JPH02120829U - - Google Patents

Info

Publication number
JPH02120829U
JPH02120829U JP2920089U JP2920089U JPH02120829U JP H02120829 U JPH02120829 U JP H02120829U JP 2920089 U JP2920089 U JP 2920089U JP 2920089 U JP2920089 U JP 2920089U JP H02120829 U JPH02120829 U JP H02120829U
Authority
JP
Japan
Prior art keywords
ray
window portion
shielding plate
exposure
defective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2920089U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2920089U priority Critical patent/JPH02120829U/ja
Publication of JPH02120829U publication Critical patent/JPH02120829U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案のX線露光用マスクを示す図で
、同図aはその平面図、同図bは同図a図におけ
るA−A′線での断面図、第2図は本考案におけ
る他のX線露光用マスクを示す図で、同図aはそ
の平面図、同図bは同図a図におけるA−A′線
での断面図、第3図は欠陥パターンを有するX線
露光用マスクを示す図で、同図aはその平面図、
同図bは同図aのA−A′線での断面図、第4図
は欠陥X線透過膜を有するX線露光用マスクを示
す図で、同図aはその平面図、同図bは同図aの
A−A′線での断面図である。なお、X線露光用
マスクの表(オモテ)側は第1図b〜第4図bに
おける紙面の地の側とする。 1は正常なパターンを有する露光領域、2は修
正不可能な欠陥パターンを有する露光領域、3は
破れたX線透過膜を有する露光領域、4はX線透
過膜が除去された露光領域、5はX線遮蔽板、6
は接着層、7は支持体、8はX線透過膜、9はX
線吸収体、10はアライメント・マーク用小窓、
11は正常なパターンを有する露光領域をもつ大
窓、12は修正不可能な欠陥パターンを有する露
光領域をもつ大窓、13は破れたX線透過膜を有
する露光領域をもつ大窓、14は窓側壁を示す。
Figure 1 is a diagram showing the X-ray exposure mask of the present invention, Figure a is a plan view thereof, Figure b is a sectional view taken along line A-A' in Figure A, and Figure 2 is a diagram of the invention FIG. 3 is a diagram showing another X-ray exposure mask in FIG. This figure shows an exposure mask, and figure a is a plan view thereof;
Figure b is a cross-sectional view taken along line A-A' in figure a, Figure 4 is a diagram showing an X-ray exposure mask having a defective X-ray transmitting film, figure a is a plan view thereof, figure b is 1 is a sectional view taken along line AA' in FIG. The front side of the X-ray exposure mask is the bottom side of the paper in FIGS. 1b to 4b. 1 is an exposure area with a normal pattern, 2 is an exposure area with an uncorrectable defect pattern, 3 is an exposure area with a torn X-ray transparent film, 4 is an exposure area from which the X-ray transparent film has been removed, 5 is an X-ray shielding plate, 6
is an adhesive layer, 7 is a support, 8 is an X-ray transparent membrane, 9 is X
Line absorber, 10 is a small window for alignment mark,
11 is a large window with an exposure area having a normal pattern; 12 is a large window with an exposure area having an uncorrectable defect pattern; 13 is a large window with an exposure area having a broken X-ray transparent film; Showing the window side wall.

Claims (1)

【実用新案登録請求の範囲】 (1) 平板状支持体の一方の面にX線透過膜が積
層され、複数個のX線露光領域に対して該X線透
過膜上にX線吸収材からなる同一のパターンがそ
れぞれ形成され、かつ該平板状支持体の他方の面
から各X線露光領域に対応した窓部が穿設される
X線露光用マスクにおいて、欠陥パターン、また
は欠陥X線透過膜を有する窓部がX線遮蔽板によ
り遮蔽されていることを特徴とするX線露光用マ
スク。 (2) 上記欠陥パターン、または欠陥X線透過膜
を有する窓部を遮蔽したX線遮蔽板が、気密に遮
蔽されていることを特徴とする請求項1記載のX
線露光用マスク。 (3) 上記支持体窓部が谷状にテーパーを有して
穿設され、またその窓部の開口面積の小さい方の
面にX線透過膜が積層されており、かつその窓部
がX線遮蔽板により谷状窓部内において遮蔽され
ていることを特徴とする請求項1、または2記載
のX線露光用マスク。
[Claims for Utility Model Registration] (1) An X-ray transparent film is laminated on one surface of a flat support, and an X-ray absorbing material is layered on the X-ray transparent film for a plurality of X-ray exposure areas. In an X-ray exposure mask in which identical patterns are formed and windows corresponding to each X-ray exposure area are formed from the other surface of the flat support, defective patterns or defective X-ray transmission An X-ray exposure mask characterized in that a window portion having a film is shielded by an X-ray shielding plate. (2) The X-ray shielding plate according to claim 1, wherein the X-ray shielding plate that shields the window portion having the defect pattern or the defective X-ray transparent film is airtightly shielded.
Mask for line exposure. (3) The window portion of the support body is formed with a taper in the shape of a valley, and an X-ray transparent membrane is laminated on the surface with a smaller opening area of the window portion, and the window portion is 3. The X-ray exposure mask according to claim 1, wherein the valley-shaped window portion is shielded by a ray shielding plate.
JP2920089U 1989-03-14 1989-03-14 Pending JPH02120829U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2920089U JPH02120829U (en) 1989-03-14 1989-03-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2920089U JPH02120829U (en) 1989-03-14 1989-03-14

Publications (1)

Publication Number Publication Date
JPH02120829U true JPH02120829U (en) 1990-09-28

Family

ID=31253205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2920089U Pending JPH02120829U (en) 1989-03-14 1989-03-14

Country Status (1)

Country Link
JP (1) JPH02120829U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100389567B1 (en) * 1999-08-19 2003-06-27 엔이씨 일렉트로닉스 코포레이션 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100389567B1 (en) * 1999-08-19 2003-06-27 엔이씨 일렉트로닉스 코포레이션 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus

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