JPH03230946A - Laminated film - Google Patents
Laminated filmInfo
- Publication number
- JPH03230946A JPH03230946A JP2025277A JP2527790A JPH03230946A JP H03230946 A JPH03230946 A JP H03230946A JP 2025277 A JP2025277 A JP 2025277A JP 2527790 A JP2527790 A JP 2527790A JP H03230946 A JPH03230946 A JP H03230946A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- layer
- film
- film layer
- metallic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010408 film Substances 0.000 claims abstract description 43
- 239000010410 layer Substances 0.000 claims abstract description 31
- 239000010409 thin film Substances 0.000 claims abstract description 31
- 229920006254 polymer film Polymers 0.000 claims abstract description 20
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 8
- 229920005989 resin Polymers 0.000 claims abstract description 8
- 238000002834 transmittance Methods 0.000 claims abstract description 8
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 7
- 239000011247 coating layer Substances 0.000 claims abstract description 7
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 150000004706 metal oxides Chemical class 0.000 claims description 9
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 7
- -1 polyethylene terephthalate Polymers 0.000 abstract description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract description 5
- 239000005020 polyethylene terephthalate Substances 0.000 abstract description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract description 4
- 229910001887 tin oxide Inorganic materials 0.000 abstract description 4
- 229910000881 Cu alloy Inorganic materials 0.000 abstract description 2
- 239000004593 Epoxy Substances 0.000 abstract description 2
- NEIHULKJZQTQKJ-UHFFFAOYSA-N [Cu].[Ag] Chemical compound [Cu].[Ag] NEIHULKJZQTQKJ-UHFFFAOYSA-N 0.000 abstract description 2
- 239000002648 laminated material Substances 0.000 abstract 2
- 230000001105 regulatory effect Effects 0.000 abstract 2
- ODIGIKRIUKFKHP-UHFFFAOYSA-N (n-propan-2-yloxycarbonylanilino) acetate Chemical compound CC(C)OC(=O)N(OC(C)=O)C1=CC=CC=C1 ODIGIKRIUKFKHP-UHFFFAOYSA-N 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 239000010931 gold Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004695 Polyether sulfone Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229920006393 polyether sulfone Polymers 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229920006125 amorphous polymer Polymers 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- WPUJEWVVTKLMQI-UHFFFAOYSA-N benzene;ethoxyethane Chemical compound CCOCC.C1=CC=CC=C1 WPUJEWVVTKLMQI-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野〕
透明導電性フィルムは液晶用、−啄パネル用透明電極と
して利用されている６本発明は、透明性・導電性・耐久
性に優れた透明導電性積層フィルムに関するものである
。[Detailed Description of the Invention] (Industrial Application Field) Transparent conductive films are used as transparent electrodes for liquid crystals and panels. This invention relates to a conductive laminated film.
（従来の技術〕
高分子フィルム上に形成された透明導電被膜として従来
から知られているものは
■ 金、銀、銅、パラジウム等の金属薄膜■ 酸化イン
ジウム、酸化錫、ヨウ化銅等の化合物半導体および
■ 金、銀、銅、パラジウム等の導電性金属膜を可視光
領域において透明になるよう透明導電体膜と組み合せた
積層膜が知られている。(Prior art) Conventionally known transparent conductive coatings formed on polymer films are: ■ Thin films of metals such as gold, silver, copper, and palladium ■ Compounds such as indium oxide, tin oxide, and copper iodide Semiconductors and laminated films are known in which a conductive metal film such as gold, silver, copper, palladium, etc. is combined with a transparent conductor film so as to be transparent in the visible light region.
しかしながら、液晶電極、タッチパネルに応用できる性
能を有する透明導電性膜が工業的に安価に製造されるに
至っていない。However, a transparent conductive film having performance applicable to liquid crystal electrodes and touch panels has not yet been produced industrially and at low cost.
即ち、上記■の金属薄膜は、金属が広い波長領域にわた
り反射能又は吸収能が高いため、光線透過率の高めると
、膜が薄くなり、導電性、耐久性の高いものが得られ難
い。That is, in the metal thin film (2) above, since the metal has high reflective or absorbing ability over a wide wavelength range, increasing the light transmittance results in a thin film, making it difficult to obtain a film with high conductivity and durability.
上記■の化合物半導体薄膜は、例えば、真空蒸着法、ス
パンタリング法等の真空中における薄膜形成法で高分子
フィルム上に形成することができる。透明で導電性の高
い膜は通常４００°Ｃ以上の高温下では得られる。しか
し、高分子フィルムはガラス基板に比べて耐熱性がなく
高温で薄膜を形成することが不可能である。そのため導
電性を高めるため数千オングストローム積層すると高分
子フィルムのカール、薄膜の割れの問題が発生する。The compound semiconductor thin film described in (1) above can be formed on a polymer film by a thin film forming method in vacuum, such as a vacuum evaporation method or a sputtering method. Transparent and highly conductive films are usually obtained at high temperatures of 400°C or higher. However, polymer films have less heat resistance than glass substrates, making it impossible to form thin films at high temperatures. Therefore, when several thousand angstroms of layers are stacked to increase conductivity, problems occur such as curling of the polymer film and cracking of the thin film.
また被覆膜特性を均一に制御するためには膜形成速度を
遅くする必要があり生産性が悪く、製造コストが著しく
高くなる。Furthermore, in order to uniformly control the properties of the coating film, it is necessary to slow down the film formation rate, resulting in poor productivity and significantly increased manufacturing costs.
上記■の透明導電性フィルムの代表的な構成は金属膜を
高屈折率薄膜ではさんだものを高分子フィルム上に形成
させた積層フィルムが挙げられる。A typical structure of the transparent conductive film (2) above is a laminated film in which a metal film is sandwiched between high refractive index thin films and formed on a polymer film.
例えば、真空蒸着、反応性蒸着又は反応性スパッタリン
グで形成させたＢ ｉｚ ０３／Ａｕ／Ｂ １ｚ０３／
高分子フィルム、Ｚ ｎ Ｓ ／ Ａ ｇ ／ Ｚ ｎ
Ｓ ／高分子フィルム又はＴ ｉ ０２ ／Ａｇ／Ｔ
ｉ Ｏｚ ／高分子フィルム等サンドイッチ構造の積
層フィルムが提案されている。特に金属層として金、銀
を用いたものは、金、銀自身が持つ光学特性により可視
光領域における透明性が特に優れていること、導電性に
おいても好ましい特性を有していること等の点から材料
として特に優れている。For example, B iz 03/Au/B 1z03/ formed by vacuum evaporation, reactive evaporation or reactive sputtering.
Polymer film, ZnS/Ag/Zn
S/polymer film or T i 02 /Ag/T
Sandwich structure laminated films such as iOz/polymer films have been proposed. In particular, those using gold or silver as the metal layer have excellent transparency in the visible light region due to the optical properties of gold and silver themselves, and have favorable properties in terms of conductivity. It is particularly excellent as a material.
しかし、高分子フィルム上に前記のサンドインチ構造を
有する積層薄膜を直接形成するとフィルムがフレキシブ
ルなことにより割れ等の耐久性、高分子フィルムの表面
と積層薄膜との密着力の不足等の問題があった。However, when a laminated thin film having the above-mentioned sandwich inch structure is directly formed on a polymer film, problems such as durability such as cracking due to the film's flexibility and insufficient adhesion between the surface of the polymer film and the laminated thin film occur. there were.
その目的とする所は積層フィルムのそり、透明性、１導
電性、耐久性等、フィルム特有の緒特性も含めて優れた
透明導電性フィルムを提供することにある。The objective is to provide a transparent conductive film that is excellent in terms of film-specific properties such as warpage, transparency, conductivity, and durability of the laminated film.
〔課題を解決するための手段］
少なくとも片面にシランカップリング剤を含むエポキシ
アクリレート紫外線硬化樹脂のコーティング層を有する
高分子フィルム（Ａ）上に金属酸化物薄膜層（Ｂ）、金
属薄膜層（Ｃ）、金属酸化物薄膜（Ｄ）を順詩形層した
ことを特徴とする積層フィルムである。[Means for solving the problem] A metal oxide thin film layer (B) and a metal thin film layer (C ) is a laminated film characterized by having metal oxide thin films (D) layered in a regular pattern.
本発明は、従来技術における前述のような欠点のない優
れた透明性、導電性、平坦性、耐久性を存し、密着力の
強い積層体について研究した結果以下に示す構成の積層
フィルムを得るにいたった。As a result of research into a laminate with excellent transparency, conductivity, flatness, durability, and strong adhesion without the above-mentioned drawbacks of the prior art, the present invention obtains a laminate film having the following structure. It arrived.
以下、本発明の詳細について述べる。The details of the present invention will be described below.
本発明において用いられる高分子フィルムは、可撓性を
有する透明フィルムもしくはシートであり例えばポリエ
チレンテレフタレート等ポリエステル系フィルム、ポリ
サルフォンボリエーテルサルフォン等すルフォン系フィ
ルムが使用可能である。上記フィルムに塗膜を形成する
有機コーティング層の樹脂としては、高分子フィルム金
属酸化物の双方に対して密着力が必要であり、エポキシ
アクリレートプレポリマーにシランカップリング剤を添
加した時達成されることを見い出した。シランカップリ
ング剤の添加量は０．５〜１重量％が好ましい。シラン
カップリング剤としては、たとえば信越化学■のＫＭＢ
−５０３、ＫＭＢ−６０３、ＫＭＢ−８０３日本ユニカ
ー−のＡ−１８７が用いられるが、特にエポキシ基、ア
ミノ基、メルカプト基を有するものが好ましい。エポキ
シアクリレートプレポリマーは融点が５０°Ｃ以上のも
のが好ましい。The polymer film used in the present invention is a flexible transparent film or sheet, and for example, a polyester film such as polyethylene terephthalate, or a sulfone film such as polysulfone polyether sulfone can be used. The resin for the organic coating layer that forms the coating on the above film must have adhesion to both the polymer film and the metal oxide, which can be achieved by adding a silane coupling agent to the epoxy acrylate prepolymer. I discovered that. The amount of the silane coupling agent added is preferably 0.5 to 1% by weight. As a silane coupling agent, for example, Shin-Etsu Chemical's KMB
-503, KMB-603, KMB-803 Nippon Unicar's A-187 are used, and those having an epoxy group, an amino group, or a mercapto group are particularly preferred. The epoxy acrylate prepolymer preferably has a melting point of 50°C or higher.
本発明の積層フィルムは前記有機コーティング上に前記
のごとく、金属酸化物薄膜層、金属薄膜層、金属酸化物
薄膜層を順時積層したものであるが、かかる金属薄膜層
は、金、銀、銅およびプラチナのうちの複数の混合物あ
るいは単体からなることが望ましい。金属薄膜の膜厚は
、透明導電性としての要求特性をもてば別に限定される
ものでないが、導電性を持つためには、少なくともある
程度の領域で連続性を持つことが必要である。島状構造
より、連続構造に移る膜厚として５０Å以上又、透明性
の点から５００Å以下が好ましい。The laminated film of the present invention has a metal oxide thin film layer, a metal thin film layer, and a metal oxide thin film layer sequentially laminated on the organic coating as described above. Preferably, it is made of a mixture or a single substance of copper and platinum. The thickness of the metal thin film is not particularly limited as long as it has the required characteristics for transparent conductivity, but in order to have conductivity, it is necessary to have continuity in at least a certain area. The thickness at which the film changes from an island structure to a continuous structure is preferably 50 Å or more, and 500 Å or less from the viewpoint of transparency.
金属酸化物層を構成するものとしては、透明高屈折率、
低比抵抗のものであれば特に限定されるものでないが、
屈折率は可視光に対して１．６以上好ましくは１．７以
上の屈折率を有し、シート抵抗値が３００Ω以下、光線
透過率８０％以上、好ましくは９０％以上であるのが効
果的である。これらの条件を満たすものとしては、イン
ジウム・錫合金の酸化物、酸化錫が上げられる。The metal oxide layer is made of transparent high refractive index,
It is not particularly limited as long as it has low resistivity, but
It is effective to have a refractive index of 1.6 or more, preferably 1.7 or more for visible light, a sheet resistance value of 300Ω or less, and a light transmittance of 80% or more, preferably 90% or more. It is. Examples of materials that satisfy these conditions include indium-tin alloy oxides and tin oxide.
本発明は金属層として銀銅合金の薄膜層を用いその両側
を酸化錫薄膜で覆った積層物をエポキシアクリレ−Ｉ・
プレポリマーを塗布樹脂としコーティングしたポリエチ
レンテレフタレート上に設けた積層フィルムとして使用
される。The present invention uses a thin film layer of silver-copper alloy as a metal layer and covers both sides with a thin film of tin oxide.
It is used as a laminated film on polyethylene terephthalate coated with a prepolymer as the coating resin.
即ち、ポリエチレンテレフタレートフィルム等の高分子
フィルムは酸化金属薄膜との密着力が低（それに起因し
て、積層フィルムの耐久性が乏しいという欠点があった
が、高分子フィルム、酸化金属の双方に密着力の優れた
有機コーティングを施すことにより面］久性を上げるこ
とができた。In other words, polymer films such as polyethylene terephthalate film have low adhesion to metal oxide thin films (due to this, the laminated film had the disadvantage of poor durability), but By applying a strong organic coating, we were able to increase the durability of the surface.
本発明による積層フィルムを液晶等に用いる場合には、
フィルム側からの空気の透過を防がなければならない。When the laminated film according to the present invention is used for liquid crystal etc.,
Air permeation from the film side must be prevented.
空気が透過した場合は液晶内に気泡が生し外観上致命的
な障害となる。If air passes through the liquid crystal, bubbles will form inside the liquid crystal, causing a fatal problem in appearance.
光学特性上、液晶用途には、無定形液高分子であるポリ
エーテルサルフォンが適している。しかし、無定形高分
子フィルムは一般的に空気の透過率が大きく、液晶劣化
の防止をすることは困難である。よってこの様な場合ガ
スバリヤ−性、耐熱性、耐塩酸性、ポリエーテルサルフ
ォンに対して強固な密着力を有する有機コーティング層
を有するポリサルフォンフィルムを用いることができる
。Due to its optical properties, polyether sulfone, which is an amorphous liquid polymer, is suitable for liquid crystal applications. However, amorphous polymer films generally have high air permeability, making it difficult to prevent liquid crystal deterioration. Therefore, in such cases, a polysulfone film having an organic coating layer having gas barrier properties, heat resistance, hydrochloric acid resistance, and strong adhesion to polyethersulfone can be used.
有機コーティング層としては例えばポリサルフメン上に
ウレタンｆｄ１層、ポリビニルアルコール樹脂層、エポ
キシ系熱硬化樹脂層を順時積層したものが上げられる。The organic coating layer may be, for example, one in which a urethane fd layer, a polyvinyl alcohol resin layer, and an epoxy thermosetting resin layer are sequentially laminated on polysulfmen.
尚、特に指定していなければ光線透過率は波長６００
（ｒ＋ｍ）の値を示している。In addition, unless otherwise specified, the light transmittance is at wavelength 600.
The value of (r+m) is shown.
（実施例］
高分子フィルムに光線透過率８６％厚さ７５（μｍ）の
二軸延伸ポリエチレンテレフタレートフィルムを用い、
その上に第１層として、分子量約１０４０、融点５５°
Ｃのエポキシアクリレートプレポリマー（昭和高分子株
式会社製ＵＲ−９０）１００重量部、ジエチレングリコ
ール２００重量部、酢酸エチル１００重量部、ベンゼン
エチルエーテル２重量部、シランカップリング剤１重量
部を５０°Ｃにて撹はん溶解して均一な溶液をデイツプ
法により両面塗布し８０°ＣＩＯ分加熱して紫外線を照
射して有機コーティング層を形成した後、第２層として
リアクテブマグネトロンスバソタリング法により厚さ３
００人のＩＴＯ膜を形成、第３層としてＡｇをスパッタ
法により厚さ１５０人形成し、第４層としてＩＴＯ膜を
厚さ３００人第２層と同様にリアクテブスバッタ法で形
成して積層フィルムを得た。(Example) Using a biaxially stretched polyethylene terephthalate film with a light transmittance of 86% and a thickness of 75 (μm) as the polymer film,
On top of that, as a first layer, the molecular weight is about 1040, the melting point is 55°
100 parts by weight of epoxy acrylate prepolymer C (UR-90 manufactured by Showa Kobunshi Co., Ltd.), 200 parts by weight of diethylene glycol, 100 parts by weight of ethyl acetate, 2 parts by weight of benzene ethyl ether, and 1 part by weight of a silane coupling agent at 50°C. After stirring and dissolving the solution, a uniform solution was coated on both sides using the dip method, heated for 80°CIO minutes, and irradiated with ultraviolet rays to form an organic coating layer.Then, the second layer was coated using the reactive magnetron bathotering method. thickness 3
An ITO film with a thickness of 150 mm was formed as the third layer by the sputtering method, and an ITO film with a thickness of 300 mm was formed as the fourth layer by the reactive sputtering method in the same manner as the second layer. A laminated film was obtained.
この積層フィルムの光線透過率は７２％シート抵抗値２
０Ω／口であった。直径１５φの柱状物に導電層が外側
になるようにこの積層フィルムを巻きつけ、巻きだす動
作を５０回繰り返し、シート抵抗値の変化、クラック発
生の有無を調べた。その結果、シート抵抗値の変化は１
．３倍以内、クラックの発生は、認められなかった。The light transmittance of this laminated film is 72%, and the sheet resistance value is 2.
It was 0Ω/mouth. This laminated film was wound around a columnar object with a diameter of 15φ so that the conductive layer was on the outside, and the unwinding operation was repeated 50 times to examine changes in sheet resistance and presence or absence of cracks. As a result, the change in sheet resistance value is 1
．． No cracks were observed within 3 times.
〔比較例］
有機コーティングをしていない以外は実施例と同様な積
層フィルムについて同じく１５φの柱状物に導電層が外
側になるように巻き付け、巻き出し動作を行った後のシ
ート抵抗値の変化は２倍以上であり、目視でクラックが
発生しているのが認められた。[Comparative example] A laminated film similar to that of the example except that no organic coating was applied was wound around a 15φ pillar with the conductive layer facing outward, and the change in sheet resistance after unwinding was as follows: It was more than twice as large, and cracks were visually observed.
本発明の透明導電性を有する積層フィルムは層間の密着
力が強く、
透明性、
導電性良好でかつ耐久
性のすくれたものである。The transparent conductive laminated film of the present invention has strong interlayer adhesion, good transparency and conductivity, and excellent durability.
Claims (1)
ポキシアクリレート紫外線硬化樹脂のコーティング層を
有する高分子フィルム上に金属酸化物薄膜層、金属薄膜
層、金属酸化物薄膜層を順次積層したシート抵抗値５０
Ω以下、光線透過率７０％以上であることを特徴とする
積層フィルム。(1) A sheet resistance value of 50 in which a metal oxide thin film layer, a metal thin film layer, and a metal oxide thin film layer are sequentially laminated on a polymer film having a coating layer of an epoxy acrylate ultraviolet curing resin containing a silane coupling agent on at least one side.
A laminated film characterized by having a light transmittance of Ω or less and a light transmittance of 70% or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025277A JPH03230946A (en) | 1990-02-06 | 1990-02-06 | Laminated film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025277A JPH03230946A (en) | 1990-02-06 | 1990-02-06 | Laminated film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03230946A true JPH03230946A (en) | 1991-10-14 |
Family
ID=12161528
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025277A Pending JPH03230946A (en) | 1990-02-06 | 1990-02-06 | Laminated film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03230946A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06116425A (en) * | 1992-10-09 | 1994-04-26 | Sumitomo Bakelite Co Ltd | Production of transparent conductive film |
| JPH0740498A (en) * | 1993-07-29 | 1995-02-10 | Sumitomo Bakelite Co Ltd | Manufacture of transparent conductive film |
| JPH11138685A (en) * | 1997-11-14 | 1999-05-25 | Fujimori Kogyo Kk | Manufacture of transparent conductive sheet |
| JP2006216266A (en) * | 2005-02-01 | 2006-08-17 | Kitagawa Ind Co Ltd | Transparent conductive film |
| WO2015141068A1 (en) * | 2014-03-17 | 2015-09-24 | コニカミノルタ株式会社 | Touch panel |
-
1990
- 1990-02-06 JP JP2025277A patent/JPH03230946A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06116425A (en) * | 1992-10-09 | 1994-04-26 | Sumitomo Bakelite Co Ltd | Production of transparent conductive film |
| JPH0740498A (en) * | 1993-07-29 | 1995-02-10 | Sumitomo Bakelite Co Ltd | Manufacture of transparent conductive film |
| JPH11138685A (en) * | 1997-11-14 | 1999-05-25 | Fujimori Kogyo Kk | Manufacture of transparent conductive sheet |
| JP2006216266A (en) * | 2005-02-01 | 2006-08-17 | Kitagawa Ind Co Ltd | Transparent conductive film |
| WO2015141068A1 (en) * | 2014-03-17 | 2015-09-24 | コニカミノルタ株式会社 | Touch panel |
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