JPH01291989A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH01291989A JPH01291989A JP63123622A JP12362288A JPH01291989A JP H01291989 A JPH01291989 A JP H01291989A JP 63123622 A JP63123622 A JP 63123622A JP 12362288 A JP12362288 A JP 12362288A JP H01291989 A JPH01291989 A JP H01291989A
- Authority
- JP
- Japan
- Prior art keywords
- substituted
- group
- unsubstituted
- membered ring
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 34
- -1 trivinyl methane compound Chemical class 0.000 claims abstract description 60
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 9
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 8
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 7
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 7
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 6
- 125000005843 halogen group Chemical group 0.000 claims abstract description 3
- 125000000304 alkynyl group Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 30
- 239000010409 thin film Substances 0.000 abstract description 25
- 239000000758 substrate Substances 0.000 abstract description 16
- 238000000576 coating method Methods 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 14
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000010521 absorption reaction Methods 0.000 abstract description 6
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000003960 organic solvent Substances 0.000 abstract description 4
- 125000001424 substituent group Chemical group 0.000 abstract description 3
- 230000006866 deterioration Effects 0.000 abstract description 2
- 125000006193 alkinyl group Chemical group 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000011241 protective layer Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 6
- 239000005977 Ethylene Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000010355 oscillation Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 4
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 description 4
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 150000002484 inorganic compounds Chemical class 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 125000003386 piperidinyl group Chemical group 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- MWAFWBDWAWZJGK-UHFFFAOYSA-N 3,3-diphenylprop-2-enal Chemical compound C=1C=CC=CC=1C(=CC=O)C1=CC=CC=C1 MWAFWBDWAWZJGK-UHFFFAOYSA-N 0.000 description 2
- HEKRPWJODWSOQV-UHFFFAOYSA-N 3-ethenylpenta-1,4-diene Chemical compound C=CC(C=C)C=C HEKRPWJODWSOQV-UHFFFAOYSA-N 0.000 description 2
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 2
- 101150030723 RIR2 gene Proteins 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000013112 stability test Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical class [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- MVHNJOOFKDQTNG-UHFFFAOYSA-N 1,5-bis[4-(dimethylamino)phenyl]penta-1,4-dien-3-ol Chemical compound C1=CC(N(C)C)=CC=C1C=CC(O)C=CC1=CC=C(N(C)C)C=C1 MVHNJOOFKDQTNG-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- VEXPSCVURVNTMX-UHFFFAOYSA-N 3,3-bis(4-pyrrolidin-1-ylphenyl)prop-2-enal Chemical compound C=1C=C(N2CCCC2)C=CC=1C(=CC=O)C(C=C1)=CC=C1N1CCCC1 VEXPSCVURVNTMX-UHFFFAOYSA-N 0.000 description 1
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 description 1
- LBSXSAXOLABXMF-UHFFFAOYSA-N 4-Vinylaniline Chemical compound NC1=CC=C(C=C)C=C1 LBSXSAXOLABXMF-UHFFFAOYSA-N 0.000 description 1
- HBWITNNIJDLPLS-UHFFFAOYSA-N 4-[1-[4-(dimethylamino)phenyl]ethenyl]-n,n-dimethylaniline Chemical group C1=CC(N(C)C)=CC=C1C(=C)C1=CC=C(N(C)C)C=C1 HBWITNNIJDLPLS-UHFFFAOYSA-N 0.000 description 1
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical class O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical group [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-L Oxalate Chemical compound [O-]C(=O)C([O-])=O MUBZPKHOEPUJKR-UHFFFAOYSA-L 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- 229910003069 TeO2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229940006460 bromide ion Drugs 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- UOCJDOLVGGIYIQ-PBFPGSCMSA-N cefatrizine Chemical group S([C@@H]1[C@@H](C(N1C=1C(O)=O)=O)NC(=O)[C@H](N)C=2C=CC(O)=CC=2)CC=1CSC=1C=NNN=1 UOCJDOLVGGIYIQ-PBFPGSCMSA-N 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910001914 chlorine tetroxide Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229940117916 cinnamic aldehyde Drugs 0.000 description 1
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-M dihydrogenphosphate Chemical compound OP(O)([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-M 0.000 description 1
- PPSZHCXTGRHULJ-UHFFFAOYSA-N dioxazine Chemical compound O1ON=CC=C1 PPSZHCXTGRHULJ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005980 hexynyl group Chemical group 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- QTWZICCBKBYHDM-UHFFFAOYSA-N leucomethylene blue Chemical compound C1=C(N(C)C)C=C2SC3=CC(N(C)C)=CC=C3NC2=C1 QTWZICCBKBYHDM-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 238000007760 metering rod coating Methods 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- FATBGEAMYMYZAF-KTKRTIGZSA-N oleamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(N)=O FATBGEAMYMYZAF-KTKRTIGZSA-N 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- 229940113162 oleylamide Drugs 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000001782 photodegradation Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000004853 tetrahydropyridinyl group Chemical group N1(CCCC=C1)* 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 125000001814 trioxo-lambda(7)-chloranyloxy group Chemical group *OCl(=O)(=O)=O 0.000 description 1
- 150000004961 triphenylmethanes Chemical class 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はレーザー特に半導体レーザーによる書込み、再
生に適した光学記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical recording medium suitable for writing and reproducing using a laser, particularly a semiconductor laser.
一般に光学記録媒体例えば光ディスクや光カードはらせ
ん状1円形状、直線状のトラックを有する基板の上に設
けられた薄い記録層に光学的に検出可能な小さな例えば
1μm程度のピットを形成することにより高密度に情報
を記録することができる。In general, optical recording media such as optical disks and optical cards are produced by forming optically detectable small pits, for example, about 1 μm, in a thin recording layer provided on a substrate having a spiral, circular, or linear track. Information can be recorded with high density.
この記録層の表面に集束したレーザー光を走査すると記
録層にはレーザーエネルギーを吸収して光学的に検出可
能なピットが形成され情報が書込まれる。When the surface of this recording layer is scanned with a focused laser beam, the recording layer absorbs the laser energy to form optically detectable pits, thereby writing information.
例えばヒートモード記録方式では、記録層は熱エネルギ
ーを吸収しその個所に蒸発又は融解により小さな四部か
らなるピットを形成できる。又、別のヒートモード記録
方式では、照射されたレーザーエネルギーの吸収により
その個所に光学的に検出可能な濃度差を有するピットを
形成できる。For example, in the heat mode recording method, the recording layer absorbs thermal energy and forms small four-part pits at the locations by evaporation or melting. In another heat mode recording method, a pit having an optically detectable density difference can be formed at that location by absorbing the irradiated laser energy.
このようにして光学記録媒体に記録された情報はレーザ
光をトラックに沿って走査し、ピットが形成された部分
とピットが形成されていない部分の光学的変化を読み取
ることによって検出される。The information recorded on the optical recording medium in this manner is detected by scanning a laser beam along a track and reading optical changes in areas where pits are formed and areas where pits are not formed.
例えば、光ディスクの場合、レーザ光がトラックに沿っ
て走査され、ディスクより反射された光エネルギーがフ
ォトディテクターによってモニターされる。ピットが形
成されていない部分は、レーザ光が充分に反射されフォ
トディテクターの出力は大きくなる。一方、ピットが形
成されている部分は、反射が低(なりフォトディテクタ
ーの出力は小さ(なる。For example, in the case of an optical disc, a laser beam is scanned along a track, and the optical energy reflected from the disc is monitored by a photodetector. In the portion where no pit is formed, the laser beam is sufficiently reflected and the output of the photodetector becomes large. On the other hand, in areas where pits are formed, the reflection is low (and the output of the photodetector is small).
この様な光学記録媒体の記録層として従来アルミニウム
や金の薄膜、ビスマス薄膜、酸化テルル薄膜やカルコゲ
ナイド系非晶質ガラス膜など無機化合物を主に用いたも
のが提案されている。しかし、これらの薄膜は、保存性
が悪い、分解能が低い、記録密度が低い等の欠点を有し
、更に蒸着等によって薄膜を形成するためコスト高にな
るという問題点を有する。Conventionally, it has been proposed that the recording layer of such an optical recording medium mainly uses an inorganic compound such as a thin film of aluminum or gold, a thin film of bismuth, a thin film of tellurium oxide, or a chalcogenide-based amorphous glass film. However, these thin films have drawbacks such as poor storage stability, low resolution, and low recording density, and also have the problem of high cost because the thin films are formed by vapor deposition or the like.
又、最近になって比較的長波長の光で物性変化し得る有
機色素薄膜を記録層に用いることが提案されている。有
機色素薄膜は上記無機化合物の欠点を除去するものであ
るが、一般に長波長側に吸収特性を持つ有機色素は反射
率が低く、熱及び光に対する安定性が低いなどの問題点
がある。Furthermore, recently it has been proposed to use a thin film of organic dye whose physical properties can be changed by light having a relatively long wavelength in the recording layer. Organic dye thin films are intended to eliminate the drawbacks of the above-mentioned inorganic compounds, but organic dyes that generally have absorption characteristics on the long wavelength side have problems such as low reflectance and low stability against heat and light.
〔発明が解決しようとしている問題点〕本発明は近赤外
波長領域に大きな吸収を有し、薄膜状態で反射率の高い
新規有機化合物を用いた光学記録媒体を提供することを
目的とするものである。[Problems to be solved by the invention] An object of the present invention is to provide an optical recording medium using a novel organic compound that has large absorption in the near-infrared wavelength region and has a high reflectance in a thin film state. It is.
又、本発明は光劣化、再生光劣化の少ない保存安定性に
優れた新規有機化合物を用いた光学記録媒体を提供する
ことを他の目的とするものである。Another object of the present invention is to provide an optical recording medium using a novel organic compound that exhibits less photodegradation and reproduction photodeterioration and has excellent storage stability.
本発明の光学記録媒体は一般式[1]で表わされるトリ
ビニルメタン系化合物を含有する記録層を有することを
特徴とするものである。The optical recording medium of the present invention is characterized by having a recording layer containing a trivinylmethane compound represented by the general formula [1].
/\
6R6
(式中R8〜R6は水素原子または炭素数1〜8までの
置換基であり、R1とR2,R3とR4+ R6とR6
の組合せで少(とも1組がNとともに置換もしくは未置
換の5員環、置換もしくは未置換の6員環、置換もしく
は未置換の7員環を形成する。/\6R6 (In the formula, R8 to R6 are hydrogen atoms or substituents having 1 to 8 carbon atoms, R1 and R2, R3 and R4+ R6 and R6
A combination of (one set together with N) forms a substituted or unsubstituted 5-membered ring, a substituted or unsubstituted 6-membered ring, or a substituted or unsubstituted 7-membered ring.
B1+ B2はそれぞれハロゲン原子、又は炭素数1〜
8までの置換もしくは未置換のアルキル基、又は置換も
しくは未置換のシクロアルキル基又は置換もしくは未置
換のアルケニル基又は置換もしくは未置換のアラルキル
基又はアルキニル基かもしここで、R7,R8,R8は
各々水素原子又は炭素数1〜8までの置換もしくは未置
換のアルキル基又は置換もしくは未置換の5〜6員環の
シクロアルキル基又は置換もしくは未置換のアルケニル
基又は置換もしくは未置換のアラルキル基又はアルキニ
ル基を示し、又はR7とR8でNとともに置換もしくは
未置換の5員環、置換もしくは未置換の6員環、置換も
しくは未置換の7員環を形成する。B1+ B2 are each a halogen atom or a carbon number of 1 to
up to 8 substituted or unsubstituted alkyl groups, or substituted or unsubstituted cycloalkyl groups, or substituted or unsubstituted alkenyl groups, or substituted or unsubstituted aralkyl groups or alkynyl groups, where R7, R8, R8 are each A hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 8 carbon atoms, a substituted or unsubstituted 5- to 6-membered cycloalkyl group, a substituted or unsubstituted alkenyl group, or a substituted or unsubstituted aralkyl group or alkynyl represents a group, or R7 and R8 together with N form a substituted or unsubstituted 5-membered ring, a substituted or unsubstituted 6-membered ring, or a substituted or unsubstituted 7-membered ring.
nは1または2である。)
R1−R6の置換基としては水素原子又は炭素数1から
8の置換もしくは未置換のアルキル基、又は置換もしく
は未置換の5〜6員環のシクロアルキル基、又は置換も
しくは未置換のアルケニル基又は置換もしくは未置換の
アラルキル基又はアルキニル基であり、R1とR2+
R3とR4+R5とR6の組合せで少な(とも−組がN
とともに置換もしくは未置換の5員環、置換もしくは未
置換の6員環、置換もしくは未置換の7員環を形成する
。この置換もしくは未置換の5員環としては例えばピロ
リジン環など置換もしくは未置換の6員環としてはピペ
リジン環、モルホリン環、テトラヒドロピリジン環など
、置換もしくは未置換の7員環としてはシクロチル基、
エチル基、n−プロピル基、1so−プロピル基、n−
ブチル基、 5ec−ブチル基、 iso −ブチル
基、t−ブチル基、n−アミル基、t−アミル基、n−
ヘキシル基、n−オクチル基、t−オクチル基などが挙
げられ、更に他のアルキル基、例えば置換アルキル基と
しては2−ヒドロキシエチル基、3−ヒドロキシプロピ
ル基、4−ヒドロキシブチル基、2−アセトキシエチル
基、カルボキシメチル基、2−カルボキシエチル基、3
−カルボキシプロピル基、メトキシエチル基、エトキシ
エチル基。n is 1 or 2. ) As a substituent for R1-R6, a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 8 carbon atoms, a substituted or unsubstituted 5- to 6-membered cycloalkyl group, or a substituted or unsubstituted alkenyl group or a substituted or unsubstituted aralkyl group or alkynyl group, and R1 and R2+
The combination of R3 and R4 + R5 and R6 is small (both - group is N
Together, they form a substituted or unsubstituted 5-membered ring, a substituted or unsubstituted 6-membered ring, or a substituted or unsubstituted 7-membered ring. Examples of the substituted or unsubstituted 5-membered ring include a pyrrolidine ring; examples of the substituted or unsubstituted 6-membered ring include a piperidine ring, morpholine ring, and tetrahydropyridine ring; and examples of the substituted or unsubstituted 7-membered ring include a cyclotyl group,
Ethyl group, n-propyl group, 1so-propyl group, n-
Butyl group, 5ec-butyl group, iso-butyl group, t-butyl group, n-amyl group, t-amyl group, n-
Examples include hexyl group, n-octyl group, t-octyl group, and other alkyl groups, such as substituted alkyl groups, such as 2-hydroxyethyl group, 3-hydroxypropyl group, 4-hydroxybutyl group, and 2-acetoxy group. Ethyl group, carboxymethyl group, 2-carboxyethyl group, 3
-Carboxypropyl group, methoxyethyl group, ethoxyethyl group.
メトキシプロピル基などが挙げられる。シクロアルキル
基としてはシクロヘキシル基、シクロペンテニル基、2
.6−シメチルシクロヘキシル基など、例えばビニル基
、プロペニル基、ブテニル基、ペンテニル基、ヘキセニ
ル基、ヘプテニル基、オクテニル基など、アラルキル基
としては例えばベンジル基、p−クロロベンジル基、p
−メチルベンジル基、2−フェニルメチル基、2−フェ
ニルプロピル基、3−フェニルプロピル基、α−ナフチ
ルメチル基、β−ナフチルエチル基など、アルキニル基
としては例えばプロパギル基、ブチニル基。Examples include methoxypropyl group. Cycloalkyl groups include cyclohexyl group, cyclopentenyl group, 2
.. 6-dimethylcyclohexyl group, etc., such as vinyl group, propenyl group, butenyl group, pentenyl group, hexenyl group, heptenyl group, octenyl group, etc.; aralkyl group, such as benzyl group, p-chlorobenzyl group, p-chlorobenzyl group, etc.
-Methylbenzyl group, 2-phenylmethyl group, 2-phenylpropyl group, 3-phenylpropyl group, α-naphthylmethyl group, β-naphthylethyl group, etc.; examples of the alkynyl group include propargyl group and butynyl group;
ペンチニル基、ヘキシニル基などアラルキル基としては
例えばベンジル基、p−クロロベンジル基。Aralkyl groups such as pentynyl group and hexynyl group include, for example, benzyl group and p-chlorobenzyl group.
p−メチルベンジル基、2−フェニルメチル基。p-methylbenzyl group, 2-phenylmethyl group.
2−フェニルプロピル基、3−フェニルプロピル基。2-phenylpropyl group, 3-phenylpropyl group.
α−ナフチルメチル基、β−ナフチルエチル基などが挙
げられる。Examples include α-naphthylmethyl group and β-naphthylethyl group.
XQは、塩化物イオン、臭化物イオン、ヨウ化物イオン
、過塩素酸塩イオン、硝酸塩イオン、ベンゼンスルホン
酸塩イオン、p−トルエンスルホン酸塩イオン、メチル
硫酸塩イオン、エチル硫酸塩イオン、プロピル硫酸塩イ
オン、テトラフルオロホウ酸塩イオン、テトラフェニル
ホウ酸塩イオン。XQ is chloride ion, bromide ion, iodide ion, perchlorate ion, nitrate ion, benzenesulfonate ion, p-toluenesulfonate ion, methylsulfate ion, ethylsulfate ion, propylsulfate ion, tetrafluoroborate ion, tetraphenylborate ion.
ヘキサフルオリン酸塩イオン、ベンゼンスルフィン酸塩
イオン、酢酸塩イオン、トリフルオロ酢酸塩イオン、プ
ロピオン酢酸塩イオン、安息香酸塩イオン、シュウ酸塩
イオン、コハク酸塩イオン。Hexafluorophosphate ion, benzenesulfinate ion, acetate ion, trifluoroacetate ion, propionacetate ion, benzoate ion, oxalate ion, succinate ion.
マロン酸塩イオン、オレイン酸塩イオン、ステアリン酸
塩イオン、クエン酸塩イオン、−水素二リン酸塩イオン
、二水素−リン酸塩イオン、ペンタクロロスズ酸塩イオ
ン、クロロスルホン酸塩イオン、フルオロスルホン酸塩
イオン、トリフルオロメタンスルホン酸塩イオン、ヘキ
サフルオロヒ酸塩イオン、ヘキサフルオロアンチモン酸
塩イオン。malonate ion, oleate ion, stearate ion, citrate ion, -hydrogen diphosphate ion, dihydrogen-phosphate ion, pentachlorostannate ion, chlorosulfonate ion, fluorocarbon Sulfonate ion, trifluoromethanesulfonate ion, hexafluoroarsenate ion, hexafluoroantimonate ion.
モリブデン酸塩イオン、タングステン酸塩イオン。Molybdate ion, tungstate ion.
チタン酸塩イオン、ジルコン酸塩イオンなどの陰イオン
を表わす。Represents anions such as titanate ions and zirconate ions.
次に前記−形成[11で示されるトリビニルメタン化合
物の代表例を挙げるが本発明においては必ずしもこれら
に限定されない。又、簡略化の為に[I]式で表わされ
る化合物の表記方法を述べる。Next, representative examples of the trivinylmethane compound shown in the above-mentioned -formation [11] will be listed, but the present invention is not necessarily limited to these. Also, for the sake of simplification, the notation method for the compound represented by formula [I] will be described.
(1) X、 (RIR2,rb1rb2.R3R41
(R6R6,rbarI)41と表すことにする。(1) X, (RIR2, rb1rb2.R3R41
It will be expressed as (R6R6, rbarI)41.
例えばXがClO4でR,とR2,R3とR4+R5と
R6が各々ピペリジン環を形成しl’blrb□がメチ
ル基、rb3rb4が水素原子の場合は(1) C10
4[(CHz) s、 CH3CH3,(CH2) 5
)[(CH2) s 、 H川
と表記する。For example, if X is ClO4 and R, R2, R3 and R4 + R5 and R6 each form a piperidine ring, l'blrb□ is a methyl group, and rb3rb4 is a hydrogen atom, (1) C10
4 [(CHz) s, CH3CH3, (CH2) 5
) [(CH2) s, written as H river.
(2) X+ (RIR2+ ’b5+ R3R4]
[R5Ra、 rbalと表す。(2) X+ (RIR2+ 'b5+ R3R4]
[R5Ra, expressed as rbal.
例えばXが1″7′R1とR2がメチル基でR3とR4
,R,とR6が各々ピペリジン環を形成しrbsがp−
エトキシ基でrb6が水素原子の場合は、(2) I
((CH3CH3,p−0CH,、(CH2) 51[
(CH2)6.川
と表記する。For example, X is 1''7'R1 and R2 are methyl groups, R3 and R4
, R, and R6 each form a piperidine ring, and rbs is p-
When rb6 is a hydrogen atom in an ethoxy group, (2) I
((CH3CH3, p-0CH,, (CH2) 51[
(CH2)6. Written as river.
(3) BrがrbllB2がrb2である場合には、
(3) L (R+ R21rb I!R3R4) [
R5Re、rb 21と表すことにする。(3) If Br is rbllB2 is rb2,
(3) L (R+ R21rb I!R3R4) [
It will be expressed as R5Re, rb 21.
例えばXがBF4でRII R21R31R4がエチル
基でR5とR6がピロリジン環を形成しrblとrb2
が水素原子の場合、
(3) BF4 [C2H5C2H51HIC2HI5
C2H61((CH2) 4. H)
と表記する。For example, X is BF4, RII R21R31R4 is an ethyl group, R5 and R6 form a pyrrolidine ring, and rbl and rb2
If is a hydrogen atom, (3) BF4 [C2H5C2H51HIC2HI5
It is written as C2H61 ((CH2) 4.H).
(4)X、[RIR21rb 1rb21 R3R41
[R5R61rb3]と表わす。(4) X, [RIR21rb 1rb21 R3R41
It is expressed as [R5R61rb3].
(5) X+ !R+R2,rb Irb 21 R3
R41[R5Ra、 rb 31と表記する。(5) X+! R+R2, rb Irb 21 R3
R41[R5Ra, written as rb31.
(6) X+ iRlR21rbl+ R3R41[R
8R61rb 2] と表記する。(6) X+ iRlR21rbl+ R3R41[R
8R61rb 2].
本発明の化合物は、例えば次のような反応経路で得るこ
と(反応式a)
R,R6
(m)
(反応式b)
5R6
(■′)
ができる。The compound of the present invention can be obtained, for example, by the following reaction route (reaction formula a) R,R6 (m) (reaction formula b) 5R6 (■').
R,R6
反応式aを経る場合(n)、(n’ )、(If’ )
の例として実用的なものはアミノ置換ジフェニルエチレ
ンであり、最も簡単な例として1,1−ビス(p−ジメ
チルアミノフェニル)エチレンが挙げられ、これらは公
知の、ミヒラーケトンからのグリニアル反応あるいはヴ
イテイヒ反応を経て製造できる。又、特開昭62−22
5562号公報に開示されているように1.1−ビス(
p−ジ置換アミノフェニル)エタンを過酸他船で酸化し
ても得られる。R, R6 If reaction formula a is followed (n), (n'), (If')
A practical example of this is amino-substituted diphenylethylene, and the simplest example is 1,1-bis(p-dimethylaminophenyl)ethylene, which can be synthesized by the well-known Grignard reaction or Wittich reaction from Michler's ketone. It can be manufactured through Also, JP-A-62-22
As disclosed in Japanese Patent No. 5562, 1.1-bis(
It can also be obtained by oxidizing p-disubstituted aminophenyl)ethane with a peracid.
又、R8とR2+ R3とR4,R5とR6がNととも
に5員環、6員環、7員環を形成した(■)。Further, R8 and R2+, R3 and R4, and R5 and R6 together with N formed a 5-membered ring, a 6-membered ring, and a 7-membered ring (■).
(n’ )、(n’ )はp−アミノスチレンを原料と
して容易に得られる。特にアミノ基の環化反応はアルキ
ル化に比較して速やかに反応が進行し収率も良い為、従
来のプロピル体あるいはブチル体などより合成が容易で
、更に環によって分子が同一平面上に並び易く薄膜状態
でより高い反射率を得ることができると考えられる。(n') and (n') can be easily obtained using p-aminostyrene as a raw material. In particular, the cyclization reaction of amino groups progresses more quickly and has a better yield than alkylation, so it is easier to synthesize than conventional propyl or butyl compounds, and the rings align the molecules on the same plane. It is thought that higher reflectance can be easily obtained in a thin film state.
(I[[)の例としては桂皮アルデヒドやジフェニルア
クロレインあるいはそれらの核置換体が使用できる。ジ
フェニルアクロレイン誘導体のうち特に有用な3,3−
ビス(p−ジ置換アミノフェニル)アクロレインは1.
1−ビス−(p−ジ置換アミノフェニル)エチレンにヴ
イルスマイヤー試薬を反応せしめれば容易に製造し得る
。As an example of (I[[), cinnamaldehyde, diphenyl acrolein, or a nuclear substituted product thereof can be used. Among diphenyl acrolein derivatives, particularly useful 3,3-
Bis(p-disubstituted aminophenyl)acrolein is 1.
It can be easily produced by reacting 1-bis-(p-disubstituted aminophenyl)ethylene with a Willsmeier reagent.
これらを(n)、(n’)と酸触媒の存在下に反応せし
めれば容易に脱水縮合してロイコ体(V)が生成する。When these are reacted with (n) and (n') in the presence of an acid catalyst, dehydration condensation easily occurs to produce the leuco form (V).
反応式すを経る場合(IV)式中量体の例として最も簡
単な例はp−ジメチルアミノベンズアルデヒドとアセト
ンをアルカリ存在下に縮合させて得たビス((p−ジメ
チルアミノ)スチリルコケトンを水素添加して得られる
ビス((p−ジメチルアミノ)スチリル〕メタノールを
挙げることができる。これを(■′)の例としてのアミ
ノ置換ジフェニルエチレンと反応させれば脱水縮合して
ロイセ体(V)が生成する。The simplest example of the intermediate intermediate of formula (IV) is to use bis((p-dimethylamino)styryl coketone) obtained by condensing p-dimethylaminobenzaldehyde and acetone in the presence of an alkali. One example is bis((p-dimethylamino)styryl)methanol obtained by hydrogenation.If this is reacted with amino-substituted diphenylethylene as an example of (■'), dehydration condensation will occur to form the Leuce compound (V ) is generated.
このロイコ体(V)から反応式Cに示すような酸化反応
を用いて目的とする化合物(1)を得ることができる。The target compound (1) can be obtained from this leuco compound (V) using an oxidation reaction as shown in reaction formula C.
K、l?6
本発明の光学記録媒体は、例えば第1図に示すごとき構
造とすることができる。第1図に示す光学記録媒体は、
基板1上に前記一般式[1]で示される化合物を含有さ
せた有機薄膜2を設けることによって形成できる。かか
る有機薄膜2は前記の一般式[I]で示される化合物を
真空蒸着または、有機溶媒中に溶解もしくは分散させた
塗布液を塗布することによって形成することができる。K, l? 6. The optical recording medium of the present invention can have a structure as shown in FIG. 1, for example. The optical recording medium shown in FIG.
It can be formed by providing on a substrate 1 an organic thin film 2 containing a compound represented by the general formula [1]. Such an organic thin film 2 can be formed by vacuum evaporation of the compound represented by the general formula [I] or by applying a coating liquid in which the compound is dissolved or dispersed in an organic solvent.
また、有機薄膜2の形成にあたって、前記一般式[I]
で示される化合物を2種以上組合せて用いることができ
、さらに他の染料、例えば、前記一般式[1]の化合物
以外のトリビニルメタン系、ポリメチン系、アズレン系
、ピリリウム系、スクアリウム系、クロコニウム系、ト
リフェニルメタン系。In addition, in forming the organic thin film 2, the general formula [I]
Two or more of the compounds represented by can be used in combination, and other dyes such as trivinylmethane, polymethine, azulene, pyrylium, squalium, and croconium other than the compound of the general formula [1] can be used. series, triphenylmethane series.
キサンチン系、アントラキノン系、シアニン系。Xanthine series, anthraquinone series, cyanine series.
フタロシアニン系、ジオキサジン系、テトラヒドロコリ
シ系、トリフエッチアジン系、フェナンスレン系などと
混合分散あるいは積層してもよい。It may be mixed and dispersed or laminated with a phthalocyanine type, dioxazine type, tetrahydrocolici type, triphetchiazine type, phenanthrene type, etc.
また酸化防止剤としてアミニウム塩、ジイモニウム塩基
の赤外線吸収化合物や金属キレート錯体など、あるいは
金属および金属化合物など、例えばAf、Te、Bi、
Sn、In、Se、SnO,TeO2゜As、Cdなど
、あるいは紫外線吸収剤などと混合分散あるいは積層し
てもよい。In addition, antioxidants include aminium salts, infrared absorbing compounds of diimonium bases, metal chelate complexes, metals and metal compounds, such as Af, Te, Bi,
It may be mixed and dispersed or laminated with Sn, In, Se, SnO, TeO2°As, Cd, or an ultraviolet absorber.
有機薄膜2は塗布法あるいは蒸着法等の種々の方法によ
り基板l上に形成される。塗布法を用いる場合には、ト
リビニルメタン化合物を有機溶媒中に溶解あるいは分散
した溶液を基板1上に塗布することによって形成するこ
とができる。また必要に応じて成膜性および塗膜安定性
を考慮してバインダーを記録層中に混合して成膜するこ
ともできる。The organic thin film 2 is formed on the substrate l by various methods such as a coating method or a vapor deposition method. When using a coating method, it can be formed by coating the substrate 1 with a solution in which a trivinylmethane compound is dissolved or dispersed in an organic solvent. Further, if necessary, a binder may be mixed into the recording layer to form a film in consideration of film formability and coating stability.
塗布の際に使用できる有機溶媒は、前述のトリビニルメ
タン系化合物を分散状態とするか、或いは溶解状態とす
るかによって異なるが、一般には、アルコール系、ケト
ン系、アミド系、エーテル系。Organic solvents that can be used during coating vary depending on whether the trivinylmethane compound is in a dispersed or dissolved state, but are generally alcohol-based, ketone-based, amide-based, or ether-based.
エステル系、脂肪族ハロゲン化炭化水素系、芳香族系、
脂肪族炭化水素系などの溶媒を用いることができる。ま
た、バインダーとしては、例えばニトロセルロース、エ
チルセルロース、ポリスチレン、ポリビニルピロリドン
、ポリメチルメタクリレート、ポリアミドなどが挙げら
れる。また、必要によりワックス、高級脂肪酸、アミド
類(例えば、オレイルアミド)を添加剤として用いる。Ester type, aliphatic halogenated hydrocarbon type, aromatic type,
Solvents such as aliphatic hydrocarbons can be used. Examples of the binder include nitrocellulose, ethylcellulose, polystyrene, polyvinylpyrrolidone, polymethylmethacrylate, and polyamide. Furthermore, wax, higher fatty acids, and amides (eg, oleylamide) are used as additives if necessary.
以上のバインダーにジオクチルフタレート、ジブチルフ
タレート、トリクレジルフォスフェート等の可塑剤、鉱
油、植物油等の油剤、更にアルキルベンゼンスルホン酸
ソーダ、ポリオキシエチレンアルキルフェニルエーテル
等の分散剤及びその他の添加剤を適宜混合させ記録層の
成膜性、塗膜安定性を高めることができる。To the above binder, plasticizers such as dioctyl phthalate, dibutyl phthalate and tricresyl phosphate, oil agents such as mineral oil and vegetable oil, dispersants such as sodium alkylbenzene sulfonate and polyoxyethylene alkylphenyl ether, and other additives are added as appropriate. By mixing them, the film formability and coating stability of the recording layer can be improved.
塗工は、浸漬コーティング法、スプレーコーティング法
、スピンナーコーティング法、ビードコーティング法、
マイヤーバーコーティング法。Coating methods include dip coating, spray coating, spinner coating, bead coating,
Meyer bar coating method.
ブレードコーティング法、ローラーコーティング法、グ
ラビアコーテイング体などのコーティング法を用いて行
うことができる。This can be carried out using a coating method such as a blade coating method, a roller coating method, or a gravure coating body.
有機薄膜2中のトリビニルメタン系化合物の含有量は通
常40〜100重量%、好ましくは50〜100重量%
が望ましい。40重量%未満では記録層の十分な光吸収
性と再生レーザー光に対して十分な光反射率を得ること
ができない。The content of the trivinylmethane compound in the organic thin film 2 is usually 40 to 100% by weight, preferably 50 to 100% by weight.
is desirable. If it is less than 40% by weight, it is not possible to obtain sufficient light absorption of the recording layer and sufficient light reflectance for reproduction laser light.
又、記録層2の膜厚は100人〜20μm1好ましくは
200λ〜1μmが適当である。尚、記録レーザー光に
対して十分な光反射性を有する薄膜を安定に形成でき得
るならば可能な限り薄いほうがよい。The thickness of the recording layer 2 is suitably 100 to 20 .mu.m, preferably 200 .lambda. to 1 .mu.m. Note that, if a thin film having sufficient light reflectivity for the recording laser beam can be stably formed, it is better to make it as thin as possible.
さらに、本発明の光学記録媒体は、第2図に示すように
、記録層2上に記録及び再生レーザー光に対して透明な
保護層3を設けることができる。該保護層3は、基板l
側から光を照射する場合は不透明でも差支えない。Further, in the optical recording medium of the present invention, as shown in FIG. 2, a protective layer 3 that is transparent to recording and reproduction laser beams can be provided on the recording layer 2. The protective layer 3
If light is irradiated from the side, it may be opaque.
また、第3図に示すように、基板1と記録層2の間に下
引層4を設けても良い。Further, as shown in FIG. 3, an undercoat layer 4 may be provided between the substrate 1 and the recording layer 2.
基板1としては、ポリエステル、ポリカーボネート、ア
クリル樹脂、ポリオレフィン樹脂、フェノール樹脂、エ
ポキシ樹脂、ポリアミド、ポリイミドなどのプラスチッ
ク、ガラスあるいは金属類などを用いることができる。As the substrate 1, plastics such as polyester, polycarbonate, acrylic resin, polyolefin resin, phenol resin, epoxy resin, polyamide, polyimide, glass, or metals can be used.
下引き層は(a)接着性の向上、(b)水またはガスな
どのバリヤー、(C)記録層の保存安定性の向上、(d
)反射率の向上、(e)溶剤からの基板の保護および(
f)プレグルーブの形成などを目的として設けられる。The undercoat layer (a) improves adhesion, (b) serves as a barrier against water or gas, (C) improves storage stability of the recording layer, and (d)
) improvement of reflectance, (e) protection of the substrate from solvents and (
f) Provided for the purpose of forming a pre-groove, etc.
(a)の目的に対しては高分子材料、例えばアイオノマ
ー樹脂、ポリアミド系樹脂。For the purpose of (a), polymeric materials such as ionomer resins and polyamide resins are used.
ビニル系樹脂、天然高分子、シリコーン、液状ゴムなど
の種々の材料もしくはシランカップリング剤などの種々
の物質を用いることができ、(b)、(C)の目的に対
しては上記高分子材料以外に無機化合物例えばSiO2
、MgF 2 、 Sin、 Ti02 、 ZnO。Various materials such as vinyl resins, natural polymers, silicones, and liquid rubbers, or various substances such as silane coupling agents can be used, and for the purposes (b) and (C), the above-mentioned polymeric materials In addition, inorganic compounds such as SiO2
, MgF2, Sin, Ti02, ZnO.
TiN、 SiNなど、金属または半金属例えばZn
。Metals or metalloids such as TiN, SiN, etc., such as Zn
.
Cu、 S、 Ni、 Cr、 Ge、 Se、 Cd
、 Ag、 AA’などを用いることができる。(d)
の目的に対しては金属例えばAl、Agなど、または金
属光沢を有する有機薄膜、例えばアズレン染料、メチン
染料などを用いることができる。そして(e)、(f)
の目的に対しては紫外線硬化樹脂、熱硬化性樹脂、熱可
塑性樹脂などを用いることができる。下引き層の膜厚は
50人〜100μm1好ましくは200人〜30μmが
適当である。Cu, S, Ni, Cr, Ge, Se, Cd
, Ag, AA', etc. can be used. (d)
For this purpose, metals such as Al, Ag, etc., or organic thin films having metallic luster, such as azulene dyes, methine dyes, etc., can be used. and (e), (f)
For this purpose, ultraviolet curing resins, thermosetting resins, thermoplastic resins, etc. can be used. The thickness of the undercoat layer is suitably 50 to 100 .mu.m, preferably 200 to 30 .mu.m.
また、保護層は、キズ、ホコリ、汚れなどからの保護お
よび記録層の保存安定性の向上および反射率の向上を目
的として設けられ、その材料としては下引き層と同じ材
料を使用することができる。The protective layer is provided for the purpose of protecting the recording layer from scratches, dust, dirt, etc., improving the storage stability of the recording layer, and improving the reflectance.The protective layer can be made of the same material as the undercoat layer. can.
保護層の膜厚は100以上、好ましくはtoooÅ以上
が適当である。The thickness of the protective layer is suitably 100 Å or more, preferably 100 Å or more.
この際、下引き層および/または保護層中には本発明の
上記−船底[I]の化合物が含有されていてもよい。ま
た、下引き層または保護層には安定剤1分散剤、難燃剤
、滑剤、帯電防止剤、界面活性剤、可塑剤などが含有さ
れていてもよい。At this time, the undercoat layer and/or the protective layer may contain the compound of the above-mentioned bottom [I] of the present invention. Further, the undercoat layer or the protective layer may contain a stabilizer, a dispersant, a flame retardant, a lubricant, an antistatic agent, a surfactant, a plasticizer, and the like.
さらに、本発明による光学的記録媒体の別の構成として
は、第1図から第4図に示した同一構成の2枚の記録媒
体(場合によりその1枚を基板のみとして)を用い有機
薄膜2を内側に配置して密封したいわゆるエアーサンド
イッチ構造にしてもよいし、保護層4を介して接着した
いわゆる密着構造(貼り合せ構造)にしてもよい。Furthermore, as another configuration of the optical recording medium according to the present invention, two recording media having the same configuration as shown in FIGS. It may be arranged in a so-called air sandwich structure in which it is placed inside and sealed, or it may be in a so-called close contact structure (bonded structure) in which it is adhered with a protective layer 4 interposed therebetween.
本発明の光学記録媒体は、ヘリウム−ネオンレーザ(発
振波長633nm)などのガスレーザの照射によって記
録することも可能であるが、好ましくは750nm以上
の波長を有するレーザ、特にガリウムーアルミニウムー
ヒ素半導体レーザ(発振波長830 n m )などの
近赤外あるいは赤外領域に発振波長を有するレーザ光線
の照射によって記録する方法が適している。また、読み
出しのためには、前述のレーザ光線を用いることができ
る。この際、書込みと読み出しを同一波長のレーザで行
うことができ、また異なる波長のレーザで行うことがで
きる。Although the optical recording medium of the present invention can be recorded by irradiation with a gas laser such as a helium-neon laser (oscillation wavelength: 633 nm), it is preferable to use a laser with a wavelength of 750 nm or more, particularly a gallium-aluminum-arsenide semiconductor laser. A method of recording by irradiation with a laser beam having an oscillation wavelength in the near-infrared or infrared region such as (oscillation wavelength 830 nm) is suitable. Furthermore, the aforementioned laser beam can be used for reading. At this time, writing and reading can be performed using a laser of the same wavelength, or can be performed using lasers of different wavelengths.
以下、本発明を実施例に従って詳細に説明するが、これ
らに限定されるものではない。Hereinafter, the present invention will be explained in detail according to Examples, but is not limited thereto.
〈合成例1〉
(1)−1トリス〔2,2−ビス(p−ピロリジノフェ
ニル)エチニルコメタンの合成
3.3−ビス(p−ピロリジノフェニル)アクロレイン
3.46g、1.1−ビス(p−ピロリジノフェニル)
エチレン6.5gをエタノール100mf中に加え35
%塩酸2gを加えて室温下に5時間反応させる。<Synthesis Example 1> (1) Synthesis of -1 Tris[2,2-bis(p-pyrrolidinophenyl)ethynylcomethane 3.3-bis(p-pyrrolidinophenyl)acrolein 3.46 g, 1.1- Bis(p-pyrrolidinophenyl)
Add 6.5 g of ethylene to 100 mf of ethanol and
Add 2 g of % hydrochloric acid and react at room temperature for 5 hours.
アンモニア水で中和し、析出した結晶を濾集する。Neutralize with aqueous ammonia and collect the precipitated crystals by filtration.
これをトルエンより再結晶して淡緑色結晶4.2gを得
た。融点195°C(分解)。This was recrystallized from toluene to obtain 4.2 g of pale green crystals. Melting point 195°C (decomposed).
[元素分析]
CHN
計算値 83.40 7.88 8.71分析値
83,70 7,65 8.54この化合物1gを2N
塩酸40m1中に溶解させたのち水冷下1.2倍モルの
二酸化鉛を加え1時間反応させた。その後1.5倍モル
の硫酸ソーダを加えよく撹拌したのち、析出物を濾別し
た。濾液を力性ソーダ水溶液で中和し、析出物を濾取し
た。この濾取物を過塩素酸水に水冷下加え1時間撹拌し
た。[Elemental analysis] CHN Calculated value 83.40 7.88 8.71 Analysis value
83,70 7,65 8.54 1g of this compound is 2N
After dissolving in 40 ml of hydrochloric acid, 1.2 times the mole of lead dioxide was added while cooling with water, and the mixture was reacted for 1 hour. Thereafter, 1.5 times the mole of sodium sulfate was added and stirred thoroughly, and the precipitate was filtered off. The filtrate was neutralized with aqueous sodium hydroxide solution, and the precipitate was collected by filtration. The filtered material was added to perchloric acid water under water cooling and stirred for 1 hour.
反応後、室温にもどるまで放置したのち減圧下濃縮し青
緑色の析出結晶を濾取した。取得部は0.7gであった
。After the reaction, the mixture was allowed to return to room temperature, concentrated under reduced pressure, and blue-green precipitated crystals were collected by filtration. The obtained portion weighed 0.7 g.
このようにして合成した(1) −1は838 n m
。(1) -1 synthesized in this way has a particle size of 838 nm
.
628nmに吸収極大を示す。It exhibits an absorption maximum at 628 nm.
< (1)−IQの合成〉
ビス(p−ジメチルアミノスチリル)メタノール3.2
g、1.1−ビス(p−ピロリジノフェニル)エチレン
3.2gをエチルセロソルブ50m!!に入れ120℃
で2時間反応させる。水200mf中に反応混合物を排
出し、析出する固体を濾集する。トルエンから再結晶す
ると淡青緑色結晶5.2gが得られる。<Synthesis of (1)-IQ> Bis(p-dimethylaminostyryl)methanol 3.2
g, 1.1-bis(p-pyrrolidinophenyl)ethylene 3.2g to ethyl cellosolve 50m! ! Put it in the oven at 120℃
Let it react for 2 hours. The reaction mixture is discharged into 200 mf of water and the precipitated solid is collected by filtration. Recrystallization from toluene yields 5.2 g of pale blue-green crystals.
(融点109℃)、
〔元素分析〕
CHN
計算値 82.95 8.04 9.00分析値
83.15 7.89 8.75この化合物1
gを2N塩酸40 m II中に溶解させたのち、水冷
下1.2倍モルの二酸化鉛を加え1時間反応させた。そ
の後1.5倍モルの硫酸ソーダを加えよ(撹拌したのち
析出物を濾別した。濾液を力性ソーダ水溶液で中和し析
出物を濾取した。この濾物を過塩素酸水に水冷下加え1
時間撹拌した。反応後、室温にまで放置したのち減圧下
濃縮し析出結晶を濾取した。取得量は0.9gで極大吸
収波長は622nmと793nmであった。(Melting point 109°C), [Elemental analysis] CHN Calculated value 82.95 8.04 9.00 Analysis value 83.15 7.89 8.75 This compound 1
g was dissolved in 40 m II of 2N hydrochloric acid, 1.2 times the mole of lead dioxide was added under water cooling, and the mixture was reacted for 1 hour. Then add 1.5 times the mole of sodium sulfate (stir, then filter out the precipitate. The filtrate was neutralized with aqueous sodium hydroxide solution and the precipitate was collected by filtration. The filtered material was cooled in perchloric acid water. Bottom addition 1
Stir for hours. After the reaction, the mixture was left to stand at room temperature, concentrated under reduced pressure, and precipitated crystals were collected by filtration. The amount obtained was 0.9 g, and the maximum absorption wavelengths were 622 nm and 793 nm.
< (1) −1の合成〉において1,1−ビス(p−
ピロリジノフェニル)エチレンに替えて各種のX、t−
ヒス(p−置換アミノフェニル)エチレンを使用して、
あるいは、3.3−ビス(p−ピロリジノフェニル)ア
クロレインに替えて各種のアクロレインを使用して、同
様の反応を行うことにより、トリビニルメタン化合物を
合成できる。<(1) Synthesis of -1>, 1,1-bis(p-
(pyrrolidinophenyl) in place of ethylene, various X, t-
Using his(p-substituted aminophenyl)ethylene,
Alternatively, a trivinylmethane compound can be synthesized by performing a similar reaction using various acrolein instead of 3,3-bis(p-pyrrolidinophenyl)acrolein.
また、< (1)−10の合成〉において、1.1−ビ
ス(p−ピロリジノフェニル)エチレンに替えて各種1
,1−ビス(p−ジ置換アミノフェニル)エチレンを用
い同様に反応させて各種トリビニルメタン化合物を得る
ことができる。In addition, in <Synthesis of (1)-10>, various 1.
, 1-bis(p-disubstituted aminophenyl)ethylene can be reacted in the same manner to obtain various trivinylmethane compounds.
実施例1
直径130 m mφ、厚さ1 、2 m mのポリメ
チルメタクリレート(以下[PMMAJと略記する)基
板上に、エポキシ−アクリレート系紫外線硬化樹脂を用
いて2P法(フォト・ポリマー法)で厚さ50μのプレ
グルーブを設け、その上に前記化合物No。Example 1 A polymethyl methacrylate (hereinafter abbreviated as PMMAJ) substrate with a diameter of 130 mmφ and a thickness of 1 or 2 mm was coated with an epoxy-acrylate ultraviolet curing resin by the 2P method (photopolymer method). A pregroove with a thickness of 50 μm was provided, and the compound No.
(1) −1の化合物2重量部をジクロルエタン98重
量部に溶解させた液をスピナー塗工法により塗布した後
、乾燥して800人の有機薄膜記録層を得た。(1) A solution obtained by dissolving 2 parts by weight of the compound of -1 in 98 parts by weight of dichloroethane was coated by a spinner coating method and then dried to obtain an organic thin film recording layer of 800 layers.
表 1
実施例2〜9
実施例1で用いた化合物No、(1) −1を前記化合
物No、(1) −3,(1) −4,(1) −10
,(2)−1,(2) −2,(3) −3,(4)
−1,(5) −4にかえて、実施例1と同様の方法で
記録媒体を作製し、それぞれ実施例2〜9の光学的記録
媒体を作製した。Table 1 Examples 2 to 9 The compound No. used in Example 1, (1) -1, the above compound No., (1) -3, (1) -4, (1) -10
, (2) -1, (2) -2, (3) -3, (4)
-1, (5) Instead of -4, recording media were produced in the same manner as in Example 1, and optical recording media of Examples 2 to 9 were produced, respectively.
上記実施例2〜9の光学的記録媒体を実施例1と同様の
方法で測定した。その結果を表2に示す。The optical recording media of Examples 2 to 9 above were measured in the same manner as in Example 1. The results are shown in Table 2.
実施例10および11
下記化合物No、(7)および(8)と前記化合物No
、(3)−1とをそれぞれl:1の重量比でジクロルエ
タンに混合し、実施例1と同様の方法で塗布し、乾燥膜
厚850人の有機薄膜記録層を設け、それぞれ実施例1
0. 11の光学的記録媒体を作製した。Examples 10 and 11 The following compounds No., (7) and (8) and the above compound No.
, (3)-1 were mixed in dichloroethane at a weight ratio of 1:1, and coated in the same manner as in Example 1 to form an organic thin film recording layer with a dry film thickness of 850 mm.
0. Eleven optical recording media were produced.
この様にして作成した実施例10. 11の光学的記録
媒体を実施例1と同様の方法で測定した。その結果を表
3に示す。Example 10 created in this way. Eleven optical recording media were measured in the same manner as in Example 1. The results are shown in Table 3.
化合物No、(7)
し、14U4
化合物No、(8)
比較例1
実施例10で用いた化合物No、(3) −1を除いた
以外は、実施例10と同様の方法で光学的記録媒体を作
製し、同様1こ測定した。その結果を表3に併示する。Compound No. (7) 14U4 Compound No. (8) Comparative Example 1 An optical recording medium was prepared in the same manner as in Example 10, except that Compound No. (3) -1 used in Example 10 was removed. was prepared and one measurement was made in the same manner. The results are also shown in Table 3.
実施例12
前記化合物No、(1) −6の化合物2重量部とニト
ロセルロース樹脂(オーバレスラッカー、ダイセル化学
■製)1重量部をメチルエチルケトン97重量部に混合
させた液をスピナー塗布法により、プレグルーブを設け
た直径130mmφ、厚さ1.2mmのPMMA基板上
に塗布し、乾燥膜厚1000人の有機薄膜記録層を得た
。Example 12 A solution prepared by mixing 2 parts by weight of the above compound No. (1) -6 and 1 part by weight of nitrocellulose resin (Overres Lacquer, manufactured by Daicel Kagaku ■) in 97 parts by weight of methyl ethyl ketone was coated using a spinner coating method. It was coated on a PMMA substrate having a diameter of 130 mm and a thickness of 1.2 mm provided with a pregroove to obtain an organic thin film recording layer with a dry film thickness of 1000 mm.
この様にして作成した光学的記録媒体を実施例1と同様
の方法で測定した。その結果を表4に示す。The optical recording medium thus produced was measured in the same manner as in Example 1. The results are shown in Table 4.
実施例13〜15
実施例12で用いた化合物No、(1) −6を前記化
合物No、(1) −5,(2) −4,(3) −3
にかえて、実施例12と同様の方法で記録媒体を作製し
、それぞれ実施例13〜15の光学的記録媒体を作成し
た。Examples 13 to 15 Compound No. (1) -6 used in Example 12 was replaced with the compound No. (1) -5, (2) -4, (3) -3
Instead, recording media were produced in the same manner as in Example 12, and optical recording media of Examples 13 to 15 were produced, respectively.
上記実施例13〜15の光学的記録媒体を実施例1と同
様の方法で測定した。その結果を表4に示す。The optical recording media of Examples 13 to 15 above were measured in the same manner as in Example 1. The results are shown in Table 4.
実施例16および17
前記の化合物No、(1) −2およびNo、(2)
−1の化合物500 m gを蒸着用モリブデンボード
に入れ、I X 10=mmHg以下に排気した後、プ
レグルーブを設けた直径130mmφ、厚さ1.2mm
のPMMA基板上に蒸着した。蒸着中は真空室内の圧力
が10−’m m Hg以上に上昇しない様にヒータを
制御しながら、950人の有機薄膜記録層を形成し、そ
れぞれ実施例16.17の光学的記録媒体を作製した。Examples 16 and 17 Compound No. (1) -2 and No. (2)
500 mg of the compound of -1 was placed in a molybdenum board for vapor deposition, and after evacuating to below IX10 = mmHg, a pre-groove was provided with a diameter of 130 mmφ and a thickness of 1.2 mm.
was deposited on a PMMA substrate. While controlling the heater so that the pressure in the vacuum chamber did not rise above 10 mm Hg during vapor deposition, 950 organic thin film recording layers were formed to produce optical recording media of Examples 16 and 17, respectively. did.
この様にして作成した光学記録媒体を実施例1と同様の
方法で測定した。その結果を表5に示す。The optical recording medium thus produced was measured in the same manner as in Example 1. The results are shown in Table 5.
実施例18
ウオーレットサイズの厚さ0.4mmポリカーボネート
(以下rPcJと略記する)基板上に、熱プレス法によ
りプレグルーブを設け、その上に前記化合物No、(3
) −1の化合物4重量部をジアセトンアルコール99
6重量部に混合させた液をバーコード法により塗布した
後、乾燥して1000人の有機薄膜記録層を得た。さら
に、その上にエチレン−酢ビドライフィルムを介してウ
オーレットサイズの厚さ0 、3 m m P C基板
と、熱ロール法により密着し、密着構造の実施例18の
光学的記録媒体を作製した。Example 18 A pregroove was provided on a wallet-sized polycarbonate (hereinafter abbreviated as rPcJ) substrate with a thickness of 0.4 mm by a heat press method, and the compound No. (3
) -1 4 parts by weight of diacetone alcohol 99%
A mixture of 6 parts by weight of the liquid was applied by a bar code method and dried to obtain 1000 organic thin film recording layers. Further, a PC substrate having a thickness of 0.3 mm and a wallet size was adhered thereon via an ethylene-acetate dry film by a hot roll method to produce an optical recording medium of Example 18 having a close contact structure. did.
この様にして作製した実施例18の光学的記録媒体をX
−Y方向に駆動するステージ上に取り付け、発振波長8
30nmの半導体レーザを用いて、厚さ0.4mmのP
C基板側より、有機薄膜記録層にスポットサイズ3.0
μmφ、記録パワー4 、0 m Wで記録パルス80
μsecでY軸方向に情報を書き込み、読み出しパワー
0.4mWで再生し、そのコントラスト比の信号強度)
を測定した。The optical recording medium of Example 18 produced in this way was
- Mounted on a stage driven in the Y direction, oscillation wavelength 8
Using a 30 nm semiconductor laser, a 0.4 mm thick P
Spot size 3.0 on the organic thin film recording layer from the C substrate side
μmφ, recording power 4, recording pulse 80 at 0 mW
Information is written in the Y-axis direction in μsec, reproduced with a read power of 0.4 mW, and the signal strength of the contrast ratio)
was measured.
さらに、前記条件で作製した同一記録媒体を実施例1と
同様の条件の環境保存安定性試験、および耐光安定性試
験を行い、その後の透過率およびコントラスト比を測定
した。その結果を表6に示す。Furthermore, the same recording medium produced under the above conditions was subjected to an environmental storage stability test and a light resistance stability test under the same conditions as in Example 1, and the transmittance and contrast ratio were then measured. The results are shown in Table 6.
表 6
〔発明の効果〕
上述のように本発明の光学的記録媒体は以下の効果を奏
することができる。Table 6 [Effects of the Invention] As described above, the optical recording medium of the present invention can have the following effects.
(1)長波長帯に吸収を有し、半導体レーザ等の長波長
発振レーザを用いても高感度に記録できる。(1) It has absorption in a long wavelength band, and can be recorded with high sensitivity even when using a long wavelength oscillation laser such as a semiconductor laser.
(2)良好なビット形状を形成でき、高いC/N比が得
られる。(2) A good bit shape can be formed and a high C/N ratio can be obtained.
(3)熱および光に対する安定性が高く、保存性に優れ
、再生劣化の少ない記録体が得られる。(3) A recording medium with high stability against heat and light, excellent storage stability, and little reproduction deterioration can be obtained.
第1図乃至第4図は各々本発明の光学的記録媒体の構成
を示す断面図である。
l・・・基板
2・・・有機薄膜
3・・・保護層
4・・・下引き層1 to 4 are cross-sectional views showing the structure of the optical recording medium of the present invention. l...Substrate 2...Organic thin film 3...Protective layer 4...Undercoat layer
Claims (1)
含有する記録層を有することを特徴とする光記録媒体。 ▲数式、化学式、表等があります▼[ I ] (式中、R_1〜R_6は水素原子または炭素数1〜8
までの置換基であり、R_1とR_2、R_3とR_4
、R_5とR_6の組合せで少くとも1組がNとともに
置換もしくは未置換の5員環、置換もしくは未置換の6
員環、置換もしくは未置換の7員環を形成する。 B_1、B_2はそれぞれハロゲン原子、又は炭素数1
〜8までの置換もしくは未置換のアルキル基、又は置換
もしくは未置換のシクロアルキル基又は置換もしくは未
置換のアルケニル基又は置換もしくは未置換のアラルキ
ル基又はアルキニル基かもしくは▲数式、化学式、表等
があります▼ 又は▲数式、化学式、表等があります▼を表わす。 ここで、R_7、R_8、R_9は各々水素原子又は炭
素数1〜8までの置換もしくは未置換のアルキル基又は
置換もしくは未置換の5〜6員環のシクロアルキル基又
は置換もしくは未置換のアルケニル基又は置換もしくは
未置換のアラルキル基又はアルキニル基を示し、又はR
_7とR_8でNとともに置換もしくは未置換の5員環
、置換もしくは未置換の6員環、置換もしくは未置換の
7員環を形成する。nは1または2である。)[Scope of Claims] An optical recording medium characterized by having a recording layer containing a trivinylmethane compound represented by the general formula [I]. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [I] (In the formula, R_1 to R_6 are hydrogen atoms or carbon atoms 1 to 8
R_1 and R_2, R_3 and R_4
, a combination of R_5 and R_6 in which at least one set is substituted or unsubstituted 5-membered ring with N, substituted or unsubstituted 6
Forms a 7-membered ring, substituted or unsubstituted. B_1 and B_2 are each a halogen atom or a carbon number of 1
Substituted or unsubstituted alkyl group, or substituted or unsubstituted cycloalkyl group, or substituted or unsubstituted alkenyl group, or substituted or unsubstituted aralkyl group or alkynyl group, or ▲ Numerical formula, chemical formula, table, etc. Represents ▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼. Here, R_7, R_8, and R_9 are each a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 8 carbon atoms, a substituted or unsubstituted 5- to 6-membered cycloalkyl group, or a substituted or unsubstituted alkenyl group. or represents a substituted or unsubstituted aralkyl group or alkynyl group, or R
_7 and R_8 together with N form a substituted or unsubstituted 5-membered ring, a substituted or unsubstituted 6-membered ring, or a substituted or unsubstituted 7-membered ring. n is 1 or 2. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63123622A JPH01291989A (en) | 1988-05-19 | 1988-05-19 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63123622A JPH01291989A (en) | 1988-05-19 | 1988-05-19 | Optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01291989A true JPH01291989A (en) | 1989-11-24 |
Family
ID=14865145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63123622A Pending JPH01291989A (en) | 1988-05-19 | 1988-05-19 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01291989A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020537019A (en) * | 2017-10-12 | 2020-12-17 | ミリケン・アンド・カンパニーMilliken & Company | Leuco colorant with extended conjugation |
-
1988
- 1988-05-19 JP JP63123622A patent/JPH01291989A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020537019A (en) * | 2017-10-12 | 2020-12-17 | ミリケン・アンド・カンパニーMilliken & Company | Leuco colorant with extended conjugation |
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