JPH021338B2 - - Google Patents
Info
- Publication number
- JPH021338B2 JPH021338B2 JP57008433A JP843382A JPH021338B2 JP H021338 B2 JPH021338 B2 JP H021338B2 JP 57008433 A JP57008433 A JP 57008433A JP 843382 A JP843382 A JP 843382A JP H021338 B2 JPH021338 B2 JP H021338B2
- Authority
- JP
- Japan
- Prior art keywords
- openings
- apertures
- electrode
- diameter
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 description 6
- 230000004075 alteration Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
- H01J29/503—Three or more guns, the axes of which lay in a common plane
Description
【発明の詳細な説明】
本発明はインライン型カラー受層管用電子銃の
主電子レンズ構成電極の改善に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in the main electron lens constituent electrode of an in-line color receiver tube electron gun.
電子銃の解像度特性は主としてバイポテンシヤ
ル型、ユニポテンシヤル型、その他の多段集束型
からなる静電電子レンズの球面収差に制約され、
高解像度特性を得るには主電子レンズを構成する
電極口径を大きくして電子レンズの球面収差を小
さくする必要がある。主電子レンズ電極口径はカ
ラー受像管の硝子頚部内径に制限され、三電子銃
が一列配列されたインライン型カラー受像管では
主電子レンズ電極口径は最大でも硝子頚部内径の
１／３以下となり電子銃構体設計上何如にこの最大
径に近づけるかが重要な点となつている。 The resolution characteristics of an electron gun are mainly limited by the spherical aberration of the electrostatic electron lens, which can be of bipotential type, unipotential type, or other multi-stage focusing type.
In order to obtain high resolution characteristics, it is necessary to increase the aperture of the electrodes constituting the main electron lens to reduce the spherical aberration of the electron lens. The diameter of the main electron lens electrode is limited to the inner diameter of the glass neck of the color picture tube, and in an in-line color picture tube with three electron guns arranged in a row, the diameter of the main electron lens electrode is at most 1/3 or less of the inner diameter of the glass neck. An important point in designing the structure is how to approach this maximum diameter.
第１図及び第２図は従来用いられている一体化
電極から形成されたインライン型電子銃の主電子
レンズ構成電極１の一例を示す上面図、側断面図
である。即ち電極構体１は中央及び両外側電子ビ
ーム透過開孔１１Ｇ，１１Ｒ，１１Ｂが閉塞面１
２に穿設され、閉塞面１２に連続して筒側部１３
が形成された閉塞筒状体である。上記電子ビーム
開孔周囲は閉塞筒状体内部に突出する突状縁１４
で囲まれ、各開孔部に形成される静電電子ビーム
の相互影響を防止すると共に閉塞面１２を強化し
ている。ここに前者の目的に対しては突状縁１４
の高さは高い程望ましく、その高さは開孔径の1/
３以上必要とされている。電子ビーム開孔１１Ｒ，
１１Ｇ，１１Ｂの直径D0は開孔相互間距離Ｓと
開孔相互間に挾まれた挾隙部の幅d0によつて制限
される。通常閉塞筒状体電極１を形成する電極母
材板厚は0.2〜0.4mmのものが用いられ、各開孔１
１Ｒ，１１Ｇ，１１Ｂ周囲に独立した三つの突状
縁１４を形成する加工上の必要から、口径D0の
大きさによらずd0は0.9〜1.2mm程度必要とされて
いる。又一体化電極を用いたインライン型電子銃
ではセルフコンバージエンスを実現するため開孔
相互間距離Ｓは出来るだけ小さい値に設定され、
一般的にはＳは７mm以下となつている。従がつて
従来D0／Ｓは0.83以下の値となつている。例えば
硝子頚部口径29.1mm（内径23.9mm）に用いられる
一体化電極を用いた代表的なインライン型電子銃
ではＳ＝6.6mm、D0＝5.5mmであり、従がつてd0＝
1.1mm、D0／Ｓ＝0.833となつている。 1 and 2 are a top view and a side sectional view showing an example of a main electron lens constituent electrode 1 of an in-line electron gun formed from a conventionally used integrated electrode. That is, in the electrode structure 1, the center and both outer electron beam transmission apertures 11G, 11R, 11B are closed surfaces 1.
2, and the cylinder side part 13 continues to the closed surface 12.
It is a closed cylindrical body formed with. Around the electron beam aperture is a protruding edge 14 that protrudes into the inside of the closed cylindrical body.
This prevents mutual influence of the electrostatic electron beams formed in each opening and also strengthens the closed surface 12. Here, for the former purpose, the projecting edge 14
The higher the height, the better, and the height should be 1/1 of the aperture diameter.
3 or more are required. Electron beam aperture 11R,
The diameter D 0 of the holes 11G and 11B is limited by the distance S between the holes and the width d 0 of the gap between the holes. Normally, the thickness of the electrode base material forming the closed cylindrical electrode 1 is 0.2 to 0.4 mm, and each opening 1
Because of the processing requirements for forming three independent protruding edges 14 around 1R, 11G, and 11B, d 0 is required to be approximately 0.9 to 1.2 mm regardless of the size of the aperture D 0 . In addition, in an in-line electron gun using an integrated electrode, the distance S between the apertures is set as small as possible in order to achieve self-convergence.
Generally, S is 7 mm or less. Therefore, conventionally D 0 /S has a value of 0.83 or less. For example, in a typical in-line electron gun using an integrated electrode that is used with a glass neck diameter of 29.1 mm (inner diameter 23.9 mm), S = 6.6 mm and D 0 = 5.5 mm, so d 0 =
1.1mm, D 0 /S=0.833.
上述の様にインライン型電子銃主電子レンズを
構成する一体化電極では加工上の制約から挾隙部
の幅d0は或程度以下に小さくすることが出来ず、
これが開孔直径D0を制限する構造上からくる最
大の制約となつていた。本発明は従来の欠点を除
去して開孔相互間距離を変更することなく開孔直
径を大きくした電極構体を提供することを目的と
する。 As mentioned above, in the integrated electrode that constitutes the main electron lens of an in-line electron gun, the width d 0 of the gap cannot be made smaller than a certain level due to processing constraints.
This was the biggest structural constraint that limited the opening diameter D 0 . SUMMARY OF THE INVENTION An object of the present invention is to provide an electrode structure in which the diameter of the apertures is increased without changing the distance between the apertures, thereby eliminating the drawbacks of the prior art.
本発明によれば、インライン配列開孔相互間距
離Ｓ、夫々独立した突状縁で囲まれた開孔径Ｄと
の関係を0.89≦Ｄ／Ｓ＜0.98とし、中央開孔を完
全円孔状に、両外側開孔を中央開孔と接する側に
三つの開孔配列方向に直交した弦を持つた不完全
円孔状とすることによつて開孔相互間距離を変え
ることなく、従来より大口径開孔を備えた一体化
インライン電極構体を得られる。 According to the present invention, the relationship between the distance S between the in-line array holes and the diameter D of the holes surrounded by independent protruding edges is 0.89≦D/S<0.98, and the central hole is formed into a completely circular hole. By making both outer holes into an incomplete circular shape with chords perpendicular to the three hole arrangement directions on the side in contact with the center hole, the distance between the holes remains unchanged and the hole size is larger than before. An integrated in-line electrode structure with apertures is obtained.
以下図面に従がつて本発明を詳細に説明する。
第３図、第４図は本発明の一実施例を基づく一体
化インライン電極構体２の加工第１段階に於ける
形状を示す側断面図と上面図である。電極構体２
は従来と同一の開孔相互間距離Ｓを保つており、
閉塞面２２に中央及び両外側電子ビーム透過開孔
２１Ｇ，２１Ｒ，２１Ｂが穿設され、閉塞面２２
に連続して筒側部２３が形成された閉塞筒状体で
ある。開孔２１Ｒ，２１Ｇ，２１Ｂの径Ｄは互に
重畳せず閉塞筒状体内部に突出する突状縁２４で
夫々囲まれた独立の開孔を形成し、その径はほぼ
Ｓ値より電極母材板厚ｔの分だけ小さく0.89≦
Ｄ／Ｓ＜0.98となる範囲に選定されている。然し
ながらこの場合は三つの開孔２１Ｒ，２１Ｇ，２
１Ｂ間の最小挾隙幅ｄは突状縁付で独立した完全
円孔状に形成するに必要な値0.9〜1.2mm以下とな
つてしまう。このため本発明では開孔相互が完全
円孔状で隣接するのではなく、先ず挾隙部２５を
電極母材板厚ｔ以上でその倍2t程度の幅ｄを持つ
た二本の平行線で挾まれた直線状とする。即ち二
つの開孔２１Ｒ，２１Ｇ及び２１Ｇ，２１Ｂに挾
まれた挾隙部２５は三つの開孔配列方向に直交し
長さｌの直線部を持ち、三つの開孔は一つ又は二
つの弦を持つた不完全円孔状となつている。第５
図に示す様にｄ＝2t、Ｄ＝ｓ−ｔとすれば
となる。従がつて挾隙部２５の幅ｄは三つの開孔
２１Ｒ，２１Ｇ，２１Ｂを完全円孔状に形成する
に必要な値以下であるが、従来の様に三つの開孔
は挾隙部幅ｄに一点で接するのではなく有限の長
さｌを持つて互に接しているため、開孔形成時の
加工で挾隙部が引ちぎれたり、変形することな
く、安定した形状となつている。 The present invention will be described in detail below with reference to the drawings.
3 and 4 are a side sectional view and a top view showing the shape of the integrated in-line electrode structure 2 in the first stage of processing according to an embodiment of the present invention. Electrode structure 2
maintains the same distance S between the openings as before,
Center and both outer electron beam transmission apertures 21G, 21R, and 21B are formed in the closed surface 22, and the closed surface 22
It is a closed cylindrical body in which a cylindrical side portion 23 is formed continuously. The diameters D of the openings 21R, 21G, and 21B do not overlap each other and form independent openings each surrounded by a protruding edge 24 that projects inside the closed cylindrical body. 0.89≦ smaller by the material plate thickness t
The range is selected such that D/S<0.98. However, in this case, three openings 21R, 21G, 2
The minimum gap width d between 1B is less than 0.9 to 1.2 mm, which is necessary to form an independent complete circular hole with a protruding edge. For this reason, in the present invention, the openings are not completely circular and adjacent to each other, but the gap 25 is first formed by two parallel lines having a thickness t or more and a width d about twice that of the electrode base material plate. Shape it into a straight line. In other words, the gap 25 sandwiched between the two openings 21R, 21G and 21G, 21B has a straight portion having a length l that is perpendicular to the arrangement direction of the three openings, and the three openings have one or two chords. It has an incomplete circular hole shape. Fifth
As shown in the figure, if d=2t and D=s−t becomes. Therefore, the width d of the gap portion 25 is less than the value required to form the three openings 21R, 21G, and 21B in a completely circular shape, but as in the conventional case, the width d of the three openings is smaller than the width of the gap portion. Because they do not touch d at a single point, but touch each other with a finite length l, the gap is not torn or deformed during the process of forming the hole, resulting in a stable shape. .
上述の開孔形状を持つた二組の閉塞筒状体電極
の閉塞面を互に対向させて、主電子レンズ又はそ
の一部を構成した場合、中央開孔２１Ｇは開孔配
列方向に二つの弦を持つため、中央開孔部に形成
される中央開孔部の電子レンズは両外側開孔より
強く非軸対称に歪み、開孔配列方向の集束作用が
強くなり、中央開孔部通過後の電子ビームは垂直
偏向方向に長軸を持つた著しい縦長形状となり、
垂直方向の解像度を劣化させる。一方両外側開孔
は中央開孔側にのみ弦を持つているため、そこに
形成される電子レンズは中央開孔部の電子レンズ
程軸対称性が損われることはない。 When the main electron lens or a part thereof is constructed by arranging the closed surfaces of two sets of closed cylindrical body electrodes having the above-mentioned hole shapes to face each other, the central hole 21G has two pairs in the hole arrangement direction. Because it has a string, the electron lens in the central aperture formed in the central aperture is more strongly axisymmetrically distorted than the outer apertures, and the focusing effect in the aperture arrangement direction is stronger, so that the electron lens formed in the central aperture is more strongly focused in the aperture arrangement direction. The electron beam has a significantly elongated shape with its long axis in the vertical deflection direction,
Degrades vertical resolution. On the other hand, since both outer apertures have chords only on the central aperture side, the axial symmetry of the electron lens formed there will not be impaired as much as the electron lens in the central aperture.
このため、第６図、第７図の上面図及び側断面
図に示す様に、夫々の挾隙部２５で中央開孔２１
Ｇの内壁２５ａをしごいて引抜き研磨して、中央
の不完全円孔状開孔２１Ｇのみ前記直径Ｄを持つ
た完全円孔状開孔とする。この加工を行なつた二
組の閉塞筒状体電極の閉塞面を対向させて、主電
子レンズ又はその一部を構成すれば、その電子レ
ンズは従来より大口径で軸対称性を持ち、球面収
差の小さい特性が得られる。更に両外側開孔部の
電子レンズは中央開孔側に弦を持つた不完全円孔
による若干の非軸対称性を持つていても、極めて
近接した中央開孔側の電界侵入により非軸対称性
はほぼ相殺され、実用***開孔と同程度の大口
径電子レンズが得られる。 Therefore, as shown in the top view and side sectional view of FIGS. 6 and 7, the central opening 21 is
The inner wall 25a of G is drawn and polished to make only the central incomplete circular hole 21G a completely circular hole having the diameter D. If the closed surfaces of the two sets of closed cylindrical electrodes subjected to this process are made to face each other to form the main electron lens or a part thereof, the electron lens will have a larger diameter than conventional ones, will have axial symmetry, and will have a spherical surface. Characteristics with small aberrations can be obtained. Furthermore, even though the electron lenses in both outer apertures have a slight axisymmetrical property due to the incomplete circular hole having a chord on the central aperture side, they are non-axially symmetrical due to the electric field penetration on the very close central aperture side. The characteristics are almost canceled out, and in practical terms, a large-diameter electron lens comparable to that of a central aperture can be obtained.
本実施例では電極母材板厚0.3mmのステンレス
鋼を用いたＳ＝5.1mmの場合、両外側開孔の直線
部長さｌ＝2.80mm、Ｄ＝5.1−0.3＝4.8（mm）、Ｄ／
Ｓ＝0.941となりこれは従来と同一のD0＝5.1−1.0
＝4.1（mm）に対し直径は約17％増加したことにな
り、又Ｓ＝6.6mmの場合、ｌ＝3.245mm、Ｄ＝6.6−
0.3＝6.3（mm）、Ｄ／Ｓ＝0.955となり、従来のD0＝
5.5mmに対し約14.5％直径が増加したことに相当
する。 In this example, when stainless steel with an electrode base material plate thickness of 0.3 mm is used and S = 5.1 mm, the linear length of both outer openings l = 2.80 mm, D = 5.1 - 0.3 = 4.8 (mm), D /
S = 0.941, which is the same as before, D 0 = 5.1−1.0
= 4.1 (mm), the diameter has increased by approximately 17%, and in the case of S = 6.6 mm, l = 3.245 mm, D = 6.6-
0.3 = 6.3 (mm), D/S = 0.955, and the conventional D 0 =
This corresponds to an approximately 14.5% increase in diameter compared to 5.5mm.
この様に従来の部品形成時の加工法では挾隙部
の幅d0は電極口径D0にかかわらずほぼ一定値以
上要していたため、本発明適用による開孔拡大化
の効果は開孔相互間距離が小さい程顕著となる。 As described above, in the conventional processing method when forming parts, the width d 0 of the gap part was required to be more than a constant value regardless of the electrode diameter D 0 , so the effect of expanding the opening by applying the present invention is The smaller the distance, the more noticeable this becomes.
上述した様に本発明によれば、インライン配列
された三つの開孔相互間距離Ｓを同一に保つたま
まで、電極開孔径を従来より14％以上大きくして
球面収差を低減させた大口径開孔を備えたインラ
イン型電極構体が容易に得られる。 As described above, according to the present invention, the electrode aperture diameter is increased by 14% or more compared to the conventional one to reduce spherical aberration while keeping the distance S between the three inline apertures the same. An in-line electrode structure with holes is easily obtained.
第１図、第２図は従来用いられているインライ
ン型電子銃電極構体の上面図、及び側断面図を、
第３図、第４図は本発明の一実施例に基づく部品
加工前段階に於けるインライン型電極構体の上面
図、及び側断面図を、第５図は第３図の中央及び
外側開孔部の一部拡大図を、第６図、第７図は本
発明の一実施例に基づく部品加工最終段階に於け
るインライン型電子銃電極構体の上面図、側断面
図を夫々示す。
１１Ｒ，１１Ｇ，１１Ｂ，２１Ｒ，２１Ｇ，２
１Ｂ……主電子レンズ電極開孔；１２，２２……
閉塞面；１３，２３……筒側部；１４，２４……
突状縁；１５，２５……挾隙部；Ｓ……開孔相互
間距離；D0，Ｄ……主電子レンズ電極開孔口径。
Figures 1 and 2 show a top view and a side sectional view of a conventionally used in-line electron gun electrode structure.
3 and 4 are a top view and a side sectional view of an in-line electrode assembly at a stage before parts processing according to an embodiment of the present invention, and FIG. 5 shows the center and outer openings of FIG. 3. FIGS. 6 and 7 show a top view and a side sectional view, respectively, of an in-line electron gun electrode assembly at the final stage of parts processing according to an embodiment of the present invention. 11R, 11G, 11B, 21R, 21G, 2
1B... Main electron lens electrode aperture; 12, 22...
Closed surface; 13, 23... Cylinder side part; 14, 24...
Projected edge; 15, 25...Spanning portion; S...Distance between the apertures; D0 , D...Main electron lens electrode aperture diameter.
Claims (1)
その三つの開孔は夫々独立した突状縁で囲まれた
独立開孔であつて、開孔相互間距離Ｓと、開孔径
Ｄとは0.89≦Ｄ／Ｓ＜0.98の範囲に選定すると共
に、三つの開孔中、中央開孔を完全円孔状に、両
外側開孔を中央開孔と接する側に三つの開孔配列
方向に直交した弦を持つた不完全円孔状としたこ
とを特徴としたインライン型電子銃電極構体。1 Three openings are arranged in-line on the closed surface,
The three apertures are independent apertures surrounded by independent protruding edges, and the distance S between the apertures and the aperture diameter D are selected within the range of 0.89≦D/S<0.98, and Among the three openings, the central opening is a complete circular hole, and both outer openings are incomplete circular holes with chords perpendicular to the three opening arrangement directions on the sides in contact with the central opening. Features an in-line electron gun electrode structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP843382A JPS58126644A (en) | 1982-01-22 | 1982-01-22 | In-line type electron gun electrode structural body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP843382A JPS58126644A (en) | 1982-01-22 | 1982-01-22 | In-line type electron gun electrode structural body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58126644A JPS58126644A (en) | 1983-07-28 |
| JPH021338B2 true JPH021338B2 (en) | 1990-01-11 |
Family
ID=11692983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP843382A Granted JPS58126644A (en) | 1982-01-22 | 1982-01-22 | In-line type electron gun electrode structural body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58126644A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4833364A (en) * | 1984-04-04 | 1989-05-23 | Hitachi, Ltd. | Electron gun for color picture tubes having uniquely formed lens apertures |
| US5027043A (en) * | 1989-08-11 | 1991-06-25 | Zenith Electronics Corporation | Electron gun system with dynamic convergence control |
| US5731657A (en) * | 1992-04-21 | 1998-03-24 | Hitachi, Ltd. | Electron gun with cylindrical electrodes arrangement |
| JP3058222B2 (en) * | 1992-05-21 | 2000-07-04 | 株式会社日立製作所 | Color cathode ray tube with in-line type electron gun |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5682548A (en) * | 1979-12-07 | 1981-07-06 | Toshiba Corp | Electron gun |
-
1982
- 1982-01-22 JP JP843382A patent/JPS58126644A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5682548A (en) * | 1979-12-07 | 1981-07-06 | Toshiba Corp | Electron gun |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58126644A (en) | 1983-07-28 |
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