JPH03277947A - Method for detecting acidic gas or basic gas - Google Patents
Method for detecting acidic gas or basic gasInfo
- Publication number
- JPH03277947A JPH03277947A JP7681590A JP7681590A JPH03277947A JP H03277947 A JPH03277947 A JP H03277947A JP 7681590 A JP7681590 A JP 7681590A JP 7681590 A JP7681590 A JP 7681590A JP H03277947 A JPH03277947 A JP H03277947A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- crystal
- light
- particles
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002378 acidificating effect Effects 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims description 14
- 239000002245 particle Substances 0.000 claims abstract description 26
- 238000001514 detection method Methods 0.000 claims description 14
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 abstract description 89
- 239000013078 crystal Substances 0.000 abstract description 31
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 23
- 239000000428 dust Substances 0.000 abstract description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 12
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 abstract description 10
- 229910021529 ammonia Inorganic materials 0.000 abstract description 10
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract description 8
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract description 8
- 238000000149 argon plasma sintering Methods 0.000 abstract description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 abstract description 4
- 235000019270 ammonium chloride Nutrition 0.000 abstract description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 abstract description 3
- 239000010419 fine particle Substances 0.000 description 25
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 6
- -1 salt compound Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、酸性ガス又は塩基性ガス、特に強酸性ガス又
は強塩基性ガスの検出方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for detecting acidic or basic gases, particularly strongly acidic or strongly basic gases.
（従来の技術）
従来、塩素ガスを検出する方法としては、例えば特開昭
５８−２２３０５３号に記載されるものがあった。この
方法はセラミック板中にヒータを内蔵した小型の基板を
使用し、その全面に半導体結晶を塗装焼成してなる素子
によって、塩素ガスを検出するものである。その他に塩
素ガスを検出する方法としては、ガスを吸収したサンプ
ル液の吸光度を測定する方法、ガス検知管の着色層の長
さを測定する方法等があるが、何れの検出方法も対象と
するガスは酸性ガスに限られ、塩基性ガスをも検出でき
る汎用性のあるものではなかった。(Prior Art) Conventionally, as a method for detecting chlorine gas, there is a method described in, for example, Japanese Patent Application Laid-Open No. 58-223053. This method uses a small ceramic board with a built-in heater, and detects chlorine gas using an element whose entire surface is coated with semiconductor crystals and fired. Other methods for detecting chlorine gas include measuring the absorbance of a sample liquid that has absorbed gas, and measuring the length of the colored layer of a gas detection tube, but both detection methods are covered. The gas used was limited to acidic gases, and it was not versatile enough to detect basic gases as well.
（発明が解決しようとする課題）
ところで、半導体製造現場等の超清浄性が必要とされる
空間では、浮遊微粒子だけが問題とされるのではなく、
酸性又は塩基性の薬品性ガス雰囲気も半導体の品質に悪
影響を与えるので、これらのガスを厳しく管理する必要
がある。そのためには複数の薬品性ガス（即ち、複数種
の酸性ガス又は複数種の塩基性ガス）を同時に短時間で
検出しなければならないにもかかわらず、従来技術では
検出可能なガスの種類が極めて限られており、また同一
装置で性質の異なるガス（即ち、酸性ガスと塩基性ガス
）を検出可能なものはなく、ガス雰囲気の管理に満足で
きるものはなかった。(Problem to be solved by the invention) By the way, in spaces where ultra-cleanliness is required, such as semiconductor manufacturing sites, floating particles are not the only problem;
Acidic or basic chemical gas atmospheres also have an adverse effect on the quality of semiconductors, so these gases must be strictly controlled. To achieve this, it is necessary to simultaneously detect multiple chemical gases (i.e., multiple types of acidic gases or multiple types of basic gases) in a short period of time, but with conventional technology, the types of gases that can be detected are extremely limited. There is no device that can detect gases with different properties (that is, acidic gas and basic gas) with the same device, and there is no device that can satisfy the gas atmosphere management.
本発明は、上記問題点を除去し、複数種の酸性ガス又は
複数種の塩基性ガスを同時に短時間に検出することがで
きる酸性ガス又は塩基性ガスの検出方法を提供すること
を目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for detecting acidic gases or basic gases that can eliminate the above-mentioned problems and simultaneously detect multiple types of acidic gases or multiple types of basic gases in a short time. .
（課題を解決するための手段）
本発明は、上記目的を達成するために、酸性ガス又は塩
基性ガスの検出方法において、サンプルガスをアンモニ
ア又は塩化水素雰囲気に通して結晶微粒子を生成させる
工程と、前記結晶微粒子をダストモニタに導き、該結晶
微粒子を検出する工程とを施すようにしたものである。(Means for Solving the Problems) In order to achieve the above object, the present invention provides a method for detecting acidic gas or basic gas, which includes a step of passing a sample gas through an ammonia or hydrogen chloride atmosphere to generate crystalline fine particles. , the step of guiding the crystalline fine particles to a dust monitor and detecting the crystalline fine particles.
また、前記結晶微粒子の検出は、
（１）結晶微粒子に光を照射し、その乱反射光をフォト
ダイオードにより行う。Further, the detection of the crystalline fine particles is as follows: (1) The crystalline fine particles are irradiated with light, and the diffusely reflected light is detected by a photodiode.
（２）結晶微粒子をフィルタで捕集し、顕微鏡により行
うか、或いはフィルタの重量増加で行うようにしたもの
である。(2) Fine crystal particles are collected with a filter and the detection is performed using a microscope or by increasing the weight of the filter.
（作用）
本発明によれば、上記のように構成することにより、サ
ンプルガスが酸性であれば、アンモニア雰囲気に通すと
反応が起こり、塩化合物結晶微粒子が生成される０例え
ば、サンプルガスが塩化水素の場合、
ＨＣＩ＋ＮＨａＯＨ−−ラＮＨａＣＩ＋ＨｚＯの反応に
よりＮＨ，ＣＩの結晶微粒子が生成される。(Function) According to the present invention, with the above configuration, if the sample gas is acidic, a reaction occurs when it is passed through an ammonia atmosphere, and fine salt compound crystal particles are generated. In the case of hydrogen, crystal fine particles of NH and CI are generated by the reaction HCI+NHaOH--RaNHaCI+HzO.
また、サンプルガスが塩基性であれば、塩化水素雰囲気
に通すと、同様に反応が起こり塩化合物結晶微粒子が生
成される０反応式は上記式と同様である。Further, if the sample gas is basic, when it is passed through a hydrogen chloride atmosphere, a similar reaction occurs and salt compound crystal fine particles are produced.The reaction formula is the same as the above formula.
これらの結晶微粒子は、ガスに浮遊しており、これらの
結晶微粒子を含んだガスを、光散乱式ダストモニタにて
検出する。光散乱式ダストモニタは強力光照射エリアに
サンプルガスを通し、ガス中の結晶微粒子により乱反射
した光の強度を、電位差に変換するもので、結晶微粒子
存在の有無を電気的に測定できる。また、ダストモニタ
での結晶微粒子の検出は、光散乱式以外にフィルタを用
いて結晶微粒子を捕集し、顕微鏡で検出したり、フィル
タの重量増加で検出することもできる。These crystal fine particles are suspended in the gas, and the gas containing these crystal fine particles is detected by a light scattering type dust monitor. A light scattering type dust monitor passes a sample gas through an area irradiated with intense light and converts the intensity of the light diffusely reflected by fine crystal particles in the gas into a potential difference, making it possible to electrically measure the presence or absence of fine crystal particles. In addition to the light scattering method, crystal fine particles can be detected with a dust monitor by using a filter to collect the crystal fine particles and detecting them with a microscope, or by detecting by increasing the weight of the filter.
ガス検出装置内のアンモニアは、サンプルガス中に含ま
れる多種の強酸性ガスと反応する。またガス検出装置内
の塩化水素は、サンプルガス中に含まれる多種の強塩基
性ガスと反応して、それぞれ塩化合物の結晶微粒子を生
成するので、ダストモニタでの結晶微粒子検出の有無に
より、複数の薬品性ガスの有無を検出することが可能と
なる。Ammonia in the gas detection device reacts with various types of strong acid gases contained in the sample gas. In addition, hydrogen chloride in the gas detection device reacts with various types of strong basic gases contained in the sample gas, producing crystalline particles of each salt compound. It becomes possible to detect the presence or absence of chemical gas.
（実施例）
以下、本発明の実施例について図面を参照しながら詳細
に説明する。(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
図は本発明の実施例で使用されるガス検出装置の構成図
であり、サンプルガスから結晶微粒子を生成させる部分
と、その結晶微粒子を光散乱方式で検出するダストモニ
タ部分とからなる。特に、塩素ガスを検出する場合の使
用例を示している。The figure is a configuration diagram of a gas detection device used in an embodiment of the present invention, which consists of a part that generates crystal fine particles from a sample gas and a dust monitor part that detects the crystal fine particles using a light scattering method. In particular, an example of use in detecting chlorine gas is shown.
回において、２は内部がアンモニア水溶液とアンモニア
雰囲気が密閉収容された結晶微粒子生成容器であり、サ
ンプルガス導入管１と結晶微粒子ガス管４が設けられて
いる。サンプルガス導入管１の入口がガス吸入口となっ
ている。３は結晶微粒子を含んだガス中の結晶微粒子の
存在を検出するダストモニタである。ダストモニタ３内
は、サンプルガスを照射する光源ランプ５と、乱反射し
た光を検出するフォトダイオード７が付帯した密閉状態
の光照射室９を内蔵している。光照射室９は結晶微粒子
ガス管４によって結晶微粒子生成容器２と接続され、更
に、排気ポンプ８を有する排気管が設けられている。2, a crystal fine particle generation container 2 has an aqueous ammonia solution and an ammonia atmosphere sealed therein, and is provided with a sample gas introduction tube 1 and a crystal fine particle gas tube 4. The inlet of the sample gas introduction tube 1 serves as a gas inlet. 3 is a dust monitor that detects the presence of crystalline particles in a gas containing crystalline particles. The dust monitor 3 contains a light source lamp 5 for irradiating sample gas and a closed light irradiation chamber 9 equipped with a photodiode 7 for detecting diffusely reflected light. The light irradiation chamber 9 is connected to the crystal fine particle production container 2 by a crystal fine particle gas pipe 4, and is further provided with an exhaust pipe having an exhaust pump 8.
サンプルガス存在域に置かれたガス吸入口から吸入され
た塩化水素ガスを含むサンプルガスは、サンプルガス導
入管ｌを通して、内部にアンモニア水溶液とアンモニア
雰囲気が密閉収容された結晶微粒子生成容器２に導入さ
れる。この容器中で酸である塩化水素ガスと、アルカリ
であるアンモニア雰囲気が反応し、塩化合物である塩化
アンモニウム（ＮＨ，ＣＩ）が生成される。塩化アンモ
ニウムは結晶微粒子となっており、ガスに浮遊分散して
いる。この浮遊結晶微粒子を含んだガスは、結晶微粒子
生成容器２の結晶微粒子ガス管４を通り、ダストモニタ
３内の光照射室９に取り入れられる。The sample gas containing hydrogen chloride gas inhaled from the gas inlet placed in the sample gas presence area is introduced through the sample gas introduction pipe l into the crystal fine particle generation container 2 in which an ammonia aqueous solution and an ammonia atmosphere are sealed. be done. In this container, hydrogen chloride gas, which is an acid, and an ammonia atmosphere, which is an alkali, react to generate ammonium chloride (NH, CI), which is a salt compound. Ammonium chloride is in the form of crystalline particles and is suspended and dispersed in the gas. The gas containing the suspended crystal particles passes through the crystal particle gas pipe 4 of the crystal particle generation container 2 and is introduced into the light irradiation chamber 9 in the dust monitor 3.
光照射室９内には光源ランプ５の照射により、強力光照
射エリア６が形成されており、結晶微粒子を含んだガス
がこのエリア６を通過すると光が乱反射する。この乱反
射した光がフォトダイオード７によって電位に換夏され
、この発生した電位を測定することによって、サンプル
ガス中の酸性ガスの存在を検出することができる０強力
光照射エリア６を通過したガスは、排気ポンプ８によっ
て排気管から外部に排出される。この方法によれば、サ
ンプルガス中の塩素ガスを０．１ ｐｐ−レベルまで瞬
時に検出することができる。他の強酸性ガスであっても
アンモニアと塩化合物を生成するものであれば、同様に
検出することができる。A strong light irradiation area 6 is formed in the light irradiation chamber 9 by irradiation with the light source lamp 5, and when gas containing crystal fine particles passes through this area 6, the light is diffusely reflected. This diffusely reflected light is converted into a potential by the photodiode 7, and by measuring the generated potential, the presence of acidic gas in the sample gas can be detected. , is discharged to the outside from the exhaust pipe by the exhaust pump 8. According to this method, chlorine gas in the sample gas can be instantly detected down to the 0.1 pp-level. Other strongly acidic gases that generate salt compounds with ammonia can be similarly detected.
以上の実施例は、塩素ガスを検出する場合を説明したが
、結晶微粒子生成容器２内に塩酸を入れておけば、サン
プルガス中のアンモニアがｏ、１ｐｐ−レベルまで検出
することができる。この場合も上記の実施例と同様に他
の強塩基性ガスでも塩化水素と塩化合物を生成するもの
であれば検出することができる。Although the above embodiment describes the case of detecting chlorine gas, if hydrochloric acid is placed in the crystal fine particle generation container 2, ammonia in the sample gas can be detected down to the o, 1 pp- level. In this case as well, similar to the above embodiment, other strongly basic gases can be detected as long as they produce hydrogen chloride and salt compounds.
また、以上の実施例ではダストモニタ部分を結晶微粒子
を光散乱方式で検出する手段で説明したが、生成した結
晶微粒子をフィルタで捕集し、フィルタ上の結晶微粒子
を顕微鏡で検出したり、或いはフィルタの重量増加で検
出することもできる。In addition, in the above embodiment, the dust monitor part was explained as a means for detecting crystal fine particles using a light scattering method, but it is also possible to collect the generated crystal fine particles with a filter and detect the crystal fine particles on the filter with a microscope. It can also be detected by an increase in the weight of the filter.
更に、検査されるべき対象ガス中の浮遊微粒子の影響を
減じる必要が有る場合には、サンプルガス導入管１にフ
ィルタを設けてもよい。Furthermore, if it is necessary to reduce the influence of suspended particles in the target gas to be tested, the sample gas introduction tube 1 may be provided with a filter.
更にまた、本発明に係るガス検出装置を並列に設置して
、一方の結晶微粒子生成容器２に塩酸を入れ、他方の結
晶微粒子生成容器２にアンモニア水を入れておけば、同
一の検出装置を並列に設置するという簡単な構成で性質
の異なる複数のガスの検出を同時に行うことができる。Furthermore, if the gas detection devices according to the present invention are installed in parallel, and one crystalline particle generation container 2 is filled with hydrochloric acid and the other crystalline particle generation container 2 is filled with aqueous ammonia, the same detection device can be used. With a simple configuration of parallel installation, multiple gases with different properties can be detected simultaneously.
なお、本発明は上記実施例に限定されるものではなく、
本発明の趣旨に基づいて種々の変形が可能であり、これ
らを本発明の範囲から排除するものではない。Note that the present invention is not limited to the above embodiments,
Various modifications are possible based on the spirit of the present invention, and these are not excluded from the scope of the present invention.
（発明の効果）
以上、詳細に説明したように、本発明によれば、次のよ
うな効果を奏することができる。(Effects of the Invention) As described above in detail, according to the present invention, the following effects can be achieved.
（１）サンプルガスに含まれる複数種の酸性ガス又は複
数種の塩基性ガスの検出を同時に短時間で行うことがで
きる。(1) Multiple types of acidic gases or multiple types of basic gases contained in the sample gas can be detected simultaneously in a short time.
（２）酸性又は塩基性ガスを含む雰囲気の検出を同一の
検出装！で行うことができる。(2) Detect atmospheres containing acidic or basic gases with the same detection device! It can be done with
（３）サンプルガスはダストモニタを通るため、酸性又
は塩基性ガスの検出のみならず、サンプルガス中の浮遊
微粒子の検出もできるので、サンプルガスの統括した清
浄度のモニタに適用できる。(3) Since the sample gas passes through the dust monitor, it is possible to detect not only acidic or basic gases but also suspended particles in the sample gas, so it can be applied to comprehensively monitor the cleanliness of the sample gas.
図は本発明の実施例に使用されるガスの検出装置の構成
図である。
１・・・サンプルガス導入管、２・・・結晶微粒子生成
容器、３・・・ダストモニタ、４・・・結晶微粒子ガス
管、５・・・光源ランプ、６・・・強力光照射エリア、
７・・・フォトダイオード、８・・・排気ポンプ、９・
・・光照射室。The figure is a configuration diagram of a gas detection device used in an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Sample gas introduction pipe, 2... Crystal fine particle generation container, 3... Dust monitor, 4... Crystal fine particle gas tube, 5... Light source lamp, 6... Strong light irradiation area,
7... Photodiode, 8... Exhaust pump, 9.
...Light irradiation room.
Claims (3)
通して結晶微粒子を生成させる工程と、（ｂ）前記結晶
微粒子をダストモニタに導き、該結晶微粒子を検出する
工程とを有する酸性ガス又は塩基性ガスの検出方法。(1) An acidic gas or Basic gas detection method.
し、その乱反射光をフォトダイオードにより行うことを
特徴とする請求項１記載の酸性ガス又は塩基性ガスの検
出方法。(2) The method for detecting acidic gas or basic gas according to claim 1, wherein the detection of the crystalline particles is performed by irradiating the crystalline particles with light and using a photodiode to diffusely reflect the light.
で捕集し、顕微鏡により行うか、或いはフィルタの重量
増加で行うことを特徴とする請求項１記載の酸性ガス又
は塩基性ガスの検出方法。(3) The method for detecting acidic gas or basic gas according to claim 1, wherein the detection of the crystalline particles is performed by collecting the crystalline particles with a filter and using a microscope, or by increasing the weight of the filter. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7681590A JP2911533B2 (en) | 1990-03-28 | 1990-03-28 | Acid gas, basic gas or gas detection method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7681590A JP2911533B2 (en) | 1990-03-28 | 1990-03-28 | Acid gas, basic gas or gas detection method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03277947A true JPH03277947A (en) | 1991-12-09 |
| JP2911533B2 JP2911533B2 (en) | 1999-06-23 |
Family
ID=13616169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7681590A Expired - Fee Related JP2911533B2 (en) | 1990-03-28 | 1990-03-28 | Acid gas, basic gas or gas detection method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2911533B2 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6066564A (en) * | 1998-05-06 | 2000-05-23 | International Business Machines Corporation | Indirect endpoint detection by chemical reaction |
| US6126848A (en) * | 1998-05-06 | 2000-10-03 | International Business Machines Corporation | Indirect endpoint detection by chemical reaction and chemiluminescence |
| US6176765B1 (en) | 1999-02-16 | 2001-01-23 | International Business Machines Corporation | Accumulator for slurry sampling |
| US6180422B1 (en) | 1998-05-06 | 2001-01-30 | International Business Machines Corporation | Endpoint detection by chemical reaction |
| US6194230B1 (en) | 1998-05-06 | 2001-02-27 | International Business Machines Corporation | Endpoint detection by chemical reaction and light scattering |
| US6228769B1 (en) | 1998-05-06 | 2001-05-08 | International Business Machines Corporation | Endpoint detection by chemical reaction and photoionization |
| US6228280B1 (en) | 1998-05-06 | 2001-05-08 | International Business Machines Corporation | Endpoint detection by chemical reaction and reagent |
| US6251784B1 (en) | 1998-12-08 | 2001-06-26 | International Business Machines Corporation | Real-time control of chemical-mechanical polishing processing by monitoring ionization current |
| CN108613953A (en) * | 2018-04-23 | 2018-10-02 | 杭州凯基科技有限公司 | Sample crystal grain detecting system and method |
-
1990
- 1990-03-28 JP JP7681590A patent/JP2911533B2/en not_active Expired - Fee Related
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6066564A (en) * | 1998-05-06 | 2000-05-23 | International Business Machines Corporation | Indirect endpoint detection by chemical reaction |
| US6126848A (en) * | 1998-05-06 | 2000-10-03 | International Business Machines Corporation | Indirect endpoint detection by chemical reaction and chemiluminescence |
| US6180422B1 (en) | 1998-05-06 | 2001-01-30 | International Business Machines Corporation | Endpoint detection by chemical reaction |
| US6194230B1 (en) | 1998-05-06 | 2001-02-27 | International Business Machines Corporation | Endpoint detection by chemical reaction and light scattering |
| US6228769B1 (en) | 1998-05-06 | 2001-05-08 | International Business Machines Corporation | Endpoint detection by chemical reaction and photoionization |
| US6228280B1 (en) | 1998-05-06 | 2001-05-08 | International Business Machines Corporation | Endpoint detection by chemical reaction and reagent |
| US6419785B1 (en) | 1998-05-06 | 2002-07-16 | International Business Machines Corporation | Endpoint detection by chemical reaction |
| US6440263B1 (en) | 1998-05-06 | 2002-08-27 | International Business Machines Corporation | Indirect endpoint detection by chemical reaction and chemiluminescence |
| US6251784B1 (en) | 1998-12-08 | 2001-06-26 | International Business Machines Corporation | Real-time control of chemical-mechanical polishing processing by monitoring ionization current |
| US6176765B1 (en) | 1999-02-16 | 2001-01-23 | International Business Machines Corporation | Accumulator for slurry sampling |
| CN108613953A (en) * | 2018-04-23 | 2018-10-02 | 杭州凯基科技有限公司 | Sample crystal grain detecting system and method |
| CN108613953B (en) * | 2018-04-23 | 2021-02-26 | 杭州兴浩晖生物科技有限公司 | Sample crystal particle detection system and method |
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| Publication number | Publication date |
|---|---|
| JP2911533B2 (en) | 1999-06-23 |
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