JPH01180785A - Torch nozzle for arc welding - Google Patents
Torch nozzle for arc weldingInfo
- Publication number
- JPH01180785A JPH01180785A JP33005087A JP33005087A JPH01180785A JP H01180785 A JPH01180785 A JP H01180785A JP 33005087 A JP33005087 A JP 33005087A JP 33005087 A JP33005087 A JP 33005087A JP H01180785 A JPH01180785 A JP H01180785A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- weight
- plating
- arc welding
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003466 welding Methods 0.000 title claims description 27
- 238000007747 plating Methods 0.000 claims abstract description 60
- 239000000919 ceramic Substances 0.000 claims abstract description 25
- 239000002131 composite material Substances 0.000 claims abstract description 16
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 15
- 239000000956 alloy Substances 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 45
- 229910052759 nickel Inorganic materials 0.000 claims description 22
- 229910052698 phosphorus Inorganic materials 0.000 claims description 13
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 12
- 239000011574 phosphorus Substances 0.000 claims description 12
- 229910052796 boron Inorganic materials 0.000 claims description 8
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 7
- 229910052582 BN Inorganic materials 0.000 claims 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 1
- 239000013078 crystal Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 3
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000003929 acidic solution Substances 0.000 description 6
- 239000003513 alkali Substances 0.000 description 5
- 239000001569 carbon dioxide Substances 0.000 description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 description 5
- 229910000765 intermetallic Inorganic materials 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 4
- 229910018104 Ni-P Inorganic materials 0.000 description 3
- 229910018536 Ni—P Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000521 B alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 241000233803 Nypa Species 0.000 description 1
- 235000005305 Nypa fruticans Nutrition 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004021 metal welding Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000003832 thermite Substances 0.000 description 1
- 238000005493 welding type Methods 0.000 description 1
Landscapes
- Arc Welding In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、セラミックス製アーク溶接用トーチノズル（
以下ノズルと呼ぶ）に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a ceramic arc welding torch nozzle (
(hereinafter referred to as nozzle).
一般に金属の溶接は、被覆アーク、サブマージアーク、
イナートガスアーク、炭酸ガスアーク、ノンガスシール
ドアーク、スタッド、エレクトロスラグ、電子ビーム、
テルミット、ガス、ブラズマおよびレーザー等のいわゆ
る融接といわれる方法で行われている。これらの内、融
接部の酸化を防止するため不活性ガスによるシールを行
うものにイナートガスアーク溶接と炭酸ガスアーク溶接
の二通りがあり、本発明はこれらに使用するトーチの先
端にガスシールな行うための機能をそなえたノズルに係
る。In general, metal welding is performed using coated arc, submerged arc,
Inert gas arc, carbon dioxide arc, non-gas shielded arc, stud, electroslag, electron beam,
This is done by a method called fusion welding using thermite, gas, plasma, laser, etc. Among these, there are two types of welding, inert gas arc welding and carbon dioxide gas arc welding, which use an inert gas seal to prevent oxidation of the fusion weld, and the present invention provides a gas seal at the tip of the torch used for these. This relates to a nozzle with functions for
従来、ノズルは銅もしくは銅合金を基材としたもの、鉄
もしくは鉄合金を基材としたもの、あるいはアルミ合金
を基材としたもののように金属を基材とするものあるい
はこれに金属メッキをしだもの特開昭５５−１３７４１
３と、アルミナあるいはテラ化ケイ素のようなセラミッ
クスを基材としだもの特開昭６１−６０２７６、特開昭
６２−３８７７２、特開昭６２−６８６８２がある。Conventionally, nozzles have been made of metal as a base material, such as those made of copper or copper alloys, iron or iron alloys, or aluminum alloys, or metal-plated nozzles. Shidamono JP 55-13741
3, and JP-A-61-60276, JP-A-62-38772, and JP-A-62-68682, which are based on ceramics such as alumina or silicon terraride.
金属を基材とするノズルは使用時間の経過と共に金属溶
加材および溶融金属部から発生するスパッタにより、ノ
ズル先端部が閉塞し、溶接部のガスシールが不完全とな
ると共にアークの安定性および溶接ワイヤの円滑な送り
出しが不可能となり、時にはアークの発生そのものが停
止してしまう。As metal-based nozzles are used over time, the nozzle tip becomes clogged by spatter generated from the metal filler metal and the molten metal part, making the gas seal in the welding part incomplete and affecting the stability of the arc. It becomes impossible to send out the welding wire smoothly, and sometimes the generation of the arc itself stops.
ノズルにスパッタが付着するとスパッタとアークの熱に
よって、ノズル先端部が溶損し適切なガスシールが行わ
れにくくなる。ノズルは付着スパッタを頻繁に剥離する
操作を必要とし、かつ使用時間が延びるにしたがい、ノ
ズル内面があれ、スパッタが付きやすくなると共Ｃ：、
剥離に要する力も大きくなり、最後には剥離することす
ら不可能となる。If spatter adheres to the nozzle, the nozzle tip will be eroded due to the heat of the spatter and the arc, making it difficult to properly seal the gas. The nozzle requires frequent operations to peel off adhering spatter, and as the usage time increases, the inner surface of the nozzle becomes rough and spatter becomes more likely to adhere.
The force required for peeling increases, and eventually it becomes impossible to even peel it off.
それ故、自動溶接機の分野では生産性が著しく阻害され
るという問題を生じていた。これを避けるためにノズル
内面にスパッタの付着防止剤（薬剤）を塗布することも
試みられているが実質的な効果は認められない。Therefore, in the field of automatic welding machines, there has been a problem in that productivity is significantly hindered. In order to avoid this, attempts have been made to coat the inner surface of the nozzle with a spatter adhesion prevention agent (chemical), but no substantial effect has been found.
一方、セラミックスを基材とするノズルは金属を基材と
するノズルと比較して耐熱性に優れるものの、熱伝導率
が金属系よりも劣るため、ノズルに付着したスパッタの
冷却速度は遅くなり、ノズル自体の温度が高くなる傾向
にある。加えてセラミックス系ノズルは金属系よりも表
面状態が悪いため、ノズルと付着スパッタの接合力が強
くなり、スパッタの剥離性は金属系に劣る。On the other hand, although ceramic-based nozzles have superior heat resistance compared to metal-based nozzles, their thermal conductivity is inferior to metal-based nozzles, so the cooling rate of spatter attached to the nozzle is slow. The temperature of the nozzle itself tends to increase. In addition, ceramic nozzles have a worse surface condition than metal nozzles, so the bonding force between the nozzle and attached sputter is stronger, and the sputter removability is inferior to metal nozzles.
特に炭酸ガスアーク溶接でセラミックス系ノズルを使用
した時、溶加材である電極ワイヤに脱酸剤として添加さ
れているマンガン、ケイ素およびワイヤを被覆している
銅などの元素を含むスパッタが弱酸化状態でノズル（−
付着した場合、この酸化物はセラミックスとの親和性を
有するので、金属系ノズルよりも強固に接着しやすい。In particular, when a ceramic nozzle is used in carbon dioxide arc welding, the spatter containing elements such as manganese and silicon added as a deoxidizing agent to the filler electrode wire and copper coating the wire is in a weakly oxidized state. Press the nozzle (-
When attached, this oxide has an affinity for ceramics, so it is easier to bond more firmly than a metal nozzle.
一般にマンガン、ケイ素および銅の酸化物はセラミック
スの接合材として使用されることからもこの現象は説明
できる。This phenomenon can also be explained by the fact that manganese, silicon, and copper oxides are generally used as bonding materials for ceramics.
セラミックス系ノズルはスパッタの付着力が強いため、
付着スパッタの機械的な剥離を行う時しばしばノズル先
端部に欠損を生じることも知られている。セラミックス
系が金属系ノズルよりもはるかに耐熱性に優れるにもか
かわらず、スパッタ発生量の少ないイナートガスアーク
溶接のＴＩＧ溶接８１以外あまり利用されないのは、付
着スパッタの剥離性に難があるためである。Ceramic nozzles have strong sputter adhesion, so
It is also known that defects often occur at the nozzle tip when mechanically removing adhering spatter. Even though ceramic nozzles have much better heat resistance than metal nozzles, they are not used much other than TIG welding 81 for inert gas arc welding, which generates less spatter, because it is difficult to remove adhering spatter. .
本発明は、前述のノズル先端部の溶損防止、付着スパッ
タ量の軽減および付着スパッタの剥離性を改善したセラ
ミックス系のアーク溶接用トーチノズルを提供するもの
である。The present invention provides a ceramic-based arc welding torch nozzle that prevents erosion of the nozzle tip, reduces the amount of attached spatter, and improves the peelability of attached spatter.
本発明のノズルはセラミックスを基材とし、その表面に
合金メッキもしくは合金＋セラミックスからなるコンポ
ジットメッキの処理をしたものから構成される。The nozzle of the present invention is made of ceramic as a base material, the surface of which is coated with alloy plating or composite plating consisting of alloy and ceramics.
セラミックスは液相出現温度が１４００’Ｃ以上の固体
の無機材料を対象とし、具体的には７５重１１％（特に
指定のない限り以下％として表す）以上のアルミナを含
むセラミックス系を始めとして、アルミナ−シリカ系、
アルミナ−カルシア系、炭化ケイ素系および窒化ケイ素
系の各県を指す。これらは焼結、熱間静水圧および熱間
圧縮等の方法でノズル形状に固化するか、固化後加工に
より指定形状に仕上げ、その後無電解メッキ処理を行う
ことに特徴がある。Ceramics refers to solid inorganic materials with a liquid phase appearance temperature of 1400'C or higher, including ceramics containing alumina of 75% by weight or 11% (unless otherwise specified, expressed as %) or higher. Alumina-silica system,
Refers to each prefecture of alumina-calcia type, silicon carbide type, and silicon nitride type. These materials are characterized in that they are solidified into a nozzle shape by methods such as sintering, hot isostatic pressure, and hot compression, or are finished into a specified shape by processing after solidification, and then subjected to electroless plating.
発明者の知見によると、最も好適なメッキはＮ１−Ｐ、
Ｎ１−Ｂの各合金メッキまたはＮ１−Ｐ−ＢＮ、Ｎｉ
−Ｐ−８ｉＣのコンポジットメッキである。これらは単
一もしくは組み合わせてメッキしても良い。According to the inventor's knowledge, the most suitable plating is N1-P,
N1-B alloy plating or N1-P-BN, Ni
-P-8iC composite plating. These may be plated singly or in combination.
Ｎ１−Ｐ、Ｎ１−８合金メッキは高温における金属酸化
物のメッキ層への拡散を防止するバリアーとして最適で
ある。ノズルにＮ１−Ｐ％Ｎ１−８合金メッキをするこ
とによって、付着スパッタは減少しがつ容易に剥離でき
るようＣ二なった。N1-P and N1-8 alloy plating is optimal as a barrier to prevent metal oxide from diffusing into the plating layer at high temperatures. By plating the nozzle with an N1-P%N1-8 alloy, adhesion spatter was reduced and C2 was easily peeled off.
Ｎｉ −Ｐ −Ｂ Ｎコンポジットメッキは潤滑性に富
む六方晶型ＢＮをＮ１−Ｐメッキ層に分散させ°るこ−
とによって、付着スパッタの剥離性をさらに改善するこ
とができる。加えてＢＮはノズル使用時に加わるメッキ
層の熱応力を緩和することもでき、ノズルを加熱した時
に生じやすいメッキ１−の亀裂発生もしくは基材からの
剥離を防止できるようになる。Ni-P-BN composite plating is achieved by dispersing hexagonal BN, which is rich in lubricity, into the N1-P plating layer.
By doing so, the removability of the deposited sputter can be further improved. In addition, BN can also relieve the thermal stress applied to the plating layer when the nozzle is used, making it possible to prevent the plating 1- from cracking or peeling from the base material, which tends to occur when the nozzle is heated.
Ｎｉ −Ｐ −８ｉＣコンポジツトメッキはＮｉ −Ｐ
−ＢＮと同様に付着スパッタの剥離性を増し、メッキ
層に加わる熱応力を緩和させる効果を有する。Ni-P-8iC composite plating is Ni-P
- Like BN, it has the effect of increasing the releasability of deposited sputtering and relieving thermal stress applied to the plating layer.
以下にメッキ層組成の限定理由を述べる。The reasons for limiting the composition of the plating layer will be described below.
Ｎ１−Ｐメッキ二ニッケル８６〜９７％、リン：３〜１
４％の範囲とする。その理由はニッケルが８５％以下、
リン１５９４６以上にすると％溶接中５＝ノズルの受け
る熱によって、アモルファスであるメッキ層からＮｉ３
Ｐ等の金属間化合物のみが形成される。さらにリン含有
率が茜まるとＮ１５Ｐ２、Ｎｉ７Ｐａ、Ｎｉ２Ｐ％Ｎｉ
６Ｐ５ 、Ｎ１Ｐ２、およびＮｉＰａの金属間化合物が
形成されるようになる。N1-P plating Ni 86-97%, Phosphorus: 3-1
The range shall be 4%. The reason is that the nickel content is less than 85%.
If the phosphorus is 15946 or more, the heat received by the nozzle during welding will remove Ni3 from the amorphous plating layer.
Only intermetallic compounds such as P are formed. Furthermore, when the phosphorus content is increased to a red circle, N15P2, Ni7Pa, Ni2P%Ni
Intermetallic compounds of 6P5, N1P2, and NiPa begin to form.
大部分が金属間化合物のみになるとメッキ層の靭性は失
われると共に、セラミックス基材との密着性が低下する
。If most of the plating layer is composed of only intermetallic compounds, the toughness of the plating layer will be lost and the adhesion to the ceramic substrate will be reduced.
ニッケルが９８％ａ上、リンが２％以下であると、メッ
キ層への金属酸化物の拡散を防止するバリアーとしての
効果が失われる。よつて、Ｎ１−Ｐメッキ層の組成はニ
ッケル８６〜９７％、リン３〜１４％の範囲とする。If the nickel content is 98% a or more and the phosphorus content is 2% or less, the effect as a barrier for preventing metal oxide diffusion into the plating layer is lost. Therefore, the composition of the N1-P plating layer is in the range of 86 to 97% nickel and 3 to 14% phosphorus.
Ｎｉ −Ｂメッキ二ニッケル；９２〜９９％、ボロン；
１〜８％の範囲とする。限定理由はニッケルが９１％Ｊ
／ｉ下、ボロンが９％以上であると溶接中にノズルが受
ける熱によってアモルファスであるメッキ層からほとん
ど金属部分のないＮｉ２Ｂ 。Ni-B plating dinickel; 92-99%, boron;
The range is 1 to 8%. The reason for the limitation is that nickel is 91% J.
Under /i, when boron is 9% or more, there is almost no metal part from the amorphous plating layer due to the heat received by the nozzle during welding.
Ｎ１５Ｂｚ 、およびＮｉＢの金属間化合物のみが形成
される。大部分が金属間化合物のみになると前述と同様
Ｃニメッキ層の靭性が失われるとともに、セラミックス
基材との密着性が低下する。ニッケルが９９％以上、ボ
ロンが１％以下であると、メッキ層への金属酸化物の拡
散を防止するバリアーとしての効果が失われる。よつて
、Ｎ１−Ｂメッキ層の組成はニッケル９２〜９９％、ボ
ロン１〜８％の範囲とする。Only N15Bz and NiB intermetallic compounds are formed. If most of the material is composed of intermetallic compounds, the toughness of the C double-plated layer will be lost as described above, and the adhesion to the ceramic base material will be reduced. If the nickel content is 99% or more and the boron content is 1% or less, the effect as a barrier for preventing diffusion of metal oxides into the plating layer is lost. Therefore, the composition of the N1-B plating layer is in the range of 92 to 99% nickel and 1 to 8% boron.
Ｎｉ −Ｐ −Ｂ Ｎコンポジットメッキ：メッキの組
成でペースとなるＮ１−Ｐがニッケル８６〜９７％、リ
ン３〜１４％の範囲にあるものであって、Ｎ１−ＰとＢ
Ｎの構成比率が４５〜９９容１ｉ％：１〜５５容量％か
らなるコンポジットメッキである。Ｎ１−Ｐの比率が４
４容量％以下、ＢＮの比率が５６容量％以上になるとコ
ンポジットメッキの基材に対する密着力が低下する。Ni-P-B N composite plating: N1-P, which is the paste in the plating composition, is in the range of 86 to 97% nickel and 3 to 14% phosphorus, and N1-P and B
This is a composite plating in which the composition ratio of N is 45 to 99% by volume: 1 to 55% by volume. The ratio of N1-P is 4
When the ratio of BN is less than 4% by volume and more than 56% by volume, the adhesion of the composite plating to the base material decreases.
Ｎ１−Ｐの比率が９９．１容量％以上、ＢＮの比率が０
．９容量％以下になると付着スパッタの剥離性はＮ１−
Ｐメッキと差がなくなる。よって、Ｎｉ −Ｐ−ＢＮの
Ｎｉ −ＰとＢＮの構成比率は４５〜９９容量％：１〜
５５容量％とした。N1-P ratio is 99.1% by volume or more, BN ratio is 0
．． When the amount is less than 9% by volume, the removability of the attached sputter is N1-
There is no difference from P plating. Therefore, the composition ratio of Ni-P and BN in Ni-P-BN is 45-99% by volume: 1-
It was set to 55% by volume.
Ｎｉ −Ｐ −ＳｉＣコンポジットメッキ；メッキの組
成でペースとなるＮｉ −Ｐはニッケル８６〜９７％、
リン３〜１４％の範囲にあるものであって、Ｎ１−Ｐと
８ｉＣの構成比率が４５〜９９容量％＝１〜５５容量％
からなるコンポジットメッキである。Ｎ１−Ｐの比率が
４４容量％以下、ＳｉＣの比率が５６容１＊以上になる
と前記と同様にメッキの基材に対する密着力が低下する
と共にメッキ層の靭性も低下する。Ｎ１−Ｐの比率が９
９．１容量％以上、ＳｉＣの比率が０．９容量９Ｖ）以
下になると、付着スパッタの剥離性はＮ１−Ｐメッキと
差がすくナル。ヨう”Ｃ、Ｎ１−Ｐ −ＳｉＣノＮ１−
Ｐ トＳｉＣの構成比率は４５〜９９容１ｉ％：１〜５
５容量％とした。、
なお、メッキ層の厚さは１μから１００μ、好ましくは
５μから２５μの範囲で使用するのが良い。Ni-P-SiC composite plating; Ni-P, which is the paste in the plating composition, is 86-97% nickel,
Phosphorus is in the range of 3-14%, and the composition ratio of N1-P and 8iC is 45-99% by volume = 1-55% by volume
It is a composite plating consisting of. When the ratio of N1-P is less than 44% by volume and the ratio of SiC is more than 56% by volume, the adhesion of the plating to the base material decreases as well as the toughness of the plating layer, as described above. The ratio of N1-P is 9
When the ratio of SiC is 9.1% by volume or more and the ratio of SiC is 0.9% by volume (9V) or less, the removability of attached sputtering is very different from N1-P plating. YO"C, N1-P -SiCノN1-
The composition ratio of P and SiC is 45-99 volume 1i%: 1-5
The amount was 5% by volume. The thickness of the plating layer is preferably in the range of 1μ to 100μ, preferably 5μ to 25μ.
以下本発明の実施例について説明する。Examples of the present invention will be described below.
実施例１゜
アルミナ粉９５％、酸化クロム粉５％を混合、成形、焼
結して、外径２１ｍｍ０１内径１６ｍｍ、１、長さ７３
ｍｍのセラミックス系ノズルを作り、アルカリ脱脂後、
フッ酸を含む酸性溶液でエツチングし、キャタライジン
グ処理を実施し、ニッケル含有量６ａｌｌのニッケルリ
ン浴でメッキした。得られたメッキは厚さ１７μでニッ
ケル中に１２９りのリンを含む。このノズルを炭酸ガス
溶接機を用い、付着スパッタ量および剥離性の評価テス
トを実施した。Example 1゜95% alumina powder and 5% chromium oxide powder were mixed, molded, and sintered to form a product with an outer diameter of 21 mm, an inner diameter of 16 mm, and a length of 73 mm.
After making a mm ceramic nozzle and degreasing it with alkaline,
Etching was performed with an acidic solution containing hydrofluoric acid, catalytic treatment was performed, and plating was performed in a nickel-phosphorus bath with a nickel content of 6all. The resulting plating was 17μ thick and contained 129 phosphorus in nickel. Using this nozzle, a carbon dioxide gas welding machine was used to evaluate the amount of attached spatter and peelability.
溶接条件は
材料；軟鋼板、１ 電極ワイヤ；軟鋼１．２ ｍｍ ｌ
電圧−電流；３３Ｖ−３０ＯＡ
炭酸ガス ； ２０ Ｉ！／ｍｉｎ
溶接速度 ： ３０〜３４ ａｒｍ ／ ｍｉｎ材料−
ノズル間距離：２０■
姿 勢；下向き 溶接時間；１０分／回としビードオ
ンプレートで実施した。Welding conditions are Material: Mild steel plate, 1 Electrode wire: Mild steel 1.2 mm l
Voltage-current; 33V-30OA Carbon dioxide gas; 20 I! /min Welding speed: 30~34 arm/min Material-
Distance between nozzles: 20cm Posture: downward Welding time: 10 minutes/time Welding was carried out using bead-on-plate.
結果を第１表に示す。The results are shown in Table 1.
実施例２
アルミナ５５％、シリカ４５％の組成からなるアルミナ
−シリカ系（ムライト）のノズルをアルカリ脱脂後、ク
ロムを含む酸性溶液でエツチングし、キャタライジング
処理を実施し、ニッケル含有！ ４．８ ｇ／ ｌのニ
ッケルリン浴でメッキした。Example 2 An alumina-silica type (mullite) nozzle with a composition of 55% alumina and 45% silica was degreased with an alkali, etched with an acidic solution containing chromium, and subjected to catalyzing treatment to produce a nozzle containing nickel! Plated with a 4.8 g/l nickel phosphorus bath.
得られたメッキは厚さ５μでニッケル中に１４％のリン
を含む。The resulting plating is 5 microns thick and contains 14% phosphorus in nickel.
このノズルを実施例１に示す条件で評価テストを実施し
た。An evaluation test was conducted on this nozzle under the conditions shown in Example 1.
実施例３゜
シリコンナイトライド９２％、アルミナ２％、イツトリ
ア５％の組成からなるノズルをアルカリ脱脂後、フッ酸
とクロム酸を含む酸性溶液でエツチングし、キャタライ
ジング処理を実施し、ニッケル・ボロン浴でメッキした
。得られたメッキは厚さ１０μでニッケル中に８％のボ
ロンを含む。Example 3 A nozzle with a composition of 92% silicon nitride, 2% alumina, and 5% yttoria was degreased with alkali, etched with an acidic solution containing hydrofluoric acid and chromic acid, and subjected to catalytic treatment to remove nickel and boron. Plated in bath. The resulting plating was 10 microns thick and contained 8% boron in nickel.
このノズルを実施例１に示す条件で評価した。This nozzle was evaluated under the conditions shown in Example 1.
実施例４゜
シリコンカーバイド８４．４ ％、アルミナ１５％、炭
素０．６％を混合、圧粉、成形、焼結して得たノズルを
弱アルカリ脱脂後、クロム酸を含む酸性溶液でエツチン
グし、キャタライジング処理を実施し、ニッケル含有量
３ｓ／／でＢＮ粒子を分散させたニッケルリン浴でメッ
キした。得られたメッキは厚さ３５μで、構成比（容１
１％）はＮ１−ｐ：ＢＮが６２：３ｇである。Example 4 A nozzle obtained by mixing 84.4% silicon carbide, 15% alumina, and 0.6% carbon, pressing, molding, and sintering was degreased with a weak alkali, and then etched with an acidic solution containing chromic acid. , a catalytic treatment was performed, and plating was performed in a nickel-phosphorous bath in which BN particles were dispersed with a nickel content of 3 s//. The obtained plating has a thickness of 35μ and a composition ratio (volume 1
1%) has a ratio of N1-p:BN of 62:3 g.
このノズルを実施例１に示す条件で評価した。This nozzle was evaluated under the conditions shown in Example 1.
実施例５゜
アルミナ８２％、酸化カルシュラム３％、ジルコニア１
５％の組成からなるノズルをアルカリ脱脂後、酸性溶液
でエツチングし、キャタライジング処理を実施し、ニッ
ケル含有量５ｇ／ｌでＢＮ粒子を分散させたニッケルリ
ン浴でメッキした。Example 5゜82% alumina, 3% calcilum oxide, 1 zirconia
After alkali degreasing, a nozzle with a composition of 5% was etched with an acidic solution, subjected to a catalytic treatment, and plated with a nickel-phosphorus bath containing BN particles dispersed therein with a nickel content of 5 g/l.
得られたメッキは厚さ２５μで構成比（容量％）はＮ１
−Ｐ：ＢＮが７８：２２である。The resulting plating has a thickness of 25μ and a composition ratio (volume %) of N1.
-P:BN is 78:22.
このノズルを実施例１に示す条件で評価した。This nozzle was evaluated under the conditions shown in Example 1.
実施例６゜
アルミナ８２％、シリカ１２％の組成からなるアルミナ
−シリカ系（ムライト）を７０％とジルコニア３０％を
混合、圧粉、成形、焼結して得たノズルをアルカリ脱脂
後、フッ酸とクロム酸を含む酸性溶液でエツチングし、
キャタライジング処理を実施し、ニッケル含有量６ ｗ
／ｌで、ＳＩＣ粒子を分散させたニッケルリン浴でメッ
キした。得られたメッキは厚さ２２μで構成比（容量％
）はＮ１−ｐ：ｓｔｃが９５：５である・
このノズルな実施例１に示す条件で評価した。Example 6゜A nozzle obtained by mixing 70% alumina-silica (mullite) with a composition of 82% alumina and 12% silica and 30% zirconia, compacting, molding, and sintering was degreased with alkali and then fluoresced. Etching with an acidic solution containing acid and chromic acid,
Catalyzing treatment to reduce nickel content to 6w
Plating was carried out in a nickel phosphorus bath in which SIC particles were dispersed at a concentration of 100 ml. The obtained plating has a thickness of 22μ and the composition ratio (volume %)
) has N1-p:stc of 95:5. This nozzle was evaluated under the conditions shown in Example 1.
なお、市販の金属系ノズルとメッキ処理をしてないセラ
ミックスノズルについても比較例として示した。A commercially available metal nozzle and a ceramic nozzle that has not been plated are also shown as comparative examples.
第１表 材料別実験結果 ×：剥離にかなり力を要するか、不可能。Table 1: Experimental results by material ×: Separation requires considerable force or is impossible.
○：剥離に力を要するが、可能である。○: Peeling requires force, but is possible.
◎：容易（二剥離できる。◎: Easy (can be peeled off twice).
ノズル先端が欠損した場合も３０回までテストを実施。Tests are conducted up to 30 times even if the nozzle tip is damaged.
第１表で明らかにした様に、セラミックス基材に合金メ
ッキ又はコンポジプトメプキをしたアーク溶接用ノズル
は従来品と比べてスパッタ付２ｍが１７２〜１／３に減
少し、かつスパッタの剥離性が低下しく二くいという特
徴がある。そのため、スパッタ剥離作業回数の減少、ノ
ズルの長寿命化にすぐれた効果を有する。As shown in Table 1, the arc welding nozzle with alloy plating or composite plating on the ceramic base material has a reduction of 2 m with spatter by 172 to 1/3 compared to conventional products, and the peeling of spatter has been reduced by 172 to 1/3. It is characterized by a decrease in sex and a 2-year-old man. Therefore, it has excellent effects in reducing the number of sputter stripping operations and extending the life of the nozzle.
Claims (6)
ズルにおいて、セラミックス表面に合金メッキ又は合金
＋セラミックスからなるコンポジットメッキをしたアー
ク溶接用トーチノズル。(1) An arc welding torch nozzle that uses ceramic as a base material and has the ceramic surface coated with alloy plating or composite plating consisting of alloy and ceramics.
以下、リン３重量傷以上１４重量％以下である特許請求
の範囲第１項記載のアーク溶接用トーチノズル。(2) Alloy plating is 86% or more by weight of nickel and 97% by weight.
The arc welding torch nozzle according to claim 1, wherein the phosphorus content is 3% by weight or more and 14% by weight or less.
以下、ボロン１重量％以上８重量％以下である特許請求
の範囲第１項記載のアーク溶接用トーチノズル。(3) Alloy plating is 92% or more by weight of nickel or 99% by weight.
The torch nozzle for arc welding according to claim 1, wherein the content of boron is 1% by weight or more and 8% by weight or less.
７重量％以下、リン３重量％以上１４重量％以下である
合金メッキが４５重量％以上９９重量％以下であって、
六方晶の結晶構造を有する窒化ホウ素が１容量％以上５
５容量％以下である特許請求の範囲第１項記載のアーク
溶接用トーノズル。(4) Composite plating is 86% or more of nickel by weight9
The alloy plating is 7% by weight or less and 3% by weight or more and 14% by weight or less of phosphorus is 45% by weight or more and 99% by weight or less,
Boron nitride with a hexagonal crystal structure is 1% by volume or more5
The toe nozzle for arc welding according to claim 1, wherein the content is 5% by volume or less.
７重量％以下、リン３重量％以上１４重量％以下である
合金メッキが４５重量％以上９９重量％以下、シリコン
カーバイドが１容量％以上５５容量％以下からなる特許
請求の範囲第１項記載のアーク溶接用トーチノズル。(5) Composite plating is 86% or more of nickel by weight9
7% by weight or less, phosphorus from 3% to 14% by weight, alloy plating from 45% to 99% by weight, and silicon carbide from 1% by volume to 55% by volume according to claim 1. Torch nozzle for arc welding.
から１００μとした特許請求の範囲第１項記載のアーク
溶接用トーチノズル。(6) Thickness of alloy plating or composite plating is 1μ
The arc welding torch nozzle according to claim 1, wherein the arc welding torch nozzle has a diameter of 100μ.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33005087A JPH01180785A (en) | 1987-12-28 | 1987-12-28 | Torch nozzle for arc welding |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33005087A JPH01180785A (en) | 1987-12-28 | 1987-12-28 | Torch nozzle for arc welding |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01180785A true JPH01180785A (en) | 1989-07-18 |
Family
ID=18228217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33005087A Pending JPH01180785A (en) | 1987-12-28 | 1987-12-28 | Torch nozzle for arc welding |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01180785A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004108338A1 (en) | 2003-06-04 | 2004-12-16 | Mitsubishi Denki Kabushiki Kaisha | Nozzle for processing machinery, contact tip for welding, method of manufacturing the nozzle for the processing machinery, and method of manufacturing the contact tip for welding |
| JP2012218046A (en) * | 2011-04-12 | 2012-11-12 | Panasonic Corp | Welding contact tip |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61216867A (en) * | 1985-03-22 | 1986-09-26 | Toyota Motor Corp | Ceramic contact tip for arc welding and its production |
-
1987
- 1987-12-28 JP JP33005087A patent/JPH01180785A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61216867A (en) * | 1985-03-22 | 1986-09-26 | Toyota Motor Corp | Ceramic contact tip for arc welding and its production |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004108338A1 (en) | 2003-06-04 | 2004-12-16 | Mitsubishi Denki Kabushiki Kaisha | Nozzle for processing machinery, contact tip for welding, method of manufacturing the nozzle for the processing machinery, and method of manufacturing the contact tip for welding |
| EP1629924A1 (en) * | 2003-06-04 | 2006-03-01 | Mitsubishi Denki Kabushiki Kaisha | Nozzle for processing machinery, contact tip for welding, method of manufacturing the nozzle for the processing machinery, and method of manufacturing the contact tip for welding |
| EP1629924A4 (en) * | 2003-06-04 | 2008-09-03 | Mitsubishi Electric Corp | Nozzle for processing machinery, contact tip for welding, method of manufacturing the nozzle for the processing machinery, and method of manufacturing the contact tip for welding |
| JP2012218046A (en) * | 2011-04-12 | 2012-11-12 | Panasonic Corp | Welding contact tip |
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