JPH0312837A - Production of optical disk substrate - Google Patents
Production of optical disk substrateInfo
- Publication number
- JPH0312837A JPH0312837A JP1147012A JP14701289A JPH0312837A JP H0312837 A JPH0312837 A JP H0312837A JP 1147012 A JP1147012 A JP 1147012A JP 14701289 A JP14701289 A JP 14701289A JP H0312837 A JPH0312837 A JP H0312837A
- Authority
- JP
- Japan
- Prior art keywords
- optical disk
- disk substrate
- optical disc
- substrate
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 39
- 230000003287 optical effect Effects 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 229920000642 polymer Polymers 0.000 claims abstract description 10
- 230000001678 irradiating effect Effects 0.000 claims abstract description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000001257 hydrogen Substances 0.000 claims abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 17
- 238000006116 polymerization reaction Methods 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 5
- 238000010526 radical polymerization reaction Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 239000000178 monomer Substances 0.000 abstract description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007423 decrease Effects 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000000862 absorption spectrum Methods 0.000 description 4
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- YCOZIPAWZNQLMR-UHFFFAOYSA-N pentadecane Chemical compound CCCCCCCCCCCCCCC YCOZIPAWZNQLMR-UHFFFAOYSA-N 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000004386 diacrylate group Chemical group 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 238000011417 postcuring Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical group COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 2
- MUZDXNQOSGWMJJ-UHFFFAOYSA-N 2-methylprop-2-enoic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.CC(=C)C(O)=O MUZDXNQOSGWMJJ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- COYPJOXAWCRUGJ-UHFFFAOYSA-N C(C=C)(=O)O.CCCCCCCCCCCCCCC.C(C=C)(=O)O Chemical compound C(C=C)(=O)O.CCCCCCCCCCCCCCC.C(C=C)(=O)O COYPJOXAWCRUGJ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- GNVMUORYQLCPJZ-UHFFFAOYSA-M Thiocarbamate Chemical compound NC([S-])=O GNVMUORYQLCPJZ-UHFFFAOYSA-M 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- RGBXDEHYFWDBKD-UHFFFAOYSA-N propan-2-yl propan-2-yloxy carbonate Chemical compound CC(C)OOC(=O)OC(C)C RGBXDEHYFWDBKD-UHFFFAOYSA-N 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の背景〕
〈産業上の利用分野〉
本発明は、光ディスク基板、とりわけ情報の書込み及び
消去可能な光ディスク用の基板、に関する。さらに具体
的には、本発明は、複屈折、耐熱性、透明性及び記録膜
等の保護に優れた光ディスク基板を製造する方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION BACKGROUND OF THE INVENTION Field of Industrial Application The present invention relates to optical disc substrates, particularly to substrates for optical discs on which information can be written and erased. More specifically, the present invention relates to a method for manufacturing an optical disc substrate that is excellent in birefringence, heat resistance, transparency, and protection of recording films and the like.
〈従来の技術〉
光ディスク基板に用いられる樹脂としては、ポリメチル
メタクリレート樹脂及びポリカーホネト樹脂が代表的で
ある。しかしなから前者は、複屈折等の光学的特性に優
れる反面、耐熱性、吸水性とりわけ吸水時の形状保持性
、に問届かあり、一方後者は、前者と比較して耐熱性、
吸水性に優れるものの光学的特性等未だ改良すべぎ問題
点を有している。<Prior Art> Typical resins used for optical disc substrates are polymethyl methacrylate resin and polycarbonate resin. However, while the former has excellent optical properties such as birefringence, it has poor heat resistance, water absorption, and especially shape retention during water absorption.
Although it has excellent water absorption, it still has problems such as optical properties that need improvement.
上記の樹脂が保有する本質的な問題点を解決するべく種
々の提案がなされており、なかでも、分子中に重合性官
能基を複数個有する熱硬化性樹脂を注型重合する方法に
より優れた特性を有する基板が得られている（特開昭６
１−１７４２０８号、特開昭６１−２７５３１−２号、
特開昭６１−２８７９１、３号、特開昭６２−２２５５
０８号各公報等）。Various proposals have been made to solve the essential problems of the above-mentioned resins, and among them, a superior method of casting a thermosetting resin having multiple polymerizable functional groups in the molecule has been proposed. A substrate with characteristics has been obtained (Japanese Patent Application Laid-open No. 6
No. 1-174208, JP-A-61-27531-2,
JP-A No. 61-28791, No. 3, JP-A No. 62-2255
08 publications, etc.).
ところで多官能性のラジカル重合性基を有する化合物を
使用した系は、注型重合における生産性の低さを克服す
るものとして注目すべき技術のひとつである（特開昭６
２−１８２２３号、特開昭６２−２７９９１０号各公報
′：５）。By the way, a system using a compound having a polyfunctional radically polymerizable group is one of the technologies that should be noted as it can overcome the low productivity in cast polymerization (Japanese Patent Application Laid-Open No.
No. 2-18223 and Japanese Unexamined Patent Publication No. 62-279910': 5).
しかしながら、一般に知られている通り、多官能性のラ
ジカル重合性基を有する化合物を注型重合する際にその
ラジカル重合性基を全て反応させることは極めて困難で
あり、多くの場合に、これらは未反応モノマー（少なく
とも１個のラジカル重合性基が未重合で存在しているも
のを未反応モノマーと総称することにする）として重合
体中に残存する。この未反応モノマーは吸水時の・Ｊ゛
法法定定性低下、更に又記録膜等の金属薄膜の腐食等、
致命的な欠陥が発生する要因となり、実用に供す（Ｉ）
（ＲおよびＲ２は、同一でも異なってもよくて、それぞ
れ水素またはメチル基である。ｎは、０又は１の整数で
ある。）
〈発明の効果〉
本発明の手法を用いることにより、光ディスク基板を製
造する際、多官能性の（メタ）アクリル酸エステル化合
物の注型重合において、極めて容易に重合度、とりわけ
表面（＝１近のアクリル酸又はメタクリル酸エステル残
基の反応率、を高めることが可能である。更に、表面の
未反応モノマーの残存率が低減することにより、記録膜
等の金属薄膜の腐食が抑制されることが期待できる。However, as is generally known, it is extremely difficult to react all of the radically polymerizable groups during cast polymerization of compounds having polyfunctional radically polymerizable groups, and in many cases, these radically polymerizable groups are The monomers remain in the polymer as unreacted monomers (those in which at least one radically polymerizable group is present in an unpolymerized state are collectively referred to as unreacted monomers). This unreacted monomer causes deterioration of the J law constant when water is absorbed, and corrosion of metal thin films such as recording films.
(I) (R and R2 may be the same or different, and each is hydrogen or a methyl group. n is an integer of 0 or 1.) <Effects of the Invention> By using the method of the present invention, when producing an optical disk substrate, the degree of polymerization, especially the surface (approximately 1), can be extremely easily controlled in the cast polymerization of a polyfunctional (meth)acrylic acid ester compound. It is possible to increase the reaction rate of acrylic acid or methacrylic acid ester residues.Furthermore, by reducing the residual rate of unreacted monomers on the surface, corrosion of metal thin films such as recording films can be suppressed. can be expected.
［Ｉ］単量体およびその重合
く単量体〉
本発明で使用する上式（Ｉ）の化合物の具体例る上にお
いて未反応モノマー含有率の低い基数か切に要望されて
いるのが現状である。[I] Monomer and its polymerizable monomer> When specifying the compound of the above formula (I) used in the present invention, there is an urgent need for a number of groups with a low content of unreacted monomers. It is.
〈発明が克服しようとする課題〉
本発明は、多官能性ラジカル重合性基をａする化合物を
注型重合して、光ディスク是板を１りる際にその基板中
とりわけ表面部分に含まれる未反応モノマーの量を低減
することを目的としたものである。<Problems to be Solved by the Invention> The present invention aims to eliminate undesirable substances contained in the substrate, especially in the surface area, by cast-polymerizing a compound having a polyfunctional radically polymerizable group. The purpose is to reduce the amount of reactive monomers.
く課題を解決するための手段〉
上記の課題を解決する手段として本発明による光ディス
ク基板の製造法は、下式（Ｉ）で示される多官能性（メ
タ）アクリル酸エステル化合物をラジカル重合させて重
合体を板状体として得るかあるいは板状体に加工するこ
とからなる光ディスク基板の製造法において、得られた
光ディスク基板を不活性ガス雰囲気下で紫外線照射して
光ディスク基板の表面の重合度を高めること、を特徴と
するものである。Means for Solving the Problems> As a means for solving the above problems, the method for manufacturing an optical disk substrate according to the present invention comprises radically polymerizing a polyfunctional (meth)acrylic acid ester compound represented by the following formula (I). In a method for manufacturing an optical disk substrate that involves obtaining or processing a polymer into a plate-like body, the degree of polymerization on the surface of the optical disk substrate is determined by irradiating the obtained optical disk substrate with ultraviolet rays in an inert gas atmosphere. It is characterized by enhancing.
としでは、ビス（オキシメチル）トリシクロ〔５゜２．
１．０２” ］ ］デカンフジアクリレ−１、ビス（オ
キシメチル）トリシクロ［５，２，１゜０２°６〕デカ
ン＝ジメタクリレート、ビス（オキシメチル）トリシク
ロ［５，２，１，０２”）デカンニアクリレートメタク
リレート及びこれらの混合物、ビス（オキシメチル）ペ
ンタシクロ〔６゜３・６２・７０９．１３〕ペンタデカ
ン５．１．１． ０゜
＝ジアクリレート、ビス（オキシメチル）ペンタシクロ
［６，５，１，１，３°６ ｏ、 ２，７０９．１３〕
ペンタデカン＝ジアクリレート、ビス（オキシメチル）
ペンタシクロ（６，５，１，１，３”ｏ、 ２′７０９
゛１３）ペンタデカン＝アクリレートメタクリレ−１・
及びこれらの混合物である。これら上記のトリシクロデ
カン化合物及びペンタシクロペンタデカン化合物は群内
の外に群間て２種以上を併用しても良い。For example, bis(oxymethyl)tricyclo[5゜2.
1.02"] ] Decane-diacrylate-1, bis(oxymethyl)tricyclo[5,2,1°02°6] Decane-dimethacrylate, bis(oxymethyl)tricyclo[5,2,1,02" ) Decanenia acrylate methacrylate and mixtures thereof, bis(oxymethyl)pentacyclo[6°3.62.709.13]pentadecane 5.1.1. 0°=diacrylate, bis(oxymethyl)pentacyclo[6,5,1,1,3°6o, 2,709.13]
Pentadecane diacrylate, bis(oxymethyl)
Pentacyclo (6,5,1,1,3"o, 2'709
゛13) Pentadecane = acrylate methacrylate -1.
and mixtures thereof. Two or more of these tricyclodecane compounds and pentacyclopentadecane compounds may be used in combination within or between groups.
本発明での重合対象としての！ｌ”−量体は、上記の式
（Ｉ）の化合物から主としてなるものである。As a polymerization target in the present invention! l''-mers are those consisting primarily of compounds of formula (I) above.
ここで「主としてなる」ということは、式（Ｉ）の化合
物１００重量部に対して、０〜２０重量部の共重合性単
量体を併用してもよいことを意味する。Here, "mainly" means that 0 to 20 parts by weight of the copolymerizable monomer may be used in combination with 100 parts by weight of the compound of formula (I).
すなわち、本発明では、上記式（Ｉ）の化合物に対して
本発明の目的を損なうことのない範囲でラジカル重合性
の化合物を（Ｊｌ用することができる。That is, in the present invention, a radically polymerizable compound can be added to the compound of formula (I) within a range that does not impair the object of the present invention.
そのような共単量体の具体的な例としては、メチルアク
リレート、メチルメタクリレ−１・等の一官能性のアク
リル酸及びメタクリル酸エステル類、スチレン等の芳香
族ビニル化合物類、ビスフェノルーＡのエチレンオキザ
イト付加体のジアクリレート及びジメタクリレート等の
二官能性のアクリル酸及びメタクリル酸エステル類へ−
か挙げられる。これらラジカル重合性の化合物の使用量
は、式（Ｉ）の化合物１００重量部に対して２０宙量部
以下である。Specific examples of such comonomers include monofunctional acrylic and methacrylic esters such as methyl acrylate and methyl methacrylate-1, aromatic vinyl compounds such as styrene, and bisphenol-A. To difunctional acrylic acid and methacrylic acid esters such as diacrylate and dimethacrylate of ethylene oxite adducts.
Can be mentioned. The amount of these radically polymerizable compounds used is 20 parts by weight or less per 100 parts by weight of the compound of formula (I).
［Ｉ［］重合
式（Ｉ）の化合物を重合させて、光ディスク基板を製造
する方法については、種々の提案が既に公開されている
。式（Ｉ）の化合物をラジカル重合させるのに必要な過
酸化物及び／又は光開始剤を混合し、注形型の中に注入
後熱及び／又は紫外線を使用して基板とする方法が一般
的であり、本発明もこれに従うことができる。[I[] Various proposals have already been published regarding methods for manufacturing optical disc substrates by polymerizing the compound of polymerization formula (I). A common method is to mix the peroxide and/or photoinitiator necessary for radical polymerization of the compound of formula (I), pour it into a casting mold, and then use heat and/or ultraviolet rays to form a substrate. The present invention can also follow this principle.
ここで使用される過酸化物としては、過酸化ベンゾイル
、ジイソプロピルパーオキシカーホネト、ラウロイルパ
ーオキサイド、ターシャリ−ブチルパーオキシピバレー
ト、ジクミルパーオキサイド、アゾイソブチロニトリル
等である。又、光開始剤の具体例としては、ベンゾフェ
ノン、ベンゾインエチルエーテル、ベンジル、アセトフ
ェノン、アントラキノン、ジフェニルサルファイド、チ
オカーバメート等の硫黄化合物などである。Examples of peroxides used here include benzoyl peroxide, diisopropyl peroxycarbonate, lauroyl peroxide, tertiary-butyl peroxypivalate, dicumyl peroxide, azoisobutyronitrile, and the like. Specific examples of photoinitiators include sulfur compounds such as benzophenone, benzoin ethyl ether, benzyl, acetophenone, anthraquinone, diphenyl sulfide, and thiocarbamate.
これらの過酸化物及び光開始剤の使用量は、前記式（Ｉ
）の化合物１００重量部に対して０．０１〜２０重量部
、好ましくは、０．１〜１０重量部、の範囲である。The amounts of these peroxides and photoinitiators to be used are based on the formula (I
) is in the range of 0.01 to 20 parts by weight, preferably 0.1 to 10 parts by weight, per 100 parts by weight of the compound.
熱及び／又は紫外線を使用して型中で式（Ｉ）の化合物
を重合させて、重合体の形成と成形を同時に行って基板
とする方法では、重合時の収縮に伴う光学的な歪、外観
上の形状歪、例えば平面度、表面粗度等の発生を極力抑
制する必要かある。それを解決する方法として、プリキ
ュアー／ポストキュアーの二段法、すなわち、熱及び／
又は紫外線を用い、型中で基板の形状を保持できる程度
に重合させた後、脱型し、加熱することによりポストキ
ュアーを行なう方法か好ましい。In the method of polymerizing the compound of formula (I) in a mold using heat and/or ultraviolet rays, and simultaneously forming and molding the polymer to form a substrate, optical distortion due to shrinkage during polymerization, It is necessary to suppress as much as possible the occurrence of shape distortions in appearance, such as flatness and surface roughness. As a way to solve this problem, a two-step precure/post-cure method is proposed, namely heat and/or
Alternatively, it is preferable to use ultraviolet rays to polymerize the substrate to the extent that it can maintain its shape in the mold, then remove it from the mold, and perform post-curing by heating.
プリキュアーは、室温〜１００℃の温度で、空気又は不
活性ガス中で実施することができる。脱型は、不活性ガ
ス中で行なった後、２枚のガラス板及びスペーサーより
成るポストキュアー用の型の中に基板を種石する。ポス
トキュアーの条件は、１５０℃〜２００°Ｃ１空気又は
不活性ガス中で実施できる。Precure can be carried out in air or inert gas at temperatures from room temperature to 100°C. After demolding is performed in an inert gas, the substrate is seeded into a post-cure mold consisting of two glass plates and a spacer. Post-cure conditions can be carried out at 150°C to 200°C in air or inert gas.
このように、重合体を直接に板状体（必ずしも最終の形
態ではなく、表面仕上げを更に行なう場合を包含する）
として得る代りに、重合体を最終の板状体以外の形状で
得て、それを加工して最終の板状体として光ディスク基
板を得ることもできる。In this way, the polymer can be directly applied to a plate (not necessarily in its final form, but also includes cases where surface finishing is further performed).
Instead of obtaining the polymer as a final plate-like body, it is also possible to obtain the polymer in a shape other than the final plate-like body and process it to obtain the optical disk substrate as the final plate-like body.
上記の方法により、形状、光学的特性、耐熱性等に優れ
た光ディスク基板を製造することかＩＩＪ能であるが、
本基板の重合度、すなわち式（Ｉ）の（メタ）アクリル
酸エステル化合物の反応率、は９５％を越えることは困
難であって、未反応モノマーが残存していることは前記
したところである。It is possible to manufacture an optical disc substrate with excellent shape, optical properties, heat resistance, etc. by the above method, but
As mentioned above, it is difficult for the degree of polymerization of this substrate, that is, the reaction rate of the (meth)acrylic acid ester compound of formula (I), to exceed 95%, and unreacted monomers remain.
［ｍ１表面重合
本発明の光ディスク基板の製造法は、上記で得られた基
板の表面付近の（メタ）アクリル酸エステル化合物の反
応率を高めて、未反応モノマーの残存量を低減する方法
である。[m1 Surface Polymerization The method for producing an optical disk substrate of the present invention is a method of increasing the reaction rate of the (meth)acrylic acid ester compound near the surface of the substrate obtained above and reducing the amount of residual unreacted monomer. .
前記のポストキュアーを行なった型中にある基板を所定
の温度に保った後、型を構成するガラスを通して紫外線
を照射する。本発明で使用する紫外線は、０．１〜６０
０ｎｍ、好ましくは、１９０〜４３０ｎｍ、の波長を有
するものか適当であり、被照射物表面において１〜３０
０ｍＪ／ｃれ好ましくは５〜２００ｍＪ／ｃ♂、の全光
量を照射する。５ｍＪ／ｃ／未満では効果が少なく、２
００ｍＪ／ｃｎ〒を越えては、不経済である。紫外線を
照射する時の披照射物、すなわちガラス型の中にあるデ
ィスク基板、の温度は、室温〜２００℃の範囲にあれば
よい。温度を高くすることにより、紫外線照射光量が低
減され、作業時間が短縮されるが、一方高温では得られ
る光ディスク基板か著しく着色し、記録／消去／読取り
に使用されるレーサー光の透過率が低下し、実用上大き
な問題となる。紫外線を照射する方法としては、前記の
ごとくポストキュアーを行った後、不活性ガス雰囲気下
で脱型後、ガラス型及びスペーサーを用いることなく、
同様の雰囲気下で紫外線照射を実施しても良い。After the substrate in the mold, which has undergone the above-mentioned post-curing, is maintained at a predetermined temperature, ultraviolet rays are irradiated through the glass constituting the mold. The ultraviolet rays used in the present invention are 0.1 to 60
0 nm, preferably 190 to 430 nm, or an appropriate wavelength of 1 to 30 nm on the surface of the irradiated object.
A total light amount of 0 mJ/c, preferably 5 to 200 mJ/c♂ is irradiated. Less than 5 mJ/c/ has little effect;
If it exceeds 00 mJ/cn〒, it is uneconomical. The temperature of the object to be irradiated, that is, the disk substrate in the glass mold, when irradiated with ultraviolet rays may be in the range of room temperature to 200°C. Increasing the temperature reduces the amount of ultraviolet irradiation and shortens the working time, but at high temperatures, the resulting optical disc substrate becomes markedly colored and the transmittance of the laser light used for recording/erasing/reading decreases. However, this poses a big problem in practice. The method of irradiating ultraviolet rays is to perform post-curing as described above, then demold under an inert gas atmosphere, and then without using a glass mold or spacer.
Ultraviolet irradiation may be performed in a similar atmosphere.
［ＩＶ］実施例
参考例（光ディスク基板の製造例）
ビス（オキシメチル）トリシクロ（５，２，１゜０２．
８〕デカン＝アクリレートメタクリレ−１・（ジアクリ
レート体１６％、ジメタクリレート体３６％及びアクリ
レート／メタクリレート交叉体４８％とから成る混合物
）１００部に対して、１ヒドロキシシクロへキシルフェ
ニルケトン（「イルガキュアー１８４Ｊ、チバガイギー
社品）０．１部及びジクミルパーオキサイド１． ０部
（いずれも重量部）を加えて均一に攪拌ＧＰした後、脱
泡した。次いで、この液を、ガラス板とシリコーンゴム
で構成された、直径１３ｃｍで厚み１．５ｍｍの鋳型の
中へ注入した。出力８０ Ｗ ／ ｃｍの高圧水銀灯を
用いてガラス板面より１５秒間紫外線を照射したところ
、液状部分のない硬化物が得られた。更にこの硬化物を
エアーオーブン１１１５０°Ｃで２時間加熱して、無色
透明の光ディスク基板状の硬化物を得た。[IV] Reference Example (Manufacturing Example of Optical Disc Substrate) Bis(oxymethyl)tricyclo(5,2,1°02.
8] Decane = acrylate methacrylate-1 (mixture consisting of 16% diacrylate, 36% dimethacrylate and 48% acrylate/methacrylate cross-body) to 100 parts of 1-hydroxycyclohexyl phenyl ketone (1) After adding 0.1 part of Irgacure 184J (Ciba Geigy product) and 1.0 part of dicumyl peroxide (all parts by weight) and stirring uniformly, defoaming was performed.Then, this liquid was placed on a glass plate and It was injected into a mold made of silicone rubber with a diameter of 13 cm and a thickness of 1.5 mm.Using a high-pressure mercury lamp with an output of 80 W/cm, the glass plate surface was irradiated with ultraviolet rays for 15 seconds, and it was cured without any liquid part. This cured product was further heated in an air oven at 11,150° C. for 2 hours to obtain a colorless and transparent cured product in the form of an optical disc substrate.
光ディスク基板の表面反応性は、赤外吸収スペクトル分
析における多重反射法（ＡＴＲ−ＦＴ法）を用で（Ｄｉ
ｇｉｌａｂ社製ＦＴＳ−］５ＣＦＴＩＲ装置ＫＲ８−５
反射板）、スペクトル中の炭素炭素二重結合に由来する
ピークの変化より、その反応度を見積った。The surface reactivity of the optical disk substrate can be measured using the multiple reflection method (ATR-FT method) in infrared absorption spectrum analysis (Di
gilab FTS-]5CFTIR device KR8-5
The degree of reactivity was estimated from the change in peaks derived from carbon-carbon double bonds in the spectrum.
炭素−炭素二重結合の減少率（α）は、下式より求めた
。The reduction rate (α) of carbon-carbon double bonds was determined from the following formula.
α−１００Ｘ （Ｉ−γＩ／γ０）
γ 及びγ１は、各々上記二重結合の照射及び１
２−
照射後の残存率を示す。γ１／γ。は、各々の赤外吸収
スペクトルにおける上記二重結合に由来する吸収ピーク
（８１０ｃｍ ’）とカルホキシル基に由来する吸収ピ
ーク（Ｉ７３０ｃｍ−１）の吸収強度比より算出するこ
とができる。α-100X (I-γI/γ0) γ and γ1 indicate the residual rate of the double bond after irradiation and 1 2- irradiation, respectively. γ1/γ. can be calculated from the absorption intensity ratio of the absorption peak (810 cm') derived from the double bond and the absorption peak (I730 cm-1) derived from the carboxyl group in each infrared absorption spectrum.
実施例１〜５
参考例に示した方法で得られた光ディスク基板を窒素下
でガラス板及びシリコーンゴムスペーサで構成された型
の中に挿着し、所定の温度（表１に記載）に加熱した後
、ガラス板面より、出力８０Ｗ／ｃｍの高圧水銀灯を用
いて、所定の全光量（表−１に記載）となるように紫外
線を照射した。照射面の表面における炭素−炭素二重結
合の減少率及び外観評価の結果を表−１にまとめて示し
た。Examples 1 to 5 Optical disk substrates obtained by the method shown in Reference Examples were inserted into a mold made of a glass plate and a silicone rubber spacer under nitrogen, and heated to a predetermined temperature (listed in Table 1). After that, ultraviolet rays were irradiated from the glass plate surface using a high-pressure mercury lamp with an output of 80 W/cm so as to provide a predetermined total light intensity (listed in Table 1). The reduction rate of carbon-carbon double bonds on the surface of the irradiated surface and the results of appearance evaluation are summarized in Table 1.
比較例１
製造例に示した方法で得られた光ディスク基板をエアー
オーブン中２４０℃で１時間加熱した。Comparative Example 1 An optical disc substrate obtained by the method shown in Production Example was heated at 240° C. for 1 hour in an air oven.
１υられた基板は、著しく着色しており、表面部におけ
る炭素−炭素二重結合の消失が確認されるものの、赤外
吸収スペクトルの各吸収帯の＋ｌ＋が広がっていて、上
記の結合部以外による架橋反応が生じていることを示し
た。結果を表−１に示した。The 1υ substrate was significantly colored, and although it was confirmed that the carbon-carbon double bond had disappeared on the surface, the +l+ of each absorption band in the infrared absorption spectrum was broadened, indicating that it was not caused by bonds other than those mentioned above. This showed that a crosslinking reaction was occurring. The results are shown in Table-1.
第１図、第２図及び第３図は、各々参考例、実施例５及
び比較例１で得られた光ディスク基板の表面赤外吸収ス
ペクトル図である。FIG. 1, FIG. 2, and FIG. 3 are surface infrared absorption spectra of optical disk substrates obtained in Reference Example, Example 5, and Comparative Example 1, respectively.
Claims (1)
エステル化合物から主としてなる中、量体をラジカル重
合させて重合体を板状体として得るかあるいは板状体に
加工することからなる光ディスク基板の製造法において
、得られた光ディスク基板を不活性ガス雰囲気下で紫外
線照射して光ディスク基板の表面の重合度を高めること
を特徴とする、光ディスク基板の製造法。 ▲数式、化学式、表等があります▼（ I ） （Ｒ＿１およびＲ＿２は、同一でも異なってもよくて、
それぞれ水素又はメチル基である。ｎは、０又は１の整
数である。）[Scope of Claims] Mainly consisting of a polyfunctional (meth)acrylic acid ester compound represented by the following formula (I), the polymer is obtained in the form of a plate by radical polymerization of the polymer, or the polymer is obtained in the form of a plate. A method for producing an optical disc substrate comprising processing the optical disc substrate, the method comprising: irradiating the obtained optical disc substrate with ultraviolet rays in an inert gas atmosphere to increase the degree of polymerization on the surface of the optical disc substrate. ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) (R_1 and R_2 may be the same or different,
Each is hydrogen or methyl group. n is an integer of 0 or 1. )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1147012A JP2778988B2 (en) | 1989-06-09 | 1989-06-09 | Manufacturing method of optical materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1147012A JP2778988B2 (en) | 1989-06-09 | 1989-06-09 | Manufacturing method of optical materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0312837A true JPH0312837A (en) | 1991-01-21 |
| JP2778988B2 JP2778988B2 (en) | 1998-07-23 |
Family
ID=15420554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1147012A Expired - Fee Related JP2778988B2 (en) | 1989-06-09 | 1989-06-09 | Manufacturing method of optical materials |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2778988B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10144469A (en) * | 1996-09-12 | 1998-05-29 | Mitsubishi Chem Corp | Organic electroluminescent element and manufacture thereof |
| WO2006051895A1 (en) * | 2004-11-15 | 2006-05-18 | Nippon Kayaku Kabushiki Kaisha | Ultraviolet curable resin composition and curing product thereof |
| JP2008218421A (en) * | 1996-09-12 | 2008-09-18 | Mitsubishi Chemicals Corp | Organic electroluminescent element and its manufacturing method |
| JP2009042448A (en) * | 2007-08-08 | 2009-02-26 | Konica Minolta Opto Inc | Method of manufacturing optical device and optical device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61174208A (en) * | 1985-01-28 | 1986-08-05 | Mitsubishi Petrochem Co Ltd | Production of resin for molding optical disc |
| JPS63214375A (en) * | 1987-02-27 | 1988-09-07 | Sumitomo Metal Ind Ltd | Anticorrosion treatment of metal with ultraviolet curable resin |
-
1989
- 1989-06-09 JP JP1147012A patent/JP2778988B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61174208A (en) * | 1985-01-28 | 1986-08-05 | Mitsubishi Petrochem Co Ltd | Production of resin for molding optical disc |
| JPS63214375A (en) * | 1987-02-27 | 1988-09-07 | Sumitomo Metal Ind Ltd | Anticorrosion treatment of metal with ultraviolet curable resin |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10144469A (en) * | 1996-09-12 | 1998-05-29 | Mitsubishi Chem Corp | Organic electroluminescent element and manufacture thereof |
| JP2008218421A (en) * | 1996-09-12 | 2008-09-18 | Mitsubishi Chemicals Corp | Organic electroluminescent element and its manufacturing method |
| WO2006051895A1 (en) * | 2004-11-15 | 2006-05-18 | Nippon Kayaku Kabushiki Kaisha | Ultraviolet curable resin composition and curing product thereof |
| JP2009042448A (en) * | 2007-08-08 | 2009-02-26 | Konica Minolta Opto Inc | Method of manufacturing optical device and optical device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2778988B2 (en) | 1998-07-23 |
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