JPH02152030A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH02152030A JPH02152030A JP63304657A JP30465788A JPH02152030A JP H02152030 A JPH02152030 A JP H02152030A JP 63304657 A JP63304657 A JP 63304657A JP 30465788 A JP30465788 A JP 30465788A JP H02152030 A JPH02152030 A JP H02152030A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- substrate
- optical disk
- optical recording
- electrolysis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 32
- 239000010409 thin film Substances 0.000 claims abstract description 32
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000000693 micelle Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 10
- 239000010408 film Substances 0.000 abstract description 9
- 239000004094 surface-active agent Substances 0.000 abstract description 7
- 239000003792 electrolyte Substances 0.000 abstract description 6
- 239000010419 fine particle Substances 0.000 abstract description 6
- 229910052759 nickel Inorganic materials 0.000 abstract description 5
- 125000006850 spacer group Chemical group 0.000 abstract description 4
- 239000000084 colloidal system Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 19
- 239000008151 electrolyte solution Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 229930192627 Naphthoquinone Natural products 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000015654 memory Effects 0.000 description 3
- 150000002791 naphthoquinones Chemical class 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000003115 supporting electrolyte Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- -1 Jll In forming Q Substances 0.000 description 1
- 230000005374 Kerr effect Effects 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、光記録材料として、反射用金属薄膜と反射防
止用薄膜の２層構造を用いる光記録媒体における、反射
防止用薄膜の形成方法に関するものである。Detailed Description of the Invention [Industrial Application Field] The present invention provides a method for forming an antireflection thin film in an optical recording medium that uses a two-layer structure of a reflective metal thin film and an antireflection thin film as an optical recording material. It is related to.
〔発明の概要］
本発明は、反射用金属薄膜と反射防止用薄膜の２層構造
を用い、ビット穴あけ方式による反射率の違いを利用す
る光記録媒体において、その反射防止用薄膜の形成方法
なミセル電解で行うことによりプロセスを簡略にし、低
コストで品質の安定した光記録媒体を製造するものであ
る。[Summary of the Invention] The present invention provides a method for forming an anti-reflection thin film in an optical recording medium that uses a two-layer structure of a reflective metal thin film and an anti-reflection thin film and utilizes the difference in reflectance due to the bit drilling method. By using micellar electrolysis, the process is simplified and optical recording media with stable quality can be manufactured at low cost.
［従来の技術１
１ａ気メモリーよりも大容量の情報を記録再生できる光
メモリ−（光記録媒体）は、次世代のメモｌ−として近
年活発に開発商品化がすすめられている。[Prior Art 1] Optical memories (optical recording media) that can record and reproduce larger amounts of information than 1A memory have been actively developed and commercialized as next-generation memories in recent years.
光記録再生の方法としては、Ｅｕ性薄膜のカー効果を利
用する光磁気方式や、光ビームに対する反射率の変化を
利用する方法がある。Optical recording and reproducing methods include a magneto-optical method that utilizes the Kerr effect of a Eu thin film and a method that utilizes changes in reflectance with respect to a light beam.
後者の光の反射率変化を利用する方式としては相転移方
式や有機色素薄膜方式があるが、反射用金属薄膜と反射
防止用薄膜の２層構造とし、反射防止用薄膜にビットを
空ける事により反射率の違いが発生する事を利用する方
法も、酸化しやすい金属ｍ性薄膜を使う光磁気ディスク
媒体と異なり長期的に安定であると同時に、Ｃ／Ｎが高
くでるため、特にＤＲＡＷクイブのメディアとして採用
されている。The latter method, which utilizes changes in the reflectance of light, includes the phase transition method and the organic dye thin film method. The method that takes advantage of the difference in reflectance is also stable over a long period of time, unlike magneto-optical disk media that uses thin metal films that are easily oxidized. It is used as a media.
しかし、その製造方法においては、特に反射防止用；ｉ
ｌＲＭとなる有機または、無機系薄膜の形成方法として
、真空蒸着法あるいは有機溶剤に溶解してスピンコード
する方法が行われている。However, in the manufacturing method, especially for antireflection; i
As a method for forming an organic or inorganic thin film that becomes an IRM, a vacuum evaporation method or a method of dissolving it in an organic solvent and spin-coding are used.
スピンコード法は、量産性に優れているが難溶性の材料
が多く、使用出来る材Ｈの範囲が限定される。また有機
溶剤を使用するため、プラスティク基板が侵される可能
性もあり、生産性の悪い真空蒸着法あるいはスパッタ法
で行わざる得なかった。Although the spin cord method is excellent in mass production, many materials are poorly soluble, and the range of materials H that can be used is limited. Furthermore, since an organic solvent is used, there is a possibility that the plastic substrate may be corroded, so that vacuum evaporation or sputtering methods, which have poor productivity, have to be used.
〔発明が解決しようとする課題１
本発明は１以上の様な従来問題であった反射用金属薄膜
上への反射防止用薄膜の形成を容易にする事により生産
性を改善すると供に、光記録媒体としての品質を安定す
る事を目的としている。[Problem to be Solved by the Invention 1] The present invention improves productivity by facilitating the formation of an anti-reflection thin film on a reflective metal thin film, which has caused at least one of the conventional problems. The purpose is to stabilize the quality of the recording medium.
［課題を解決するための手段１
本発明では、反射用金属薄膜上への反射防止用、Ｊｌｌ
Ｑの形成において、無機または有機系材料の微粒子を、
界面活性剤で取り囲んでコロイド状態のミセル電解液と
した後、このミセル電解液に、表面に反射用金属薄膜を
形成した光デイスク基板を浸漬し、光デイスク基板表面
と通電用の電極との間に電圧をかけ、光デイスク基板の
金属薄膜表面上でミセル電解を行う事により、界面活性
剤に取り囲まれている無機、または有機系材料の微粒子
を反射用金属表面上に析出、薄膜化することを特徴とす
る。[Means for Solving the Problems 1] In the present invention, a method for preventing reflection on a reflective metal thin film, Jll
In forming Q, fine particles of inorganic or organic material are
After surrounding the micelle electrolyte with a surfactant to form a colloidal micelle electrolyte, an optical disk substrate with a reflective metal thin film formed on the surface is immersed in the micelle electrolyte, and the gap between the optical disk substrate surface and the current-carrying electrode is immersed. By applying a voltage to perform micellar electrolysis on the surface of the metal thin film of the optical disk substrate, fine particles of inorganic or organic material surrounded by surfactant are deposited on the reflective metal surface and formed into a thin film. It is characterized by
［作 用１
本発明によれば、反射防止用薄膜の光デイスク基板の金
属表面上への形成をミセル電解液中での電解により容易
に行う事が出来、装置的にも簡略な設備となり生産性が
高いため、安価で高性能の光ディスクを大量に生産する
事が可能になった。[Function 1] According to the present invention, an antireflection thin film can be easily formed on the metal surface of an optical disk substrate by electrolysis in a micellar electrolyte, and the equipment is simple and easy to manufacture. Because of its high performance, it has become possible to mass-produce inexpensive, high-performance optical discs.
［実 施 例−１１
第１図（ａ）〜（ｄ）は、本発明の光記録媒体の実施例
の手順と膜構成を説明するための断面図である。光デイ
スク基板（１）は、射出成形により製造された厚み１．
２ｍｍのＰＣ基板である。[Example 11] FIGS. 1(a) to 1(d) are cross-sectional views for explaining the procedure and film structure of an example of the optical recording medium of the present invention. The optical disk substrate (1) is manufactured by injection molding and has a thickness of 1.
It is a 2mm PC board.
この基板のグループ表面に反射用としてニッケル薄膜相
（２）をスパッタリング法により８００人の厚みに形成
する（内、外周はマスキングして、ニッケル層が形成さ
れない様にした）。A reflective nickel thin film phase (2) was formed on the group surface of this substrate to a thickness of 800 mm by sputtering (the inner and outer peripheries were masked to prevent the formation of a nickel layer).
次に、この基板をナフトキノン系色素の微粒子を界面活
性剤で取り囲んでコロイド状態にしたミセル電解溶液中
に浸漬し、陰極としてステンレス板との間に電圧をかけ
、光デイスク基板表面でのミセル電解によりｌ、２００
人程程度厚みの有機色素膜（３）が形成される。Next, this substrate is immersed in a micelle electrolyte solution in which fine particles of naphthoquinone dye are surrounded by a surfactant to form a colloid, and a voltage is applied between the stainless steel plate as a cathode and micelle electrolysis occurs on the surface of the optical disk substrate. by l, 200
An organic dye film (3) approximately as thick as a human being is formed.
この様にして作られた光デイスク面上に、透明フラット
基板（４）を、スペーサー（５）を介して張り合わせる
事によりエアーサンドイッチ光ディスク（ｄ）として完
成した物となる。A transparent flat substrate (4) is laminated on the surface of the optical disk thus produced via a spacer (5), thereby completing the air sandwich optical disk (d).
ミセル電解溶液は、界面活性剤としてフェロセニルＰＥ
Ｇ （同人化学槽）を用いた６液組成、電解条件は以下
の様に行った。The micellar electrolyte solution contains ferrocenyl PE as a surfactant.
The six liquid composition and electrolysis conditions using G (Dojin Chemical Bath) were as follows.
〈液組成〉
フェロセニルＰＥＧ ： ２ｍＬり・Ｌｉ
Ｂｒ（支持電解質）：０．２Ｍ
ナフトキノン系色素 ； ７ｍＭ〈電解条件
〉
電解電位 ； １２Ｖ・電解時間
： ８ ｍ１ｎｓ電解温度
： ３０℃撹拌 ：
強撹拌［実 施 例−２１
実施例−１と同様に、第１図（ａ）〜（ｂ）を用いて説
明すると射出成形により製造された厚み１．２ｍｍのア
モルファスポリオレフィン製の光デイスク基板（１）の
グループ表面に反射用としてスパッタリングにより７０
０人のｉ艮の薄膜（２）を形成する。<Liquid composition> Ferrocenyl PEG: 2mL Li
Br (supporting electrolyte): 0.2M Naphthoquinone dye; 7mM <Electrolysis conditions> Electrolysis potential: 12V/electrolysis time
: 8 m1ns electrolysis temperature
: Stirring at 30℃ :
Strong stirring [Example 21 Similar to Example 1, an optical disk substrate made of amorphous polyolefin with a thickness of 1.2 mm manufactured by injection molding ( 70 by sputtering on the group surface of 1) for reflection.
A thin film (2) of 0 people is formed.
この基板を、ＴｅＴｉＡｇＳｅ合金の微粒子を界面活性
剤で取り囲んでコロイド状態にしたミセル電解溶液中に
浸漬し、陰極としてステンレスプレートとの間に電圧を
かけ、ディスク基板表面でのミセル電解により１，００
０人の厚みの合金層（３）が形成される。This substrate was immersed in a micellar electrolytic solution in which fine particles of TeTiAgSe alloy were surrounded by a surfactant to form a colloid, and a voltage was applied between the plate and a stainless steel plate as a cathode.
An alloy layer (3) is formed with a thickness of 0.
この光デイスク面上に、透明フラット基板（４）を、ス
ペーサー（５）を介して張り合わセる事によりエアーサ
ンドイッチ光ディスク（ｄ）として完成した物となる６
ミセル電解溶液は、界面活性剤としてフェロセニルＰＥ
Ｇ（同人化学製）を用いた。液組成、電解条件は以下の
様に行った。A transparent flat substrate (4) is laminated on the surface of this optical disk via a spacer (5) to form a completed air sandwich optical disk (d).6 The micellar electrolytic solution contains ferrocenyl as a surfactant. P.E.
G (manufactured by Doujin Kagaku) was used. The liquid composition and electrolysis conditions were as follows.
〈液組成〉
・フェロセニルＰＥＧ ３ｍＭＬｉＢｒ
（支持電解質）：０．３Ｍ
ＴｅＴｉＡｇＳｅａ金微粒子： １０ｍＭ〈電解条件
）
電解電位 、 １０Ｖ電解時間
７ ｍ１ｎｓ・電解温度
３０℃撹拌 、
強撹拌［発明の効果］
本発明は、以上述べたように光記録材料として反射用金
属薄膜と反射防止用薄膜の２層構造を用いる光記録媒体
において、反射防止用薄膜の形成を、ミセル電解法によ
り行う事により、難溶性の有機色素系反射防止用薄膜の
形成を容易に行う事ができるようになった。<Liquid composition> ・Ferrocenyl PEG 3mMLiBr
(Supporting electrolyte): 0.3M TeTiAgSea gold particles: 10mM <Electrolysis conditions) Electrolysis potential, 10V electrolysis time
7 m1ns・Electrolysis temperature
Stir at 30℃,
Strong Stirring [Effects of the Invention] As described above, in an optical recording medium that uses a two-layer structure of a reflective metal thin film and an antireflection thin film as an optical recording material, the present invention is capable of forming an antireflection thin film using micellar electrolysis. By using this method, it has become possible to easily form a poorly soluble organic dye-based antireflection thin film.
実施例においては、成形基板にニッケル４模または、銀
薄膜を形成して、反射用金属薄膜とする方法について述
べたが、これ以外の金属のコーティングも容易に適用す
る事が可能である。In the embodiment, a method has been described in which a nickel 4 pattern or silver thin film is formed on a molded substrate to form a reflective metal thin film, but coatings of other metals can also be easily applied.
また反射防止用薄膜についても、有機色素、金属以外の
有機物質、あるいは無機物質も、レザー光で容易に昇華
する物であれば、すべて本発明に含まれるものである。Further, regarding the antireflection thin film, any organic dye, organic substance other than metal, or inorganic substance is included in the present invention as long as it is easily sublimed by laser light.
第１図（ａ）〜（ｄ）は、本発明の光記録媒体の実施例
の手順と膜構成を示す断面図である。
■・・・光デイスク基板
２・・・二・ンケル月莫または、を艮薄膜３ ・・ナフ
トキノン系色素膜または、ＴｅＴｉＡｇＳｅ合金膜
透明フラッ
・スペーサー
ト基扱
以上
出願人 セイコーエプソン株式会社
代理人 弁理士 鈴 木 喜三部（仙１名）第１図FIGS. 1(a) to 1(d) are cross-sectional views showing the procedure and film structure of an embodiment of the optical recording medium of the present invention. ■... Optical disk substrate 2... 2... Thin film 3... Naphthoquinone dye film or TeTiAgSe alloy film Transparent flat spacer based Applicant: Seiko Epson Corporation Agent Patent attorney Master Suzuki Kisanbe (1 master) Figure 1
Claims (1)
膜の２層構造を用いる光記録媒体において、反射防止用
薄膜の形成を、ミセル電解法により行った事を特徴とす
る光記録媒体。 ２）反射防止用薄膜の物質が、無機または、有機の単位
もしくは、化合物である事を特徴とする、請求項１に記
載の光記録媒体。[Scope of Claims] 1) An optical recording medium that uses a two-layer structure of a reflective metal thin film and an antireflection thin film as an optical recording material, characterized in that the antireflection thin film is formed by micelle electrolysis. optical recording medium. 2) The optical recording medium according to claim 1, wherein the substance of the antireflection thin film is an inorganic or organic unit or compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63304657A JPH02152030A (en) | 1988-12-01 | 1988-12-01 | Optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63304657A JPH02152030A (en) | 1988-12-01 | 1988-12-01 | Optical recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02152030A true JPH02152030A (en) | 1990-06-12 |
Family
ID=17935663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63304657A Pending JPH02152030A (en) | 1988-12-01 | 1988-12-01 | Optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02152030A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007014538A1 (en) * | 2007-03-27 | 2008-10-02 | Carl Zeiss Ag | Method for producing an anti-reflection surface on an optical element and optical elements with an anti-reflection surface |
-
1988
- 1988-12-01 JP JP63304657A patent/JPH02152030A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007014538A1 (en) * | 2007-03-27 | 2008-10-02 | Carl Zeiss Ag | Method for producing an anti-reflection surface on an optical element and optical elements with an anti-reflection surface |
| WO2008116616A1 (en) * | 2007-03-27 | 2008-10-02 | Carl Zeiss Ag | Method for producing an anti-reflection surface on an optical element, and optical elements comprising an anti-reflection surface |
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