JPH01310712A - Producing equipment of atmospheric gas for heating oven - Google Patents
Producing equipment of atmospheric gas for heating ovenInfo
- Publication number
- JPH01310712A JPH01310712A JP63143149A JP14314988A JPH01310712A JP H01310712 A JPH01310712 A JP H01310712A JP 63143149 A JP63143149 A JP 63143149A JP 14314988 A JP14314988 A JP 14314988A JP H01310712 A JPH01310712 A JP H01310712A
- Authority
- JP
- Japan
- Prior art keywords
- adsorbent
- impurities
- heating furnace
- heating oven
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 34
- 239000003463 adsorbent Substances 0.000 claims abstract description 28
- 239000012535 impurity Substances 0.000 claims abstract description 19
- 238000001179 sorption measurement Methods 0.000 abstract description 28
- 239000007789 gas Substances 0.000 abstract description 23
- 230000008929 regeneration Effects 0.000 abstract description 3
- 238000011069 regeneration method Methods 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000002912 waste gas Substances 0.000 abstract 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 14
- 229910001882 dioxygen Inorganic materials 0.000 description 12
- 239000000463 material Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、電気炉などのような加熱炉にお１１旭で用い
られる雰囲気カスを製造するための装置（こ関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an apparatus for producing atmospheric scum used in a heating furnace such as an electric furnace.
従来の技術
たとえばセラミクス系超電導物質を製造する際には、そ
の材料をたとえば電気炉内で焼結する際における雰囲気
ガスの組成が重要である。この雰囲気カスは、純酸素か
好ましく、その中に不純物として、特に水分が含まれて
いると、安定した良質な超電導物質を得ることができな
い。BACKGROUND ART In manufacturing, for example, ceramic-based superconducting materials, the composition of the atmospheric gas during sintering of the material in, for example, an electric furnace is important. This atmospheric scum is preferably pure oxygen; if it contains impurities, especially water, it will not be possible to obtain a stable and high-quality superconducting material.
従来では、このような酸素雰囲気ガスとして、圧力容器
に充填された酸素ガスを用いている。Conventionally, oxygen gas filled in a pressure vessel has been used as such oxygen atmosphere gas.
発明が解決しようとする課題
このような先行技術では、圧力容器内の酸素ガスに、そ
の充填時に混入した空気に含まれている水分が存在する
。したがってこのような圧力容器に充填されている酸素
ガスを使用すると、前述のように安定した良質な超電導
物質を得ることができない。Problems to be Solved by the Invention In such prior art, moisture contained in the air mixed in during filling of the pressure vessel is present in the oxygen gas inside the pressure vessel. Therefore, if oxygen gas filled in such a pressure vessel is used, it is not possible to obtain a stable and high-quality superconducting material as described above.
本発明の目的は、雰囲気ガス中の不純物を除去すること
がてきるようにした加熱炉用雰囲気カスの製造装置を提
供することである。An object of the present invention is to provide an apparatus for producing atmosphere scum for a heating furnace that can remove impurities in the atmosphere gas.
課題を解決するための手段
本発明は、不純物を含む加熱炉用雰囲気カスを、吸着剤
に通過させて前記不純物を吸着することを特徴とする加
熱炉用雰囲気ガスの製造装置である。Means for Solving the Problems The present invention is an apparatus for producing an atmosphere gas for a heating furnace, characterized in that atmosphere gas for a heating furnace containing impurities is passed through an adsorbent to adsorb the impurities.
また本発明は、加熱炉からの排ガスによって吸着剤を加
熱して再生することを特徴とする特作 用
本発明に従えば、雰囲気ガスに含まれている不純物を、
吸着剤に通過してその吸着剤によって前記不純物を吸着
する。こうして不純物が除去されたガスを、加熱炉の雰
囲気カスとして使用する。Further, the present invention is characterized in that the adsorbent is heated and regenerated by the exhaust gas from the heating furnace.According to the present invention, impurities contained in the atmospheric gas are
It passes through an adsorbent and the impurities are adsorbed by the adsorbent. The gas from which impurities have been removed in this way is used as the atmospheric waste of the heating furnace.
これによって良好な環境で加熱を行うことが可能になる
。This makes it possible to perform heating in a favorable environment.
実施例
第１図は、本発明の一実施例の全体の系統図である。電
気炉のような加熱炉１内ては、被焼結体がたとえば８０
０〜１３００℃に加熱され、セラミクス系超電導物質を
製造することができる。この加熱炉１内の雰囲気カスと
しては、純酸素ガスが必要であり、特に水分を含むこと
が避けられなければならない。Embodiment FIG. 1 is an overall system diagram of an embodiment of the present invention. In a heating furnace 1 such as an electric furnace, the object to be sintered is, for example, 80
It is heated to 0 to 1300°C, and a ceramic superconducting material can be produced. The atmospheric waste in the heating furnace 1 must be pure oxygen gas, and in particular must be prevented from containing moisture.
酸素ガスが充填された圧力容器２からの酸素ガスは、管
路３および開閉弁Ｖ１から管路４を経て吸着塔５の下部
に導かれ、また開閉弁Ｖ２を経て管路６から吸着塔７の
下部に導かれることができる。吸着塔５．７内には、た
とえばモレキュラシーブなどのような吸着剤８，９がそ
れぞれ充填されている。吸着塔５．７の上部は、管路１
ｏ、１１から開閉弁Ｖ３．Ｖ４を経て管路１２に接続さ
れる。管路１２の途中には、流量計１３が介在される。Oxygen gas from the pressure vessel 2 filled with oxygen gas is led to the lower part of the adsorption tower 5 via the pipe line 3 and on-off valve V1 through the pipe line 4, and from the pipe line 6 to the adsorption tower 7 via the on-off valve V2. can be guided to the bottom of Adsorption towers 5.7 are filled with adsorbents 8 and 9, such as molecular sieves, respectively. The upper part of the adsorption tower 5.7 is connected to the pipe line 1.
o, 11 to on-off valve V3. It is connected to the conduit 12 via V4. A flow meter 13 is interposed in the middle of the pipe line 12.
管路１２がらの雰囲気カスは、加熱炉１に導かれる。加
熱炉１がらの排ガスは、管路１４がら熱交換器１５を経
て、管路１６がら開閉弁ｖ５゜Ｖ６を経て、管路４，６
に導かれる。吸着塔５゜７の上部は、開閉弁Ｖ７．Ｖ８
を介して管Ｗ＋ １．７を経て大気に開放される。熱交
換器１５には、ファン１８によって大気が供給され、管
路１４がらの高温度の排ガスが、たとえは３００−３５
０”Ｃ程度にまで冷却される。Atmospheric debris from the pipe line 12 is guided to the heating furnace 1. The exhaust gas from the heating furnace 1 passes through the heat exchanger 15 through the pipe 14, through the on-off valves v5 and V6 through the pipe 16, and then into the pipes 4 and 6.
guided by. The upper part of the adsorption tower 5.7 is equipped with an on-off valve V7. V8
It is opened to the atmosphere via pipe W+ 1.7. The heat exchanger 15 is supplied with atmospheric air by a fan 18, and the high temperature exhaust gas from the pipe line 14 is
It is cooled down to about 0"C.
加熱炉１において加熱を行うにあたっては、吸着塔らに
おいて吸着剤８を用いて圧力容器２内の酸素の不純物の
除去を行い、もう１つの吸着塔７における吸着剤９を加
熱炉１がらの高温度の排カスによ′）で再生する。この
ために開閉弁Ｖｌ、ＶＢ、Ｖ６．Ｖ１３を開き、開閉弁
Ｖ２．Ｖ４．Ｖ５゜■７を閉しる。これによって圧力容
器２がらの酸−３＝
素ガスは、管路３がら開閉弁Ｖ１および管路４を経て吸
着塔５に導かれ、この酸素ガスは吸着剤８を通過するこ
とによって不純物である水分が除去される。吸着塔５が
らの酸素ガスは、管路１ｏがら開閉弁Ｖ３および管路１
２を経て、流量計１３を経て加熱炉１に雰囲気ガスとし
て供給される。When heating is performed in the heating furnace 1, oxygen impurities in the pressure vessel 2 are removed using the adsorbent 8 in the adsorption tower, and the adsorbent 9 in the other adsorption tower 7 is heated to a high temperature in the heating furnace 1. It is regenerated by temperature discharged waste. For this purpose, the on-off valves Vl, VB, V6. Open V13 and open/close valve V2. V4. Close V5゜■7. As a result, the acid gas in the pressure vessel 2 is guided from the pipe line 3 through the on-off valve V1 and the pipe line 4 to the adsorption tower 5, and this oxygen gas passes through the adsorbent 8 to remove impurities. Moisture is removed. Oxygen gas from the adsorption tower 5 is transferred from the pipe 1o to the on-off valve V3 and the pipe 1
2, and is supplied to the heating furnace 1 as an atmospheric gas via a flowmeter 13.
したがって加熱炉１ては、水分が除去された純酸素が雰
囲気カスとして用いられ、良好な加熱環境が達成される
。Therefore, in the heating furnace 1, pure oxygen from which moisture has been removed is used as atmospheric waste, and a good heating environment is achieved.
加熱炉１からの排ガスは前述のように熱交換器１５にお
いて冷却され、管１ｉ’＋１６から開閉弁■６を経て吸
着塔７に導がれ、この吸着塔７に充填されている吸着剤
９を加熱する。したがって吸着剤９の再生が行なわれる
。この吸着塔７がらの排ガスは、管路１１がら開閉弁■
８を経て管路１７がら大気放散される。As mentioned above, the exhaust gas from the heating furnace 1 is cooled in the heat exchanger 15, and is led from the pipe 1i'+16 to the adsorption tower 7 via the on-off valve 6, where the adsorption tower 7 is filled with adsorbent 9. heat up. Therefore, the adsorbent 9 is regenerated. The exhaust gas from the adsorption tower 7 is passed through the pipe line 11 through the on-off valve ■
8 and is released into the atmosphere through a pipe 17.
吸着塔５に充填されている吸着剤８の吸着能力が低下し
てきたときには、開閉弁Ｖｌ、Ｖ３．Ｖ６、Ｖ８を閉じ
、開閉弁Ｖ’２．Ｖ４．Ｖ５．Ｖ７を開で。これによっ
て吸着塔５内の吸着剤８が加熱炉１からの高温度の排ガ
スによって再生され、圧力容器２からの酸素は吸着塔７
内における吸着剤９を通過することができる。When the adsorption capacity of the adsorbent 8 filled in the adsorption tower 5 decreases, the on-off valves Vl, V3. Close V6 and V8, and open/close valve V'2. V4. V5. Open V7. As a result, the adsorbent 8 in the adsorption tower 5 is regenerated by the high temperature exhaust gas from the heating furnace 1, and the oxygen from the pressure vessel 2 is transferred to the adsorption tower 5.
can pass through the adsorbent 9 in the interior.
第２図は、吸着剤８．９の吸着等圧線を示す。FIG. 2 shows the adsorption isobars for adsorbent 8.9.
吸着剤８，９は、温度の上昇に伴ってその吸着量がライ
ン１１に応じて低下していく。たとえば常温Ｔ１におい
て吸着剤８．９の吸着量をｓｌとするとき、それよりも
高い温度Ｔ２では、吸着量Ｓ１よりも小さい吸着量ｓ２
を有する。したがって加熱炉１からの高温度の排ガスを
用いて吸着剤によって吸着されている不純物を脱着除去
して再生することができる。ライン１１は、たとえば大
気圧時の特性を示している。The amount of adsorption of the adsorbents 8 and 9 decreases according to the line 11 as the temperature increases. For example, when the adsorption amount of the adsorbent 8.9 is sl at room temperature T1, at a higher temperature T2, the adsorption amount s2 is smaller than the adsorption amount S1.
has. Therefore, the impurities adsorbed by the adsorbent can be desorbed and removed using the high-temperature exhaust gas from the heating furnace 1 for regeneration. Line 11 shows the characteristics at atmospheric pressure, for example.
このようにして加熱炉１内に高純度の雰囲気ガスとして
の酸素ガスを供給することができ、これによって良質の
たとえばセラミクス系超電導物質を安定に焼結すること
ができる。また圧力容器２によって供給される酸素ガス
は、水分を含まないむやみに高純度の酸素ガスである必
要はなく、安価に酸素を得ることができる。In this way, oxygen gas can be supplied as a high-purity atmospheric gas into the heating furnace 1, thereby making it possible to stably sinter a high-quality ceramic superconducting material, for example. Further, the oxygen gas supplied by the pressure vessel 2 does not need to be an unnecessarily high-purity oxygen gas that does not contain moisture, and oxygen can be obtained at low cost.
吸着剤８．つとしてはたとえば、き成ゼオライ■・、シ
リカゲル、アルミナなとがある。Adsorbent 8. Examples include zeolite, silica gel, and alumina.
上述の実施例ては、加熱炉１からの高温度の排ガスを用
いて吸着剤の再生を行うことができるので、構成が簡単
てあり、省工本ルギー化を図ることができる。In the above-described embodiment, the adsorbent can be regenerated using the high-temperature exhaust gas from the heating furnace 1, so the structure is simple and it is possible to save labor costs.
本発明は、酸素ガスに関連して実施することがてきるだ
けてなく 、Ｎ２．８２． Ａ ｒ 、 Ｈｅおよびそ
の他のカスに関連しても実施することができる。The invention not only can be practiced in connection with oxygen gas, but also with N2.82. It can also be implemented in conjunction with Ar, He and other scum.
本発明によれば、ガスに含まれる不純物として、水分た
けてなく、この不純物（たとえばｏ２中のＣＯ２，Ｎ２
およびＣ１１４なと、Ｎ２．Ａｒ、Ｈｅ中）０２． Ｃ
Ｏ□、 Ｇ Ｏなと、ならびに、Ｈ２中（７Ｊ ＣＯ，
ＣＯ２，０２など）の除去のためにもまた実施すること
かできる。これらの場き、不純物としてのＣＯ２を除去
する場きを除いて、吸着塔５，７内に充填させる吸着剤
８，９は異なる。According to the present invention, as impurities contained in the gas, there is no water content, and these impurities (for example, CO2 in O2, N2
and C114, N2. (in Ar, He) 02. C
O□, G O nato, and H2 (7J CO,
It can also be carried out for the removal of CO2,02, etc.). In these cases, the adsorbents 8 and 9 filled in the adsorption towers 5 and 7 are different, except for the case where CO2 as an impurity is removed.
第３図は、本発明の他の実施例の全体の系統図である。FIG. 3 is an overall system diagram of another embodiment of the present invention.
この実施例は前述の実施例に類似し、対応する部分には
同一の参照符を付す。この実施例るために、吸着塔５．
７に充填される吸着剤８゜９として、モレキュラシーブ
およびＮｉなとの触媒が用いられる。触媒還元再生用水
素ガスＨ２は、管路２１から流量計２０および開閉弁Ｖ
ＩＯを介して供給される。その他の構成は、前述の実施
例に類似する。This embodiment is similar to the previous embodiment and corresponding parts are provided with the same reference numerals. To illustrate this example, an adsorption tower 5.
A molecular sieve and a catalyst such as Ni are used as the adsorbent 8.9 packed in the 7. The hydrogen gas H2 for catalytic reduction regeneration is passed from the pipe line 21 to the flow meter 20 and the on-off valve V.
Supplied via IO. The rest of the configuration is similar to the previous embodiment.
発明の効果
以上のように本発明によれば、吸着剤を用いて雰囲気ガ
ス中の不純物を吸着して除去することができるようにし
たので、加熱炉に導く雰囲気ガスの組成を希望するとお
りとすることができ、良好な環境で加熱を行うことがで
きる。Effects of the Invention As described above, according to the present invention, impurities in the atmospheric gas can be adsorbed and removed using an adsorbent, so that the composition of the atmospheric gas introduced into the heating furnace can be adjusted as desired. heating can be carried out in a favorable environment.
第１図は本発明の一実施例の全体の系統図、第２図は吸
着剤８．９の吸着等圧線を示すグラフ、第３図は本発明
の他の実施例の全体の系統図である。FIG. 1 is an overall system diagram of one embodiment of the present invention, FIG. 2 is a graph showing the adsorption isobars of adsorbent 8.9, and FIG. 3 is an entire system diagram of another embodiment of the present invention. .
Claims (2)
過させて前記不純物を吸着することを特徴とする加熱炉
用雰囲気ガスの製造装置。(1) An apparatus for producing an atmospheric gas for a heating furnace, characterized in that the atmospheric gas for a heating furnace containing impurities is passed through an adsorbent to adsorb the impurities.
生することを特徴とする特許請求の範囲第１項記載の加
熱炉用雰囲気ガスの製造装置。(2) The apparatus for producing atmospheric gas for a heating furnace according to claim 1, wherein the adsorbent is heated and regenerated by exhaust gas from the heating furnace.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63143149A JPH01310712A (en) | 1988-06-09 | 1988-06-09 | Producing equipment of atmospheric gas for heating oven |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63143149A JPH01310712A (en) | 1988-06-09 | 1988-06-09 | Producing equipment of atmospheric gas for heating oven |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01310712A true JPH01310712A (en) | 1989-12-14 |
Family
ID=15332066
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63143149A Pending JPH01310712A (en) | 1988-06-09 | 1988-06-09 | Producing equipment of atmospheric gas for heating oven |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01310712A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51103078A (en) * | 1975-03-08 | 1976-09-11 | Chugai Ro Kogyo Kaisha Ltd | FUNIKIGASUNOJOSHITSUHOHO |
| JPS60179134A (en) * | 1984-02-28 | 1985-09-13 | Union Showa Kk | Molecular sieve molded body |
| JPS6138384A (en) * | 1984-07-31 | 1986-02-24 | 宇野 煕 | Method of recovering argon gas for atmosphere |
| JPS6150634A (en) * | 1984-08-14 | 1986-03-12 | Ngk Insulators Ltd | Apparatus for preparing atmospheric gas |
-
1988
- 1988-06-09 JP JP63143149A patent/JPH01310712A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51103078A (en) * | 1975-03-08 | 1976-09-11 | Chugai Ro Kogyo Kaisha Ltd | FUNIKIGASUNOJOSHITSUHOHO |
| JPS60179134A (en) * | 1984-02-28 | 1985-09-13 | Union Showa Kk | Molecular sieve molded body |
| JPS6138384A (en) * | 1984-07-31 | 1986-02-24 | 宇野 煕 | Method of recovering argon gas for atmosphere |
| JPS6150634A (en) * | 1984-08-14 | 1986-03-12 | Ngk Insulators Ltd | Apparatus for preparing atmospheric gas |
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