JPH0219970B2 - - Google Patents
Info
- Publication number
- JPH0219970B2 JPH0219970B2 JP57058837A JP5883782A JPH0219970B2 JP H0219970 B2 JPH0219970 B2 JP H0219970B2 JP 57058837 A JP57058837 A JP 57058837A JP 5883782 A JP5883782 A JP 5883782A JP H0219970 B2 JPH0219970 B2 JP H0219970B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- photosensitive resin
- resin film
- etched
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011347 resin Substances 0.000 claims description 28
- 229920005989 resin Polymers 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57058837A JPS58175830A (ja) | 1982-04-08 | 1982-04-08 | パタ−ン形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57058837A JPS58175830A (ja) | 1982-04-08 | 1982-04-08 | パタ−ン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58175830A JPS58175830A (ja) | 1983-10-15 |
JPH0219970B2 true JPH0219970B2 (de) | 1990-05-07 |
Family
ID=13095762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57058837A Granted JPS58175830A (ja) | 1982-04-08 | 1982-04-08 | パタ−ン形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58175830A (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61144083A (ja) * | 1984-12-18 | 1986-07-01 | Agency Of Ind Science & Technol | ジヨセフソン接合素子の形成方法 |
JPS61144084A (ja) * | 1984-12-18 | 1986-07-01 | Agency Of Ind Science & Technol | ジョセフソン接合素子の形成方法 |
JPH0821571B2 (ja) * | 1984-12-26 | 1996-03-04 | 日本電気株式会社 | 微細パターン形成方法 |
JPS61216431A (ja) * | 1985-03-22 | 1986-09-26 | Nec Corp | 微細パタ−ン形成方法 |
JPH0658905B2 (ja) * | 1985-03-22 | 1994-08-03 | 日本電気株式会社 | 微細パタ−ン形成方法 |
JPS61263179A (ja) * | 1985-05-16 | 1986-11-21 | Agency Of Ind Science & Technol | ジヨセフソン接合素子の製造方法 |
JPS62183576A (ja) * | 1986-02-08 | 1987-08-11 | Agency Of Ind Science & Technol | ジヨセフソン素子の製造方法 |
JPS6394692A (ja) * | 1986-10-09 | 1988-04-25 | Agency Of Ind Science & Technol | ジヨセフソン接合素子の製造方法 |
JPH01179418A (ja) * | 1988-01-07 | 1989-07-17 | Sharp Corp | マスク |
JPH0525601U (ja) * | 1991-09-17 | 1993-04-02 | 株式会社オビツ製作所 | 花束用照明装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53124085A (en) * | 1977-01-26 | 1978-10-30 | Texas Instruments Inc | Semiconductor memory |
JPS56137622A (en) * | 1980-03-28 | 1981-10-27 | Nec Corp | Forming of cross pattern electrode |
JPS56137623A (en) * | 1980-03-28 | 1981-10-27 | Nec Corp | Forming of cross pattern electrode |
-
1982
- 1982-04-08 JP JP57058837A patent/JPS58175830A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53124085A (en) * | 1977-01-26 | 1978-10-30 | Texas Instruments Inc | Semiconductor memory |
JPS56137622A (en) * | 1980-03-28 | 1981-10-27 | Nec Corp | Forming of cross pattern electrode |
JPS56137623A (en) * | 1980-03-28 | 1981-10-27 | Nec Corp | Forming of cross pattern electrode |
Also Published As
Publication number | Publication date |
---|---|
JPS58175830A (ja) | 1983-10-15 |
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