JPH02124531A - Liquid crystal display panel and production thereof - Google Patents
Liquid crystal display panel and production thereofInfo
- Publication number
- JPH02124531A JPH02124531A JP30163688A JP30163688A JPH02124531A JP H02124531 A JPH02124531 A JP H02124531A JP 30163688 A JP30163688 A JP 30163688A JP 30163688 A JP30163688 A JP 30163688A JP H02124531 A JPH02124531 A JP H02124531A
- Authority
- JP
- Japan
- Prior art keywords
- film
- liquid crystal
- org
- crystal display
- display panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 13
- 238000007789 sealing Methods 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 abstract description 10
- 239000004642 Polyimide Substances 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 80
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 239000009719 polyimide resin Substances 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229910007156 Si(OH)4 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
液晶表示パネルとその製造方法に係り、特に液晶表示パ
ネルの基板間ショートを防止するための絶縁膜の構成と
その形成方法に関し 透明電極に悪影響を与えない低い
温度で焼成しても、絶縁性の無機膜を十分に硬化させる
ことが可能な液晶表示パネルとその製造方法とを提供す
ることを目的とする。[Detailed Description of the Invention] [Summary] This invention relates to a liquid crystal display panel and its manufacturing method, and in particular to the structure of an insulating film and its formation method for preventing short circuits between substrates of a liquid crystal display panel, which does not adversely affect transparent electrodes. An object of the present invention is to provide a liquid crystal display panel capable of sufficiently curing an insulating inorganic film even when fired at a low temperature, and a method for manufacturing the same.
この目的は、パターン形成された透明電極を含む透明基
板上に絶縁性の無機膜が、有機膜と液晶分子を配向させ
る有機膜とに挟まれて積層されてなる液晶パネルの構成
、またはその製造方法であって、透明電極上にまず有機
膜を形成する溶液を塗布し、ついで前記無機膜を形成す
る溶液と前記配向用の有機膜を形成する溶液とを順次塗
布して３層構造膜とし、該３層構造膜を同時に加熱して
硬化させる構成で達成される。The purpose is to construct or manufacture a liquid crystal panel in which an insulating inorganic film is sandwiched and laminated between an organic film and an organic film for orienting liquid crystal molecules on a transparent substrate containing patterned transparent electrodes. The method comprises first applying a solution for forming an organic film onto a transparent electrode, and then sequentially applying a solution for forming the inorganic film and a solution for forming the organic film for alignment to form a three-layer structure film. This is achieved by simultaneously heating and curing the three-layer structure film.
本発明は液晶表示パネルと、その製造方法に係り、特に
液晶表示パネルの基板間のショートを防止するための絶
縁膜の構成とその形成方法とに関する。The present invention relates to a liquid crystal display panel and a method for manufacturing the same, and more particularly to a structure of an insulating film for preventing short circuits between substrates of a liquid crystal display panel and a method for forming the same.
液晶表示パネルは、低駆動電圧・低価格などから平面表
示装置に幅広（使用されているが、最近は画面サイズの
大型化が進められている。Liquid crystal display panels are widely used in flat display devices due to their low driving voltage and low cost, but recently the screen size has been increasing.
そしてパネルの大型化に伴い、パネル当たりの塵埃混入
数が増加し、特に導電性の塵埃がパネル内に混入すると
対向基板の電極間でショートが発生し表示不良となるの
で、電極上に絶縁膜を形成しておく必要があり、絶縁特
性が良好な絶縁膜の構成とその形成方法が望まれている
。As panels become larger, the number of dust particles per panel increases.In particular, if conductive dust gets into the panel, a short circuit will occur between the electrodes on the opposing substrate, resulting in poor display. It is necessary to form an insulating film in advance, and a structure and method for forming an insulating film with good insulating properties are desired.
液晶表示パネルは、例えば反射型の場合、第２図の模式
断面図に示すように、内面に所定パターンの透明電極１
１．１１’が形成された２枚の透明基板１．１°を１θ
μｍ以下の微小ギャップを隔てて対向され、透明電極１
，１゛の外側には偏光板２，２”や反射板３が設けられ
ている。For example, in the case of a reflective type liquid crystal display panel, as shown in the schematic cross-sectional view of FIG.
1.1° of two transparent substrates on which 1.11' is formed is 1θ
The transparent electrode 1 is opposed to each other with a micro gap of less than μm in between.
, 1'' are provided with polarizing plates 2, 2'' and a reflecting plate 3.
ところがパネルの製造プロセスで両透明基板１゜ｌ”間
に導電性の塵埃が混入することがあるので、この導電性
塵埃によって透明電極１１．１１’間が短絡されるのを
防ぐため透明電極の表面には絶縁性の無機膜１２を形成
し、その上に液晶分子を配向させて所定の捩り角を与え
るためポリイミド系樹脂などの有機材料よりなる配向膜
１３が形成されて・いる。However, during the panel manufacturing process, conductive dust may get mixed in between the two transparent substrates 1゜l'', so in order to prevent the conductive dust from shorting between the transparent electrodes 11 and 11' An insulating inorganic film 12 is formed on the surface, and an alignment film 13 made of an organic material such as polyimide resin is formed on the insulating inorganic film 12 to orient the liquid crystal molecules and give a predetermined twist angle.
この絶縁性無機膜１２としては、通常は例えば二酸化珪
素（Ｓｉｎ２）や二酸化チタン（ＴｉＯｚ）を主成分と
した無機膜が用いられる。As this insulating inorganic film 12, an inorganic film containing, for example, silicon dioxide (Sin2) or titanium dioxide (TiOz) as a main component is usually used.
従来のこれらの膜の形成方法は、酸化インジウム（Ｉｎ
Ｏ□）などの透明導電膜を蒸着してパターニングして透
明電極１１を形成したのち、溶剤に溶かした水酸化珪素
（Ｓｉ （ＯＨ） ４）を塗布して加熱し、脱水縮合反
応により硬化させ５ｉ０２を主成分とする無機膜１２を
形成し、しかる後、その上にポリイミド系樹脂などの有
・機樹脂を塗布・焼成しラビング処理を行って配向用の
有機膜１３を形成していた。The conventional method for forming these films is to use indium oxide (In
After depositing and patterning a transparent conductive film such as O□) to form the transparent electrode 11, silicon hydroxide (Si (OH) 4) dissolved in a solvent is applied and heated, and hardened by a dehydration condensation reaction. An inorganic film 12 containing 5i02 as a main component is formed, and then an organic resin such as a polyimide resin is applied thereon, baked, and rubbed to form an organic film 13 for orientation.
絶縁用の無機膜の下に形成されているＩｎ０ｚ等の透明
導電膜は高温に弱く、その上に形成される無機膜を硬化
させるために高温度で熱処理すると抵抗値が上昇してし
まう。例えば、無機膜を３５０°Ｃで焼成すると透明電
極の抵抗値が２倍になって電極としての特性が劣化する
。そこでこれを避けるため無機膜は比較的低温度で焼成
されるため、無機膜が十分に硬化されず、所定の硬度や
絶縁特性が得られないと言う問題点があった。A transparent conductive film formed under an insulating inorganic film, such as In0z, is sensitive to high temperatures, and if the inorganic film formed thereon is heat-treated at a high temperature to harden, the resistance value will increase. For example, when an inorganic film is fired at 350° C., the resistance value of the transparent electrode doubles and its properties as an electrode deteriorate. Therefore, in order to avoid this, the inorganic film is fired at a relatively low temperature, resulting in the problem that the inorganic film is not sufficiently hardened and the desired hardness and insulation properties cannot be obtained.
本発明は上記問題点に鑑み創出されたもので、透明電極
に悪影響を与えない低い温度で焼成しても、絶縁性の無
機膜を十分に硬化させることが可能な液晶表示パネルと
その製造方法を提供することを目的とする。The present invention was created in view of the above-mentioned problems, and includes a liquid crystal display panel and a method for manufacturing the same that can sufficiently harden an insulating inorganic film even when fired at a low temperature that does not adversely affect the transparent electrodes. The purpose is to provide
上記問題点は、 パターン形成された透明電極を含む透
明基板上に絶縁性の無機膜が基板側の有機膜と無機膜上
の液晶分子を配向させる有機膜とによってサンドインチ
された構成の液晶表示パネル、またはその製造方法であ
って、透明電極上にまず有機膜を形成する溶液を塗布し
、ついで前記無機膜を形成する溶液と前記配向用の有機
膜を形成する溶液とを順次塗布して３層構造膜とし、該
３層構造膜を同時に加熱して硬化させることを特徴とす
る製造方法により解決される。The above problem is solved by a liquid crystal display in which an insulating inorganic film is sandwiched between an organic film on the substrate side and an organic film that orients the liquid crystal molecules on the inorganic film on a transparent substrate containing patterned transparent electrodes. A panel or a method for manufacturing the same, wherein a solution for forming an organic film is first applied on a transparent electrode, and then a solution for forming the inorganic film and a solution for forming the alignment organic film are sequentially applied. The problem is solved by a manufacturing method characterized by forming a three-layer structure film and simultaneously heating and curing the three-layer structure film.
有機膜として低温度で加熱硬化する低温焼成ポリイミド
やポリビニールアルコール（ＰＶＡ）などが用いられる
。 無機膜は、低温で硬化する有機膜で挟まれており、
両有機膜が硬化収縮する際に、界面効果の影響で両有機
膜に挾まれた無機膜にも収縮が起こり、透明電極に悪影
響を及ぼさない低温度で無機膜の脱水縮合反応が促進さ
れ硬度が高く絶縁特性が良好な無機膜を形成することが
できる。As the organic film, low-temperature firing polyimide, polyvinyl alcohol (PVA), etc., which are heat-cured at low temperatures, are used. The inorganic film is sandwiched between organic films that harden at low temperatures.
When both organic films harden and shrink, the inorganic film sandwiched between both organic films also shrinks due to the interfacial effect, and the dehydration condensation reaction of the inorganic film is promoted at a low temperature that does not adversely affect the transparent electrode, resulting in hardness. It is possible to form an inorganic film with high insulation properties and good insulation properties.
以下添付図により本発明の詳細な説明する。 The present invention will be described in detail below with reference to the accompanying drawings.
第１図は本発明の液晶表示パネルの一方の基板の模式断
面図である。FIG. 1 is a schematic cross-sectional view of one substrate of the liquid crystal display panel of the present invention.
図において、６は平板状ガラスなどからなる透明基板で
、その片面（相手透明基板との対向面）には約１０００
人程度の厚さのＩＴＯを蒸着してフォトエツチングでパ
ターン形成してなる透明電極６１が局部的に設けられて
いる。In the figure, 6 is a transparent substrate made of flat glass, etc., and on one side (the surface facing the other transparent substrate) there are about 1000
Transparent electrodes 61 are locally provided, which are formed by depositing ITO to a thickness similar to that of a human body and patterning it by photo-etching.
そして透明電極上を含む基板の全表面にポリイミド系樹
脂やＰＶＡなとの有機膜６２とＳｉＯ□などを主成分と
する金属酸化物薄膜よりなる絶縁性の無機膜６３と前記
有機膜６２と同一かまたは異なる材料を用いラビング処
理により液晶分子の配向を規制する有機膜６４とが順次
積層されている。 これらの膜の形成を有機膜にポリイ
ミドを用いた場合につきまず説明する。Then, on the entire surface of the substrate including the transparent electrode, there is an organic film 62 made of polyimide resin or PVA, and an insulating inorganic film 63 made of a metal oxide thin film whose main component is SiO□, which is the same as the organic film 62. Alternatively, an organic film 64 made of different materials and controlling the alignment of liquid crystal molecules by a rubbing process is sequentially laminated. The formation of these films will first be explained in the case where polyimide is used as the organic film.
有機膜６２を形成するため、ポリイミドの前駆体、ポリ
アミック酸の溶液を５００人の厚さに印刷などにより塗
布する。そしてこの有機膜に加熱硬化処理を行わずに、
その上に無機膜６３を形成するための溶液を印刷などで
厚さ５００人程度に塗布する。In order to form the organic film 62, a solution of polyimide precursor and polyamic acid is applied to a thickness of 500 mm by printing or the like. Then, without applying heat curing treatment to this organic film,
A solution for forming an inorganic film 63 is applied thereon to a thickness of approximately 500 mm by printing or the like.
この溶液は例えば、珪酸エチル（Ｓｉ （ＯＣｚＨｓ）
）を主成分とするアルコール溶液に水を添加して加水
分解させて得られるＳｉ （ＯＨ） ４あるいはＳｉＯ
□を主成分とするアルコール溶液で、基板上にロールコ
ータ等で印刷塗布する。そして室温で放置して溶剤を風
乾したのち、配向膜として用いる有機膜６４の溶液を有
機膜６２と同様のプロセスにより印刷塗布する。しかる
後上記３層の脱溶液が塗布された基板をクリーンオーブ
ン中で３００°Ｃ，１時間の加熱処理を行う。This solution is, for example, ethyl silicate (Si (OCzHs)
) is obtained by adding water to an alcoholic solution containing Si(OH)4 as the main component and hydrolyzing it.
An alcohol solution containing □ as the main component is printed and coated onto the substrate using a roll coater or the like. After the solvent is air-dried by leaving it at room temperature, a solution of an organic film 64 to be used as an alignment film is applied by printing in the same process as the organic film 62. Thereafter, the substrate coated with the three layers of desolution is heat-treated at 300° C. for 1 hour in a clean oven.
この加熱処理によりポリイミド等の有機膜６２゜６４は
所定に硬化して収縮し、この収縮時の界面効果により両
有機膜に挟まれた無機膜６３も収縮するのでこの温度で
十分な硬化が行われて絶縁特性が良好な無機絶縁膜が得
られる。Through this heat treatment, the organic films 62, 64 such as polyimide are cured and contracted to a predetermined degree, and the inorganic film 63 sandwiched between both organic films also contracts due to the interfacial effect during this contraction, so that sufficient curing can be achieved at this temperature. As a result, an inorganic insulating film with good insulation properties can be obtained.
このように形成された無機膜を有する液晶表示パネルの
ショート発生率は５％以下であり、従来製法によるそれ
の２０％程度に比べて絶縁性能が顕著に改善されている
ことが確認された。It was confirmed that the short-circuit occurrence rate of the liquid crystal display panel having the inorganic film formed in this manner was 5% or less, and the insulation performance was significantly improved compared to about 20% in the conventional manufacturing method.
なおこの同時焼成は有機膜の硬化に必要な温度で行えば
よく、有機膜の材料として低温焼成用のポリイミド樹脂
を用いた場合は、溶剤であるＮメチルピロリドンの沸点
以上の温度、例えば２５０°Ｃで焼成しても良好な絶縁
膜が得られることが確認されている。Note that this simultaneous firing may be performed at a temperature necessary for curing the organic film, and when a polyimide resin for low-temperature firing is used as the material for the organic film, the temperature is higher than the boiling point of the solvent N-methylpyrrolidone, for example, 250°C. It has been confirmed that a good insulating film can be obtained even when fired with C.
また、別の有機膜の組み合わせとして、まずＰＶＡを約
５００人厚程度塗布し、その表面にＴｉＯ２を４０〜６
０％含むＳｉＯ□膜を蒸着、または印刷により約５００
人厚程度形成する。更に、その上に配向膜となるポリイ
ミドを約５００人厚程度塗布し、３００°Ｃで１時間焼
成後、ラビングにより配向処理することによっても良好
な絶縁膜が得られる。In addition, as another combination of organic films, PVA is first applied to a thickness of approximately 500 mm, and TiO2 is applied to the surface by 40 to 60 mm thick.
Approximately 500% SiO□ film containing 0% is deposited or printed.
Form a person's thickness. Furthermore, a good insulating film can also be obtained by applying polyimide to a thickness of about 500 mm to serve as an alignment film thereon, baking at 300° C. for 1 hour, and then performing an alignment treatment by rubbing.
この方法で得られる絶縁膜の硬度は鉛筆硬度でＯＨ以上
のものが得られている。The insulating film obtained by this method has a pencil hardness of OH or higher.
なお、無機膜のＳｉＯ□膜を有機膜の間にサンドイッチ
させない場合の硬度は、鉛筆硬度で５〜６Ｈであった。The hardness in the case where the inorganic SiO□ film was not sandwiched between the organic films was 5 to 6H in terms of pencil hardness.
このようにＳｉｎ、膜にＴｉＯ□を含有させた場合には
硬度を高くする効果があると共に、Ｓｉ０□が網目構造
となるガラス転移温度を降下させる効果も得ることがで
きる。In this way, when TiO□ is contained in the Si film, it is effective to increase the hardness, and it is also possible to obtain the effect of lowering the glass transition temperature at which Si0□ forms a network structure.
以上説明したように、本発明によれば透明電極の抵抗値
に変動を与えない低温での焼成硬化が可能で、かつ硬度
が向上した無機絶縁膜を形成することが可能となり、液
晶表示パネルの品質向上に寄与することが顕著である。As explained above, according to the present invention, it is possible to form an inorganic insulating film that can be baked and hardened at a low temperature without causing any fluctuation in the resistance value of the transparent electrode, and has improved hardness. It is remarkable that it contributes to quality improvement.
また、基板側の有機膜をＰＶＡとすることにより、低コ
ストでの絶縁膜の構成も可能である。Furthermore, by using PVA as the organic film on the substrate side, it is possible to construct an insulating film at low cost.
第１図は、本発明の液晶表示パネルを示す模式第２図は
、従来の液晶表示パネルの断面図である。
図において、
１．６：透明基板、 ２：偏光板、３ ：反射板
、 ５：液晶、
６１：透明電極、
６３：絶縁性の無機膜、
である。
６２：有機膜、
６４：配向用の有機膜
一方の基板の羊更代断面口
＄ １ 図
触ト液二筬示ハオノしめ杉１代断面団
＄２図FIG. 1 is a schematic diagram showing a liquid crystal display panel of the present invention. FIG. 2 is a sectional view of a conventional liquid crystal display panel. In the figure, 1.6: transparent substrate, 2: polarizing plate, 3: reflective plate, 5: liquid crystal, 61: transparent electrode, 63: insulating inorganic film. 62: Organic film, 64: Organic film for alignment One substrate's sheep-refined cross-section opening $ 1 Figure showing the contact liquid 2nd generation Haonoshimesugi 1st generation cross-section group $ 2 Figure
Claims (2)
液晶表示パネルにおいて、 表示電極上の膜構成を、無機膜（６３）の上層（６４）
と下層（６２）とを有機膜で挟むサンドイッチ構造を少
なくとも一組含む絶縁膜構成とすることを特徴とする液
晶表示パネル。(1) In a liquid crystal display panel configured by sealing a liquid crystal layer between a pair of electrode substrates, the film structure on the display electrode is changed to an upper layer (64) of an inorganic film (63).
A liquid crystal display panel characterized in that it has an insulating film structure including at least one set of a sandwich structure in which a lower layer (62) and a lower layer (62) are sandwiched between organic films.
基板（６）上に絶縁性の無機膜（６３）と液晶分子を配
向させる有機膜（６４）とが順次積層されてなる液晶表
示パネルを製造する方法で、 透明電極（６１）上にまず有機膜（６２）を形成する溶
液を塗布し、ついで前記無機膜（６３）を形成する溶液
と前記配向用の有機膜（６４）を形成する溶液とを順次
塗布して３層構造膜とし、該３層構造膜を同時に加熱し
て硬化させることを特徴とする液晶表示パネルの製造方
法。(2) A liquid crystal display panel in which an insulating inorganic film (63) and an organic film (64) for orienting liquid crystal molecules are sequentially laminated on a transparent substrate (6) containing patterned transparent electrodes (61). In this method, a solution for forming an organic film (62) is first applied on a transparent electrode (61), and then a solution for forming an inorganic film (63) and an organic film for alignment (64) are formed. 1. A method for manufacturing a liquid crystal display panel, which comprises sequentially applying a solution containing three layers to form a three-layer structure film, and simultaneously heating and curing the three-layer structure film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30163688A JPH02124531A (en) | 1988-07-13 | 1988-11-29 | Liquid crystal display panel and production thereof |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17476288 | 1988-07-13 | ||
| JP63-174762 | 1988-07-13 | ||
| JP30163688A JPH02124531A (en) | 1988-07-13 | 1988-11-29 | Liquid crystal display panel and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02124531A true JPH02124531A (en) | 1990-05-11 |
Family
ID=26496257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30163688A Pending JPH02124531A (en) | 1988-07-13 | 1988-11-29 | Liquid crystal display panel and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02124531A (en) |
-
1988
- 1988-11-29 JP JP30163688A patent/JPH02124531A/en active Pending
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