JPH01156741U - - Google Patents
Info
- Publication number
- JPH01156741U JPH01156741U JP5150788U JP5150788U JPH01156741U JP H01156741 U JPH01156741 U JP H01156741U JP 5150788 U JP5150788 U JP 5150788U JP 5150788 U JP5150788 U JP 5150788U JP H01156741 U JPH01156741 U JP H01156741U
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- tank
- material gas
- supply device
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002994 raw material Substances 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 2
Description
第１図は本考案に係る原料ガス供給装置の一実
施例を示す縦断面図、第２図は第１図に示す装置
で用いている原料タンクの平面図、第３図及び第
４図は本考案で用いる原料タンクの他の２種の例
を示す平面図、第５図及び第６図は本考案で用い
る原料タンクの更に他の例を示す縦断面図及び平
面図、第７図は本考案の装置の他の例を示す縦断
面図、第８図は従来の装置の他の例を示す縦断面
図である。
１…原料タンク、１Ａ…タンク壁突出部、２…
原料液、３Ａ…上部ヒータ、３Ｂ…側部ヒータ、
３Ｃ…底部ヒータ、３Ｄ…内部ヒータ、１１Ａ…
上部ヒータ温度コントローラ、１１Ｂ…側部ヒー
タ温度コントローラ、１１Ｃ…底部ヒータ温度コ
ントローラ、１１Ｄ…内部ヒータ温度コントロー
ラ。
FIG. 1 is a longitudinal sectional view showing an embodiment of the raw material gas supply device according to the present invention, FIG. 2 is a plan view of a raw material tank used in the device shown in FIG. 1, and FIGS. 3 and 4 are FIGS. 5 and 6 are plan views showing two other examples of raw material tanks used in the present invention; FIGS. 5 and 6 are longitudinal sectional views and plan views showing still other examples of raw material tanks used in the present invention; FIG. FIG. 8 is a longitudinal sectional view showing another example of the device of the present invention, and FIG. 8 is a longitudinal sectional view showing another example of the conventional device. 1... Raw material tank, 1A... Tank wall protrusion, 2...
Raw material liquid, 3A...upper heater, 3B...side heater,
3C...Bottom heater, 3D...Internal heater, 11A...
Upper heater temperature controller, 11B... Side heater temperature controller, 11C... Bottom heater temperature controller, 11D... Internal heater temperature controller.
Claims (1)
生させて供給する原料ガス供給装置において、前
記原料タンクにその内側に突出するタンク壁突出
部が設けられ、前記タンク壁突出部内に内部ヒー
タが収納されていることを特徴とする原料ガス供
給装置。 In the raw material gas supply device that heats a raw material liquid in a raw material tank to generate and supply raw material gas, the raw material tank is provided with a tank wall protrusion that protrudes inwardly, and an internal heater is provided in the tank wall protrusion. A raw material gas supply device characterized by being housed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5150788U JPH01156741U (en) | 1988-04-19 | 1988-04-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5150788U JPH01156741U (en) | 1988-04-19 | 1988-04-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01156741U true JPH01156741U (en) | 1989-10-27 |
Family
ID=31277528
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5150788U Pending JPH01156741U (en) | 1988-04-19 | 1988-04-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01156741U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021150472A (en) * | 2020-03-19 | 2021-09-27 | 株式会社Kokusai Electric | Vaporizer, substrate processing device, cleaning method, and manufacturing method of semiconductor device |
-
1988
- 1988-04-19 JP JP5150788U patent/JPH01156741U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021150472A (en) * | 2020-03-19 | 2021-09-27 | 株式会社Kokusai Electric | Vaporizer, substrate processing device, cleaning method, and manufacturing method of semiconductor device |