JPH0336940U - - Google Patents

Info

Publication number
JPH0336940U
JPH0336940U JP9762689U JP9762689U JPH0336940U JP H0336940 U JPH0336940 U JP H0336940U JP 9762689 U JP9762689 U JP 9762689U JP 9762689 U JP9762689 U JP 9762689U JP H0336940 U JPH0336940 U JP H0336940U
Authority
JP
Japan
Prior art keywords
light
liquid leakage
detecting
reflective
submerged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9762689U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9762689U priority Critical patent/JPH0336940U/ja
Publication of JPH0336940U publication Critical patent/JPH0336940U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Examining Or Testing Airtightness (AREA)

Description

【図面の簡単な説明】
第１図はこの考案の漏液センサの基本構成を示
す斜視図、第２図は漏液の非浸水状態を示す漏液
センサの部分側面図、第３図はその浸水状態を示
す部分側面図、第４図は別の実施例による漏液の
非浸水状態を示す漏液センサ部分側面図、第５図
はその浸水状態を示す部分側面図、第６図〜第９
図は従来の漏液検知方法を説明するために示す図
である。 １，１００……反射媒体、２……漏液、３……
配管、４……床面、５……発光装置、６……受光
装置、７……検知装置。

Claims (1)

    【実用新案登録請求の範囲】
  1. 漏液の光屈折率に近い光屈折率を有する透明材
    又は半透明材であると共に、非浸水時に照射光を
    反射する反射面を有する反射媒体と、この反射媒
    体に前記照射光を照射する発光手段と、前記反射
    媒体からの反射光を受光する受光手段と、この受
    光手段からの情報に基づいて前記漏液を検知する
    検知手段とによつて構成され、前記反射面の浸水
    時に前記反射光の光量変化によつて漏液検知を行
    ない得るようにしたことを特徴とする漏液センサ
    。
JP9762689U 1989-08-22 1989-08-22 Pending JPH0336940U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9762689U JPH0336940U (ja) 1989-08-22 1989-08-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9762689U JPH0336940U (ja) 1989-08-22 1989-08-22

Publications (1)

Publication Number Publication Date
JPH0336940U true JPH0336940U (ja) 1991-04-10

Family

ID=31646761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9762689U Pending JPH0336940U (ja) 1989-08-22 1989-08-22

Country Status (1)

Country Link
JP (1) JPH0336940U (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011044735A (ja) * 2004-07-12 2011-03-03 Nikon Corp 露光装置及びデバイス製造方法
JP2012225780A (ja) * 2011-04-20 2012-11-15 Disco Abrasive Syst Ltd 漏液検出機構
US9760026B2 (en) 2003-07-28 2017-09-12 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133335A (ja) * 1985-12-06 1987-06-16 Nec Corp 漏洩検出装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133335A (ja) * 1985-12-06 1987-06-16 Nec Corp 漏洩検出装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9760026B2 (en) 2003-07-28 2017-09-12 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus
US10185232B2 (en) 2003-07-28 2019-01-22 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus
JP2011044735A (ja) * 2004-07-12 2011-03-03 Nikon Corp 露光装置及びデバイス製造方法
JP2012009897A (ja) * 2004-07-12 2012-01-12 Nikon Corp 露光装置及びデバイス製造方法
JP2012225780A (ja) * 2011-04-20 2012-11-15 Disco Abrasive Syst Ltd 漏液検出機構

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