JPH02209987A - Production of fluorescent ceramics - Google Patents
Production of fluorescent ceramicsInfo
- Publication number
- JPH02209987A JPH02209987A JP1030732A JP3073289A JPH02209987A JP H02209987 A JPH02209987 A JP H02209987A JP 1030732 A JP1030732 A JP 1030732A JP 3073289 A JP3073289 A JP 3073289A JP H02209987 A JPH02209987 A JP H02209987A
- Authority
- JP
- Japan
- Prior art keywords
- rare earth
- heat treatment
- fluorescent
- scintillator
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 27
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 21
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000001257 hydrogen Substances 0.000 claims abstract description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 12
- -1 rare earth oxysulfide Chemical class 0.000 claims abstract description 11
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims abstract description 10
- 239000007789 gas Substances 0.000 claims abstract description 8
- 238000003754 machining Methods 0.000 claims abstract description 7
- 239000011261 inert gas Substances 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 abstract description 11
- 238000005520 cutting process Methods 0.000 abstract description 9
- 230000005855 radiation Effects 0.000 abstract description 6
- 206010073306 Exposure to radiation Diseases 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000001513 hot isostatic pressing Methods 0.000 description 5
- 229910052771 Terbium Inorganic materials 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- 229910052777 Praseodymium Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
Landscapes
- Measurement Of Radiation (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Luminescent Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的１
（産業上の利用分野）
本発明は、Ｘ線やγ線などの放射線検出器などに用いら
れる蛍光性セラミックスの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention 1 (Industrial Application Field) The present invention relates to a method for manufacturing fluorescent ceramics used in radiation detectors for X-rays, γ-rays, etc.
（従来の技術）
シンチレータは、Ｘ線などの放射線の刺激によって可視
光または可視光に近い波長の電磁波を放射する材料であ
り、シンチレーションカウンタとしてＸＩＩＣＴ （Ｘ
線断層像撮影装置）の検出器などに用いられている。(Prior art) A scintillator is a material that emits visible light or electromagnetic waves with wavelengths close to visible light when stimulated by radiation such as X-rays.
It is used as a detector in line tomography equipment.
このようなシンチレータとしてはｓ Ｎａｌ 、Ｃｓ１
ＣｄＶＯ４などの単結晶体、ＢａＦＣＪ ：Ｅｕ 、
Ｌａ０Ｂｒ：Ｔｂ。Such scintillators include s Nal , Cs1
Single crystals such as CdVO4, BaFCJ:Eu,
La0Br:Tb.
Ｃｓｌ：ＴＪ２、ＣａＶＯ４およびＣｄＷＯ４焼結体（
特公昭５９−４５０２２号公報参照）、立方晶系希土類
酸化物セラミックス（特開昭５９−２７２８３号公報参
照） 、Ｇｄ２Ｏ２Ｓ：Ｐｒ、 Ｇｄ２０２ Ｓ：（Ｔ
ｂ、Ｐｒ）などの希土類オキシ硫化物セラミックス（特
開昭５８−２０４０８８号公報参照）などが知られてい
る。Csl: TJ2, CaVO4 and CdWO4 sintered body (
(see Japanese Patent Publication No. 59-45022), cubic rare earth oxide ceramics (see Japanese Patent Publication No. 59-27283), Gd2O2S:Pr, Gd202S:(T
Rare earth oxysulfide ceramics such as b, Pr) (see JP-A-58-204088) are known.
これらシンチレータのうち、特に希土類オキシ硫化物セ
ラミックスは、その高い発光効率や大きなＸ線吸収係数
のためにＸ線ＣＴ用のシンチレータとして好適なものと
言える。Among these scintillators, rare earth oxysulfide ceramics are particularly suitable as scintillators for X-ray CT because of their high luminous efficiency and large X-ray absorption coefficient.
上記希土類オキシ硫化物セラミックスは、たとえば原料
粉末をホットプレス法やＨＩＰ（熱間静水圧プレス）法
などを用いて焼結させ、このセラミックス焼結体から切
断、研磨などの機械加工によって所望の形状および寸法
にし、シンチレータとして用いられている。The above-mentioned rare earth oxysulfide ceramics can be produced by, for example, sintering the raw material powder using a hot pressing method or a HIP (hot isostatic pressing) method, and then cutting the ceramic sintered body into a desired shape by machining such as cutting and polishing. It is also used as a scintillator.
（発明が解決しようとする課題）
上述のように希土類オキシ硫化物セラミックスからなる
シンチレータは、ホットプレスやＨＩＰなどによる焼結
体に切断や研磨などの機械加工を施すことによって得ら
れる。しかし、希土類オキシ硫化物セラミックスは、焼
結の際の印加圧力による残留歪やこれら機械加工による
機械的ダメージによって、継続してＸ線の曝射を受けた
シンチレータが一時的に劣化し、光出力（放射線照射時
にシンチレータから放出される光量）が経時的に低下す
るヒステリシス現象が認められるという問題があった。(Problems to be Solved by the Invention) As described above, a scintillator made of rare earth oxysulfide ceramics is obtained by subjecting a sintered body by hot pressing, HIP, etc. to mechanical processing such as cutting and polishing. However, rare earth oxysulfide ceramics suffer from temporary deterioration of the scintillator due to continuous exposure to X-rays due to residual strain caused by the pressure applied during sintering and mechanical damage caused by these machining processes, resulting in optical output. There was a problem in that a hysteresis phenomenon was observed in which the amount of light emitted from the scintillator during radiation irradiation decreased over time.
このようなヒステリシス現象が生じると、たとえばＸ線
ＣＴのＸ線検出器に用いた際に、誤ったＸ線強度データ
を出力することとなり、雑音の多い画像や誤った画像を
もたらすことになる。また、この光出力は放射線検出器
の感度を決定する重要な特性であり、ヒステリシスを減
少させるために光量が極端に低下するようなことがあっ
てはならない。If such a hysteresis phenomenon occurs, for example, when used in an X-ray detector for X-ray CT, incorrect X-ray intensity data will be output, resulting in a noisy or erroneous image. Furthermore, this light output is an important characteristic that determines the sensitivity of a radiation detector, and in order to reduce hysteresis, the light amount must not be extremely reduced.
本発明は、このような従来技術の課題に対処するために
なされたもので、シンチレータの絶対的光出力をほとん
ど低下させることなく、放射線の曝射によるヒステリシ
ス現象を軽減した蛍光性セラミックスを製造する方法を
提供することを目的としている。The present invention has been made to address the problems of the prior art, and is to produce fluorescent ceramics that reduce the hysteresis phenomenon caused by radiation exposure without substantially reducing the absolute light output of the scintillator. The purpose is to provide a method.
［発明の構成］
（課題を解決するための手段）
すなわち本発明の蛍光性セラミックスの製造方法は、
化学式：Ｍ２Ｏ２Ｓ ・・・・・・（１
）（式中、Ｈは希土類元素から選ばれる少なくとも１種
の元素を示す。）で表される希土類オキシ硫化物を主成
分とする希土類元素付活の蛍光性セラミックス焼結体を
所望の形状に機械加工する工程と、この加工体に水素ま
たは硫化水素と不活性ガスとの混合ガス雰囲気中で８０
０℃〜１４００℃の温度で熱処理を施す工程とを有する
ことを特徴としている。[Structure of the invention] (Means for solving the problem) That is, the method for producing fluorescent ceramics of the present invention has the following chemical formula: M2O2S (1)
) (In the formula, H represents at least one element selected from rare earth elements.) A rare earth element-activated fluorescent ceramic sintered body containing rare earth oxysulfide as a main component is shaped into a desired shape. The process of machining and the processing of this workpiece in an atmosphere of a mixed gas of hydrogen or hydrogen sulfide and an inert gas.
It is characterized by having a step of performing heat treatment at a temperature of 0°C to 1400°C.
本発明に用いられる希土類元素付活の蛍光性セラミック
ス焼結体としては、上記（１）式で表される希土類オキ
シ硫化物を主成分とするものであり、上記（Ｉ）式中の
間としてはＧｄｘ Ｌａ、 Ｙ 、 Ｌｕなどが例示さ
れ、これらの１種または２種以上の混合系として用いら
れる。また、付活剤としての希土類元素としては、Ｐ「
、Ｔｂ、 Ｅｕ、 Ｔｓなどの１種または２種以上が用
いられる。具体例としては、Ｇｄ２０２ Ｓ：Ｐｒ、
Ｇｄ２０２ Ｓ：（Ｔｂ、Ｐｒ） 、（Ｙ、Ｇｄ）２０
２ Ｓ：Ｐｒ、 （Ｙ、Ｇｄ）２０２ Ｓ：（Ｔｂ、Ｐ
ｒ） 、Ｌａ２０２ Ｓ：Ｔｂなどが例示される。これ
らはたとえばホットプレス法やＨＩＰ法などによって作
製される。The rare earth element-activated fluorescent ceramic sintered body used in the present invention has a rare earth oxysulfide represented by the above formula (1) as a main component, and the intermediate in the above formula (I) is Gdx Examples include La, Y, Lu, etc., and these are used alone or as a mixture of two or more. In addition, as a rare earth element as an activator, P
, Tb, Eu, Ts, etc., or two or more thereof are used. Specific examples include Gd202S:Pr,
Gd202S: (Tb, Pr), (Y, Gd)20
2 S: Pr, (Y, Gd) 202 S: (Tb, P
r), La202S:Tb, etc. These are produced by, for example, a hot press method or a HIP method.
本発明においては、これらの希土類元素付活の蛍光性セ
ラミックス焼結体に対し、所望の形状とするための切断
加工や研磨加工などの機械加工を施し、この後水素また
は硫化水素と不活性ガスとの混合ガス雰囲気中で８００
℃〜１４００℃の温度において熱処理を施す。In the present invention, these rare earth element-activated fluorescent ceramic sintered bodies are subjected to mechanical processing such as cutting and polishing in order to obtain a desired shape, and then heated with hydrogen or hydrogen sulfide and an inert gas. 800 in a mixed gas atmosphere with
Heat treatment is performed at a temperature of 1400°C to 1400°C.
この熱処理温度が８００℃より低い温度では、有効に内
部歪や機械的ダメージを取り除くことができず、また１
４００℃を超える温度では、上記蛍光性セラミックス焼
結体が着色してしまうという現象がみられ、光出力が低
下してしまう。If this heat treatment temperature is lower than 800℃, internal strain and mechanical damage cannot be effectively removed, and 1
At temperatures exceeding 400° C., a phenomenon occurs in which the fluorescent ceramic sintered body becomes colored, resulting in a decrease in light output.
また、熱処理の際の雰囲気中の水素または硫化水素の濃
度は１体積％以上であることが好ましい。Further, the concentration of hydrogen or hydrogen sulfide in the atmosphere during the heat treatment is preferably 1% by volume or more.
水素や硫化水素の濃度が１体積％未満であると光出力の
低下が著しくなるためである。熱処理に要する時間は、
温度にも依存するためいちがいに言えないが、おおよそ
１０分間以上で効果が認められ、たとえば１時間〜５時
間程度である。This is because if the concentration of hydrogen or hydrogen sulfide is less than 1% by volume, the optical output will be significantly reduced. The time required for heat treatment is
Although it is difficult to say with certainty because it depends on the temperature, the effect is observed in about 10 minutes or more, for example, about 1 hour to 5 hours.
（作 用）
本発明においては、所望の形状とするための機械加工を
行った希土類オキシ硫化物蛍光性セラミックスに対して
水素または硫化水素と不活性ガスとの混合ガス雰囲気中
で８００℃〜１４００℃の温度で熱処理を施す。この水
素または硫化水素を含む不活性ガス中での熱処理によっ
て内部歪が緩和されるとともに、機械加工による機械的
ダメージが有効に取り除かれ、ヒステリシスが低減する
。たとえば上記雰囲気以外の雰囲気中での熱処理では、
８００℃〜１４００℃の温度範囲による熱処理でも希土
類オキシ硫化物蛍光性セラミックスの着色が発生し、光
出力が大幅に低下してしまう。(Function) In the present invention, rare earth oxysulfide fluorescent ceramics that have been machined into a desired shape are heated at 800°C to 1400°C in a hydrogen or mixed gas atmosphere of hydrogen sulfide and an inert gas. Heat treatment is carried out at a temperature of °C. This heat treatment in an inert gas containing hydrogen or hydrogen sulfide alleviates internal strain, effectively removes mechanical damage caused by machining, and reduces hysteresis. For example, in heat treatment in an atmosphere other than the above,
Even heat treatment in the temperature range of 800° C. to 1400° C. causes coloring of the rare earth oxysulfide fluorescent ceramics, resulting in a significant decrease in light output.
（実施例） 次に、本発明の実施例について説明する。(Example) Next, examples of the present invention will be described.
実施例１
まず、１５００℃Ｘ １０００気圧の条件によるＨ Ｉ
Ｐ ｌ：ｌ：よりＧｄ２０２ Ｓ：Ｐｒのセラミック
ス焼結体を作製し、このセラミックス焼結体から １ｍ
５Ｘ ２ｓｓＸ ３０ｍ−の大きさのシンチレータ片
を切り出した。Example 1 First, H I under the conditions of 1500°C x 1000 atm.
A ceramic sintered body of Gd202 S:Pr was prepared from P l:l, and a 1 m
A piece of scintillator with a size of 5×2ss×30m was cut out.
なお、この切断後のシンチレータ片に管電圧１２０ｋＶ
ｐ 、線量１５００レントゲンのＸ線を曝射し、この後
管電圧ｔ２０ｋＶｐ 、線量０．Ｏｌレントゲンの条件
でＸ線を照射して光出力を測定したところ、切断後のシ
ンチレータ片の光出力に対して、ヒステリシス現象によ
りＸ線曝射前の８１％に低下した。In addition, a tube voltage of 120 kV was applied to the scintillator piece after cutting.
p, a dose of 1500 roentgens is irradiated, and then the tube voltage is t20kVp, and the dose is 0. When the optical output was measured by irradiating X-rays under Ol-X-ray conditions, the optical output of the scintillator piece after cutting decreased to 81% of that before X-ray irradiation due to a hysteresis phenomenon.
次に、切断して所望の形状としたシンチレータ片に、箱
型電気炉中において水素と窒素の混合ガス（水素濃度３
体積％、流Ｑ ｔｏｏＪ２／ｍ１ｎ）雰囲気下で１２０
０℃× ２時間の条件で熱処理を施した。Next, the scintillator pieces cut into the desired shape were heated with a mixed gas of hydrogen and nitrogen (hydrogen concentration 3) in a box electric furnace.
Volume %, flow Q tooJ2/m1n) 120 under atmosphere
Heat treatment was performed at 0°C for 2 hours.
このようにして得た熱処理後のシンチレータに線量１５
００レントゲンのＸ線を曝射し、この後管電圧１２０ｋ
ｖｐ 、線量０．Ｏｌレントゲンの条件でＸ線を照射し
、Ｘ線曝射前のシンチレータ片の光出力を１００％とし
て光出力をｉｌＮ定したところ、光出力の維持率は８５
％と、上記熱処理を行わないものに比べてヒステリシス
が減少した。また、熱処理後のシンチレータの光出力は
、熱処理を施さないものに対して１４％向上していた。The scintillator thus obtained after heat treatment received a dose of 15
00 Roentgen X-rays are emitted, and then the tube voltage is 120k.
vp, dose 0. When X-rays were irradiated under Ol-X-ray conditions and the light output was determined by setting the light output of the scintillator piece before X-ray exposure as 100%, the light output maintenance rate was 85.
%, the hysteresis was reduced compared to that without the above heat treatment. Furthermore, the light output of the scintillator after heat treatment was 14% higher than that without heat treatment.
実施例２
上記実施例１における熱処理に代えて、切断後のシンチ
レータ片に管状炉中で硫化水素と窒素の混合ガス（硫化
水素濃度２体積％、流量２Ｊ２１１ｎ）雰囲気下で９０
０℃×１時間の熱処理を施した。Example 2 Instead of the heat treatment in Example 1, the scintillator pieces after cutting were treated in a tube furnace in an atmosphere of a mixed gas of hydrogen sulfide and nitrogen (hydrogen sulfide concentration: 2% by volume, flow rate: 2J211n) at 90°C.
Heat treatment was performed at 0° C. for 1 hour.
このようにして得たシンチレータに対して実施例１と同
様に、線ｆｆｉ １５００レントゲンのＸ線曝射を行い
、光出力の維持率を測定したところ、９１％と熱処理を
施さないものに比べてヒステリシスの大幅な減少が認め
られた。また、処理後のシンチレータの光出力は、熱処
理前に比べてわずか１％低下しただけであり、実用上は
とんど支障のないものであった。The scintillator thus obtained was subjected to X-ray irradiation at an FFI 1500 Roentgen as in Example 1, and the optical output maintenance rate was measured, which was 91%, compared to that without heat treatment. A significant reduction in hysteresis was observed. Furthermore, the optical output of the scintillator after the treatment was only 1% lower than that before the heat treatment, which was practically no problem.
実施例３
１４００℃ｘ １０００気圧の条件のＨＩＰによって作
製したＬａ２０２ Ｓ：Ｔｂのセラミックス焼結体から
ｌｓｍＸ ２＊ｉ ｘ ３０５ｍの大きさのシンチレ
ータ片を切り出した。Example 3 A scintillator piece having a size of lsm x 2*i x 305 m was cut out from a La202 S:Tb ceramic sintered body produced by HIP under conditions of 1400° C. and 1000 atm.
なお、この切断後のシンチレータ片に実施例１と同一条
件でＸ線を曝射し、この後実施例１と同様にして光出力
の維持率を測定したところ、ヒステリシス現象によりＸ
線曝射前の８９％に低下した。The scintillator piece after cutting was exposed to X-rays under the same conditions as in Example 1, and then the optical output maintenance rate was measured in the same manner as in Example 1.
This decreased to 89% of the level before radiation exposure.
次に、切断して所望の形状としたシンチレータ片に、箱
型電気炉ボにおいて水素と窒素の混合ガス（水素濃度３
体積％、流ｆｆｉ １００β／５ｉｎ）雰囲気下で１２
００℃×・１時間の条件で熱処理を施した。Next, the scintillator pieces cut into the desired shape were heated with a mixed gas of hydrogen and nitrogen (hydrogen concentration 3.
Volume %, flow ffi 100β/5in) under atmosphere 12
Heat treatment was performed at 00°C for 1 hour.
このようにして得た熱処理後のシンチレータに線２１５
００レントゲンのＸ線を曝射し、実施例１と同様にして
光出力の維持率を測定したところ９４％と、上記熱処理
を行わないものに比べてヒステリシスが大幅に減少した
。また、熱処理後のシンチレータの光出力は、熱処理を
施さないものに対して１０％向上していた。A line 215 is attached to the scintillator after heat treatment obtained in this way.
When irradiated with X-rays of 0.00 Roentgen and measured for the retention rate of optical output in the same manner as in Example 1, it was found to be 94%, which was a significant reduction in hysteresis compared to that without the heat treatment. Furthermore, the light output of the scintillator after heat treatment was 10% higher than that without heat treatment.
［発明の効果］
以上説明したように本発明によれば、所望の形状を得る
際に不可欠な機械加工によって受けるダメージや焼結時
の印加圧力による残留歪に起因するヒステリシス現象、
すなわちＸ線曝射による光出力の低下を大幅に減少させ
ることが可能となる。[Effects of the Invention] As explained above, according to the present invention, the hysteresis phenomenon caused by damage caused by machining that is essential for obtaining a desired shape and residual strain caused by applied pressure during sintering,
That is, it becomes possible to significantly reduce the decrease in optical output due to X-ray exposure.
しかも、熱処理による絶対的光出力の低下がほとんどな
いために、十分な検出感度が得られる。したがって、本
発明によって得られる蛍光性セラミックスは十分な感度
と少ないヒステリシスを示し、Ｘ＠ＣＴなどの放射線検
出器に好適なものを提供することができる。Moreover, since there is almost no decrease in absolute optical output due to heat treatment, sufficient detection sensitivity can be obtained. Therefore, the fluorescent ceramics obtained according to the present invention exhibit sufficient sensitivity and low hysteresis, and can be suitable for radiation detectors such as X@CT.
出願人 株式会社 東芝 代理人 弁理士 須 山 佐 −Applicant: Toshiba Corporation Agent Patent Attorney Suyama Sa
Claims (1)
元素を示す。）で表される希土類オキシ硫化物を主成分
とする希土類元素付活の蛍光性セラミックス焼結体を所
望の形状に機械加工する工程と、この加工体に水素また
は硫化水素と不活性ガスとの混合ガス雰囲気中で８００
℃〜１４００℃の温度で熱処理を施す工程とを有するこ
とを特徴とする蛍光性セラミックスの製造方法。(1) A rare earth element-activated fluorescent ceramic sintered body containing a rare earth oxysulfide as a main component and represented by the chemical formula: M_2O_2S (wherein, M represents at least one element selected from rare earth elements). A process of machining the workpiece into a desired shape, and subjecting the workpiece to 800°C in an atmosphere of a mixed gas of hydrogen or hydrogen sulfide and an inert gas.
1. A method for producing fluorescent ceramics, comprising the step of performing heat treatment at a temperature of 1400°C to 1400°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1030732A JP2685867B2 (en) | 1989-02-09 | 1989-02-09 | Method for manufacturing fluorescent ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1030732A JP2685867B2 (en) | 1989-02-09 | 1989-02-09 | Method for manufacturing fluorescent ceramics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02209987A true JPH02209987A (en) | 1990-08-21 |
| JP2685867B2 JP2685867B2 (en) | 1997-12-03 |
Family
ID=12311845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1030732A Expired - Lifetime JP2685867B2 (en) | 1989-02-09 | 1989-02-09 | Method for manufacturing fluorescent ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2685867B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0690116A1 (en) * | 1994-06-29 | 1996-01-03 | Rhone-Poulenc Chimie | Rare earth oxysulfide, process for its manufacturing and its use as phosphor |
| US5518659A (en) * | 1994-01-26 | 1996-05-21 | Siemens Aktiengesellschaft | Method for manufacturing a phosphor having high translucency |
| CN1061958C (en) * | 1994-01-26 | 2001-02-14 | 西门子公司 | Method for producing lightening material with high translucency |
| DE19506368C2 (en) * | 1994-02-25 | 2001-03-01 | Toshiba Kawasaki Kk | Scintillator and method for its manufacture, as well as X-ray detector and X-ray computed tomography scanner |
| CN1065220C (en) * | 1994-07-21 | 2001-05-02 | 西门子公司 | Method for producing fluorescence ceramics by hot press |
| US8123981B2 (en) | 2009-02-19 | 2012-02-28 | Nitto Denko Corporation | Method of fabricating translucent phosphor ceramics |
| US8137587B2 (en) * | 2009-02-19 | 2012-03-20 | Nitto Denko Corporation | Method of manufacturing phosphor translucent ceramics and light emitting devices |
| CN115321579A (en) * | 2022-08-18 | 2022-11-11 | 北京科技大学 | Preparation method of high-performance sulfur oxide fluorescent powder |
-
1989
- 1989-02-09 JP JP1030732A patent/JP2685867B2/en not_active Expired - Lifetime
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5518659A (en) * | 1994-01-26 | 1996-05-21 | Siemens Aktiengesellschaft | Method for manufacturing a phosphor having high translucency |
| CN1061958C (en) * | 1994-01-26 | 2001-02-14 | 西门子公司 | Method for producing lightening material with high translucency |
| DE19506368C2 (en) * | 1994-02-25 | 2001-03-01 | Toshiba Kawasaki Kk | Scintillator and method for its manufacture, as well as X-ray detector and X-ray computed tomography scanner |
| EP0690116A1 (en) * | 1994-06-29 | 1996-01-03 | Rhone-Poulenc Chimie | Rare earth oxysulfide, process for its manufacturing and its use as phosphor |
| FR2721918A1 (en) * | 1994-06-29 | 1996-01-05 | Rhone Poulenc Chimie | RARE EARTH OXYSULFIDE, PREPARATION METHOD THEREOF, AND USE THEREOF AS LUMINOPHORE |
| CN1065220C (en) * | 1994-07-21 | 2001-05-02 | 西门子公司 | Method for producing fluorescence ceramics by hot press |
| US8123981B2 (en) | 2009-02-19 | 2012-02-28 | Nitto Denko Corporation | Method of fabricating translucent phosphor ceramics |
| US8137587B2 (en) * | 2009-02-19 | 2012-03-20 | Nitto Denko Corporation | Method of manufacturing phosphor translucent ceramics and light emitting devices |
| US8298442B2 (en) | 2009-02-19 | 2012-10-30 | Nitto Denko Corporation | Method of manufacturing phosphor translucent ceramics and light emitting devices |
| CN115321579A (en) * | 2022-08-18 | 2022-11-11 | 北京科技大学 | Preparation method of high-performance sulfur oxide fluorescent powder |
| CN115321579B (en) * | 2022-08-18 | 2023-08-08 | 北京科技大学 | Preparation method of high-performance oxysulfide fluorescent powder |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2685867B2 (en) | 1997-12-03 |
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