JPH03240996A - Surface treatment - Google Patents
Surface treatmentInfo
- Publication number
- JPH03240996A JPH03240996A JP3365790A JP3365790A JPH03240996A JP H03240996 A JPH03240996 A JP H03240996A JP 3365790 A JP3365790 A JP 3365790A JP 3365790 A JP3365790 A JP 3365790A JP H03240996 A JPH03240996 A JP H03240996A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- masking
- base metal
- masking material
- anodic oxidation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004381 surface treatment Methods 0.000 title claims description 7
- 239000010409 thin film Substances 0.000 claims abstract description 39
- 230000000873 masking effect Effects 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 16
- 238000005260 corrosion Methods 0.000 claims abstract description 11
- 230000007797 corrosion Effects 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 9
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 5
- 239000000956 alloy Substances 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims abstract 3
- 150000002739 metals Chemical class 0.000 claims abstract 3
- 239000010953 base metal Substances 0.000 claims description 23
- 238000007743 anodising Methods 0.000 claims description 14
- 238000007747 plating Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 abstract description 19
- 239000003086 colorant Substances 0.000 abstract description 12
- 230000003647 oxidation Effects 0.000 abstract description 12
- 238000007254 oxidation reaction Methods 0.000 abstract description 12
- 238000007740 vapor deposition Methods 0.000 abstract description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、金属の表面を多色化する表面処理方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a surface treatment method for making the surface of metal multicolored.
ステンレスやチタンなどの基材金属の表面に陽極酸化処
理を施して薄い酸化物層を形成すると、この薄い酸化物
層における反射光の干渉によって、美しい干渉色が得ら
れるので、この干渉色を利用したカラー材が開発されて
いる。また、陽極酸化の処理条件を変化させると、異な
る干渉色が得られるので、多色化する場合は、先ず、基
材金属の表面の一部をマスキングして陽極酸化し、マス
キングを剥離する。そして他の部分を再びマスキングし
て陽極酸化し、マスキングを剥離する工程を所定数繰り
返している。つまり、基材金属の表面の所定部位ごとに
陽極酸化の処理条件を変化させて多色化するので、陽極
酸化処理を数回行う必要がある。When a thin oxide layer is formed by anodizing the surface of a base metal such as stainless steel or titanium, beautiful interference colors can be obtained by the interference of reflected light in this thin oxide layer.Utilize this interference color. Colored materials have been developed. Furthermore, different interference colors can be obtained by changing the anodic oxidation processing conditions, so when multicoloring is desired, first, a part of the surface of the base metal is masked and anodized, and then the masking is peeled off. Then, the process of masking other parts again, anodizing them, and peeling off the masking is repeated a predetermined number of times. That is, since the anodic oxidation treatment conditions are changed for each predetermined portion of the surface of the base metal to produce multiple colors, it is necessary to perform the anodic oxidation treatment several times.
ところで、陽極酸化処理で得られる干渉色は、基材金属
の結晶相、結晶方位1粒界、酸化物、表面の汚れなどが
影響して微妙に変化するので、干渉色にバラツキが生じ
易く、再現性よく同一の干渉色を有する商品を大量生産
するのが困難である。By the way, the interference color obtained by anodizing treatment changes slightly due to the influence of the crystal phase of the base metal, crystal orientation 1 grain boundary, oxides, surface dirt, etc., so the interference color tends to vary. It is difficult to mass produce products that have the same interference color with good reproducibility.
このため、陽極酸化処理の前に、基材金属の表面をきれ
いに安定化させるための前処理が必要になるが、この前
処理に手間を要している。更には、ネガネフレームなど
のように加工履歴が複雑なものは1表面が酸化したり結
晶相が析出したりするので、前処理が非常に困難であり
、多色化する場合は陽極酸化処理が数回必要なためなお
さら手間を要していた。Therefore, before the anodizing treatment, pretreatment is required to cleanly stabilize the surface of the base metal, but this pretreatment requires time and effort. Furthermore, for items with a complicated processing history, such as negative frames, the surface may be oxidized or a crystalline phase may precipitate, making pretreatment extremely difficult. It was even more time-consuming because it needed to be done several times.
そこで本発明は、基材金属の表面に、陽極酸化処理が容
易で、しかも1回の陽極酸化処理でバラツキのない複数
の干渉色によって多色化できる表面処理方法を提供する
ことを目的とするものである。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a surface treatment method that allows easy anodic oxidation treatment on the surface of a base metal, and that can be multicolored with a plurality of consistent interference colors in a single anodic oxidation treatment. It is something.
本発明の表面処理方法は、耐食性の大きな基材金属の表
面に、マスキングを利用して陽極酸化可能な金属ないし
合金の1種類ないし2種類以上の薄膜が所定部位にそれ
ぞれ露出するように蒸着し、しかる後、この薄膜および
必要に応じて露出させた基材金属に陽極酸化処理を施し
て多色化することを特徴とするものである。そして、基
材金属の耐食性が小さいときは、表面に耐食性の大きな
めっきを施してから同様の処理を行う。In the surface treatment method of the present invention, a thin film of one or more types of anodizable metal or alloy is vapor-deposited on the surface of a highly corrosion-resistant base metal using masking so that each is exposed at a predetermined location. Thereafter, this thin film and, if necessary, the exposed base metal are subjected to anodizing treatment to make them multicolored. When the corrosion resistance of the base metal is low, the same treatment is performed after plating the surface with high corrosion resistance.
すなわち、基材金属の表面に陽極酸化可能な金属ないし
合金を蒸着して1種類ないし2種類以上の薄膜を形威し
、それぞれの部位から異なった薄膜を露出(必要に応じ
て露出させた基材金属を含む、)させるので、−度陽極
酸化処理すると、各薄膜および必要に応じて露出させた
基材金属が酸化され、独自の干渉色を有するので多色化
できる。In other words, a metal or alloy that can be anodized is deposited on the surface of a base metal to form one or more types of thin films, and different thin films are exposed from each part (the exposed base is changed as necessary). Since the material contains metal (), when the material is anodized, each thin film and, if necessary, the exposed base metal are oxidized and have unique interference colors, so it can be multicolored.
また、薄膜をイオンブレーティング法などで蒸着してか
らこの薄膜に陽極酸化処理を施すが、イオンブレーティ
ング法などの蒸着は高真空中で行われるので、純度が高
くて表面が極めて美しく、陽極酸化処理を安定的に行う
ための前処理が不要であり、かつバラツキのない干渉色
を容易に得ることができる。もっとも、基材金属ないし
めっき層を露出させて陽極酸化処理を施すときは、この
前処理が必要であるが、面積が小さく、かつ−度の前処
理でよいので、従来よりも簡単である。In addition, a thin film is deposited using ion-blating methods, etc., and then anodized. However, since evaporation using ion-blating methods is performed in a high vacuum, the purity is high and the surface is extremely beautiful. Pretreatment for stably performing oxidation treatment is not necessary, and interference colors without variation can be easily obtained. However, this pretreatment is necessary when exposing the base metal or plating layer to perform the anodizing treatment, but it is simpler than the conventional method because the area is small and only one degree of pretreatment is required.
以下の実施例に基いて本発明を具体的に説明する。 The present invention will be specifically explained based on the following examples.
(1)基材金属
ステンレス製メガネフレームを使用した6メガネフレー
ムに限らず、筆記具のパーツやゴルフクラブなどの身近
な商品を始め、あらゆる商品を使用できる。そして、第
1図において模式的に示すように、SUSである基材金
属1表面のA、B。(1) It is not limited to 6 glasses frames that use glasses frames made of metal stainless steel as a base material, and can be used with all kinds of products, including familiar products such as parts of writing implements and golf clubs. As schematically shown in FIG. 1, A and B on the surface of the base metal 1 made of SUS.
Cの領域を色分けする例を説明する。An example of color-coding the area C will be explained.
(2)蒸 着
先ず、第1図(イ)に示すように、基材金属1表面の領
域A、Bをマスキング材21で覆う、そして、アーク放
電型イオンブレーティング装置を使用し、下記の条件で
Tiの薄膜を蒸着した。(2) Vapor deposition First, as shown in FIG. 1(a), areas A and B on the surface of the base metal 1 are covered with a masking material 21, and then an arc discharge type ion blating device is used to perform the following steps. A thin film of Ti was deposited under these conditions.
基板電圧 100V
イオン化電流 70A
イオン化電圧 40V
真空度 5 X 10−’ Torr基板温度
250℃
処理時間 45■in。Substrate voltage 100V Ionization current 70A Ionization voltage 40V Vacuum degree 5 X 10-' Torr Substrate temperature
250℃ Processing time 45inch.
この結果、第1回(ロ)に示すように、領域Cに厚さが
約1μ■のTi薄膜3が形成される。蒸着法は、イオン
ブレーティング以外にも、真空蒸着法、スパッタリング
法、レーザ物理蒸着法などのPVD法を採用することが
できる。As a result, as shown in the first step (b), a Ti thin film 3 having a thickness of about 1 μm is formed in region C. As the vapor deposition method, in addition to ion blating, PVD methods such as a vacuum vapor deposition method, a sputtering method, and a laser physical vapor deposition method can be employed.
次に、マスキング材21を剥離し、第1図(ハ)に示す
ように、領域B、Cをマスキング材22で覆う、そして
、下記の条件でT1CNの薄膜を蒸着した。Next, the masking material 21 was peeled off, and as shown in FIG. 1(C), regions B and C were covered with a masking material 22, and a thin film of T1CN was deposited under the following conditions.
基板電圧−100V
イオン化電流 70A
イオン化電圧 40V
N、: C,H,=2 : 1
真空度 4X10″″4Torr基板温度
250℃
処理時間 45m1n。Substrate voltage -100V Ionization current 70A Ionization voltage 40V N,:C,H,=2:1 Vacuum degree 4X10''4Torr Substrate temperature
250°C Processing time 45m1n.
この結果領域Aに厚さが約1μmのT1CN薄膜4が形
成される。As a result, a T1CN thin film 4 having a thickness of approximately 1 μm is formed in region A.
次に、マスキング材22を剥離し、第1図(ニ)に示す
ように、領域A、Cをマスキング材23で覆う、そして
、下記の条件でZrの薄膜を蒸着した。Next, the masking material 22 was peeled off, and as shown in FIG. 1(d), regions A and C were covered with a masking material 23, and a thin film of Zr was deposited under the following conditions.
基板電圧 200V
イオン化電流 40A
イオン化電圧 50V
真空度 5 X 10−′Torr基板温度
300℃
処理時間 60m1n。Substrate voltage 200V Ionization current 40A Ionization voltage 50V Vacuum degree 5 X 10-'Torr Substrate temperature
300℃ processing time 60mln.
この結果領域Bに厚さが約1μmのZr薄膜5が形成さ
れる。つまり、マスキング材23を剥離すると、第1図
(ホ)に示すように、SUSからなる基材金属1表面の
領域A、B、CにT1CN薄膜4、Zr薄膜5、Ti@
膜3がそれぞれ形成される。なお、各薄膜を多層に形成
してそれぞれの薄膜が所定部位で露出するようにしても
よい。As a result, a Zr thin film 5 having a thickness of approximately 1 μm is formed in region B. That is, when the masking material 23 is peeled off, as shown in FIG.
A membrane 3 is formed respectively. Note that each thin film may be formed in multiple layers so that each thin film is exposed at a predetermined portion.
(3)陽極酸化処理
かかる薄膜が形成されたメガネフレームに、安定化する
ための前処理を行うことなく、リン酸浴(25g/12
)中で陽極酸化処理を施した。そして、印加電圧を10
0Vにすると、Ti薄膜3が赤紫色、T i CN薄膜
4が濃い灰色、Zrl膜5が赤色に発色する。つまり、
−度の陽極酸化処理で多色化できる。また、印加電圧を
200Vにすると、Ti薄膜3が薄縁色、T i CN
薄膜4が濃い青色、Zr薄膜5が青紫色に発色し、陽極
酸化の処理条件を変えることによっても色の組み合わせ
を変えることもできる。(3) Anodic oxidation treatment The glasses frames on which such a thin film was formed were treated in a phosphoric acid bath (25 g/12
) was subjected to anodizing treatment. Then, the applied voltage was increased to 10
When the voltage is set to 0V, the Ti thin film 3 develops a reddish-purple color, the T i CN thin film 4 develops a dark gray color, and the Zrl film 5 develops a red color. In other words,
Can be multi-colored by -degree anodizing treatment. Moreover, when the applied voltage is 200V, the Ti thin film 3 has a thin edge color and T i CN
The thin film 4 develops a deep blue color, and the Zr thin film 5 develops a bluish-purple color, and the color combination can also be changed by changing the anodic oxidation treatment conditions.
かかる薄膜は、純度が高くて表面が極めて美しいので、
バラツキのない干渉色を容易に得ることができる。Such thin films have high purity and extremely beautiful surfaces, so
Interference colors without variation can be easily obtained.
以上の実施例は、蒸着された薄膜のみに陽極酸化処理を
施したが、基材金属のSUSが耐食性が大きくて陽極酸
化処理に耐えるので、SUSも露出させて陽極酸化処理
することもできる。なお、蒸着される薄膜が1種類のと
きは、この薄膜と露出した基材金属のSUSがそれぞれ
発色して2色になる。In the above examples, only the deposited thin film was anodized, but since the base metal SUS has high corrosion resistance and can withstand anodizing, SUS can also be exposed and anodized. Note that when only one type of thin film is deposited, this thin film and the exposed base metal SUS each develop colors into two colors.
また、基材金属の耐食性が小さい場合は、例えばNiめ
っきのように耐食性の大きなめっきを施し、蒸着された
薄膜が薄くても、基材金属がめつき層で防御されて陽極
酸化処理に耐えるようにする。更には、めっき層も露出
させて陽極酸化処理することもできる。In addition, if the corrosion resistance of the base metal is low, plating with high corrosion resistance such as Ni plating may be applied, so that even if the deposited thin film is thin, the base metal will be protected by the plating layer and will withstand anodizing. Make it. Furthermore, the plating layer can also be exposed and anodized.
以上説明したように、本発明の表面処理方法は。 As explained above, the surface treatment method of the present invention is as follows.
基材金属の表面に1種類ないし2種類以上の薄膜を蒸着
し、それぞれの薄膜を所定部位に露出させて陽極酸化処
理するようにしたので、陽極酸化処理が容易で、しかも
1回の陽極酸化処理でバラツキのない複数の干渉色によ
って多色化できる利点がある。One or more types of thin films are deposited on the surface of the base metal, and each thin film is exposed at a predetermined location for anodizing, making the anodizing process easy and requiring only one anodic oxidation process. It has the advantage of being able to produce multiple colors by using multiple interference colors with no variation in processing.
第1図(イ〉〜(ホ)は工程の説明図である。
1・・・基材金属(SUS) 3・・・Ti薄膜4・
・・T i CN薄膜 5・・・Zr薄膜21.2
2.23・・・マスキング材Fig. 1 (A) to (E) are explanatory diagrams of the steps. 1... Base metal (SUS) 3... Ti thin film 4.
...T i CN thin film 5...Zr thin film 21.2
2.23...Masking material
Claims (1)
用して陽極酸化可能な金属ないし合金の1種類ないし2
種類以上の薄膜が所定部位にそれぞれ露出するように蒸
着し、しかる後、該薄膜および必要に応じて露出させた
基材金属に陽極酸化処理を施して多色化することを特徴
とする表面処理方法。 2)耐食性の小さな基材金属の表面に耐食性の大きなめ
っきを施し、このめっき層の表面にマスキングを利用し
て陽極酸化可能な金属ないし合金の1種類ないし2種類
以上の薄膜が所定部位にそれぞれ露出するように蒸着し
、しかる後、該薄膜および必要に応じて露出させためっ
き層に陽極酸化処理を施して多色化することを特徴とす
る表面処理方法。[Claims] 1) One or two metals or alloys that can be anodized using masking on the surface of a base metal with high corrosion resistance.
A surface treatment characterized by depositing more than one type of thin film so that it is exposed at a predetermined location, and then anodizing the thin film and, if necessary, the exposed base metal to make it multicolored. Method. 2) Plating with high corrosion resistance is applied to the surface of the base metal with low corrosion resistance, and by masking the surface of this plating layer, a thin film of one or more types of metals or alloys that can be anodized is applied to each predetermined location. 1. A surface treatment method characterized by depositing the thin film so that it is exposed, and then subjecting the thin film and, if necessary, the exposed plating layer to anodizing treatment to make the thin film multicolored.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3365790A JPH03240996A (en) | 1990-02-16 | 1990-02-16 | Surface treatment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3365790A JPH03240996A (en) | 1990-02-16 | 1990-02-16 | Surface treatment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03240996A true JPH03240996A (en) | 1991-10-28 |
Family
ID=12392520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3365790A Pending JPH03240996A (en) | 1990-02-16 | 1990-02-16 | Surface treatment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03240996A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100439766B1 (en) * | 2001-02-28 | 2004-07-12 | 주식회사 범일 | Color titanium-zirconium alloy and method for manufacturing the same |
JP2015063067A (en) * | 2013-09-25 | 2015-04-09 | 三菱鉛筆株式会社 | Ink refill and writing instrument |
-
1990
- 1990-02-16 JP JP3365790A patent/JPH03240996A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100439766B1 (en) * | 2001-02-28 | 2004-07-12 | 주식회사 범일 | Color titanium-zirconium alloy and method for manufacturing the same |
JP2015063067A (en) * | 2013-09-25 | 2015-04-09 | 三菱鉛筆株式会社 | Ink refill and writing instrument |
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