JPH03215812A - Matrix optical switch - Google Patents
Matrix optical switchInfo
- Publication number
- JPH03215812A JPH03215812A JP1052290A JP1052290A JPH03215812A JP H03215812 A JPH03215812 A JP H03215812A JP 1052290 A JP1052290 A JP 1052290A JP 1052290 A JP1052290 A JP 1052290A JP H03215812 A JPH03215812 A JP H03215812A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- waveguide
- elastically deformable
- matrix
- optical switch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 37
- 239000011159 matrix material Substances 0.000 title claims abstract description 29
- 238000003780 insertion Methods 0.000 claims abstract description 12
- 230000037431 insertion Effects 0.000 claims abstract description 12
- 230000001902 propagating effect Effects 0.000 claims description 6
- 229920002545 silicone oil Polymers 0.000 abstract description 6
- 230000007547 defect Effects 0.000 abstract 1
- 230000000644 propagated effect Effects 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000013307 optical fiber Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 5
- 230000005489 elastic deformation Effects 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、マトリクス状に配列された光路のおのおのの
途中に設置したミラーで光を反射させ、光路を切り替え
ることにより、自由にかつ低損失に接続・切替できる多
端子マトリクス光スイッチに関するものである。Detailed Description of the Invention (Industrial Application Field) The present invention reflects light with mirrors installed in the middle of each optical path arranged in a matrix, and switches the optical path freely and with low loss. This invention relates to a multi-terminal matrix optical switch that can be connected to and switched over.
（従来の技術）
第４図は、文献ｒＮＯＮＢＬＯｃＫＩＮＧ ８ ｘ ８
０ＰＴＩＣＡＬＭＡＴＲＩＸ ＳＷＩＴＣＨ ＦＯＲ
ＦＩＢＥＲ−ＯＰＴＩＣ ＣＯＭＭＵＮＩＣＡＴＩＯ
Ｎ，ＥＬＥＣＴＲＯＮＩＣＳ ＬＥＴＴＥＲＳ， ＶＯ
Ｌ．１６，ＮＯ．ｌＬ， ｐｐ．４２２−４２３（１９
８０）Ｊなどにみられるような、従来のこの種の７１・
リクス光スイッチの基本構成を示した平面図である。第
４図に示す光スイッチは、光ファイバ１−１．１−２の
端部とレンズ２−１．１−２の相対位置を固定して、ビ
ームコリメータ３−１，３−２を作り、その光路の途中
にマトリクス状に配設したミラー４を介して、レンズ２
−１． ２２が対向するように設置して、ミラー４を
ソレノイドアクチュエー夕で紙面に垂直に上／下動させ
ることによって、光ビーム５を反射／通過させ、光ビー
ム５を任意の光ファイバ１−１．１−２に接続・切替す
るように構成したマトリクス光スイッチである。(Prior art) Figure 4 shows the document rNONBLOcKING 8 x 8
0PTICAL MATRIX SWITCH FOR
FIBER-OPTIC COMMUNICATION
N, ELECTRONICS LETTERS, VO
L. 16, NO. LL, pp. 422-423 (19
80) Conventional 71・ of this type as seen in J.
1 is a plan view showing the basic configuration of an optical switch. The optical switch shown in FIG. 4 fixes the relative position of the end of the optical fiber 1-1.1-2 and the lens 2-1.1-2 to form beam collimators 3-1 and 3-2. The lens 2
-1. 22 facing each other, and by moving the mirror 4 up and down perpendicular to the plane of the paper using a solenoid actuator, the light beam 5 is reflected/passed, and the light beam 5 is connected to any optical fiber 1-1. This is a matrix optical switch configured to connect and switch between .1 and 2.
（発明が解決しようとする課題）
しかし、第４図の構成によるマトリクス光スイッチには
、以下の課題があり、低損失化、小型高密度化、かつ多
端子化が難しかった。すなわち（１）損失は、ビームコ
リメータ３−１を構成する光ファイバ１−１とレンズ２
−１の各軸間の軸ずれ・角度ずれ、ビームコリメータ３
−１とビームコリメータ３−２との軸ずれ・角度ずれ、
およびミラー４自体の製作精度（角度など）とミラー４
の設置精度（角度など）などで決定される。現状の機構
・部品の製作技術では、光ビーム入射角度誤差を可成り
吸収できる五角プリズムを用いても、損失が大きくなる
問題がある。たとえば、ビームコリメータ３−１．３−
２を構成する光ファイバ１−１ （１−２）とレンズｌ
−１ （１−２）の各軸間の軸ずれ２μｍ１レンズ２−
１．２−２間の一３
角度ずれ１０−３ラジアン、およびミラー４の角度誤差
２Ｘ１０−”ラジアンという機構・部品精度で、スポッ
トサイズ５μｍの単一モードファイバと焦点距離１．５
ｍｍのレンズを用いて平行ビーム系を構成する場合、光
ファイバ１−１．１−２間の損失は、回折損失ＯｄＢの
条件で計算すると、約１０ｄＢと大きくなる場合が出て
くる。損失を低減するため、軸ずれ・角度ずれをすべて
の行または列について人手で最適に調整することは極め
て困難であり、結局、損失が大きくなる場合が相当数出
てくる問題がある。(Problems to be Solved by the Invention) However, the matrix optical switch having the configuration shown in FIG. 4 has the following problems, and it is difficult to reduce loss, increase the size and density, and increase the number of terminals. In other words, (1) the loss is caused by the optical fiber 1-1 and lens 2 that constitute the beam collimator 3-1.
-Axis misalignment/angular misalignment between each axis of -1, beam collimator 3
-1 and beam collimator 3-2 axis misalignment/angular misalignment,
and the manufacturing accuracy (angle, etc.) of the mirror 4 itself and the mirror 4
Determined by installation accuracy (angle, etc.). With the current manufacturing technology for mechanisms and parts, even if a pentagonal prism that can absorb a considerable amount of the error in the angle of incidence of the light beam is used, there is a problem in that the loss becomes large. For example, beam collimator 3-1.3-
Optical fiber 1-1 (1-2) and lens l constituting 2
-1 Axis deviation between each axis of (1-2) 2 μm 1 lens 2-
1.3 between 2 and 2 With mechanical and component accuracy of an angular deviation of 10-3 radians and an angular error of mirror 4 of 2 x 10-'' radians, a single mode fiber with a spot size of 5 μm and a focal length of 1.5
When a parallel beam system is constructed using a lens of mm, the loss between the optical fibers 1-1, 1-2 may be as large as about 10 dB when calculated under the condition of diffraction loss O dB. In order to reduce loss, it is extremely difficult to manually optimally adjust the axis misalignment and angular misalignment for all rows or columns, and as a result, there are many cases where the loss becomes large.
（２）回折損失ＯｄＢとなる最大光路長はレンズの焦点
距離で決定されること、また、光ビーム５は、ビームウ
エストを越えると、回折により光路長とともに立体的に
広がって行くことのため、光路長が受光レンズ径や損失
から制限され、多端子化には限度がある。たとえば上記
（１）の計算例の場合、レンズとして球レンズを用い、
行間または列間のピッチがレンズ径で決まるとした場合
、約１０ｄＢの損失を許容しても、マトリクス光スイッ
チの端子＝４
数が１０×ＩＯに制限される問題がある。(2) The maximum optical path length resulting in diffraction loss OdB is determined by the focal length of the lens, and the light beam 5 expands three-dimensionally with the optical path length due to diffraction once it exceeds the beam waist. The optical path length is limited by the diameter of the light receiving lens and loss, and there is a limit to the number of terminals. For example, in the case of calculation example (1) above, using a spherical lens as the lens,
If the pitch between rows or columns is determined by the lens diameter, there is a problem that even if a loss of about 10 dB is allowed, the number of terminals of the matrix optical switch is limited to 10×IO.
（３）マトリクス状に設置する光学部品や機構部品を、
小型かつ高精度に製作するには限度があり、光スイッチ
を小型高密度化できない問題がある。(3) Optical and mechanical parts installed in a matrix,
There is a limit to the ability to manufacture small and highly accurate optical switches, and there is a problem in that optical switches cannot be made smaller and more dense.
特に、長期的に損失再現性を確保するため機構部品の摩
擦による劣化を小さくするように製作する場合、寸法が
大きくなる問題がある。また、ミラー４を移動させるた
め、各切替・接続点ごとにソレノイドアクチュエータを
用いる場合、行間または列間のピッチを小さくしてソレ
ノイドアクチュエータを高密度配置にすると、磁気が隣
接するソレノイドアクチュエー夕に漏れ、接続・切替に
誤動作を発生し、マトリクス光スイッチの小型高密度化
できない問題がある。Particularly, when manufacturing mechanical components to reduce deterioration due to friction in order to ensure long-term loss reproducibility, there is a problem in that the dimensions become large. In addition, when using a solenoid actuator at each switching/connection point to move the mirror 4, if the pitch between rows or columns is reduced and the solenoid actuators are arranged in high density, the magnetic field will be applied to the adjacent solenoid actuators. This causes problems such as leakage and connection/switching malfunctions, making it impossible to make matrix optical switches smaller and more dense.
（４） ソレノイドアクチュエー夕とミラー４の必要
個数は、ともに、行数と列数の積となり、たとえば端子
数１００ ＸＩＯＯのマトリクス光スイッチでも、必要
部品が各１万個となり、加工精度や組立精度のばらつき
による光損失、および量的に経済性が問題である。これ
に対して、ミラーを行または列５一
ごとに移動させるミラー１軸移動機構を導入して経済化
しようとすると、ミラー１軸移動機構の寸法が大きくな
り、その結果、行間または列間のピッチが大きくなり、
高密度化できなかったり、ミラー設定位置精度がばらつ
き、損失が大きくばらつく場合がでてきたり、切替時間
が少なくともミラー移動時間の分だけ長くなる問題があ
る。(4) The required number of solenoid actuators and mirrors 4 are both the product of the number of rows and the number of columns. For example, even for a XIOO matrix optical switch with 100 terminals, the required parts are 10,000 each, and processing accuracy and assembly are required. Problems include optical loss due to variations in accuracy and economical efficiency in terms of quantity. On the other hand, if an attempt is made to save money by introducing a mirror 1-axis moving mechanism that moves the mirror row by row or column by column, the dimensions of the mirror 1-axis moving mechanism become large, and as a result, the distance between rows or columns increases. The pitch increases,
There are problems in that high density cannot be achieved, mirror setting position accuracy varies, loss may vary greatly, and switching time becomes longer by at least the mirror moving time.
本発明の課題は、上記問題点に鑑み、大規模マトリクス
で任意の光ファイバ間において、ミラーの反射により切
替・接続でき、低損失で、かつ小型高密度で、かつ多端
子のマトリクス光スイッチを提供することにある。In view of the above-mentioned problems, an object of the present invention is to provide a low-loss, compact, high-density, multi-terminal matrix optical switch that can be switched and connected between arbitrary optical fibers in a large-scale matrix by mirror reflection. It is about providing.
（課題を解決するための手段）
本発明のマトリクス光スイッチには、格子状に形成した
導波路、導波路の交差部に形成したミラー挿入空間用ギ
ャップ、ミラーを支持する弾性変形梁、弾性変形梁上に
形成した導波路内伝搬光を反射させるミラー、弾性変形
梁上に形成した弾性変形梁を撓ませミラーを微小移動さ
せるアクチュエー夕、およびアクチュエー夕用電極を半
導体プ６−
ロセス技術でマトリクス状に形成したマトリクス板と、
導波路交差部で対向しているコア端面間とミラー部に充
満したマッチングオイルと、アクチュエータ駆動装置と
を備えた。(Means for Solving the Problems) The matrix optical switch of the present invention includes waveguides formed in a lattice shape, gaps for mirror insertion spaces formed at intersections of the waveguides, elastically deformable beams that support the mirrors, and elastically deformable beams. A mirror formed on the beam that reflects the light propagating in the waveguide, an actuator that bends the elastically deformable beam formed on the elastically deformable beam and moves the mirror minutely, and electrodes for the actuator are matrix-formed using semiconductor processing technology. A matrix plate formed in the shape of
The device includes matching oil filled between the core end faces facing each other at the waveguide intersection and the mirror portion, and an actuator drive device.
（作 用）
光は空間伝搬から導波路伝搬となり、導波路交差部に設
けるミラー挿入空間用ギャップを除いて、常に導波路内
に閉じ込められ、光路長の制限が大幅に緩和され、光ス
イッチを多端子化できる。また、マッチングオイルによ
りフレネル損失がなく、導波路部で軸ずれ・角度ずれが
なく、かつ導波路の光軸に対するミラー角度を高精度に
設定でき、損失が小さい。また、導波路交差部にミラー
、ミラー支持用弾性変形梁、およびアクチュエー夕を小
型高密度に作製できる。また、ミラーは、機械的に摺動
することなく、弾性変形梁の撓みによってコア端面間に
移動し、ミラーの設定位置精度が劣化せず、接続・切替
による損失のばらつきが長期的に少ない。(Function) Light changes from spatial propagation to waveguide propagation, and is always confined within the waveguide, except for the mirror insertion space gap provided at the waveguide intersection, which greatly eases the restriction on optical path length and allows optical switches to be Can have multiple terminals. Further, due to the matching oil, there is no Fresnel loss, there is no axis deviation or angular deviation in the waveguide section, and the mirror angle with respect to the optical axis of the waveguide can be set with high precision, resulting in small loss. Moreover, the mirror, the elastically deformable beam for supporting the mirror, and the actuator can be fabricated in a small size and with high density at the waveguide intersection. In addition, the mirror moves between the core end faces by the deflection of the elastically deformable beam without mechanically sliding, so the precision of the mirror setting position does not deteriorate, and variations in loss due to connection and switching are small over the long term.
（実施例）
第１図は、本発明のマトリクス光スイ・ソチのスイッチ
ング部の一実施例の断面図である。第１図において、Ｓ
ｉ基板６上に作られた導波路７ Ｃｉ、ミラー挿入空間
用ギャップ８（たとえば、幅１０μｍ）を挟んで、コア
９−１．９−２の軸が一致するように対向している。ミ
ラー４がミラー挿入空間用ギャップ８内に移動できるよ
うに、かつコア９−１．９−２の軸とミラー４の面が４
５度をなすように、Ｓｉ基板６、ミラー４ （たとえば
、厚さ４μｍ）と弾性変形粱１０（たとえば、１４００
μｍＸ２００μｍ×５μｍ）を形成している。弾性変形
粱１０の」二番こＣよ、Ａβ（たとえば、厚さ０．５μ
ｍ）を蒸着Ｌ，Ａ１層１１−１の上に（ユニモルフ）圧
電素子となるＺｎＯをスパッタリングで付け、ＺｎＯ層
１２（たとえ（よ、厚さ１０μｍ）の上にＡｎを蒸着し
てΔβ層１１−２を形成する。二つのＡＡの層１１−１
． １１−２４よ、圧電素子ＺｎＯ層ｌ２の電極となる
。また、少なくとも、コア９−１．９−２の間とミラー
４部は、屈折率かコア９−１．９−２と同等のシリコー
ンオイノレ１３で満たし、フレネル損失が発生しないよ
うにしている。圧電素子ＺｎＯ層ｌ２の駆動調節装置１
４は、Ａｌ層１１−１． １１−２の電極間に印加する
電圧の大きさを調節して弾性変形粱１０の歪量を、すな
わち、ミラー４がミラー挿入空間用ギャップ８内に移動
し、コア９−１または９−２内伝搬光を反射させるに必
要なミラー移動量（たとえば、数十μｍ程度）を調節す
る。ただし、弾性変形粱１０とＺｎＯ層１２およびＡｊ
ｌ’層１１−１． １１−２の寸法、さらに圧電素子Ｚ
ｎＯ層１２に印加する電圧の大きさは、ミラー移動量に
応じて決める。第２図は、第１図の平面図で、スイッチ
ング部をマトリクス状に形成した場合の説明図である。(Embodiment) FIG. 1 is a sectional view of an embodiment of a switching section of a matrix optical switch according to the present invention. In Figure 1, S
The waveguide 7 Ci formed on the i-substrate 6 faces the cores 9-1 and 9-2 with their axes aligned across the mirror insertion space gap 8 (for example, width 10 μm). The axis of the core 9-1, 9-2 and the surface of the mirror 4 are aligned with
Si substrate 6, mirror 4 (for example, 4 μm thick) and elastically deformable wire 10 (for example, 1400
200 μm×5 μm). The second part of the elastically deformed tube 10 is Aβ (for example, 0.5μ thick).
ZnO, which will become a (unimorph) piezoelectric element, is deposited on the L and A1 layers 11-1 by sputtering, and An is deposited on the ZnO layer 12 (for example, 10 μm thick) to form the Δβ layer 11. -2.Two AA layers 11-1
．． 11-24 becomes the electrode of the piezoelectric element ZnO layer 12. In addition, at least the space between the cores 9-1.9-2 and the mirror 4 are filled with silicone oil 13 whose refractive index is equivalent to that of the core 9-1.9-2 to prevent Fresnel loss from occurring. . Drive adjustment device 1 for piezoelectric element ZnO layer 12
4 is an Al layer 11-1. By adjusting the magnitude of the voltage applied between the electrodes 11-2, the amount of strain of the elastically deformable coil 10 can be adjusted so that the mirror 4 moves into the mirror insertion space gap 8, and the core 9-1 or 9-2 The amount of mirror movement required to reflect internally propagating light (for example, about several tens of μm) is adjusted. However, the elastic deformation layer 10, the ZnO layer 12 and Aj
l' layer 11-1. Dimensions of 11-2, and piezoelectric element Z
The magnitude of the voltage applied to the nO layer 12 is determined depending on the amount of mirror movement. FIG. 2 is a plan view of FIG. 1, and is an explanatory diagram when the switching parts are formed in a matrix.
第２図において、弾性変形粱１０は、隣接する弾性変形
粱１０と互いに直交するように配設することにより、弾
性変形粱１０を長くして、塑性変形させることなく、ミ
ラー移動量を確保できる構造にしている。また導波路７
に隣接して、ＡＡ層１１Ｌ １１−２の電極への配線孔
１５を設け、電極と圧電素子ＺｎＯ層１２の駆動調節装
置ｌ４を結線する構造にしている。第３図は、第９−
１図の導波路を除いて、Ｓｉ基板を上方からみたときの
ミラー移動機構の平面図である。第３図において、弾性
変形梁１０の両側面は、Ｓｉ基板６を貫通する通し穴Ｉ
６にし、第１図示すマトリクス板１７の表面と裏面は、
ミラー挿入空間用ギャップ８と配線穴１５を介して連通
し、シリコーンオイル１３が自在に移動できる構造にし
ている。これにより、弾性変形梁１０の導波路７側とＳ
ｉ基板６側の圧力差によって、弾性変形梁ｌＯが撓まな
い構造にしている。In FIG. 2, by arranging the elastically deformable casing 10 so as to be perpendicular to the adjacent elastically deformable casing 10, the elastically deformable casing 10 can be lengthened and the amount of mirror movement can be ensured without plastic deformation. It has a structure. In addition, the waveguide 7
A wiring hole 15 to the electrode of the AA layer 11L 11-2 is provided adjacent to the wiring hole 15 to connect the electrode to the drive adjustment device 14 of the piezoelectric element ZnO layer 12. FIG. 3 is a plan view of the mirror moving mechanism when the Si substrate is viewed from above, excluding the waveguide shown in FIG. 9-1. In FIG. 3, both sides of the elastically deformable beam 10 have through holes I penetrating the Si substrate 6.
6, and the front and back surfaces of the matrix plate 17 shown in FIG.
It communicates with the mirror insertion space gap 8 through the wiring hole 15, and has a structure that allows the silicone oil 13 to move freely. As a result, the waveguide 7 side of the elastically deformable beam 10 and the S
The structure is such that the elastically deformable beam 1O does not bend due to the pressure difference on the i-board 6 side.
次に、上記構成による導波路内伝搬光のスイッチング動
作を説明する。第１図において、圧電素子ＺｎＯ層１２
の駆動調節装置１４によって、電圧をｌ層１１−１．
１１−２の電極間に印加し圧電素子ＺｎＯ層ｌ２を屈曲
させると、ミラー４を支持している弾性変形梁１０の中
央部が導波路７の下部に接触する直前まで、弾性変形梁
１０が撓み、ミラー４がミラー挿入空間用ギャップ８内
に向かって移動し、ミラー４は導波路７に対して位置決
めされる。このとき、導波路７の交差部において、ミラ
ー挿入空間用ギャップ８部のシリコーンオイル１３を透
過し１０
ていた伝搬光はミラー４で反射し、直交した導波路にス
イッチングされる。逆に、圧電素子ＺｎＯ層１２の駆動
調節装置ｌ４で、電圧印加をやめると、圧電素子ＺｎＯ
層１２の歪（屈曲）がなくなり、したがって、弾性変形
梁１０の撓みが元に戻り、ミラー４はミラー挿入空間用
ギャップ８の外へ向かって移動する。このとき、導波路
交差部において、ミラー４で反射していた伝搬光は、ミ
ラー挿入空間用ギャップ８のシリコーンオイル１３を透
過し、直進するようになり、スイッチングが解除される
。Next, the switching operation of the light propagating in the waveguide with the above configuration will be explained. In FIG. 1, a piezoelectric element ZnO layer 12
The voltage is applied to the l layer 11-1 .
When the voltage is applied between the electrodes 11-2 to bend the piezoelectric element ZnO layer 12, the elastically deformable beam 10 is bent until the center of the elastically deformable beam 10 supporting the mirror 4 comes into contact with the lower part of the waveguide 7. Upon deflection, the mirror 4 moves toward the mirror insertion space gap 8 , and the mirror 4 is positioned relative to the waveguide 7 . At this time, at the intersection of the waveguides 7, the propagating light that has passed through the silicone oil 13 in the mirror insertion space gap 8 is reflected by the mirror 4 and switched to the orthogonal waveguides. Conversely, when the voltage application is stopped in the drive adjustment device l4 of the piezoelectric element ZnO layer 12, the piezoelectric element ZnO
The distortion (bending) of the layer 12 disappears, and therefore the deflection of the elastically deformable beam 10 returns to its original state, and the mirror 4 moves toward the outside of the mirror insertion space gap 8. At this time, at the waveguide intersection, the propagating light that has been reflected by the mirror 4 passes through the silicone oil 13 in the mirror insertion space gap 8 and travels straight, and switching is canceled.
次に、圧電素子ＺｎＯ層１２などアクチュエータの駆動
力と弾性変形梁１０（ １４００μｍ Ｘ ２００μｍ
Ｘ５μｍ）の撓みの目安を考える。また、梁の両端が固
定され、かつ梁の中央に０．１ｇの力が加わる条件で、
梁の中央の撓み、すなわちミラー４の移動量を求めると
、約７０μｍとなる。駆動力は、梁の中央の換算で、０
．１ｇ以下で、十分なミラー移動量が得られる。Next, the driving force of the actuator such as the piezoelectric element ZnO layer 12 and the elastic deformation beam 10 (1400 μm x 200 μm
Consider the standard of deflection (x5μm). Also, under the conditions that both ends of the beam are fixed and a force of 0.1 g is applied to the center of the beam,
The deflection at the center of the beam, that is, the amount of movement of the mirror 4, is approximately 70 μm. The driving force is 0 in terms of the center of the beam.
．． A sufficient amount of mirror movement can be obtained with 1 g or less.
なお以上の説明では、ユニモルフ圧電素子であるＺｎＯ
層ｌ２で弾性変形梁ｌＯを撓ませた場合を説明−１１
したが、ＺｎＯ層１２を２枚作り、バイモルフ圧電素子
として用いてもよい。一方、バイメタルの原理よって発
熱抵抗で駆動力を得てもよい。In the above explanation, ZnO, which is a unimorph piezoelectric element, is used.
Although the case where the elastically deformable beam 1O is bent by the layer 12 has been explained in 11, two ZnO layers 12 may be formed and used as a bimorph piezoelectric element. On the other hand, the driving force may be obtained by a heat-generating resistor based on the bimetal principle.
以上のように、導波路交差部のピッチ１ｍｍ以下、切り
換え電圧数十ボルトで切替時間０． ０５ｓ程度、端子
数１００ ＸＩＯＯ程度のマトリクス光スイッチを構成
できる。また、導波路形成技術の進歩などにより、導波
路における損失が低減してきており、端子数１００ Ｘ
ＩＯＯの光スイッチの損失は約３． ５ｄＢ以下となる
。As described above, the pitch of the waveguide intersections is 1 mm or less, the switching voltage is several tens of volts, and the switching time is 0. It is possible to construct a matrix optical switch with a time of about 0.5 seconds and a number of terminals of about 100 XIOO. In addition, due to advances in waveguide formation technology, loss in waveguides has been reduced, and the number of terminals is 100
The loss of the IOO optical switch is approximately 3. It becomes 5dB or less.
（発明の効果）
以上説明したように、本発明の７１・リクス光スイッチ
は、光が導波路内に閉じ込められ、光路長の制限が小さ
くなり、多端子化できる。またマッチングオイルにより
フレネル損失がなく、導波路部で軸ずれ・角度ずれがな
く、かつ導波路の光軸に対するミラー角度を高精度に設
定でき、損失が小さい。また導波路交差部にミラー、ミ
ラー支持用弾性変形梁、アクチュエー夕を、半導体製作
プロセス技術（エッチング、接合技術など）により、１
２−
小型高密度に作製できる。またミラーは、機械的に摺動
ずることなくコア端面間に移動し、ミラーの設定位置精
度は劣化せず、接続・切替による損失のばらつきが長期
的に少ない。このように、機械的摺動部がないこと、半
導体製作プロセス技術を駆使してＳｉ基板を複雑な３次
元構造に加工する技術が普及してきていることなどによ
って、上記マトリクス光スイッチは多端子化、低損失化
、小型高密度化が可能であり、また量産性があり、した
がって経済化が可能である。(Effects of the Invention) As described above, in the 71-RiX optical switch of the present invention, light is confined within the waveguide, the restriction on the optical path length is reduced, and it is possible to have multiple terminals. Furthermore, due to the matching oil, there is no Fresnel loss, there is no axis deviation or angular deviation in the waveguide section, and the mirror angle with respect to the optical axis of the waveguide can be set with high precision, resulting in small loss. In addition, a mirror, an elastic deformable beam for supporting the mirror, and an actuator are installed at the waveguide intersection using semiconductor manufacturing process technology (etching, bonding technology, etc.).
2- Can be manufactured in a small size and with high density. In addition, the mirror moves between the core end faces without mechanically sliding, the precision of the mirror setting position does not deteriorate, and there is little variation in loss due to connection and switching over the long term. In this way, the above-mentioned matrix optical switch has become multi-terminal due to the lack of mechanical sliding parts and the widespread use of technology to process Si substrates into complex three-dimensional structures using semiconductor manufacturing process technology. , low loss, small size and high density are possible, and mass production is possible, so economicalization is possible.
第１図は本発明のマトリクス光スイッチのスイッチング
部の一実施例の断面図、
第２図は第１図の平面図で、スイッチング部をマトリク
ス状に形成した場合の説明図、第３図は第１図の導波路
を除いて、Ｓｉ基板を上方からみたときのミラー移動機
構の平面図、第４図は従来のマトリクス光スイッチの基
本構成を示す平面図である。
１１，ｉ２・・・光ファイバ
１ ３一
２−１．２−２・・・レンズ
３−１．３−２・・・ビームコリメータ４・・・ミラー
訃・・ビーム６・・・Ｓｉ基板
７・・・導波路８・・・ミラー挿入空間用ギャップ
９−１．９−２・・・コア ＩＯ・・・弾性変形梁１１
−１． １１−２・ＡＩ層 １２−ＺｎＯ層ｌ３・・
・シリコーンオイル １４・・・駆動調節装置１５・・
・配線穴 １６・・・通し穴１７・・・マト
リクス板FIG. 1 is a sectional view of one embodiment of the switching section of the matrix optical switch of the present invention, FIG. 2 is a plan view of FIG. 1, and is an explanatory diagram when the switching section is formed in a matrix shape. FIG. 1 is a plan view of the mirror moving mechanism when the Si substrate is viewed from above, excluding the waveguide, and FIG. 4 is a plan view showing the basic configuration of a conventional matrix optical switch. 11,i2...Optical fiber 1 3-2-1.2-2...Lens 3-1.3-2...Beam collimator 4...Mirror End...Beam 6...Si substrate
7... Waveguide 8... Gap for mirror insertion space 9-1.9-2... Core IO... Elastic deformation beam 11
-1. 11-2・AI layer 12-ZnO layer l3...
・Silicone oil 14... Drive adjustment device 15...
・Wiring hole 16...Through hole 17...Matrix board
Claims (1)
設置したミラーで光を反射させ、光路を切り替える多端
子マトリクス光スイッチにおいて、 格子状に形成した導波路、導波路の交差部に設けたミラ
ー挿入空間用ギャップ、ミラーを指示す弾性変形梁、弾
性変形梁上に形成した導波路内伝搬光を反射させるミラ
ー、弾性変形梁上に形成した弾性変形梁を撓ませミラー
を微小移動させるアクチュエータおよびアクチュエータ
用電極をマトリクス状に形成したマトリクス板と、 導波路交差部で対向しているコア端面間とミラー部に充
満したマッチングオイルと、 アクチュエータ駆動装置と を備えたことを特徴とするマトリクス光スイッチ。[Claims] 1. In a multi-terminal matrix optical switch that switches the optical path by reflecting light with a mirror installed in the middle of each optical path arranged in a matrix, the waveguide is formed in a lattice pattern. A gap for mirror insertion space provided at the intersection, an elastically deformable beam that directs the mirror, a mirror formed on the elastically deformable beam to reflect the light propagating in the waveguide, and a mirror that deflects the elastically deformable beam formed on the elastically deformable beam. The actuator is equipped with a matrix plate in which an actuator and actuator electrodes are formed in a matrix shape, matching oil filled between the core end faces facing each other at the waveguide intersection and the mirror part, and an actuator drive device. A matrix optical switch with special features.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1052290A JPH03215812A (en) | 1990-01-22 | 1990-01-22 | Matrix optical switch |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1052290A JPH03215812A (en) | 1990-01-22 | 1990-01-22 | Matrix optical switch |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03215812A true JPH03215812A (en) | 1991-09-20 |
Family
ID=11752577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1052290A Pending JPH03215812A (en) | 1990-01-22 | 1990-01-22 | Matrix optical switch |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03215812A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1089108A2 (en) * | 1999-09-28 | 2001-04-04 | Agilent Technologies Inc | Optical switches using micromirrors in trenches and integrated optical waveguides |
| WO2001051973A1 (en) * | 2000-01-14 | 2001-07-19 | Corning Incorporated | Mems optical switch and method of manufacture |
| EP1189092A2 (en) * | 2000-09-06 | 2002-03-20 | Japan Aviation Electronics Industry, Limited | Electrostatically operated optical switch |
| KR100417405B1 (en) * | 2001-10-30 | 2004-02-05 | 엘지전자 주식회사 | Piezoelectrically actuated optical switch |
| US6989919B2 (en) | 2003-05-29 | 2006-01-24 | Mitsubishi Denki Kabushiki Kaisha | Scanning apparatus |
| US10816733B2 (en) * | 2016-04-01 | 2020-10-27 | Intel Corporation | Piezoelectrically actuated mirrors for optical communications |
-
1990
- 1990-01-22 JP JP1052290A patent/JPH03215812A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1089108A2 (en) * | 1999-09-28 | 2001-04-04 | Agilent Technologies Inc | Optical switches using micromirrors in trenches and integrated optical waveguides |
| JP2001142008A (en) * | 1999-09-28 | 2001-05-25 | Agilent Technol Inc | Optical switching element |
| EP1089108A3 (en) * | 1999-09-28 | 2004-01-21 | Agilent Technologies, Inc. (a Delaware corporation) | Optical switches using micromirrors in trenches and integrated optical waveguides |
| WO2001051973A1 (en) * | 2000-01-14 | 2001-07-19 | Corning Incorporated | Mems optical switch and method of manufacture |
| EP1189092A2 (en) * | 2000-09-06 | 2002-03-20 | Japan Aviation Electronics Industry, Limited | Electrostatically operated optical switch |
| EP1189092A3 (en) * | 2000-09-06 | 2003-01-02 | Japan Aviation Electronics Industry, Limited | Electrostatically operated optical switch |
| US6625343B2 (en) | 2000-09-06 | 2003-09-23 | Japan Aviation Electronics Industry Limited | Optical switch |
| SG118086A1 (en) * | 2000-09-06 | 2006-01-27 | Japan Avionic Electronics Indu | Optical switch |
| KR100417405B1 (en) * | 2001-10-30 | 2004-02-05 | 엘지전자 주식회사 | Piezoelectrically actuated optical switch |
| US6989919B2 (en) | 2003-05-29 | 2006-01-24 | Mitsubishi Denki Kabushiki Kaisha | Scanning apparatus |
| US10816733B2 (en) * | 2016-04-01 | 2020-10-27 | Intel Corporation | Piezoelectrically actuated mirrors for optical communications |
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