JPH01140442A - Production of optical disk substrate - Google Patents

Production of optical disk substrate

Info

Publication number
JPH01140442A
JPH01140442A JP30082587A JP30082587A JPH01140442A JP H01140442 A JPH01140442 A JP H01140442A JP 30082587 A JP30082587 A JP 30082587A JP 30082587 A JP30082587 A JP 30082587A JP H01140442 A JPH01140442 A JP H01140442A
Authority
JP
Japan
Prior art keywords
radiation
resin
curing
substrate
wavelength region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30082587A
Other languages
Japanese (ja)
Other versions
JP2638859B2 (en
Inventor
Yoshihiko Kudo
工藤 嘉彦
Kiyoshi Tanii
清 谷井
Toshiaki Kashihara
樫原 俊昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP30082587A priority Critical patent/JP2638859B2/en
Publication of JPH01140442A publication Critical patent/JPH01140442A/en
Application granted granted Critical
Publication of JP2638859B2 publication Critical patent/JP2638859B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To eliminate the cause for warpage and chemical instability of a substrate by using the radiations in the wavelength region at the radiation absorption end of a radiation curing resin to cure and form the substrate. CONSTITUTION:The radiation curing resin having excellent optical characteristics, heat resistance, etc., is used for the substrate material. The radiation curing resin is cured and formed by using the radiations of only the wavelength region at the radiation absorption end thereof (the wavelength region at the radiation absorption end of a curing initiating mechanism). While the curing of the resin on the radiation irradiation surface progresses, several 10% of the radiations arrive at the resin on the opposite side as well by passing the inside of the resin on the radiation irradiation surface side, thereby progressing the curing. The optical disk substrate which is uniform in characteristics, decreases the warpage and deformation and is suitable for small- scale production of diversified kinds with high productivity is thereby obtd.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、レーザ光等の光を用いて情報の記録再生を行
なう光ディスクに関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an optical disc on which information is recorded and reproduced using light such as a laser beam.

従来の技術 近年、情報処理システムにおける処理情報量の急速な増
加に伴い、特に画像情報処理やオフィスオートメーショ
ン等の分野において記録容量の大きい記録媒体、とりわ
け光ディスクが注目されている。光ディスクでは、記録
膜上に光ビームを照射し、光吸収による局部的な温度上
昇あるいは化学変化を誘起して記録を行ない、記録時よ
り低強度の光ビームを照射して記録膜上の変化を検出す
ることによって再生を行なう。
2. Description of the Related Art In recent years, with the rapid increase in the amount of information processed in information processing systems, recording media with large recording capacities, particularly optical discs, have been attracting attention, particularly in fields such as image information processing and office automation. In optical discs, recording is performed by irradiating a light beam onto the recording film to induce a local temperature rise or chemical change due to light absorption, and by irradiating a light beam with a lower intensity than during recording to induce changes on the recording film. Reproduction is performed by detection.

従来の光ディスクは、例えば第3図に示すように構成さ
れている。すなわち、トラッキング溝が形成されだプ゛
ラスチック、ガラス等の透明基板31上に基板の熱損傷
防止あるいは記録膜保護のための下地層32を形成し、
この下地層の上に記録膜33を形成してさらにその上に
保護層34を設けた構成になっている。
A conventional optical disc is configured as shown in FIG. 3, for example. That is, a base layer 32 is formed on a transparent substrate 31 made of plastic, glass, etc., on which tracking grooves have been formed, to prevent heat damage to the substrate or to protect the recording film.
A recording film 33 is formed on this base layer, and a protective layer 34 is further provided on the recording film 33.

光ディスク表面のじんあいによる記録再生特性の劣化を
防止するために、記録再生は前記光ディスクのトラッキ
ング溝付透明基板側より光ビームを記録膜に照射して行
なう。この時、透明基板の光入射端で光ビーム径を充分
大きくし、じんあいによる影響を小さくするために透明
基板の厚さは1M11前後に設定される。
In order to prevent deterioration of the recording and reproducing characteristics due to dust on the surface of the optical disc, recording and reproducing are performed by irradiating the recording film with a light beam from the side of the transparent substrate with tracking grooves of the optical disc. At this time, the thickness of the transparent substrate is set to about 1M11 in order to make the light beam diameter sufficiently large at the light incident end of the transparent substrate and to reduce the influence of dust.

発明が解決しようとする問題点 しかしながら、前記のような構成の従来の光ディスクで
は光入射用の透明基板自身にトラッキング溝が形成され
ているため、透明基板は光学特性。
Problems to be Solved by the Invention However, in the conventional optical disc having the above-mentioned configuration, the transparent substrate for light incidence has tracking grooves formed on itself, so the optical characteristics of the transparent substrate are limited.

耐湿性、耐熱性、溝成形性の全てに優れていることが要
求され、そのような要求を充分に満たす透明基板が得ら
れていない。
It is required to have excellent moisture resistance, heat resistance, and groove formability, and a transparent substrate that fully satisfies these requirements has not been obtained.

すなわち、従来の光ディスクの溝付透明基板として用い
られているアクリル樹脂の場合は溝成形性、光学特性、
生産性に優れているが耐湿性、耐熱性に劣っており、ポ
リカーボネイト樹脂の場合は耐熱性、溝成形性、生産性
に優れているが複屈折等の光学特性に劣っており、エポ
キシ系樹脂等の熱硬化性樹脂およびガラスの場合は光学
特性。
In other words, in the case of acrylic resin used as the grooved transparent substrate of conventional optical discs, groove moldability, optical properties,
Although polycarbonate resin has excellent productivity, it has poor moisture resistance and heat resistance. Polycarbonate resin has excellent heat resistance, groove moldability, and productivity, but is inferior in optical properties such as birefringence, and epoxy resin Optical properties for thermosetting resins such as and glass.

耐熱性に優れているが、生産性に劣っているという問題
点を有していた。
Although it has excellent heat resistance, it has the problem of poor productivity.

さらに、熱硬化性樹脂の紫外線硬化タイプのものを用い
ることによって成形時間の短縮し、生産性向上を図る試
みもされているが、成形基板の厚さが1ff前後と厚い
ため、金属系スタンパを用いたキャスティング成形では
基板厚方向に紫外線吸収量に差が生じて硬化状態に分布
が生じる結果、基板のソリや化学的不安定性の原因とな
るという問題点を有している。
Furthermore, attempts have been made to shorten molding time and improve productivity by using ultraviolet curing type thermosetting resins, but since the thickness of the molded substrate is around 1ff, metal stampers cannot be used. The casting molding method used has the problem that a difference occurs in the amount of ultraviolet absorption in the thickness direction of the substrate, resulting in a distribution of the cured state, which causes warping of the substrate and chemical instability.

一方、ポリカーボネイト樹脂等の熱可塑性樹脂に用いる
インジェクション成形法は生産性に優れているが、設備
が高価でかつ成形条件を厳密、安定に維持する必要があ
るため、小規模多品種生産に不適当とい・う指摘もあり
、紫外線等の放射線を用いたキャスティング成形法の改
良が期待されている。
On the other hand, the injection molding method used for thermoplastic resins such as polycarbonate resin has excellent productivity, but the equipment is expensive and molding conditions must be maintained strictly and stably, making it unsuitable for small-scale, high-mix production. It has been pointed out that the casting molding method using radiation such as ultraviolet rays is expected to be improved.

本発明は上記問題点に鑑み、光学特性、耐湿性。In view of the above problems, the present invention has been developed to improve optical properties and moisture resistance.

附熱性、溝成形性、生産性に優れ、特に小規模多品種生
産に適した光ディスク基板の作製方法を提供するもので
ある。
The present invention provides a method for manufacturing an optical disk substrate that has excellent heat resistance, groove formability, and productivity, and is particularly suitable for small-scale, multi-product production.

問題点を解決するための手段 この目的を達成するために本発明の光ディスク基板の作
製方法では、基板材料に光学特性、耐熱性等に優れた放
射線硬化樹脂を用い、その放射線吸収端波長領域(硬化
開始機構の放射線吸収端波長領域)のみの放射線を用い
て該放射線硬化樹脂を硬化成形するという手段を行なう
Means for Solving the Problems In order to achieve this object, the method for manufacturing an optical disk substrate of the present invention uses a radiation-curable resin with excellent optical properties, heat resistance, etc. as the substrate material, and The radiation curable resin is cured and molded using radiation only in the radiation absorption edge wavelength region of the curing initiation mechanism.

作   用 放射線硬化樹脂にその放射線吸収端波長領域(放射線吸
収率が90%前後から10%前後に変化していく波長領
域)の放射線を照射すれば、放射線照射面側の樹脂の硬
化が進行する一方、反対面側の樹脂にも数10%の放射
線が放射線照射面側の樹脂内を通過して到達し、硬化を
進行させるだめ、硬化が照射面側に片寄って進行するあ
るいは成形基板内部の樹脂の硬化が不充分となるという
ようなことに起因する問題点を解決することができる。
Effect: If radiation-cured resin is irradiated with radiation in its radiation absorption edge wavelength region (a wavelength region where the radiation absorption rate changes from around 90% to around 10%), the resin on the side irradiated with radiation will harden. On the other hand, several tens of percent of the radiation passes through the resin on the irradiated side and reaches the resin on the opposite side. Problems caused by insufficient curing of the resin can be solved.

実施例 以下本発明の一実施例について図面を参照しながら股間
する。
EXAMPLE Hereinafter, an example of the present invention will be explained with reference to the drawings.

第1図は本発明の一実施例における光ディスク基板の作
製方法の構成図である。第1図において、11は紫外線
照射装置、12は波長310〜390nmの領域のバン
ドパスフィルター板、13はガラス平板、14はエポキ
シアクリレート系紫外線硬化樹脂、15は金属系スタン
パ、16はスペーサである。
FIG. 1 is a block diagram of a method for manufacturing an optical disk substrate in one embodiment of the present invention. In FIG. 1, 11 is an ultraviolet irradiation device, 12 is a band-pass filter plate for a wavelength range of 310 to 390 nm, 13 is a glass flat plate, 14 is an epoxy acrylate ultraviolet curing resin, 15 is a metal stamper, and 16 is a spacer. .

第2図は上記実施例中の紫外線硬化樹脂の分光吸収特性
とがンドパスフィルター板の分光透過特性を表わした図
である。第2図において、21は紫外線硬化樹脂の分光
吸収曲線、22はバンドパスフィルター板の分光透過曲
線である。
FIG. 2 is a diagram showing the spectral absorption characteristics of the ultraviolet curable resin in the above embodiment and the spectral transmission characteristics of the pass filter plate. In FIG. 2, 21 is the spectral absorption curve of the ultraviolet curable resin, and 22 is the spectral transmission curve of the bandpass filter plate.

スペーサ16によって一定間隔(1〜1.2H)に保た
れたスタンパ15とガラス平板13の間に紫外線硬化樹
脂14を充填後、バンドパスフィルター板12を通して
紫外線をガラス平板13上から照射して紫外線硬化樹脂
14を成形固化させる。
After filling the space between the stamper 15 and the glass flat plate 13, which are kept at a constant interval (1 to 1.2 H) by the spacer 16, with an ultraviolet curing resin 14, ultraviolet rays are irradiated from above the glass flat plate 13 through the bandpass filter plate 12. The cured resin 14 is molded and solidified.

紫外線硬化樹脂14の紫外線吸収端波長領域(310〜
390nm)の紫外線のみを照射するので、紫外線照射
面側の樹脂の硬化が進行する一方、中央部叉び反対面側
(スタンパ側)の樹脂にも数10%の紫外線が到達して
硬化を進行させるだめ、硬化が照射面側に片寄って進行
するあるいは成形基板内部の樹脂の硬化が不充分になる
というようなことが発生せずほぼ均一な硬化が達成でき
る。
The ultraviolet absorption edge wavelength region of the ultraviolet curing resin 14 (310~
Since only ultraviolet rays (390 nm) are irradiated, the resin on the side irradiated with ultraviolet rays is cured, while several tens of percent of the ultraviolet rays also reach the center and the opposite side (stamper side) and proceed with curing. As a result, substantially uniform curing can be achieved without causing the curing to proceed toward the irradiated surface side or the resin inside the molded substrate to be insufficiently cured.

なお、本実施例では放射線及び放射線硬化を紫外線系の
ものとしたが、電子線等の他の放射線系のものを用いて
も良い。
In this embodiment, the radiation and radiation curing are UV-based, but other radiation-based radiation such as electron beams may be used.

発明の効果 本発明は、光ディスク基板材料として光学特性。Effect of the invention The present invention provides optical properties as an optical disc substrate material.

#熱性、成形性等に優れた放射線硬化樹脂を用い、その
放射線吸収端波長領域のみの放射線を用いて該放射線硬
化樹脂を硬化成形する方法によって特性が均一でソリ、
変形が小さく、生産性が高くて小規模多品種生産に適し
た光ディスク基板を実現できるものである。
#By using a radiation-cured resin with excellent thermal properties and moldability, and by curing and molding the radiation-cured resin using radiation only in the radiation absorption edge wavelength region, the properties are uniform and warp is achieved.
It is possible to realize an optical disk substrate with small deformation, high productivity, and suitable for small-scale multi-product production.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例における光ディスク基板の作
製方法の構成図、第2図は上記実施例中の紫外線硬化樹
脂の分光吸収特性とバンドパスフィルター板の分光透過
特性を表わした特性図、第3図は従来の光ディスクの構
成図である。 11・・・・・・紫外線照射装置、12・・・・・・バ
ンドパスフィルター、13・・・・・・ガラス平板、1
4・・・・・・紫外M 硬化樹脂、16・・・・・・ヌ
タンパ、16・・・・・・ヌベーサ、21・・・・・・
紫外線硬化樹脂の分光吸収曲線、22・・・・・・バン
ドパスフィルター板の分光透過曲線、31・・・・・・
透明基板、32・・・・・・下地層、33・・・・・・
記録膜、34・・・・・・保護層。
FIG. 1 is a block diagram of a method for manufacturing an optical disk substrate in one embodiment of the present invention, and FIG. 2 is a characteristic diagram showing the spectral absorption characteristics of the ultraviolet curable resin and the spectral transmission characteristics of the bandpass filter plate in the above embodiment. , FIG. 3 is a block diagram of a conventional optical disc. 11... Ultraviolet irradiation device, 12... Band pass filter, 13... Glass flat plate, 1
4... Ultraviolet M curing resin, 16... Nutampa, 16... Nubesa, 21...
Spectral absorption curve of ultraviolet curing resin, 22... Spectral transmission curve of band pass filter plate, 31...
Transparent substrate, 32... Base layer, 33...
Recording film, 34...protective layer.

Claims (2)

【特許請求の範囲】[Claims] (1)放射線硬化樹脂の放射線吸収端波長領域のみの放
射線を用いて硬化成形することを特徴とする放射線硬化
樹脂による光ディスク基板の作製方法。
(1) A method for producing an optical disk substrate using a radiation-curable resin, characterized in that curing and molding is performed using radiation only in the radiation absorption edge wavelength region of the radiation-curable resin.
(2)放射線が紫外線であることを特徴とする特許請求
の範囲第1項記載の光ディスク基板の作製方法。
(2) The method for manufacturing an optical disk substrate according to claim 1, wherein the radiation is ultraviolet rays.
JP30082587A 1987-11-27 1987-11-27 Manufacturing method of optical disk substrate Expired - Fee Related JP2638859B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30082587A JP2638859B2 (en) 1987-11-27 1987-11-27 Manufacturing method of optical disk substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30082587A JP2638859B2 (en) 1987-11-27 1987-11-27 Manufacturing method of optical disk substrate

Publications (2)

Publication Number Publication Date
JPH01140442A true JPH01140442A (en) 1989-06-01
JP2638859B2 JP2638859B2 (en) 1997-08-06

Family

ID=17889558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30082587A Expired - Fee Related JP2638859B2 (en) 1987-11-27 1987-11-27 Manufacturing method of optical disk substrate

Country Status (1)

Country Link
JP (1) JP2638859B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100543662B1 (en) * 2003-11-18 2006-01-20 주식회사 엔텍 Range-hood

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100543662B1 (en) * 2003-11-18 2006-01-20 주식회사 엔텍 Range-hood

Also Published As

Publication number Publication date
JP2638859B2 (en) 1997-08-06

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