JPH02908Y2 - - Google Patents
Info
- Publication number
- JPH02908Y2 JPH02908Y2 JP1981160291U JP16029181U JPH02908Y2 JP H02908 Y2 JPH02908 Y2 JP H02908Y2 JP 1981160291 U JP1981160291 U JP 1981160291U JP 16029181 U JP16029181 U JP 16029181U JP H02908 Y2 JPH02908 Y2 JP H02908Y2
- Authority
- JP
- Japan
- Prior art keywords
- rotation
- work holder
- rotation shaft
- work
- shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 230000007547 defect Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
【考案の詳細な説明】
本考案は主としてIC回路用の半導体素子のワ
ークに真空蒸着を施す薄膜形成装置に適用される
自公転偏角治具装置に関する。[Detailed Description of the Invention] The present invention relates to a rotation-revolution declination jig device mainly applied to a thin film forming apparatus that performs vacuum deposition on a workpiece of a semiconductor element for an IC circuit.
従来この種治具装置としてモータその他の原動
機に連動する真空処理室内の回動枠に、ワークホ
ルダの複数個を前面に軸設して該回動枠の回動に
よれば該ワークホルダに公転と自転とを与えるよ
うにしたものが知られる。このものはワークホル
ダに取付けられたIC回路用の半導体素子のワー
クに蒸着処理を施すに際しその表面の凹凸面への
薄膜形成（ステツプカバレージ）が向上し、断線
による製品不良を減少すべく有効であるが、近時
の該素子の超微細化（LSI化、超LSI化）によれ
ばかかる公転と自転のみでは例えば第１図示のよ
うにワークａの凹部ｂに堆積する複数層の薄膜
ｃ，ｃの一部が欠如ｄし、製品不良が生じ勝ちで
ある不都合を伴なう。 Conventionally, as this type of jig device, a plurality of work holders are pivoted in front of a rotating frame in a vacuum processing chamber that is linked to a motor or other prime mover, and the work holders revolve around the work holders as the rotating frame rotates. A known example is one that gives rotation and rotation. This product improves the formation of a thin film (step coverage) on the uneven surface of a workpiece of a semiconductor element for an IC circuit mounted on a workholder, and is effective in reducing product defects due to disconnection. However, with the recent ultra-miniaturization of such elements (LSI, super LSI), such revolutions and rotations alone can cause the formation of multiple layers of thin film c, deposited in the recess b of workpiece a, as shown in Figure 1 This is accompanied by the inconvenience that a part of c is missing and d is likely to result in product defects.
本考案はかかる不都合を排除することをその目
的としたもので、モータその他の原動機１に連動
した真空処理室２内の回動枠３に、ワークホルダ
４の複数個を前面に軸設して該回動枠３の回動に
よれば該ワークホルダ４に公転と自転とが与えら
れるようにした式のものに於て、該ワークホルダ
４に自転を与える回転手段５を該回動枠３に支承
された第１回動軸５ａと、該第１回動軸５ａによ
りこれと傾角を存して回動される前記ワークホル
ダ４と一体の第２回動軸５ｂとで構成して該ワー
クホルダ４に歳差運動を行なわせるようにして成
る。 The purpose of the present invention is to eliminate such inconveniences, and a plurality of work holders 4 are pivoted in front of a rotating frame 3 in a vacuum processing chamber 2 that is linked to a motor or other prime mover 1. In the type in which the work holder 4 is given revolution and rotation by the rotation of the rotating frame 3, the rotating means 5 for giving rotation to the work holder 4 is connected to the rotating frame 3. A first rotation shaft 5a supported by the work holder 4, and a second rotation shaft 5b integral with the work holder 4, which is rotated by the first rotation shaft 5a at an inclination angle with the work holder 4. The work holder 4 is made to precess.
第２図及び第３図は本案装置の一例を示すもの
で、これに於ては回動枠３を真空処理室２の上方
に設けた環状の案内レール６上に転輪７を介して
載置し、該真空処理室２の外部の原動機１が回動
されるとその駆動アーム８にピン９が係合して該
回動枠３が回動されるようにした。１０は該真空
処理室２の下方に設けた蒸発源で、これにより蒸
発した物質が例えば３個のワークホルダ４の各前
面に取付けされたワーク１１に附着する。該ワー
クホルダ４はその背面にこれと一体に第２回動軸
５ｂが取付けられ、該第２回動軸５ｂはさらに回
動枠３に回動自在に取付けされた略Ｌ字形の第１
回動軸５ａに回転自在に支承されるが、該第２回
動軸５ｂは該第１回動軸５ａに傾角ａを存して取
付けられると共に該第２回動軸５ｂの後端部に回
動枠３と一体の歯車１２と咬合する歯車１３が設
けられ、かくて第１回動軸５ａがこれと一体の転
輪７と共に回動されると第２回動軸５ｂ及びワー
クホルダ４は角度ａをもつて歳差運動を行なう。 FIGS. 2 and 3 show an example of the present device, in which the rotating frame 3 is placed on an annular guide rail 6 provided above the vacuum processing chamber 2 via rollers 7. When the motor 1 outside the vacuum processing chamber 2 is rotated, the pin 9 engages with the drive arm 8 of the motor 1, and the rotation frame 3 is rotated. Reference numeral 10 denotes an evaporation source provided below the vacuum processing chamber 2, and the evaporated material thereby adheres to the workpieces 11 attached to the front surfaces of the three workholders 4, for example. A second rotation shaft 5b is integrally attached to the back surface of the work holder 4, and the second rotation shaft 5b further has a substantially L-shaped first rotation shaft rotatably attached to the rotation frame 3.
The second rotation shaft 5b is rotatably supported on the rotation shaft 5a, and the second rotation shaft 5b is attached to the first rotation shaft 5a at an inclination angle a, and the second rotation shaft 5b is attached to the rear end of the second rotation shaft 5b. A gear 13 is provided that engages with a gear 12 that is integral with the rotation frame 3. Thus, when the first rotation shaft 5a is rotated together with the roller 7 that is integrated therewith, the second rotation shaft 5b and the work holder 4 are rotated. precesses with an angle a.
その作動を説明するに、原動機１が回動される
と回動枠３が真空処理２内を回転し、ワークホル
ダ４には公転が与えられるが、これと同時に該ワ
ークホルダ４は回動枠３の第１回動軸５ａ及びこ
れと傾角を存して回動される第２回動軸５ｂで構
成された回動手段５とにより歳差運動を伴なう自
転が与えられ、該ワークホルダ４に取付けられた
ワーク１１は蒸発源１０に対し各種の角度で対向
し、蒸発物質がワーク１１の表面の特に凹凸部に
均一性をもつて附着し、第１図示のような薄膜ｃ
の欠如ｄを生ずることがなくステツプカバレージ
が向上する。 To explain its operation, when the prime mover 1 is rotated, the rotating frame 3 rotates within the vacuum processing 2, and the work holder 4 is given revolution, but at the same time, the work holder 4 is rotated within the rotating frame. Rotation means 5 constituted by a first rotation shaft 5a of No. 3 and a second rotation shaft 5b rotated at an inclination angle with the first rotation shaft 5a rotates the workpiece with precession. The workpiece 11 attached to the holder 4 faces the evaporation source 10 at various angles, and the evaporated substance is uniformly attached to the surface of the workpiece 11, especially to the uneven parts, and a thin film c as shown in the first figure is formed.
Step coverage is improved without causing a lack of d.
尚第２回動軸５ｂを第１回動軸５ａにユニバー
サルジヨイントその他で直列的に回転接続し、該
第２回動軸５ｂと一体のワークホルダ４をカム等
により第１回動軸５ａに対する傾角を与えるよう
にしてもよい。 The second rotation shaft 5b is serially connected to the first rotation shaft 5a by a universal joint or the like, and the work holder 4 integrated with the second rotation shaft 5b is connected to the first rotation shaft 5a by a cam or the like. It is also possible to give an inclination angle to
このように本考案によるときはワークホルダ４
に自転を与える回動手段５を、回動枠３に支承さ
れた第１回動軸５ａと、これと傾角を存して回動
される該ワークホルダ４と一体の第２回動軸５ｂ
とで構成したので該ワークホルダ４に歳差運動を
伴なう自転を行なわせ得、ステツプカバレージが
良好となつて超LSI等の多層の薄膜が形成される
ワークの製品不良を減少させることが出来る等の
効果がある。 In this way, when using the present invention, the work holder 4
A rotating means 5 for imparting rotation to the rotating frame 3 includes a first rotating shaft 5a supported on the rotating frame 3, and a second rotating shaft 5b integrated with the work holder 4, which is rotated at an inclination angle with the first rotating shaft 5a.
Since the work holder 4 is configured with the above structure, the work holder 4 can be rotated with precession, and step coverage can be improved to reduce product defects in workpieces in which multi-layered thin films are formed, such as in VLSIs. There are effects such as being able to do it.
第１図は従来のワークの凹凸面の蒸着状況を示
す拡大断面図、第２図は本考案装置の一例の截断
側面図、第３図はその要部の拡大図である。
１……原動機、２……真空処理室、３……回動
枠、４……ワークホルダ、５……回動手段、５ａ
……第１回動軸、５ｂ……第２回動軸。
FIG. 1 is an enlarged cross-sectional view showing the state of vapor deposition on the uneven surface of a conventional workpiece, FIG. 2 is a cross-sectional side view of an example of the apparatus of the present invention, and FIG. 3 is an enlarged view of the main parts thereof. DESCRIPTION OF SYMBOLS 1... Prime mover, 2... Vacuum processing chamber, 3... Rotating frame, 4... Work holder, 5... Rotating means, 5a
...First rotation axis, 5b...Second rotation axis.
Claims (1)
２内の回動枠３に、ワークホルダ４の複数個を前
面に軸設して該回動枠３の回動によれば該ワーク
ホルダ４に公転と自転とが与えられるようにした
式のものに於て、該ワークホルダ４に自転を与え
る回動手段５を該回動枠３に支承された第１回動
軸５ａと、該第１回動軸５ａによりこれと傾角を
存して回動される前記ワークホルダ４と一体の第
２回動軸５ｂとで構成して該ワークホルダ４に歳
差運動を行なわせるようにして成る薄膜形成装置
に於ける自公転偏角治具装置。 A plurality of work holders 4 are pivoted in front of a rotary frame 3 in a vacuum processing chamber 2 that is linked to a motor or other prime mover 1, and revolve around the work holders 4 as the rotary frame 3 rotates. In the type in which rotation is given to the work holder 4, a rotation means 5 for giving rotation to the work holder 4 is connected to a first rotation shaft 5a supported on the rotation frame 3, and a first rotation shaft 5a supported by the rotation frame 3. Thin film formation comprising the work holder 4 rotated by a moving shaft 5a at an inclination angle with the work holder 4 and a second rotating shaft 5b integral with the work holder 4 so as to cause the work holder 4 to perform a precession motion. Rotation and revolution declination jig device in equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16029181U JPS5866637U (en) | 1981-10-29 | 1981-10-29 | Rotation/revolution declination jig device in thin film forming equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16029181U JPS5866637U (en) | 1981-10-29 | 1981-10-29 | Rotation/revolution declination jig device in thin film forming equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5866637U JPS5866637U (en) | 1983-05-06 |
| JPH02908Y2 true JPH02908Y2 (en) | 1990-01-10 |
Family
ID=29952705
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16029181U Granted JPS5866637U (en) | 1981-10-29 | 1981-10-29 | Rotation/revolution declination jig device in thin film forming equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5866637U (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59232434A (en) * | 1983-06-16 | 1984-12-27 | Nippon Telegr & Teleph Corp <Ntt> | Work rotating apparatus in vacuum treatment apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5545209B2 (en) * | 1971-08-23 | 1980-11-17 | ||
| JPS5770274A (en) * | 1980-10-17 | 1982-04-30 | Fujitsu Ltd | Vapor deposition apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56598Y2 (en) * | 1978-09-14 | 1981-01-09 |
-
1981
- 1981-10-29 JP JP16029181U patent/JPS5866637U/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5545209B2 (en) * | 1971-08-23 | 1980-11-17 | ||
| JPS5770274A (en) * | 1980-10-17 | 1982-04-30 | Fujitsu Ltd | Vapor deposition apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5866637U (en) | 1983-05-06 |
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