JPH0337489A - Proportion control valve for gas - Google Patents
Proportion control valve for gasInfo
- Publication number
- JPH0337489A JPH0337489A JP17088389A JP17088389A JPH0337489A JP H0337489 A JPH0337489 A JP H0337489A JP 17088389 A JP17088389 A JP 17088389A JP 17088389 A JP17088389 A JP 17088389A JP H0337489 A JPH0337489 A JP H0337489A
- Authority
- JP
- Japan
- Prior art keywords
- valve body
- diaphragm
- gas
- flow rate
- port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001276 controlling effect Effects 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000002485 combustion reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
Landscapes
- Magnetically Actuated Valves (AREA)
- Flow Control (AREA)
- Control Of Fluid Pressure (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、ガスの燃焼出力を比例的に制御するようにし
たガスガバナーと電磁装置の組合わせからなる制御弁、
特に大流量と小流量制御を行えるようにしたガス比例制
御弁に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention provides a control valve consisting of a combination of a gas governor and an electromagnetic device that proportionally controls the combustion output of gas;
In particular, the present invention relates to a gas proportional control valve that is capable of controlling large and small flow rates.
［従来の技術］
ガス燃焼出力を比例的に制御し得るようにしたガス比例
制御弁は、特開昭６１−２３１３２５号、同５７−１１
２６０９号、実開昭６３−１９７５号、特開平１−１４
６０３号の各公報にみられるように一般に知られている
。[Prior Art] Gas proportional control valves capable of proportionally controlling gas combustion output are disclosed in Japanese Patent Application Laid-open Nos. 61-231325 and 57-11.
No. 2609, Utility Model Publication No. 1975-1975, Japanese Patent Publication No. 1-14
It is generally known as seen in each publication of No. 603.
このような従来のガス比例制御弁の基本的な構成は、第
１図に示すように、ガス圧力の変動でダイヤフラム５１
を応動させて弁口５２を広狭変化させることによりガス
圧を一定の範囲に制御するものである。弁体５３は、ダ
イヤフラム５１に取付けられてダイヤフラムと一体的に
応動するとともに、電磁装置５４の作動でコイル５５に
通電するとヨーク５６が励磁されて、マグネット５７に
反発磁力が作用して弁体５３を開弁させるようにコント
ロールするものである。The basic structure of such a conventional gas proportional control valve is as shown in FIG.
The gas pressure is controlled within a certain range by adjusting the valve opening 52 to widen or narrow. The valve body 53 is attached to the diaphragm 51 and reacts integrally with the diaphragm. When the coil 55 is energized by the operation of the electromagnetic device 54, the yoke 56 is excited, and a repulsive magnetic force acts on the magnet 57, causing the valve body 53 to move. This controls the opening of the valve.
［考案が解決しようとする課題］
しかし、このような従来の比例制御弁においては、次の
ような問題点がある。[Problems to be solved by the invention] However, such a conventional proportional control valve has the following problems.
（１） 大流量と小流量のガス圧設定が何れか一方
となり、同時に両方の設定が困難である。(1) The gas pressure setting is either large flow rate or small flow rate, and it is difficult to set both at the same time.
（２） 大流量と小流量の２設定が可能なものでも
互いに大きな相互干渉が発生する。(2) Even if two settings are possible, large flow rate and small flow rate, large mutual interference occurs.
（３） 大流量と小流量の設定値が一次ガス圧変動
に対して安定した供給が困難である。(3) The set values for large flow rate and small flow rate make it difficult to provide a stable supply despite fluctuations in primary gas pressure.
（４） 絞り比率が増加すれば、弁の振動現象が発
生し、又温度変化等の影響による変動が発生し易い。(4) If the throttling ratio increases, vibration phenomena of the valve will occur, and fluctuations due to the influence of temperature changes etc. will easily occur.
（５） 大きな弁で小さい流量を制御することにな
るために、各種の変動に対する弊害が大きく、又部品精
度の確保も困難である。(5) Since a small flow rate is controlled by a large valve, there is a large problem with various fluctuations, and it is also difficult to ensure component accuracy.
（６） 小流量制御時には、弁体と弁座の隙間によ
って流量の制御を行うことになるため、数ミクロンの精
度が要求され、製作加工が困難でコスト高になる。(6) When controlling a small flow rate, the flow rate is controlled by the gap between the valve body and the valve seat, which requires precision of several microns, making manufacturing difficult and expensive.
本発明は、従来の技術の有するこのような問題点に鑑み
てなされたものであり、その目的とするところは、大流
量と小流量のガス圧設定が簡単確実に行えるとともに、
機能面で独立し、相互に干渉することのないガス比例制
御弁を提供しようとするものである。The present invention has been made in view of the above-mentioned problems of the conventional technology, and its purpose is to easily and reliably set gas pressures for large flow rates and small flow rates, and to
The objective is to provide gas proportional control valves that are functionally independent and do not interfere with each other.
［課題を解決するための手段］
上記目的を達成するために、本発明におけるガス比例制
御弁は、ガス入口とガス出口を有する弁ケース本体に、
ガス圧により変動するダイヤフラムと、これに連動する
ように取付けられてガス出口への弁口を広狭変化させる
ように開閉する主弁体、及びダイヤフラムの動きを磁力
にて外的にコントロールするようにコイルにて励磁され
るヨークとマグネットとよりなる電磁装置とを備え、前
記主弁体には、その内部に第のダイヤフラムとその第２
のダイヤフラムと共動して第の弁口を開閉させる第２の
弁体とを設け、前記第２の弁体は、主弁第が閉止時に開
弁して小流量制御を行うように設定してなるものである
。[Means for Solving the Problems] In order to achieve the above object, the gas proportional control valve of the present invention includes a valve case body having a gas inlet and a gas outlet.
A diaphragm that changes depending on the gas pressure, a main valve body that is attached to the diaphragm and opens and closes the valve port to the gas outlet to change its width, and the movement of the diaphragm is externally controlled using magnetic force. The main valve body includes an electromagnetic device consisting of a yoke and a magnet excited by a coil, and the main valve body has a second diaphragm and a second diaphragm therein.
and a second valve body that opens and closes the second valve port in cooperation with the diaphragm, and the second valve body is set to open when the main valve is closed to perform small flow rate control. This is what happens.
そして上記ガス比例制御弁は、第２の弁体に、ねじの操
作によって張力を外的にコントロールする調整ばねを設
けることが好ましい。In the gas proportional control valve, it is preferable that the second valve body is provided with an adjustment spring that externally controls the tension by operating a screw.
［作用］
第１図において、電磁装置１０のコイル７に電流を印加
すると、ヨーク８に磁極が発生し、マグネット９に対し
反発磁力が発生する。この為ダイヤフラム４はマグネッ
ト９とともにヨーク８から遠ざかる方向に押しやられる
為主弁体６は開弁する。[Operation] In FIG. 1, when a current is applied to the coil 7 of the electromagnetic device 10, a magnetic pole is generated in the yoke 8, and a repulsive magnetic force is generated against the magnet 9. Therefore, the diaphragm 4 is pushed away from the yoke 8 together with the magnet 9, and the main valve body 6 opens.
この主弁体６の開方向の移動によって、出口側に二次圧
力Ｐ２が発生する。This movement of the main valve body 6 in the opening direction generates a secondary pressure P2 on the outlet side.
ガス入口１のガスが弁口５を経てガス出口２側へ流出す
ることにより二次圧力Ｐ２が徐々に高くなる。すると小
流量制御用の弁体１２は閉塞状態となる。この状態で入
口側の一次圧力Ｐ１が増大すると、ダイヤフラム４が上
方へ膨大するからこれに伴い主弁体６は閉止方向に動き
、ガス流量を制限する。その為−次圧力Ｐ１が低下する
から再び弁口５は大きくなり、これの繰り返えしで大流
量設定値の制御が行われる。As the gas at the gas inlet 1 flows out to the gas outlet 2 side through the valve port 5, the secondary pressure P2 gradually increases. Then, the valve body 12 for small flow rate control enters a closed state. When the primary pressure P1 on the inlet side increases in this state, the diaphragm 4 expands upward, and the main valve body 6 accordingly moves in the closing direction, thereby restricting the gas flow rate. As a result, the second pressure P1 decreases, so the valve port 5 becomes larger again, and this process is repeated to control the large flow rate set value.
次に、小流量制御時には、電磁装置１０のコイル７への
通電を停止する。すると、ヨーク８の磁極が消失するた
め今まで反発していたマグネット９とヨーク８に吸引力
が作用して、主弁体６は閉弁する。Next, during small flow rate control, power supply to the coil 7 of the electromagnetic device 10 is stopped. Then, since the magnetic pole of the yoke 8 disappears, an attractive force acts on the magnet 9 and the yoke 8, which had been repelling each other, and the main valve body 6 closes.
この状態で小流量制御用の弁体１２は、第２のダイヤフ
ラム１１と調整用ばね１４とのバランスによって保持さ
れるから入口１側のガスは、通孔１７から第２の弁口１
３を経て出口２側へ流出する。従ってこの場合には、−
次圧力Ｐ１が印加された状態で調整ばね１４を所定の値
に設定することにより最小圧力の設定が可能となる。又
、第２の弁体１２は第２のダイヤフラム１１の動きに応
してガバナー作用を行う為小流量設定域においてガス出
力の比例制御が行われる。In this state, the valve body 12 for small flow rate control is held by the balance between the second diaphragm 11 and the adjustment spring 14, so the gas on the inlet 1 side flows from the through hole 17 to the second valve port 1.
3 and flows out to the exit 2 side. Therefore, in this case, −
The minimum pressure can be set by setting the adjustment spring 14 to a predetermined value while the next pressure P1 is applied. Further, since the second valve body 12 performs a governor action in response to the movement of the second diaphragm 11, proportional control of the gas output is performed in the small flow rate setting range.
調整ばね１４の張力調整は、ねじ１５によって行われる
。ねじ１５を右方向へ回動すると、上方へ進行してはね
１４の張力が強くなり、逆に左方向へ回動すると弱くな
る。The tension of the adjustment spring 14 is adjusted by means of a screw 15. When the screw 15 is turned to the right, the tension of the spring 14 increases as it moves upward, and vice versa, when the screw 15 is turned to the left, it becomes weaker.
［実施例］
第２図に示すように、電磁装置１０は、ケース２０とそ
の中にコイル７を巻いたボビンケース２１、及びボビン
ケースの中心の縦孔２２内に嵌挿固定したヨーク８とよ
りなる。ヨーク８は、ねじ式にして上下方向の位置が調
整されるようになす。２３はその固定用のナツトである
。[Embodiment] As shown in FIG. 2, the electromagnetic device 10 includes a case 20, a bobbin case 21 in which a coil 7 is wound, and a yoke 8 fitted and fixed into a vertical hole 22 at the center of the bobbin case. It becomes more. The yoke 8 is of a screw type so that its position in the vertical direction can be adjusted. 23 is a nut for fixing it.
マグネット９は、ヨーク８に対応するようにダイヤフラ
ム４に取付け、ヨーク８との吸引力又は反発磁力によっ
て上下に移動する。The magnet 9 is attached to the diaphragm 4 so as to correspond to the yoke 8, and is moved up and down by attraction or repulsion magnetic force with the yoke 8.
主弁体６は、ダイヤフラム４にこれと一体に取付けてダ
イヤフラム４の動きに共動する。The main valve body 6 is integrally attached to the diaphragm 4 and moves together with the movement of the diaphragm 4.
主弁体６は、ダイヤフラム側の取付部６ａと、弁体部６
ｂとよりなり、両者を結合して一体となす。The main valve body 6 has a mounting portion 6a on the diaphragm side and a valve body portion 6.
b, and the two are combined to form a single body.
そしてその結合部に第２のダイヤフラム１１を周縁部が
挟着されるように一体に取付ける。この主弁体６を中空
に形成してその中空内部に第２の弁体１２を両者の軸心
が一致するように組入れ、弁体上端を第２のダイヤフラ
ム１１に取付ける。この第２のダイヤフラム１１には、
ばね１６を設けてそのばね圧とダイヤフラム１１の張力
を加えたものが、調整ばね１４とバランスするようにな
す。ばね１６は、これを設けない場合もある。Then, the second diaphragm 11 is integrally attached to the joint portion so that the peripheral edge portion is sandwiched therebetween. The main valve body 6 is formed hollow, and the second valve body 12 is assembled into the hollow interior so that their axes coincide with each other, and the upper end of the valve body is attached to the second diaphragm 11. This second diaphragm 11 has
A spring 16 is provided so that the spring pressure plus the tension of the diaphragm 11 is balanced with the adjustment spring 14. The spring 16 may not be provided in some cases.
ねじ１５は、ばね受は部１５ａを有するねじ軸１５ｂを
弁ケース本体３に形成した円筒部１５ｃに進退移動しう
るように螺入して外部に突出するつまみ１５ｄを回わす
ことにより操作する。The screw 15 is operated by screwing a screw shaft 15b having a spring bearing portion 15a into a cylindrical portion 15c formed in the valve case body 3 so as to be able to move forward and backward, and turning a knob 15d that projects outside.
［考案の効果］
本発明は、上述のとおり構成されているので、次に記載
する効果を奏する。[Effects of the invention] Since the present invention is configured as described above, it produces the following effects.
■ ガス燃焼出力を、大流量と小流量値の設定が可能
であり、特に小流量値のガス圧を一次ガス圧力の変動に
対して安定した供給を行うことができる。(2) The gas combustion output can be set to a large flow rate value or a small flow rate value, and in particular, gas pressure at a small flow rate value can be stably supplied against fluctuations in primary gas pressure.
■ 大流量と小流量の設定が機能面で独立し、相互に
干渉しない。■ Large flow rate and small flow rate settings are functionally independent and do not interfere with each other.
■ 絞り比率が増加しても、弁の振動、温度変化等の
影響による変動が生じない。■ Even if the throttle ratio increases, fluctuations due to valve vibration, temperature changes, etc. do not occur.
■ 大きな弁で小さな流量を制御するために発生する
従来の弊害、不具合を完全になくすことができ、又部品
精度の確保が容易となるため、製作、加工が簡単で、安
価に実施できる。■ It is possible to completely eliminate the conventional problems and problems that occur when controlling a small flow rate with a large valve, and it is easy to ensure the accuracy of parts, so manufacturing and processing are simple and can be carried out at low cost.
図面は本発明に係るガス比例制御弁の実施例を示すも、
ので、第１図は従来の制御弁の断面図、第２図は本発明
の制御弁の縦断側面図である。
２・・・ガス出口
４・・・ダイヤフラム
６・−・主弁体
８・・・ヨーク
１０・・・電磁装置
１２・・・第２の弁体
１４・・・はね
１・・・ガス入口
３・・・弁ケース本体
５・・・弁口
７・・・コイル
９・−・マグネット
１１・・−第２のダイヤフラム
１３・・・第２の弁口
１５・・・調整ねじ
出
願
人
神菱電機製造株式会社
第１図
５４
３
特開平３
３７４８９ （４）
第２図Although the drawings show an embodiment of the gas proportional control valve according to the present invention,
Therefore, FIG. 1 is a sectional view of a conventional control valve, and FIG. 2 is a longitudinal sectional side view of the control valve of the present invention. 2... Gas outlet 4... Diaphragm 6... Main valve body 8... Yoke 10... Electromagnetic device 12... Second valve body 14... Splash 1... Gas inlet 3...Valve case body 5...Valve port 7...Coil 9...Magnet 11...-Second diaphragm 13...Second valve port 15...Adjusting screw Applicant Kamibishi Denki Seizo Co., Ltd. Figure 1 54 3 JP-A-3 37489 (4) Figure 2
Claims (2)
に、ガス圧により変動するダイヤフラム４と、これに連
動するように取付けられてガス出口２への弁口５を広狭
変化させるように開閉する主弁体６、及びダイヤフラム
４の動きを磁力にて外的にコントロールするようにコイ
ル７にて励磁されるヨーク８とマグネット９とよりなる
電磁装置１０とを備え、前記主弁体６には、その内部に
第２のダイヤフラム１１とその第２のダイヤフラムと共
動して第２の弁口１３を開閉させる第２の弁体１２とを
設け、前記第２の弁体１２は、主弁体６が閉止時に開弁
して小流量制御を行うように設定してなることを特徴て
するガス用比例制御弁。(1) Valve case body 3 having gas inlet 1 and gas outlet 2
A diaphragm 4 that changes depending on the gas pressure, a main valve body 6 that is attached in conjunction with the diaphragm 4 and opens and closes the valve port 5 to the gas outlet 2 to change its width, and the movement of the diaphragm 4 is controlled by magnetic force. The main valve body 6 includes a second diaphragm 11 and a second diaphragm 11 inside the main valve body 6. A second valve body 12 is provided which opens and closes the second valve port 13 in cooperation with the diaphragm, and the second valve body 12 opens when the main valve body 6 is closed to perform small flow control. Proportional control valve for gas, which is characterized by the following settings.
張力を外的にコントロールする調整ばね１４を設けた請
求項１記載のガス用比例制御弁。(2) The proportional control valve for gas according to claim 1, wherein said second valve body (12) is provided with an adjustment spring (14) for externally controlling the tension by operating a screw (15).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17088389A JPH07113432B2 (en) | 1989-06-30 | 1989-06-30 | Proportional control valve for gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17088389A JPH07113432B2 (en) | 1989-06-30 | 1989-06-30 | Proportional control valve for gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0337489A true JPH0337489A (en) | 1991-02-18 |
| JPH07113432B2 JPH07113432B2 (en) | 1995-12-06 |
Family
ID=15913082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17088389A Expired - Fee Related JPH07113432B2 (en) | 1989-06-30 | 1989-06-30 | Proportional control valve for gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07113432B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0393664U (en) * | 1990-01-10 | 1991-09-25 | ||
| KR19990037203A (en) * | 1997-10-20 | 1999-05-25 | 토니올로 쿠르트 | Flow control valve with integrated pressure controller |
| CN113803480A (en) * | 2021-11-17 | 2021-12-17 | 星宇电子(宁波)有限公司 | High-stability high-voltage electric proportional valve |
| US11906059B2 (en) * | 2022-04-11 | 2024-02-20 | Rinnai Corporation | Gas governor |
-
1989
- 1989-06-30 JP JP17088389A patent/JPH07113432B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0393664U (en) * | 1990-01-10 | 1991-09-25 | ||
| KR19990037203A (en) * | 1997-10-20 | 1999-05-25 | 토니올로 쿠르트 | Flow control valve with integrated pressure controller |
| CN113803480A (en) * | 2021-11-17 | 2021-12-17 | 星宇电子(宁波)有限公司 | High-stability high-voltage electric proportional valve |
| CN113803480B (en) * | 2021-11-17 | 2022-02-08 | 星宇电子(宁波)有限公司 | High-stability high-voltage electric proportional valve |
| US11906059B2 (en) * | 2022-04-11 | 2024-02-20 | Rinnai Corporation | Gas governor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07113432B2 (en) | 1995-12-06 |
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