JPH01142079A - Production of rare earth metal alloy target - Google Patents
Production of rare earth metal alloy targetInfo
- Publication number
- JPH01142079A JPH01142079A JP30388787A JP30388787A JPH01142079A JP H01142079 A JPH01142079 A JP H01142079A JP 30388787 A JP30388787 A JP 30388787A JP 30388787 A JP30388787 A JP 30388787A JP H01142079 A JPH01142079 A JP H01142079A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- rare earth
- casting
- earth metal
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 33
- 239000000956 alloy Substances 0.000 title claims abstract description 33
- 229910052761 rare earth metal Inorganic materials 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 150000002910 rare earth metals Chemical class 0.000 title claims description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000007704 transition Effects 0.000 claims abstract description 10
- 239000010409 thin film Substances 0.000 claims abstract description 9
- 238000005266 casting Methods 0.000 abstract description 17
- 230000007547 defect Effects 0.000 abstract description 7
- 238000011109 contamination Methods 0.000 abstract description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 3
- 239000007789 gas Substances 0.000 abstract description 3
- 239000001301 oxygen Substances 0.000 abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 abstract description 3
- 238000007711 solidification Methods 0.000 abstract description 3
- 230000008023 solidification Effects 0.000 abstract description 3
- 238000005336 cracking Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000012774 insulation material Substances 0.000 description 3
- 229910052771 Terbium Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000004663 powder metallurgy Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- -1 Argon ions Chemical class 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910000748 Gd alloy Inorganic materials 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
（１）産業上の利用分野
本発明は、光磁気記録ディスク用の磁性薄膜をＰＶＤ法
によって形成する際に使用される希土類合金ターゲット
の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (1) Field of Industrial Application The present invention relates to a method for manufacturing a rare earth alloy target used when forming a magnetic thin film for a magneto-optical recording disk by a PVD method.
（２）従来の技術
近年、光磁気記録に対する関心が著しく高まって来てい
るが、光磁気記録は磁性材料に、光と磁場を当てる事に
よシ記録を行うものであシ、ディスク面上に形成された
、磁性薄膜が利用される。(2) Conventional technology In recent years, interest in magneto-optical recording has increased significantly. Magneto-optical recording is a method of recording by exposing a magnetic material to light and a magnetic field. A magnetic thin film formed in
このよう左、磁性薄膜の材料としては遷移金属−希土類
系、たとえばＦｅ −Ｇｄ 、 Ｆｅ −Ｔｂ等の二元
系、Ｆｅ −Ｃｏ −Ｔｂ 、 Ｆｅ −Ｇｄ −Ｔｂ
等の三元系が有望とされている。As shown on the left, materials for magnetic thin films include transition metal-rare earth systems, such as binary systems such as Fe-Gd and Fe-Tb, Fe-Co-Tb and Fe-Gd-Tb.
The ternary system is considered to be promising.
光磁気ディスクの製造は、合成樹脂などの円形基盤の表
面に上記の磁性薄膜材料をＰＶＤ法によ多形成させる。To manufacture a magneto-optical disk, the above-mentioned magnetic thin film material is formed on the surface of a circular base made of synthetic resin or the like using a PVD method.
ＰＶＤ法としては、スパッター装置によシ成膜するのが
一般的であり、これは、真空容器中に磁成薄膜の組成に
ほぼ等しい組成の合金ターゲットを設置し、このターゲ
ットと対向させて前記の円形基盤を設置する。In the PVD method, it is common to form a film using a sputtering device, in which an alloy target with a composition approximately equal to that of the magnetic thin film is placed in a vacuum container, and the above-mentioned film is placed opposite to this target. A circular base will be installed.
そして、真空容器内にアルゴンガスを１Ｏ−２Ｔｏｒｒ
程度加え、高周波電流を流して放電させる。Then, argon gas was introduced into the vacuum container at 1O-2 Torr.
In addition, a high frequency current is applied to discharge the battery.
放電によって生じたプラズマ中のアルゴンイオンを前記
合金ターゲットに衝突させ、この衝突エネルギーで遷移
金属と希土類をたたき出し、前記の円形基板に付着させ
る。この様に、ＰＶＤ法を利用して磁性薄膜を基盤上に
形成するには合金ターゲットが必要である。Argon ions in the plasma generated by the discharge collide with the alloy target, and the collision energy knocks out transition metals and rare earths, which are then deposited on the circular substrate. As described above, an alloy target is required to form a magnetic thin film on a substrate using the PVD method.
合金ターゲットはその製造法から鋳造ターゲットと焼結
ターゲットに分けられる。Alloy targets can be divided into cast targets and sintered targets based on their manufacturing method.
（３）発明が解決するための問題点
従来、遷移金属−希土類系の合金は非常に脆く、量産に
適した大面積のターゲットを作る事は困難であシ、−度
鋳造した合金を粉末にして、成形焼結するという粉末冶
金法によシ、合金ターゲットを製造するのが一般的であ
った。(3) Problems to be solved by the invention Conventionally, transition metal-rare earth alloys have been extremely brittle, and it has been difficult to make large-area targets suitable for mass production. It was common to manufacture alloy targets using the powder metallurgy method of shaping and sintering.
しかしながら、この粉末冶金法は希土類元素が著しく活
性であるため、汚染が大きく、不純物の少い良質のター
ゲットを得るのは困難であシ、工程が多いため、高コス
トであるという欠点があった。However, this powder metallurgy method has the disadvantages of high contamination due to the extremely active rare earth elements, difficulty in obtaining a high-quality target with few impurities, and high cost due to the large number of steps. .
本発明は上述した様な従来の問題法゛に着目して行われ
たものであシ、鋳造法によシ割れのない汚染の少いしか
も鋳造欠陥のない遷移金属−希土類系合金ターグツトを
作る事を目的としている。The present invention has been carried out by focusing on the above-mentioned conventional problem method, and uses a casting method to produce transition metal-rare earth alloy targants that are free from cracks, have little contamination, and are free from casting defects. is aimed at something.
（４）問題点を解決するだめの手段
この発明は、遷移金属−希土類系の薄膜形成用合金ター
ゲツト材ターケ゛ツトするに際して、鋳型の内側に鉄箔
を張ったものを使う事を特徴とする。(4) Means for Solving the Problems The present invention is characterized by using a mold lined with iron foil when targeting a transition metal-rare earth alloy target material for forming thin films.
一般に遷移金属−希土類系合金は非常に脆く、通常の金
型や砂型に鋳込むと冷却時の熱応力で割れてしまい、割
れのない成形体を得るのは不可能であった。In general, transition metal-rare earth alloys are very brittle, and when cast into a normal mold or sand mold, they crack due to thermal stress during cooling, making it impossible to obtain a crack-free molded product.
また、この種の合金は、活性が高く、かつ鋳造温度も高
いので、侵食に耐えられる鋳型材料は窒化ホウ素等、特
殊なものに限られている。Furthermore, since this type of alloy has high activity and a high casting temperature, mold materials that can withstand corrosion are limited to special materials such as boron nitride.
本発明者らは、耐火断熱材の内側に鉄箔を張った鋳型を
作シ、これに遷移金属−希土類系合金を鋳込み割れ及び
鋳造欠陥がなく、しかも汚染の少い合金ターゲットを作
るのに成功した。本発明で言う耐火断熱材は、耐火温度
が合金の融点以上であれば何でも良いが、加工性の点か
ら、アルミナ繊維系が好ましい。耐火断熱材の厚さは、
厚過ぎると保温効果が犬きくなシ過ぎ、内側に張った金
属箔が溶解してしまい、金属箔を張った効果が無くなる
。The present inventors created a mold with iron foil on the inside of a fireproof insulation material, and cast a transition metal-rare earth alloy into the mold to create an alloy target with no cracks or casting defects, and with less contamination. Successful. The refractory heat insulating material referred to in the present invention may be any material as long as its refractory temperature is equal to or higher than the melting point of the alloy, but from the viewpoint of workability, alumina fiber-based materials are preferred. The thickness of fireproof insulation is
If it is too thick, the insulation effect will be too weak, and the metal foil placed on the inside will melt, making the metal foil ineffective.
また本発明で使用する箔は、合金の成分金属で構成され
る金属又は合金が好ましく、入手し易さの点から鉄箔が
最適である。箔の厚さは、厚過ぎれば、強度が大で鋳造
後の冷却時の応力を緩和する事が出来ず、割れにっなが
シ、薄過ぎれば溶解して、溶湯が直接、断熱材に触れ、
箔を張った効果がなくなる。Further, the foil used in the present invention is preferably a metal or an alloy composed of component metals of an alloy, and iron foil is most suitable from the viewpoint of easy availability. If the foil is too thick, the strength will be too high and it will not be able to alleviate the stress during cooling after casting, causing it to crack, while if it is too thin, it will melt and the molten metal will directly be applied to the insulation material. touch,
The effect of applying foil disappears.
（５）作 用
断熱材で出来た鋳型は、注湯した合金を徐冷し、割れを
防ぐ効果がある。しかし、断熱材の厚さが厚過ぎると保
温効果が大となって内側の金属箔を溶解してしまう。合
金の種類、ターゲツト材の大きさと形状、および注湯温
度にょシ、適当な厚さがちシ、実験的に決定する。(5) Function A mold made of heat insulating material has the effect of slowly cooling the poured alloy and preventing cracking. However, if the thickness of the insulation material is too thick, the heat retention effect will be so great that it will melt the metal foil inside. The type of alloy, the size and shape of the target material, the pouring temperature, and the appropriate thickness are determined experimentally.
鉄箔は、溶湯と鋳型が接触してガスを発生し、鋳造欠陥
となるのを防ぐと共に、凝固時の収縮に追随して、割れ
の発生を防ぐ。Iron foil prevents the molten metal from coming into contact with the mold and generating gas, which would cause casting defects, and also prevents cracks from occurring due to shrinkage during solidification.
（６）実施例
Ｆｅ −５０’ ｗｔ％ Ｇｄ合金６００ｇを高周波溶
解炉でＡｒ雰囲気中で溶解し、第１図に示す様な内径１
０６瓢高さ２０Ｗａｎ肉厚３閣のアルミナ繊維系耐熱材
でできた型内に、０．５＋ｍｎの鉄箔を内張した鋳型に
鋳造した。鋳造温度は１４５０℃である。凝固後、合金
を取シ出してみると、鋳型内部に張った鉄箔は、合金の
表面に付着していたが溶解してはいなかった。(6) Example 600 g of Fe-50' wt% Gd alloy was melted in an Ar atmosphere in a high-frequency melting furnace, and the inner diameter was 1 as shown in Fig. 1.
06 It was cast in a mold made of alumina fiber-based heat-resistant material with a height of 20W and a wall thickness of 3 mm and lined with 0.5+mm iron foil. The casting temperature is 1450°C. When the alloy was taken out after solidification, the iron foil that had been placed inside the mold had adhered to the surface of the alloy, but had not melted.
また、割れは見られず、巣、孔１等の鋳造欠陥も見られ
なかった。なお、鋳造後の合金の酸素濃度は６００ ｐ
ｐｍであった。Further, no cracks were observed, and no casting defects such as cavities or holes 1 were observed. The oxygen concentration of the alloy after casting was 600 p.
It was pm.
（７）効 果
本発明によれば、鋳造法で遷移金属−希土類系合金ター
グツトを製造する事が出来、このターゲットには、割れ
や巣、孔等の鋳造欠陥は見られない。また、汚染も少く
、合金中の酸素濃度も低い。(7) Effects According to the present invention, a transition metal-rare earth alloy target can be manufactured by a casting method, and casting defects such as cracks, cavities, and holes are not observed in this target. Also, there is less contamination and the oxygen concentration in the alloy is low.
さらに、この発明は、反応性が大で、割れ易い金属又は
合金の鋳造には全て利用できる。Furthermore, the present invention can be used for casting any metal or alloy that is highly reactive and easily cracked.
第１図は本発明に使用する鋳型の一例を示す図である。
特許出願人 昭和電工株式会社
代理人弁理士 菊 地 精 −矢 口
平FIG. 1 is a diagram showing an example of a mold used in the present invention. Patent Applicant Showa Denko K.K. Representative Patent Attorney Sei Kikuchi - Yaguchi
flat
Claims (1)
製造するに際し、溶解した合金を、内側に鉄箔を張った
鋳型に鋳造する事を特徴とする希土類合金ターゲットの
製造方法1. A method for producing a rare earth alloy target, which is characterized in that when producing a transition metal-rare earth alloy target for forming a thin film, a molten alloy is cast into a mold with iron foil lined inside.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30388787A JPH01142079A (en) | 1987-11-30 | 1987-11-30 | Production of rare earth metal alloy target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30388787A JPH01142079A (en) | 1987-11-30 | 1987-11-30 | Production of rare earth metal alloy target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01142079A true JPH01142079A (en) | 1989-06-02 |
Family
ID=17926466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30388787A Pending JPH01142079A (en) | 1987-11-30 | 1987-11-30 | Production of rare earth metal alloy target |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01142079A (en) |
-
1987
- 1987-11-30 JP JP30388787A patent/JPH01142079A/en active Pending
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