JPH03117711U - - Google Patents

Info

Publication number
JPH03117711U
JPH03117711U JP2716690U JP2716690U JPH03117711U JP H03117711 U JPH03117711 U JP H03117711U JP 2716690 U JP2716690 U JP 2716690U JP 2716690 U JP2716690 U JP 2716690U JP H03117711 U JPH03117711 U JP H03117711U
Authority
JP
Japan
Prior art keywords
sample
electron beam
chamber
length measuring
measuring device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2716690U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2716690U priority Critical patent/JPH03117711U/ja
Publication of JPH03117711U publication Critical patent/JPH03117711U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本考案の一実施例を示す電子線測長装
置の縦断面図である。 １……電子鏡、２……電子ビーム、３……収束
レンズ、４……対物レンズ、５……試料ステージ
、６……試料、１０……ＣＲＴ、１１……鏡筒、
１２……試料室、１３……ロードロツク室、ベー
ス板、２１……試料搬送装置、２４……荷重板、
２６……架台、３０……位置変動防止機構。 FIG. 1 is a longitudinal sectional view of an electron beam length measuring device showing an embodiment of the present invention. 1... Electron mirror, 2... Electron beam, 3... Converging lens, 4... Objective lens, 5... Sample stage, 6... Sample, 10... CRT, 11... Lens barrel,
12...Sample chamber, 13...Load lock chamber, base plate, 21...Sample transport device, 24...Load plate,
26... Frame, 30... Position fluctuation prevention mechanism.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子線を細く絞り試料に照射する電子光学系を
含めた鏡筒、試料を水平方向に移動する機構を含
めた試料室及び該試料室に試料を搬送する際予備
排気を行なうロードロツク室を荷重板で支持した
鏡体と試料収納箱から試料を取り出しロードロツ
ク室へ搬送する試料搬送装置と該鏡体及び該試料
搬送装置を防振マウントを介して架台に設置した
電子線測長装置において、試料搬送装置と荷重板
の間に位置変動防止機構を設けたことを特徴とす
る電子線測長装置。 The load plate includes the lens barrel that includes the electron optical system that narrows the electron beam and irradiates the sample, the sample chamber that includes the mechanism that moves the sample horizontally, and the load lock chamber that performs preliminary exhaust when transporting the sample to the sample chamber. In an electron beam length measuring device, the sample transport device takes out the sample from the mirror supported by the mirror and the sample storage box and transports it to the load lock chamber. An electron beam length measuring device characterized in that a positional fluctuation prevention mechanism is provided between the device and a load plate.
JP2716690U 1990-03-19 1990-03-19 Pending JPH03117711U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2716690U JPH03117711U (en) 1990-03-19 1990-03-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2716690U JPH03117711U (en) 1990-03-19 1990-03-19

Publications (1)

Publication Number Publication Date
JPH03117711U true JPH03117711U (en) 1991-12-05

Family

ID=31530034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2716690U Pending JPH03117711U (en) 1990-03-19 1990-03-19

Country Status (1)

Country Link
JP (1) JPH03117711U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005038853A (en) * 2003-07-14 2005-02-10 Fei Co Double beam apparatus
KR101396648B1 (en) * 2013-05-13 2014-05-16 서희주 Fixing device of accessory

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005038853A (en) * 2003-07-14 2005-02-10 Fei Co Double beam apparatus
JP2011210740A (en) * 2003-07-14 2011-10-20 Fei Co Dual beam system
KR101396648B1 (en) * 2013-05-13 2014-05-16 서희주 Fixing device of accessory

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