JPH01106064A - Printing method - Google Patents

Printing method

Info

Publication number
JPH01106064A
JPH01106064A JP26441787A JP26441787A JPH01106064A JP H01106064 A JPH01106064 A JP H01106064A JP 26441787 A JP26441787 A JP 26441787A JP 26441787 A JP26441787 A JP 26441787A JP H01106064 A JPH01106064 A JP H01106064A
Authority
JP
Japan
Prior art keywords
photomask
ink
printing
light
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26441787A
Other languages
Japanese (ja)
Inventor
Katsue Kenmochi
剣持 加津衛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP26441787A priority Critical patent/JPH01106064A/en
Publication of JPH01106064A publication Critical patent/JPH01106064A/en
Pending legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable printing with high surface roughness using a thick film by controlling the shape of a printing pattern previously and forming its surface to the roughness of a photomask surface. CONSTITUTION:On one surface of a photomask 1, there is a mask part 2 formed by vapor-depositing a chromium film according to a pattern, and there is ink 3 consisting principally of ultraviolet-ray setting resin in contact with the mask part. The top surface of the photomask 1 is irradiated with a light beam from the light source consisting of an ultraviolet-ray lamp 4 and a reflecting mirror 5 and the light strikes on the ink 3 through a part 6 where there is not the chromium film, so that the setting part 7 of the ink 3 is grown downward gradually. When the whole body is heated or irradiated with the light while the setting part 7 is in contact with a body 8 to be printed, the setting part 7 sets completely on the whole to obtain adhesive strength with the body 8 to be printed. When the photomask 1 and body 8 to be printed are separated, the setting part 7 is left on the side of the body 8 to be printed. At this time, the surface of the setting part 7 has nearly the same surface roughness with the photomask 1, its plane shape is a copy of the pattern of the photomask 1, and the thickness is uniform.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は印刷方法に関するものであシ、とくに印刷され
るインクの厚さが比較的厚いものに対して有効となるよ
う工夫したものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a printing method, and is particularly designed to be effective when printing ink that is relatively thick.

従来の技術 印刷方法としては、凸版印刷、凹版印刷、スクリーン印
刷などが古くから知られている。
Conventional printing methods such as letterpress printing, intaglio printing, and screen printing have been known for a long time.

例えば第4図は凸版印刷の例で、中間ロール16とドク
ターロール16とでインク17を一定の厚さにならし、
中間ロール16に付着したインクを印刷ロール18上の
凸部19に移し取り、印刷ロール18と送シロール2o
によりはさんだ被印刷物22を送シながら凸部19に付
着したインク21を被印刷物22に印刷する方法である
For example, FIG. 4 shows an example of letterpress printing, in which the ink 17 is leveled to a constant thickness using an intermediate roll 16 and a doctor roll 16.
The ink adhering to the intermediate roll 16 is transferred to the convex portion 19 on the printing roll 18, and the ink is transferred to the printing roll 18 and the feed roll 2o.
In this method, the ink 21 adhering to the convex portion 19 is printed on the printing material 22 while the printing material 22 sandwiched between the two is being fed.

第6図はスクリーン印刷の例でありヌクリーン23上に
インク24を載せ、スキージ26でスクリーン23を被
印刷物26に押し当てながら矢印の方向に押し進めるこ
とによシ、スクリーン23の所望位置に設けられたスキ
間よりインク27が被印刷物26に付着する。
FIG. 6 shows an example of screen printing. Ink 24 is placed on a blank 23, and the screen 23 is placed at a desired position on the screen 23 by pushing it in the direction of the arrow while pressing the screen 23 against the printing material 26 with a squeegee 26. The ink 27 adheres to the printing material 26 from the gaps.

発明が解決しようとする問題点 しかしながらこれ等の方法において、被印刷物に付着し
たインクの厚さを厚くできない。スクリーン印刷のよう
にロールを用いない印刷により1100zz程度まで印
刷することができてもそれ以上は困難である。
Problems to be Solved by the Invention However, in these methods, it is not possible to increase the thickness of the ink adhered to the printing substrate. Even if it is possible to print up to about 1100 zz by printing without using a roll, such as screen printing, it is difficult to print beyond that.

また厚く印刷した時に、印刷したインクの形状精度を保
つことが難しく、横への崩れ、上面の凹凸などを伴なう
Furthermore, when printing thickly, it is difficult to maintain the shape accuracy of the printed ink, resulting in horizontal collapse and unevenness on the top surface.

問題点を解決するための手段 本発明は、立体的な形状精度も含めて精度の良い印刷を
行うために、光を選択的に通すようにパターンを形成し
たフォトマスクのパターン形成面に感光性硬化樹脂を基
材としたインクを接触させ、パターン形成面の反対側か
ら光線を照射してインクのパターン形状の硬化部を形成
した後、パターン形成面に付着した未硬化インクを取り
除いて前記硬化部を被印刷物に当接し、この硬化部を光
もしくは熱によって完全硬化させた後フォトマスクを剥
がすことを特徴とする。
Means for Solving the Problems In order to perform printing with high precision including three-dimensional shape precision, the present invention uses a photosensitive material on the patterned surface of a photomask that is patterned to selectively transmit light. After bringing ink based on a cured resin into contact and irradiating a light beam from the opposite side of the pattern-forming surface to form a cured part in the shape of the ink pattern, uncured ink adhering to the pattern-forming surface is removed and the above-mentioned curing is performed. The photomask is removed after the photomask is brought into contact with the printed material and the cured portion is completely cured by light or heat.

作  用 上記構成によれば、フォトマスクに接触した感光性硬化
樹脂はフォトマスクを通過した光線により硬化する。こ
の硬化パターンはフォトマスクのパターンに従がい、そ
の厚さは光量に比例する。
Operation According to the above configuration, the photosensitive curing resin that has come into contact with the photomask is cured by the light beam that has passed through the photomask. This cured pattern follows the pattern of the photomask, and its thickness is proportional to the amount of light.

適光な時間を選んで光をさえ切り、フォトマスクに付着
している未硬化樹脂を取り除くと、硬化した樹脂がフォ
トマスクのパターンに従って残ル。
When the light is turned off at an appropriate time and the uncured resin adhering to the photomask is removed, the cured resin remains following the pattern of the photomask.

厳密にはフォトマスクに近い部分の樹脂は硬化が進み、
表面部の樹脂は硬化途上の樹脂である。その状態で被印
刷物に当接して、熱もしくは光を作用させることによシ
、完全に全体の樹脂を硬化することができる。次にフォ
トマスクを剥がす時、樹脂の付着強度がフォトマスクよ
り、被印刷物に対して強い条件で、インクは被印刷物側
に残シ所期の目的にかなう。
Strictly speaking, the resin in the area near the photomask will continue to harden.
The resin on the surface is in the process of curing. In this state, the entire resin can be completely cured by bringing it into contact with the printing material and applying heat or light to it. Next, when the photomask is peeled off, the ink will remain on the printing medium and serve the intended purpose, provided that the adhesive strength of the resin is stronger than that of the photomask.

実施例 第1図は本発明の第1実施例における一工程での断面図
であシ、フォトマスク1の片面には、クロム膜をパター
ンに基いて蒸着したマスク部2があり、そこに接して紫
外線硬化樹脂を主成分としたインク3がある。フォトマ
スク1の上面からは紫外線ランプ4と反射鏡5からなる
光源の光線が照射され、クロム膜のない部分6を通して
、インク3に光が当たる。その結果、インク3の硬化部
7が下方に徐々に成長する。
Embodiment FIG. 1 is a cross-sectional view of one step in the first embodiment of the present invention. On one side of a photomask 1, there is a mask part 2 on which a chromium film is vapor-deposited based on a pattern, and in contact therewith. There is an ink 3 whose main component is an ultraviolet curing resin. A light beam from a light source consisting of an ultraviolet lamp 4 and a reflecting mirror 5 is irradiated from the top surface of the photomask 1, and the light hits the ink 3 through a portion 6 where there is no chrome film. As a result, the hardened portion 7 of the ink 3 gradually grows downward.

適度に成長したところで光源を止め、フォトマスク1を
インク3から離すと、硬化部7はフォトマスク1に接合
し未硬化のインク3と分離される。
When the light source is turned off and the photomask 1 is separated from the ink 3 after proper growth, the cured portion 7 is bonded to the photomask 1 and separated from the uncured ink 3.

厳密には硬化部7の表面も未硬化樹脂成分濃度が高い。Strictly speaking, the surface of the cured portion 7 also has a high concentration of uncured resin components.

第2図は、次いで被印刷物に印刷する工程の断面図であ
り、硬化部7が被印刷物8と接した状態で、全体を加熱
するか、第1図と同様に光を照射すると硬化部7全体が
完全に硬化し、被印刷物8との接合強度を生ずる。被印
刷物8が多孔質(紙類、木材等)であればフォトマスク
1を上回る接合強度が生じ、同程度であればフォトマス
ク1のマスク表面9にフッ素系のコーテング処理を施す
ことによシ、被印刷物8への接合性へ高めること 。
FIG. 2 is a cross-sectional view of the process of printing on the printing material. When the hardening section 7 is in contact with the printing material 8 and the entire body is heated or light is irradiated in the same manner as in FIG. The entire body is completely cured, creating a bonding strength with the printing substrate 8. If the substrate 8 to be printed is porous (paper, wood, etc.), the bonding strength will be higher than that of the photomask 1, and if it is the same, it will be possible to bond by applying a fluorine-based coating to the mask surface 9 of the photomask 1. , to improve adhesion to the printing substrate 8.

ができ、フォトマスク1と被印刷物8を引き剥すと、硬
化部7は被印刷物8側に残される。その時、硬化部7の
表面はフォトマスク1の面粗度と同等であシ、平面形状
はフォトマスク1のパターンにならっておシ、厚さも均
一に揃っている。
When the photomask 1 and the printing material 8 are peeled off, the cured portion 7 is left on the printing material 8 side. At this time, the surface of the cured portion 7 has a surface roughness equivalent to that of the photomask 1, has a planar shape that follows the pattern of the photomask 1, and has a uniform thickness.

第3図は、更に高さ寸法を任意の値に制御するための方
法であシ、フォトマスク10とトレイ11との間にスペ
ーサ12を設け、そのスキ間をインク13″″C充填し
た後、第1図と同様に光を照射すると、スペーサ12と
同等の厚さの硬化部14が成長する。この時、トレイ1
1と硬化部14が接合しないように、トレイ11の表面
をテフロンや、シリコンなどによシ被覆しておくと有利
である。
FIG. 3 shows a method for further controlling the height dimension to an arbitrary value, after providing a spacer 12 between the photomask 10 and the tray 11 and filling the gap with ink 13''C. When light is irradiated in the same manner as in FIG. 1, a cured portion 14 having the same thickness as the spacer 12 grows. At this time, tray 1
It is advantageous to coat the surface of the tray 11 with Teflon, silicone, etc. so that the hardened portion 1 and the hardened portion 14 do not come together.

発明の効果 本発明によれば、予め印刷パターンの形状をコントロー
ルした後印刷するので形状精度の高い印刷が可能であシ
、特に印刷表面はフォトマスク面粗度にならうので従来
困難であった厚膜で面粗度の高い印刷が可能となる。
Effects of the Invention According to the present invention, since the shape of the printing pattern is controlled in advance before printing, it is possible to print with high shape precision, which was difficult in the past because the printing surface follows the surface roughness of the photomask. It is possible to print thick films with high surface roughness.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の第1実施例を表わす断面図、第2図は
第1図に示す工程の次の工程での断面図、第3図は本発
明の第2実施例の断面図、第4図及び第6図は従来の印
刷方法を示す断面図である。 1.10・・・・・・フォトマヌク、3.13・・・・
・・インク、4・・・・・・ランプ、7,14・・・・
・・硬化部、8・・・・・・被印刷物。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名1−
−−フォL7又り 第 1 図                    
3−1+シク第 2 図             8
−梃呻呻第3図       ′°ゴ″ゝ″″ +3−4.り f4−1仁砕
FIG. 1 is a sectional view showing a first embodiment of the present invention, FIG. 2 is a sectional view at a step subsequent to the step shown in FIG. 1, and FIG. 3 is a sectional view of a second embodiment of the invention. FIGS. 4 and 6 are cross-sectional views showing a conventional printing method. 1.10...Photomanuku, 3.13...
...Ink, 4...Lamp, 7,14...
...Curing part, 8... Printing target. Name of agent: Patent attorney Toshio Nakao and 1 other person1-
--Photo L7 Figure 1
3-1+shiku 2nd figure 8
- Figure 3 ``Go''ゝ'''' +3-4.ri f4-1

Claims (3)

【特許請求の範囲】[Claims] (1)光を選択的に通すようにパターンを形成したフォ
トマスクのパターン形成面に感光性硬化樹脂を基材とし
たインクを接触させ、パターン形成面の反対側から光線
を照射してインクのパターン形状の硬化部を形成した後
、パターン形成面に付着した未硬化インクを取り除いて
前記硬化部を被印刷物に当接し、この硬化部を光もしく
は熱によって完全硬化させた後、フォトマスクを剥がし
てなる印刷方法。
(1) Ink made of a photosensitive hardening resin is brought into contact with the patterned surface of a photomask that is patterned to selectively transmit light, and the ink is irradiated with light from the opposite side of the patterned surface. After forming a pattern-shaped cured area, remove the uncured ink adhering to the pattern formation surface, bring the cured area into contact with a printing target, completely cure this cured area with light or heat, and then peel off the photomask. A printing method.
(2)パターン形成面に感光性樹脂と剥離しやすい層を
設けた特許請求の範囲第1項記載の印刷方法。
(2) The printing method according to claim 1, wherein a layer that is easily peeled off from the photosensitive resin is provided on the pattern forming surface.
(3)フォトマスクに接触させるインクの厚さを予め制
御できるようインクをフォトマスクと底板にはさんでな
る特許請求の範囲第1項記載の印刷方法。
(3) The printing method according to claim 1, wherein the ink is sandwiched between the photomask and the bottom plate so that the thickness of the ink brought into contact with the photomask can be controlled in advance.
JP26441787A 1987-10-20 1987-10-20 Printing method Pending JPH01106064A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26441787A JPH01106064A (en) 1987-10-20 1987-10-20 Printing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26441787A JPH01106064A (en) 1987-10-20 1987-10-20 Printing method

Publications (1)

Publication Number Publication Date
JPH01106064A true JPH01106064A (en) 1989-04-24

Family

ID=17402882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26441787A Pending JPH01106064A (en) 1987-10-20 1987-10-20 Printing method

Country Status (1)

Country Link
JP (1) JPH01106064A (en)

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