JP7501793B2 - ジルコニア粒子、及びジルコニア粒子の製造方法 - Google Patents
ジルコニア粒子、及びジルコニア粒子の製造方法 Download PDFInfo
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- JP7501793B2 JP7501793B2 JP2023525005A JP2023525005A JP7501793B2 JP 7501793 B2 JP7501793 B2 JP 7501793B2 JP 2023525005 A JP2023525005 A JP 2023525005A JP 2023525005 A JP2023525005 A JP 2023525005A JP 7501793 B2 JP7501793 B2 JP 7501793B2
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- zirconia particles
- zirconia
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- molybdenum
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- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 title claims description 649
- 239000002245 particle Substances 0.000 title claims description 336
- 238000004519 manufacturing process Methods 0.000 title claims description 46
- 238000010304 firing Methods 0.000 claims description 48
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims description 48
- 150000002752 molybdenum compounds Chemical class 0.000 claims description 44
- 239000005078 molybdenum compound Substances 0.000 claims description 43
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 39
- 229910052750 molybdenum Inorganic materials 0.000 claims description 39
- 239000011733 molybdenum Substances 0.000 claims description 39
- 239000002344 surface layer Substances 0.000 claims description 37
- 239000000203 mixture Substances 0.000 claims description 32
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 claims description 28
- 150000003755 zirconium compounds Chemical class 0.000 claims description 20
- 238000004458 analytical method Methods 0.000 claims description 18
- 238000005211 surface analysis Methods 0.000 claims description 13
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 12
- 229910052700 potassium Inorganic materials 0.000 claims description 12
- 239000011591 potassium Substances 0.000 claims description 12
- 238000009826 distribution Methods 0.000 claims description 11
- 238000002156 mixing Methods 0.000 claims description 10
- 239000011684 sodium molybdate Substances 0.000 claims description 6
- 235000015393 sodium molybdate Nutrition 0.000 claims description 6
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 claims description 6
- 238000004438 BET method Methods 0.000 claims description 5
- NMHMDUCCVHOJQI-UHFFFAOYSA-N lithium molybdate Chemical compound [Li+].[Li+].[O-][Mo]([O-])(=O)=O NMHMDUCCVHOJQI-UHFFFAOYSA-N 0.000 claims description 5
- 238000007561 laser diffraction method Methods 0.000 claims description 4
- 238000000790 scattering method Methods 0.000 claims description 4
- 238000000733 zeta-potential measurement Methods 0.000 claims description 2
- 238000005245 sintering Methods 0.000 claims 2
- 230000000052 comparative effect Effects 0.000 description 25
- 238000000034 method Methods 0.000 description 24
- 238000005259 measurement Methods 0.000 description 23
- 238000004876 x-ray fluorescence Methods 0.000 description 19
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 18
- 239000000843 powder Substances 0.000 description 18
- 229910052726 zirconium Inorganic materials 0.000 description 18
- 239000003795 chemical substances by application Substances 0.000 description 16
- 239000013078 crystal Substances 0.000 description 16
- 230000004907 flux Effects 0.000 description 15
- 239000011164 primary particle Substances 0.000 description 15
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 13
- 239000003153 chemical reaction reagent Substances 0.000 description 13
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 13
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 13
- 230000002776 aggregation Effects 0.000 description 11
- -1 coatings Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 238000002441 X-ray diffraction Methods 0.000 description 9
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- 238000007716 flux method Methods 0.000 description 9
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 229910001928 zirconium oxide Inorganic materials 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000001354 calcination Methods 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 239000004570 mortar (masonry) Substances 0.000 description 4
- 150000003112 potassium compounds Chemical class 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
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- 239000000047 product Substances 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- RWVGQQGBQSJDQV-UHFFFAOYSA-M sodium;3-[[4-[(e)-[4-(4-ethoxyanilino)phenyl]-[4-[ethyl-[(3-sulfonatophenyl)methyl]azaniumylidene]-2-methylcyclohexa-2,5-dien-1-ylidene]methyl]-n-ethyl-3-methylanilino]methyl]benzenesulfonate Chemical compound [Na+].C1=CC(OCC)=CC=C1NC1=CC=C(C(=C2C(=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=2C(=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=C1 RWVGQQGBQSJDQV-UHFFFAOYSA-M 0.000 description 3
- IVORCBKUUYGUOL-UHFFFAOYSA-N 1-ethynyl-2,4-dimethoxybenzene Chemical compound COC1=CC=C(C#C)C(OC)=C1 IVORCBKUUYGUOL-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 description 2
- 238000010332 dry classification Methods 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000000634 powder X-ray diffraction Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- 235000015842 Hesperis Nutrition 0.000 description 1
- 235000012633 Iberis amara Nutrition 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910020435 K2MoO4 Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910015667 MoO4 Inorganic materials 0.000 description 1
- 229910004616 Na2MoO4.2H2 O Inorganic materials 0.000 description 1
- KGBUQHGXOAESDX-UHFFFAOYSA-N [Zr].OOO Chemical compound [Zr].OOO KGBUQHGXOAESDX-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
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- 230000007423 decrease Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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- 230000008020 evaporation Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
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- 239000011810 insulating material Substances 0.000 description 1
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- 239000012774 insulation material Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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- 230000001699 photocatalysis Effects 0.000 description 1
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- 229920003196 poly(1,3-dioxolane) Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
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- 230000005855 radiation Effects 0.000 description 1
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- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- FDEIWTXVNPKYDL-UHFFFAOYSA-N sodium molybdate dihydrate Chemical compound O.O.[Na+].[Na+].[O-][Mo]([O-])(=O)=O FDEIWTXVNPKYDL-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- 238000001238 wet grinding Methods 0.000 description 1
- 238000004736 wide-angle X-ray diffraction Methods 0.000 description 1
- 150000003746 yttrium Chemical class 0.000 description 1
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/94—Products characterised by their shape
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/95—Products characterised by their size, e.g. microceramics
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Description
[1] モリブデンを含み、多面体形状を有するジルコニア粒子。
[2] 前記モリブデンが、前記ジルコニア粒子の表層に偏在している、前記[1]に記載のジルコニア粒子。
[3] 前記ジルコニア粒子の[11バー1]面の結晶子径が90nm以上である、前記[1]又は[2]に記載のジルコニア粒子。
[4] 前記ジルコニア粒子の、レーザー回折・散乱法により算出されるメディアン径D50が0.1~1000μmである、前記[1]~[3]のいずれか一項に記載のジルコニア粒子。
[5] 前記ジルコニア粒子をXRF分析することによって求められる前記ジルコニア粒子100質量%に対するZrO2含有率(Z1)が90.0~99.9質量%であり、前記ジルコニア粒子をXRF分析することによって求められる前記ジルコニア粒子100質量%に対するMoO3含有率(M1)が0.1~5.0質量%である、前記[1]~[4]のいずれか一項に記載のジルコニア粒子。
[6] 前記ジルコニア粒子をXPS表面分析することによって求められる前記ジルコニア粒子の表層100質量%に対するZrO2含有率(Z2)が35.0~98.0質量%であり、前記ジルコニア粒子をXPS表面分析することによって求められる前記ジルコニア粒子の表層100質量%に対するMoO3含有率(M2)が2.0~40.0質量%である、前記[1]~[5]のいずれか一項に記載のジルコニア粒子。
[7] 前記ジルコニア粒子をXRF分析することによって求められる前記ジルコニア粒子100質量%に対するMoO3含有率(M1)に対する、前記ジルコニア粒子をXPS表面分析することによって求められる前記ジルコニア粒子の表層100質量%に対するMoO3含有率(M2)の表面偏在比(M2/M1)が2~80である、前記[1]~[6]のいずれか一項に記載のジルコニア粒子。
[8] ゼータ電位測定により、電位が0となる等電点のpHが2.0~6.5である、前記[1]~[7]のいずれか一項に記載のジルコニア粒子。
[9] BET法により求められる比表面積が20m2/g以下である、前記[1]~[8]のいずれか一項に記載のジルコニア粒子。
[10] 前記ジルコニア粒子の[111]面の結晶子径が90nm以上である、前記[1]~[9]のいずれか一項に記載のジルコニア粒子。
[11] 前記[1]~[10]のいずれか一項に記載のジルコニア粒子の製造方法であって、
ジルコニウム化合物と、モリブデン化合物と、を混合して混合物とし、前記混合物を焼成することを含む、ジルコニア粒子の製造方法。
[12] 前記モリブデン化合物が、三酸化モリブデン、モリブデン酸リチウム、モリブデン酸カリウム又はモリブデン酸ナトリウムである、前記[11]に記載のジルコニア粒子の製造方法。
[13] 前記混合物を焼成する最高焼成温度が800~1600℃である、前記[11]又は[12]に記載のジルコニア粒子の製造方法。
本実施形態のジルコニア粒子は、モリブデンを含み、多面体形状を有する。
<ジルコニア粒子の製造方法>
[混合工程]
(ジルコニウム化合物)
(モリブデン化合物)
(形状制御剤)
[焼成工程]
[モリブデン除去工程]
[粉砕工程]
[分級工程]
[比較例1]
[比較例2]
[実施例1]
[実施例2]
[実施例3]
[実施例4]
[実施例5]
[実施例6]
[実施例7]
[実施例8]
[実施例9]
[結晶子径の測定]
管電圧:45kV
管電流:200mA
スキャンスピード:0.05°/min
スキャン範囲:10~70°
ステップ:0.002°
βs:20rpm
装置標準幅:米国立標準技術研究所が作製している標準シリコン粉末(NIST、640d)を用いて算出した0.026°を使用した。
実施例1~2、5~7、10及び比較例1~2のジルコニア粒子の試料を0.5mm深さの測定試料用ホルダーに充填し、それを広角X線回折(XRD)装置(株式会社リガク製 UltimaIV)にセットし、Cu/Kα線、40kV/40mA、スキャンスピード2°/min、走査範囲10~70°の条件で測定を行った。実施例1~2、5~7、比較例1~2のジルコニア粒子のXRD測定の結果を図12に示す。
[ジルコニア粒子の粒度分布測定]
[ジルコニア粒子の等電点測定]
[ジルコニア粒子の比表面積測定]
[ジルコニア粒子の純度測定:XRF(蛍光X線)分析]
測定条件
EZスキャンモード
測定元素:F~U
測定時間:標準
測定径:10mm
残分(バランス成分):なし
[XPS表面分析]
[液中分散性試験]
(1)純水10gに35%塩酸を20mg及びジルコニア粒子の試料0.1gを加えた。
(2)手で30秒間振盪した後、5時間静置した。
(3)5時間静置した後に外観を観察し、次の基準で液中分散性を評価した。
〇 透明な上澄み部がほとんど見られない。
△ 液上部に透明部ができている。
× 粒子がほぼ全て沈降して液が透明になっている。
Claims (11)
- モリブデンを含み、多面体形状を有し、[11バー1]面の結晶子径が90nm以上であり、
ジルコニア粒子をXRF分析することによって求められる前記ジルコニア粒子100質量%に対するZrO2含有率(Z1)が90.0~99.9質量%であり、前記ジルコニア粒子をXRF分析することによって求められる前記ジルコニア粒子100質量%に対するMoO3含有率(M1)が0.1~5.0質量%であるジルコニア粒子。 - 前記モリブデンが、前記ジルコニア粒子の表層に偏在している、請求項1に記載のジルコニア粒子。
- 前記ジルコニア粒子の、レーザー回折・散乱法により算出されるメディアン径D50が0.1~1000μmである、請求項1に記載のジルコニア粒子。
- 前記ジルコニア粒子をXPS表面分析することによって求められる前記ジルコニア粒子の表層100質量%に対するZrO2含有率(Z2)が35.0~98.0質量%であり、前記ジルコニア粒子をXPS表面分析することによって求められる前記ジルコニア粒子の表層100質量%に対するMoO3含有率(M2)が2.0~40.0質量%である、請求項1に記載のジルコニア粒子。
- 前記ジルコニア粒子をXRF分析することによって求められる前記ジルコニア粒子100質量%に対するMoO3含有率(M1)に対する、前記ジルコニア粒子をXPS表面分析することによって求められる前記ジルコニア粒子の表層100質量%に対するMoO3含有率(M2)の表面偏在比(M2/M1)が2~80である、請求項1に記載のジルコニア粒子。
- ゼータ電位測定により、電位が0となる等電点のpHが2.0~6.5である、請求項1に記載のジルコニア粒子。
- BET法により求められる比表面積が20m2/g以下である、請求項1に記載のジルコニア粒子。
- 前記ジルコニア粒子の[111]面の結晶子径が90nm以上である、請求項1に記載のジルコニア粒子。
- 請求項1~8のいずれか一項に記載のジルコニア粒子の製造方法であって、
ジルコニウム化合物と、モリブデン化合物と、を混合して混合物とし、前記混合物を焼成することを含む、ジルコニア粒子の製造方法。 - 前記モリブデン化合物が、三酸化モリブデン、モリブデン酸リチウム、モリブデン酸カリウム又はモリブデン酸ナトリウムである、請求項9に記載のジルコニア粒子の製造方法。
- 前記混合物を焼成する最高焼成温度が800~1600℃である、請求項10に記載のジルコニア粒子の製造方法。
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JP2007106635A (ja) | 2005-10-14 | 2007-04-26 | Dai Ichi Kogyo Seiyaku Co Ltd | ジルコニア系酸化物粉末の製造方法 |
JP5716008B2 (ja) | 2012-12-27 | 2015-05-13 | 株式会社デンソー | 部分安定化ジルコニア磁器の製造方法 |
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CN104718162A (zh) | 2012-09-28 | 2015-06-17 | Dic株式会社 | α-氧化铝微粒以及其制造方法 |
CN102896317A (zh) | 2012-10-23 | 2013-01-30 | 上海大学 | 利用溶胶-凝胶法制备Mo-ZrO2金属陶瓷电极的方法 |
CN105658715A (zh) | 2013-10-24 | 2016-06-08 | Dic株式会社 | 树脂组合物、散热材料及散热构件 |
CN109415207A (zh) | 2016-06-29 | 2019-03-01 | Dic株式会社 | 金属氧化物的制造装置及前述金属氧化物的制造方法 |
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