JPH03223191A - Surface-treatment of ceramics - Google Patents
Surface-treatment of ceramicsInfo
- Publication number
- JPH03223191A JPH03223191A JP1727790A JP1727790A JPH03223191A JP H03223191 A JPH03223191 A JP H03223191A JP 1727790 A JP1727790 A JP 1727790A JP 1727790 A JP1727790 A JP 1727790A JP H03223191 A JPH03223191 A JP H03223191A
- Authority
- JP
- Japan
- Prior art keywords
- sic
- heat
- heating element
- layer
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 33
- 238000004381 surface treatment Methods 0.000 title claims description 12
- 238000002844 melting Methods 0.000 claims abstract description 17
- 230000008018 melting Effects 0.000 claims abstract description 16
- 239000002131 composite material Substances 0.000 claims abstract description 14
- 239000011248 coating agent Substances 0.000 claims abstract description 11
- 238000000576 coating method Methods 0.000 claims abstract description 11
- 238000010438 heat treatment Methods 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 16
- 229910007948 ZrB2 Inorganic materials 0.000 abstract description 12
- VWZIXVXBCBBRGP-UHFFFAOYSA-N boron;zirconium Chemical compound B#[Zr]#B VWZIXVXBCBBRGP-UHFFFAOYSA-N 0.000 abstract description 12
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract description 10
- 230000003647 oxidation Effects 0.000 abstract description 9
- 238000007254 oxidation reaction Methods 0.000 abstract description 9
- 229910052799 carbon Inorganic materials 0.000 abstract description 8
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 abstract description 8
- 238000009413 insulation Methods 0.000 abstract description 8
- 229910052863 mullite Inorganic materials 0.000 abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract 1
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 29
- 238000010586 diagram Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000005388 borosilicate glass Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910018540 Si C Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 238000007605 air drying Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Ceramic Products (AREA)
- Spark Plugs (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明はセラミックスの表面処理方法に係り、特にセラ
ミックスの表面に耐熱温度の高い絶縁被膜を形成するの
に好適な表面処理方法に関するものである。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a surface treatment method for ceramics, and particularly to a surface treatment method suitable for forming an insulating coating with a high heat resistance on the surface of ceramics. .
従来、バーナ点火装置の点火源として、電極間に生ずる
火花放電を利用したパルスイグナイタが用いられている
が、点火領域が狭（、プラグ先端部の耐熱温度が７００
℃と低いため寿命が短い等の欠点があった。Conventionally, pulse igniters that utilize spark discharge generated between electrodes have been used as the ignition source for burner ignition devices, but the ignition range is narrow (and the heat resistant temperature of the plug tip is 700°C).
It had shortcomings such as a short lifespan due to the low temperature.
最近、パルスイグナイタに代わるものとして、ＳｉＣと
ＺｒＢ、とからなる複合セラミックスを応用したセラミ
ックスイグナイタが開発されている。該セラミックスイ
グナイタはパルスイグナイタに比較して着火領域が広く
、発熱体の耐熱温度が高く、寿命が長いという特長があ
る。Recently, as an alternative to pulse igniters, ceramic igniters using composite ceramics made of SiC and ZrB have been developed. The ceramic igniter has the advantage of having a wider ignition range, a higher temperature resistance of the heating element, and a longer life than a pulse igniter.
第４図は、従来のセラミックスイグナイタ発熱体の構造
図である。図においてＳｉＣ／ＺｒＢ。FIG. 4 is a structural diagram of a conventional ceramic igniter heating element. In the figure, SiC/ZrB.
導電部ｌは、発熱体中央部の長手方向に形成したＡｌＮ
（窒化アルミニウム）絶縁部２で分離されてコ字状を
なし、それぞれの末端は電極板４と接続されている。該
導電部１に電極板４を介して電流を印加すると、発熱体
先端の薄肉にした発熱部３が赤熱する。発熱部の温度制
御は、ＳｉＣ／ＺｒＢ、複合セラミックスが正の抵抗温
度係数を有しているため、該抵抗値を一定とする方法で
行われる。しかしながら、ＳｉＣ／ＺｒＢ、発熱体が大
気に露出しているため高温酸化が起こり、抵抗値が経時
的に増加して発熱温度が低下するという現象を生じる。The conductive part 1 is made of AlN formed in the longitudinal direction of the central part of the heating element.
(Aluminum nitride) They are separated by an insulating part 2 to form a U-shape, and each end is connected to an electrode plate 4. When a current is applied to the conductive portion 1 through the electrode plate 4, the thin heat generating portion 3 at the tip of the heating element becomes red hot. Since SiC/ZrB and composite ceramics have a positive temperature coefficient of resistance, temperature control of the heat generating part is performed by a method that keeps the resistance value constant. However, since the SiC/ZrB heating element is exposed to the atmosphere, high-temperature oxidation occurs, resulting in a phenomenon in which the resistance value increases over time and the heat generation temperature decreases.
また燃料が熱分解して高結晶化したカーボンが発熱体に
付着すると、短絡により発熱体の抵抗値が減少し、焼損
につながるという問題があった。Furthermore, when the fuel is thermally decomposed and highly crystallized carbon adheres to the heating element, there is a problem in that the resistance value of the heating element decreases due to short circuiting, leading to burnout.
〔発明が解決しようとする課題］
上記問題の解決策としてＳｉＣ／ＺｒＢ、発熱体をあら
かじめ１１００〜１２００℃の大気中で熱処理し、Ｓｉ
Ｃ／ＺｒＢ２導電部１の表面層にＳ ｉＣ／Ｓ ｉｏｚ
／ＺｒＢｚ ／Ｚｒ０ｚの酸化層およびはう珪酸ガラ
ス層を形成する方法が考えられる。第５図には、第４図
の発熱体を１１００〜１２００℃の大気中で熱処理した
場合のＢ−Ｂ線断面図を示した。この方法で得られる発
熱体は酸化速度が抑制されるため寿命が約２倍向上する
。[Problems to be Solved by the Invention] As a solution to the above problem, the SiC/ZrB heating element is heat-treated in advance at 1100 to 1200°C in the atmosphere, and Si
SiC/S ioz on the surface layer of the C/ZrB2 conductive part 1
A method of forming an oxide layer of /ZrBz /Zr0z and a borosilicate glass layer is considered. FIG. 5 shows a sectional view taken along the line B-B when the heating element shown in FIG. 4 is heat-treated in the atmosphere at 1100 to 1200°C. The heating element obtained by this method has a service life approximately doubled because the oxidation rate is suppressed.
しかし、外表面に形成されるほう珪酸ガラス層８は７０
０℃から軟化して１２００℃では溶融状態となるため、
点火の際の軽油噴霧等で除去され易く、第６図に示すよ
うにＳ ｉｃ／Ｓ ｉｏ、／ＺｒＢ２／ＺｒＯ□層７の
間に導電性の高結晶化カーボン９が付着し易く、短絡に
よる焼損現象が発生し易いという問題がある。発熱部３
が焼損すると点火機能を失うことになり、点火源として
の信顛性を著しく損なうこととなる。However, the borosilicate glass layer 8 formed on the outer surface is 70%
It softens from 0°C and becomes molten at 1200°C, so
It is easily removed by light oil spray etc. during ignition, and as shown in Fig. 6, highly conductive crystallized carbon 9 tends to adhere between the Sic/Sio, /ZrB2/ZrO□ layers 7, resulting in short circuits. There is a problem in that a burnout phenomenon is likely to occur. Heat generating part 3
If it burns out, it will lose its ignition function, significantly impairing its reliability as an ignition source.
本発明の目的は、上記問題をＪ決し、ＳｉＣ／ＺｒＢ、
複合セラミックスの表面に緻密で、かつ耐熱性に優れた
絶縁被膜を形成することができるセラミックスの表面処
理方法を提供することにある。The purpose of the present invention is to solve the above problem and to
An object of the present invention is to provide a method for surface treatment of ceramics, which can form a dense insulating film with excellent heat resistance on the surface of composite ceramics.
本発明の第１は、ＳｉＣ／ＺｒＢ２複合セラミックスを
６５０〜１０００℃の大気中で熱処理し、上記複合セラ
ミックスの表面にＳｉＣ／Ｚ−０□層を形成することを
特徴とするセラミックスの表面処理方法に関する。The first aspect of the present invention is a method for surface treatment of ceramics, which comprises heat-treating a SiC/ZrB2 composite ceramic in the atmosphere at 650 to 1000°C to form a SiC/Z-0□ layer on the surface of the composite ceramic. Regarding.
本発明の第２は、ＳｉＣ／ＺｒＢ２複合セラミックスの
表面に高融点酸化物をコーティングすることを特徴とす
るセラミックスの表面処理方法。The second aspect of the present invention is a method for surface treatment of ceramics, which comprises coating the surface of SiC/ZrB2 composite ceramics with a high melting point oxide.
本発明の第３は、前記ＳｉＣ／Ｚｒ０．層を有する複合
セラミックスの表面に高融点酸化物をコーティングする
ことを特徴とするセラミックスの表面処理方法に関する
。The third aspect of the present invention is the SiC/Zr0. The present invention relates to a method for surface treatment of ceramics, which comprises coating the surface of a composite ceramic layer with a high melting point oxide.
［作用〕
ＺｒＢ、の酸化開始温度は６５０℃であるため、この温
度以上では大気中の酸素と反応して下式に示すように、
ＺｒＯ，とＢ２０．とを生成する。[Effect] Since the oxidation starting temperature of ZrB is 650°C, above this temperature it reacts with oxygen in the atmosphere and as shown in the formula below,
ZrO, and B20. and generate.
ＺｒＯ，＋ ５／２０ｔ−ｈＺｒＯ，＋Ｂ、Ｏ，↑また
ＳｉＣの酸化開始温度は１０００℃であるため、この温
度以上では大気中の酸素と反応して下式に示すように、
ＳｉｎｇとＣＯ□とを生成する。ZrO, + 5/20t-hZrO, +B, O, ↑Also, since the oxidation initiation temperature of SiC is 1000°C, above this temperature it reacts with oxygen in the atmosphere and as shown in the formula below,
Generates Sing and CO□.
ＳｉＣ±２０□−３ｉ Ｏ，＋ＣＯ，↑一方、ＳｉＣ／
Ｚｒ０ｚは１１００℃以上の大気中で熱処理すると、上
記ＳｉｎｇおよびＺｒＯ２以外に、ＳｉＣとＺｒＢ、と
酸素とが反応して融点の低いはう珪酸ガラスを生成する
。SiC±20□-3i O, +CO, ↑while SiC/
When Zr0z is heat-treated in the atmosphere at 1100° C. or higher, SiC, ZrB, and oxygen, in addition to the above-mentioned Sing and ZrO2, react to form silicic acid glass having a low melting point.
したがって、ＳｉＣ／ＺｒＢ、を６５０〜１０００℃の
温度範囲の酸化雰囲気中で熱処理することにより、Ｓｉ
Ｃは反応せず、ＺｒＢ２だけがＺｒｏ、となり、ＳｉＣ
／Ｚｒ０ｚ層が形成される。Therefore, by heat treating SiC/ZrB in an oxidizing atmosphere in the temperature range of 650 to 1000°C, Si
C does not react, only ZrB2 becomes Zro, and SiC
/Zr0z layer is formed.
ＺｒＯ□は耐熱温度が２６７０℃と高く、優れた絶縁性
を有するため、ＳｉＣ／Ｚｒ０ｚ層を表面に有する発熱
体は、ＳｉＣ／ＺｒＢ、発熱体に比較して抵抗率が４倍
程度高くなり、また耐熱性が向上する。ZrO□ has a high heat resistance temperature of 2670°C and has excellent insulation properties, so a heating element with a SiC/ZrOz layer on the surface has a resistivity about 4 times higher than that of a SiC/ZrB heating element. Also, heat resistance is improved.
また上記ＳｉＣ／Ｚｒ０ｚ層を表面に有する発熱体の表
面にさらに高融点酸化物をコーティングすると、発熱体
が大気と遮断されるため、絶縁性および耐熱性をさらに
向上することができる。該高融点酸化物としては、アル
ミナ、シリカ、ムライト、スピネル、ジルコン等が挙げ
られる。これらの物性および化学的安定性を第１表に示
した。Further, when the surface of the heating element having the SiC/Zr0z layer on its surface is further coated with a high melting point oxide, the heating element is isolated from the atmosphere, so that insulation and heat resistance can be further improved. Examples of the high melting point oxide include alumina, silica, mullite, spinel, zircon, and the like. Their physical properties and chemical stability are shown in Table 1.
以下余白
これらの高融点酸化物のうち、ムライトは科学的に安定
であり、高温環境条件下においてもカーボンと反応する
ことはなく、絶縁性を保持でき、また不透過性を示すた
め特に好ましい。これらの高融点酸化物層の厚さは、母
材との熱膨張差を考慮して適宜法めるのが好ましい。Among these high melting point oxides, mullite is particularly preferred because it is scientifically stable, does not react with carbon even under high temperature environmental conditions, can maintain insulation properties, and exhibits impermeability. The thickness of these high-melting point oxide layers is preferably determined as appropriate, taking into account the difference in thermal expansion with the base material.
［実施例〕 以下、本発明を実施例により詳しく説明する。[Example〕 Hereinafter, the present invention will be explained in detail with reference to Examples.
第１図は、本発明の一実施例の表面処理方法によって得
られるセラミックス発熱体の構造図、第２図は、第１図
のＡ−Ａ線断面図、第３図は、第１図の発熱体に高融点
酸化物層を形成させた場合のＡ−Ａ線断面図である。FIG. 1 is a structural diagram of a ceramic heating element obtained by a surface treatment method according to an embodiment of the present invention, FIG. 2 is a cross-sectional view taken along line A-A in FIG. 1, and FIG. FIG. 3 is a cross-sectional view taken along the line A-A when a high melting point oxide layer is formed on the heating element.
第１図において、ＳｉＣ／ＺｒＢ２導電部１は、基材で
あるＳｉＣと導電材であるＺｒＢ２とを容積比で３０％
添加した、抵抗率が１．４Ｘ１０−３Ω・ｃｍ、常温か
ら１２００°Ｏまでの線膨脹率が６×１０−”／”Ｃで
ある導電性セラミックスである。またＡＩＮ絶縁部２は
、線膨張特性がＳｉＣ／ＺｒＢ２とほぼ同じである。In FIG. 1, the SiC/ZrB2 conductive part 1 consists of SiC as a base material and ZrB2 as a conductive material in a volume ratio of 30%.
It is a conductive ceramic having a resistivity of 1.4×10 −3 Ω·cm and a coefficient of linear expansion of 6×10 −”/”C from room temperature to 1200° O. Furthermore, the linear expansion characteristic of the AIN insulation portion 2 is almost the same as that of SiC/ZrB2.
発熱体の焼結は、電極板４を取りつける前の発熱体をホ
ットプレス法により９００℃の大気中で２４時間熱処理
して行った。得られた焼結体の密度は９９％であり、Ｓ
ｉＣ／ＺｒＢ２の上層にＳｉｃ／ＺｒＯ，層５が平均で
１０ＩＩｍ形成された（第２図）。熱処理の温度は、Ｚ
ｒＢ、の酸化開始温度である６５０℃以上で、ＳｉＣの
酸化開始温度の１０００℃以下であればよい。ＳｉＣ／
ＺｒＯ□層５の厚さは、熱処理温度および処理時間によ
ってコントロールできる。またＡＩＮ絶縁部２はＡｌｘ
の酸化開始温度が１１００℃であるため前記温度範囲で
は変化しない。Sintering of the heating element was carried out by heat-treating the heating element before attaching the electrode plate 4 in the atmosphere at 900° C. for 24 hours using a hot press method. The density of the obtained sintered body was 99%, and S
A layer 5 of Sic/ZrO with an average thickness of 10 IIm was formed on the iC/ZrB2 layer (FIG. 2). The temperature of heat treatment is Z
The temperature may be 650° C. or higher, which is the oxidation starting temperature of rB, and 1000° C., which is the oxidation starting temperature of SiC. SiC/
The thickness of the ZrO□ layer 5 can be controlled by the heat treatment temperature and treatment time. Also, the AIN insulation part 2 is Alx
Since the oxidation start temperature of is 1100° C., there is no change in the above temperature range.
Ｓ ｉ Ｃ／ Ｚ ｒ Ｏｚ層５が形成された発熱体に
さらに高融点酸化物としてムライトを用いて高融点酸化
物層６を形成した（第３図）。高融点酸化物層６のコー
ティングはゾル−ゲル法で行った。まずアルミナゾルと
シリカゾルを重量比で５：２の割合で約１時間部合した
。該混合溶液を、上記ＳｉＣ／Ｚｒ０．層５の上に塗布
して２時間風乾した。この塗布−風乾の工程を５回繰り
返し行った後、アルゴン中で１２００℃の温度条件下で
２時間熱処理した。１２００ ”Ｃの熱処理によって３
Ａｊｌ！ｚ Ｏｓ ＋２３ ｉ０□→
３ Ａ １２０ｉ ・２ＳｉＯ２
の反応が生じ、ムライト（３Ａｌｚ０３ ・２ＳｉＯ
□）組成の塗布層を平均で５μｍの厚さで形成すること
ができた。A high melting point oxide layer 6 was further formed using mullite as a high melting point oxide on the heating element on which the S i C/Z r Oz layer 5 was formed (FIG. 3). The high melting point oxide layer 6 was coated by a sol-gel method. First, alumina sol and silica sol were combined at a weight ratio of 5:2 for about 1 hour. The mixed solution was mixed with the SiC/Zr0. It was coated on top of layer 5 and air dried for 2 hours. After repeating this coating-air-drying process five times, it was heat-treated in argon at a temperature of 1200° C. for 2 hours. 3 by heat treatment at 1200”C
Ajl! The reaction of z Os +23 i0□→ 3 A 120i ・2SiO2 occurs, and mullite (3Alz03 ・2SiO
□) It was possible to form a coating layer with an average thickness of 5 μm.
未処理発熱体（１）、Ｓ ｉＣ／Ｚｒ０ｚ層を有する発
熱体（２）およびＳｉＣ／ＺｒＢ２層とムライト層を有
する発熱体（３）の抵抗値（サンプルの１ｃＩＩ１間の
表面抵抗値）を測定し、それらの結果を第２表に示した
。Measure the resistance value (surface resistance value between 1cII1 of the sample) of the untreated heating element (1), the heating element with SiC/Zr0z layer (2), and the heating element with SiC/ZrB2 layer and mullite layer (3) The results are shown in Table 2.
第２表
第２表から、未処理発熱体（１）では抵抗値が０．０５
Ωと低いのに対し、ＳｉＣ／ＺｒＯ□層を有する発熱体
（２）では抵抗値が１００〜１にΩと非常に高く、さら
にムライト層を有する発熱体（３）では抵抗値がＩＭΩ
〜■であり、はぼ完全な絶縁被膜が得られることがわか
る。Table 2 From Table 2, the resistance value of untreated heating element (1) is 0.05.
In contrast, the resistance value of the heating element (2) having a SiC/ZrO□ layer is extremely high at 100 to 1 Ω, and the resistance value of the heating element (3) having a mullite layer is IMΩ.
~ ■, which shows that a nearly perfect insulating film can be obtained.
本実施例では、熱処理によりＳｉＣ／ＺｒＯ。In this example, SiC/ZrO was formed by heat treatment.
層を形成した後にムライトコーティングを実施して絶縁
被膜の信幀性向上を図ったが、熱処理または高融点酸化
物のコーティングを単独で実施してもよい。Although a mullite coating was performed after forming the layer to improve the reliability of the insulating coating, heat treatment or a high melting point oxide coating may also be performed alone.
第１および第２の発明によれば、耐熱温度の高い絶縁被
膜が形成されるため、発熱体の酸化速度が著しく抑制さ
れ、高寿命化を図ることができる。According to the first and second inventions, since an insulating coating having a high heat resistance temperature is formed, the oxidation rate of the heating element is significantly suppressed, and a longer life can be achieved.
また点火トーチ等の高温環境条件下において、導電性の
高い高結晶化カーボンが発熱体に付着しても短絡するこ
とがなく、点火源としての信頼性が著しく向上する。In addition, even if the highly conductive, highly crystallized carbon adheres to the heating element under high-temperature environmental conditions such as in an ignition torch, there will be no short circuit, and the reliability as an ignition source is significantly improved.
第３の発明によれば、さらに発熱体を不透過性の緻密な
酸化膜で覆うため、はぼ完全な絶縁被膜が得られ、上記
効果がさらに向上する。According to the third aspect of the invention, since the heating element is further covered with an impermeable dense oxide film, a nearly perfect insulation coating is obtained, and the above-mentioned effects are further improved.
第１図は、本発明の一実施例の表面処理方法によって得
られるセラミックス発熱体の構造図、第２図は、第１図
のＡ−Ａ線断面図、第３図は、第１図の発熱体に高融点
酸化物層を形成させた場合のＡ−Ａ線断面図、第４図は
、従来のセラミックスイグナイタ発熱体の構造図、第５
図は、第４図の発熱体を１１００〜１２００ ”Ｃの大
気中で熱処理した場合のＢ−Ｂ線断面図、第６図は、第
５図の発熱体を用いた場合の高結晶化カーボンの付着状
況を示す図である。
１−３ ｉ Ｃ／ Ｚ ｒ Ｂｚ導電部、２・ＡｎＮ！
縁部、３・・・発熱部、４・・・電極板、５・・・Ｓｉ
Ｃ／ＺｒＯ□層、６・・・高融点酸化物層、７・・・Ｓ
ｉＣ／ＳｉＯ，／ＺｒＢ、／ＺｒＯ２層、８・・・はう
珪酸ガラス層、９・・・高結晶化カーボン。FIG. 1 is a structural diagram of a ceramic heating element obtained by a surface treatment method according to an embodiment of the present invention, FIG. 2 is a cross-sectional view taken along line A-A in FIG. 1, and FIG. Fig. 4 is a cross-sectional view taken along the line A-A when a high melting point oxide layer is formed on the heating element, and Fig. 5 is a structural diagram of a conventional ceramic igniter heating element.
The figure is a sectional view taken along the line B-B when the heating element shown in Fig. 4 is heat treated in the atmosphere at 1100 to 1200''C, and Fig. 6 is a cross-sectional view of highly crystallized carbon when the heating element shown in Fig. 5 is used. 1-3 i C/ Z r Bz conductive part, 2 AnN!
Edge, 3... Heat generating part, 4... Electrode plate, 5... Si
C/ZrO□ layer, 6...high melting point oxide layer, 7...S
iC/SiO, /ZrB, /ZrO2 layer, 8... borosilicate glass layer, 9... highly crystallized carbon.
Claims (3)
１０００℃の大気中で熱処理し、上記複合セラミックス
の表面にＳｉＣ／ＺｒＯ＿２層を形成することを特徴と
するセラミックスの表面処理方法。(1) SiC/ZrB_2 composite ceramics from 650
A method for surface treatment of ceramics, characterized in that a SiC/ZrO_2 layer is formed on the surface of the composite ceramic by heat treatment in the atmosphere at 1000°C.
融点酸化物をコーティングすることを特徴とするセラミ
ックスの表面処理方法。(2) A method for surface treatment of ceramics, which comprises coating the surface of SiC/ZrB_2 composite ceramics with a high melting point oxide.
る複合セラミックスの表面に高融点酸化物をコーティン
グすることを特徴とするセラミックスの表面処理方法。(3) A method for surface treatment of ceramics, which comprises coating the surface of the composite ceramic having the SiC/ZrO_2 layer according to claim (1) with a high melting point oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017277A JP3009166B2 (en) | 1990-01-26 | 1990-01-26 | Surface treatment method for ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017277A JP3009166B2 (en) | 1990-01-26 | 1990-01-26 | Surface treatment method for ceramics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03223191A true JPH03223191A (en) | 1991-10-02 |
| JP3009166B2 JP3009166B2 (en) | 2000-02-14 |
Family
ID=11939487
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017277A Expired - Fee Related JP3009166B2 (en) | 1990-01-26 | 1990-01-26 | Surface treatment method for ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3009166B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112194506A (en) * | 2020-08-26 | 2021-01-08 | 北京理工大学 | Preparation of oxide in-situ coated ZrB by using oxyacetylene fuel flow2Method for agglomerating powder by using-SiC |
| CN113800955A (en) * | 2021-09-29 | 2021-12-17 | 湖北瑞宇空天高新技术有限公司 | Multilayer ceramic matrix composite thermal protection coating and preparation method and application thereof |
-
1990
- 1990-01-26 JP JP2017277A patent/JP3009166B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112194506A (en) * | 2020-08-26 | 2021-01-08 | 北京理工大学 | Preparation of oxide in-situ coated ZrB by using oxyacetylene fuel flow2Method for agglomerating powder by using-SiC |
| CN113800955A (en) * | 2021-09-29 | 2021-12-17 | 湖北瑞宇空天高新技术有限公司 | Multilayer ceramic matrix composite thermal protection coating and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3009166B2 (en) | 2000-02-14 |
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