JPH0327002A - Production of optical waveguide - Google Patents
Production of optical waveguideInfo
- Publication number
- JPH0327002A JPH0327002A JP16191289A JP16191289A JPH0327002A JP H0327002 A JPH0327002 A JP H0327002A JP 16191289 A JP16191289 A JP 16191289A JP 16191289 A JP16191289 A JP 16191289A JP H0327002 A JPH0327002 A JP H0327002A
- Authority
- JP
- Japan
- Prior art keywords
- soln
- alkoxide
- thickener
- film
- optical waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 150000004703 alkoxides Chemical class 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- 239000002562 thickening agent Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 238000005245 sintering Methods 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 17
- 239000010409 thin film Substances 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims 1
- 108010025899 gelatin film Proteins 0.000 abstract description 14
- 239000010410 layer Substances 0.000 abstract description 10
- -1 Silicon alkoxide Chemical class 0.000 abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 9
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 5
- 239000010703 silicon Substances 0.000 abstract description 5
- 239000012792 core layer Substances 0.000 abstract description 4
- 239000010453 quartz Substances 0.000 abstract description 3
- 239000010936 titanium Substances 0.000 abstract description 3
- 229910052719 titanium Inorganic materials 0.000 abstract description 3
- 239000002202 Polyethylene glycol Substances 0.000 abstract description 2
- 229920001223 polyethylene glycol Polymers 0.000 abstract description 2
- 230000003301 hydrolyzing effect Effects 0.000 abstract 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 5
- 229920000620 organic polymer Polymers 0.000 description 5
- 238000000465 moulding Methods 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Optical Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、光スイッチなどに用いられる光導波路の製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an optical waveguide used in an optical switch or the like.
従来光導波路の製造方法としては、レジストとドライエ
ッチング工程を用いた方法が提案されているが、装置が
高価でプロセスが難しいという問題があった。また、電
子ビームによる直接描画法も提案されているが、これも
装置が高価でありかつ量産性に乏しかった。Conventionally, a method using a resist and a dry etching process has been proposed as a method for manufacturing an optical waveguide, but this method has the problems of expensive equipment and difficult processes. A direct writing method using an electron beam has also been proposed, but this also requires expensive equipment and is not suitable for mass production.
これに対し、近年、金属アルコキシドやその加水分解液
などの液体（ゾル）を使用したゾルゲル法と成形技術と
を組合せた簡易な方法が試みられている（特開昭６３−
２５０６１０号公報）。In response to this, in recent years, a simple method has been attempted that combines a sol-gel method using liquids (sols) such as metal alkoxides and their hydrolyzed liquids with molding technology (Japanese Unexamined Patent Application Publication No. 1983-1999-1).
250610).
上記ゾルゲル法と成形技術との組合せによれば、簡便性
は向上するものの、反面、ゾルの塗布によって形或する
薄膜と基板との密着性が十分でなく、そのためにパター
ンを正確に残すことが難しいという問題があった。Although the above-mentioned combination of the sol-gel method and molding technology improves simplicity, on the other hand, the adhesion between the thin film formed by applying the sol and the substrate is insufficient, and as a result, it is difficult to leave a pattern accurately. The problem was that it was difficult.
この発明は、ゾルゲル法と成形技術とを組合せて光導波
路を製造するにあたり、ゾルとして増粘剤を含む金属ア
ルコキシドの加水分解液を用いるものである。This invention uses a metal alkoxide hydrolyzate containing a thickener as a sol in manufacturing an optical waveguide by combining a sol-gel method and a molding technique.
増粘剤としては、有機高分子材料が適当であり、次の性
質を有することが望ましい。As the thickener, an organic polymeric material is suitable and preferably has the following properties.
（１）金属アルコキシドの加水分解液とともに使用する
ものであるから、アルコールに対して適当な溶解性があ
ること。(1) Since it is used together with a metal alkoxide hydrolyzate, it must have appropriate solubility in alcohol.
（２）増粘剤として用いるものであるから、それ自体が
適当な粘度を有していること。(2) Since it is used as a thickener, it must have an appropriate viscosity.
（３）熱処理によって完全に燃焼・分解すること。(3) Complete combustion and decomposition through heat treatment.
金属アルコキシドの加水分解液に増粘剤を加えることで
ゾルの粘度が高まり、基板に対する密着性が向上して戊
形型によるパターンが忠実に再現される。Adding a thickener to the metal alkoxide hydrolysis solution increases the viscosity of the sol, improving its adhesion to the substrate and faithfully reproducing the oval pattern.
以下、添付図面の第１図を参照してこの発明の一実施例
を説明する。なお、図面の説明において、同一要素には
同一符号を付し、重複する説明を省略する。Hereinafter, one embodiment of the present invention will be described with reference to FIG. 1 of the accompanying drawings. In addition, in the description of the drawings, the same elements are given the same reference numerals, and redundant description will be omitted.
まず、金属アルコキシドを加水分解する。ここでは、石
英系導波路を製造する場合について述べるものとして、
金属アルコキシドとしては、Ｓ１（ＯＣＲ ） ，
Ｓｉ （ＱＣ２Ｈ５）４などのケ３４
イ素アルコキシドを用いる。これに、適当量の有機高分
子材料を添加して出発溶液（ゾル）とする。First, the metal alkoxide is hydrolyzed. Here, we will discuss the case of manufacturing a silica-based waveguide.
As the metal alkoxide, S1 (OCR),
An alkoxide such as Si (QC2H5)4 is used. An appropriate amount of organic polymer material is added to this to form a starting solution (sol).
有機高分子材料としては、ポリエチレングリコール（Ｐ
ＥＧ）、グリセリン等が好ましい。ここではＰＥＧ６０
０を用いるものとする。As an organic polymer material, polyethylene glycol (P
EG), glycerin, etc. are preferred. Here PEG60
0 shall be used.
次に、石英基板１上にスピンコーティング法により上記
調製溶液を塗布し、有機高分子を含むゲル膜２を形成す
る（同図（ａ））。スピンコーティングは、回転数２，
０００ｒｐｍで２０秒間行なった。なお、スピンコーテ
ィング法の代りにディップコーティング法を用いてもよ
いし、あるいは型枠状の容器を用い、単に、溶液を直接
基板上に流し込んでもよい。Next, the prepared solution is applied onto the quartz substrate 1 by a spin coating method to form a gel film 2 containing an organic polymer (FIG. 2(a)). Spin coating is performed at a rotation speed of 2,
000 rpm for 20 seconds. Note that a dip coating method may be used instead of the spin coating method, or the solution may be simply poured directly onto the substrate using a mold-like container.
ゲル膜２は、次第にゲル化が進行して硬くなるが、未だ
可塑性を残している柔軟な状態のうちに、これにスタン
パ−３を押しあて、バターニングを行なう（同図（ｂ）
）。The gel film 2 gradually gels and becomes hard, but the stamper 3 is pressed against it while it is still flexible and buttered (see Figure 2(b)).
).
ゲル膜２が乾燥後、スタンパ−３を離型すると、スタン
パー３のパターンが正確に転写されたゲル膜からなるバ
ッファ層４が得られる（同図（Ｃ））。スタンバ−３は
、ゲル膜２に対し離型性の良いものが好ましいが、必要
に応じ、予めフッ素系等のＭ型剤を塗布しておいてもよ
い。When the stamper 3 is released from the mold after the gel film 2 is dried, a buffer layer 4 made of the gel film to which the pattern of the stamper 3 is accurately transferred is obtained (FIG. 2(C)). The stand bar 3 is preferably one that has good mold releasability with respect to the gel film 2, but if necessary, an M-type agent such as a fluorine-based agent may be applied in advance.
別に、導波路のコアを形成するためケイ素アルコキシド
とチタンアルコキシドを加水分解した溶液を調製してお
き、これをバッファ層４の溝に流し込み、乾燥させてゲ
ル膜からなるコア層５を形威した（同図（ｄ））。Separately, in order to form the core of the waveguide, a solution of hydrolyzed silicon alkoxide and titanium alkoxide was prepared, poured into the grooves of the buffer layer 4, and dried to form the core layer 5 made of a gel film. ((d) in the same figure).
次に熱処理によりゲル膜の焼結を行なう。この熱処理過
程で、添加した有機高分子は焼結・分解して除去され、
ゲル膜は一層緻密なものとなる。Next, the gel film is sintered by heat treatment. During this heat treatment process, the added organic polymer is sintered and decomposed and removed.
The gel film becomes even more dense.
熱処理は９００℃に昇温して行ない、バッファ層４およ
びコア層５を透明ガラス化させた。The heat treatment was performed by raising the temperature to 900° C., and the buffer layer 4 and the core layer 5 were made into transparent glass.
このプロセスにおいて、パターンが正確に形成されるか
否かはゲル膜の加工性に左右され、この意味で、有機高
分子の添加によるゲル膜の物性（粘性）の調製は極めて
重要な意義をもつ。In this process, whether or not a pattern is formed accurately depends on the processability of the gel film, and in this sense, adjusting the physical properties (viscosity) of the gel film by adding organic polymers is extremely important. .
以上のプロセスで得られた成形体にフフ化水素（ＨＦ）
による表面エッチングを施して端面を整えた後、前述し
た金属アルコキシドの加水分解液をスピンコーティング
してゲル膜を形或し、さらに熱処理により透明ガラス化
してクラッド層６とした。これにより、ＳＩＯ２からな
るバッファ層４、ＴＩ Ｏ２−ＳＩ Ｏ２からなるコア
層５およびＳｉＯ２からなるクラッド層６をもつ光導波
路が得られた（同図（ｅ））。Hydrogen fluoride (HF) is added to the molded product obtained through the above process.
After surface etching was performed to prepare the end faces, a gel film was formed by spin coating with the above-mentioned metal alkoxide hydrolysis solution, and the cladding layer 6 was made into transparent glass by heat treatment. As a result, an optical waveguide having a buffer layer 4 made of SIO2, a core layer 5 made of TIO2-SIO2, and a cladding layer 6 made of SiO2 was obtained (FIG. 4(e)).
以上、増粘剤を含むケイ素アルコキシドの加水分解液を
用い、成形技術と組合せて石英系導波路を形或する例に
ついて述べたが、金属アルコキシドとしては、ケイ素ア
ルコキシドの他にも、ゲルマニウムアルコキシド、チタ
ンアルコキシドなどの使用が可能である。Above, we have described an example in which a silica-based waveguide is formed by using a silicon alkoxide hydrolyzate containing a thickener and combining it with a molding technique. However, as metal alkoxides, in addition to silicon alkoxide, germanium alkoxide, Titanium alkoxide and the like can be used.
以上のように、この発明は、増粘剤を含む金属アルコキ
シドの加水分解液を利用することにより、正確なパター
ンを有する光導波路が、きわめて容易な装置で量産性良
く得られる効果を有する。As described above, the present invention has the effect that an optical waveguide having a precise pattern can be obtained with high mass productivity using a very simple device by using a metal alkoxide hydrolyzate containing a thickener.
第１図はこの発明の一実施例を示す工程斜視図である。
１・・・石英基板、２・・・ゲル膜、３・・・スタンパ
−４・・・ゲル膜からなるバツファ層。FIG. 1 is a process perspective view showing an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Quartz substrate, 2... Gel film, 3... Stamper 4... Buffer layer consisting of gel film.
Claims (1)
に可塑性が残っている時点で型を押しつけることにより
光導波路形状を形成する工程および焼結を行なう工程を
含む光導波路の製造方法において、上記ゾルとして増粘
剤を含む金属アルコキシドの加水分解液を用いることを
特徴とする光導波路の製造方法。In a method for manufacturing an optical waveguide, which includes a step of applying a sol onto a substrate to form a thin film, a step of forming an optical waveguide shape by pressing a mold while the thin film still has plasticity, and a step of performing sintering. . A method for manufacturing an optical waveguide, characterized in that a hydrolyzed solution of a metal alkoxide containing a thickener is used as the sol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16191289A JPH0327002A (en) | 1989-06-23 | 1989-06-23 | Production of optical waveguide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16191289A JPH0327002A (en) | 1989-06-23 | 1989-06-23 | Production of optical waveguide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0327002A true JPH0327002A (en) | 1991-02-05 |
Family
ID=15744384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16191289A Pending JPH0327002A (en) | 1989-06-23 | 1989-06-23 | Production of optical waveguide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0327002A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0608566A2 (en) * | 1992-12-28 | 1994-08-03 | Matsushita Electric Industrial Co., Ltd. | Opitcal component mounting substrate and method of producing the same |
| JP2006011211A (en) * | 2004-06-29 | 2006-01-12 | Fuji Xerox Co Ltd | Manufacturing method of polymer optical waveguide, mold used therefor, and manufacturing method thereof |
| JP2014003276A (en) * | 2012-04-02 | 2014-01-09 | Tokuyama Corp | Composition for photocurable nanoimprint and patterning method |
| JP2014003284A (en) * | 2012-05-25 | 2014-01-09 | Tokuyama Corp | Composition for photocurable nanoimprint and patterning method |
| JP2015012100A (en) * | 2013-06-28 | 2015-01-19 | 株式会社トクヤマ | Photocurable composition for nanoimprint, and method for pattern formation |
-
1989
- 1989-06-23 JP JP16191289A patent/JPH0327002A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0608566A2 (en) * | 1992-12-28 | 1994-08-03 | Matsushita Electric Industrial Co., Ltd. | Opitcal component mounting substrate and method of producing the same |
| EP0608566A3 (en) * | 1992-12-28 | 1995-02-01 | Matsushita Electric Ind Co Ltd | Opitcal component mounting substrate and method of producing the same. |
| US5425118A (en) * | 1992-12-28 | 1995-06-13 | Matsushita Electric Industrial Co., Ltd. | Optical component mounting substrate and method of producing the same |
| JP2006011211A (en) * | 2004-06-29 | 2006-01-12 | Fuji Xerox Co Ltd | Manufacturing method of polymer optical waveguide, mold used therefor, and manufacturing method thereof |
| JP2014003276A (en) * | 2012-04-02 | 2014-01-09 | Tokuyama Corp | Composition for photocurable nanoimprint and patterning method |
| JP2014003284A (en) * | 2012-05-25 | 2014-01-09 | Tokuyama Corp | Composition for photocurable nanoimprint and patterning method |
| JP2015012100A (en) * | 2013-06-28 | 2015-01-19 | 株式会社トクヤマ | Photocurable composition for nanoimprint, and method for pattern formation |
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