JPH01307426A - Pressure-swinging adsorber - Google Patents
Pressure-swinging adsorberInfo
- Publication number
- JPH01307426A JPH01307426A JP63140142A JP14014288A JPH01307426A JP H01307426 A JPH01307426 A JP H01307426A JP 63140142 A JP63140142 A JP 63140142A JP 14014288 A JP14014288 A JP 14014288A JP H01307426 A JPH01307426 A JP H01307426A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorption
- towers
- adsorption towers
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001179 sorption measurement Methods 0.000 claims abstract description 46
- 238000003795 desorption Methods 0.000 claims description 14
- 238000004140 cleaning Methods 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 4
- 238000010926 purge Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 abstract 2
- 230000008595 infiltration Effects 0.000 abstract 1
- 238000001764 infiltration Methods 0.000 abstract 1
- 239000002912 waste gas Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 16
- 238000010586 diagram Methods 0.000 description 10
- 239000000047 product Substances 0.000 description 8
- 238000011084 recovery Methods 0.000 description 8
- 239000003463 adsorbent Substances 0.000 description 7
- 239000002699 waste material Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は高純度ガスの製造に利用される圧力スイング吸
着装置（以下単にＰＳＡ装置という）に関し、詳細には
製品ガスを高純度で吸着回収することのできるＰＳＡ装
置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a pressure swing adsorption device (hereinafter simply referred to as a PSA device) used in the production of high-purity gas, and more specifically, the present invention relates to a pressure swing adsorption device (hereinafter simply referred to as a PSA device) used in the production of high-purity gas. The present invention relates to a PSA device that can perform
以下にはその代表例として原料空気からＮ２ガスを高純
度に回収するＰＳＡ装置について説明するが、本発明装
置の適用対象はこれによって限定解釈されてはならない
。A PSA device for recovering N2 gas with high purity from feed air will be described below as a representative example, but this should not be construed as limiting the scope of application of the device of the present invention.
［従来の技術］
加圧空気をＰＳＡ装置に導入してＮ２ガスを濃縮回収す
る方法を大別すると、０２ガスを吸着剤に吸着して除去
する方法、及びＮ、ガスを吸着剤に吸着させ更に脱着さ
せて回収する方法の２つに分類される。このうち後者は
Ｎ２ガス吸着用合成ゼオライト系の吸着剤を使用し、Ｎ
、ガス吸着後の吸着塔を減圧することにより高純度のＮ
、ガスを脱着回収する方法であり、以下これに利用され
るＰＳＡ装置について説明する。[Prior art] Methods for concentrating and recovering N2 gas by introducing pressurized air into a PSA device can be roughly divided into two methods: a method in which 02 gas is removed by adsorption to an adsorbent, and a method in which N and gas are adsorbed to an adsorbent. It is further classified into two methods: desorption and recovery. The latter uses a synthetic zeolite-based adsorbent for N2 gas adsorption, and
, high purity N is produced by reducing the pressure in the adsorption tower after gas adsorption.
This is a method for desorbing and recovering gas, and the PSA device used for this will be explained below.
第２図は前処理塔２ａ、２ｂにおいてＮ２０とＣＯ２を
除去した後のＯｚ／Ｎｚ混合ガスを３塔式ＰＳＡ装置に
供給してＮ２ガスを選択的に回収する装置の概略説明図
である。FIG. 2 is a schematic explanatory diagram of an apparatus for selectively recovering N2 gas by supplying the Oz/Nz mixed gas from which N20 and CO2 have been removed in the pretreatment towers 2a and 2b to a three-column PSA apparatus.
圧縮機９によって加圧された空気は前処理塔２ａ、２ｂ
のいずれかに送給され、該塔内に収納された吸着剤にＮ
２０及びＣＯ２成分を吸着させ、ここを通過した０２／
Ｎ２混合ガスを３塔式ＰＳＡ装置の原料ガス供給管１ａ
へ送り込む、原料ガス供給管１ａは自動開閉弁（以下単
に弁という）Ｖ＋ＮＶｓを介して吸着塔３ａ、３ｂ、３
ｃに接続され、多塔の底部には弁ｖ４〜ｖ６を介して排
ガス廃棄管４ａが連結される。該排ガス廃棄管４ａは前
処理塔２ａ、２ｂに連結され、吸着塔３ａ、３ｂ、３ｃ
を通過した０２ガスを主成分とする排ガスは前処理塔内
に吸着されたＮ２０゜ＣＯ３の脱着用パージガスとして
利用される。また弁ｖ４〜ｖ６の介設点より上流側番吸
着塔３ａ、３ｂ、３ｃの底部には脱着用管５ａ。The air pressurized by the compressor 9 is sent to the pretreatment towers 2a and 2b.
The adsorbent stored in the tower is supplied with N
02/ which adsorbed 20 and CO2 components and passed through here.
N2 mixed gas is supplied to the raw material gas supply pipe 1a of the three-column PSA device.
The raw material gas supply pipe 1a is fed to the adsorption towers 3a, 3b, 3 via automatic on-off valves (hereinafter simply referred to as valves) V+NVs.
c, and an exhaust gas waste pipe 4a is connected to the bottom of the multi-column via valves v4 to v6. The exhaust gas waste pipe 4a is connected to pretreatment towers 2a, 2b, and adsorption towers 3a, 3b, 3c.
The exhaust gas mainly composed of 02 gas that has passed through is used as a purge gas for desorption of N20°CO3 adsorbed in the pretreatment tower. Further, a desorption pipe 5a is provided at the bottom of each adsorption tower 3a, 3b, 3c on the upstream side from the intervening point of the valves v4 to v6.
５ｂ、５ｃが配設され、夫々弁Ｖ、〜ｖ９を介してそれ
より下流側で合流される０合流された脱着用管５には真
空ポンプ６が設けられて製品ガスホルダ２０に連結され
、脱着回収された高純度Ｎ。5b and 5c are disposed, and are merged on the downstream side via valves V, to v9, respectively.A vacuum pump 6 is provided in the merged desorption pipe 5, which is connected to the product gas holder 20, and is connected to the product gas holder 20, and is connected to the product gas holder 20 to Recovered high purity N.
ガスを貯留する。製品ガスホルダ２０には、洗浄用管８
が配設され、該洗浄用管８は分岐された抜弁ｖ１３〜ｖ
ｌｓを介して吸着塔３ａ、３ｂ、３ｃの各頂部に連結さ
れる。また吸着塔３ａ、３ｂ。Store gas. The product gas holder 20 has a cleaning pipe 8
are arranged, and the cleaning pipe 8 has branched vent valves v13 to v.
It is connected to the tops of adsorption towers 3a, 3b, and 3c via ls. Also, adsorption towers 3a and 3b.
３ｃは連結配管１０ａ、１０ｂ、１０ｃによって夫々直
列的に連結され、各々に弁ＶＩＯ〜ＶＩ２が設けられる
。3c are connected in series by connecting pipes 10a, 10b, and 10c, and each is provided with valves VIO to VI2.
第３図は、吸着塔３ａ、３ｂ、３ｃの作動工程を示すタ
イムスケジェール（時間は左から右方向に進む）の例で
あり、吸着工程開始時から脱着工程終了時までの作動工
程を１工程サイクルとしている。この１工程サイクルは
図示の如く吸着工程、回収工程、洗浄工程及び脱着工程
より構成される。まず吸着工程では脱着された吸着塔内
を加圧すると共に、０２／Ｎ２混合ガスを供給管１ａか
ら加圧供給し、回収目的成分のＮ２ガスを吸着剤に吸着
させ不純成分ガス（主に０２ガス）を排ガス廃棄管４ａ
を介して放出させる。又脱着工程では吸着塔を真空ポン
プ６によって減圧し、吸着塔内の吸着剤に吸着されたＮ
２を脱着し、脱着用管５を通して製品ガスホルダ２０に
回収貯留する。次に回収工程及び洗浄工程を、吸着塔３
ａの場合を例に挙げて説明すると第５図（ａ）及び（ｂ
）によって示される。即ち第５図（ａ）の状態において
は、製品ガスホルダ２０側から供給される高純度Ｎ２ガ
スは洗浄用管８を通って吸着塔３Ｃ内の残留０２を追放
し、吸着工程の終了した吸着塔３ａへ連結配管１０ｃを
介して送り込まれる。このとき吸着塔３ａでは回収工程
が行なわれ、吸着塔３Ｃでは洗浄工程が行なわれる。ま
た第５図（ｂ）の状態では、吸着塔３ａは洗浄工程を行
ない、吸着塔３ｂは回収工程を行なっている状態を示す
。Figure 3 is an example of a time schedule (time progresses from left to right) showing the operating steps of the adsorption towers 3a, 3b, and 3c. It is a cycle. As shown in the figure, this one-step cycle consists of an adsorption step, a recovery step, a washing step, and a desorption step. First, in the adsorption step, the interior of the desorbed adsorption tower is pressurized, and the 02/N2 mixed gas is supplied under pressure from the supply pipe 1a, so that the target N2 gas to be recovered is adsorbed onto the adsorbent and the impure component gas (mainly the 02 gas ) to exhaust gas waste pipe 4a
released through. In addition, in the desorption process, the adsorption tower is depressurized by the vacuum pump 6, and the N adsorbed by the adsorbent in the adsorption tower is removed.
2 is removed, and collected and stored in the product gas holder 20 through the removal and removal tube 5. Next, a recovery step and a washing step are performed in the adsorption tower 3.
To explain case a as an example, Fig. 5 (a) and (b)
). That is, in the state shown in FIG. 5(a), the high-purity N2 gas supplied from the product gas holder 20 passes through the cleaning pipe 8 to expel the residual 02 in the adsorption tower 3C, and the adsorption tower after the adsorption process is removed. 3a via the connecting pipe 10c. At this time, a recovery process is performed in the adsorption tower 3a, and a cleaning process is performed in the adsorption tower 3C. Further, in the state shown in FIG. 5(b), the adsorption tower 3a is performing a cleaning process, and the adsorption tower 3b is performing a recovery process.
［発明が解決しようとする課題］
上記のＰＳＡ装置は小規模の産業分野でも自家生産型で
利用できる様にするため小型化が進められつつあり、吸
着塔等を小型化すると共に、自動開閉弁も小型で安価な
真空用電磁弁が用いられる様になってきた。[Problem to be solved by the invention] The above-mentioned PSA equipment is being miniaturized so that it can be used in home production even in small-scale industrial fields. However, small and inexpensive vacuum solenoid valves have come into use.
第６図は真空用電磁弁の一例を示す断面説明図であり、
電磁コイル２１の励起によって摺動するプランジャ２３
の先端に弁体２４を設け、弁座２７に対して当接・離反
できる様に構成されている。第４図は上記構成の真空用
電磁弁２．．２２を連結配管１０ａ、１０ｂに設けたＰ
ＳＡ装置による吸着塔３ｂの脱着工程時の状態を示す説
明図である。このとき吸着塔３ｂ内は真空ポンプ６によ
って１００ Ｔｏｒｒ程度まで減圧され、この減圧域は
上記の真空用電磁弁２．．２．により遮断されている。FIG. 6 is a cross-sectional explanatory diagram showing an example of a vacuum solenoid valve,
A plunger 23 that slides due to the excitation of the electromagnetic coil 21
A valve body 24 is provided at the tip of the valve body 24, and is configured to be able to come into contact with and separate from a valve seat 27. FIG. 4 shows the vacuum solenoid valve 2 with the above configuration. ．． P 22 provided in the connecting pipes 10a and 10b
FIG. 3 is an explanatory diagram showing the state of the adsorption tower 3b during the desorption process using the SA device. At this time, the pressure inside the adsorption tower 3b is reduced to about 100 Torr by the vacuum pump 6, and this reduced pressure area is controlled by the vacuum solenoid valve 2. ．． 2. It is blocked by.
ところが上記の真空用電磁弁２１．２２は第６図に示す
白抜き矢印Ｆ、→Ｆ２方向のガス流に対しては有効な遮
断性能を発揮するが、破線矢印りに示す様な逆方向のガ
ス流れに対しては、弁体２４がスプリング２２の反発力
によって押え付けられているだけなので、弁座２７から
押し戻されてガスリークを生じ易い、即ち第４図に示す
例においては矢印Ｐ方向にリークを生じ易く吸着塔３Ｃ
中の０２ ／ Ｎ ２ガスが脱着ガス中に混入し、回収
製品ガスの純度低下を引き起こす。However, although the above-mentioned vacuum solenoid valves 21 and 22 exhibit effective blocking performance against gas flows in the directions of the white arrows F and →F2 shown in Fig. 6, they do not work effectively against gas flows in the directions shown by the dashed arrows. With respect to the gas flow, since the valve body 24 is only held down by the repulsive force of the spring 22, it is likely to be pushed back from the valve seat 27 and cause a gas leak. In other words, in the example shown in FIG. Adsorption tower 3C tends to cause leaks
The 02/N2 gas inside will mix into the desorption gas, causing a decrease in the purity of the recovered product gas.
そこで本発明者らは小型で安価な真空用電磁弁を使用す
るＰＳＡ装置であっても、高純度の製品ガスを回収でき
るようにする目的で種々研究を重ね、本発明を完成した
。Therefore, the present inventors conducted various studies and completed the present invention with the aim of making it possible to recover highly purified product gas even with a PSA device that uses a small and inexpensive vacuum electromagnetic valve.
［課題を解決するための手段］
上記の目的を達成し得た本発明ＰＳＡ装置は、１対の真
空用電磁弁を、互いに入口側が背中合わせどなる様に、
前記連結配管の両端部近傍に直列配設する点を要旨とす
るものである。[Means for Solving the Problems] The PSA device of the present invention which has achieved the above object has a pair of vacuum solenoid valves arranged so that their inlet sides are back to back to each other.
The gist is that the connecting pipes are arranged in series near both ends.
［作用及び実施例］
第１図は本発明の代表的な実施例を示す概略説明図であ
り、各連結配管１０ａ、１０ｂ、１０ｃには夫々２つの
真空用電磁弁Ｘ＋””Ｘｓ及びＹ、〜Ｙ、が配設される
。上記の真空用電磁弁Ｙ１〜Ｙ、は吸着塔３ａ、３ｂ、
３ｃの底部側へできるだけ接近して設けられ、該弁Ｙ１
〜Ｙ３の出口部２６（第６図）を吸着塔３ａ、３ｂ、３
ｃの底部に向けて配設される。一方弁Ｘ、〜Ｘ、は上記
の弁Ｙ１〜Ｙ３とは逆向きに配設される。即ち連結配管
１０ａにおいて真空用電磁弁ｘＩとＹｌは人口部２５を
互いに背中合わせとなる様に設けられ、その開閉作動は
同一タイミングで同一の開閉制御がなされる。従って吸
着塔３ａの脱着工程時に電磁弁Ｘ、において矢印り方向
のガスリーク（第６図参照）が生じても吸着塔３ａ側の
電磁弁Ｙ１においてこのガス流が完全に遮断され、吸着
塔３ａの脱着工程中に吸着塔３ｂ、３ｃ内の０２混入ガ
スが混り込むことは全くなくなる。[Operations and Embodiments] FIG. 1 is a schematic explanatory diagram showing a typical embodiment of the present invention, in which two vacuum solenoid valves X+""Xs and Y, ~Y, are arranged. The vacuum solenoid valves Y1 to Y above are the adsorption towers 3a, 3b,
3c as close as possible to the bottom side of the valve Y1.
~Y3 outlet section 26 (Fig. 6) is connected to adsorption towers 3a, 3b, 3
It is placed toward the bottom of c. One-way valves X, -X, are disposed in the opposite direction to the above-mentioned valves Y1-Y3. That is, in the connecting pipe 10a, the vacuum electromagnetic valves xI and Yl are provided so that the artificial part 25 is placed back to back with respect to the other, and their opening and closing operations are controlled in the same manner at the same timing. Therefore, even if gas leaks in the direction of the arrow (see Fig. 6) from the solenoid valve X during the desorption process of the adsorption tower 3a, this gas flow is completely blocked by the solenoid valve Y1 on the adsorption tower 3a side. During the desorption process, the 02 gas in the adsorption towers 3b and 3c will not be mixed in at all.
（実験例）
第１図及び第２図に示す構成の小型ＰＳＡ装置において
、原料空気供給量を３２０ＯＮｌｂとして５．５ｋｇ／
ｃｍ２Ｇで供給し、８０ＯＮｊ２／ｈのＮ、ガスを回収
する実験を下記のＰＳＡ装置によって行なった。(Experiment example) In a small PSA device configured as shown in Figs.
An experiment in which N and gas were supplied at cm2G and recovered at 80 ONj2/h was conducted using the following PSA apparatus.
吸着塔内径：８０＋ａｍ
吸着塔高さ：１０００ｍｍ
吸着剤 二合成ゼオライト１３Ｘ型（改良型）
脱着圧力 ： １００Ｔｏｒｒ
この結果従来のＰＳＡ装置（第２図に示す）においては
、回収Ｎ２ガスの純度は９９．９％が限界であったが、
本発明のＰＳＡ装置においては、９９．９９７％の高純
度を達成した。Adsorption tower inner diameter: 80+am Adsorption tower height: 1000mm Adsorbent Bisynthetic zeolite 13X type (improved type) Desorption pressure: 100Torr As a result, in the conventional PSA device (shown in Figure 2), the purity of recovered N2 gas is 99. 9% was the limit, but
In the PSA device of the present invention, a high purity of 99.997% was achieved.
上記の様に２つの真空用電磁弁を直列して配設する箇所
は上記の実施例に限らず、排ガス廃棄管４ａに設けられ
る自動開閉弁ｖ４〜ｖ６その他の自動開閉弁配設箇所に
適用しても良い、また回収ガス分離用のＰＳＡ装置のみ
に限らず、その前段に設けられる前処理装置において適
用しても構わない。さらに上記のＮ２ガス回収の例に限
らず、０２ガス回収やＨ２ガスの精製等のＰＳＡ装置に
も適用できる。The location where two vacuum solenoid valves are arranged in series as described above is not limited to the above embodiment, but is applicable to other automatic on-off valves v4 to v6 installed in the exhaust gas waste pipe 4a. Furthermore, the present invention may be applied not only to a PSA device for separating recovered gas, but also to a pre-processing device provided upstream of the PSA device. Furthermore, the invention is not limited to the above example of N2 gas recovery, but can also be applied to PSA devices for O2 gas recovery, H2 gas purification, and the like.
［発明の効果］
本発明により、小型の真空用電磁弁を適用するＰＳＡ装
置においても、製品ガスを高純度で回収できる様になっ
た。[Effects of the Invention] According to the present invention, product gas can now be recovered with high purity even in a PSA device that uses a small vacuum solenoid valve.
第１図は本発明の代表的な実施例を示す概略説明図、第
２図は従来例を示す概略説明図、第３図は工程説明図、
第４図は吸着塔３ｂの脱着工程状態を示す説明図、第５
図（ａ） 、 （ｂ）は洗浄工程及び回収工程を示すた
めの説明図、第６図は真空用電磁弁の例を示す断面説明
図である。
１ａ・・・原料ガス供給管 ２ａ、２ｂ・・・前ＩＡ理
塔３ａ、３ｂ、３ｃ・・・吸着塔 ４ａ・・・排ガス
廃棄管５・・・脱着用管 ６・・・真空ポンプ８
・・・洗浄用管 ９・・・圧縮機ｌｅａ、ｌＯｂ
、１０ｃ ・−・連結配管２０・・・ケーシング
２１・・・コイル２ｚ・・・スプリング ２３−・
・プランジャ２４・・・弁体 ２５・・・入
口部２６・・・出口部 ２７・・・弁座第３図
第４図Fig. 1 is a schematic explanatory diagram showing a typical embodiment of the present invention, Fig. 2 is a schematic explanatory diagram showing a conventional example, Fig. 3 is a process explanatory diagram,
FIG. 4 is an explanatory diagram showing the desorption process state of the adsorption tower 3b;
Figures (a) and (b) are explanatory diagrams showing the cleaning process and the recovery process, and Fig. 6 is a cross-sectional explanatory diagram showing an example of a vacuum electromagnetic valve. 1a... Raw material gas supply pipe 2a, 2b... Pre-IA control tower 3a, 3b, 3c... Adsorption tower 4a... Exhaust gas waste pipe 5... Desorption pipe 6... Vacuum pump 8
...Cleaning pipe 9...Compressor lea, lOb
, 10c...Connecting pipe 20...Casing
21...Coil 2z...Spring 23-...
・Plunger 24... Valve body 25... Inlet section 26... Outlet section 27... Valve seat Fig. 3 Fig. 4
Claims (1)
用管を接続すると共に、２つの吸着塔同士を連結配管に
よって直列接続する様に構成してなる圧力スイング吸着
装置において、１対の真空用電磁弁を、互いに入口側が
背中合わせとなる様に、前記連結配管の両端部近傍に直
列配設されてなることを特徴とする圧力スイング吸着装
置。In a pressure swing adsorption apparatus configured such that a raw material gas supply pipe, a desorption pipe, and a cleaning pipe are connected to each of a plurality of adsorption towers, and two adsorption towers are connected in series by a connecting pipe, a pair of adsorption towers is used. A pressure swing adsorption device characterized in that vacuum electromagnetic valves are arranged in series near both ends of the connecting pipe so that the inlets are back to back.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63140142A JPH01307426A (en) | 1988-06-06 | 1988-06-06 | Pressure-swinging adsorber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63140142A JPH01307426A (en) | 1988-06-06 | 1988-06-06 | Pressure-swinging adsorber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01307426A true JPH01307426A (en) | 1989-12-12 |
| JPH0331487B2 JPH0331487B2 (en) | 1991-05-07 |
Family
ID=15261851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63140142A Granted JPH01307426A (en) | 1988-06-06 | 1988-06-06 | Pressure-swinging adsorber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01307426A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019141759A (en) * | 2018-02-16 | 2019-08-29 | 大陽日酸株式会社 | Gas refining apparatus, gas refining method, propene producing apparatus and propane producing apparatus |
| JP2019177314A (en) * | 2018-03-30 | 2019-10-17 | 大陽日酸株式会社 | Gas refining apparatus and gas refining method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607920A (en) * | 1983-06-29 | 1985-01-16 | Hitachi Ltd | Separation of mixed gas and its apparatus |
-
1988
- 1988-06-06 JP JP63140142A patent/JPH01307426A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607920A (en) * | 1983-06-29 | 1985-01-16 | Hitachi Ltd | Separation of mixed gas and its apparatus |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019141759A (en) * | 2018-02-16 | 2019-08-29 | 大陽日酸株式会社 | Gas refining apparatus, gas refining method, propene producing apparatus and propane producing apparatus |
| US11471819B2 (en) | 2018-02-16 | 2022-10-18 | Taiyo Nippon Sanso Corporation | Gas refining apparatus, gas refining method, propene manufacturing apparatus, and propane manufacturing apparatus |
| JP2019177314A (en) * | 2018-03-30 | 2019-10-17 | 大陽日酸株式会社 | Gas refining apparatus and gas refining method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0331487B2 (en) | 1991-05-07 |
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