JPH01100714A - Composite magnetic head - Google Patents
Composite magnetic headInfo
- Publication number
- JPH01100714A JPH01100714A JP25629087A JP25629087A JPH01100714A JP H01100714 A JPH01100714 A JP H01100714A JP 25629087 A JP25629087 A JP 25629087A JP 25629087 A JP25629087 A JP 25629087A JP H01100714 A JPH01100714 A JP H01100714A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- oxide
- gap
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002131 composite material Substances 0.000 title claims description 30
- 239000010409 thin film Substances 0.000 claims abstract description 60
- 239000010408 film Substances 0.000 claims abstract description 23
- 239000000696 magnetic material Substances 0.000 claims abstract description 23
- 229910052751 metal Inorganic materials 0.000 claims description 38
- 239000002184 metal Substances 0.000 claims description 38
- 229910052748 manganese Inorganic materials 0.000 claims description 9
- 229910052726 zirconium Inorganic materials 0.000 claims description 9
- 229910052749 magnesium Inorganic materials 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 239000011162 core material Substances 0.000 abstract description 33
- 229910000859 α-Fe Inorganic materials 0.000 abstract description 13
- 239000011521 glass Substances 0.000 abstract description 7
- 230000004927 fusion Effects 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 34
- 230000002265 prevention Effects 0.000 description 30
- 239000000956 alloy Substances 0.000 description 19
- 229910045601 alloy Inorganic materials 0.000 description 17
- 230000004907 flux Effects 0.000 description 12
- 230000000694 effects Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 229910000929 Ru alloy Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910018459 Al—Ge Inorganic materials 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910001004 magnetic alloy Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 229910000927 Ge alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000007499 fusion processing Methods 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 229910021364 Al-Si alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910020018 Nb Zr Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、複合磁気ヘッドに関し、特に主コア材として
軟磁性の金属磁性薄膜を、補助コア材として酸化物磁性
材料を用い、高周波記録・再生に適する複合磁気ヘッド
に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a composite magnetic head, and in particular uses a soft magnetic metal magnetic thin film as the main core material and an oxide magnetic material as the auxiliary core material, and is capable of high-frequency recording. This invention relates to a composite magnetic head suitable for reproduction.
本発明は、酸化物磁性材料と金属磁性薄膜により構成さ
れるとともに、上記金属磁性薄膜により磁気ギャップが
形成されるいわゆるメタル・イン・ギャップ型の複合磁
気ヘッドにおいて、上記金属磁性薄膜と上記酸化物磁性
材料との界面に２０〜２００人の膜厚のＳｉ、Ｔｉ、Ｃ
ｒ、ＡＩ、Ｔａ。The present invention provides a so-called metal-in-gap type composite magnetic head that is composed of an oxide magnetic material and a metal magnetic thin film, and in which a magnetic gap is formed by the metal magnetic thin film. Si, Ti, C with a thickness of 20 to 200 people at the interface with the magnetic material
r, AI, Ta.
Ｚｒ、Ｍｇ、Ｍｎ、Ｚｎの酸化物薄膜の少なくとも一種
を配することにより、上記金属磁性薄膜と上記酸化物磁
性材料との間の反応を抑制し、疑似ギャップの形成を防
止することを可能とするものである。By disposing at least one kind of oxide thin film of Zr, Mg, Mn, or Zn, it is possible to suppress the reaction between the metal magnetic thin film and the oxide magnetic material and prevent the formation of a pseudo gap. It is something to do.
近年、磁気記録の分野においては、記録信号の高密度化
が進行しており、高い抗磁力と残留磁束密度を有する磁
気記録媒体が使用されるようになっている。これに伴っ
て、磁気ヘッドのコア材料には高い飽和磁束密度および
透磁率を有することが要求されている。In recent years, in the field of magnetic recording, the density of recorded signals has been increasing, and magnetic recording media having high coercive force and residual magnetic flux density have come to be used. Accordingly, the core material of the magnetic head is required to have high saturation magnetic flux density and magnetic permeability.
しかしながら、コア材料として最も広く使用されている
酸化物磁性材料であるフェライトでは、飽和磁束密度が
不十分である。そこで、フェライトを補助コア材とし、
磁気ヘッドのギャップ部に高飽和磁束密度を有する金属
磁性薄膜を主コア材として挿入した、いわゆるメタル・
イン・ギャップ型の磁気ヘッドが従来から提案されてお
り、既に一部の消去用ヘッドに採用されている。However, ferrite, which is the most widely used oxide magnetic material as a core material, has an insufficient saturation magnetic flux density. Therefore, we used ferrite as an auxiliary core material.
A so-called metal magnetic thin film with a high saturation magnetic flux density is inserted as the main core material into the gap of the magnetic head.
In-gap magnetic heads have been proposed and have already been used in some erasing heads.
このような用途に使用される金属磁性薄膜としては、従
来Ｆｅ−Ｎｉ系合金（パーマロイ）、ｃｏ−Ｎｂ−Ｚｒ
等のアモルファス合金等が開発されてきた。しかし、パ
ーマロイは耐摩耗性に劣り、アモルファス合金は高温下
でのガラス融着に耐えることが困難である等の問題点が
あった。Conventional metal magnetic thin films used for such applications include Fe-Ni alloy (permalloy) and co-Nb-Zr.
Amorphous alloys such as these have been developed. However, permalloy has poor wear resistance, and amorphous alloys have problems such as difficulty in resisting glass fusion at high temperatures.
これらの諸問題を解決するため、本願出願人はこれまで
に高飽和磁束密度を有する金属磁性薄膜として、たとえ
ば特願昭６０−７７３３６号明細書においてＦｅ−Ｃｏ
−３ｉ−ＡＩ系合金を、特願昭６０−７７３３７号明細
書においてＦｅ−Ａｌ−Ｇｅ系合金を、また特願昭６０
−７７３３８号明細書においてＦｅ−Ｇａ−５ｉ系合金
を開示してきた。これらの合金の飽和磁束密度は１２〜
１５ ｋＧにも達することから、メタル・イン・ギャッ
プ型の複合磁気へラドの主コア材として有用であること
が期待され、開発が続けられている。In order to solve these problems, the applicant of the present application has developed Fe-Co as a metal magnetic thin film having high saturation magnetic flux density, for example, in Japanese Patent Application No. 77336/1983.
-3i-AI based alloy, Fe-Al-Ge based alloy in Japanese Patent Application No. 77337/1983, and Fe-Al-Ge based alloy in Japanese Patent Application No.
A Fe-Ga-5i based alloy has been disclosed in the specification No.-77338. The saturation magnetic flux density of these alloys is 12~
Since it can reach up to 15 kG, it is expected to be useful as the main core material for metal-in-gap type composite magnetic helads, and its development continues.
ところで、Ｎｉ−Ｚｎ系フェライト、Ｍｎ−Ｚｎ系フェ
ライト等の酸化物磁性材料から成る補助コア材の上に、
高飽和磁束密度を有するＦｅ−Ａｌ−３ｉ系合金、Ｆｅ
−Ｇａ−５ｔ−Ｒｕ系合金等の軟磁性合金を主コア材と
して成膜し、メタル・イン・ギャップ型の磁気ヘッドを
構成した場合、再生信号の周波数特性が周期的に変動す
る、いわゆるうねりが観測されていた。これは、磁気ヘ
ッドの製造工程において不可欠なガラス融着工程時の高
温加熱により、上記金属磁性薄膜と酸化物磁性材料との
界面において反応して、著しく透磁率の低下した反応層
（例えばアルミ酸化膜あるいはガリウム酸化膜）が形成
されるためである。上記反応層はギャップと略平行に位
置して形成されるため、疑似ギャップとして作用し、本
来のギャップにおける磁束と干渉を起こして疑似信号を
生成し、再生信号の品質を低下させる。このような欠点
が、複合磁気ヘッドの記録・再生兼用ヘッドとしての実
用化を妨げる原因となっていた。By the way, on the auxiliary core material made of oxide magnetic material such as Ni-Zn ferrite and Mn-Zn ferrite,
Fe-Al-3i alloy with high saturation magnetic flux density, Fe
- When forming a metal-in-gap magnetic head using a soft magnetic alloy such as a Ga-5t-Ru alloy as the main core material, the frequency characteristics of the reproduced signal periodically fluctuate, so-called waviness. was observed. This is due to the reaction at the interface between the metal magnetic thin film and the oxide magnetic material due to high-temperature heating during the glass fusing process, which is essential in the manufacturing process of magnetic heads, resulting in a reaction layer with significantly reduced magnetic permeability (for example, aluminum oxide). This is because a gallium oxide film) is formed. Since the reaction layer is formed substantially parallel to the gap, it acts as a pseudo gap and interferes with the magnetic flux in the original gap to generate a pseudo signal and degrade the quality of the reproduced signal. These drawbacks have hindered the practical use of composite magnetic heads as both recording and reproducing heads.
この反応層の形成を防止するため、たとえば酸化シリコ
ン等の非磁性材料を用いて上記界面に反応防止層を形成
する試みもなされているが、従来反応防止層として使用
されてきた各種の材料は、反応防止効果を得るためにあ
る程度以上の膜厚を必要とするので、反応防止層自体が
疑似ギャップとして悪影響を及ぼす虞れがある。In order to prevent the formation of this reaction layer, attempts have been made to form a reaction prevention layer at the interface using non-magnetic materials such as silicon oxide, but the various materials conventionally used as the reaction prevention layer are Since a certain thickness or more is required in order to obtain a reaction prevention effect, there is a possibility that the reaction prevention layer itself may have an adverse effect as a pseudo gap.
そこで本発明は、上記金属磁性薄膜と酸化物磁性材料と
の界面における反応を効果的に抑制し、かつ疑似ギャッ
プの発生を防止することにより、良好な記録・再生を可
能とする複合磁気ヘッドの提供を目的とするものである
。Therefore, the present invention provides a composite magnetic head that enables good recording and reproducing by effectively suppressing the reaction at the interface between the metal magnetic thin film and the oxide magnetic material and preventing the occurrence of pseudo gaps. It is intended for the purpose of providing.
上述のような従来の問題点を解決する目的で、本発明者
らは金属磁性Ｉ膜と酸化物磁性材料の界面に挿入される
反応防止層の材料として種々の物質を検討した結果、Ｓ
ｔ、Ｔｉ、Ｃｒ、ＡＩ、Ｔａ、Ｚｒ、Ｍｇ、Ｍｎ、Ｚｎ
の酸化物薄膜の少なくとも一種を用いて成膜した場合に
膜厚が薄くても良好な反応防止効果を示すことを見出し
、本発明に至ったものである。In order to solve the above-mentioned conventional problems, the present inventors investigated various substances as materials for the reaction prevention layer inserted at the interface between the metal magnetic I film and the oxide magnetic material.
t, Ti, Cr, AI, Ta, Zr, Mg, Mn, Zn
The present inventors have discovered that when a film is formed using at least one of the following oxide thin films, a good reaction prevention effect is exhibited even if the film is thin, and the present invention has been achieved.
すなわち、本発明にかかる複合磁気ヘッドは、少なくと
も一方の磁気コア半体が酸化物磁性材料と金属磁性薄膜
により構成される一対の磁気コア半体を突合せ、上記金
属磁性薄膜により磁気ギヤツブが形成されてなる複合磁
気ヘッドであって、上記金属磁性薄膜と上記酸化物磁性
材料との界面の一部が上記磁気ギャップの近傍において
該磁気ギャップと略平行であり、かつ上記金属磁性薄膜
と上記酸化物磁性材料との間に２０〜２００人の膜厚の
Ｓｔ、 Ｔｉ、 Ｃｒ、 ＡＩ、’Ｔａ、 Ｚｒ、 Ｍ
ｇ。That is, in the composite magnetic head according to the present invention, a pair of magnetic core halves in which at least one magnetic core half is made of an oxide magnetic material and a metal magnetic thin film are butted together, and a magnetic gear is formed by the metal magnetic thin film. A composite magnetic head comprising: a part of the interface between the metal magnetic thin film and the oxide magnetic material is approximately parallel to the magnetic gap in the vicinity of the magnetic gap; St, Ti, Cr, AI, 'Ta, Zr, M with a film thickness of 20 to 200 between magnetic materials.
g.
Ｍｎ、Ｚｎの酸化物薄膜の少なくとも一種を配したこと
を特徴とするものである。It is characterized by disposing at least one of Mn and Zn oxide thin films.
本発明にかかる複合磁気ヘッドは、補助コア材となるフ
ェライト等の酸化物磁性材料と、主コア材となる金属磁
性薄膜との界面の一部が磁気ギャップの近傍に、かつ該
磁気ギャップと略平行に配置された構造を有している。In the composite magnetic head according to the present invention, a part of the interface between the oxide magnetic material such as ferrite as the auxiliary core material and the metal magnetic thin film as the main core material is in the vicinity of the magnetic gap and approximately within the magnetic gap. It has structures arranged in parallel.
上記界面にはさらに、非常に膜厚の薄い（２０〜２００
人）反応防止層であるＳｉ、Ｔｉ、Ｃｒ、ＡＩ、Ｔａ、
Ｚｒ、Ｍｇ、Ｍｎ、Ｚｎの酸化物薄膜の少なくとも一種
が挿入されているので、ガラス融着等の熱処理を経た場
合にも上記酸化物磁性材料と金属磁性薄膜との間に反応
が起こらない、このため、反応層が形成されない、また
、反応防止層の膜厚が非常に薄いため、当該反応防止層
自体が疑似ギャップとして作用することもない。The above interface also has a very thin film (20 to 200
human) reaction prevention layer Si, Ti, Cr, AI, Ta,
Since at least one type of oxide thin film of Zr, Mg, Mn, or Zn is inserted, no reaction occurs between the oxide magnetic material and the metal magnetic thin film even after heat treatment such as glass fusion. Therefore, no reaction layer is formed, and since the thickness of the reaction prevention layer is very thin, the reaction prevention layer itself does not act as a pseudo gap.
したがって、このような複合磁気ヘッドを使用すること
により、捲めて良好な記録・再生特性が実現される。Therefore, by using such a composite magnetic head, good recording and reproducing characteristics can be realized.
以下、本発明の好適な実施例について、図面を参照しな
がら説明する。Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
本実施例は、補助コア材となる酸化物磁性材料としてＭ
ｎ−Ｚｎ系フェライトを、主コア材である金属磁性薄膜
に使用される軟磁性合金としてＦｅ−Ｇａ−５ｉ系合金
を、また反応防止層の材料として膜厚の極めて薄いＳｉ
等の酸化物薄膜を使用した複合磁気ヘッドの例である。In this example, M
n-Zn ferrite, Fe-Ga-5i alloy as the soft magnetic alloy used for the metal magnetic thin film which is the main core material, and extremely thin Si as the material for the reaction prevention layer.
This is an example of a composite magnetic head using an oxide thin film such as .
以下、本実施例にかかる複合磁気ヘッドの構成を、第１
図および第２図を参照しながら説明する。Hereinafter, the configuration of the composite magnetic head according to this embodiment will be explained as follows.
This will be explained with reference to the figures and FIG.
まず第１図に、いわゆるメタル・イン・ギャップ型の複
合磁気ヘッドの外観を示す、このような複合磁気ヘッド
は、記録媒体対接面ｌの中央に位置する磁気ギャップ２
を境として左右別々の磁気コア半体■、■とじて作成さ
れ、最後にガラス融着等により該磁気コア半体１．
ＩＩが対向して接合される。上記磁気コア半体１．ＩＩ
の少なくとも一方には、コイルを巻装するための巻線溝
３が穿設されている。First, Fig. 1 shows the appearance of a so-called metal-in-gap type composite magnetic head.
Separate left and right magnetic core halves 1.
II are joined facing each other. The above magnetic core half 1. II
A winding groove 3 for winding a coil is bored in at least one of the two.
第２図は、この複合磁気ヘッドを記録媒体対接面ｌから
見た要部拡大断面図である。各磁気コア半体半体ｉ、■
はフェライトからなる補助コア部４．５とＦｅ−Ｇａ−
３ｔ−Ｒｕ系合金からなる主コア部である金属磁性薄膜
６．７とに大別され、上記主コア部４，５と上記金属磁
性薄膜６．７との間には２０〜２００人の膜厚のＳｉ等
の酸化物薄膜からなる反応防止層８．９がそれぞれ形成
されている。上記磁気ギャップ２の両端にはトラック幅
Ｔ、、を規制するための略円弧状の切溝１０．１１が設
けられており、この切溝１０．１１には磁気記録媒体と
の当たり特性を確保するとともに磁気記録媒体の摺接に
よる偏摩耗を防止するためにガラス等の非磁性材料が充
填され、ガラス充填層１２となっている。そして上記相
対向する金属磁性薄膜６．７間にもガラスが充填され、
この部分がギャップ・スペーサとなっている。FIG. 2 is an enlarged sectional view of the main parts of this composite magnetic head viewed from the recording medium contacting surface l. Each magnetic core half half i,■
is an auxiliary core part 4.5 made of ferrite and Fe-Ga-
The metal magnetic thin film 6.7 is the main core part made of 3t-Ru alloy, and between the main core parts 4, 5 and the metal magnetic thin film 6.7 there is a film of 20 to 200 people. Reaction prevention layers 8 and 9 each made of a thick oxide thin film such as Si are formed. Approximately arcuate grooves 10.11 are provided at both ends of the magnetic gap 2 to regulate the track width T, and these grooves 10.11 ensure contact characteristics with the magnetic recording medium. At the same time, in order to prevent uneven wear due to sliding contact of the magnetic recording medium, a non-magnetic material such as glass is filled to form a glass filled layer 12. Glass is also filled between the opposing metal magnetic thin films 6 and 7,
This part serves as a gap spacer.
上述のような複合磁気ヘッドの構成においては、上記金
属磁性１１１１１Ａ６．７が、上部切溝１０．１１に沿
い、かつ磁気ギャップ２を囲むように形成され、磁気ギ
ャップ２へ向かって収束する形状を有しているので、磁
束を集中的に該磁気ギャップ２へ導（ことができる。In the configuration of the composite magnetic head as described above, the metal magnetic 11111A6.7 is formed along the upper kerf 10.11 and surrounding the magnetic gap 2, and has a shape converging toward the magnetic gap 2. Therefore, magnetic flux can be guided to the magnetic gap 2 in a concentrated manner.
上述の金属磁性薄膜６．７の材料としては、本例ではＦ
ｅ−Ｇａ−３ｉ−Ｒｕ系合金としたが、たとえば組成が
次式
％式％
（ただし、ａ、ｂ、ｃはそれぞれ組成比を原子％として
表す、）
で表され、その組成範囲が
６８≦ａ＋ｂ≦８４
１≦ｂ≦２３
９≦Ｃ≦３１
ａ＋ｂ＋ｃ＝１００
なる関係を満足するＦｅ−Ｇａ−５ｉ系合金が使用可能
である。In this example, the material of the metal magnetic thin film 6.7 is F.
For example, the composition of the e-Ga-3i-Ru alloy is expressed by the following formula % (where a, b, and c each represent the composition ratio as atomic %), and the composition range is 68≦ A Fe-Ga-5i alloy that satisfies the following relationships can be used: a+b≦84 1≦b≦23 9≦C≦31 a+b+c=100.
また、上記Ｆｅ−Ｇａ−５ｉ系合金材料において、耐蝕
性、耐摩耗性を向上させるためにＦｅの１５原子％まで
をＣＯで置換してもよいが、これより多くＣｏを使用す
ると飽和磁束密度が低下するので注意を要する。In addition, in the above Fe-Ga-5i alloy material, up to 15 atomic percent of Fe may be replaced with CO in order to improve corrosion resistance and wear resistance, but if more Co is used than this, the saturation magnetic flux density Caution is required as this will cause a decrease in
さらに、上記Ｆｅ−Ｇａ−５ｉ系合金材料の耐蝕性や耐
摩耗性の一層の向上を図るために、Ｆｅ。Furthermore, in order to further improve the corrosion resistance and wear resistance of the Fe-Ga-5i alloy material, Fe is added.
（一部をＣｏで置換したものを含む）、Ｇａ、Ｓｉを基
本組成とする合金に、Ｔｉ、Ｃｒ、Ｍｎ。(including those partially substituted with Co), Ti, Cr, and Mn in alloys whose basic composition is Ga and Si.
Ｚｒ、Ｎｂ、Ｍｏ、Ｔａ、Ｗ、Ｒｕ、Ｏｓ、Ｒｈ、Ｉｒ
、Ｒｅ、Ｎｉ、Ｐｄ、ＰＬ、Ｈｆ、Ｖの少なくとも１種
を添加しても良い、この場合、添加元素毎に添加量によ
る飽和磁束密度の低下率が異なるため、添加量は添加元
素毎に所定の範囲内で適宜設定する。特に、Ｒｕは耐摩
耗性の改善に好適であり、１５原子％以内の添加量であ
れば軟磁気特性にも悪影響を及ぼさない。Zr, Nb, Mo, Ta, W, Ru, Os, Rh, Ir
, Re, Ni, Pd, PL, Hf, and V may be added. In this case, the rate of decrease in saturation magnetic flux density depending on the amount added differs for each added element, so the amount added depends on each added element. Set as appropriate within a predetermined range. In particular, Ru is suitable for improving wear resistance, and if added in an amount of 15 atomic % or less, it does not adversely affect soft magnetic properties.
上記金属磁性薄膜６．７の材料として使用できる軟磁性
合金には、上述のＦｅ−Ｇａ−３ｉ系合金の他にも、Ｆ
ｅ−Ａｌ−３ｉ系合金、Ｆｅ−Ａｌ−Ｇｅ系合金、−Ｆ
ｅ−Ｇａ−Ｇｅ系合金、Ｆｅ−５ｉ−Ｇｅ系合金、Ｆｅ
−Ｃｏ−５ｉ系合金、Ｆｅ−Ｃｏ−３ｔ−ＡＩ系合金等
があり、いずれも高い飽和磁束密度を有し、かつ軟磁気
特性に優れている。In addition to the Fe-Ga-3i alloy mentioned above, soft magnetic alloys that can be used as the material for the metal magnetic thin film 6.7 include F
e-Al-3i alloy, Fe-Al-Ge alloy, -F
e-Ga-Ge alloy, Fe-5i-Ge alloy, Fe
-Co-5i alloy, Fe-Co-3t-AI alloy, etc., all of which have high saturation magnetic flux density and excellent soft magnetic properties.
なお、この金属磁性薄膜６．７は、各種スパッタリング
、イオン・ブレーティング、真空蒸着法、クラスター・
イオン・ビーム法等により被着形成することができる。In addition, this metal magnetic thin film 6.7 can be prepared by various sputtering methods, ion blating methods, vacuum evaporation methods, cluster deposition methods, etc.
It can be formed by an ion beam method or the like.
また、反応防止層８，９の材料として使用できる酸化物
薄膜としては、上述のＳｉの酸化物薄膜の他、Ｔｉ、Ｃ
ｒ、ＡＩ、Ｔａ、Ｚｒ、Ｍｇ、Ｍｎ、Ｚｎ等の酸化物薄
膜がある。これらの酸化物薄膜は、単層膜または各酸化
物を積層した積層膜としてもよく、さらには上記各酸化
物を混合した混合膜として使用してもよい、なお、この
反応防止層８．９も、上述の金属磁性薄膜６．７と同様
の手段にて被着形成される。ここで、上記反応防止層８
．９は、２０〜２００人の膜厚に設定する必要がある。Further, as the oxide thin film that can be used as a material for the reaction prevention layers 8 and 9, in addition to the above-mentioned Si oxide thin film, Ti, C
There are oxide thin films of r, AI, Ta, Zr, Mg, Mn, Zn, etc. These oxide thin films may be used as a single layer film or a laminated film of each oxide, or may be used as a mixed film of the above-mentioned oxides. The metal magnetic thin film 6.7 is also deposited by the same means as the above-described metal magnetic thin film 6.7. Here, the reaction prevention layer 8
．． 9 needs to be set to a film thickness of 20 to 200 people.
すなわち、上記反応防止層８．９をの膜厚を上記範囲に
限定するのは、次に示すような実験結果に基づくもので
ある。That is, the reason why the thickness of the reaction prevention layer 8.9 is limited to the above range is based on the following experimental results.
本発明者らは、上記反応防止層８．９のＷＩ４厚を０〜
４００人の範囲で何種類か膜厚の異なった上述した如き
複合磁気ヘッドを、以下に示す工程により作成した。そ
の結果、最も良好な反応防止効果を示す膜厚の範囲を見
出すに至った。The present inventors set the WI4 thickness of the reaction prevention layer 8.9 to 0 to
Composite magnetic heads as described above having several types of different film thicknesses within the range of 400 people were fabricated by the steps shown below. As a result, we have found a range of film thickness that provides the best reaction prevention effect.
まず、各磁気コア半体の補助コア材となるＭｎ−Ｚｎ系
のフェライト基板を用意し、トラック幅Ｔ、を規制する
ための切溝および必要に応じて巻線溝を切削形成した。First, a Mn--Zn-based ferrite substrate to be used as an auxiliary core material for each magnetic core half was prepared, and cut grooves for regulating the track width T and winding grooves were formed as necessary.
次に、これらの各フェライト基板に対してスパッタリン
グ等の手法で反応防止層を被着形成した、本実験では、
反応防止層としてＳｉｎ、膜を使用した。Next, in this experiment, a reaction prevention layer was formed on each of these ferrite substrates by a method such as sputtering.
A film of Sin was used as the reaction prevention layer.
次に、上記反応防止層の上にスパッタリングにより金属
磁性＊Ｍ４となるＦｅ−Ｇａ−３ｔ−Ｒｕ系合金を被着
形成し各磁気コア半体を作成した。Next, a Fe-Ga-3t-Ru alloy, which becomes metal magnetic *M4, was deposited on the reaction prevention layer by sputtering to create each magnetic core half.
そしてこれら各磁気コア半体を互いに対問させ、加熱し
てガラス融着により接合するとともに、ガラス等の非磁
性材料を用いて切溝を充填した。Then, these magnetic core halves were placed in opposition to each other, heated and joined by glass fusing, and the grooves were filled with a non-magnetic material such as glass.
最後にスライシングにより個々の複合磁気ヘッドとなる
チップに切分け、記録媒体対接面に適当な研磨処理を施
して複合磁気ヘッドを完成させた。Finally, the chips were cut into individual composite magnetic heads by slicing, and the surface facing the recording medium was subjected to an appropriate polishing process to complete the composite magnetic head.
以上の工程を繰り返して膜厚の異なる複合磁気ヘッドを
数種類形成した。The above steps were repeated to form several types of composite magnetic heads with different film thicknesses.
次に、このようにして製造された各複合磁気ヘッドを用
いて磁気テープに対して定電流記録を行い、５ ＭＨｚ
での再生出力のうねりをそれぞれ測定した。その結果を
第３図に示す。図中、縦軸は再生出力のうねり（単位ｄ
Ｂ）を示し、横軸はそれぞれ設定した反応防止層の膜厚
（単位人）を示す。Next, constant current recording was performed on the magnetic tape using each composite magnetic head manufactured in this way, and 5 MHz
The undulation of the playback output was measured at each. The results are shown in FIG. In the figure, the vertical axis is the undulation of the playback output (unit: d
B) is shown, and the horizontal axis shows the film thickness (unit person) of each set reaction prevention layer.
第３図から分かるように、反応防止層の膜厚が２０〜２
００人の範囲では、再生出力の−うねりが最大的２．５
ｄＢ以下に抑えられ、良好な再生信号特性を有している
ことが分かった。また、上記反応防止層はその膜厚が２
０〜２００人と極めて薄い膜厚で良好な反応防止効果を
発揮することが分か９た。As can be seen from Figure 3, the film thickness of the reaction prevention layer is 20 to 2
In the range of 00 people, the maximum -swell of the playback output is 2.5
It was found that the reproduction signal characteristics were suppressed to below dB and had good reproduction signal characteristics. Further, the reaction prevention layer has a thickness of 2
It was found that an extremely thin film thickness of 0 to 200 people can exhibit a good reaction prevention effect.
これに対して、膜厚が２０Å以下に設定した場合の複合
磁気ヘッドでは、うねりが大きくなり、補助コア材であ
るフェライトと主コア材である金属磁性薄膜との間に反
応層が生成し、疑似ギャップとして悪影響を与えている
ことが示唆された。On the other hand, in a composite magnetic head where the film thickness is set to 20 Å or less, the waviness increases and a reaction layer is generated between the ferrite, which is the auxiliary core material, and the metal magnetic thin film, which is the main core material. It was suggested that this is having an adverse effect as a pseudo gap.
また、逆に膜厚が２００Å以上に形成された複合磁気ヘ
ッドでは、やはり再生出力のうねりが太き（なっており
、この場合は、反応防止層自体が疑似ギャップとして作
動しているものと考えられる。On the other hand, in a composite magnetic head formed with a film thickness of 200 Å or more, the undulation of the reproduction output is still thick (in this case, it is thought that the reaction prevention layer itself is acting as a pseudo gap). It will be done.
以上ＳｉＯっ膜に関して実験を行ったが、Ｔ１Ｃｒ、Ａ
Ｉ、Ｔａ、Ｚｒ、Ｍｇ、Ｍｎ、Ｚｎ等の酸化物薄膜でも
同様の結果であった。The above experiments were conducted on SiO films, but T1Cr, A
Similar results were obtained for thin films of oxides such as I, Ta, Zr, Mg, Mn, and Zn.
なお、本実施例においては、両方の磁気コア半体に金属
磁性薄膜が形成された複合磁気ヘッドについて説明した
が、本発明はこれに限定されるものではなく、たとえば
片方の磁気コア半体のみに金属磁性薄膜が形成された複
合磁気ヘッドにも応用できることは言うまでもない。Although this embodiment describes a composite magnetic head in which a metal magnetic thin film is formed on both magnetic core halves, the present invention is not limited to this. Needless to say, it can also be applied to a composite magnetic head in which a metal magnetic thin film is formed.
また、本発明を薄膜形成技術により形成された上部磁性
体および下部磁性体を主とし、特に下部磁性体が酸化物
磁性基板と金属磁性薄膜の複合体である薄膜磁気ヘッド
にも適用することができる、すなわち、第４図に示すよ
うに、フェライト基板１５とＦｅ−Ａｌ−５ｔ系合金の
金属磁性薄膜１４よりなる下部磁性体上、やはりＦｅ−
Ａｌ−Ｓｉ系合金等によりなる上部磁性体１３、銅、ア
ルミニウム等の導体材料よりなるコイル導体１７が絶縁
層を介して順次積層されてなる薄膜磁気ヘッドにおいて
、フェライト基＋Ｊｉ１５とこのｌ［１５上に形成され
る金属磁性薄膜１４との間に本発明に係る反応防止層１
６を積層して疑似ギャップの発生を防止することもでき
る。Furthermore, the present invention can be applied to a thin film magnetic head that mainly includes an upper magnetic body and a lower magnetic body formed by thin film forming technology, and in particular, the lower magnetic body is a composite of an oxide magnetic substrate and a metal magnetic thin film. In other words, as shown in FIG. 4, Fe-
In a thin film magnetic head in which an upper magnetic body 13 made of an Al-Si alloy or the like and a coil conductor 17 made of a conductive material such as copper or aluminum are sequentially laminated with an insulating layer interposed therebetween, a ferrite group + Ji 15 and this l[15 upper The reaction prevention layer 1 according to the present invention is between the metal magnetic thin film 14 formed on the
6 can also be stacked to prevent the occurrence of pseudo gaps.
以上の説明からも明らかなように、本発明にかかる複合
磁気ヘッドにおいては、補助コア材であるフェライトと
主コア材である金属磁性薄膜との間に極めて薄い２０〜
２００人の膜厚のＳｉ、Ｔｉ。As is clear from the above description, in the composite magnetic head according to the present invention, there is a very thin layer between the ferrite which is the auxiliary core material and the metal magnetic thin film which is the main core material.
Si, Ti with a film thickness of 200 people.
Ｃｒ、ＡＩ、Ｔａ、Ｚｒ、Ｍｇ、Ｍｎ、Ｚｎの酸化物薄
膜の少なくとも一種を反応防止層として設けているので
、上記金属磁性薄膜との界面における反応を効果的に抑
制することができ、且つ疑似ギャップの発生を防止する
ことができる。また、反応防止層の膜厚が極めて薄いこ
とから反応防止層自体が疑似ギャップとして作用するこ
ともない。Since at least one kind of oxide thin film of Cr, AI, Ta, Zr, Mg, Mn, and Zn is provided as a reaction prevention layer, the reaction at the interface with the metal magnetic thin film can be effectively suppressed, and It is possible to prevent the occurrence of pseudo gaps. Furthermore, since the reaction prevention layer is extremely thin, the reaction prevention layer itself does not act as a pseudo gap.
したがって、記録時および再生時の両方に良好な特性を
発揮する記録再往兼用ヘッドの捷供が可能となる。Therefore, it is possible to provide a read/write head that exhibits good characteristics both during recording and during reproduction.
第１図は本発明を適用した複合磁気ヘッドの一実施例を
示す外観斜視図であり、第２図はその記録媒体対接面を
示す要部拡大平面図である。第３図は反応防止層の膜厚
を変えたときの再生出力のうねりを示す特性図である。
第４図は本発明を薄膜磁気ヘッドに適用した一実施例を
示す要部拡大断面図である。
！、■ ・・・ 磁気コア半体
１ ・・・ 記録媒体対接面
２ ・・・ 磁気ギャップ
４．５ ・・・ 補助コア部
６．７ ・・・ 金属磁性薄膜
８．９ ・・・ 反応防止層
特 許 出 願 人 ソニー株式会社代理人 弁
理士 小 池 見間 田村榮−
同 佐藤 勝
第１図
辰／ＩＪ（λ）
第３図FIG. 1 is an external perspective view showing an embodiment of a composite magnetic head to which the present invention is applied, and FIG. 2 is an enlarged plan view of the main parts showing the recording medium contacting surface thereof. FIG. 3 is a characteristic diagram showing the fluctuation of the reproduced output when the thickness of the reaction prevention layer is changed. FIG. 4 is an enlarged sectional view of essential parts showing an embodiment in which the present invention is applied to a thin film magnetic head. ! , ■ ... Magnetic core half 1 ... Recording medium contact surface 2 ... Magnetic gap 4.5 ... Auxiliary core part 6.7 ... Metal magnetic thin film 8.9 ... Reaction prevention Layer Patent Applicant Sony Corporation Agent Patent Attorney Koike Mima Ei Tamura Masaru Sato Figure 1/IJ(λ) Figure 3
Claims (1)
磁性薄膜により構成される一対の磁気コア半体を突合せ
、上記金属磁性薄膜により磁気ギャップが形成されてな
る複合磁気ヘッドであって、上記金属磁性薄膜と上記酸
化物磁性材料との界面の一部が上記磁気ギャップの近傍
において該磁気ギャップと略平行であり、かつ上記金属
磁性薄膜と上記酸化物磁性材料との間に２０〜２００Å
の膜厚のＳｉ、Ｔｉ、Ｃｒ、Ａｌ、Ｔａ、Ｚｒ、Ｍｇ、
Ｍｎ、Ｚｎの酸化物薄膜の少なくとも一種を配したこと
を特徴とする複合磁気ヘッド。A composite magnetic head comprising a pair of magnetic core halves in which at least one magnetic core half is made of an oxide magnetic material and a metal magnetic thin film, and a magnetic gap is formed by the metal magnetic thin film, wherein a magnetic gap is formed by the metal magnetic thin film. A part of the interface between the magnetic thin film and the oxide magnetic material is near the magnetic gap and approximately parallel to the magnetic gap, and there is a distance of 20 to 200 Å between the metal magnetic thin film and the oxide magnetic material.
Si, Ti, Cr, Al, Ta, Zr, Mg, with a film thickness of
A composite magnetic head comprising at least one of Mn and Zn oxide thin films.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62256290A JP2726048B2 (en) | 1987-10-13 | 1987-10-13 | Composite magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62256290A JP2726048B2 (en) | 1987-10-13 | 1987-10-13 | Composite magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01100714A true JPH01100714A (en) | 1989-04-19 |
| JP2726048B2 JP2726048B2 (en) | 1998-03-11 |
Family
ID=17290601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62256290A Expired - Fee Related JP2726048B2 (en) | 1987-10-13 | 1987-10-13 | Composite magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2726048B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01303613A (en) * | 1988-05-31 | 1989-12-07 | Nec Kansai Ltd | Magnetic head |
| JPH02273305A (en) * | 1989-04-14 | 1990-11-07 | Hitachi Metals Ltd | Magnetic head and manufacture thereof |
| EP0466159A2 (en) * | 1990-07-13 | 1992-01-15 | Fuji Photo Film Co., Ltd. | Composite magnetic head |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61172203A (en) * | 1985-01-26 | 1986-08-02 | Sony Corp | Magnetic head |
| JPS62145510A (en) * | 1985-12-18 | 1987-06-29 | Sony Corp | Magnetic head |
-
1987
- 1987-10-13 JP JP62256290A patent/JP2726048B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61172203A (en) * | 1985-01-26 | 1986-08-02 | Sony Corp | Magnetic head |
| JPS62145510A (en) * | 1985-12-18 | 1987-06-29 | Sony Corp | Magnetic head |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01303613A (en) * | 1988-05-31 | 1989-12-07 | Nec Kansai Ltd | Magnetic head |
| JPH02273305A (en) * | 1989-04-14 | 1990-11-07 | Hitachi Metals Ltd | Magnetic head and manufacture thereof |
| EP0466159A2 (en) * | 1990-07-13 | 1992-01-15 | Fuji Photo Film Co., Ltd. | Composite magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2726048B2 (en) | 1998-03-11 |
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