JPH0192356A - Ornamental body and its production - Google Patents
Ornamental body and its productionInfo
- Publication number
- JPH0192356A JPH0192356A JP24691087A JP24691087A JPH0192356A JP H0192356 A JPH0192356 A JP H0192356A JP 24691087 A JP24691087 A JP 24691087A JP 24691087 A JP24691087 A JP 24691087A JP H0192356 A JPH0192356 A JP H0192356A
- Authority
- JP
- Japan
- Prior art keywords
- masking
- layer
- vacuum
- base material
- masking layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 239000000463 material Substances 0.000 claims abstract description 43
- 230000000873 masking effect Effects 0.000 claims abstract description 36
- 238000000034 method Methods 0.000 claims abstract description 29
- 239000002562 thickening agent Substances 0.000 claims abstract description 10
- 239000000843 powder Substances 0.000 claims abstract description 5
- 239000002904 solvent Substances 0.000 claims abstract description 4
- 238000007747 plating Methods 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 12
- 229920002678 cellulose Polymers 0.000 claims description 6
- 239000001913 cellulose Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- 239000003463 adsorbent Substances 0.000 claims 1
- 230000000274 adsorptive effect Effects 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 239000011521 glass Substances 0.000 abstract description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052759 nickel Inorganic materials 0.000 abstract description 6
- 229910045601 alloy Inorganic materials 0.000 abstract description 5
- 239000000956 alloy Substances 0.000 abstract description 5
- 239000000919 ceramic Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 238000007650 screen-printing Methods 0.000 abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 abstract description 3
- 229910052742 iron Inorganic materials 0.000 abstract description 3
- 150000002739 metals Chemical class 0.000 abstract description 3
- 239000003960 organic solvent Substances 0.000 abstract description 3
- 229910052719 titanium Inorganic materials 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 150000001247 metal acetylides Chemical class 0.000 abstract description 2
- 150000004767 nitrides Chemical class 0.000 abstract description 2
- 235000019646 color tone Nutrition 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 23
- 239000010408 film Substances 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 239000010409 thin film Substances 0.000 description 6
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、真空成膜法を用いて、基材上にパターン層を
形成した装飾体およびその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a decorative body in which a pattern layer is formed on a base material using a vacuum film forming method, and a method for manufacturing the same.
［従来の技術とその問題点］
一般に、筆記具、時計等といった携帯用装飾品の装飾用
薄膜を形成する方法の１つとして真空成膜法がある。[Prior art and its problems] In general, a vacuum film forming method is one of the methods for forming decorative thin films for portable accessories such as writing instruments, watches, and the like.
これらの薄膜を用いて、装飾効果の高いパターン形成を
行なうために、レジスト、メタルマスク等の方法が用い
られているが、筆記具、時計等といった携帯用装飾品に
応用するには１作業工程が複雑である、用いられる材料
が高価格である等といった点から問題が多いものである
。そのため、低コストで作業性に富んだパターン形成方
法として、転写法、あるいは、スクリーン印刷法等によ
り、ペースト状マスキング材のパターンを基材に印刷し
、このパターン上に直接装飾用薄膜を真空成膜法により
形成した後、マスキング材を除去し、装飾用薄膜のパタ
ーンを形成する方法がある。Methods such as resist and metal masks are used to form patterns with high decorative effects using these thin films, but one work step is required to apply them to portable accessories such as writing instruments and watches. There are many problems due to the complexity and the high cost of the materials used. Therefore, as a low-cost and easy-to-work pattern forming method, a pattern of paste masking material is printed on a base material using a transfer method or screen printing method, and a thin decorative film is vacuum-formed directly on this pattern. There is a method of forming a decorative thin film pattern by removing the masking material after forming it by a film method.
この方法として、マスキング材によるパターン形成に低
融点ガラスフリットの焼付けによる密着性を利用したも
の、増粘剤としてエチルセルロース、ニトロセルロース
等を使用したマスキング材を用いたもの等が一般に用い
られているが、低融点ガラスフリットの焼付けによる密
着性を利用したものは、ガラス系基材との特有の物理的
性質、例えば、転移温度、軟化温度等の差を利用してい
るため、金居１合金、セラミック等の基材には不向きで
あり、作業性も悪いものである。Commonly used methods include those that utilize the adhesion of low-melting glass frit by baking to form a pattern using a masking material, and those that use a masking material that uses ethyl cellulose, nitrocellulose, etc. as a thickener. , those that utilize the adhesion of low-melting glass frit by baking utilize the unique physical properties with the glass base material, such as the difference in transition temperature, softening temperature, etc. It is unsuitable for base materials such as ceramics, and has poor workability.
一方、増粘剤としてエチルセルロース、ニトロセルロー
ス等を使用したマスキング材を用いたものは、耐熱性が
悪く、２００℃以上の温度ではガスを発生し分解、炭化
してしまう。特に窒化チタン、炭化チタン等の金色装飾
用薄膜のパターン形成に用いるには、薄膜形成中にガス
が発生すると色が黒ずむため所望の金色薄膜が得られな
いものである。On the other hand, masking materials using ethyl cellulose, nitrocellulose, or the like as a thickener have poor heat resistance, and at temperatures of 200° C. or higher, they generate gas, decompose, and carbonize. In particular, when used for patterning gold decorative thin films of titanium nitride, titanium carbide, etc., the desired golden thin film cannot be obtained because the color darkens if gas is generated during thin film formation.
その上に、立体的なパターンを形成するため、真空成膜
法及び化学めっきを併用して同形のパタ二島、を形成す
る場合には、レジスト、メタルマスク等といった方法を
用いて真空成膜法によりパターンを形成する工程と、マ
スキング材を用いて、化学めっきによりパターンを形成
する工程とを交互に行なうことにより、作業工程が複雑
になる、同一形状のパターンを形成するのが難しい等と
いった問題点を有する。On top of that, in order to form a three-dimensional pattern, when forming two islands of the same shape using a combination of vacuum film formation method and chemical plating, vacuum film formation is performed using a method such as resist or metal mask. By alternating the process of forming a pattern by a chemical plating method and the process of forming a pattern by chemical plating using a masking material, the work process becomes complicated, and it is difficult to form a pattern with the same shape. There are problems.
［問題点を解決するための手段］
本発明は、上記問題点に鑑みなされたものであり、その
要旨を、軟化点が２００ ’Ｃ以上で、真空での蒸気圧
が２００℃で１×１０″″３Ｐａ以下のマスキング材を
用いて、真空成膜法及び化学めっきにより我村上に同形
のパターン層を少なくとも２層形成したことを特徴とす
る装飾体ｔおよび、基材上に軟化点が２００℃以上で、
真空での蒸気圧が２００°Ｃで１×１０−３Ｐａ以下の
マスキング材を用いて、非パターン部にマスキング層を
設け、この後、該マスキング層およびパターン部上に真
空酸Ｉ’Ｓ法及び化学めっきにより少なくとも２層皮膜
を設け、次いで、マスキング層および該マスキング層上
の皮膜を除去してなる装飾体の製造方法とするものであ
る。[Means for Solving the Problems] The present invention has been made in view of the above problems, and its gist is as follows: ``''A decorative body t characterized in that at least two pattern layers of the same shape are formed on the base material by vacuum film forming method and chemical plating using a masking material of 3 Pa or less, and a softening point of 200 on the base material. At temperatures above ℃,
A masking layer is provided on the non-patterned area using a masking material with a vacuum vapor pressure of 1 x 10-3 Pa or less at 200°C, and then the masking layer and patterned area are subjected to vacuum acid I'S method and The present invention provides a method for producing a decorative body by providing at least two layers of coating by chemical plating, and then removing a masking layer and the coating on the masking layer.
以Ｆ１図面に従い、本発明について詳述する。The present invention will be described in detail below with reference to the F1 drawing.
参照符合１は、鉄、鋼、アルミニウム、亜鉛等の金属ま
たはこれらの合金、セラミックス、ガラス、樹脂等の基
材を示すものであり、適宜必要に応じて、これらの基材
の表面には、真空蒸着、スパッタリング、イオンブレー
ティング等の真空成膜法により皮膜２ａを設けたり、電
気めっき、無電解めっき等の化学めっきによりぬっき１
２ｂを設けてもよい。これらの皮膜２ａ或いはめっき層
２ｂは、適宜必要に応じて、１種もしくは２種以上組み
合わせて設けてもよい。（第１− （ａ）〜（ｃ）図参
照）
上記基材１上には、パターンＭ３を形成するものであり
、該パターン層３は真空成膜法による被膜３ａ化学めっ
きによるめっき層３ｂを適宜必要に応じて組み合わせて
設けてなる。Reference numeral 1 indicates a base material such as metal such as iron, steel, aluminum, zinc, or an alloy thereof, ceramics, glass, resin, etc. The surface of these base materials may be coated with The coating 2a is provided by a vacuum film forming method such as vacuum evaporation, sputtering, or ion blating, or is plated 1 by chemical plating such as electroplating or electroless plating.
2b may be provided. These coatings 2a or plating layers 2b may be provided singly or in combination of two or more, as appropriate and necessary. (Refer to Figures 1-(a) to (c)) A pattern M3 is formed on the base material 1, and the pattern layer 3 includes a coating layer 3a formed by a vacuum film-forming method and a plating layer 3b formed by chemical plating. They are provided in combination as appropriate.
上記パターン層３上には、適宜必要に応じて、真空成膜
法による皮膜４ａ或いは化学めっきによるめっき／ｉ！
７４ｂを１種もしくは２種以上組み合わせて設けてもよ
い。（第２−（ａ）〜（ｃ）図参照）
次に、本発明の製造方法について詳述する。On the pattern layer 3, a film 4a formed by a vacuum film forming method or a plating film 4a formed by chemical plating is applied as necessary.
74b may be provided alone or in combination of two or more types. (See Figures 2-(a) to (c)) Next, the manufacturing method of the present invention will be described in detail.
基材１の表面に、軟化点が２００ ’Ｃ以上で、真空で
の蒸気圧が２００℃で１×１０−ｆｆＰａ以下のマスキ
ング材をスクリーン印刷或いは転写法等により、非パタ
ーン部５にマスキング層６を設け、この上にパターン層
３を設け、この後、有機溶剤等によりマスキング層６を
除去することにより得られる。On the surface of the base material 1, a masking material having a softening point of 200'C or more and a vapor pressure of 1x10-ffPa or less at 200°C in vacuum is applied as a masking layer to the non-patterned area 5 by screen printing or transfer method. 6 is provided, a pattern layer 3 is provided thereon, and then the masking layer 6 is removed using an organic solvent or the like.
本発明によるマスキング材の軟化点が２００℃以上で、
真空での蒸気圧が２００℃で１×１０−３Ｐａ以下であ
るのは、真空成膜法による皮膜形成の条件下において、
マスキング材の剥離やガスの発生を防ぐためである。The softening point of the masking material according to the present invention is 200°C or higher,
The reason why the vapor pressure in vacuum is 1×10-3 Pa or less at 200°C is that under the conditions of film formation by the vacuum film-forming method,
This is to prevent peeling of the masking material and generation of gas.
上記マスキング材としては、軟化点が２００℃以上のセ
ルロース系の増粘剤と、上記セルロース系の増粘剤を溶
解し得る溶剤と、非吸若性の無機粉体（アルミニウム、
鉄、銅、ニッケル、チタン等の金属あるいはこれらの合
金、酸化物、窒化物、炭化物等の金属化合物、ガラス、
セラミックス等）からなるマスキング材を用いるもので
ある。The masking material includes a cellulose thickener with a softening point of 200°C or higher, a solvent capable of dissolving the cellulose thickener, and non-absorbable inorganic powder (aluminum,
Metals such as iron, copper, nickel, titanium, etc. or their alloys, metal compounds such as oxides, nitrides, and carbides, glass,
A masking material made of ceramics, etc.) is used.
［実施例］ 以下、実施例に基づき、更に詳述する。[Example] Hereinafter, it will be explained in more detail based on Examples.
実施例１
真鍮の板にニッケルめっきを施した基材１をトリクロル
エチレン、アセトン、イソプロピルアルコールにより順
に超音波洗浄を行なった後、乾燥させ、基材表面を浄化
する（第３−（ａ）図）。Example 1 A base material 1, which is a brass plate plated with nickel, is subjected to ultrasonic cleaning using trichlorethylene, acetone, and isopropyl alcohol in order, and then dried to purify the surface of the base material (Fig. 3-(a)). ).
この基材上に、シルクスクリーン印刷によりマスキング
材を用いてネガパターンを形成する（第３− （ｂ）図
）。その後、化学めっきによりニッケル層を約３０ｐｍ
形成した後、洗浄、乾燥し、基材を真空槽内に入れ、１
×１０−３Ｐａ以下の真空にして、基材バイアス電圧−
１００Ｖ、Ａｒガス圧−力１．３３Ｐａ、直流電力２Ａ
Ｘ４００Ｖの条件■
ス（混合比８：２）圧力６．６５Ｘ１０−１Ｐａ、直流
電力１．１Ａｘ４６０Ｖの条件にて１０分間スパッタリ
ングを行ない、上記したニッケルめっき層の上に、窒化
チタンＭ３を形成した（第３−（ｃ）図）。この基材よ
り、アセトンを使って、窒化チタン層３を接着したまま
マスキング層６を除去して、窒化チタン層によるパター
ンを形成した（第３− （ｄ）図）。この結果窒化チタ
ンの金色にニッケルの銀色立体パターンを形成すること
ができた。A negative pattern is formed on this base material by silk screen printing using a masking material (FIG. 3-(b)). After that, a nickel layer of about 30 pm was applied by chemical plating.
After forming, the substrate is washed, dried, placed in a vacuum chamber, and 1
Make the vacuum below ×10-3 Pa and base material bias voltage -
100V, Ar gas pressure 1.33Pa, DC power 2A
Sputtering was performed for 10 minutes under the conditions of X400V (mixing ratio 8:2), pressure 6.65X10-1Pa, and DC power 1.1Ax460V to form titanium nitride M3 on the nickel plating layer described above ( Figure 3-(c)). From this base material, the masking layer 6 was removed using acetone while the titanium nitride layer 3 remained adhered to form a pattern of the titanium nitride layer (FIG. 3-(d)). As a result, a silver three-dimensional pattern of nickel could be formed on the gold of titanium nitride.
尚、用いたマスキング材の組成は以下に示す。The composition of the masking material used is shown below.
以下、単に１％」とあるのは「重量％」を示す。Hereinafter, "1%" simply means "wt%."
アセチルブチルセルロース １３．６％Ｔｉ○
２粉 ２７．２％以下、表１に示す様に
基材に、前処理を行ない、洗浄、乾燥し、この上に下地
石を設け、実施例１と同様にして、ネガパターンを形成
し、表１に示表 １
［効 果］
以上の様に、本発明による装飾体の製造方法は、作業性
に富み、低コストで、各種基材に適応し得るものであり
、装飾効果の高いパターン層を設けた装飾体が得られる
ものである。Acetyl butylcellulose 13.6%Ti○
2 powder 27.2% or less, as shown in Table 1, the base material is pretreated, washed and dried, a base stone is provided on this, and a negative pattern is formed in the same manner as in Example 1, Table 1 shows the results shown in Table 1. [Effects] As described above, the method for manufacturing a decorative body according to the present invention is easy to work with, is low cost, can be applied to various base materials, and can produce patterns with high decorative effects. A decorative body provided with layers is obtained.
第１− （ａ） 〜（ｃ）図、第２ （ａ）〜（ｃ）
図は本発明により得られる装飾体の例を示す縦断面図、
第３−（ａ）〜（ｄ）図は、本発明におけ’ ２ａ、
３ａ、４ａ・・・真空成膜法による皮膜２ｂ、３ｂ、４
ｂ・・・化学めっきによるめっき層。
３・・・パターン層、 ５・・・非パターン部、６
・・・マスキング層。
特許出皿へ ぺんでる株式会社
第ｆ−（ａ）図 第ｆ−（Ｃ）図第２
−（礁）図 第２−（Ｃ）図第２−
（り図
第３一体）図
ト” ｙ ／、 ｙコ
第３−（＆）図
第３−（Ｃ）図
第３−（４３図Part 1 - Figures (a) to (c), Part 2 (a) to (c)
The figure is a longitudinal sectional view showing an example of a decorative body obtained by the present invention.
Figures 3-(a) to (d) show that in the present invention '2a,
3a, 4a... Films 2b, 3b, 4 formed by vacuum film forming method
b... Plating layer by chemical plating. 3... Pattern layer, 5... Non-patterned part, 6
...Masking layer. To the patent plate Pendel Co., Ltd. Figure f-(a) Figure f-(C) Figure 2
- (Reef) Figure 2- (C) Figure 2-
(Figure 3) Figure 3-(&) Figure 3-(C) Figure 3-(43)
Claims (4)
０℃で１×１０＾−＾３Ｐａ以下のマスキング材を用い
て、真空成膜法及び化学めっきにより基材上に同形のパ
ターン層を少なくとも２層形成したことを特徴とする装
飾体。(1) Softening point is 200℃ or higher, vapor pressure in vacuum is 20℃
A decorative body characterized in that at least two pattern layers of the same shape are formed on a base material by a vacuum film forming method and chemical plating using a masking material having a pressure of 1×10^-^3 Pa or less at 0°C.
気圧が２００℃で１×１０＾−＾３Ｐａ以下のマスキン
グ材を用いて、非パターン部にマスキング層を設け、こ
の後、該マスキング層およびパターン部上に真空成膜法
及び化学めっきにより少なくとも２層皮膜を設け、次い
で、マスキング層および該マスキング層上の皮膜を除去
してなる装飾体の製造方法。(2) On the base material, a masking layer is provided in the non-patterned area using a masking material with a softening point of 200°C or higher and a vapor pressure of 1x10^-^3Pa or less at 200°C in vacuum. After that, at least two layers of coating are provided on the masking layer and the pattern portion by vacuum coating and chemical plating, and then the masking layer and the coating on the masking layer are removed.
ロース系の増粘剤と、上記セルロース系の増粘剤を溶解
し得る溶剤と、非吸着性の無機粉体からなることを特徴
とする特許請求の範囲第（１）項記載の装飾体。(3) The masking material is characterized by comprising a cellulose-based thickener with a softening point of 200°C or higher, a solvent capable of dissolving the cellulose-based thickener, and a non-adsorptive inorganic powder. A decorative body according to claim (1).
ロース系の増粘剤と、上記セルロース系の増粘剤を溶解
し得る溶剤と、非吸着性の無機粉体からなることを特徴
とする特許請求の範囲第（２）項記載の装飾体の製造方
法。(4) The masking material is characterized by comprising a cellulose-based thickener with a softening point of 200°C or higher, a solvent capable of dissolving the cellulose-based thickener, and a non-adsorbent inorganic powder. A method for manufacturing a decorative body according to claim (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24691087A JPH0192356A (en) | 1987-09-30 | 1987-09-30 | Ornamental body and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24691087A JPH0192356A (en) | 1987-09-30 | 1987-09-30 | Ornamental body and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0192356A true JPH0192356A (en) | 1989-04-11 |
Family
ID=17155565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24691087A Pending JPH0192356A (en) | 1987-09-30 | 1987-09-30 | Ornamental body and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0192356A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007533483A (en) * | 2003-09-19 | 2007-11-22 | シピックス・イメージング・インコーポレーテッド | Method for forming a thin film structure depicting a pattern for in-mold decoration |
| JP2011191321A (en) * | 2003-12-23 | 2011-09-29 | Rolex Sa | Ceramic element for watch case, and method of manufacturing the same |
-
1987
- 1987-09-30 JP JP24691087A patent/JPH0192356A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007533483A (en) * | 2003-09-19 | 2007-11-22 | シピックス・イメージング・インコーポレーテッド | Method for forming a thin film structure depicting a pattern for in-mold decoration |
| JP2011191321A (en) * | 2003-12-23 | 2011-09-29 | Rolex Sa | Ceramic element for watch case, and method of manufacturing the same |
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