JPH0193443A - Production of titanium oxide coating film - Google Patents
Production of titanium oxide coating filmInfo
- Publication number
- JPH0193443A JPH0193443A JP7003287A JP7003287A JPH0193443A JP H0193443 A JPH0193443 A JP H0193443A JP 7003287 A JP7003287 A JP 7003287A JP 7003287 A JP7003287 A JP 7003287A JP H0193443 A JPH0193443 A JP H0193443A
- Authority
- JP
- Japan
- Prior art keywords
- titanium oxide
- substrate
- aqueous solution
- titanium
- additive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 37
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000011248 coating agent Substances 0.000 title abstract description 8
- 238000000576 coating method Methods 0.000 title abstract description 8
- 239000007864 aqueous solution Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000000243 solution Substances 0.000 claims abstract description 21
- 239000000654 additive Substances 0.000 claims abstract description 17
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims abstract description 14
- 230000000996 additive effect Effects 0.000 claims abstract description 12
- BFDQRLXGNLZULX-UHFFFAOYSA-N titanium hydrofluoride Chemical compound F.[Ti] BFDQRLXGNLZULX-UHFFFAOYSA-N 0.000 claims abstract description 10
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000004327 boric acid Substances 0.000 claims abstract description 7
- 239000011701 zinc Substances 0.000 claims abstract description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 4
- 239000007788 liquid Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 238000006460 hydrolysis reaction Methods 0.000 abstract 1
- 230000001737 promoting effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 14
- 239000002585 base Substances 0.000 description 11
- 239000010936 titanium Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 229910052719 titanium Inorganic materials 0.000 description 8
- 229910003708 H2TiF6 Inorganic materials 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 238000001556 precipitation Methods 0.000 description 6
- 239000004408 titanium dioxide Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- -1 Titanium hydrogen Chemical class 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- VKRWBTVMYISSEF-UHFFFAOYSA-N oxygen(2-);titanium(2+) Chemical compound [O-2].[Ti+2] VKRWBTVMYISSEF-UHFFFAOYSA-N 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は酸化チタン被膜の製造方決に関し、特に処理溶
液と基材とを＃紗させて基材表面に酸化チタン被膜を形
成する酸化チタン被膜の製造方法に関する。Detailed Description of the Invention [Industrial Field of Application] The present invention relates to a method for producing a titanium oxide film, and in particular, a method for producing a titanium oxide film, in which a treatment solution and a base material are gauged to form a titanium oxide film on the surface of the base material. This invention relates to a method for producing a film.
従来、酸化亜鉛を飽和させたチタン７ツ化水素酸水溶液
にホウ酸を添加した処理液とガラス材とを接触させてガ
ラス材表面に酸化チタン被膜を製造する方法が知られて
いる。（例えば特開昭！ターハク弘弘ｌ）
〔発明が解決しようとする問題点〕
上記液相析出方法によれば、任意の形状のガラス材の表
ｍ１に酸化チタン被膜を形成できる利点を有するものの
ＺｎＯ溶解の工程中飽和状態の判定がむずかしく、該ｚ
ｎＯ溶解量の誤差に基づいて添加すべきホウ酸量が大き
く変動し、被膜形成速度（析出速度）の制御がむずかし
いという問題点があった。又処理液中ＫＺｎイオン又は
Ｚｎを含む錯イオン等が存在するため、影線１酸化チタ
ン被膜中にＺｎ原子が取りこまれる可能性があり、該被
膜中にＺｎ原子が取りこまれると被膜の屈折率にムラが
生じる可能性もあった。BACKGROUND ART Conventionally, a method is known in which a titanium oxide film is produced on the surface of a glass material by bringing the glass material into contact with a treatment solution prepared by adding boric acid to an aqueous titanium heptastonic acid aqueous solution saturated with zinc oxide. (For example, JP-A-Sho! Hirohiro Terahaku) [Problems to be Solved by the Invention] Although the liquid phase precipitation method described above has the advantage of being able to form a titanium oxide film on the surface m1 of a glass material of any shape, During the process of dissolving ZnO, it is difficult to judge the saturation state, and the
There was a problem in that the amount of boric acid to be added varied greatly based on the error in the amount of nO dissolved, making it difficult to control the film formation rate (precipitation rate). In addition, since KZn ions or complex ions containing Zn are present in the processing solution, there is a possibility that Zn atoms may be incorporated into the shadow line titanium monooxide coating. There was also the possibility that unevenness would occur in the refractive index.
本発明は上記問題点を解決するためになされたもので、
チタンフッ化水素酬を含む水溶液に、水溶液中のＨ２Ｓ
ｉＦ６ ＋、２Ｈ２０−ＴｉＯ２＋ ／ｉＨＦ の平衡
を右に進める添加剤を添加して酸化チタンの過飽和溶液
とした処理液と基材とを接触させて基材表ｍ１に酸化チ
タン被膜を形成する酸化チタン被膜の製造方法において
、該処理液として亜鉛を含まない水溶液を用いるととも
に該添加剤を処理液中のチタンフッ化水素酬のモル数に
対してグ〜よ０倍のモル数、添加している。The present invention has been made to solve the above problems,
H2S in the aqueous solution is added to the aqueous solution containing titanium hydrogen fluoride.
iF6 +, 2H20-TiO2+ /iHF A titanium oxide film is formed on the substrate surface m1 by bringing the substrate into contact with a treatment solution that is made into a supersaturated solution of titanium oxide by adding an additive that shifts the equilibrium of 2H20-TiO2+ /iHF to the right. In the method for producing a film, an aqueous solution containing no zinc is used as the treatment liquid, and the additive is added in an amount of 0 to 0 times the number of moles of titanium hydrogen fluoride in the treatment liquid.
本発明に用いるチタン７ツ化水素ｅ （Ｈ２ＴｉＦ６）
水溶液は任意の濃度で使用できるが、酸化チタン被膜の
形成速度および作業性等の間験からｏ、ｉ〜３モル／リ
ットルの濃度であることが好ましい。Titanium hydrogen heptadide e (H2TiF6) used in the present invention
Although the aqueous solution can be used at any concentration, it is preferably at a concentration of o, i to 3 mol/liter based on experimental results such as the rate of formation of the titanium oxide film and workability.
該添加剤の添加量はＨ２ＴｉＦ６溶液の濃度および温度
、添加剤の種類、形腎、濃度等により調整されるが、Ｈ
２ＴｉＦ６水溶液の場合Ｈ２ＴｉＦ６１モルに対して弘
〜１０モルの割合で添加されることが必要である。添加
ｔが下限よりも少ないと基材がエツチングされたりする
場合が生じやすく、添加量が上限より多いと溶液中に沈
殿等を生じやすくなる。The amount of the additive added is adjusted depending on the concentration and temperature of the H2TiF6 solution, the type of additive, the shape, the concentration, etc.
In the case of a 2TiF6 aqueous solution, it is necessary to add it at a ratio of 10 to 10 moles per 1 mole of H2TiF6. If the addition amount t is less than the lower limit, the base material is likely to be etched, and if the addition amount is more than the upper limit, precipitation etc. are likely to occur in the solution.
該添加剤としては、金属醇化物、ホウ酸、全釈水酸化物
、金属塩化物等チタン７ツ化水素酸水溶液を酸化チタン
過飽和状態とするものならば任意の形状（粉末状、水溶
液状）で使用することができる。The additive may be in any form (powder form, aqueous solution form) as long as it makes the aqueous titanium heptatonic acid supersaturated state with titanium oxide, such as metal moltenide, boric acid, diluted hydroxide, metal chloride, etc. It can be used in
又上記添加剤の内では、アルミニウム塩、水酸化ナトリ
ウム、糸つ酸が好ましく、アルミニウム塩としては、塩
化アルミニウム、水酸化アルミニウム等が例示でき、塩
化アルミニウムが良好な二酸化チタン被膜を得るうえで
最も望ましい。塩化アルミニウムが、良好な二酸化チタ
ン被膜を得るために最も望ましい理由はさだがではない
が処理液中の塩素イオンが二酸化チタン析出反応に何ら
かの形で関与するためと考えられる。Also, among the above additives, aluminum salts, sodium hydroxide, and sulfuric acid are preferable. Examples of aluminum salts include aluminum chloride and aluminum hydroxide. Aluminum chloride is the most preferred for obtaining a good titanium dioxide coating. desirable. The reason why aluminum chloride is the most desirable for obtaining a good titanium dioxide coating is not because of the fact that aluminum chloride is used, but it is thought that the chlorine ions in the treatment solution are somehow involved in the titanium dioxide precipitation reaction.
該処理液と基材との接触のさせ方としては、■チタンフ
ッ化水素酸水溶液に基材を浸漬させた後該チタンフッ化
水素酸溶液に添加剤を添加する方法。■添加剤の水溶液
に基材を浸漬させた後チタンフッ化水素酸水溶液を添加
する方法。■チタン７ツ化水素酸水溶液に添加剤を添加
した後、基材を浸漬する方法。■チタン７ツ化水素酸水
溶液に添加剤を添加した後基材表面を流下させる方法等
が例示される。The method for bringing the treatment liquid into contact with the substrate is (1) a method in which the substrate is immersed in an aqueous titanium hydrofluoric acid solution and then additives are added to the titanium hydrofluoric acid solution. ■A method in which the base material is immersed in an aqueous solution of additives and then a titanium hydrofluoric acid aqueous solution is added. ■A method in which the base material is immersed after adding additives to an aqueous titanium heptathonic acid solution. (2) A method in which an additive is added to a titanium hydro7tonic acid aqueous solution and then allowed to flow down the surface of a base material is exemplified.
二酸化チタンを析出させる基材としては、該添加剤の添
加されたチタンフッ化水素酸の溶液と反応しないか又は
反応しに（い基板であれば使用することができ、ガラス
基板等のチタン７）化水素酸のみの溶液に対しては反応
（エツチング）される基板であってもかまわない。又糸
状、線状、管状、板状、壷状等任意の形状の基材に適用
することができる。As the substrate on which titanium dioxide is deposited, any substrate that does not react or does not react with the solution of titanium hydrofluoric acid to which the additive is added can be used, such as a titanium substrate such as a glass substrate. A substrate that reacts (etches) with a solution containing only hydrohydric acid may be used. Further, it can be applied to base materials of arbitrary shapes such as filamentous, linear, tubular, plate-like, pot-like, etc.
上記処理液と基材とを接触させることで基材表面に二酸
化チタン被膜を形成することができるが、該二酸化チタ
ン被覆基材を加熱処理することも可能である。該加熱処
理を行なうと二重化チタン被膜の基材に対する付着強度
が増加するので好ましい０
又該加熱は！００〜ｔ ｏ ｏ′ｃの温度で行なわれる
ことが好ましい。Although a titanium dioxide film can be formed on the surface of a substrate by bringing the above treatment liquid into contact with the substrate, it is also possible to heat-treat the titanium dioxide-coated substrate. This heating treatment increases the adhesion strength of the double titanium coating to the base material, so it is preferable. Preferably, the reaction is carried out at a temperature of 0.00 to 0.000 to 0.000 m.
実施例−ノ、比較例−／〜！
たて、横ｊＱｕ、厚さ／闘のソーダライムガラスを十分
に洗浄、乾燥し、試料基材とした。またθ、ｒｍｏｌ／
ｌのＨ２ＴｉＦ６水溶液と／ ｍｏｌ ／ｌのｉｃｌ！
３の水溶液と３００１ｎｌのビーカー６個とを用意し各
々のビーカーＫ Ｏ，ｊｍＯ６／ｌ Ｈ２ＴｉＦ５水溶
液１００ｍ１を入れ、／ｍｏｌ／ｌ！のＡ１０１３水溶
液１０ｍ１ｌ、ｊＯｍｌ。Example-No, Comparative Example-/~! Soda lime glass of length, width, and thickness was thoroughly washed and dried, and was used as a sample base material. Also θ, rmol/
l of H2TiF6 aqueous solution and / mol /l of icl!
Prepare an aqueous solution of No. 3 and 6 beakers of 3001 nl, and fill each beaker with 100 ml of an aqueous solution of K O,jmO6/l H2TiF5, /mol/l! A1013 aqueous solution 10ml, jOml.
７ｏｍｔ、ｉｏｏｍｌ、ｌｚｏｍｌ （比較例−／−ｊ
）および２ｏｏｒｎｌ （実施例−ｌ）を各々加え混
合した。7omt, iooml, lzoml (comparative example -/-j
) and 2oornl (Example-l) were added and mixed.
該ビーカー群を３０℃の水浴上に保持し、恒温に保った
。この各処理液中に上記基材を浸漬して１６時間経過後
に引きあげ、洗浄、乾燥した。The beakers were kept on a 30°C water bath to maintain a constant temperature. The base material was immersed in each treatment solution, and after 16 hours had passed, it was taken out, washed, and dried.
観察の結果、ＡｌＣｌ３水溶液を、２００ｍ１加えた溶
液（実施例−／）に浸漬した木材の表面には被膜が均一
に析出しており、他の基板はすべてエツチングされてい
た。該被膜の膜厚を接触針弐膜厚測定様にて測定した所
約１０ｎｍであった。又形成された被膜の組成１をＥＳ
ＣＡ（Ｘ線光電子分光）を用いて分析した所Ｔｉ＋Ｏ＋
および微量の不純物（ガラス基板の成、分）が検出され
、該被膜が酸化チタンＶ；膜であったことが確認された
。As a result of observation, a film was uniformly deposited on the surface of the wood immersed in a solution containing 200 ml of AlCl3 aqueous solution (Example -/), and all other substrates were etched. The film thickness of the film was measured using a contact needle film thickness measurement method and was found to be about 10 nm. In addition, the composition 1 of the formed film was ES
When analyzed using CA (X-ray photoelectron spectroscopy), Ti+O+
A trace amount of impurity (component of the glass substrate) was detected, and it was confirmed that the film was a titanium oxide V film.
実施例λ〜タ 比較例乙
たて横ｊ Ｑｍｔｎ 、厚さ／ｍｓのソーダライムガラ
スを十分に洗浄、乾燥し、試料基材とした。また弘Ｏ重
かパーセントのＨ２ＴｉＦ６水溶液（約３． ！ｍｏＪ
／Ｊ） 。Examples λ~T Comparative Example Soda lime glass having vertical and horizontal j Qmtn and thickness/ms was sufficiently washed and dried to be used as a sample base material. In addition, a H2TiF6 aqueous solution (approximately 3.!moJ
/J).
０．７ｍ０６／ｌのＨ２ＴｉＦ６水溶液、／ｍＯｌ／ｌ
ノＡｌＣｌ３の水溶液、０．６ｍ０６／ｌのホウ酸の水
溶液を用意した。0.7m06/l H2TiF6 aqueous solution, /mOl/l
An aqueous solution of 0.6 m06/l of boric acid and an aqueous solution of 0.6 m06/l of boric acid were prepared.
上記６液を用い第１表に示す邦（合で混合し、３００ｍ
１あるいは１００ｍ１のビーカーに取り３５℃水浴ある
いは室温（平均／♂”Ｃ）に放置し、この処理液中に上
記試料基材をそれぞれ１枚づつ浸漬し、／を時間保持し
た後、取り出して洗浄乾燥した。Using the above 6 liquids, mix in the amount shown in Table 1 (300 m
Place in a 1 or 100 m1 beaker and leave in a 35°C water bath or at room temperature (average/♂''C), immerse each of the sample substrates one by one in this treatment solution, hold for a period of time, then take out and wash. Dry.
その後接紗針式膜厚訓定機にて基材上に析出した被膜の
膜厚を測定した。実験条件および膜厚測定結果を第１表
に示す。Thereafter, the thickness of the film deposited on the substrate was measured using a gauze needle type film thickness measuring machine. Table 1 shows the experimental conditions and film thickness measurement results.
第１表において実施例−、＋、ｒで作成したサンプルに
ついてＥＳＣＡ（Ｘｉ光電子分光）にて被膜の成分を分
析したところ実施例２においてはＴｉ＋Ｏ。In Table 1, the components of the coating were analyzed by ESCA (Xi photoelectron spectroscopy) for the samples prepared in Examples -, +, and r, and in Example 2, Ti+O was found.
および微量のガラス成分、実施例グおよびｌにおいては
Ｔｉ、Ｏが検出され、酸化チタンが成膜されているのが
確認された。また比較例ｔで作成したサンプルについて
は、液中に沈殿が生じほとんどなにも成膜されていなか
った。In addition, trace amounts of glass components, Ti and O were detected in Examples G and I, and it was confirmed that titanium oxide was formed. Further, regarding the sample prepared in Comparative Example t, precipitation occurred in the liquid and almost no film was formed.
本発明によれば、溶液を用いた析出法によりガラス基材
等の表面に酸化チタン被膜を簡単に作成することができ
る。又処理液作成時に酸化亜鉛を飽和させる必要がない
ので、添加剤の添加量等が一定化し、反応の制御等が行
ないやすい。According to the present invention, a titanium oxide film can be easily formed on the surface of a glass substrate or the like by a precipitation method using a solution. Furthermore, since it is not necessary to saturate zinc oxide when preparing the treatment liquid, the amount of additives added can be kept constant, making it easy to control the reaction.
Claims (2)
Ｈ＿２ＴｉＦ＿６＋２Ｈ＿２Ｏ■ＴｉＯ＿２＋６ＨＦの
平衡を右に進める添加剤を添加して酸化チタンの過飽和
溶液とした処理液と基材とを接触させて基材表面に酸化
チタン被膜を形成する酸化チタン被膜の製造方法におい
て、該処理液として亜鉛を含まない水溶液を用いるとと
もに該添加剤を処理液中のチタンフッ化水素酸のモル数
に対して４〜５０倍のモル数添加することを特徴とする
酸化チタン被膜の製造方法。(1) An additive that moves the equilibrium of H_2TiF_6+2H_2O■TiO_2+6HF in the aqueous solution to the right is added to an aqueous solution containing titanium hydrofluoric acid to make a supersaturated solution of titanium oxide.The treatment liquid is brought into contact with the substrate, and the substrate is surfaced. In the method for producing a titanium oxide film in which a titanium oxide film is formed on a metal, an aqueous solution containing no zinc is used as the treatment liquid, and the additive is added in an amount of 4 to 50 times the number of moles of titanium hydrofluoric acid in the treatment liquid. A method for producing a titanium oxide film, characterized by adding a number of moles.
酸である特許請求の範囲第１項記載の酸化チタン被膜の
製造方法。(2) The method for producing a titanium oxide film according to claim 1, wherein the additive is aluminum chloride and/or boric acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7003287A JPH0735268B2 (en) | 1987-03-24 | 1987-03-24 | Method for producing titanium oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7003287A JPH0735268B2 (en) | 1987-03-24 | 1987-03-24 | Method for producing titanium oxide film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0193443A true JPH0193443A (en) | 1989-04-12 |
| JPH0735268B2 JPH0735268B2 (en) | 1995-04-19 |
Family
ID=13419847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7003287A Expired - Fee Related JPH0735268B2 (en) | 1987-03-24 | 1987-03-24 | Method for producing titanium oxide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0735268B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03285822A (en) * | 1990-03-30 | 1991-12-17 | Nippon Sheet Glass Co Ltd | Production of titanium oxide coating film |
| JPH04130017A (en) * | 1990-09-18 | 1992-05-01 | Nippon Sheet Glass Co Ltd | Production of porous titanium oxide film |
| EP0784034A1 (en) * | 1996-01-12 | 1997-07-16 | Matsushita Electric Works, Ltd. | Titanium dioxide film having photocatalytic activity and substrate having the same |
| WO1998052871A1 (en) * | 1997-05-23 | 1998-11-26 | Kyorasha Co., Ltd. | Titanium oxide-containing material and process for preparing the same |
| US6066359A (en) * | 1996-09-13 | 2000-05-23 | Takeshi Yao | Process for producing titanium oxide thin film, and photocatalyst |
| US6265064B1 (en) | 1997-05-23 | 2001-07-24 | Kyorasha Co., Ltd. | Natural fibers containing titanium oxide and process for producing the same |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4688115B2 (en) * | 1999-11-29 | 2011-05-25 | スタンレー電気株式会社 | Method for forming film in liquid phase |
| GB0803194D0 (en) | 2008-02-21 | 2008-04-02 | Microsphere Technology Ltd | Process for the manufacture of titania coated microspheres |
-
1987
- 1987-03-24 JP JP7003287A patent/JPH0735268B2/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03285822A (en) * | 1990-03-30 | 1991-12-17 | Nippon Sheet Glass Co Ltd | Production of titanium oxide coating film |
| JPH04130017A (en) * | 1990-09-18 | 1992-05-01 | Nippon Sheet Glass Co Ltd | Production of porous titanium oxide film |
| EP0784034A1 (en) * | 1996-01-12 | 1997-07-16 | Matsushita Electric Works, Ltd. | Titanium dioxide film having photocatalytic activity and substrate having the same |
| US6066359A (en) * | 1996-09-13 | 2000-05-23 | Takeshi Yao | Process for producing titanium oxide thin film, and photocatalyst |
| WO1998052871A1 (en) * | 1997-05-23 | 1998-11-26 | Kyorasha Co., Ltd. | Titanium oxide-containing material and process for preparing the same |
| US6265064B1 (en) | 1997-05-23 | 2001-07-24 | Kyorasha Co., Ltd. | Natural fibers containing titanium oxide and process for producing the same |
| US6376023B1 (en) | 1997-05-23 | 2002-04-23 | Kyorasha Co., Ltd. | Titanium oxide-containing material and process for preparing the same |
| KR100548215B1 (en) * | 1997-05-23 | 2006-02-01 | 모리토시 가부시키가이샤 | Titanium oxide-containing material and process for preparing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0735268B2 (en) | 1995-04-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |