JPH01159353U - - Google Patents
Info
- Publication number
- JPH01159353U JPH01159353U JP5487788U JP5487788U JPH01159353U JP H01159353 U JPH01159353 U JP H01159353U JP 5487788 U JP5487788 U JP 5487788U JP 5487788 U JP5487788 U JP 5487788U JP H01159353 U JPH01159353 U JP H01159353U
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- vicinity
- plasma generation
- insulating ring
- source housing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は、この考案の一実施例に係るイオン源
のより具体的な断面図である。第２図は、従来の
イオン源の一例を示す概略断面図である。
２……イオン源ハウジング、４……絶縁リング
、６……イオン源ヘツド、６ａ……プラズマ生成
容器、１４……ライナー。
FIG. 1 is a more specific sectional view of an ion source according to an embodiment of this invention. FIG. 2 is a schematic cross-sectional view showing an example of a conventional ion source. 2... Ion source housing, 4... Insulating ring, 6... Ion source head, 6a... Plasma generation container, 14... Liner.
Claims (1)
、プラズマ生成容器を有するイオン源ヘツドを保
持した構造のイオン源において、前記イオン源ハ
ウジング内であつて少なくとも絶縁リングとの境
界付近からプラズマ生成容器の先端付近にかけて
の部分に、イオン源ハウジングの内面を覆う筒状
の交換可能なライナーを設けたことを特徴とする
イオン源。 In an ion source having a structure in which an ion source head having a plasma generation vessel is held within the ion source housing via an insulating ring, the tip of the plasma generation vessel is located within the ion source housing from at least the vicinity of the boundary with the insulating ring. An ion source characterized in that a cylindrical replaceable liner that covers the inner surface of the ion source housing is provided in the vicinity thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5487788U JPH01159353U (en) | 1988-04-22 | 1988-04-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5487788U JPH01159353U (en) | 1988-04-22 | 1988-04-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01159353U true JPH01159353U (en) | 1989-11-06 |
Family
ID=31280791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5487788U Pending JPH01159353U (en) | 1988-04-22 | 1988-04-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01159353U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0531094U (en) * | 1991-09-30 | 1993-04-23 | 日新電機株式会社 | Ion source Chillamba |
| JP4649773B2 (en) * | 2001-05-14 | 2011-03-16 | 株式会社デンソー | Ion implantation machine |
| WO2019054111A1 (en) * | 2017-09-14 | 2019-03-21 | 株式会社アルバック | Ion source, ion injection device and ion source operation method |
-
1988
- 1988-04-22 JP JP5487788U patent/JPH01159353U/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0531094U (en) * | 1991-09-30 | 1993-04-23 | 日新電機株式会社 | Ion source Chillamba |
| JP4649773B2 (en) * | 2001-05-14 | 2011-03-16 | 株式会社デンソー | Ion implantation machine |
| WO2019054111A1 (en) * | 2017-09-14 | 2019-03-21 | 株式会社アルバック | Ion source, ion injection device and ion source operation method |
| US10910192B2 (en) | 2017-09-14 | 2021-02-02 | Ulvac, Inc. | Ion source, ion implantation apparatus, and ion source operating method |