JPH01107058A - Method of controlling cryogenic device - Google Patents
Method of controlling cryogenic deviceInfo
- Publication number
- JPH01107058A JPH01107058A JP26387387A JP26387387A JPH01107058A JP H01107058 A JPH01107058 A JP H01107058A JP 26387387 A JP26387387 A JP 26387387A JP 26387387 A JP26387387 A JP 26387387A JP H01107058 A JPH01107058 A JP H01107058A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- cold box
- heat
- shield
- cooled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 6
- 238000001816 cooling Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 abstract description 23
- 239000001307 helium Substances 0.000 abstract description 9
- 229910052734 helium Inorganic materials 0.000 abstract description 9
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract description 9
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000005057 refrigeration Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
Landscapes
- Containers, Films, And Cooling For Superconductive Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、極低温装置の制御方法に係り、特にヘリウム
液化冷凍装置等の極低温装置の制御方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method of controlling a cryogenic device, and particularly to a method of controlling a cryogenic device such as a helium liquefaction refrigeration device.
ヘリウム液化冷凍装置等の極低温装置において、極低温
での冷凍能力を得るために必要な理論動力は、実用上、
冷凍能力の５００〜１０００倍の動力を必要とする。そ
こで、冷凍能力を軽減するために、被冷却体においては
熱シールドを実施することが多く、通常、熱シールドと
しては、液体窒素（ＬＮ２ ）シールドが多用されてい
る。In cryogenic equipment such as helium liquefaction refrigeration equipment, the theoretical power required to obtain cryogenic cooling capacity is practically
It requires 500 to 1000 times more power than the refrigeration capacity. Therefore, in order to reduce the refrigeration capacity, a heat shield is often implemented on the object to be cooled, and usually, a liquid nitrogen (LN2) shield is often used as the heat shield.
なお、この種の技術として関連するものには、例えば、
特開昭６０−１３０１００号、実開昭５９−６６９９号
等が挙げられる。In addition, related technologies of this type include, for example,
Examples include JP-A No. 60-130100 and Utility Model Application No. 59-6699.
上記従来技術では、被冷却体の熱シールドの熱負荷変動
が及ぼすコールドボックスの制御性について配慮がされ
ておらず、このため、被冷却体の熱シールドの熱負荷が
変動した場合、極低温装置を安定運転できないといった
問題がある。In the above conventional technology, no consideration is given to the controllability of the cold box affected by changes in the heat load of the heat shield of the object to be cooled, and therefore, when the heat load of the heat shield of the object to be cooled changes, There are problems such as not being able to operate stably.
本発明の目的は、被冷却体の熱シールドの熱負荷変動に
よらず極低温装置を安定運転できる極低温装置の制御方
法を提供することにある。An object of the present invention is to provide a method for controlling a cryogenic device that allows stable operation of the cryogenic device regardless of changes in heat load on a heat shield of an object to be cooled.
上記目的は、極低温装置の制御方法を、被冷却体の熱シ
ールドを冷却後の作動ガスが合流されてコールドボック
スを介して圧縮機に戻され前記コールドボックスで前記
圧縮機から吐出された作動ガスを冷却する作動ガスの温
度を前記コールドボックスの適正制御許容温度に調節す
る方法とすることにより、達成される。The above object is to provide a control method for a cryogenic device, in which the working gas after cooling the heat shield of the object to be cooled is combined and returned to the compressor via the cold box. This is achieved by adjusting the temperature of the working gas that cools the gas to a temperature that allows proper control of the cold box.
コールドボックスの冷凍能力は、例えば、ヘリウム液化
冷凍装置の場合、膨張タービン流量、膨張弁流量及び温
度のパラメータにより決定されるので、被冷却体よりの
戻り作動ガスの温度をコールドボックスの適正制御許容
温度に調節することで、コールドボックス内の温度バラ
ンスを乱すことなく、安定した冷凍能力を得ることがで
きる。For example, in the case of a helium liquefaction refrigerator, the refrigerating capacity of the cold box is determined by the parameters of the expansion turbine flow rate, expansion valve flow rate, and temperature. By adjusting the temperature, stable refrigeration capacity can be obtained without disturbing the temperature balance inside the cold box.
また、本発明による制御は、コールドボックス内での液
体作動ガスの発生量が減少させられないように制御する
もので、余剰の液体作動ガスは、デユワ−内にてヒータ
負荷により負荷バランスの調整を行うことになるので、
常に安定した制御となる。Furthermore, the control according to the present invention is to control so that the amount of liquid working gas generated in the cold box is not reduced, and excess liquid working gas is handled by adjusting the load balance by adjusting the heater load in the dewar. Since we will be doing
Control is always stable.
以下、本発明の一実施例を第１図により説明する。第１
図で、Ｈｅ圧縮機ｌにより高圧に圧縮したＨｅガスをコ
ールドボックス９に送り、熱交換器２ａ、２ｂにてＬＮ
２と熱交換し、温度低下したＨｅガスは、一部、タービ
ン人口弁４を通り、膨張タービン３ａ、３ｂにて断熱膨
張し温度低下し、戻りガスとなる。一方、ＪＴラインの
高圧のＨｅガスは、熱交換器２０〜２ｅにより戻りガス
と熱交換し、温度低下し、ＪＴＴ弁で大気圧まで膨張し
、一部が、液化し、液体ヘリウムデユワ−７に貯えられ
る。液化しなかったガスは、膨張タービン３ｂ出口のガ
スと共に、戻りガスとなり、熱交換器２ｅ〜２ａにより
高圧ラインのＨｅガスと熱交換し、温度回復したあと、
ヘリウム圧縮機ｌの吸入側に戻る。液体ヘリウムデユワ
−７に貯えられたＬＨｅは被冷却体８に供給され、ここ
で４．５にでの熱負荷を設ける。この熱負荷によりガス
化したＧＨｅは、極低温配管１１を通り、コールドボッ
クス９に回収される。又、被冷却体８の熱シールドであ
る４０にシールド用に使用され熱負荷を受け、温度上昇
したＧＨｅは極低温配管１０を通り、コールドボックス
９の中に戻され、回収配管１４を通り寒冷回収される。An embodiment of the present invention will be described below with reference to FIG. 1st
In the figure, He gas compressed to high pressure by He compressor 1 is sent to cold box 9, and LN is transferred to heat exchangers 2a and 2b.
A portion of the He gas, whose temperature has been lowered by exchanging heat with the He gas, passes through the turbine valve 4, expands adiabatically in the expansion turbines 3a and 3b, and whose temperature is lowered, becoming return gas. On the other hand, the high-pressure He gas in the JT line exchanges heat with the return gas in the heat exchangers 20 to 2e, lowers its temperature, expands to atmospheric pressure in the JTT valve, and partially liquefies and becomes liquid helium dewar-7. Can be stored. The gas that has not been liquefied becomes return gas together with the gas at the outlet of the expansion turbine 3b, and after the heat exchangers 2e to 2a exchange heat with the He gas in the high pressure line and recover the temperature,
Return to the suction side of the helium compressor l. LHe stored in the liquid helium dewar 7 is supplied to the object to be cooled 8, where a heat load of 4.5 mm is applied. GHe gasified by this heat load passes through the cryogenic pipe 11 and is collected in the cold box 9. In addition, the GHe whose temperature has increased due to the heat load applied to the heat shield 40 of the object to be cooled 8 passes through the cryogenic pipe 10 and is returned to the cold box 9, and then passes through the recovery pipe 14 and is cooled. It will be collected.
ここで、この４０にシールドの熱負荷が、変動した場合
、戻りガスの温度が急変し、熱交換器２ｂ、２ｃのバラ
ンスが乱れ、正常な運転が出来ず、コールドボックス９
の制御が、タービン入口弁４、ＪＴＴ弁の制御のみでバ
ランスを調整するのが、難しくなる。そこで、このよう
な場合、４０に戻りガスの負荷変動に対して、流量調節
弁６、ヒータ１３、ＴＩＣコントローラー１５により４
０にシールドライン１０よりの戻りガス温度は一定温度
に調節される。４０にシールド流量は、極低温配管ｌＯ
のフンダクタンス等により流量調節も容易でない。しか
し、ＴＩＣコントローラー１５により、戻りガスの温度
変動に対して、安定した制御になる様に流量調整弁６を
所定の流量に調整しておき、ヒータ１３により寒冷量の
バランスを保って制御される。Here, if the heat load on the shield 40 changes, the temperature of the return gas will change suddenly, the balance of the heat exchangers 2b and 2c will be disturbed, normal operation will not be possible, and the cold box 9
It becomes difficult to adjust the balance only by controlling the turbine inlet valve 4 and the JTT valve. Therefore, in such a case, the flow rate control valve 6, heater 13, and TIC controller 15 will return to 40 to respond to the gas load fluctuation.
At zero, the temperature of the return gas from the shield line 10 is adjusted to a constant temperature. Shield flow rate to 40, cryogenic piping lO
It is not easy to adjust the flow rate due to the fundductance, etc. However, the flow rate adjustment valve 6 is adjusted to a predetermined flow rate by the TIC controller 15 to ensure stable control against temperature fluctuations of the return gas, and the heater 13 is controlled to maintain the balance of the cooling amount. .
本実施例によれば、４０にシールドの負荷変動に対して
安定した戻りガスの温度が得られるため、コールドボッ
クス内の温度バランスを乱すことがなくヘリウム液化冷
凍装置を安定運転できる。According to this embodiment, since the return gas temperature can be stabilized against the load fluctuation of the shield at 40, the helium liquefaction refrigeration system can be stably operated without disturbing the temperature balance in the cold box.
本発明によれば、被冷却体の熱シールドの熱負荷変動に
対して戻り作動ガスの温度を一定に調節することで、熱
シールドの熱負荷変動によらず極低温装置を安定運転で
きるという効果がある。According to the present invention, by adjusting the temperature of the return working gas to a constant level in response to fluctuations in the heat load of the heat shield of the object to be cooled, the cryogenic equipment can be operated stably regardless of the fluctuations in the heat load of the heat shield. There is.
第１図は、本発明の一実施例のヘリウム液化冷凍装置の
系統図である。FIG. 1 is a system diagram of a helium liquefaction refrigeration system according to an embodiment of the present invention.
Claims (1)
れてコールドボックスを介して圧縮機に戻され前記コー
ルドボックスで前記圧縮機から吐出された作動ガスを冷
却する作動ガスの温度を前記コールドボックスの適正制
御許容温度に調節することを特徴とする極低温装置の制
御方法。1. After cooling the heat shield of the object to be cooled, the working gas is combined and returned to the compressor via the cold box, and the working gas discharged from the compressor is cooled in the cold box. A method of controlling a cryogenic device, characterized by adjusting the temperature of a cold box to an appropriate control allowable temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26387387A JPH01107058A (en) | 1987-10-21 | 1987-10-21 | Method of controlling cryogenic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26387387A JPH01107058A (en) | 1987-10-21 | 1987-10-21 | Method of controlling cryogenic device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01107058A true JPH01107058A (en) | 1989-04-24 |
Family
ID=17395427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26387387A Pending JPH01107058A (en) | 1987-10-21 | 1987-10-21 | Method of controlling cryogenic device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01107058A (en) |
-
1987
- 1987-10-21 JP JP26387387A patent/JPH01107058A/en active Pending
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