surface 12 is extremely small.
なお、本実施例では、個々のヘッドに切り離す工程でな
くなってしまう切りしるの領域Ｉ９に高さ位置決めパッ
ド２を設定しているが、もちろんこの位置決めパッド２
は磁気ヘッドの特性に影響を与えない限りヘッドパター
ン３上のどこに設定しても構わない。In this embodiment, the height positioning pad 2 is set in the cutting edge area I9 that is lost in the process of cutting into individual heads, but of course this positioning pad 2
may be set anywhere on the head pattern 3 as long as it does not affect the characteristics of the magnetic head.
また本実施例では、従来の薄膜形成プロセスだけを用い
て位置決めパッドパターンを形成しているが、もし許さ
れるのであれば、特別にスペーサパターンをつくる工程
を設けてもよい。この場合、ガラス溶着工程の熱処理に
耐え、かつ基板と保護板のつき合わせに耐える機械的強
度が確保できる材料であれば、摩耗特性及び、成膜、エ
ツチング特性等は任意の材料を選ぶことが出来る。Further, in this embodiment, the positioning pad pattern is formed using only a conventional thin film forming process, but if permitted, a special step of forming a spacer pattern may be provided. In this case, any material can be selected with respect to wear characteristics, film formation, etching characteristics, etc., as long as it can withstand the heat treatment in the glass welding process and has the mechanical strength to withstand the contact between the substrate and the protective plate. I can do it.
髪肌二処果
以上説明したように本発明を用いれば薄膜磁気ヘッドの
保護板を正確に精度よく接着することが出来るだけでな
（、コスト的にも安価でスループットの高い製造方法を
提供できる。As explained above, by using the present invention, it is possible not only to bond the protective plate of a thin film magnetic head with high accuracy (but also to provide a manufacturing method that is inexpensive and has high throughput). .
第１図は、本発明の詳細な説明するための薄膜磁気ヘッ
ドパターンの平面図、第２図は、従来の薄膜ヘッドの製
造工程を説明するための磁気ヘッドの断面図、第３図は
、従来の課題を説明するための磁気ヘッドの断面図、第
４図は、本発明の詳細な説明するための磁気ヘッドの断
面図、第５図は、一般的な薄膜ヘッドの構成をしめす斜
視図（一部断面図）、第６図（ａ）、（ｂ）は、従来の
薄膜ヘッドの製造工程を説明するための磁気ヘッドの断
面図である。
１・・・上部磁極、
２・・・高さ位置決めパッド、
３・・・薄膜ヘッドパターン、
４・・・下部磁極、
５・・・絶縁層、
６・・・コイル導体、
７・・・基板、
８・・・保護板、
９・・・接着剤、
９ａ・・・接着時のを機系接着剤層、
１０・・・無機材料の保護膜、
１１ａ−１１ｂ・・・研磨する平面、
１２・・・媒体摺動面、
Ｉ３・・・隙間、
１４・・・上部磁極のコイルの乗り越し部分１１Ｂ・・
・スペーサ、FIG. 1 is a plan view of a thin film magnetic head pattern for explaining the present invention in detail, FIG. 2 is a cross-sectional view of a magnetic head for explaining the manufacturing process of a conventional thin film head, and FIG. FIG. 4 is a cross-sectional view of a magnetic head for explaining the conventional problems, FIG. 4 is a cross-sectional view of the magnetic head for explaining the present invention in detail, and FIG. 5 is a perspective view showing the configuration of a general thin film head. (Partial sectional view), FIGS. 6(a) and 6(b) are sectional views of a magnetic head for explaining the manufacturing process of a conventional thin film head. DESCRIPTION OF SYMBOLS 1... Upper magnetic pole, 2... Height positioning pad, 3... Thin film head pattern, 4... Lower magnetic pole, 5... Insulating layer, 6... Coil conductor, 7... Substrate , 8... Protective plate, 9... Adhesive, 9a... Mechanical adhesive layer during adhesion, 10... Protective film of inorganic material, 11a-11b... Plane to be polished, 12 ...Medium sliding surface, I3...Gap, 14...Cover over part 11B of the upper magnetic pole coil...
·Spacer,
Claims (1)
時に基板に対して上部磁性体磁極より厚く積層された薄
膜パターンが形成されるように高さ位置決めパッドを成
膜し、 上記薄膜パターンを基準面として、ヘッド保護板と磁気
ヘッドパターンを固定し、溶融ガラスを磁気ヘッドパタ
ーンと保護板の間に流しこむことにより溶着する工程を
有する磁気ヘッドの製造方法。[Claims] In the manufacturing process of a thin film magnetic head, a height positioning pad is formed so that a thin film pattern laminated thicker than the upper magnetic pole is formed on the substrate at the end of the thin film process; A method for manufacturing a magnetic head comprising the steps of fixing a head protection plate and a magnetic head pattern using the pattern as a reference plane, and welding by pouring molten glass between the magnetic head pattern and the protection plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18394689A JPH0349012A (en) | 1989-07-17 | 1989-07-17 | Manufacture of magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18394689A JPH0349012A (en) | 1989-07-17 | 1989-07-17 | Manufacture of magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0349012A true JPH0349012A (en) | 1991-03-01 |
Family
ID=16144582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18394689A Pending JPH0349012A (en) | 1989-07-17 | 1989-07-17 | Manufacture of magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0349012A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6784897B2 (en) | 2000-12-05 | 2004-08-31 | Nec Electronics Corporation | Apparatus for carrying out translucent-processing to still and moving pictures and method of doing the same |
-
1989
- 1989-07-17 JP JP18394689A patent/JPH0349012A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6784897B2 (en) | 2000-12-05 | 2004-08-31 | Nec Electronics Corporation | Apparatus for carrying out translucent-processing to still and moving pictures and method of doing the same |
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