JPH02149692A - Co-ni alloy electrodepositing method for producing co-ni alloy foil - Google Patents
Co-ni alloy electrodepositing method for producing co-ni alloy foilInfo
- Publication number
- JPH02149692A JPH02149692A JP30079888A JP30079888A JPH02149692A JP H02149692 A JPH02149692 A JP H02149692A JP 30079888 A JP30079888 A JP 30079888A JP 30079888 A JP30079888 A JP 30079888A JP H02149692 A JPH02149692 A JP H02149692A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- electrolyte
- cathode
- foil
- electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011888 foil Substances 0.000 title claims abstract description 39
- 229910000990 Ni alloy Inorganic materials 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 40
- 239000000956 alloy Substances 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 25
- 229910020630 Co Ni Inorganic materials 0.000 claims abstract description 24
- 229910002440 Co–Ni Inorganic materials 0.000 claims abstract description 24
- 239000003792 electrolyte Substances 0.000 claims abstract description 20
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 claims abstract description 13
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 claims abstract description 10
- 150000002500 ions Chemical class 0.000 claims abstract description 10
- 229910001629 magnesium chloride Inorganic materials 0.000 claims abstract description 5
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000004327 boric acid Substances 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 30
- 239000008151 electrolyte solution Substances 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 9
- 238000005868 electrolysis reaction Methods 0.000 abstract description 4
- 229910052759 nickel Inorganic materials 0.000 abstract description 4
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 13
- 238000002474 experimental method Methods 0.000 description 7
- 238000005096 rolling process Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 229910021645 metal ion Inorganic materials 0.000 description 6
- 238000007747 plating Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910020676 Co—N Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000012733 comparative method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、デジタルコンピューターの永久磁気皮膜等磁
性材料に用いられるＣｏ−Ｎｉ合金箔を電着によって製
造するためのＣｏ−Ｎｉ合金電解析出方法に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to Co-Ni alloy electrolytic deposition for producing Co-Ni alloy foil used in magnetic materials such as permanent magnetic coatings of digital computers by electrodeposition. Regarding the method.
（従来技術とその問題点）
Ｃｏ−Ｎｉ合金はそれが有する物理的特性のため磁性材
料として、デジタルコンピューターの永久磁気皮膜等に
用いられている。最近では、従来用いてきた材料よりさ
らに薄いＣｏ−Ｎｉ合金箔が望まれ、今後これらの合金
箔の需要はさらに拡大するものと考えられる。従来Ｃｏ
−Ｎｉ合金箔の製造方法には（１）目的の化学組成を有
する合金を圧延により板厚を減少させ目的とする箔を得
る方法、 （２）Ｃｏ−Ｎｉ合金を電解法により陰極面
に析出させた後これを剥離する方法とがあった。(Prior Art and its Problems) Due to its physical properties, Co--Ni alloy is used as a magnetic material in permanent magnetic coatings of digital computers and the like. Recently, there has been a demand for Co--Ni alloy foils that are even thinner than conventionally used materials, and it is thought that the demand for these alloy foils will further expand in the future. Conventional Co
-The manufacturing method of Ni alloy foil includes (1) a method of rolling an alloy having the desired chemical composition to reduce the plate thickness to obtain the desired foil, and (2) a method of depositing a Co-Ni alloy on the cathode surface by electrolytic method. There is a method of peeling it off after letting it dry.
圧延によりＣｏ−Ｎｉ合金箔を製造する場合、圧延によ
り材料は加工硬化し、目的とする板厚を得るためには焼
鈍により材料を軟化しなければならない。そのため箔の
製造は極めて困難となり、コスト高の原因となる。また
、圧延法による合金箔は。When manufacturing a Co-Ni alloy foil by rolling, the material is work-hardened by rolling, and must be softened by annealing in order to obtain the desired thickness. This makes manufacturing the foil extremely difficult and causes high costs. In addition, alloy foil is produced using the rolling method.
金か組織が圧延方向に成長するため磁気特性に劣る。Magnetic properties are poor because the gold structure grows in the rolling direction.
一方、電解法によりＧｏ−Ｎｉ合金箔を製造する場合、
ｃｏ２＋、Ｎｊ２＋を含む電解液を用い目的とする合金
組成を有する電着層を得なけれ″ばならない、従来より
磁性めっき、装飾めっきとして普通鋼等にＣｏ−Ｎｉ合
金をめっきする方法はあった。しかし。On the other hand, when manufacturing Go-Ni alloy foil by electrolytic method,
Conventionally, there has been a method of plating a Co--Ni alloy on ordinary steel, etc. as magnetic plating or decorative plating, which requires the use of an electrolytic solution containing co2+ and Nj2+ to obtain an electrodeposited layer having a desired alloy composition. but.
これらの電解液では電解条件によって析出組成および材
料の特性が異なり、電着層は内部応力が高く合金箔を形
成しにくい、従って、磁気特性が最も優れていると言わ
れている２５％Ｎｉ−Ｃｏ合金の電解製造方法も確立さ
れていない。In these electrolytes, the deposited composition and material properties differ depending on the electrolytic conditions, and the electrodeposited layer has high internal stress and is difficult to form an alloy foil. Therefore, 25% Ni-, which is said to have the best magnetic properties, An electrolytic manufacturing method for Co alloys has also not been established.
本発明はＣｏ−Ｎｉ合金箔を上記の問題点を解決して製
造できるＣｏ−Ｎｉ合金電解析出方法を提供することを
目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for electrolytic deposition of a Co-Ni alloy that can solve the above-mentioned problems and produce a Co-Ni alloy foil.
（問題解決に関する知見）
発明者は、金属缶の特性を考えた場合、圧延による方法
は、圧延による集合組織により磁気特性が劣るが、電解
析出による方法は、結晶粒の微細化により磁気特性が優
れ、また電解箔の方が圧延箔に比較し、より薄い材料を
低コス１へで製造可能であることから、 Ｃｏ−Ｎｉ
合金箔を製造するためのＣｏ−Ｎｉ合金電解析出方法を
検討した。(Knowledge related to problem solving) When considering the characteristics of metal cans, the inventor believes that the method using rolling has inferior magnetic properties due to the texture caused by rolling, but the method using electrolytic deposition has improved magnetic properties due to the refinement of crystal grains. Co-Ni
A Co-Ni alloy electrolytic deposition method for producing alloy foil was investigated.
その結果、電解析出しためっき層の内部応力を減少する
方法として電解液に応力除去効果をもたせるためにスル
ファミン酸塩を用いればよく、Ｃｏ−Ｎｉ析出合金組成
を安定させるためＣＯ板とＮｉ板の可溶性陽極が適して
いること、電解効率を１００％附近に維持するために塩
化マグネシウムを添加すればよいことを知見した。さら
に電解析出するＣｏ −Ｎｉ合金の組成を自由に制御す
るための電解液の組成、ｐＨ，Ｄｋ（陰極電流密度）、
電解液温度等に関しても検討し、この目的を達成するた
めの電解液の組成、電解条件を見出した。As a result, in order to reduce the internal stress of the electrolytically deposited plating layer, it is sufficient to use sulfamate to give the electrolytic solution a stress relieving effect, and to stabilize the Co-Ni deposited alloy composition, CO plates and Ni plates can be used. It was found that a soluble anode of 100% is suitable, and that magnesium chloride may be added to maintain the electrolytic efficiency near 100%. Furthermore, the composition of the electrolytic solution, pH, Dk (cathode current density), in order to freely control the composition of the Co-Ni alloy to be electrolytically deposited,
We also studied the temperature of the electrolyte and found the composition of the electrolyte and electrolysis conditions to achieve this objective.
（発明の構成）
本発明は、不動態皮膜を有する陰極上にＣｏ −Ｎｉ合
金を電着し、得られた合金箔を陰極面より剥離すること
によりＣｏ−Ｎｉ合金箔を製造する方法において：
電解液中のＮｉ源としてＮｉのスルファミン酸塩、Ｃｏ
源としてＣＯのスルファミン酸塩を用い；Ｎｉイオン濃
度は１〜６０ｇ／Ｌ Ｃｏイオン濃度は１〜６０ｇ／Ｑ
とし；目的とするＣｏ−Ｎｉ電解析出合金の組成により
その濃度を変化させた電解液を用い；緩衝剤としてほう
酸を添加して電解液のｐＨを２．０〜４．０を維持し；
また電流効率を１００％付近に維持するために塩化マグ
ネシウムを添加し；可溶性陽極を用いて。(Structure of the Invention) The present invention provides a method for producing a Co-Ni alloy foil by electrodepositing a Co-Ni alloy on a cathode having a passive film and peeling the obtained alloy foil from the cathode surface. Ni sulfamate, Co as a Ni source in the electrolyte
Using sulfamate of CO as a source; Ni ion concentration is 1 to 60 g/L, Co ion concentration is 1 to 60 g/Q
using an electrolytic solution whose concentration was varied depending on the composition of the target Co-Ni electrolytically deposited alloy; adding boric acid as a buffer to maintain the pH of the electrolytic solution at 2.0 to 4.0;
Also added magnesium chloride to maintain current efficiency near 100%; using a soluble anode.
陰極電流密度５〜ＩＯＡ／ｄａ”、電解液温度４０〜６
０℃でＣｏ −Ｎｉ合金を、陰極上に電解析出する方法
を提供する。Cathode current density 5~IOA/da'', electrolyte temperature 40~6
A method is provided for electrolytically depositing a Co--Ni alloy onto a cathode at 0<0>C.
（発明の具体的開示） 以下図面を参照して本発明の詳細な説明する。(Specific disclosure of invention) The present invention will be described in detail below with reference to the drawings.
Ｃｏ−Ｎｉ合金電解液のＮｉ源としてＮｉのスルファミ
ン酸塩を用い、Ｃｏ源としてＣＯのスルファミン酸塩を
使用する。スルファミン酸塩を用いるのはＮｉの電着応
力を緩和させるためである。 Ｃｏ源としてもスルファ
ミン酸塩を用いている。Ｎｉ源およびＣｏ源として塩化
物、硫酸塩およびその他の塩を使用した場合、電解析出
したｆＩ！着層の内部応力は高く、脆い電着層しか得ら
れず電解箔とはなりにくい。Ni sulfamate is used as the Ni source of the Co--Ni alloy electrolyte, and CO sulfamate is used as the Co source. The purpose of using sulfamate is to relieve the stress of Ni electrodeposition. Sulfamate is also used as a Co source. When using chlorides, sulfates and other salts as Ni and Co sources, the fI of electrolytic deposition! The internal stress of the deposited layer is high, and only a brittle electrodeposited layer is obtained, making it difficult to use as an electrolytic foil.
スルファミン酸塩を使用することにより比較的内部応力
の低いＣｏ−Ｎｉ合金電着層を得ることができる。その
Ｎｉイオン濃度は１〜６０ｇＩＱ、Ｃｏイオン濃度は１
〜６０ｇＩＱとし、目的とする合金の組成によりその濃
度を変化させる。金属イオン濃度に対する析出金属の組
成を第１図に示す。この図に示されるように、Ｎｉ源お
よびＣｏ源としてスルファミン酸塩を使用したＣｏ−Ｎ
ｉ合金電解液からは全組成範囲でのＣｏ−Ｎｉ合金を析
出させることが可能である。したがって、必要な組成の
合金を得るためにはこの図を参照し電解液の組成を決定
すれば良い。By using sulfamate, a Co--Ni alloy electrodeposition layer with relatively low internal stress can be obtained. The Ni ion concentration is 1 to 60 gIQ, and the Co ion concentration is 1
~60gIQ, and the concentration is varied depending on the composition of the target alloy. FIG. 1 shows the composition of the precipitated metal with respect to the metal ion concentration. As shown in this figure, Co-N using sulfamate as Ni source and Co source
It is possible to deposit Co--Ni alloys in the entire composition range from the i-alloy electrolyte. Therefore, in order to obtain an alloy with the required composition, the composition of the electrolytic solution can be determined with reference to this figure.
また本発明における電解液には緩衝剤としてほう酸が添
加され、ｐＨを２．０〜４．０に維持している。Further, boric acid is added as a buffer to the electrolytic solution in the present invention to maintain the pH at 2.0 to 4.0.
電解液のｐＨが２．０より低い場合電流効率の低下を招
き陰極（ステンレス鋼等）と電着金属との密着性が増し
、電解箔として剥離し難くなる。一方、電解液のｐＨが
４．０より高い場合は水酸化物の沈澱を生じやすくなる
。この理由により電解液のｐＨを２．０〜４．０に維持
する必要がある。また本発明においては電流効率を１０
０％付近に維持するために塩化マグネシウムが添加され
る。If the pH of the electrolytic solution is lower than 2.0, the current efficiency will decrease and the adhesion between the cathode (stainless steel or the like) and the electrodeposited metal will increase, making it difficult to peel off as an electrolytic foil. On the other hand, when the pH of the electrolytic solution is higher than 4.0, hydroxide precipitation tends to occur. For this reason, it is necessary to maintain the pH of the electrolytic solution between 2.0 and 4.0. In addition, in the present invention, the current efficiency is 10
Magnesium chloride is added to maintain it near 0%.
陰極電流密度は ５〜ＩＯＡ／ｄｍ２とする。陰極電流
密度が５ Ａ／ｄｍ２よりも低い場合電解析出した合金
の組成が変動し易い。陰極電流密度が１０＾／ｄ＋ｕ”
よりも高い場合電解析出した合金は脆くなり、電流効率
も低下する。従って、陰極電流密度が５〜１０Ａ／ｄｍ
” の場合のみ電解箔の製造に適した電着層を得ること
ができる。The cathode current density is 5 to IOA/dm2. When the cathode current density is lower than 5 A/dm2, the composition of the electrolytically deposited alloy tends to vary. Cathode current density is 10^/d+u”
If the value is higher than , the electrolytically deposited alloy becomes brittle and the current efficiency decreases. Therefore, the cathode current density is 5 to 10 A/dm.
” Only in this case can an electrodeposited layer suitable for manufacturing electrolytic foils be obtained.
電解液温度は４０〜６０℃に保つ必要がある。ｆｆｉ解
液温液温度０℃より低い場合電解液のな導性が悪くなり
、電解電圧は上昇する。また、電着層の内部応力も大き
くなるために電解箔を製造するのには適していない、？
！！解液温液温度０℃より高い場合は電解液の蒸散が速
くなり、金属イオンの酸化速度も速くなる。The electrolyte temperature must be maintained at 40 to 60°C. If the ffi solution temperature is lower than 0° C., the conductivity of the electrolyte will deteriorate and the electrolytic voltage will increase. Also, the internal stress of the electrodeposited layer increases, making it unsuitable for manufacturing electrolytic foil.
! ! When the solution temperature is higher than 0° C., the evaporation of the electrolyte becomes faster and the oxidation rate of metal ions also becomes faster.
本発明においてはＣｏ−Ｎｉ合金の析出組成の経時変化
をなくし、組成を安定させるために陽極にＣ。In the present invention, carbon is added to the anode in order to eliminate changes in the precipitated composition of the Co-Ni alloy over time and to stabilize the composition.
板とＮｉ板の可溶性陽極を用いる。ｐｔ板のような不溶
性陽極を用いて電解を行なった場合は電解液の変化にと
もない定期的に金属イオンを補給しなければならない。A soluble anode made of a plate and a Ni plate is used. When electrolysis is performed using an insoluble anode such as a PT plate, metal ions must be periodically replenished as the electrolyte changes.
また１作業上でもガスが発生することや電解液が酸化し
やすいという問題が生じる。Further, problems arise in that gas is generated even during one operation and that the electrolyte is easily oxidized.
従って、Ｃｏ−Ｎｉ合金電解箔の製造には可溶性ｐ！ｈ
極が適している。Therefore, the production of Co-Ni alloy electrolytic foil requires soluble p! h
Poles are suitable.
以上説明してきたように本発明によれば、ｃｏとＮｉと
の組成を自由に調整でき、任意の組成を有するＣｏ−Ｎ
ｉ合金電解箔を製造できる。また１本発明によるＣｏ−
Ｎｉ合金箔は表面の光沢に優れており、液側面、母材側
面とも光沢面であるＣｏ−Ｎｉ合金電解箔の製造が可能
である。As explained above, according to the present invention, the composition of co and Ni can be adjusted freely, and Co-N having an arbitrary composition can be
i-alloy electrolytic foil can be manufactured. In addition, Co-
Ni alloy foil has excellent surface gloss, and it is possible to produce a Co--Ni alloy electrolytic foil that has glossy surfaces on both the liquid side and the base material side.
実施例１
母材に市販の５ＵＳ４３０光輝焼鈍仕上げステンレス鋼
を使用して電解析出方法によるＣｏ−Ｎｉ合金電解箔の
製造実験を行なった０本発明法と比較法として一般的な
Ｃｏ−Ｎｉ合金電解液を用いて実験を行なった。ｆｌ！
解条件としてはＰ）ｌ ＝ ２．０〜４．０、浴温４０
〜６０℃に保ち、陰極電流密度（Ｄｋ）±５〜ＩＯＡ／
ｄＩ１１”で実験を行なった０表１に各電解浴における
箔試作結果を示す。その結果５本発明方法でしか目的と
する合金組成をもつ箔は得られなかった。Example 1 An experiment was conducted to produce a Co-Ni alloy electrolytic foil by an electrolytic deposition method using a commercially available 5US430 bright annealed stainless steel as the base material.The method of the present invention and a common Co-Ni alloy as a comparative method were conducted. An experiment was conducted using an electrolyte. Fl!
The solution conditions are P)l = 2.0 to 4.0, bath temperature 40
Maintain at ~60°C, cathode current density (Dk) ±5 ~ IOA/
Table 1 shows the results of trial production of foils in each electrolytic bath.As a result, a foil having the desired alloy composition could only be obtained by the method of the present invention.
表１
実施例２
実施例１と同じ実験条件で浴中の金属イオン濃度を変え
てＣｏ−Ｎｉ合金電解箔の製造実験を行なった。第１図
に本発明方法における浴中の金属イオン濃度に対する析
出組成を示す、この実験結果より、本発明方法では表２
に示す金属イオン濃度の浴組成で目的の合金組成をもつ
Ｃｏ−Ｎｉ合金電解箔が得られた。Table 1 Example 2 A Co--Ni alloy electrolytic foil production experiment was conducted under the same experimental conditions as in Example 1 by changing the metal ion concentration in the bath. Figure 1 shows the precipitation composition with respect to the metal ion concentration in the bath in the method of the present invention.From this experimental result, Table 2 shows that the method of the present invention
A Co--Ni alloy electrolytic foil having the desired alloy composition was obtained using a bath composition with a metal ion concentration shown in .
実施例３
実施例１と同じ実験条件で電解電流密度を変えてＣｏ−
Ｎｉ合金ｆｒｉＭ箔の製造実験を行なった。第２図に本
発明方法における陰極電流密度に対する析出組成および
電流効率を示す。合金電解箔の製造のためには１００％
近い高電流効率をもち、かつ析出組成のコントロール可
能な陰極電流密度でなければいけない、この実験結果よ
り、それらの条件を満たす陰極電流密度はＩＯＡ／ｄｉ
以下であることがわかる。その範囲において電流密度が
低いと生産性がおどるためにＣｏ−Ｎｉ合金電解箔製造
のためにはＤｋ ＝ ５〜ＩＯＡ／ｄ ｒｎ’が適して
いる。Example 3 Under the same experimental conditions as Example 1, Co-
A manufacturing experiment of Ni alloy friM foil was conducted. FIG. 2 shows the deposition composition and current efficiency with respect to the cathode current density in the method of the present invention. 100% for manufacturing alloy electrolytic foil
From this experimental result, the cathode current density must have a high current efficiency close to that of IOA/di and be able to control the deposition composition.
It turns out that the following is true. If the current density is low in that range, productivity decreases, so Dk = 5 to IOA/drn' is suitable for manufacturing Co-Ni alloy electrolytic foil.
実施例４
実施例１と同じ実験条件で浴温を変えてＣｏ−Ｎｉ合金
電解箔の製造実験を行なった。表３に本発明方法におけ
る浴温の影響を示す、その結果浴温は析出組成にはほと
んど影響はないが、箔の表面状態に影響を及ぼし光沢、
レベリング性の優れた箔を得るためには４０〜６０℃が
適していた。Example 4 A Co--Ni alloy electrolytic foil manufacturing experiment was conducted under the same experimental conditions as Example 1 but with different bath temperatures. Table 3 shows the influence of bath temperature in the method of the present invention.As a result, bath temperature has almost no effect on the deposited composition, but it does affect the surface condition of the foil, resulting in gloss,
In order to obtain a foil with excellent leveling properties, a temperature of 40 to 60°C was suitable.
実施例５
実施例１と同じ実験条件で陽極を変えてＣｏ−Ｎｉ合金
電解箔の製造実験を行なった。本発明法では可溶性陽極
であるＣｏ板とＮｉ板を用いているが、比較法として不
溶性陽極のｐｔ板を用いて実験を行なった１表４に本発
明方法における陽極の影響を示した。その結果、析出組
成や浴組成を安定させるためには可溶性陽極の方が適し
ていた。Example 5 A manufacturing experiment of a Co--Ni alloy electrolytic foil was conducted under the same experimental conditions as in Example 1 but with different anodes. In the method of the present invention, a Co plate and a Ni plate, which are soluble anodes, are used, but as a comparative method, an experiment was conducted using a PT plate, which is an insoluble anode.Table 4 shows the influence of the anode in the method of the present invention. As a result, soluble anodes were more suitable for stabilizing the precipitation composition and bath composition.
表４
トでＩＲ造可能である０本発明法による電解析出方法は
表面状態が非常に美しいために、装飾材用のめっき法と
しても適用できる。Since the electrolytic deposition method according to the present invention has a very beautiful surface condition, it can also be applied as a plating method for decorative materials.
第１図は本発明方法における電解液中の金屑イオン濃度
に対する析出組成および電流効率を示す図、第２図は本
発明方法における陰極電流密度に対する析出組成および
電流効率を示す図である。
（発明の効果）FIG. 1 is a diagram showing the deposition composition and current efficiency with respect to the gold scrap ion concentration in the electrolytic solution in the method of the present invention, and FIG. 2 is a diagram showing the deposition composition and current efficiency with respect to the cathode current density in the method of the present invention. (Effect of the invention)
Claims (1)
得られた合金箔を陰極面より剥離することによりＣｏ−
Ｎｉ合金箔を製造する方法において；電解液中のＮｉ源
としてＮｉのスルファミン酸塩、Ｃｏ源としてＣｏのス
ルファミン酸塩を用い；Ｎｉイオン濃度は１〜６０ｇ／
ｌ、Ｃｏイオン濃度は１〜６０ｇ／ｌとし、目的とする
Ｃｏ−Ｎｉ電解析出合金の組成によりその濃度を変化さ
せた電解液を用い；緩衝剤としてほう酸を添加して電解
液のｐＨを２．０〜４．０に維持し；また電流効率を１
００％付近に維持するために塩化マグネシウムを添加し
；可溶性陽極を用い、陰極電流密度５〜１０Ａ／ｄｍ＾
２、電解液温度４０〜６０℃で電解析出を行う；ことか
らなる方法。Electrodepositing a Co-Ni alloy on a cathode with a passive film,
By peeling the obtained alloy foil from the cathode surface, Co-
In the method for producing Ni alloy foil; using Ni sulfamate as the Ni source and Co sulfamate as the Co source in the electrolytic solution; Ni ion concentration is 1 to 60 g/
l, Co ion concentration is 1 to 60 g/l, and an electrolytic solution whose concentration is varied depending on the composition of the target Co-Ni electrolytically deposited alloy is used; boric acid is added as a buffer to adjust the pH of the electrolytic solution. Maintain the current efficiency between 2.0 and 4.0;
Add magnesium chloride to maintain near 00%; use soluble anode, cathode current density 5-10 A/dm^
2. A method consisting of performing electrolytic deposition at an electrolyte temperature of 40 to 60°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30079888A JPH02149692A (en) | 1988-11-30 | 1988-11-30 | Co-ni alloy electrodepositing method for producing co-ni alloy foil |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30079888A JPH02149692A (en) | 1988-11-30 | 1988-11-30 | Co-ni alloy electrodepositing method for producing co-ni alloy foil |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02149692A true JPH02149692A (en) | 1990-06-08 |
Family
ID=17889228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30079888A Pending JPH02149692A (en) | 1988-11-30 | 1988-11-30 | Co-ni alloy electrodepositing method for producing co-ni alloy foil |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02149692A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5314608A (en) * | 1990-10-09 | 1994-05-24 | Diamond Technologies Company | Nickel-cobalt-boron alloy, implement, plating solution and method for making same |
-
1988
- 1988-11-30 JP JP30079888A patent/JPH02149692A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5314608A (en) * | 1990-10-09 | 1994-05-24 | Diamond Technologies Company | Nickel-cobalt-boron alloy, implement, plating solution and method for making same |
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