JPH02115565U - - Google Patents
Info
- Publication number
- JPH02115565U JPH02115565U JP2149689U JP2149689U JPH02115565U JP H02115565 U JPH02115565 U JP H02115565U JP 2149689 U JP2149689 U JP 2149689U JP 2149689 U JP2149689 U JP 2149689U JP H02115565 U JPH02115565 U JP H02115565U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- magnetic material
- sample dish
- vibrating
- dish
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 239000012495 reaction gas Substances 0.000 claims description 3
- 238000003756 stirring Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 1
- 239000004570 mortar (masonry) Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 238000012856 packing Methods 0.000 description 1
Description
第1図は本考案の一実施例を示す説明図、第2
図、第3図及び第4図はそれぞれ本考案の他の実
施例を示す説明図、第5図は本考案の実施例にお
ける試料皿の一例の構造を示す説明図、第6図は
従来のマイクロ波CVD装置において採られてき
た撹拌手段の一例を示す説明図である。
1……試料皿、2……粉状試料、4……軸、5
……磁性体、6……電磁石、7……反応管、8…
…導波管、9……試料投入口、10……キヤツプ
、11a,11b……パツキン、12……軸シー
ル、13……昇降装置、14……反応ガス導入口
、15……排気装置、16……バイブレータ、1
7……接触子、18……アプリケータ。なお図中
同一符号は同一または相当するものを示す。
Fig. 1 is an explanatory diagram showing one embodiment of the present invention;
3 and 4 are explanatory diagrams showing other embodiments of the present invention, FIG. 5 is an explanatory diagram showing the structure of an example of a sample dish in the embodiment of the present invention, and FIG. FIG. 2 is an explanatory diagram showing an example of a stirring means used in a microwave CVD apparatus. 1...Sample plate, 2...Powdered sample, 4...Shaft, 5
...Magnetic material, 6...Electromagnet, 7...Reaction tube, 8...
... Waveguide, 9 ... Sample input port, 10 ... Cap, 11a, 11b ... Packing, 12 ... Shaft seal, 13 ... Lifting device, 14 ... Reaction gas inlet, 15 ... Exhaust device, 16...vibrator, 1
7... Contactor, 18... Applicator. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
クロ波を導入してプラズマを発生させ、このプラ
ズマの領域内で試料皿に入れた粉状試料を上記反
応ガスと気相化学反応させるマイクロ波CVD装
置において、上記試料皿を振動させて該試料皿内
の粉状試料を撹拌する手段を設けたことを特徴と
するマイクロ波CVD装置。 (2) 試料皿を振動させる手段として、試料皿を
支える軸に磁性体を装着するかあるいは軸自体を
磁性体とし、該磁性体の周囲に該磁性体に振動を
発生させる電磁石を配置したことを特徴とする請
求項第1項記載のマイクロ波CVD装置。 (3) 試料皿を振動させる手段として、試料皿を
支える軸に接触子を介してバイブレータを接続し
たことを特徴とする請求項第1項記載のマイクロ
波CVD装置。 (4) 試料皿の内部底面部をすりばち状にしたこ
とを特徴とする請求項第1項記載のマイクロ波C
VD装置。[Claims for Utility Model Registration] (1) Plasma is generated by flowing a reaction gas into a vacuum reaction tube and introducing microwaves, and a powdered sample placed in a sample dish is exposed to the reaction gas within the area of this plasma. A microwave CVD apparatus for carrying out a gas phase chemical reaction, characterized in that a means is provided for vibrating the sample dish to stir the powdered sample in the sample dish. (2) As a means of vibrating the sample dish, a magnetic material is attached to the shaft supporting the sample dish, or the shaft itself is made of a magnetic material, and an electromagnet is placed around the magnetic material to generate vibrations in the magnetic material. The microwave CVD apparatus according to claim 1, characterized in that: (3) The microwave CVD apparatus according to claim 1, wherein a vibrator is connected to the shaft supporting the sample plate via a contact as means for vibrating the sample plate. (4) The microwave C according to claim 1, characterized in that the inner bottom of the sample dish is shaped like a mortar.
VD device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2149689U JPH02115565U (en) | 1989-02-28 | 1989-02-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2149689U JPH02115565U (en) | 1989-02-28 | 1989-02-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02115565U true JPH02115565U (en) | 1990-09-17 |
Family
ID=31238786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2149689U Pending JPH02115565U (en) | 1989-02-28 | 1989-02-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02115565U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08176540A (en) * | 1994-12-27 | 1996-07-09 | Nec Kansai Ltd | Coating treatment of fluorescent substance for diffused electro-luminescence |
JP2019530798A (en) * | 2016-09-16 | 2019-10-24 | ピコサン オーワイPicosun Oy | Particle coating by atomic layer deposition (ALD) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58141375A (en) * | 1982-02-15 | 1983-08-22 | Takashi Hirate | Powder coating device |
JPH01247503A (en) * | 1988-03-30 | 1989-10-03 | Tdk Corp | Magnetic particles and production thereof |
-
1989
- 1989-02-28 JP JP2149689U patent/JPH02115565U/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58141375A (en) * | 1982-02-15 | 1983-08-22 | Takashi Hirate | Powder coating device |
JPH01247503A (en) * | 1988-03-30 | 1989-10-03 | Tdk Corp | Magnetic particles and production thereof |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08176540A (en) * | 1994-12-27 | 1996-07-09 | Nec Kansai Ltd | Coating treatment of fluorescent substance for diffused electro-luminescence |
JP2019530798A (en) * | 2016-09-16 | 2019-10-24 | ピコサン オーワイPicosun Oy | Particle coating by atomic layer deposition (ALD) |
US11261526B2 (en) | 2016-09-16 | 2022-03-01 | Picosun Oy | Particle coating |
JP2022095904A (en) * | 2016-09-16 | 2022-06-28 | ピコサン オーワイ | Particle coating by atomic layer deposition (ald) |
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