JPH0310243A - Antistatic layer - Google Patents
Antistatic layerInfo
- Publication number
- JPH0310243A JPH0310243A JP14600589A JP14600589A JPH0310243A JP H0310243 A JPH0310243 A JP H0310243A JP 14600589 A JP14600589 A JP 14600589A JP 14600589 A JP14600589 A JP 14600589A JP H0310243 A JPH0310243 A JP H0310243A
- Authority
- JP
- Japan
- Prior art keywords
- group
- salt
- polymer particles
- hydrophobic polymer
- silver halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims abstract description 17
- 229920001600 hydrophobic polymer Polymers 0.000 claims abstract description 16
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 10
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000003839 salts Chemical class 0.000 claims abstract description 8
- 239000002985 plastic film Substances 0.000 claims abstract description 6
- 229920006255 plastic film Polymers 0.000 claims abstract description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- -1 silver halide Chemical class 0.000 abstract description 40
- 229910052709 silver Inorganic materials 0.000 abstract description 24
- 239000004332 silver Substances 0.000 abstract description 24
- 239000000463 material Substances 0.000 abstract description 20
- 229920000642 polymer Polymers 0.000 abstract description 17
- 238000011161 development Methods 0.000 abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 239000004816 latex Substances 0.000 abstract description 9
- 229920000126 latex Polymers 0.000 abstract description 9
- 238000012545 processing Methods 0.000 abstract description 9
- 239000004848 polyfunctional curative Substances 0.000 abstract description 4
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 14
- 108010010803 Gelatin Proteins 0.000 description 11
- 229920000159 gelatin Polymers 0.000 description 11
- 239000008273 gelatin Substances 0.000 description 11
- 235000019322 gelatine Nutrition 0.000 description 11
- 235000011852 gelatine desserts Nutrition 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 239000000839 emulsion Substances 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 6
- 125000002947 alkylene group Chemical group 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000000732 arylene group Chemical group 0.000 description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 3
- 239000012964 benzotriazole Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 208000028659 discharge Diseases 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007720 emulsion polymerization reaction Methods 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- FJWJYHHBUMICTP-UHFFFAOYSA-N 4,4-dimethylpyrazolidin-3-one Chemical compound CC1(C)CNNC1=O FJWJYHHBUMICTP-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005250 alkyl acrylate group Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- 125000004069 aziridinyl group Chemical group 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000000626 sulfinic acid group Chemical group 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- OXLXSOPFNVKUMU-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid Chemical class CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC OXLXSOPFNVKUMU-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- AHABMLPWPUZVOI-UHFFFAOYSA-N 1-n,1-n-diethylbenzene-1,2,4-triamine Chemical compound CCN(CC)C1=CC=C(N)C=C1N AHABMLPWPUZVOI-UHFFFAOYSA-N 0.000 description 1
- XIROXSOOOAZHLL-UHFFFAOYSA-N 2',3',4'-Trihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C(O)=C1O XIROXSOOOAZHLL-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- IQMGXSMKUXLLER-UHFFFAOYSA-N 2-hydroxy-5-sulfobenzoic acid;sodium Chemical compound [Na].OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O IQMGXSMKUXLLER-UHFFFAOYSA-N 0.000 description 1
- LLOAINVMNYBDNR-UHFFFAOYSA-N 2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=C2NC(=S)NC2=C1 LLOAINVMNYBDNR-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- YBMTWYWCLVMFFD-UHFFFAOYSA-N 3-methylbutyl 3,4,5-trihydroxybenzoate Chemical compound CC(C)CCOC(=O)C1=CC(O)=C(O)C(O)=C1 YBMTWYWCLVMFFD-UHFFFAOYSA-N 0.000 description 1
- UIHHTFWECCZVRB-UHFFFAOYSA-N 4-amino-2-phenyl-4h-pyrazol-3-one Chemical compound O=C1C(N)C=NN1C1=CC=CC=C1 UIHHTFWECCZVRB-UHFFFAOYSA-N 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- BQCIJWPKDPZNHD-UHFFFAOYSA-N 5-bromo-2h-benzotriazole Chemical compound C1=C(Br)C=CC2=NNN=C21 BQCIJWPKDPZNHD-UHFFFAOYSA-N 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- RPWFJAMTCNSJKK-UHFFFAOYSA-N Dodecyl gallate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 RPWFJAMTCNSJKK-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- NWBJYWHLCVSVIJ-UHFFFAOYSA-N N-benzyladenine Chemical compound N=1C=NC=2NC=NC=2C=1NCC1=CC=CC=C1 NWBJYWHLCVSVIJ-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N anhydrous gallic acid Natural products OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- VOVLASAYEAYVHD-UHFFFAOYSA-N benzene-1,4-diol;1-phenylpyrazolidin-3-one Chemical compound OC1=CC=C(O)C=C1.N1C(=O)CCN1C1=CC=CC=C1 VOVLASAYEAYVHD-UHFFFAOYSA-N 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- XOPOEBVTQYAOSV-UHFFFAOYSA-N butyl 3,4,5-trihydroxybenzoate Chemical compound CCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 XOPOEBVTQYAOSV-UHFFFAOYSA-N 0.000 description 1
- IYCOKCJDXXJIIM-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1.CCCCOC(=O)C=C IYCOKCJDXXJIIM-UHFFFAOYSA-N 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical group C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- 239000000555 dodecyl gallate Substances 0.000 description 1
- 235000010386 dodecyl gallate Nutrition 0.000 description 1
- 229940080643 dodecyl gallate Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- MZPBABBOOUENLK-UHFFFAOYSA-N n-ethylethanamine;propane-1,2-diol Chemical compound CCNCC.CC(O)CO MZPBABBOOUENLK-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Chemical class CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical class 0.000 description 1
- WAGFXJQAIZNSEQ-UHFFFAOYSA-M tetraphenylphosphonium chloride Chemical compound [Cl-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 WAGFXJQAIZNSEQ-UHFFFAOYSA-M 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Chemical class 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、プラスチックフィルム用の帯電防止層に関し
、特に帯電防止能の優れたハロゲン化銀写真感光材料に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an antistatic layer for a plastic film, and particularly to a silver halide photographic material with excellent antistatic ability.
一般にプラスチイックフィルムは帯電性が強く、これが
使用上多くの制約を与えている例は多い。Generally, plastic films have strong electrostatic properties, and this often imposes many restrictions on their use.
例えばハロゲン化銀写真感光材料においてはポリエチレ
ンテレフタレートのような支持体が一般に使用されるが
、特に冬季の如き低湿度において帯電し易い。最近のよ
うに高感度写真乳剤を高速度で塗布したり、高感度の感
光拐料を自動プリンターを通して露光処理をする場合、
特に帯電防止対策が重要である。For example, supports such as polyethylene terephthalate are generally used in silver halide photographic materials, but they tend to become electrically charged, especially at low humidity such as in winter. Nowadays, when applying high-sensitivity photographic emulsions at high speeds or exposing high-sensitivity photosensitive materials through automatic printers,
In particular, antistatic measures are important.
感光材料が帯電すると、その放電によりスタチックマー
クがでたり、またはゴミ等の異物を付着し、これにより
ピンホールを発生させたりして著しく品質を劣化し、そ
の修正のため非常に作業性をおとしてしまう。このため
、一般に感光材料では帯電防止剤が使用され、最近では
、含フツ素界面活性剤、カチオン界面活性剤、両性界面
活性剤、ポリエチレンオキサイド基を含有する界面活性
剤ないし高分子化合物、スルホン酸又はリン酸基を分子
内に有するポリマー等が用いられている。When a photosensitive material is charged, static marks appear due to the discharge, or foreign matter such as dust adheres to it, which causes pinholes and significantly degrades the quality, making it extremely difficult to repair. I'll put it down. For this reason, antistatic agents are generally used in photosensitive materials, and recently, fluorine-containing surfactants, cationic surfactants, amphoteric surfactants, surfactants or polymer compounds containing polyethylene oxide groups, and sulfonic acid Alternatively, a polymer having a phosphoric acid group in the molecule is used.
特にフッ素系界面活性剤による帯電列調整、あるいは導
電性ポリマーによる導電性向上が多く使用されてきてお
り、例えば特開昭49−91165号および同49−1
21523号にはポリマー主鎖中に解離基を有するイオ
ン型ポリマーを適用する例が開示されている。In particular, adjusting the charge series using fluorine-based surfactants or improving conductivity using conductive polymers has been widely used, for example, in JP-A-49-91165 and JP-A-49-1.
No. 21523 discloses an example in which an ionic polymer having a dissociative group in the polymer main chain is applied.
しかしながら、これらの従来技術では、現像処理により
、帯電防止能が大幅に劣化してしまう。However, in these conventional techniques, the antistatic ability is significantly deteriorated by the development process.
これはアルカリを用いる現像工程、酸性の定着工程、水
洗等の工程を経ることにより帯電防止能が失われるもの
と思われる。したがって印刷感光材料等のように、処理
済みフィルムをさらに用いてプリントするような場合に
、ゴミの付着によるピンホール発生等の問題を生ずる。This is thought to be because the antistatic ability is lost through processes such as a developing process using an alkali, an acidic fixing process, and washing with water. Therefore, when a processed film is further used for printing, such as with printing photosensitive materials, problems such as pinholes occur due to adhesion of dust.
このため例えば特開昭55−84658号、同61−1
74542号ではカルボキシル基を有する水溶性導電性
ポリマー カルボキシル基を有する疎水性ポリマー及び
多官能アジリジンからなる帯電防止層が提案されている
。この方法によれば処理後にも帯電防止能を残すことが
できるが、疎水性ポリマー粒子の分散安定性が悪く、膜
中で凝集を起こし、帯電防止層の透明性を損なうという
欠点を有していた。For this reason, for example, JP-A Nos. 55-84658 and 61-1
No. 74542 proposes an antistatic layer comprising a water-soluble conductive polymer having a carboxyl group, a hydrophobic polymer having a carboxyl group, and a polyfunctional aziridine. Although this method allows antistatic properties to remain after treatment, it has the disadvantage that the dispersion stability of the hydrophobic polymer particles is poor, causing aggregation in the film and impairing the transparency of the antistatic layer. Ta.
〔発明の目的〕
上記のような問題に対し、本発明の目的は、透明性の優
れたヘーズの無いプラスチックフィルム用の帯電防止層
を提供することであり、別の目的としては、帯電防止に
優れたハロゲン化銀写真感光材料を提供することである
。[Object of the Invention] In order to solve the above-mentioned problems, the object of the present invention is to provide an antistatic layer for a plastic film with excellent transparency and no haze. An object of the present invention is to provide an excellent silver halide photographic material.
本発明の上記目的は、■水溶性導電性ポリマ■疎水性ポ
リマー粒子、■硬化剤の反応生成物からなる帯電防止層
を有してなるプラスチックフィルムにおいて、該疎水性
ポリマー粒子がリン酸基、及び/又はその塩のうちの少
なくとも1つの基を有することを特徴とする帯電防止層
により達成される。The above object of the present invention is to provide a plastic film having an antistatic layer comprising: (1) a water-soluble conductive polymer, (2) hydrophobic polymer particles, and (2) a reaction product of a curing agent, in which the hydrophobic polymer particles have phosphoric acid groups, and/or a salt thereof.
以下、本発明の詳細について説明する。The details of the present invention will be explained below.
本発明の水溶性導電性ポリマーについては、スルホン酸
基、硫酸エステル基、4級アンモニウム塩、3級アンモ
ニウム塩、カルボキシル基、ポリエチレンオキシド基か
ら選ばれる少なくとも1つの導電性基を有するポリマー
が挙げられる。これらの基のうちスルホン酸基、硫酸エ
ステル基、4級アンモニウム塩基が好ましい。導電性基
はポリマー1分子当たり5重量%以上を必要とする。水
溶性の導電性ポリマー中には、ヒドロキシ基、アミノ基
、エポキシ基、アジリジン基、活性メチレン基、スルフ
ィン酸基、アルデヒド基、ビニルスルホン基、ブロック
メチロール基を含んでいるのが好ましい。これらの基は
ポリマー1分子当たり5重量%以上が好ましい。ポリマ
ーの分子量は、3000〜100000であり、好まし
くは3500〜50000である。Examples of the water-soluble conductive polymer of the present invention include polymers having at least one conductive group selected from a sulfonic acid group, a sulfuric acid ester group, a quaternary ammonium salt, a tertiary ammonium salt, a carboxyl group, and a polyethylene oxide group. . Among these groups, sulfonic acid groups, sulfuric acid ester groups, and quaternary ammonium bases are preferred. The amount of conductive groups required is 5% by weight or more per polymer molecule. The water-soluble conductive polymer preferably contains a hydroxy group, an amino group, an epoxy group, an aziridine group, an active methylene group, a sulfinic acid group, an aldehyde group, a vinyl sulfone group, and a block methylol group. The content of these groups is preferably 5% by weight or more per polymer molecule. The molecular weight of the polymer is 3,000 to 100,000, preferably 3,500 to 50,000.
以下、本発明に用いられる水溶性導電性ポリマーの化合
物例を挙げるがこれに限定されるものではない。Examples of water-soluble conductive polymer compounds used in the present invention are listed below, but the present invention is not limited thereto.
(1)
ホモポリマー
(3)
H3
(4)
(5)
(2)
ホモポリマー
(6)
03Na
03Na
≧U31Na
(7)
S03Na
(8)
03Na
(9)
03Na
(10)
CI(3
(15)
CH3
(16)
(17)
CH3
CH2SO3Na
M千1カ
(11)
Q
03Na
o 3Na
(13)
CH3
0J
(14)
(19)
(20)
Ma1万
(21)
(22)
1.5万
(23)
デキストランザルフエイト
(27)
置換度 2.0 M=10万
(24〕
03Na
(25)
03Na
(28)
03Na
(29)
(26)
(30)
2
(31)
尚、上記(1)〜(31)において、X+ y+ zは
それぞれ単量体成分のモル%を、又Mは平均分子量(本
明細書中、平均分子量とは数平均分子量を示す。)を表
す。(1) Homopolymer (3) H3 (4) (5) (2) Homopolymer (6) 03Na 03Na ≧U31Na (7) S03Na (8) 03Na (9) 03Na (10) CI(3 (15) CH3 ( 16) (17) CH3 CH2SO3Na M11,000 (11) Q 03Na o 3Na (13) CH3 0J (14) (19) (20) Ma10,000 (21) (22) 15,000 (23) Dextranzalf Eight (27) Degree of substitution 2.0 M=100,000 (24) 03Na (25) 03Na (28) 03Na (29) (26) (30) 2 (31) In addition, in the above (1) to (31), X+ y+ z each represents the mole % of the monomer component, and M represents the average molecular weight (in this specification, the average molecular weight refers to the number average molecular weight).
これらのポリマーは市販又は常法によって得られるモノ
マーを重合することにより合成することが出来る。These polymers can be synthesized by polymerizing monomers that are commercially available or obtained by conventional methods.
次に本発明の水溶性導電性ポリマー層中に含有させる疎
水性ポリマー粒子は、リン酸基、及び/またはその塩の
うちの少なくとも1つを有し、実質的に水に溶解しない
所謂ラテ・ンクス状で含有されている。この疎水性ポリ
マー中には、N−メチロル基及びその誘導体、アミノ基
、エポキシ基、アジリジン基、活性メチレン基、スルフ
ィン酸基アルデヒド基、ヒニルスルホン基、ブロックイ
ソシアネート基のうちの少なくとも1つの基を含んでい
るのが必要であり、疎水性ポリマー1分子当たり1重量
以上に含まぜるのが好ましい。特に5%以上が好ましい
。この疎水性ポリマーは、スチレン、スチレン誘導体、
アルキルアクリレート、アルキルメタクリレート、オレ
フィン誘導体、ハロゲン化エチレン誘導体、アクリルア
ミド誘導体、メタクリルアミド誘導体、ビニルエステル
誘導体、アクリロニトリル等の中から任意の組み合わせ
で選ばれた七ツマ−を重合して得られる。特にスチレン
誘導体、アルキルアクリレート、アルキルメタクリレー
トが少なくとも30モル%含有されているのが好ましい
。特に50モル%以上が好ましい。Next, the hydrophobic polymer particles contained in the water-soluble conductive polymer layer of the present invention have at least one of a phosphoric acid group and/or a salt thereof, and are substantially insoluble in water. It is contained in the form of a chain. This hydrophobic polymer contains at least one group selected from N-methylol groups and their derivatives, amino groups, epoxy groups, aziridine groups, active methylene groups, sulfinic acid groups, aldehyde groups, hinyl sulfone groups, and blocked isocyanate groups. It is preferable that the amount is 1 weight or more per molecule of the hydrophobic polymer. Particularly preferred is 5% or more. This hydrophobic polymer includes styrene, styrene derivatives,
It is obtained by polymerizing hetamines selected from alkyl acrylates, alkyl methacrylates, olefin derivatives, halogenated ethylene derivatives, acrylamide derivatives, methacrylamide derivatives, vinyl ester derivatives, acrylonitrile, etc. in any combination. In particular, it is preferable that at least 30 mol% of styrene derivatives, alkyl acrylates, and alkyl methacrylates are contained. Particularly preferred is 50 mol% or more.
リン酸基又はその塩を導入するためのモノマーとしては
、−能代〔■〕で表わされるものが好ま一般式〔■〕
R1
CH2=CO
11
Co(A升RR2−0−P−O
0M
式中、R,は水素原子またはメチル基を表し、Aは一〇
−または−NH−を表し、R2は炭素原子数2〜10の
アルキレン基、炭素原子数6〜12のアリーレン基、炭
素原子数7〜13のアルキレンアリーレン基もしくはア
リーレンアルキレン基、または−(−CH2CH20片
刊CHD「(ここで、nは1〜20の整数、mは0〜4
の整数をそれぞれ表す)を表し、Mはアルカリ金属イオ
ン、アルカリ土類金属イオン、アンモニウムイオン、第
4アンモニウム塩イオンのカチオンまたは水素原子を表
す。As a monomer for introducing a phosphoric acid group or a salt thereof, those represented by -Noshiro [■] are preferably used in the general formula [■] , R, represents a hydrogen atom or a methyl group, A represents 10- or -NH-, R2 represents an alkylene group having 2 to 10 carbon atoms, an arylene group having 6 to 12 carbon atoms, and 7 carbon atoms. -13 alkylene arylene group or arylene alkylene group, or -(-CH2CH20 CHD (where n is an integer of 1 to 20, m is 0 to 4
), and M represents a cation of an alkali metal ion, an alkaline earth metal ion, an ammonium ion, a quaternary ammonium salt ion, or a hydrogen atom.
上記一般式〔■〕のR2で表されるアルキレン基または
アルキレン基を有する基では、そのアルキレン基は分岐
でも直鎖でもよく、さらにR2で表される各基は置換基
を有してもよい。R2の置換基としてはハロゲン原子、
水酸基、アリール基等を挙げることができる。In the alkylene group or group having an alkylene group represented by R2 in the above general formula [■], the alkylene group may be branched or straight chain, and each group represented by R2 may have a substituent. . As a substituent for R2, a halogen atom,
Examples include hydroxyl group and aryl group.
以下、A群で表されるモノマー化合物の好ましい具体例
を示す。Preferred specific examples of the monomer compounds represented by Group A are shown below.
−1 CH CH2=CH CH2=CHO I C0OCH2CH20CH2CH20P OHH CH2=CHO 1 CH2CH2CH−0−P−OH C12C40H 5 6 CH3 CH,=C0 1 COOCH2CH2−0−P −ONaNa CH3 CH2=C0 1 COOCHxCH2CH20P Na Na CHl CH2=CO I Coo (CH2CH20)xcH2cH20PH CH −9 0 1 2 CM。-1 CH CH2=CH CH2=CHO I C0OCH2CH20CH2CH20P OHH CH2=CHO 1 CH2CH2CH-0-P-OH C12C40H 5 6 CH3 CH,=C0 1 COOCH2CH2-0-P -ONaNa CH3 CH2=C0 1 COOCHxCH2CH20P Na Na CHl CH2=CO I Coo (CH2CH20)xcH2cH20PH CH -9 0 1 2 CM.
CH
CH2=CH0
11
Coo−IEcH,CH20hCH2−0−PH
CH
CH
CH□−CH0
1
CONI(CH2CH2−0−P−OHH
CH
リン酸基、及び/またはその塩を有するモノマは20モ
ル%以下が好ましい。CH CH2=CHO 11 Coo-IEcH, CH20hCH2-0-PH CH CH CH□-CH0 1 CONI (CH2CH2-0-P-OHH CH The monomer having a phosphoric acid group and/or its salt is preferably 20 mol% or less .
疎水性ポリマーをラテックス状にするには乳化重合をす
る、固体状のポリマーを低沸点溶媒に溶かして微分散後
、溶媒を留去するという2つの方法があるが粒径が細か
<、シかもそろったものができるという点で乳化重合す
ることが好ましい。There are two methods to make a hydrophobic polymer into a latex form: emulsion polymerization, or dissolving a solid polymer in a low boiling point solvent, finely dispersing it, and then distilling off the solvent. Emulsion polymerization is preferable because a complete product can be produced.
乳化重合の際に用いる界面活性剤としては、アニオン性
、ノニオン性を用いるのが好ましく、七ノで−に対し1
0重量%以下が好ましい。多量の界面活性剤は導電性層
をくもらせる原因となる。As the surfactant used during emulsion polymerization, it is preferable to use an anionic or nonionic surfactant.
It is preferably 0% by weight or less. A large amount of surfactant causes clouding of the conductive layer.
疎水性ポリマーの分子量は3000以上であれば良く、
分子量による透明性の差はほとんどない。The molecular weight of the hydrophobic polymer may be 3000 or more,
There is almost no difference in transparency depending on molecular weight.
9 5 。9 5.
H3 6。H3 6.
7 。7.
H3 13゜ It CH。H3 13° It CH.
15゜
CH3
CH3
本発明では導電性層が透明支持体」二に塗設される。透
明支持体は写真用のもの全てが使えるが好ましくは、可
視光を90%以上透過するように作られたポリエチレン
テレフタレート又はセルローストリアセテートである。15° CH3 CH3 In the present invention, a conductive layer is coated on a transparent support. Although any photographic transparent support can be used, polyethylene terephthalate or cellulose triacetate, which is made to transmit 90% or more of visible light, is preferable.
これらの透明支持体は、当業者に良く知られた方法で作
成されるものであるが、場合によっては光透過を実質的
に阻害しないように染料を若干添加して青味付けしたり
しても良い。These transparent supports are prepared by methods well known to those skilled in the art, but in some cases, a slight amount of dye may be added to give them a blue tint so as not to substantially inhibit light transmission. good.
本発明の支持体は、コロナ放電処理をした後ラテックス
ポリマーを含有する下引層が塗設されていてもよい。コ
ロナ放電処理は、エネルギー値として1 mW−1kW
/m2m1nが特に好ましく適用される。The support of the present invention may be coated with a subbing layer containing a latex polymer after being subjected to a corona discharge treatment. Corona discharge treatment has an energy value of 1 mW-1kW.
/m2m1n is particularly preferably applied.
又特に好ましくは、ラテックス下引層塗布後導電性層を
塗設する前にコロナ放電処理を再度行うと良い。Particularly preferably, corona discharge treatment is performed again after applying the latex undercoat layer and before applying the conductive layer.
本発明の導電性層を硬化する化合物としては、多官能の
アジリジンが好ましい。特に2官能、3官能で分子量が
600以下のものが好ましい。As the compound for curing the conductive layer of the present invention, polyfunctional aziridine is preferred. Particularly preferred are those having bifunctional or trifunctional properties and a molecular weight of 600 or less.
本発明の導電性層は感光性層より支持体側にあっ3
てもよいし、感光層に対し支持体の反対側、いわゆる背
面にあってもよい。The conductive layer of the present invention may be located closer to the support than the photosensitive layer, or may be located on the opposite side of the support to the photosensitive layer, ie, on the back surface.
本発明は、支持体上に形成される感光材料金てに応用す
ることができる。例えばハロゲン化銀カラー感光材料、
レントゲン用感光材料、製版用感光材料等である。The present invention can be applied to photosensitive materials formed on a support. For example, silver halide color photosensitive materials,
These include photosensitive materials for X-rays and photosensitive materials for plate making.
本発明の感光材料に用いるハロゲン化銀乳剤には、ハロ
ゲン化銀として、臭化銀、塩化銀、沃臭化銀、塩臭化銀
、塩沃臭化銀等の通常のハロゲン化銀乳剤に使用される
任意のものを用いる事ができ、ハロゲン化銀粒子は、酸
性法、中性法及びアンモニア法のいずれで得られたもの
でもよい。The silver halide emulsion used in the light-sensitive material of the present invention includes conventional silver halide emulsions such as silver bromide, silver chloride, silver iodobromide, silver chlorobromide, and silver chloroiodobromide. Any commonly used silver halide grains can be used, and the silver halide grains may be those obtained by any of the acid method, neutral method, and ammonia method.
ハロゲン化銀粒子は、粒子内において均一なハロゲン化
銀組成分布を有するものでも、粒子の内部と表面層とで
ハロゲン化銀組成が異なるコア/シェル粒子であっても
よく、潜像が主として表面に形成されるような粒子であ
っても、又主として粒子内部に形成されるような粒子で
もよい。Silver halide grains may have a uniform silver halide composition distribution within the grain, or may be core/shell grains in which the silver halide composition differs between the inside and surface layer of the grain, and the latent image is mainly on the surface. It may be a particle that is formed inside the particle, or it may be a particle that is formed mainly inside the particle.
本発明に用いられるハロゲン化銀乳剤は、例えば米国特
許第2,444,607号、同第2,716,062号
、同24
第3,512,982号、***間出願公告第1.189
,380号、同第2,058,626号、同第2,11
8,411号、特公昭43−4133号、米国特許第3
,342,596号、特公昭47−4417号、***間
出願公告第2,149..789号、特公昭39−28
25号、特公昭49−13566号等の各明細書又は公
報に記載されている化合物、好ましくは、例えば5,6
トリメチレンー7−ヒドロキシンーS−)リアゾロ(1
,5a)ピリミジン、5,6−チトラメチレンー7−ヒ
ドロキシー5−1−リアゾロ(1,5−a)ピリミジン
、5−メチル−7ヒドロキシーS−)リアゾロ(1,5
−a)ピリミジン、5メチル−7−ヒドロキシ−5−)
リアゾロ(1,5−a)ピリミジン、7−ヒドロキシン
−8−トリアシロン(1,5−a)ピリミジン、5−メ
チル−6−プロモーフ−ヒドロキシS−トリアゾロ(1
,5−8)ピリミジン、没食子酸エステル(例えば没食
子酸イソアミル、没食子酸ドデシル、没食子酸プロピル
、没食子酸ナトリウム)、メルカプタン類(l−7エニ
ルー5−メルカプトテトラゾール、2−メルカプトベン
ツチアゾール)、ベンゾトリアゾール類(5−ブロムベ
ンツトリアソール、5−メチルベンツトリアゾール)、
ベンツイミダゾル類(6−ニドロペンツイミダゾール)
等を用いて安定化することができる。The silver halide emulsion used in the present invention is, for example, US Pat. No. 2,444,607, US Pat. No. 2,716,062, US Pat.
, No. 380, No. 2,058,626, No. 2,11
No. 8,411, Japanese Patent Publication No. 43-4133, U.S. Patent No. 3
, No. 342,596, Japanese Patent Publication No. 47-4417, West German Application Publication No. 2,149. .. No. 789, Special Publication No. 39-28
Compounds described in specifications or publications such as No. 25 and Japanese Patent Publication No. 49-13566, preferably e.g.
trimethylene-7-hydroxyne-S-)riazolo(1
,5a) Pyrimidine, 5,6-titramethylene-7-hydroxy-5-1-riazolo(1,5-a)pyrimidine, 5-methyl-7hydroxy-S-)riazolo(1,5
-a) Pyrimidine, 5methyl-7-hydroxy-5-)
Riazolo(1,5-a)pyrimidine, 7-hydroxyn-8-triacylon(1,5-a)pyrimidine, 5-methyl-6-promorph-hydroxyS-triazolo(1
, 5-8) Pyrimidine, gallic acid ester (e.g. isoamyl gallate, dodecyl gallate, propyl gallate, sodium gallate), mercaptans (l-7enyl-5-mercaptotetrazole, 2-mercaptobenzthiazole), benzotriazole (5-bromobenztriazole, 5-methylbenztriazole),
Benzimidazoles (6-nidropenzimidazole)
It can be stabilized using etc.
本発明に係るハロゲン化銀写真感光材料及び/又は現像
液中には、アミノ化合物を含有することができる。The silver halide photographic material and/or developer according to the present invention may contain an amino compound.
又現像性を高めるために、フェニドンやハイドロキノン
のような現像主薬、ベンゾトリアゾールのような抑制剤
を乳剤側に含有せしめることができる。或いは処理液の
処理能力を上げるために、バッキング層に現像主薬や抑
制剤を含有せしめることができる。Further, in order to improve the developability, a developing agent such as phenidone or hydroquinone or an inhibitor such as benzotriazole may be contained in the emulsion. Alternatively, in order to increase the processing ability of the processing solution, the backing layer may contain a developing agent or an inhibitor.
本発明に特に有利に用いられる親水性コロイドはゼラチ
ンである。A hydrophilic colloid used with particular advantage in the present invention is gelatin.
本発明に用いられるゼラチンは、アルカリ処理、酸処理
いずれも用いることが出来るが、オセインゼラチンを用
いる場合にはカルシウム或いは鉄分を取り除くことが好
ましい。好ましい含有量としてカルシウム分は1〜99
9ppmであるが、更に好ましくは1−500ppmで
あり、鉄分は0.01−50ppmが好ましく、更に好
ましくは0.1〜1oppmである。このようにカルシ
ウム分や鉄分の量を調節する方法は、ゼラチン水溶液を
イオン交換装置に通ずことにより達成することができる
。The gelatin used in the present invention can be treated with either alkali treatment or acid treatment, but when using ossein gelatin, it is preferable to remove calcium or iron. The preferred calcium content is 1-99
The iron content is preferably 9 ppm, more preferably 1-500 ppm, and the iron content is preferably 0.01-50 ppm, and even more preferably 0.1-1 oppm. The amount of calcium and iron can be adjusted in this manner by passing an aqueous gelatin solution through an ion exchange device.
本発明に係るハロゲン化銀写真感光材料の現像に用いら
れる現像主薬としてはカテコール、ピロガロール及びそ
の誘導体ならびにアスコルビン酸、クロロハイドロキノ
ン、ブロモハイドロキノン、メチルハイドロキノン、2
.3−ジブロモハイドロキノン、2,5−ジエチルハイ
ドロキノン、カテコール、4−クロロカテコール、4−
フェニル−カテコール、3−メトキシ−カテコール、4
−アセチル−ピロガロル、アスコルビン酸ソーダ等があ
る。Developing agents used in developing the silver halide photographic material according to the present invention include catechol, pyrogallol and its derivatives, ascorbic acid, chlorohydroquinone, bromohydroquinone, methylhydroquinone, 2
.. 3-dibromohydroquinone, 2,5-diethylhydroquinone, catechol, 4-chlorocatechol, 4-
Phenyl-catechol, 3-methoxy-catechol, 4
-Acetyl-pyrogallol, sodium ascorbic acid, etc.
又、lo−(CH= CH)。−NH2型現像現像剤て
は、オルト及びパラのアミンフェノールが代表的なもの
で、4−アミノフェノール、2−アミノ−6−フェニル
フェノール、2−7”ミノ−410ロー6−フェニルフ
ェノール、N−メチル−p−アミノフェニール等かある
。Also, lo-(CH=CH). Typical -NH2 type developers include ortho and para amine phenols, such as 4-aminophenol, 2-amino-6-phenylphenol, 2-7"mino-410-6-phenylphenol, N -Methyl-p-aminophenyl, etc.
更に、H2N (CH= CH) 、 NH2型現
像現像剤ては例えば4−アミノ−2−メチル−N、N−
ジエチルアニリン、2.4−ジアミノ−N、N−ジエチ
ルアニリン、N−(4−アミ7
ノー3−メチルフェニル)−七ルホリン、p−フェニレ
ンジアミン等がある。Furthermore, H2N (CH=CH), NH2 type developer, for example, 4-amino-2-methyl-N,N-
Examples include diethylaniline, 2,4-diamino-N, N-diethylaniline, N-(4-amino-7-methylphenyl)-7rpholine, and p-phenylenediamine.
ヘテロ原型現像剤としては、■−フェニルー3−ピラゾ
リドン、■−フェニルー4.4−ジメチルー3−ピラゾ
リドン、■−フェニルー4−メチルー4−ヒドロキシメ
チル−3−ピラゾリドンのような3−ピラゾリドン類、
1フェニル−4−アミノ−5−ピラゾロン、5−アミノ
ラウシル等を挙げることができる。Examples of the hetero prototype developer include 3-pyrazolidones such as ■-phenyl-3-pyrazolidone, ■-phenyl-4,4-dimethyl-3-pyrazolidone, and ■-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone;
Examples include 1-phenyl-4-amino-5-pyrazolone and 5-aminolaucil.
T、H,ジェームス著ザ・セオリイ・オブ・ザ・ホトグ
ラフィック・プロセス第4版
(The Theory of Photograph
ic Process FourthEdition)
第291〜334頁及びジャーナル・オブ・ジ・アメリ
カン・ケミカル・ソサエティ(Journal oft
he American Chemical 5oci
ety)第73巻、第3,100頁(1951)に記載
されているごとき現像剤が本発明に有効に使用し得るも
のである。これらの現像剤は単独で使用しても2種以上
組み合わせてもよいが、2種以上を組み合わせて用いる
方が好ましい。又本発明にかかる感光材料の現像に使用
する現像液には保恒剤として、例えば亜硫酸ソーダ、8
亜硫酸カリ、等の亜硫酸塩を用いても、本発明の効果が
損なわれることはない。又保恒剤としてヒドロキシルア
ミン、ヒドラジド化合物を用いることができ、この場合
その使用量は現像液1g当たり5〜500gが好ましく
、より好ましくは20〜200gである。The Theory of the Photographic Process, 4th Edition, by T. H. James.
ic Process Fourth Edition)
pp. 291-334 and Journal of the American Chemical Society.
he American Chemical
Ety) Vol. 73, p. 3, 100 (1951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more types, but it is preferable to use two or more types in combination. Furthermore, even if a sulfite salt such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the photosensitive material according to the invention, the effects of the invention will not be impaired. Further, hydroxylamine or a hydrazide compound can be used as a preservative, and in this case, the amount used is preferably 5 to 500 g, more preferably 20 to 200 g, per 1 g of developer.
又現像液には有機溶媒としてグリコール類を含有させて
もよく、そのようなグリコール類としてはエチレングリ
コール、ジエチレンクリコール、プロピレングリコール
、トリエチレングリコール、1.4−ブタンジオール、
1,5−ベンタンジオール等があるが、ジエチレングリ
コールが好ましく用いられる。そしてこれらグリコール
類の好ましい使用量は現像液112当たり5〜500g
で、より好ましくは20〜200gである。これらの有
機溶媒は単独でも併用しても用いることができる。Further, the developer may contain glycols as an organic solvent, and such glycols include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol,
Among them, diethylene glycol is preferably used. The preferred amount of these glycols used is 5 to 500 g per 112 grams of developer.
The amount is more preferably 20 to 200 g. These organic solvents can be used alone or in combination.
本発明に係るハロゲン化銀写真感光材料は、上記のごと
き現像抑制剤を含んだ現像液を用いて現像処理すること
により極めて保存安定性に優れた感光材料を得ることが
できる。The silver halide photographic light-sensitive material according to the present invention can be developed with a developer containing the above-mentioned development inhibitor to obtain a light-sensitive material with extremely excellent storage stability.
」二記の組成になる現像液のpH値は好ましくは9〜1
3であるか、保恒性及び写真特性上からpH値は10〜
12の範囲が更に好ましい。現像液中の陽イオンについ
ては、ナトリウムよりカリウムイオンの比率が高い程現
像液の活性度を高めることができるので好ましい。The pH value of the developer having the composition shown in ``2'' is preferably 9 to 1.
3, or the pH value is 10 to 10 in terms of storage stability and photographic properties.
A range of 12 is more preferred. Regarding cations in the developer, it is preferable that the ratio of potassium ions is higher than that of sodium because the activity of the developer can be increased.
本発明に係るハロゲン化銀写真感光材料は、種々の茶件
で処理することができる。処理温度は、例えば現像温度
は50°C以下が好ましく、特に25°C〜40°C前
後が好ましく、又現像時間は2分以内に終了することが
一般的であるが、特に好ましくは10秒〜50秒が好効
果をもたらすことが多い。又現像以外の処理工程、例え
ば水洗、停止、安定、定着、更に必要に応じて前硬膜、
中和等の工程を採用することは任意であり、これらは適
宜省略することもできる。更に又、これらの処理は皿現
像、枠現像などいわゆる手現像処理でも、ローラー現像
、ハンガー現像など機械現像であってもよい。The silver halide photographic material according to the present invention can be processed in various ways. Regarding the processing temperature, for example, the development temperature is preferably 50°C or less, particularly preferably around 25°C to 40°C, and the developing time is generally completed within 2 minutes, particularly preferably 10 seconds. ~50 seconds often produces good results. In addition, processing steps other than development, such as washing, stopping, stabilizing, fixing, and if necessary, pre-hardening,
It is optional to employ steps such as neutralization, and these can be omitted as appropriate. Furthermore, these treatments may be so-called manual development such as plate development or frame development, or mechanical development such as roller development or hanger development.
以下実施例によって本発明を具体的に説明する。 EXAMPLES The present invention will be specifically explained below with reference to Examples.
尚、当然のことではあるが、本発明は以下述べる実施例
に限定されるものではない。It should be noted that, as a matter of course, the present invention is not limited to the embodiments described below.
実施例−1
下引き処理したポリエチレンテレフタレートにコロナ放
電した後下記構成の帯電防止液を、10m+2/dm2
になる様に33m/minの速さでロールフィツトコー
ティングパン及びエアーナイフを使用して塗布した。Example-1 After performing corona discharge on subbed-treated polyethylene terephthalate, an antistatic liquid having the following composition was applied to 10 m+2/dm2.
The coating was carried out using a roll-fit coating pan and an air knife at a speed of 33 m/min so that the coating amount was as follows.
水溶性導電性ポリマー(A) 6g/12本
発明のラテックス CB) 4g/Q硬膜剤
(H)
90°c、2分間乾燥し140°C190秒間熱処理し
た。Water-soluble conductive polymer (A) 6g/12 Latex of the present invention CB) 4g/Q Hardener (H) Dry at 90°C for 2 minutes and heat-treated at 140°C for 190 seconds.
この帯電防止層の上にゼラチンを2.0g/m2になる
様に塗布し接着力試験を行った。ゼラチンの硬膜剤とし
ては、ホルマリン、2.4−ジクロロ−6−ヒドロキシ
S−)リアジンナトリウムを用いた。結果を表−1に示
す。Gelatin was coated on this antistatic layer at a concentration of 2.0 g/m 2 and an adhesion test was conducted. Formalin and 2,4-dichloro-6-hydroxy S-) lyazine sodium were used as gelatin hardeners. The results are shown in Table-1.
(1)透過率試験
1
東京電色株式会社製濁度計Model T−260OD
Aを用いフィルム支持体を測定して透過率を百分率で示
した。(1) Transmittance test 1 Turbidity meter Model T-260OD manufactured by Tokyo Denshoku Co., Ltd.
The film support was measured using A and the transmittance was expressed as a percentage.
(a)特開昭55−84658記載
実施例−2
pH3,0の酸性雰囲気下でコントロールダブルジェッ
ト法によりロジウムを銀1モル当たり10−5モル含有
する粒子を作成した。粒子の成長は、ベンジルアデニン
を1%のゼラチン水溶液la当たり302
mg金含有る系で行った。銀と7・ライドの混合後6メ
チルー4−ヒドロキシ−1,3,3a、7テトラザイン
デンをハロゲン化銀1モル当たり600mg加え、その
後水洗、脱塩した。(a) Example 2 described in JP-A-55-84658 Particles containing 10 -5 moles of rhodium per mole of silver were prepared by the controlled double jet method in an acidic atmosphere of pH 3.0. Particle growth was performed in a system containing benzyladenine at 302 mg gold per 1% aqueous gelatin solution la. After mixing silver and 7-ride, 600 mg of 6-methyl-4-hydroxy-1,3,3a,7-tetrazaindene was added per mole of silver halide, followed by washing with water and desalting.
次いで、ハロゲン化銀1モル当たり60mgの6−メチ
ル−4−ヒドロキシ−1,3,3a、7−チトラザイン
デンを加えた後、イオウ増感をした。イオウ増感後安定
剤として6−メチル−4−ヒドロキシ−1,3,3a、
7−チトラザインデンを加えた。Next, 60 mg of 6-methyl-4-hydroxy-1,3,3a,7-titrazaindene was added per mole of silver halide, followed by sulfur sensitization. 6-methyl-4-hydroxy-1,3,3a as a stabilizer after sulfur sensitization;
7-Chitrazaindene was added.
(ハロゲン化銀乳剤層)
前記各乳剤に添加剤を下記の付量になるよう調整添加し
、ポリ(ビニリデンクロライド−イタコン酸)ラテック
ス下引処理した(100μm厚さ)ポリエチレンテレフ
タレート支持体上に塗布した。(Silver halide emulsion layer) Additives were added to each of the above emulsions in the amounts shown below, and coated on a polyethylene terephthalate support (100 μm thick) that had been subbed with poly(vinylidene chloride-itaconic acid) latex. did.
ラテックスポリマー:スチレン−ブチルアクリレート−
アクリル酸3元共重合
ポリマー 1.0 g/m2テトラフェ
ニルホスホニウムクロライド30 mg/m2
サポニン 200 mg/m2
ポリエチレングリコール
ハイドロキノン
フェニドン
スチレンスルホン酸ナトリ
重合体(Mw−25万)
没食子酸ブチルエステル
100 mg7m2
トリウム
100 mg/m2
200 mg/m2
100 mg/m2
ラム−マレイン酸
200 mg/m2
500 mg/m2
ドテシルベンゼンスルホン酸す
5−メチルベンゾトリアゾール 30 mg/m2
2−メルカプトベンツイミダゾール−5−スルホン酸
30 mg/m2イナートオセイ
ンゼラチン(等電点4.9)1・5 g/m2
1− (p−アセチルアミドフェニル)−5メルカプト
テトラゾール 30 mg/m2銀量
2.8 g/m2(乳剤層
保護膜)
乳剤層保護膜として、下記の付量になるよう調製塗布し
た。Latex polymer: styrene-butyl acrylate
Acrylic acid ternary copolymer 1.0 g/m2 Tetraphenylphosphonium chloride 30 mg/m2 Saponin 200 mg/m2
Polyethylene glycol hydroquinone phenidone styrene sulfonate sodium polymer (Mw - 250,000) Gallic acid butyl ester 100 mg7m2 Thorium 100 mg/m2 200 mg/m2 100 mg/m2 Rum-maleic acid 200 mg/m2 500 mg/m2 Dotesil 5-methylbenzotriazole benzenesulfonate 30 mg/m2
2-Mercaptobenzimidazole-5-sulfonic acid
30 mg/m2 Inatoossein gelatin (isoelectric point 4.9) 1.5 g/m2 1-(p-acetylamidophenyl)-5 mercaptotetrazole 30 mg/m2 Silver amount 2.8 g/m2 (emulsion layer Protective film) A protective film for the emulsion layer was prepared and coated in the following amount.
弗素化ジオクチルスルホコハク酸エステル300mg/
m2
マット剤:ポリメタクリル酸メチル(平均粒径3.5μ
m) 100 mg/m2硝
酸リチウム塩 30 mg/m2酸処
理ゼラチン(等電点7.0) 1.2 g/m2
コロイダルシリカ 50 mg/m2
スチレンスルホン酸ナトリウム−マレイン酸共重合体
100 mg/(62媒染剤
CH3CQθ
5
(バッキング層)
乳剤層とは反対側の支持体に、あらかじめ30W/m’
minのパワーでコロナ放電した後、ポリ(ブチルアク
リレート−スチレン−t−ブチルアクリレートヒドロキ
シエチルメタクリレート)ラテックスポリマーをヘキサ
メチレンアジリジン硬膜剤の存在下で塗布し更に本発明
の帯電防止層を実施例1と同様に塗設し、ついでこの層
上に下記組成のバッキング染料を含有するバッキング層
を塗布した。ゼラチン層はグリオキザール及びl−オキ
シ−3゜5−ジクロロ−S−トリアジンナトリウム塩で
硬膜した。Fluorinated dioctyl sulfosuccinate 300mg/
m2 Matting agent: Polymethyl methacrylate (average particle size 3.5μ
m) 100 mg/m2 Lithium nitrate salt 30 mg/m2 Acid-treated gelatin (isoelectric point 7.0) 1.2 g/m2
Colloidal silica 50 mg/m2
Sodium styrene sulfonate-maleic acid copolymer
100 mg/(62 mordant CH3CQθ 5 (backing layer) 30 W/m' in advance on the support opposite to the emulsion layer.
After corona discharge with a power of min, a poly(butyl acrylate-styrene-t-butyl acrylate hydroxyethyl methacrylate) latex polymer was applied in the presence of a hexamethylene aziridine hardener and an antistatic layer of the present invention was applied in Example 1. A backing layer containing a backing dye having the following composition was then applied on this layer. The gelatin layer was hardened with glyoxal and l-oxy-3°5-dichloro-S-triazine sodium salt.
(バッキング層)
ハイドロキノン 100 mg/m”
フェニドン 30 mg/m2
6
ラテツクスポリマー:ブチルアクリレートスチレン−ア
クリル酸共重合体
0.5 g/m2
スチレン−マレイン酸共重合体100 mg/m2ク
エン酸 40 mg/m2ベ
ンゾトリアゾール 100 mg/m2ス
チレンスルホン酸ソーダーマレイン酸共重合体
200 mg/m2硝酸リチウム塩
30 mg/m2バッキング染料(a
)、 (b )、 (c )オセインゼラチン
2.0 g/m2(a)
(b)
(c)
エチレンジアミン四酢酸ナトリウム
o 3Na
以上のようにして得られた試料を全面露光し下記に示す
現像液、定着液を使用して現像処理した後膜付透過率試
験を行った。(Backing layer) Hydroquinone 100 mg/m”
Phenidone 30 mg/m2
6 Latex polymer: Butyl acrylate styrene-acrylic acid copolymer 0.5 g/m2 Styrene-maleic acid copolymer 100 mg/m2 Citric acid 40 mg/m2 Benzotriazole 100 mg/m2 Styrene sulfonic acid sodium maleic acid copolymer polymer
200 mg/m2 lithium nitrate salt
30 mg/m2 backing dye (a
), (b), (c) Ossein gelatin
2.0 g/m2 (a) (b) (c) Sodium ethylenediaminetetraacetate o 3Na After exposing the entire surface of the sample obtained as above and developing it using the developer and fixer shown below. A membrane transmittance test was conducted.
く現像液処方〉
ハイドロキノン 25 gl−フェ
ニル−4,4ジメチル−3
ピラゾリドン 0.4g臭化ナトリ
ウム 3g5−メチルベンゾトリアゾ
ール 0.3g5−ニトロインダゾール
0.05gジエチルアミンプロパン−1,2−ジオール
0 g
亜硫酸カリウム 90 g5−スルホ
サリチル酸ナトリウム 75 gg
水で112に仕上げた。Developer formulation> Hydroquinone 25 gl-phenyl-4,4dimethyl-3 pyrazolidone 0.4g Sodium bromide 3g 5-methylbenzotriazole 0.3g 5-nitroindazole
0.05 g Diethylamine propane-1,2-diol 0 g Potassium sulfite 90 g Sodium 5-sulfosalicylate 75 g Finished to 112 with water.
pHは、苛性ソーダで11.5とした。The pH was adjusted to 11.5 with caustic soda.
く定着液処方〉
(組成A)
チオ硫酸アンモニウム(72,5w%水溶液)240
m(1
亜硫酸ナトリウム 17 g酢酸ナト
リウム・3水塩 6.5g硼酸
6gクエン酸ナトリウム・2水塩2g
酢酸(90w%水溶液) 13.6m4(
組成り)
純水(イオン交換水) 17 mO。Fixer formulation> (Composition A) Ammonium thiosulfate (72.5w% aqueous solution) 240
m (1 Sodium sulfite 17 g Sodium acetate trihydrate 6.5 g Boric acid
6g Sodium citrate dihydrate 2g Acetic acid (90w% aqueous solution) 13.6m4 (
Composition) Pure water (ion exchange water) 17 mO.
硫酸(50w%の水溶液) 3.0g硫酸
アルミニウム(AQ20.換算含量が8.1w%の水溶
液)20g
定着液の使用時に水500m4中に上記組成A1組成り
の順に溶かし、112に仕上げて用いた。この9
0
定着液のpHは約5.6であった。Sulfuric acid (50w% aqueous solution) 3.0g Aluminum sulfate (AQ20. converted content is 8.1w% aqueous solution) 20g When using the fixer, the above compositions were dissolved in 500m4 of water in the order of A1 composition and finished to 112 before use. . The pH of this 90 fixer was approximately 5.6.
く現像処理条件〉 (工程) (温度) 現像 40°C 定着 35°C 水洗 常温 評価は以下のようにして行い、 刀\ し Iこ 。Development processing conditions> (Process) (Temperature) Development 40°C Fixation 35°C Wash with water, room temperature The evaluation is done as follows, Katana \ Iko .
表−2
(時間)
8秒
8秒
10秒
結果を表
2に
テトラゾリウム化合物
表2の結果から本発明に係る試料は、現像処理後の帯電
防止能の劣化が少なく、ヘーズにも優れ、比較に比べて
著しく改善されていることがわかる。Table 2 (Time) 8 seconds 8 seconds 10 seconds The results are shown in Table 2 Tetrazolium compound From the results in Table 2, the samples according to the present invention show less deterioration in antistatic ability after development processing, excellent haze, and are superior to others in comparison. It can be seen that the comparison is significantly improved.
本発明により、現像等の処理後も帯電防止性能が劣化せ
ず、しかもヘーズに優れたハロゲン化銀写真感光材料を
提供することができた。According to the present invention, it was possible to provide a silver halide photographic material that does not deteriorate in antistatic performance even after processing such as development and has excellent haze.
ポリマーの添加量はg/m2、 ある。The amount of polymer added is g/m2, be.
表面比抵抗は07cmでThe surface resistivity is 07cm.
Claims (1)
子、(3)硬化剤の反応生成物からなる帯電防止層を有
してなるプラスチックフィルムにおいて、該疎水性ポリ
マー粒子がリン酸基、及び/又はその塩のうちの少なく
とも1つの基を有することを特徴とする帯電防止層。In a plastic film comprising an antistatic layer comprising a reaction product of (1) a water-soluble conductive polymer, (2) hydrophobic polymer particles, and (3) a curing agent, the hydrophobic polymer particles have phosphoric acid groups, and/or a salt thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14600589A JPH0310243A (en) | 1989-06-07 | 1989-06-07 | Antistatic layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14600589A JPH0310243A (en) | 1989-06-07 | 1989-06-07 | Antistatic layer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0310243A true JPH0310243A (en) | 1991-01-17 |
Family
ID=15397947
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14600589A Pending JPH0310243A (en) | 1989-06-07 | 1989-06-07 | Antistatic layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0310243A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06248023A (en) * | 1993-02-26 | 1994-09-06 | Shinnakamura Kagaku Kogyo Kk | Polymeric compound and antistatic agent |
JPH06285309A (en) * | 1993-06-25 | 1994-10-11 | Tokiwa Kogyo:Kk | Dust removing filter for perforated plate |
-
1989
- 1989-06-07 JP JP14600589A patent/JPH0310243A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06248023A (en) * | 1993-02-26 | 1994-09-06 | Shinnakamura Kagaku Kogyo Kk | Polymeric compound and antistatic agent |
JPH06285309A (en) * | 1993-06-25 | 1994-10-11 | Tokiwa Kogyo:Kk | Dust removing filter for perforated plate |
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