JPH0283227A - Forming method - Google Patents
Forming methodInfo
- Publication number
- JPH0283227A JPH0283227A JP23681188A JP23681188A JPH0283227A JP H0283227 A JPH0283227 A JP H0283227A JP 23681188 A JP23681188 A JP 23681188A JP 23681188 A JP23681188 A JP 23681188A JP H0283227 A JPH0283227 A JP H0283227A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- substrate
- sol
- resin
- matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000011159 matrix material Substances 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 5
- 230000001105 regulatory effect Effects 0.000 claims abstract description 3
- 239000011521 glass Substances 0.000 claims description 14
- 238000000465 moulding Methods 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 6
- 239000002994 raw material Substances 0.000 claims description 5
- 150000004703 alkoxides Chemical class 0.000 claims description 4
- 238000005245 sintering Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 16
- 239000000758 substrate Substances 0.000 abstract description 15
- 239000011347 resin Substances 0.000 abstract description 12
- 229920005989 resin Polymers 0.000 abstract description 12
- 239000010453 quartz Substances 0.000 abstract description 11
- 238000003980 solgel method Methods 0.000 abstract description 3
- 125000006850 spacer group Chemical group 0.000 abstract description 3
- 238000005266 casting Methods 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は成形に用いられる型に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mold used for molding.
［従来の技術］
従来の周期１μｍ程度の微細パターン構造を持つ型の例
として、母型の構造を電鋳法によって形成したＮｉなど
に転写して、それを型として用いるものがあった。[Prior Art] As an example of a conventional mold having a fine pattern structure with a period of about 1 μm, there is one in which the structure of a matrix is transferred to Ni or the like formed by electroforming and used as a mold.
［発明が解決しようとするＯＩＭ］
しかし、前述の従来の型は不透明であり紫外線などの光
を透過させないという問題点を有する。[OIM to be Solved by the Invention] However, the conventional mold described above has a problem in that it is opaque and does not transmit light such as ultraviolet rays.
また、金属の型では高温での成形において熱膨張係数が
大きいために型の変形が大きいという問題点を有する。Furthermore, metal molds have a problem in that the mold deforms greatly when molded at high temperatures due to their large coefficient of thermal expansion.
そこで本発明はこのような問題点を解決するもので
、その目的とするところは、工程中に体積が大幅に収縮
して母型の構造の寸法を縮小転写したガラスを得ること
ができるゾルゲル法を用いて型を製造することによって
、微細構造を持ち、透明で、高温でも変形の少ない型を
提供するところにある。Therefore, the present invention is intended to solve these problems, and its purpose is to develop a sol-gel method that can produce glass whose volume shrinks significantly during the process and the size of the structure of the matrix is reduced and transferred. By manufacturing a mold using this method, it is possible to provide a mold that has a fine structure, is transparent, and has little deformation even at high temperatures.
［課題を解決するための手段］
本発明の成形方法は、型によって規制された形状を成形
する成形方法において、金属アルコキシドを主原料とし
て目的とするガラス成分の液状ゾルを調製し、該液状ゾ
ルを、所望の構造を有する母型に注入し、ゲル化させた
後、乾燥、焼結などの熱処理によってガラス化させるこ
とによって作製した型を用いることを特徴とする。[Means for Solving the Problems] The molding method of the present invention is a molding method for molding a shape regulated by a mold, in which a liquid sol of a target glass component is prepared using a metal alkoxide as a main raw material, and the liquid sol is is injected into a matrix having a desired structure, gelled, and then vitrified through heat treatment such as drying and sintering.
［作用］
金属アルコキシドを加水分解して得たゾルを、従来のフ
ォトリソグラフィー技術及びエツチング技術によって形
成した微細パターン構造を持つ母型に接しながらゲル化
させ、さらに乾燥、焼結するとガラスを得ることができ
る。この時、ゾルの組成にもよるが、最終的に得られる
ガラスに転写される母型の構造の寸法は、もとの母型の
構造の寸法の約半分にまで収縮させることが可能である
。[Function] A sol obtained by hydrolyzing a metal alkoxide is gelled while in contact with a matrix having a fine pattern structure formed by conventional photolithography and etching techniques, and further dried and sintered to obtain glass. Can be done. At this time, depending on the composition of the sol, the dimensions of the matrix structure transferred to the final glass can be reduced to approximately half the dimensions of the original matrix structure. .
従って、母型に周期２μｍのレリーフ型回折格子の構造
が形成されていれば、最終的に得られるガラスの型の表
面には周期的１μｍの回折格子の構造が転写されている
。金属アルコキシドとしてエチルシリケートを選べば最
終的に得られるガラスは石英であり、紫外線透過率の非
常に高い型を得ることができる。Therefore, if a relief type diffraction grating structure with a period of 2 .mu.m is formed on the matrix, the structure of a 1 .mu.m periodic diffraction grating is transferred onto the surface of the final glass mold. If ethyl silicate is selected as the metal alkoxide, the final glass obtained is quartz, and a mold with extremely high ultraviolet transmittance can be obtained.
このように得られた型は、Ｓｉのような不透明基板の表
面の光硬化性樹脂に構造を転写する型として用いること
ができる。The mold thus obtained can be used as a mold for transferring a structure to a photocurable resin on the surface of an opaque substrate such as Si.
また、焼結温度はおおよそ１０００℃以上であり、石英
の熱膨張係数は金属に比べて小さいので、高温までの成
形に用いることができる。Further, the sintering temperature is approximately 1000° C. or higher, and since the coefficient of thermal expansion of quartz is smaller than that of metal, it can be used for molding up to high temperatures.
以下、実施例により本発明の詳細を示す。Hereinafter, the details of the present invention will be shown by examples.
［実施例］
実施例１
第１図は母型から透明な型を得る方法を説明する図であ
り、第１図（ａ）、 （ｂ）とも主要な断面図である。[Example] Example 1 FIG. 1 is a diagram explaining a method of obtaining a transparent mold from a matrix, and both FIGS. 1(a) and 1(b) are main sectional views.
石英基板１１の表面には、フォトマスクを用いてパター
ニングし、 ドライエツチングして形成した周期２μｍ
１ 深さ０． ８μｍの等間隔の直線からなる回折格
子構造の母型構造１２が形成されている。The surface of the quartz substrate 11 is patterned using a photomask and then dry etched to form a pattern with a period of 2 μm.
1 Depth 0. A matrix structure 12 of a diffraction grating structure consisting of straight lines spaced at equal intervals of 8 μm is formed.
この石英基板１１と容器１３で囲まれる領域にゾル１４
が流し込まれる。A sol 14 is placed in the area surrounded by the quartz substrate 11 and the container 13.
is poured in.
ゾルは、エチルシリケートＳ １ （ＯＣ２Ｈｓ） ａ
に０．０２規定の希塩酸水を加えて加水分解し、平均粒
径２００人の微粉末シリカを加えたものである。それぞ
れの重量比は約１． ４： １： ０． ３３であ
る。ゾルはアンモニア水でｐＨ調整した後、容器１３に
流し込む。The sol is ethyl silicate S 1 (OC2Hs) a
was hydrolyzed by adding 0.02N diluted hydrochloric acid water, and finely powdered silica having an average particle size of 200 mm was added. The weight ratio of each is approximately 1. 4: 1: 0. It is 33. The pH of the sol is adjusted with aqueous ammonia and then poured into the container 13.
ゲル化後、６０℃で１週間乾燥させた徨１１５０°Ｃで
焼結することにより石英ガラスから成る型１５が得られ
る。型１５の表面には周期１μｍ（パターン幅０．５μ
ｍ）、深さ０．４μｍの回折格子構造の型構造１６が転
写されている。After gelation, the mold 15 made of quartz glass is obtained by drying at 60° C. for one week and sintering at 1150° C. The surface of the mold 15 has a period of 1 μm (pattern width 0.5 μm).
m), a mold structure 16 of a diffraction grating structure with a depth of 0.4 μm is transferred.
続いて第２図を用いて不透明基板上の光硬化性樹脂に構
造を転写する方法を説明する。第２図（ａ）、 （ｂ）
とも主要断面図である。Next, a method for transferring a structure to a photocurable resin on an opaque substrate will be explained using FIG. Figure 2 (a), (b)
Both are main sectional views.
樹脂との密着性を上げるためにプライマー処理した８１
基板２１に対して、型１５がスペーサ２３を介して配置
されている。紫外線硬化樹脂２２をＳｉ基板２１と型１
５の間に流し込み、型１５を通して紫外線２４を照射し
て樹脂を硬化させる。81 treated with primer to improve adhesion with resin
The mold 15 is placed on the substrate 21 with a spacer 23 in between. The ultraviolet curing resin 22 is placed on the Si substrate 21 and the mold 1.
5 and irradiated with ultraviolet rays 24 through a mold 15 to harden the resin.
硬化後、型１５をはずすことによって第２図（ｂ）の様
に、Ｓｉ基板２１の表面に周期１μｍの回折格子構造を
形成できる。After curing, by removing the mold 15, a diffraction grating structure with a period of 1 μm can be formed on the surface of the Si substrate 21, as shown in FIG. 2(b).
実施例２ 第３図を用いてガラスを成形する方法を述べる。Example 2 A method of forming glass will be described using FIG.
第３図（ａ）、 （ｂ）とも主要断面を示している。Both FIGS. 3(a) and 3(b) show main cross sections.
型１５の製作方法は実施例１と同じである。第３図（ａ
）に示すように、石英容器３１に溶融状態のガラス原料
３２を流し込む。ガラス原料３２は１０００℃で溶融し
である。石英容器３１、型１５を含めた環境は高温化し
である。型１５をガラス原料３２に接触させながら徐冷
して行き、石英容器３１と型１５を取り去ると第３図（
ｂ）に示すように、ガラス製の回折格子３３を得ること
ができる。石英容器３１、型１５の表面には飛型性をよ
くするコーティングを施すのが望ましい。The method for manufacturing the mold 15 is the same as in the first embodiment. Figure 3 (a
), a molten glass raw material 32 is poured into a quartz container 31. The glass raw material 32 is melted at 1000°C. The environment including the quartz container 31 and mold 15 is at a high temperature. The mold 15 is gradually cooled while being brought into contact with the glass raw material 32, and when the quartz container 31 and the mold 15 are removed, the result is shown in FIG.
As shown in b), a glass diffraction grating 33 can be obtained. It is desirable to apply a coating to the surfaces of the quartz container 31 and the mold 15 to improve mold flying performance.
以上実施例を述べたが、本発明は以上の実施例に限定さ
れるものではなく、エチルシリケートと他の金属アルコ
キシド、あるいは、エチルシリケート以外の金属アルコ
キシド、あるいはＲＸＳｉ（ＯＲ） ａ−−（Ｒ：
アルキル基）を加水分解して得たゾルを用いてもよい。Although the embodiments have been described above, the present invention is not limited to the above embodiments, and the present invention is not limited to the above embodiments. :
A sol obtained by hydrolyzing an alkyl group) may also be used.
また、高温環境で用いる型で光の透過性を必要としない
場合は、型は透明である必要はないので、透明化しない
ゾル組成も用いることができる。Furthermore, if a mold used in a high-temperature environment does not require light transparency, the mold does not need to be transparent, and a sol composition that does not become transparent can also be used.
また、転写構造も回折格子に限定されるものではない。Further, the transfer structure is not limited to a diffraction grating either.
第３図（ａ）、 （ｂ）は、本発明の型を用いてガラス
に構造を転写する方法を説明する図で、それぞれ主要断
面図。FIGS. 3(a) and 3(b) are diagrams illustrating a method of transferring a structure onto glass using the mold of the present invention, and are respective main sectional views.
［発明の効果〕
以上述べたように本発明によれば、ゾルゲル法によって
転写すべき構造を縮小転写した型を用いることにより、
透明化するゾル組成を用いることによって不透明基板上
の光硬化性樹脂に容易にサブミクロンパターンを有する
構造を転写できるという効果を有する。[Effects of the Invention] As described above, according to the present invention, by using a mold in which the structure to be transferred is reduced by the sol-gel method,
By using a transparent sol composition, a structure having a submicron pattern can be easily transferred to a photocurable resin on an opaque substrate.
また、縮小転写した構造を高温で転写することが可能に
なるという効果も有する。It also has the effect that it becomes possible to transfer the structure that has been reduced and transferred at a high temperature.
第１図（ａ）、 （ｂ）は、本発明の型の製造方法を説
明する図で、それぞれ主要断面図。
第２図（ａ）、 （ｂ）は、本発明の型を用いて紫外線
硬化樹脂に構造を転写する方法を説明する図で、それぞ
れ主要断面図。
石英基板
母型構造
容器
ゾル溶液
石英ガラス
型構造
Ｓｉ基板
紫外線硬化樹脂
スペーサ
紫外線
石英容器
溶融ガラス
ガラス製回折格子
以上
出願人 セイコーエプソン株式会社
代理人 弁理士 銘木喜三部他１名
第 １ 図 （レノFIGS. 1(a) and 1(b) are diagrams illustrating the mold manufacturing method of the present invention, and are respective main sectional views. FIGS. 2(a) and 2(b) are diagrams illustrating a method of transferring a structure to an ultraviolet curable resin using the mold of the present invention, and are respective main sectional views. Quartz substrate matrix structure container Sol solution Quartz glass structure Si substrate Ultraviolet curable resin spacer Ultraviolet quartz container Fused glass Glass diffraction grating Applicant Seiko Epson Corporation Agent Patent attorney Kizobe Meiki and one other person Figure 1 (Reno
Claims (1)
、金属アルコキシドを主原料として目的とするガラス成
分の液状ゾルを調製し、該液状ゾルを、所望の構造を有
する母型に注入し、ゲル化させた後、乾燥、焼結などの
熱処理によってガラス化させることによって作製した型
を用いることを特徴とする成形方法。In a molding method that molds a shape regulated by a mold, a liquid sol of the desired glass component is prepared using a metal alkoxide as the main raw material, and the liquid sol is injected into a matrix having the desired structure and gelled. A molding method characterized by using a mold made by vitrifying the mold through heat treatment such as drying and sintering.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23681188A JPH0283227A (en) | 1988-09-21 | 1988-09-21 | Forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23681188A JPH0283227A (en) | 1988-09-21 | 1988-09-21 | Forming method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0283227A true JPH0283227A (en) | 1990-03-23 |
Family
ID=17006132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23681188A Pending JPH0283227A (en) | 1988-09-21 | 1988-09-21 | Forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0283227A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6524771B2 (en) * | 1992-06-30 | 2003-02-25 | Nippon Sheet Glass Co., Ltd. | Optical recording film and process for production thereof |
| WO2007065766A1 (en) | 2005-12-06 | 2007-06-14 | Degussa Novara Technology S.P.A. | Sol-gel process for the manufacture of moulds for photocatalytic processes |
| WO2008010330A1 (en) * | 2006-07-21 | 2008-01-24 | Nippon Sheet Glass Company, Limited | Transfer mold, method for manufacturing transfer mold, and method for manufacturing transferred product using the transfer mold |
| US8796158B2 (en) | 2003-06-12 | 2014-08-05 | Samsung Electronics Co., Ltd. | Methods for forming circuit pattern forming region in an insulating substrate |
-
1988
- 1988-09-21 JP JP23681188A patent/JPH0283227A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6524771B2 (en) * | 1992-06-30 | 2003-02-25 | Nippon Sheet Glass Co., Ltd. | Optical recording film and process for production thereof |
| US8796158B2 (en) | 2003-06-12 | 2014-08-05 | Samsung Electronics Co., Ltd. | Methods for forming circuit pattern forming region in an insulating substrate |
| WO2007065766A1 (en) | 2005-12-06 | 2007-06-14 | Degussa Novara Technology S.P.A. | Sol-gel process for the manufacture of moulds for photocatalytic processes |
| JP2009518200A (en) * | 2005-12-06 | 2009-05-07 | デグサ ノヴァラ テクノロジー ソチエタ ペル アツィオーニ | Sol-gel method for producing molds for photocatalytic methods |
| JP4669551B2 (en) * | 2005-12-06 | 2011-04-13 | デグサ ノヴァラ テクノロジー ソチエタ ペル アツィオーニ | Sol-gel method for producing molds for photocatalytic methods |
| WO2008010330A1 (en) * | 2006-07-21 | 2008-01-24 | Nippon Sheet Glass Company, Limited | Transfer mold, method for manufacturing transfer mold, and method for manufacturing transferred product using the transfer mold |
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