JPH02120829U - - Google Patents
Info
- Publication number
- JPH02120829U JPH02120829U JP2920089U JP2920089U JPH02120829U JP H02120829 U JPH02120829 U JP H02120829U JP 2920089 U JP2920089 U JP 2920089U JP 2920089 U JP2920089 U JP 2920089U JP H02120829 U JPH02120829 U JP H02120829U
- Authority
- JP
- Japan
- Prior art keywords
- ray
- window portion
- shielding plate
- exposure
- defective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000002950 deficient Effects 0.000 claims description 4
- 230000007547 defect Effects 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 2
- 239000011358 absorbing material Substances 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
Description
第1図は本考案のX線露光用マスクを示す図で
、同図aはその平面図、同図bは同図a図におけ
るA−A′線での断面図、第2図は本考案におけ
る他のX線露光用マスクを示す図で、同図aはそ
の平面図、同図bは同図a図におけるA−A′線
での断面図、第3図は欠陥パターンを有するX線
露光用マスクを示す図で、同図aはその平面図、
同図bは同図aのA−A′線での断面図、第4図
は欠陥X線透過膜を有するX線露光用マスクを示
す図で、同図aはその平面図、同図bは同図aの
A−A′線での断面図である。なお、X線露光用
マスクの表(オモテ)側は第1図b〜第4図bに
おける紙面の地の側とする。
1は正常なパターンを有する露光領域、2は修
正不可能な欠陥パターンを有する露光領域、3は
破れたX線透過膜を有する露光領域、4はX線透
過膜が除去された露光領域、5はX線遮蔽板、6
は接着層、7は支持体、8はX線透過膜、9はX
線吸収体、10はアライメント・マーク用小窓、
11は正常なパターンを有する露光領域をもつ大
窓、12は修正不可能な欠陥パターンを有する露
光領域をもつ大窓、13は破れたX線透過膜を有
する露光領域をもつ大窓、14は窓側壁を示す。
Figure 1 is a diagram showing the X-ray exposure mask of the present invention, Figure a is a plan view thereof, Figure b is a sectional view taken along line A-A' in Figure A, and Figure 2 is a diagram of the invention FIG. 3 is a diagram showing another X-ray exposure mask in FIG. This figure shows an exposure mask, and figure a is a plan view thereof;
Figure b is a cross-sectional view taken along line A-A' in figure a, Figure 4 is a diagram showing an X-ray exposure mask having a defective X-ray transmitting film, figure a is a plan view thereof, figure b is 1 is a sectional view taken along line AA' in FIG. The front side of the X-ray exposure mask is the bottom side of the paper in FIGS. 1b to 4b. 1 is an exposure area with a normal pattern, 2 is an exposure area with an uncorrectable defect pattern, 3 is an exposure area with a torn X-ray transparent film, 4 is an exposure area from which the X-ray transparent film has been removed, 5 is an X-ray shielding plate, 6
is an adhesive layer, 7 is a support, 8 is an X-ray transparent membrane, 9 is X
Line absorber, 10 is a small window for alignment mark,
11 is a large window with an exposure area having a normal pattern; 12 is a large window with an exposure area having an uncorrectable defect pattern; 13 is a large window with an exposure area having a broken X-ray transparent film; Showing the window side wall.
Claims (1)
層され、複数個のX線露光領域に対して該X線透
過膜上にX線吸収材からなる同一のパターンがそ
れぞれ形成され、かつ該平板状支持体の他方の面
から各X線露光領域に対応した窓部が穿設される
X線露光用マスクにおいて、欠陥パターン、また
は欠陥X線透過膜を有する窓部がX線遮蔽板によ
り遮蔽されていることを特徴とするX線露光用マ
スク。 (2) 上記欠陥パターン、または欠陥X線透過膜
を有する窓部を遮蔽したX線遮蔽板が、気密に遮
蔽されていることを特徴とする請求項1記載のX
線露光用マスク。 (3) 上記支持体窓部が谷状にテーパーを有して
穿設され、またその窓部の開口面積の小さい方の
面にX線透過膜が積層されており、かつその窓部
がX線遮蔽板により谷状窓部内において遮蔽され
ていることを特徴とする請求項1、または2記載
のX線露光用マスク。[Claims for Utility Model Registration] (1) An X-ray transparent film is laminated on one surface of a flat support, and an X-ray absorbing material is layered on the X-ray transparent film for a plurality of X-ray exposure areas. In an X-ray exposure mask in which identical patterns are formed and windows corresponding to each X-ray exposure area are formed from the other surface of the flat support, defective patterns or defective X-ray transmission An X-ray exposure mask characterized in that a window portion having a film is shielded by an X-ray shielding plate. (2) The X-ray shielding plate according to claim 1, wherein the X-ray shielding plate that shields the window portion having the defect pattern or the defective X-ray transparent film is airtightly shielded.
Mask for line exposure. (3) The window portion of the support body is formed with a taper in the shape of a valley, and an X-ray transparent membrane is laminated on the surface with a smaller opening area of the window portion, and the window portion is 3. The X-ray exposure mask according to claim 1, wherein the valley-shaped window portion is shielded by a ray shielding plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2920089U JPH02120829U (en) | 1989-03-14 | 1989-03-14 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2920089U JPH02120829U (en) | 1989-03-14 | 1989-03-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02120829U true JPH02120829U (en) | 1990-09-28 |
Family
ID=31253205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2920089U Pending JPH02120829U (en) | 1989-03-14 | 1989-03-14 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02120829U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100389567B1 (en) * | 1999-08-19 | 2003-06-27 | 엔이씨 일렉트로닉스 코포레이션 | Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
-
1989
- 1989-03-14 JP JP2920089U patent/JPH02120829U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100389567B1 (en) * | 1999-08-19 | 2003-06-27 | 엔이씨 일렉트로닉스 코포레이션 | Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
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