JPH01142421A - Monochromator - Google Patents

Monochromator

Info

Publication number
JPH01142421A
JPH01142421A JP30024087A JP30024087A JPH01142421A JP H01142421 A JPH01142421 A JP H01142421A JP 30024087 A JP30024087 A JP 30024087A JP 30024087 A JP30024087 A JP 30024087A JP H01142421 A JPH01142421 A JP H01142421A
Authority
JP
Japan
Prior art keywords
slit
monochromator
diffraction grating
light
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30024087A
Other languages
Japanese (ja)
Inventor
Nobuo Akitomo
秋友 信雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP30024087A priority Critical patent/JPH01142421A/en
Publication of JPH01142421A publication Critical patent/JPH01142421A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To simplify the constitution of a device, by making an incident angle into a diffraction grating at a recess surface, where ruled lines are formed at a specified interval, equal to a diffraction angle, and arranging an incident slit and a reflecting slit respectively on one straight line, which is in parallel with the ruled lines. CONSTITUTION:An original point 0 of coordinates is provided at the center of a diffraction grating 20 of a recess surface having an unequal interval. An (x) axis is provided in the normal direction, a (y) axis is provided in the vertical direction with respect to a groove and a (z) axis is provided in the parallel direction with respect to the groove. An incident slit 2 and an output slit 3 are arranged in parallel with the (z) axis in the up and down direction. A light beam from the incident slit 2 is diffracted through the diffraction grating 20 of a recess surface having an equal interval and taken out as monochromatic light through the output slit 3. The wavelength is selected only by rotary motion 10 around the (z) axis. Since the incident slit 2 and the output slit 3 can be aligned in the vertical direction and the wavelengths can be scanned only by the rotation of the diffraction grating 20, the device can be made compact.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はモノクロメータに係り、特に、不等間隔凹面回
折格子を分散子として使用するのに好適なモノクロメー
タに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a monochromator, and more particularly to a monochromator suitable for using an unevenly spaced concave diffraction grating as a dispersion element.

〔従来の技術〕[Conventional technology]

従来の不等間隔凹面回折格子を用いたモノクロメータと
しては、瀬谷、波間形の他に、開角を小さくした特開昭
52−55546号公報に示すようなモノクロメータが
開示されている。これは第4図に示すように入射スリッ
ト2および出射スリット3を入射角と回折角の差が5°
以内になるよう配置するとされているが、開角0°の場
合について深くは検討されていなかった。しかるに、特
開昭52−55546号公報で開示されているような同
一平面上に凹面回折格子1や入射スリツl〜2、出射ス
リット3等の光学系を配置したインプレイン形の入射ス
リット2、出射スリット3の配置では、1@al的制約
から、入射スリット2、出射スリット3をある程度以上
には近づけることができない。
As a conventional monochromator using an unevenly spaced concave diffraction grating, in addition to the Seya and Nami type monochromators, a monochromator with a small opening angle as shown in Japanese Patent Application Laid-Open No. 52-55546 has been disclosed. This means that the difference between the incident angle and the diffraction angle between the entrance slit 2 and the exit slit 3 is 5° as shown in Figure 4.
However, the case where the opening angle is 0° has not been deeply studied. However, an in-plane type entrance slit 2 in which an optical system such as a concave diffraction grating 1, an entrance slit 1 to 2, an exit slit 3, etc. are arranged on the same plane as disclosed in Japanese Patent Application Laid-Open No. 52-55546, In the arrangement of the exit slit 3, due to the 1@al constraint, the entrance slit 2 and the exit slit 3 cannot be brought closer to each other than a certain degree.

また、入射スリット2、出射スリット3の幅を変更でき
る可変スリット幅の場合には、両スリットが近くにある
という制約条件は設計上非常に大きなネックになってい
た。入射スリット2、出射スリット3を上下に配置した
オフプレイン形の凹面回折格子モノクロメータとしては
、第5図に示すイーグル形モノクロメータがある。しか
るに、本配置で広い範囲にわたり、高分解のモノクロメ
ータを得るには回折格子1の回転10と同時に回折格子
1を入射スリット2、出射スリット3の方゛向に平行移
動11するスライドを必要とし、機溝が複雑となってい
た。
Furthermore, in the case of a variable slit width in which the widths of the entrance slit 2 and the exit slit 3 can be changed, the constraint that both slits be close to each other has been a very big bottleneck in design. An example of an off-plane concave grating monochromator in which an entrance slit 2 and an exit slit 3 are arranged above and below is an eagle-shaped monochromator shown in FIG. However, in order to obtain a high-resolution monochromator over a wide range with this arrangement, it is necessary to use a slide to move the diffraction grating 1 parallelly in the directions of the entrance slit 2 and the exit slit 3 at the same time as the rotation 10 of the diffraction grating 1. , the machine groove was complicated.

さらに、オフプレイン形の凹面回折格子モノクロメータ
としては、アプライド オプティックス25、22 (
1986年)第4071頁から第4075頁(Appl
ied 0ptics 110L、25.NO,22(
198G)PI’4071〜4075)に示すようなも
のが発表されている。
Furthermore, as an off-plane type concave grating monochromator, Applied Optics 25, 22 (
1986) pp. 4071-4075 (Appl.
ied 0ptics 110L, 25. NO, 22 (
198G) PI'4071-4075) have been published.

ここにおいてはオフプレインにしたことによって増大す
る収差をホログラフィック回折格子制作時の焼込条件を
選ぶことによって低減させる方法についての提示であり
、その主目的はオフプレイン配ににすることによって迷
光を低減させることにあり、必ずしも、開角を小さくし
て、装置をコンパクトにまとめることを目的とはしてい
ない6〔発明を解決しようとする問題点〕 これらの従来技術においては、凹面回折格子を用いるこ
とによって、単純な分光学的性能追求のみを追っており
装置の簡素化が計れるという点に着目していなかった。
This paper presents a method to reduce the aberrations that increase due to off-plane placement by selecting the burning conditions when producing a holographic diffraction grating, and the main purpose is to reduce stray light by using off-plane placement. The purpose is not necessarily to reduce the opening angle and make the device compact.6 [Problems to be solved by the invention] In these conventional techniques, the concave diffraction grating is They were only pursuing simple spectroscopic performance and did not pay attention to the fact that by using this method, they could simplify the equipment.

本発明の目的は、凹面回折格子が有する2つの特性であ
る分散性能と集光性能を同時に効果的に発揮させしかも
入・出射スリットをオフプレインに配置して小形でかつ
5優れた分光性能を持つモノクロメータを提供すること
にある。
The purpose of the present invention is to effectively exhibit the two characteristics of a concave diffraction grating, dispersion performance and light collection performance, at the same time, and to achieve excellent spectral performance while maintaining a small size by arranging input and output slits off-plane. The goal is to provide a monochromator with

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は、凹面上に所定の間隔に刻線した格子面を
有する凹面回折格子と、該格子面に所定の入射角で光が
入射する入射スリットと、眩光が回折して出射する出射
スリットと、を備えたモノクロメータにおいて、眩光が
回折する回折角が前記入射角と等しくなる位置に前記入
射スリットと前記出射スリットとを前記刻線に平行な一
直線上にそれぞれ配置したモノクロメータ、または、こ
のモノクロメータに前記刻線と直交する方向を幅方向と
して前記入射スリットと前記出射スリットのそれぞれの
幅方向を変更するスリット幅変更手段とを設けたモノク
ロメータによって解決される。
The above problems are solved by a concave diffraction grating that has a grating surface with lines marked at predetermined intervals on the concave surface, an entrance slit through which light enters the grating surface at a predetermined angle of incidence, and an exit slit through which dazzling light is diffracted and exits. A monochromator comprising: the entrance slit and the exit slit are each arranged on a straight line parallel to the marked line at a position where a diffraction angle at which dazzling light is diffracted is equal to the incidence angle, or This problem is solved by a monochromator provided with a slit width changing means for changing the width direction of each of the entrance slit and the exit slit, with the width direction being perpendicular to the scored line.

〔作用〕[Effect]

所定の間隔に刻線した凹面回折格子と、その凹面回折格
子への入射角と回折角を同一角度になるように入射スリ
ットと、出射スリットとを前記刻線に平行な一直線上に
それぞれ配置し、前記凹面回折格子の所定の位置に入射
光を入射して所望の単色光を得る。また、スリット幅変
更手段により前記入射スリットと前記出射スリットのそ
れぞれの幅を変更して単色光の分解能を調整する。
A concave diffraction grating with lines scored at predetermined intervals, and an entrance slit and an exit slit arranged on a straight line parallel to the lines so that the incident angle to the concave diffraction grating and the diffraction angle are the same angle. , the incident light is incident on a predetermined position of the concave diffraction grating to obtain desired monochromatic light. Further, the resolution of the monochromatic light is adjusted by changing the respective widths of the entrance slit and the exit slit by the slit width changing means.

〔実施例〕〔Example〕

以下本発明による一実施例を第1図〜第3図を用いて説
明する。第1図において不等間隔凹面回折格子2oの中
心に座標原点Oをとり、法線方向にX、溝垂直方向にy
、海事行方向にZ軸をとる。
An embodiment of the present invention will be described below with reference to FIGS. 1 to 3. In Fig. 1, the coordinate origin O is set at the center of the unevenly spaced concave diffraction grating 2o, X is in the normal direction, and y is in the direction perpendicular to the grooves.
, take the Z axis in the maritime direction.

入射スリン1〜2、出射スリット3は、Z軸に平行に上
下にml匿されている。入射スリット2からの光線は不
等間隔凹面回折格子2oで回折され、出射スリット3を
通り、単色光として外部に取り出される。波長の選択は
、Z軸まわりの回転運動1oだけで行う、一般に所望の
波長の単色光を得るには回折格子の溝のピッチ、入射角
、回折角及び次数によって定まるが本実施例のモノクロ
メータにおいて、結像状態把握のために具体的な例で数
値計算を試みると次の様になる。
The entrance slits 1 and 2 and the exit slit 3 are vertically hidden parallel to the Z axis. The light beam from the input slit 2 is diffracted by the unevenly spaced concave diffraction grating 2o, passes through the output slit 3, and is extracted to the outside as monochromatic light. The selection of the wavelength is performed only by rotational movement 1o around the Z-axis.Generally, obtaining monochromatic light of the desired wavelength is determined by the pitch of the grooves of the diffraction grating, the angle of incidence, the angle of diffraction, and the order, but the monochromator of this example In order to understand the imaging state, numerical calculations are attempted using a concrete example as follows.

回折格子は、中心溝間隔1/ 600nwnテ1159
7〜1 / G O3mmの間で溝間隔を変えながら刻
線されているとする。回折格子曲率半径を15On+n
+、入射スリット回折格子間圧はを150m、回折格子
出射スリット間距離を150圃、次数を+1、スリット
幅24を0.4mm、スリット高25を4m、入射スリ
ット2、出射スリット3、端面間距離26を2m、回折
格子大きさを10+m角の例で、コンピュータスポット
ダイアグラムを描くと第2図のようになり、通常の半値
幅10nm程度以下の紫外可視域(200〜900nm
)分光光度計用モノクロメータとしては充分に実用に耐
える分解が得られる。本実施例によれば、実用に酎え得
る分解でもって、コンパクトな不等間隔凹面回折格子モ
ノクロメータを(1カ成することができる。
The diffraction grating has a center groove spacing of 1/600nwnte 1159
It is assumed that the groove lines are marked while changing the groove spacing between 7 and 1/GO3 mm. The diffraction grating radius of curvature is 15On+n
+, the pressure between the entrance slit diffraction grating is 150 m, the distance between the diffraction grating exit slits is 150 fields, the order is +1, the slit width 24 is 0.4 mm, the slit height 25 is 4 m, the entrance slit 2, the exit slit 3, and between the end faces. In an example where the distance 26 is 2 m and the diffraction grating size is 10 + m square, if you draw a computer spot diagram, it will look like Figure 2.
) A resolution sufficient for practical use as a monochromator for spectrophotometers can be obtained. According to this embodiment, a compact unequal-spaced concave grating monochromator can be constructed with practical decomposition.

このように入射スリット2、出射スリット3をオフプレ
インに配にすることによって生ずる収差に関しては、回
折格子20の格子溝間隔、溝形状の位置を変えて製作す
ることにより低減出来ることをコンピュータスポットダ
イアグラム法によって確認し、性能を落すことなく装置
の小形化が計れた。
The computer spot diagram shows that the aberrations caused by arranging the entrance slit 2 and the exit slit 3 off-plane in this way can be reduced by changing the grating groove interval and groove shape position of the diffraction grating 20. We confirmed this by using the method and were able to downsize the device without compromising performance.

次に第3図により、入射スリン1−2と出射スリット3
のスリン1−幅の連続可変について記述する。
Next, according to FIG. 3, the entrance slit 1-2 and the exit slit 3
Continuously variable width of Surin 1 will be described.

スリット幅変更範囲3oで入射スリット2と出射スリッ
ト3の幅を任意に設定できるようにすること及び連続的
に2つのスリットを1体の板溝で可変にする。また、必
要に応じてスリット幅変更範囲30内で2つのスリット
の幅を各々独自に調整できるようにすることにより得ら
れるスペクトルの分解能を任意に調整できることになる
To arbitrarily set the widths of an entrance slit 2 and an exit slit 3 in a slit width changing range 3o, and to continuously make the two slits variable with one plate groove. Furthermore, by allowing the widths of the two slits to be independently adjusted within the slit width changing range 30 as needed, the resolution of the spectrum obtained can be adjusted as desired.

本実膨例によれば、入射スリット2、出射スリット3を
垂直方向に並べることができ、かつ、回折格子20の回
転だけで波長走査ができるので、装置をコンパクトにす
ることができる。また、スリット幅変更の場合には、入
射、出射を同じスリットの上下で分割使用でき、一つの
メカニズムで入射スリットと出射スリットを構成できる
According to this example, the entrance slit 2 and the exit slit 3 can be arranged vertically, and wavelength scanning can be performed simply by rotating the diffraction grating 20, so that the apparatus can be made compact. Furthermore, in the case of changing the slit width, the entrance and exit can be used separately at the top and bottom of the same slit, and the entrance slit and the exit slit can be configured with one mechanism.

〔発明の効果〕〔Effect of the invention〕

所定の間隔に刻線した凹面回折格子と、その凹面回折格
子への入射角と回折角を同一角度にして入射スリットと
、反射スリットとを前記刻線に平行な一直線上にそれぞ
れ配置することにより装置構成が簡易化され極めて小型
で簡単な構成で所望の単色光を得ることができるという
優れた効果がある。また、前記入射スリットと前記出射
スリットの幅を変更することにより、求める単色光の分
解能を任意に調整できるので能率良く単色光を得ること
ができるという効果もある。
By arranging a concave diffraction grating with lines scored at predetermined intervals, and an incident slit and a reflection slit on a straight line parallel to the scored lines so that the incident angle to the concave diffraction grating and the diffraction angle are the same angle. This has the excellent effect that the device configuration is simplified and desired monochromatic light can be obtained with an extremely small and simple configuration. Further, by changing the widths of the entrance slit and the exit slit, the resolution of the desired monochromatic light can be arbitrarily adjusted, so that monochromatic light can be obtained efficiently.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例を示す鳥敞図、第2図は本発明
の具体例による計算結果を示すスポラ1−ダイアグラム
、第3図は本発明のスリット幅変更を示す図、第4図は
従来の第1の例を示す光学系統図、第5図は従来の第2
の例を示す光学系統図を示す。 1・・・凹面回折格子、2・・・入射スリット、3・・
・出射スリット、4・・・入射光、5・・・回折光、7
・・・開角、1o・・・回転運動、20・・・不等間隔
凹面回折格子、30・・・スリット幅変更範囲。 \に1.・ γ1 凹 第2(2] qOQ ’n77r1 菖3図 ノは博n!南凹面回何九S 奮4図 硲      ローフン1門 一
FIG. 1 is a bird's-eye diagram showing an embodiment of the present invention, FIG. 2 is a spora 1 diagram showing calculation results according to a specific example of the present invention, FIG. 3 is a diagram showing changing the slit width of the present invention, and FIG. The figure shows an optical system diagram showing the first conventional example, and Figure 5 shows the conventional second example.
An optical system diagram showing an example is shown. 1...Concave diffraction grating, 2...Incidence slit, 3...
・Output slit, 4...Incoming light, 5...Diffracted light, 7
...Opening angle, 1o...Rotary movement, 20...Unequally spaced concave diffraction grating, 30...Slit width change range. \に1.・ γ1 Concave 2nd (2) qOQ 'n77r1 Iris 3 figure is Hakun! Minami concave times How many S Iku 4 figure 2 Rofun 1 Mon 1

Claims (1)

【特許請求の範囲】 1、凹面上に所定の間隔に刻線した格子面を有する凹面
回折格子と、該格子面に所定の入射角で光が入射する入
射スリットと、該光が回折して出射する出射スリットと
、を備えたモノクロメータにおいて、該光が回折する回
折角が前記入射角と等しくなる位置に前記入射スリット
と前記出射スリットとを前記刻線に平行な一直線上にそ
れぞれ位置したことを特徴とするモノクロメータ。 2、前記刻線が機械刻線機で刻線したことを特徴とする
特許請求の範囲第1項記載のモノクロメータ。 3、前記凹面回折格子をホログラフィックに刻線したこ
とを特徴とする特許請求の範囲第1項記載のモノクロメ
ータ。 4、前記入射スリットと前記出射スリットとを同一平面
に設けたことを特徴とする特許請求の範囲第1項〜第3
項のいずれかに記載のモノクロメータ。 5、凹面上に所定の間隔に刻線した格子面を有する凹面
回折格子と、該格子面に所定の入射角で光を入射する入
射スリットと、該光が回折して出射する出射スリットと
、を備えたモノクロメータにおいて、該光が回折する回
折角が前記入射角と等しくなる位置に前記入射スリット
と前記出射スリットとを前記刻線に平行な一直線上にそ
れぞれ配置し、前記刻線と直交する方向を幅方向として
前記入射スリットと前記出射スリットのそれぞれの幅方
向を変更するスリット幅変更手段とを設けたことを特徴
とするモノクロメータ。 6、前記刻線が機械刻線機で刻線したことを特徴とする
特許請求の範囲第5項記載のモノクロメータ。 7、前記凹面回折格子をホログラフィックに刻線したこ
とを特徴とする特許請求の範囲第5項記載のモノクロメ
ータ。 8、前記入射スリットと前記出射スリットとを同一平面
に設けたことを特徴とする特許請求の範囲第5項〜第7
項のいずれかに記載のモノクロメータ。 9、前記それぞれのスリット幅の変更が連続して行える
ことを特徴とする特許請求の範囲第5項〜第8項のいず
れかに記載のモノクロメータ。 10、前記それぞれのスリット幅の変更が一体の駆動装
置で行えることを特徴とした特許請求の範囲第5項〜第
9項のいずれかに記載のモノクロメータ。 11、前記それぞれのスリット幅の変更がそれぞれ独立
に行えることを特徴とした特許請求の範囲第5項〜第9
項のいずれかに記載のモノクロメータ。
[Claims] 1. A concave diffraction grating having a grating surface marked at predetermined intervals on a concave surface, an entrance slit through which light is incident on the grating surface at a predetermined angle of incidence, and the light is diffracted. In a monochromator equipped with an exit slit, the entrance slit and the exit slit are each located on a straight line parallel to the scored line at a position where the diffraction angle at which the light is diffracted is equal to the incident angle. A monochromator characterized by: 2. The monochromator according to claim 1, wherein the marked lines are formed by a mechanical marking machine. 3. The monochromator according to claim 1, wherein the concave diffraction grating is holographically scored. 4. Claims 1 to 3, characterized in that the entrance slit and the exit slit are provided on the same plane.
The monochromator described in any of the paragraphs. 5. A concave diffraction grating having a grating surface with lines marked at predetermined intervals on the concave surface, an entrance slit through which light is incident on the grating surface at a predetermined angle of incidence, and an exit slit through which the light is diffracted and emitted; In the monochromator, the entrance slit and the exit slit are each arranged on a straight line parallel to the scored line at a position where the diffraction angle at which the light is diffracted is equal to the incident angle, and the exit slit is arranged on a straight line parallel to the scored line, and 1. A monochromator comprising slit width changing means for changing the width direction of each of the entrance slit and the exit slit, with the direction of the input slit being the width direction. 6. The monochromator according to claim 5, wherein the scored lines are scored using a mechanical marking machine. 7. The monochromator according to claim 5, wherein the concave diffraction grating is holographically scored. 8. Claims 5 to 7, characterized in that the entrance slit and the exit slit are provided on the same plane.
The monochromator described in any of the paragraphs. 9. The monochromator according to any one of claims 5 to 8, characterized in that the width of each of the slits can be changed continuously. 10. The monochromator according to any one of claims 5 to 9, characterized in that the width of each of the slits can be changed by an integrated drive device. 11. Claims 5 to 9, characterized in that the width of each of the slits can be changed independently.
The monochromator described in any of the paragraphs.
JP30024087A 1987-11-30 1987-11-30 Monochromator Pending JPH01142421A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30024087A JPH01142421A (en) 1987-11-30 1987-11-30 Monochromator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30024087A JPH01142421A (en) 1987-11-30 1987-11-30 Monochromator

Publications (1)

Publication Number Publication Date
JPH01142421A true JPH01142421A (en) 1989-06-05

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Family Applications (1)

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JP30024087A Pending JPH01142421A (en) 1987-11-30 1987-11-30 Monochromator

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003028715A (en) * 2001-07-10 2003-01-29 Japan Atom Energy Res Inst Conical diffraction oblique-incidence spectroscope, and diffraction grating for the spectroscope
JP2009285734A (en) * 2009-09-02 2009-12-10 Mitsubishi Materials Corp Method of manufacturing blade member of cutting tool and press forming die of green compact used for the method
JP2012506562A (en) * 2008-10-20 2012-03-15 ニンボ ユアンル エレクトロ−オプティクス,コーポレーション リミテッド Spectrometer comprising an aberration correcting concave diffraction grating and transmission aberration correcting means
JP2017120200A (en) * 2015-12-28 2017-07-06 国立研究開発法人産業技術総合研究所 Spectral radiation measuring device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003028715A (en) * 2001-07-10 2003-01-29 Japan Atom Energy Res Inst Conical diffraction oblique-incidence spectroscope, and diffraction grating for the spectroscope
JP2012506562A (en) * 2008-10-20 2012-03-15 ニンボ ユアンル エレクトロ−オプティクス,コーポレーション リミテッド Spectrometer comprising an aberration correcting concave diffraction grating and transmission aberration correcting means
JP2009285734A (en) * 2009-09-02 2009-12-10 Mitsubishi Materials Corp Method of manufacturing blade member of cutting tool and press forming die of green compact used for the method
JP2017120200A (en) * 2015-12-28 2017-07-06 国立研究開発法人産業技術総合研究所 Spectral radiation measuring device

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