JPH03294740A - Heating method of pure or ultra-pure water - Google Patents
Heating method of pure or ultra-pure waterInfo
- Publication number
- JPH03294740A JPH03294740A JP2093041A JP9304190A JPH03294740A JP H03294740 A JPH03294740 A JP H03294740A JP 2093041 A JP2093041 A JP 2093041A JP 9304190 A JP9304190 A JP 9304190A JP H03294740 A JPH03294740 A JP H03294740A
- Authority
- JP
- Japan
- Prior art keywords
- light
- water
- pure
- pure water
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 21
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 21
- 238000010438 heat treatment Methods 0.000 title abstract description 33
- 238000000034 method Methods 0.000 title abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 62
- 230000001678 irradiating effect Effects 0.000 claims description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 5
- 229910052753 mercury Inorganic materials 0.000 claims description 5
- 229910052724 xenon Inorganic materials 0.000 claims description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 3
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 claims description 2
- 238000005498 polishing Methods 0.000 abstract description 5
- 239000012535 impurity Substances 0.000 abstract description 4
- 238000002310 reflectometry Methods 0.000 abstract 1
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 235000013305 food Nutrition 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 239000008236 heating water Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000004457 water analysis Methods 0.000 description 1
Landscapes
- Physical Water Treatments (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、純水又は超純水の加熱方法に関し、例えば、
電子工業、医療医薬品工業、精密工業あるいは食品工業
で用いられる純水又は超純水の加熱方法に関するもので
ある。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for heating pure water or ultrapure water, for example,
The present invention relates to a method for heating pure water or ultrapure water used in the electronics industry, medical and pharmaceutical industry, precision industry, or food industry.
近年、電子工業等では、高集積化、精密化に伴い、洗浄
の高度化が計られている。その一つとして、高温の純水
又は超純水を用いた洗浄がある。In recent years, in the electronics industry, etc., cleaning has become more sophisticated due to the increase in integration and precision. One such method is cleaning using high-temperature pure water or ultrapure water.
従来の純水又は超純水の加熱方法には、電気ヒーター、
熱交換器、周波数２４５０ＭＨｚ及び９１５ Ｍｆｌｚ
等のマイクロ波照射、波長約３μｍ以上の赤外線照射な
どがある。Conventional methods of heating pure or ultrapure water include electric heaters,
Heat exchanger, frequency 2450MHz and 915 Mflz
Microwave irradiation, such as microwave irradiation, infrared irradiation with a wavelength of about 3 μm or more, etc.
しかし、電気ヒーターでは、水は接触界面のみで加熱さ
れるため、水全体の加熱は、水自体の熱伝導と対流で行
われ、加熱効果が不均一になりやすい。また接触面での
過熱による沸騰などは、加熱効率の低下等を招くため、
電気ヒーターの単位面積あたりの供給熱量はあまり大き
くできず、加熱速度を高めるためには、接触面積を大き
くする、または水の加圧又は攪拌等を行う必要がある。However, with electric heaters, water is heated only at the contact interface, so the entire water is heated by heat conduction and convection of the water itself, and the heating effect tends to be uneven. In addition, boiling due to overheating on the contact surface will lead to a decrease in heating efficiency, etc.
The amount of heat supplied per unit area of the electric heater cannot be increased very much, and in order to increase the heating rate, it is necessary to increase the contact area or pressurize or stir the water.
熱交換器では、高温側媒体として熱水又はスチームが必
要であり、熱効率があまり高くない。Heat exchangers require hot water or steam as a high-temperature medium, and their thermal efficiency is not very high.
さらに、大きな伝熱面積が必要となるため、伝熱媒体と
して用いられるテフロン等のプラスチック又はステンレ
ス等の金属からの、有機物質及び金属イオン類の溶出量
が大きくなり、純水又は超純水の汚染を招く難点がある
。Furthermore, since a large heat transfer area is required, the amount of organic substances and metal ions eluted from plastics such as Teflon or metals such as stainless steel used as heat transfer media increases, and It has the disadvantage of causing pollution.
マイクロ波のエネルギーは、水分子の回転エネルギーと
ほぼ一致するため、水へのマイクロ波の吸収効率は非常
に高い。しかし、電力をマイクロ波に変換する時点で２
０％ないし５０％の損失があること、並びにマイクロ波
発生装置がかなり大きく、さらに伝達に用いる導波管の
大きさが波長によって決まり、小型化できない等の難点
がある。また、マイクロ波は人体に対して有害であり、
マイクロ波の検出は肉眼では不可能であるため、漏洩に
気づきにくい。The energy of microwaves almost matches the rotational energy of water molecules, so the absorption efficiency of microwaves into water is extremely high. However, at the time of converting electricity to microwaves, 2
There are disadvantages such as there is a loss of 0% to 50%, the microwave generator is quite large, and the size of the waveguide used for transmission is determined by the wavelength, making it impossible to miniaturize. Additionally, microwaves are harmful to the human body.
Microwaves cannot be detected with the naked eye, so leaks are difficult to detect.
３μｍ前後または６μｍ前後の赤外線のエネルギーは、
水分子の振動エネルギーとほぼ一致するため、水への吸
収効率が非常に高い。従って塗料等の水分の蒸発乾燥に
は非常に効果的である。また、人体は水を主成分とする
ため暖房器具等に使用した場合には比較的少ないエネル
ギーで温かみを感じ有効である。しかし逆に、吸収効率
が高いために、水の表面又は光源との接触界面から数ｍ
ｍで吸収されてしまい、それ以上の浸透は困難である。The energy of infrared rays around 3 μm or around 6 μm is
Because it almost matches the vibrational energy of water molecules, its absorption efficiency into water is extremely high. Therefore, it is very effective in evaporating and drying the water content of paints, etc. In addition, since the human body has water as its main component, when used in heating equipment, etc., it is effective to feel warmth using relatively little energy. However, on the contrary, due to its high absorption efficiency, it
It is absorbed by m, and further penetration is difficult.
すなわち、水自体を加熱する場合には電気ヒーターと同
じ難点がある。That is, when heating water itself, there are the same difficulties as electric heaters.
さらに、通常赤外線光源は熱放射であり、照射強度は光
源温度による。従って、水に直接接触する場合は温度が
限られるため、放射エネルギーはごく小さくなり加熱効
果は小さい。また、水と光源との間に赤外線吸収の無い
０２．１４２等の気体等を介在させて光源温度を高くし
、照射強度を大きくする方法もあるが、純水又は超純水
の加熱に際して気体を介在させることは困難である。Furthermore, infrared light sources are usually thermal radiation, and the irradiation intensity depends on the source temperature. Therefore, in the case of direct contact with water, the temperature is limited, so the radiant energy is very small and the heating effect is small. Another method is to interpose a gas such as 02.142 that does not absorb infrared rays between the water and the light source to increase the light source temperature and increase the irradiation intensity. It is difficult to intervene.
上記のように、従来の加熱方法では、それぞれに問題が
あり、純水又は超純水を均一にかつ効率よく、不純物を
増加させずに、加熱することは困難であった。As mentioned above, each of the conventional heating methods has its own problems, and it has been difficult to heat pure water or ultrapure water uniformly and efficiently without increasing impurities.
そこで、本発明は、従来技術の問題点を解消し、均一に
かつ効率よく、しかも不純物の増加も極めて少ない純水
又は超純水の加熱方法を提供することを目的とする。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a method for heating pure water or ultrapure water uniformly and efficiently, with extremely little increase in impurities, by solving the problems of the prior art.
上記目的を達成するために、本発明では、純水又は超純
水を、近赤外領域から紫外領域の光を、該光を反射する
容器内で照射することによって、加熱することを特徴と
する純水又は超純水の加熱方法としたものである。In order to achieve the above object, the present invention is characterized in that pure water or ultrapure water is heated by irradiating it with light in the near-infrared to ultraviolet region in a container that reflects the light. This is a method of heating pure water or ultrapure water.
本発明は、純水又は超純水の汚染を起こさず、効率よく
かつ均一に加熱することのできる加熱方法を提供するも
のであり、純水または超純水に、近赤外領域から紫外領
域の光をこれらの光を反射する容器内で照射して加熱す
ることで容易に目的を達成し得る。The present invention provides a heating method that can efficiently and uniformly heat pure water or ultrapure water without causing contamination. This purpose can be easily achieved by irradiating and heating the light inside a container that reflects these lights.
以下に本発明の詳細な説明する。The present invention will be explained in detail below.
本発明においては、原水を加熱するに際し、近赤外領域
から紫外領域の全部または一部を放射する光源と、その
周囲にあって前記波長の光を反射する内部表面を持つ容
器とを備えたものであればよい。In the present invention, when heating raw water, there is provided a light source that emits all or a part of the near-infrared to ultraviolet region, and a container surrounding the light source that has an internal surface that reflects light of the wavelengths. It is fine as long as it is something.
使用する光源の特性は、近赤外領域から紫外領域の全部
または一部の波長の光を、加熱に必要なエネルギーを１
または複数で発生する光源であればよい。光源として、
ランプ１本あたりの出力が大きく、かつ光のエネルギー
の大きい紫外域の光を主に照射するランプが望ましい。The characteristics of the light source used are that it emits light of all or part of the wavelength from the near-infrared region to the ultraviolet region, and the energy required for heating is 1.
Alternatively, it is sufficient if the light source generates a plurality of light sources. As a light source,
It is desirable to use a lamp that has a large output per lamp and emits light mainly in the ultraviolet region, which has a large amount of light energy.
例えば、波長約４００ｎｍ以下の紫外域の水銀の輝線ス
ペクトルを主体として連続スペクトルを照射する中圧、
高圧又は超高圧の水銀ランプ、波長約４０００ｍ〜約１
１０００ｎの広範囲で連続スペクトルを放射するキセノ
ンランプ、または水銀とキセノンとを共存させて紫外域
を強化した水銀キセノンランプ等を用いることができる
。For example, medium pressure that irradiates a continuous spectrum mainly consisting of the emission line spectrum of mercury in the ultraviolet region with a wavelength of about 400 nm or less;
High-pressure or ultra-high-pressure mercury lamp, wavelength approximately 4000 m to approximately 1
A xenon lamp that emits a continuous spectrum over a wide range of 1000 nm, or a mercury-xenon lamp that enhances the ultraviolet region by coexisting mercury and xenon, or the like can be used.
なお低圧水銀ランプは、１本当りの出力が比較的小さく
多数必要であること、ランプ温度が上昇すると放射効率
が低下するとされていることなどから、加熱用途への利
用は困難である。Note that it is difficult to use low-pressure mercury lamps for heating purposes because the output per lamp is relatively small and a large number of lamps are required, and the radiation efficiency is said to decrease as the lamp temperature increases.
使用する容器の特性は、前記波長域の光を効率よく反射
するものであればよい。容器としては、反射率を大きく
するために内部表面に鏡面研磨、電解研磨、電解複合研
磨等を施した、 ５ＫＩＳ３１６またはＳ［ｌ５３１６
Ｌ製等が望ましい。The characteristics of the container used may be any as long as it can efficiently reflect light in the above wavelength range. The container is made of 5KIS316 or S[l5316, whose internal surface has been subjected to mirror polishing, electrolytic polishing, electrolytic composite polishing, etc. to increase the reflectance.
L-made one is preferable.
純水又は超純水に、近赤外領域から紫外領域の光を、こ
れらの光を反射する容器内で照射して加熱する方法には
、次のような作用がある。The method of heating pure water or ultrapure water by irradiating it with light in the near-infrared to ultraviolet range in a container that reflects this light has the following effects.
（１）近赤外領域から紫外領域の光は、波長約３μｍま
たは約６μｍの赤外線またはマイクロ波に比較して、水
への吸収効率が低い。従って、水に一過性で照射した場
合、水に吸収されるエネルギーは大きくない。しかし、
容器内表面によって光が反射して、繰り返し吸収され、
加熱される。すなわち、水の熱伝導または対流に比較し
て、均一な加熱が可能である。(1) Light from the near-infrared region to the ultraviolet region has a lower absorption efficiency into water than infrared rays or microwaves having a wavelength of about 3 μm or about 6 μm. Therefore, when water is irradiated temporarily, the energy absorbed by the water is not large. but,
Light is reflected by the inner surface of the container and absorbed repeatedly,
heated. That is, uniform heating is possible compared to water heat conduction or convection.
さらに、−過あたりの吸収効率が高くないため、系内の
一部、例えば接触界面などで過熱されることが無い。す
なわち、光源単位面積あたりの照射強度、すなわちエネ
ルギー密度を大きくすることができ、水質低下の原因と
なる水と加熱媒体との接触面積を小さくすることができ
る。Furthermore, since the absorption efficiency per unit temperature is not high, a part of the system, such as a contact interface, is not overheated. That is, the irradiation intensity per unit area of the light source, that is, the energy density, can be increased, and the contact area between water and the heating medium, which causes deterioration in water quality, can be reduced.
（２）純水又は超純水中にわずかに残存する有機物質を
、分解除去できる可能性がある。(2) It is possible to decompose and remove organic substances slightly remaining in pure water or ultrapure water.
ここで、食品等の加熱においては、主成分である有機物
質の変質を起こさずに加熱することが必要であり、有機
物質の変質分解を起こす可能性の高い紫外領域の光は利
用できなかった。Here, when heating foods, etc., it is necessary to heat them without causing deterioration of the organic substances that are the main components, and it was not possible to use light in the ultraviolet region, which is likely to cause decomposition and decomposition of organic substances. .
しかし、純水又は超純水の加熱においては、水の加温の
みが問題であり、共存する有機物質の分解はむしろ望ま
しい。However, when heating pure water or ultrapure water, only the heating of the water is a problem, and decomposition of coexisting organic substances is rather desirable.
（３）２５４ｎｍの紫外線には殺菌作用があり、加温の
みに比較して高い殺菌効果が得られる。(3) Ultraviolet light of 254 nm has a bactericidal effect, and a higher bactericidal effect can be obtained compared to heating alone.
以下に、本発明を実施例及び比較例を挙げて説明するが
、本発明は、次の実施例に限定されるものではない。The present invention will be described below with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples.
実施例１
水道水を原水として、逆浸透装置、イオン交換塔及びメ
ンブレンフィルタ等で構成された純水製造装置で処理し
て得られた純水を、第１図に示した１ｋＷの中圧紫外線
ランプによる紫外線加熱装置に、流量的２０β／ｈで通
水して処理した。処理前後の水温を第１表に、被処理水
および処理水の水質の例を第２表に示した。なお温水の
分析は、ガラス製ザンプルびんに採水して冷却した水に
ついて行った。Example 1 Tap water was used as raw water and purified water obtained by processing it in a water purification device consisting of a reverse osmosis device, an ion exchange tower, a membrane filter, etc. was exposed to 1 kW of medium-pressure ultraviolet light as shown in Figure 1. The treatment was carried out by passing water through an ultraviolet heating device using a lamp at a flow rate of 20β/h. Table 1 shows the water temperature before and after the treatment, and Table 2 shows examples of the water quality of the treated water and the treated water. The hot water analysis was performed on water that was collected in a glass sample bottle and cooled.
比較例１
前記実施例と同様に処理して得られた純水を、１ｋＷの
電気ヒーターを組み込んだ高温水槽に浸漬したテフロン
製チューブよりなる熱交換器を用いて加熱した。加熱開
始後の時間と処理水水温は、第１表に示したようになっ
た。また、実施例１と同様に測定した被処理水および処
理水の水質は第２表に示したようになった。Comparative Example 1 Pure water obtained by the same treatment as in the above example was heated using a heat exchanger made of a Teflon tube immersed in a high-temperature water tank equipped with a 1 kW electric heater. The time after the start of heating and the temperature of the treated water were as shown in Table 1. Further, the water quality of the treated water and the treated water measured in the same manner as in Example 1 was as shown in Table 2.
比較例２
前記実施例と同様に処理して得られた純水を、１ ｋｌ
ｌｉの電気ヒーターを５ＩＩＳ［ｌ３１６管を周囲に巻
き付けた加熱装置を用いて加温した。加温開始後の時間
と処理水水温は第１表に示したようになった。また実施
例１と同様に測定した被処理水および処理水の水質は第
２表に示したようになった。Comparative Example 2 1 kl of pure water obtained by the same treatment as in the above example
The heating device was heated using an electric heater with a 5IIS [1316 tube wrapped around it. The time after the start of heating and the temperature of the treated water were as shown in Table 1. Furthermore, the water quality of the treated water and the treated water measured in the same manner as in Example 1 was as shown in Table 2.
第１表 加温開始後の水温の経時変化
第２表 処理前後の水質
０
〔発明の効果〕
本発明は、近赤外領域から紫外領域の光を、前記領域の
光を反射する容器内で照射することによって、純水又は
超純水を加熱するものであり、
■）従来法である熱交換器などに比較して、水と装置と
の接触面積が非常に小さく、不純物増加がきわめて小さ
い。高温側媒体が不要のため、所要エネルギーが少ない
。Table 1 Changes in water temperature over time after the start of heating Table 2 Water quality before and after treatment 0 [Effects of the Invention] The present invention allows light from the near-infrared region to the ultraviolet region to be transmitted in a container that reflects light in the aforementioned region. It heats pure water or ultrapure water by irradiating it. ■) Compared to conventional methods such as heat exchangers, the contact area between the water and the device is extremely small, and the increase in impurities is extremely small. . Since no high-temperature medium is required, less energy is required.
２）電気ヒーター、赤外線照射等に比較して均一な加熱
ができる。2) Uniform heating is possible compared to electric heaters, infrared irradiation, etc.
３）熱交換器、マイクロ波照射等に比較して装置が小型
化できる。3) The device can be made smaller compared to heat exchangers, microwave irradiation, etc.
４）紫外線の殺菌作用により、加熱のみに比較して殺菌
効果が高い。4) Due to the sterilizing effect of ultraviolet rays, the sterilizing effect is higher than that of heating alone.
等の効果がある。There are other effects.
このため本発明によれば、純水又は超純水を水質低下を
起こさず、かつ効率的に加温できる。Therefore, according to the present invention, pure water or ultrapure water can be heated efficiently without causing a drop in water quality.
第１図は、実施例に用いた加熱装置の断面概略図である
。
１・・・中圧紫外線ランプ、２・・・石英保護管、３・
・・容器FIG. 1 is a schematic cross-sectional view of a heating device used in an example. 1... Medium pressure ultraviolet lamp, 2... Quartz protection tube, 3...
··container
Claims (1)
、該光を反射する容器内で照射することによって、加熱
することを特徴とする純水又は超純水の加熱方法。 ２、前記近赤外領域から紫外領域の光は、中圧、高圧又
は超高圧の水銀ランプ、キセノンランプ、水銀キセノン
ランプから選ばれた光源からの光である請求項１記載の
純水又は超純水の加熱方法。[Claims] 1. Pure water or ultrapure water characterized by being heated by irradiating the pure water or ultrapure water with light in the near-infrared to ultraviolet region in a container that reflects the light. How to heat ultrapure water. 2. The pure water or ultraviolet light according to claim 1, wherein the light from the near-infrared region to the ultraviolet region is light from a light source selected from a medium-pressure, high-pressure, or ultra-high pressure mercury lamp, xenon lamp, or mercury-xenon lamp. How to heat pure water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2093041A JPH03294740A (en) | 1990-04-10 | 1990-04-10 | Heating method of pure or ultra-pure water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2093041A JPH03294740A (en) | 1990-04-10 | 1990-04-10 | Heating method of pure or ultra-pure water |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03294740A true JPH03294740A (en) | 1991-12-25 |
Family
ID=14071420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2093041A Pending JPH03294740A (en) | 1990-04-10 | 1990-04-10 | Heating method of pure or ultra-pure water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03294740A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5590240A (en) * | 1995-05-30 | 1996-12-31 | Process Technology Inc | Ultra pure water heater with coaxial helical flow paths |
| CN103062903A (en) * | 2013-01-15 | 2013-04-24 | 山东金仓新能源科技有限公司 | Remotely-controlled intelligent light-wave heating water heater |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS40712Y1 (en) * | 1961-11-01 | 1965-01-11 | ||
| JPS5848380A (en) * | 1981-09-18 | 1983-03-22 | セイコーエプソン株式会社 | Lamp annealing device |
| JPS6222462U (en) * | 1985-07-23 | 1987-02-10 | ||
| JPS62181422A (en) * | 1985-10-26 | 1987-08-08 | Nissho Giken Kk | Light projecting apparatus |
| JPS62183962A (en) * | 1986-02-07 | 1987-08-12 | Hitachi Ltd | Heating device |
| JPH0232535A (en) * | 1988-07-21 | 1990-02-02 | Kyushu Electron Metal Co Ltd | Manufacture of silicon substrate for semiconductor device |
-
1990
- 1990-04-10 JP JP2093041A patent/JPH03294740A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS40712Y1 (en) * | 1961-11-01 | 1965-01-11 | ||
| JPS5848380A (en) * | 1981-09-18 | 1983-03-22 | セイコーエプソン株式会社 | Lamp annealing device |
| JPS6222462U (en) * | 1985-07-23 | 1987-02-10 | ||
| JPS62181422A (en) * | 1985-10-26 | 1987-08-08 | Nissho Giken Kk | Light projecting apparatus |
| JPS62183962A (en) * | 1986-02-07 | 1987-08-12 | Hitachi Ltd | Heating device |
| JPH0232535A (en) * | 1988-07-21 | 1990-02-02 | Kyushu Electron Metal Co Ltd | Manufacture of silicon substrate for semiconductor device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5590240A (en) * | 1995-05-30 | 1996-12-31 | Process Technology Inc | Ultra pure water heater with coaxial helical flow paths |
| CN103062903A (en) * | 2013-01-15 | 2013-04-24 | 山东金仓新能源科技有限公司 | Remotely-controlled intelligent light-wave heating water heater |
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