JPH01269222A - Magnetic disk and production thereof - Google Patents
Magnetic disk and production thereofInfo
- Publication number
- JPH01269222A JPH01269222A JP9550988A JP9550988A JPH01269222A JP H01269222 A JPH01269222 A JP H01269222A JP 9550988 A JP9550988 A JP 9550988A JP 9550988 A JP9550988 A JP 9550988A JP H01269222 A JPH01269222 A JP H01269222A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic disk
- magnetic
- layer
- disk according
- magnetic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000758 substrate Substances 0.000 claims abstract description 15
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 10
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 6
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 229910018104 Ni-P Inorganic materials 0.000 claims description 5
- 229910018536 Ni—P Inorganic materials 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- 229910020630 Co Ni Inorganic materials 0.000 claims description 3
- 229910002440 Co–Ni Inorganic materials 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 229910020676 Co—N Inorganic materials 0.000 claims description 2
- 229910020516 Co—V Inorganic materials 0.000 claims description 2
- 239000004642 Polyimide Substances 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- 239000010687 lubricating oil Substances 0.000 claims description 2
- FPVKHBSQESCIEP-JQCXWYLXSA-N pentostatin Chemical compound C1[C@H](O)[C@@H](CO)O[C@H]1N1C(N=CNC[C@H]2O)=C2N=C1 FPVKHBSQESCIEP-JQCXWYLXSA-N 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229920003055 poly(ester-imide) Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001256 stainless steel alloy Inorganic materials 0.000 claims description 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 229910020707 Co—Pt Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 17
- 238000005260 corrosion Methods 0.000 abstract description 12
- 230000007797 corrosion Effects 0.000 abstract description 12
- 239000011241 protective layer Substances 0.000 abstract description 5
- 230000001050 lubricating effect Effects 0.000 abstract description 3
- 230000008595 infiltration Effects 0.000 abstract 2
- 238000001764 infiltration Methods 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000314 lubricant Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910003296 Ni-Mo Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気ディスク１こ係り、特に磁気ディスクに好
適な保護層ｌこ関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic disk, and particularly to a protective layer suitable for a magnetic disk.
一般に記録再生磁気ヘッド（以下ヘッドと呼ぶ）１と磁
気記録媒体で構成する磁気記録装置の記録再生方法には
次のような方法がある。すなわち操作開始前にヘッドと
磁気記録媒体面とを接触状態でセットした後、磁気記録
媒体に回転を与えることによりヘッドと磁気記録媒体面
との間に空気層のギャップを作り、この状態で記録再生
する方法である（コンタクト・スタート・ストップ方式
。以下Ｃ８Ｓと呼ぶ）。Ｃ８Ｓでは、磁気記録媒体の回
転開始時・回転停止時にヘッドと磁気記録媒体面は接触
・摩擦状態となる。In general, there are the following methods for recording and reproducing a magnetic recording device comprising a recording/reproducing magnetic head (hereinafter referred to as a head) 1 and a magnetic recording medium. That is, before starting the operation, the head and the magnetic recording medium surface are set in contact, and then an air gap is created between the head and the magnetic recording medium surface by giving rotation to the magnetic recording medium, and recording is performed in this state. This is a reproduction method (contact start/stop method, hereinafter referred to as C8S). In C8S, the head and the magnetic recording medium surface come into contact and friction when the magnetic recording medium starts rotating and stops rotating.
この接触摩擦状態におけるヘッドと磁気記録媒体との間
に生ずる接触摩擦力はヘッドおよび磁気記録媒体を摩耗
させ、ついにはヘッドおよび磁性媒体に傷を生じせしめ
、いわゆるヘッドクラッシュに至る。また、上記接触摩
擦状態においてヘッドのわずかな姿勢の変化がヘッドに
かかる荷重を不拘一番こさせ、ヘッドおよび磁気記録媒
体面屹傷をつける場合もある。また、磁性媒体がＣｏ−
Ｎｉ。The contact friction force generated between the head and the magnetic recording medium in this contact friction state wears out the head and the magnetic recording medium, and eventually causes scratches on the head and the magnetic medium, resulting in a so-called head crash. Further, in the above-mentioned contact friction state, a slight change in the posture of the head causes an unrestricted load to be applied to the head, which may cause scratches on the surface of the head and the magnetic recording medium. Moreover, the magnetic medium is Co-
Ni.
ｃｏ−Ｎｉ−Ｃｒ、 Ｃｏ−Ｎｉ−Ｐなどの金属媒体の
場合高湿度条件ｌこおいて腐蝕を生じる。この摩耗や腐
蝕を防ぐために、ＩＥＥＢ ＴＲＡＮＳＡＣＴＩＯＮ
ｏｎ ＭＡＧＮＥＴＩＣ３，ｖｏＬ。In the case of metal media such as co-Ni-Cr and Co-Ni-P, corrosion occurs under high humidity conditions. To prevent this wear and corrosion, IEEB TRANSACTION
on MAGNETIC3, vol.
ＭＡＧ−１７，Ｎｏ、 ４． ＪＵＬＹ １９８１″Ｄ
ＡＴＡＰＯＩＮＴ ＴＨＩＮＦＩＬＭＭＥＤＩＡＮ ｌ
こ示されているグラファイトのスパッタ膜や特公昭６０
−２８０５３に示されているポリ珪酸被膜を磁性媒体の
上に形成する方法が考案されている。MAG-17, No. 4. JULY 1981″D
ATAPOINT THINFILMMEDIAN l
The sputtered graphite film shown here and the 1980s
A method of forming a polysilicate film on a magnetic medium as shown in No. 28053 has been devised.
上述したいづれの公知例も十分な耐摩耗性や防蝕性を有
していない。そこで新たに炭化水素のバイアスＣＶＤで
硬質な炭素膜を形成し保護膜として形成する方法が考案
されている。この方法を用いると耐摩耗性や防蝕性が改
善され、とくに耐摩耗性は大巾に改善される。しかしな
がら、防蝕性についてはまだ不十分でありさらに一層の
改良が必要である。None of the above-mentioned known examples have sufficient wear resistance or corrosion resistance. Therefore, a new method has been devised in which a hard carbon film is formed as a protective film by bias CVD of hydrocarbons. When this method is used, abrasion resistance and corrosion resistance are improved, and in particular, abrasion resistance is greatly improved. However, the corrosion resistance is still insufficient and further improvement is required.
すなわち、本発明は基体上に磁性層が形成され、該磁性
層上にアモルファスフッ化炭素膜とくにバイアスＣＶＤ
法により形成されたアモルファスフッ化炭素膜が形成さ
れていることを特徴とする磁気ディスク及びその製造方
法を提供するものである。That is, in the present invention, a magnetic layer is formed on a substrate, and an amorphous fluorocarbon film, particularly a bias CVD film, is formed on the magnetic layer.
The present invention provides a magnetic disk characterized in that it has an amorphous fluorocarbon film formed by a method, and a method for manufacturing the same.
本発明に係るアモルファスフッ化炭素膜を有する磁気デ
ィスクが耐食性にすぐれていることは後に述べる実施例
で示すが、アモルファスフッ化炭素膜はアモルファス炭
素膜よりも撥水性で表面エネルギーが小さいことが高湿
状態において水分の侵入を防ぎ耐食性を良好にしている
と考えられる。The fact that the magnetic disk having the amorphous fluorocarbon film according to the present invention has excellent corrosion resistance will be shown in the examples described later. It is thought that this prevents moisture from entering in wet conditions and improves corrosion resistance.
次に図面を参照して本発明の詳細な説明する。 Next, the present invention will be described in detail with reference to the drawings.
図は本発明の磁気ディスクの断面図で基板１はアルミ合
金又はポリエステル、ポリイミドなどのプラスチックス
又は窒化ケイ素、炭化ケイ素などのセラミックス又はス
テンレス、チタン合金などの金属又はガラス板である。The figure is a sectional view of the magnetic disk of the present invention, and the substrate 1 is made of aluminum alloy, plastic such as polyester or polyimide, ceramic such as silicon nitride or silicon carbide, metal such as stainless steel or titanium alloy, or a glass plate.
次にこの基板１の上に金属薄膜磁性層２としてＣｏ−Ｎ
ｉ、 Ｃｏ−Ｎｉ−Ｐ、 Ｃｏ−Ｎｉ−Ｃｒ、 Ｃｏ−
Ｐｔ、 Ｃｏ−ｒＮｉ−Ｐｔ。Next, on this substrate 1, a metal thin film magnetic layer 2 is formed of Co-N.
i, Co-Ni-P, Co-Ni-Cr, Co-
Pt, Co-rNi-Pt.
Ｃｏ−Ｎｉ−Ｍｏ、 Ｃｏ−Ｖ 等の金属を被覆する。Coating with metal such as Co-Ni-Mo, Co-V, etc.
次に該金属薄膜磁性層２の上に保護層３としてバイアス
ＣＶＤ法形で形成したアモルファスふつ化炭素膜を被覆
する。本発明に用いられるアモルファスふつ化炭素膜は
硬質で少くともビッカース硬度１５００以上であり通常
ビッカース硬度２０００〜５０００の範囲にある。この
膜はバイアスＣＶＤによって得られるもので蒸着、スパ
ッタリング、バイアスのないＣＶＤなど他の方法では得
ることが出来ない。ここで述べるバイアスとは基板に向
っての電圧降下が１００〜ＩＫＶのことを意味し、ＤＣ
放電において基板に負の電圧をかけたり、低周波、ラジ
オ波、交流電圧を基板に印加し基板側に自己バイアスを
生じさせることによって実現することができる。アモル
ファスフッ化炭素膜中のフッ素ト炭素の比は、フッ素が
多い程耐蝕性は向上するが、あまり多くなると硬度が低
下し耐摩耗性が低下する。したがってフッ素は炭素と等
モルないしそれ以下にする必要がある。本フッ化炭素膜
を形成するには、ＣＦ４ ＣＨｓＦ＋ＣＨＦ５ Ｉｃ
！Ｆ６ ＋ｃ２Ｈ，Ｆｔ ＋ＣａＦａ ＋Ｃ３Ｈ！Ｆ６
１ｃ４Ｆ８１０４Ｆ１０などのガス又はこれのガスとＣ
へ＋ Ｃｘ Ｈｓ ＋ Ｃｓ八、Ｃ５Ｈｔｏ などの混
合ガスを用いることが適している。Next, the metal thin film magnetic layer 2 is coated with an amorphous carbon fluoride film formed by a bias CVD method as a protective layer 3. The amorphous carbon fluoride film used in the present invention is hard and has a Vickers hardness of at least 1500 or more, and usually has a Vickers hardness in the range of 2000 to 5000. This film is obtained by bias CVD and cannot be obtained by other methods such as evaporation, sputtering, or CVD without bias. The bias mentioned here means a voltage drop of 100 to IKV towards the substrate, and the DC
This can be achieved by applying a negative voltage to the substrate during discharge, or by applying low frequency, radio waves, or alternating current voltage to the substrate to generate a self-bias on the substrate side. Regarding the ratio of fluorocarbon in the amorphous fluorocarbon film, the more fluorine there is, the better the corrosion resistance will be, but if it is too much, the hardness will be lowered and the wear resistance will be lowered. Therefore, the amount of fluorine must be equal to or less than that of carbon. To form this fluorocarbon film, CF4 CHsF + CHF5 Ic
! F6 +c2H, Ft +CaFa +C3H! F6
Gas such as 1c4F8104F10 or this gas and C
It is suitable to use a mixed gas such as H+CxHs+Cs8, C5Hto, or the like.
さらに必要に応じてアモルファスふつ化炭素膜上にパー
フルオロアルキル系の液体潤滑剤を被覆することができ
る。これらはデュポン社よりタライトックス、モンテフ
ロス社よりホンプリンの商標で市販されている。Furthermore, a perfluoroalkyl liquid lubricant can be coated on the amorphous carbon fluoride film if necessary. These are commercially available under the trademarks Talytox from DuPont and Honprin from Montefros.
次に実施例により本発明を説明する。Next, the present invention will be explained with reference to examples.
（実施例１）
アルミ合金の上に下地層としてＮｉ−Ｐ めっき膜が
被覆され、表面粗さ０．００５μｍ に仕上げされた基
板１の上に金属薄膜磁性層２としてＣｏ−Ｎｉ合金を０
．０６μｍスパッタリングで形成した。次にＣＫガス８
００Ｆ、ガス２０の割合で混合したガスを用いてガス圧
５０ ｍＴｏｒｒ、 ＲＦ放電電力５００ Ｗの条件
下での自己バイアスＣＶＤ法で形成したアモルファスふ
つ化炭素膜の保護膜３を０．０５μｍの厚さに被覆し、
磁気ディスクを製作した。(Example 1) A Co-Ni alloy was coated as a metal thin film magnetic layer 2 on a substrate 1 which was coated with a Ni-P plating film as an underlayer on an aluminum alloy and finished to a surface roughness of 0.005 μm.
．． It was formed by sputtering with a thickness of 0.06 μm. Next, CK gas 8
A protective film 3 of an amorphous carbon fluoride film was formed by a self-bias CVD method using a gas mixture of 00F and 20% gas at a gas pressure of 50 mTorr and an RF discharge power of 500 W to a thickness of 0.05 μm. covered with
Manufactured magnetic disks.
（実施例２）
実施例１と同様にして、但し金属薄膜磁性層としてめっ
き法によってＣｏ−Ｎｉ−Ｐ合金を０．５μｍの厚さに
被覆し、磁気ディスクを裏作した。(Example 2) A magnetic disk was fabricated in the same manner as in Example 1, except that a Co--Ni--P alloy was coated with a thickness of 0.5 μm as a metal thin film magnetic layer by plating.
（実施例３）
実施例１と同様にして、但しアモルファスふっ化炭素膜
３をガス圧２０ ｍＴｏｒｒ 、 ５０ ｋＨｚ低周波
電力６００Ｗの条件の下で形成し、磁気ディスクを製作
した。(Example 3) A magnetic disk was manufactured in the same manner as in Example 1, except that an amorphous fluorocarbon film 3 was formed under the conditions of a gas pressure of 20 mTorr and a 50 kHz low frequency power of 600 W.
（比較例１）
実施例１と同様にして、但しｃＨ４ガスを用いて磁気デ
ィスクを製作した。(Comparative Example 1) A magnetic disk was manufactured in the same manner as in Example 1, except that cH4 gas was used.
（比較例２）
実施例１と同様にして、但し保護膜３をグラフファイト
ターゲットをＡｒガス圧５ ｍＴｏｒｒ 、 Ｄ Ｃ放
電層力３ＫＷの条件下でスパッタリングによって被覆し
、磁気ディスクを製作した。(Comparative Example 2) A magnetic disk was manufactured in the same manner as in Example 1, except that the protective film 3 was coated with a graphite target by sputtering under the conditions of an Ar gas pressure of 5 mTorr and a DC discharge layer force of 3 KW.
次に実施例１〜３および比較例１，２で示した磁気ディ
スクを用いてヘッドとディスクの起動停 ・止繰り返し
試験（ＣＳＳ試験）および温度ω℃。Next, using the magnetic disks shown in Examples 1 to 3 and Comparative Examples 1 and 2, a head and disk start/stop/stop repetition test (CSS test) and temperature ω°C were conducted.
相対温度９０％における耐食性試験を１００時間行った
ところ表１の結果を得た。A corrosion resistance test was conducted at a relative temperature of 90% for 100 hours, and the results shown in Table 1 were obtained.
表１
上述の如く、本発明の実施例では磁気ディスクについて
述べたが、フロッピーディスク、磁気テープ、磁気カー
ドにも本発明は有効である。Table 1 As mentioned above, in the embodiments of the present invention, magnetic disks have been described, but the present invention is also effective for floppy disks, magnetic tapes, and magnetic cards.
以上の結果から明らかなように本発明の磁気ディスクは
優れた耐摩耗性と防蝕性を有していることがわかった。As is clear from the above results, the magnetic disk of the present invention was found to have excellent wear resistance and corrosion resistance.
第１図は本発明に係る磁気ディスクの部分断面図である
。
１・・・基板 ２・・・金属薄膜磁性層３
・・・保護層 ４・・・潤滑層ゝ、ノ
潤滑層FIG. 1 is a partial sectional view of a magnetic disk according to the present invention. 1... Substrate 2... Metal thin film magnetic layer 3
...Protective layer 4...Lubricating layer, lubricating layer
Claims (1)
に形成されたアモルファスフッ化炭素膜とからなること
を特徴とする磁気ディスク。 ２、該基体がアルミ合金若しくはステンレス又はチタン
合金であることを特徴とする請求項１記載の磁気ディス
ク。 ３、該基体がポリエステル、若しくはポリイミドからな
ることを特徴とする請求項１記載の磁気ディスク。 ４、該基体が炭化ケイ素、若しくは窒化ケイ素からなる
ことを特徴とする請求項１記載の磁気ディスク。 ５、該基体がセラミックス又はガラス板であることを特
徴とする請求項１記載の磁気ディスク。 ６、該磁性層がＣｏ−Ｎｉ、Ｃｏ−Ｎｉ−Ｐ、Ｃｏ−Ｎ
ｉ−Ｃｒ、Ｃｏ−Ｐｔ、Ｃｏ−Ｎｉ−Ｐｔ、Ｃｏ−Ｎｉ
−Ｍｏ、若しくはＣｏ−Ｖであることを特徴とする請求
項１記載の磁気ディスク。 ７、該アモルファスふっ化炭素膜は、バイアスＣＶＤに
よって形成されることを特徴とする請求項１記載の磁気
ディスク。 ８、該アモルファスふっ化炭素膜上に、パーフルオロア
ルキル系の液体潤滑剤を被覆してあることを特徴とする
請求項１記載の磁気ディスク。 ９、該基体と該磁性層との間に、下地層を形成してある
ことを特徴とする請求項１記載の磁気ディスク。 １０ 該下地層がＮｉ−Ｐめっき層であることを特徴と
する請求項９記載の磁気ディスク。 １１ 基体表面を研摩により平坦化し、該基体上に磁性
層を形成し、該磁性上にバイアスＣＶＤ法によりアモル
ファスふっ化炭素膜を形成することを特徴とする磁気デ
ィスクの製造方法。 １２ 該磁性層をスパッタリング法により形成したこと
を特徴とする請求項１１記載の磁気ディスクの製造方法
。 １３ 該バイアスＣＶＤ法は、フッ化炭素ガス又はフッ
化炭素ガスと炭化水素ガスの混合ガスを含む雰囲気中で
行なわれることを特徴とする請求項１１記載の磁気ディ
スクの製造方法。Claims: 1. A magnetic disk comprising a base, a magnetic layer formed on the base, and an amorphous fluorocarbon film formed on the magnetic layer. 2. The magnetic disk according to claim 1, wherein the base is made of aluminum alloy, stainless steel, or titanium alloy. 3. The magnetic disk according to claim 1, wherein the base is made of polyester or polyimide. 4. The magnetic disk according to claim 1, wherein the substrate is made of silicon carbide or silicon nitride. 5. The magnetic disk according to claim 1, wherein the substrate is a ceramic or glass plate. 6. The magnetic layer is Co-Ni, Co-Ni-P, Co-N
i-Cr, Co-Pt, Co-Ni-Pt, Co-Ni
2. The magnetic disk according to claim 1, wherein the magnetic disk is made of -Mo or Co-V. 7. The magnetic disk according to claim 1, wherein the amorphous carbon fluoride film is formed by bias CVD. 8. The magnetic disk according to claim 1, wherein the amorphous fluorocarbon film is coated with a perfluoroalkyl liquid lubricant. 9. The magnetic disk according to claim 1, further comprising an underlayer formed between the base and the magnetic layer. 10. The magnetic disk according to claim 9, wherein the underlayer is a Ni-P plating layer. 11. A method for manufacturing a magnetic disk, which comprises flattening the surface of a substrate by polishing, forming a magnetic layer on the substrate, and forming an amorphous carbon fluoride film on the magnetic layer by bias CVD. 12. The method of manufacturing a magnetic disk according to claim 11, wherein the magnetic layer is formed by a sputtering method. 13. The magnetic disk manufacturing method according to claim 11, wherein the bias CVD method is performed in an atmosphere containing fluorocarbon gas or a mixed gas of fluorocarbon gas and hydrocarbon gas.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9550988A JPH01269222A (en) | 1988-04-20 | 1988-04-20 | Magnetic disk and production thereof |
| US07/755,589 US5275850A (en) | 1988-04-20 | 1991-09-04 | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9550988A JPH01269222A (en) | 1988-04-20 | 1988-04-20 | Magnetic disk and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01269222A true JPH01269222A (en) | 1989-10-26 |
Family
ID=14139559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9550988A Pending JPH01269222A (en) | 1988-04-20 | 1988-04-20 | Magnetic disk and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01269222A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9388900B2 (en) | 2010-05-25 | 2016-07-12 | Federal-Mogul Burscheid Gmbh | Method for producing a piston ring having embedded particles |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62277617A (en) * | 1986-05-26 | 1987-12-02 | Ulvac Corp | Wear resistant magnetic recording body |
| JPS62279521A (en) * | 1986-05-28 | 1987-12-04 | Hitachi Maxell Ltd | Production of magnetic recording medium |
| JPS6344318A (en) * | 1986-08-09 | 1988-02-25 | Hitachi Maxell Ltd | Production of magnetic recording medium |
-
1988
- 1988-04-20 JP JP9550988A patent/JPH01269222A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62277617A (en) * | 1986-05-26 | 1987-12-02 | Ulvac Corp | Wear resistant magnetic recording body |
| JPS62279521A (en) * | 1986-05-28 | 1987-12-04 | Hitachi Maxell Ltd | Production of magnetic recording medium |
| JPS6344318A (en) * | 1986-08-09 | 1988-02-25 | Hitachi Maxell Ltd | Production of magnetic recording medium |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9388900B2 (en) | 2010-05-25 | 2016-07-12 | Federal-Mogul Burscheid Gmbh | Method for producing a piston ring having embedded particles |
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