JPH01173040A - Glass pattern for photoengraving - Google Patents
Glass pattern for photoengravingInfo
- Publication number
- JPH01173040A JPH01173040A JP62333063A JP33306387A JPH01173040A JP H01173040 A JPH01173040 A JP H01173040A JP 62333063 A JP62333063 A JP 62333063A JP 33306387 A JP33306387 A JP 33306387A JP H01173040 A JPH01173040 A JP H01173040A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- glass
- transparent resin
- granules
- brought
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 47
- 239000011241 protective layer Substances 0.000 claims abstract description 7
- 239000002245 particle Substances 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 4
- 238000001259 photo etching Methods 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 abstract description 7
- 239000011347 resin Substances 0.000 abstract description 7
- 229920005989 resin Polymers 0.000 abstract description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- 239000008187 granular material Substances 0.000 abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000007666 vacuum forming Methods 0.000 abstract 1
- 239000007769 metal material Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、フォトエツチング法、エレクトロフォーミン
グ法等にて金属加工製品を製造する際の製版工程で使用
されるガラスパターンに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a glass pattern used in a plate-making process when manufacturing metal products by photoetching, electroforming, or the like.
フォトエツチング法にて金属加工製品を製造する際の製
版工程は、フォトレジストをコーティングした厚さ0.
10〜0.30mmの金属素材にガラスパターンを密着
させ、次いで露光させ、パターンを金属素材に焼き付け
る工程をいう。The plate-making process when manufacturing metal products using the photo-etching method uses photoresist coated with a thickness of 0.
A process in which a glass pattern is closely attached to a metal material with a thickness of 10 to 0.30 mm, and then exposed to light to print the pattern onto the metal material.
この製版工程で使用されるガラスパターンは、第3図に
示すようにガラス板2とその上面に形成されたパターン
lとからなるが、このガラスパターンは原版として使用
され、何回も金属素材に焼き付けが行われるものである
ため、パターン面には保護膜3がコーティングされてい
る。そして第2図(a)に示すように、フォトレジスト
6を両面に塗布した金属素材5を2枚のガラスパターン
で両面から挟むに際して、それぞれのパターン面が金属
素材5に対向するように配置し、次いで開閉装置(図示
せず)によりガラスパターンと金属素材を合わせ、真空
引きを行って密着させ第2図(b)に示すように、紫外
線を照射して露光させる。金属素材は露光後、現像工程
、エソチング工程にかけられて微細加工される。The glass pattern used in this plate-making process consists of a glass plate 2 and a pattern l formed on its upper surface, as shown in Figure 3. This glass pattern is used as an original plate and is applied to metal materials many times. Since baking is performed, the pattern surface is coated with a protective film 3. Then, as shown in FIG. 2(a), when the metal material 5 coated with photoresist 6 on both sides is sandwiched between two glass patterns from both sides, each patterned surface is placed so as to face the metal material 5. Next, the glass pattern and the metal material are brought together using an opening/closing device (not shown), evacuated to bring them into close contact, and exposed to ultraviolet rays as shown in FIG. 2(b). After exposure, the metal material is microfabricated through a development process and an ethoching process.
上記従来の工程におけるガラスパターンと金属素材を密
着させる工程は精密性を要求されるため、真空引きを必
要とするがガラス板の表面はフラットであり、しかもガ
ラスパターン自体、上述の如くサイズも大きく、ガラス
パターンと金属素材を完全に密着させるには時間を要す
るのが現状である。しかも真空引きはガラス板の端部か
ら行われるが、パターン部はガラス板の中心部にあるた
め真空になりに<<、真空度が不完全な状態で露光され
ると、所謂「真空かぶり」現象がおこり、パターン下部
に光が廻り込み、製版寸法がシフトしてしまうという問
題が生じる。The process of bringing the glass pattern and metal material into close contact in the above conventional process requires precision and requires vacuuming, but the surface of the glass plate is flat, and the glass pattern itself is large in size as described above. Currently, it takes time to completely bring the glass pattern and the metal material into close contact. Moreover, the vacuum is drawn from the edge of the glass plate, but since the pattern area is located in the center of the glass plate, a vacuum is generated.If exposure is performed with incomplete vacuum, so-called "vacuum fog" may occur. This phenomenon occurs, causing light to go around to the bottom of the pattern, causing a problem in that the plate dimensions shift.
そのために、本発明はフォトエツチングによる金属加工
に使用する製版用ガラスパターンにおいて、パターン表
面の保護層に透明な硬質粒体を分散させることによりこ
の問題の解決を図った。Therefore, the present invention has attempted to solve this problem by dispersing transparent hard particles in a protective layer on the pattern surface in a plate-making glass pattern used for metal processing by photoetching.
透明な硬質粒体としては、ガラスを細かく砕いたものを
好適に使用しうるが、保護層である透明樹脂に溶融しな
い透明な硬質ポリマー粒体を使用してもよい。As the transparent hard particles, finely crushed glass can be suitably used, but transparent hard polymer particles that do not melt in the transparent resin that is the protective layer may also be used.
〔作用〕
パターン表面の保護層に透明な硬質粒体を分散させるこ
とにより、その保1!層表面に硬質粒体が露出して保護
層表面に粗度単位(Ra)で0.1〜0.5μmの凹凸
が形成されるため、ガラスパターンと金属素材との間に
空気の通り道ができ、真空引きを容易におこなうことが
できる。[Function] By dispersing transparent hard particles in the protective layer on the pattern surface, its maintenance is improved! Hard particles are exposed on the surface of the layer, forming irregularities of 0.1 to 0.5 μm in roughness units (Ra) on the surface of the protective layer, creating air passages between the glass pattern and the metal material. , vacuuming can be easily performed.
以下、図面を参照しつつ実施例を説明する。 Examples will be described below with reference to the drawings.
第1図は本発明のガラスパターン断面図、第2図(a)
は金属素材とガラスパターンを密着させる前の状態を示
す断面図、第2図(b)は金属素材とガラスパターンを
密着させ露光させている状態を示す断面図、第3図は従
来のガラスパターン断面図である。Figure 1 is a sectional view of the glass pattern of the present invention, Figure 2 (a)
is a cross-sectional view showing the state before the metal material and the glass pattern are brought into close contact, FIG. 2(b) is a cross-sectional view showing the state in which the metal material and the glass pattern are brought into close contact and exposed, and FIG. 3 is the conventional glass pattern. FIG.
lはパターン、2はガラス板、3は保護膜、4は硬質粒
体、5は金属素材、6はフォトレジストを示す。1 is a pattern, 2 is a glass plate, 3 is a protective film, 4 is a hard grain, 5 is a metal material, and 6 is a photoresist.
第1に示すように、一方の面にパターン1が形成された
厚さ約6mmのガラス板(、!100cm×横80mm
)2のパターン部面に、細かく擦り潰したガラス粒4を
分散させた透明樹脂を、ガラス板パターン部上面よりノ
ズルを使用して掛は流し、コーティングして保護膜3を
形成した。ガラス粒4を分散さ曵た透明樹脂の組成は、
SiO□5〜20、透明樹脂20〜50、アルコール(
溶剤)40〜70(wt%)のものである。次いで、ガ
ラスパターンを室温乾燥させて溶剤を飛ばし、保護膜を
密着させるために150〜180℃で高温処理した。As shown in Figure 1, a glass plate with a thickness of about 6 mm (!100 cm x 80 mm width) with pattern 1 formed on one side.
) A transparent resin containing finely ground glass grains 4 dispersed therein was poured onto the patterned surface of the glass plate using a nozzle from above the patterned surface of the glass plate, and was coated to form a protective film 3. The composition of the transparent resin in which the glass particles 4 are dispersed is as follows:
SiO□5~20, transparent resin 20~50, alcohol (
Solvent) 40-70 (wt%). Next, the glass pattern was dried at room temperature to remove the solvent, and then treated at a high temperature of 150 to 180°C to adhere the protective film.
形成されたガラスパターンの表面は、表面で固化した゛
ガラス粒4のために、粗度単位(Ra)で0.1〜0.
5μmの凹凸があった。The surface of the formed glass pattern has a roughness of 0.1 to 0.0 in roughness units (Ra) due to the glass particles 4 solidified on the surface.
There were irregularities of 5 μm.
真空引きの程度は、真空引きが不充分な場合は製品の製
版寸法がシフトするので、その画像性でチエツクするこ
とができ、またガラス面のニュウトンリングの動きを検
出して、その動きが停止した段階で確認しうる。The degree of vacuuming can be checked by looking at the image quality, as if the vacuuming is insufficient, the plate dimensions of the product will shift, and the movement of the Newton ring on the glass surface can be detected and its movement stopped. You can check it at that stage.
従来のガラスパターンでは平均1分必要としていた真空
引きが、本発明のガラスパターンでは平均15〜30秒
と従来比で半分以上の早さで真空引きが可能となった。While the conventional glass pattern required an average of 1 minute to draw a vacuum, the glass pattern of the present invention allows the vacuum to be drawn in an average of 15 to 30 seconds, which is more than half the speed of the conventional glass pattern.
保護層に透明な硬質粒体を分散させることにより、製版
工程におけるガラスパターンと金属素材との密着性を高
める真空引き作業を極めて迅速に行うことが可能となり
、パターンに起因する製品不良数の低減またガラスパタ
ーンの強度が向上し、多数回の露光工程に耐えるものと
なった。By dispersing transparent hard particles in the protective layer, it is possible to perform the vacuum operation extremely quickly to improve the adhesion between the glass pattern and the metal material during the plate-making process, reducing the number of product defects caused by the pattern. Additionally, the strength of the glass pattern has been improved, making it able to withstand multiple exposure steps.
第1図は本発明のガラスパターン断面図、第2図(a)
は金属素材とガラスパターンを密着させる前の状態を示
す断面図、第2図(b)は金属素材とガラスパターンを
密着させ露光させている状態を示す断面図、第3図は従
来のガラスパターン断面図である。
lはパターン、2はガラス板、3は保護膜、4は硬質粒
体、5は金属素材、6はフォトレジストを示す。
出 願 人 大日本印刷株式会社代理人 弁理士
内1)亘彦(外3名)(レフFigure 1 is a sectional view of the glass pattern of the present invention, Figure 2 (a)
is a cross-sectional view showing the state before the metal material and the glass pattern are brought into close contact, FIG. 2(b) is a cross-sectional view showing the state in which the metal material and the glass pattern are brought into close contact and exposed, and FIG. 3 is the conventional glass pattern. FIG. 1 is a pattern, 2 is a glass plate, 3 is a protective film, 4 is a hard grain, 5 is a metal material, and 6 is a photoresist. Applicant Dai Nippon Printing Co., Ltd. Agent Patent Attorney (1) Nobuhiko (3 others) (Ref.
Claims (1)
ラスパターンにおいて、パターン表面の保護層に透明な
硬質粒体を分散させたことを特徴とする製版用ガラスパ
ターン。A plate-making glass pattern used for metal processing by photo-etching, characterized in that transparent hard particles are dispersed in a protective layer on the pattern surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33306387A JP2558304B2 (en) | 1987-12-28 | 1987-12-28 | Glass pattern for plate making |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33306387A JP2558304B2 (en) | 1987-12-28 | 1987-12-28 | Glass pattern for plate making |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01173040A true JPH01173040A (en) | 1989-07-07 |
JP2558304B2 JP2558304B2 (en) | 1996-11-27 |
Family
ID=18261849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33306387A Expired - Fee Related JP2558304B2 (en) | 1987-12-28 | 1987-12-28 | Glass pattern for plate making |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2558304B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03114845U (en) * | 1990-03-07 | 1991-11-26 | ||
JPH0491351U (en) * | 1990-12-21 | 1992-08-10 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4845304A (en) * | 1971-10-11 | 1973-06-28 | ||
JPS5427707A (en) * | 1977-08-03 | 1979-03-02 | Fujitsu Ltd | Inter-unit information transfer circuit on redundancy system |
JPS567960U (en) * | 1979-06-28 | 1981-01-23 | ||
JPS6086545A (en) * | 1983-10-17 | 1985-05-16 | Fujitsu Ltd | Mask protective film |
-
1987
- 1987-12-28 JP JP33306387A patent/JP2558304B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4845304A (en) * | 1971-10-11 | 1973-06-28 | ||
JPS5427707A (en) * | 1977-08-03 | 1979-03-02 | Fujitsu Ltd | Inter-unit information transfer circuit on redundancy system |
JPS567960U (en) * | 1979-06-28 | 1981-01-23 | ||
JPS6086545A (en) * | 1983-10-17 | 1985-05-16 | Fujitsu Ltd | Mask protective film |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03114845U (en) * | 1990-03-07 | 1991-11-26 | ||
JPH0491351U (en) * | 1990-12-21 | 1992-08-10 |
Also Published As
Publication number | Publication date |
---|---|
JP2558304B2 (en) | 1996-11-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2322874A1 (en) | METHOD OF PHOTO PRINTING A PLATE | |
JP2515521B2 (en) | Improved masking exposure method and plate making method using the same | |
JPH01173040A (en) | Glass pattern for photoengraving | |
US5112707A (en) | Mask structure for lithography | |
US4588676A (en) | Photoexposing a photoresist-coated sheet in a vacuum printing frame | |
JPH11185605A (en) | Forming method of barrier rib for plasma display panel back substrate and forming device | |
JPH07294720A (en) | Color filter intermediate product and production of color filter | |
JP3229722B2 (en) | Method for forming barrier of plasma display panel | |
JP3279754B2 (en) | Method for forming barrier of plasma display panel | |
JPS5984245A (en) | Photomask | |
KR940007799B1 (en) | Letterpress for transferring and method of transferring by use of the letterpress for transferring | |
JP2529107B2 (en) | Screen printing plate manufacturing method | |
JP2558304C (en) | ||
JPS6111673B2 (en) | ||
JPH0745191A (en) | Barrier forming method of plasma display panel | |
JPH0745192A (en) | Barrier forming method of plasma display panel | |
JPH01189655A (en) | Emulsion-coated photographic dry plate | |
JPS58126988A (en) | Manufacture of shadow mask | |
JPH0432846A (en) | Letterpress for transfer and production thereof | |
JPS59211045A (en) | Method for contact exposure of positive type photoresist | |
JPS61267762A (en) | Production of photomask | |
UST954002I4 (en) | Process for increasing mask life | |
JPH01154156A (en) | Light shieldable film-deposited substrate and substrate with light shielding pattern | |
JPS604944A (en) | Photomask | |
JPS5854869B2 (en) | Method of forming resin film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |