JP7493394B2 - Cleaning agent and method for manufacturing gravure plate-making roll having cleaning step using the same - Google Patents
Cleaning agent and method for manufacturing gravure plate-making roll having cleaning step using the same Download PDFInfo
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- JP7493394B2 JP7493394B2 JP2020110134A JP2020110134A JP7493394B2 JP 7493394 B2 JP7493394 B2 JP 7493394B2 JP 2020110134 A JP2020110134 A JP 2020110134A JP 2020110134 A JP2020110134 A JP 2020110134A JP 7493394 B2 JP7493394 B2 JP 7493394B2
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- 239000012459 cleaning agent Substances 0.000 title claims description 32
- 238000000034 method Methods 0.000 title claims description 18
- 238000004140 cleaning Methods 0.000 title claims description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000005530 etching Methods 0.000 claims description 22
- 239000007921 spray Substances 0.000 claims description 20
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims description 14
- 239000007800 oxidant agent Substances 0.000 claims description 11
- 150000003841 chloride salts Chemical class 0.000 claims description 8
- 229910001510 metal chloride Inorganic materials 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 229960003280 cupric chloride Drugs 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 238000000608 laser ablation Methods 0.000 claims description 6
- 150000007522 mineralic acids Chemical class 0.000 claims description 5
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 4
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 claims description 4
- 229940005991 chloric acid Drugs 0.000 claims description 4
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- -1 polyoxyethylene Polymers 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 238000002679 ablation Methods 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000007646 gravure printing Methods 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 1
- 229940077239 chlorous acid Drugs 0.000 description 1
- IAQWMWUKBQPOIY-UHFFFAOYSA-N chromium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Cr+4] IAQWMWUKBQPOIY-UHFFFAOYSA-N 0.000 description 1
- AYTAKQFHWFYBMA-UHFFFAOYSA-N chromium(IV) oxide Inorganic materials O=[Cr]=O AYTAKQFHWFYBMA-UHFFFAOYSA-N 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
Description
本発明は、グラビア製版ロールのクリーニング剤、および、それを用いて画像部をクリーニングする工程を有するグラビア製版ロールの製造方法に関するものである。 The present invention relates to a cleaning agent for gravure plate-making rolls and a method for manufacturing gravure plate-making rolls that includes a process for cleaning the image area using the cleaning agent.
グラビア製版ロール(以下、製版ロールともいう)は、グラビア製版ロール版材(シリンダー)(以下、製版ロール版材ともいう)の表面に製版情報に応じた微小な凹部(セル)を形成するものである。当該セルにグラビアインキを充填して被印刷物に転写するグラビア印刷だけでなく、インキ以外の材料を当該セルに充填して被印刷物に転写する凹版印刷することも可能である。 A gravure platemaking roll (hereafter also referred to as platemaking roll) forms tiny recesses (cells) according to platemaking information on the surface of a gravure platemaking roll plate material (cylinder) (hereafter also referred to as platemaking roll plate material). In addition to gravure printing, in which the cells are filled with gravure ink and then transferred to the substrate, it is also possible to perform intaglio printing, in which the cells are filled with a material other than ink and then transferred to the substrate.
セルは、エッチング法または電子彫刻法で形成される。
エッチング法では以下の工程でセルが形成される。まず、グラビア製版ロール版材の表面にエッチングレジストを塗布する。その後、レーザアブレーションにより前記エッチングレジストを焼き飛ばし、エッチング液に浸漬する。このとき、レーザにより焼き飛ばされた部分(アブレーション部または画線部ともいう)のみが、エッチングされることでセルが形成される。しかし、一旦焼き飛ばされ気化したエッチングレジストの樹脂分が前記画線部の表面に凝固付着すると、この付着物がエッチングを阻害し、セルが形成されなくなる。そのため、この付着物は、クリーニング剤を使用して除去(クリーニング)される必要がある(特許文献1~2)。しかし、これらの文献記載のクリーニング剤では、形成されたセルの深度の均一性の点で問題があった。
The cells are formed by etching or electro-engraving techniques.
In the etching method, cells are formed by the following steps. First, an etching resist is applied to the surface of a gravure plate-making roll plate material. Then, the etching resist is burned off by laser ablation, and the plate is immersed in an etching solution. At this time, only the part burned off by the laser (also called the ablation part or the image part) is etched to form cells. However, once the resin content of the etching resist that has been burned off and vaporized solidifies and adheres to the surface of the image part, this adhesion inhibits etching, and cells are not formed. Therefore, this adhesion needs to be removed (cleaned) using a cleaning agent (Patent Documents 1 and 2). However, the cleaning agents described in these documents have problems with the uniformity of the depth of the formed cells.
本発明が解決しようとする課題は、レーザアブレーションされたグラビア製版ロールを、優れたセル形状(例えば、深度の均一性)を有するグラビア製版ロールとするためのクリーニング剤と、そのクリーニング剤を用いてクリーニングされたグラビア製版ロールを提供することである。 The problem that the present invention aims to solve is to provide a cleaning agent for turning a laser-ablated gravure platemaking roll into a gravure platemaking roll with excellent cell shape (e.g., uniformity of depth), and to provide a gravure platemaking roll that has been cleaned using the cleaning agent.
本発明者らは、上記の諸問題点を考慮し解決すべく鋭意研究を重ねた結果、本発明に至った。 The inventors have considered the above problems and conducted extensive research to solve them, leading to the creation of the present invention.
すなわち本発明は、グラビア製版ロールの製造工程において、レーザアブレーションでエッチングレジスト除去後のグラビア製版ロール表面をクリーニングするためのクリーニング剤であって、
強無機酸化剤、塩化第二金属塩、界面活性剤、及び水よりなることを特徴とするクリーニング剤に関する。
That is, the present invention provides a cleaning agent for cleaning a surface of a gravure plate-making roll after removing an etching resist by laser ablation in a manufacturing process of the gravure plate-making roll, comprising:
The present invention relates to a cleaning agent which comprises a strong inorganic oxidizing agent, a metal chloride salt, a surfactant, and water.
また、本発明は、強無機酸化剤が、過マンガン酸、クロム酸、及び塩素酸から選ばれる無機酸もしくはその塩を含む上記クリーニング剤に関する。 The present invention also relates to the above cleaning agent, in which the strong inorganic oxidizing agent contains an inorganic acid selected from permanganic acid, chromic acid, and chloric acid or a salt thereof.
また、本発明は、塩化第二金属塩が、塩化第二銅、または、塩化第二鉄を含む上記クリーニング剤に関する。 The present invention also relates to the above cleaning agent in which the metal chloride salt contains cupric chloride or ferric chloride.
また、本発明は、レーザアブレーションで画線部となる部位にあるエッチングレジスト除去後のグラビア製版ロール表面に、上記クリーニング剤を接触させ、前記ロール表面をクリーニングすることを特徴とするクリーニングされたグラビア製版ロールの製造方法に関する。 The present invention also relates to a method for producing a cleaned gravure plate-making roll, which is characterized by contacting the above-mentioned cleaning agent with the surface of the gravure plate-making roll after removing the etching resist from the area that will become the image area by laser ablation, and cleaning the roll surface.
また、本発明は、クリーニング剤と画線部とをスプレー噴霧装置で接触させることを特徴とする上記クリーニングされたグラビア製版ロールの製造方法に関する。 The present invention also relates to a method for producing the above-mentioned cleaned gravure plate-making roll, which is characterized in that the cleaning agent is brought into contact with the image area using a spray device.
本発明により、クリーニング後に、優れたセル形状(例えば、深度の均一性)を与えるグラビア製版ロールとなるクリーニング剤と、そのクリーニング剤を用いてクリーニングされたグラビア製版ロールを提供することができた。 The present invention provides a cleaning agent that gives a gravure platemaking roll an excellent cell shape (e.g., uniformity of depth) after cleaning, and a gravure platemaking roll that has been cleaned using the cleaning agent.
本発明のクリーニング剤は、強無機酸化剤、塩化第二金属塩、界面活性剤及び水を必須成分とする。 The cleaning agent of the present invention contains as essential components a strong inorganic oxidizing agent, a metal chloride salt, a surfactant, and water.
本発明で用いられる強無機酸化剤としては、例えば、過マンガン酸、クロム酸、及び塩素酸から選ばれる無機酸もしくはその塩が挙げられる。具体的には、過マンガン酸、酸化クロム(III)、酸化クロム(IV)、酸化クロム(VI)、二クロム酸、次亜塩素酸、亜塩素酸、塩素酸、過塩素酸の無機酸、もしくはそれら無機酸のナトリウム塩、カリウム塩が挙げられる。
本発明で用いられる塩化第二金属塩としては、例えば、塩化第二銅、または、塩化第二鉄が挙げられる。
The strong inorganic oxidizing agent used in the present invention may be, for example, an inorganic acid selected from permanganic acid, chromic acid, and chloric acid, or a salt thereof.Specific examples of the inorganic acid include permanganic acid, chromium (III) oxide, chromium (IV) oxide, chromium (VI) oxide, dichromate, hypochlorous acid, chlorous acid, chloric acid, and perchloric acid, or the sodium salts and potassium salts of these inorganic acids.
The metal chloride salt used in the present invention may, for example, be cupric chloride or ferric chloride.
本発明で用いられる界面活性剤は、特に限定されない。好ましくは、洗浄剤用途に適したものが用いられる。具体的には、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンポリオキシプロピレングリコール、脂肪酸アルカノールアミド、アルキルアミンオキシド、もしくはそれらの誘導体が挙げられる。これらは、単独あるいは組み合わせて使用できる。 The surfactant used in the present invention is not particularly limited. Preferably, a surfactant suitable for use as a cleaning agent is used. Specific examples include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene polyoxypropylene glycols, fatty acid alkanolamides, alkylamine oxides, or derivatives thereof. These can be used alone or in combination.
本発明のクリーニング剤は、例えば、水に、強無機酸化剤、塩化第二金属塩、界面活性剤および必要に応じて添加されるそのほかの添加剤を、順次もしくは同時に、撹拌混合して調整される。撹拌混合には、可搬型ケミカルミキサーなどの公知の撹拌混合機が使用できる。 The cleaning agent of the present invention is prepared, for example, by mixing and stirring water with a strong inorganic oxidizing agent, a metal chloride salt, a surfactant, and other additives that are added as necessary, either sequentially or simultaneously. A known mixing and stirring device such as a portable chemical mixer can be used for mixing and stirring.
代表的な処方としては、クリーニング剤総量に対し、強無機酸化剤が0.1~20質量%、塩化第二金属塩が0.1~10質量%、界面活性剤が0.0001~10質量%である。 A typical formulation would be 0.1-20% by mass of a strong inorganic oxidizing agent, 0.1-10% by mass of a dichlorometal salt, and 0.0001-10% by mass of a surfactant relative to the total amount of cleaning agent.
本発明で用いられるグラビア製版ロール版材は、表面が、銅などのエッチング可能な材料である公知の製版ロール版材が使用できる。 The gravure platemaking roll plate material used in the present invention can be any known platemaking roll plate material whose surface is made of an etchable material such as copper.
本発明で用いられるエッチングレジストは、例えば、光吸収剤と樹脂、可塑剤などの添加剤、溶剤からなる感光性材料が挙げられる。光吸収剤は、カーボンブラックが好ましく用いられる。樹脂は、ニトロセルロース樹脂、ポリエステル樹脂、天然樹脂由来のテルペン系樹脂などが用いられる。溶剤は、酢酸エチルなどのエステル類、トルエンなどの炭化水素類、イソプロピルアルコール、アルキレングリコールモノアルキルエーテルなどのアルコール類、シクロヘキサノンなどのケトン類が用いられる。前記エッチングレジストは、前記グラビア製版ロール版材の表面上に、リングコート法、スプレーコート法などの公知方法で塗布される。
代表的な塗布条件は、粘度が12~30秒(離合社製ザーンカップNo.3にて測定)、常温乾燥後のレジスト膜厚がリングコート法で1~5μm、スプレーコート法で2~12μmである。
The etching resist used in the present invention is, for example, a photosensitive material consisting of a light absorbent, a resin, an additive such as a plasticizer, and a solvent. Carbon black is preferably used as the light absorbent. Nitrocellulose resin, polyester resin, terpene resin derived from natural resin, etc. are used as the resin. Esters such as ethyl acetate, hydrocarbons such as toluene, alcohols such as isopropyl alcohol and alkylene glycol monoalkyl ether, ketones such as cyclohexanone are used as the solvent. The etching resist is applied to the surface of the gravure platemaking roll plate material by a known method such as a ring coat method or a spray coat method.
Typical coating conditions are a viscosity of 12 to 30 seconds (measured using a Zahn Cup No. 3 manufactured by Rigo Co., Ltd.), and a resist film thickness after drying at room temperature of 1 to 5 μm for the ring coating method and 2 to 12 μm for the spray coating method.
本発明で行われるレーザアブレーションは、公知の手順に従い、グリーンレーザ(波長525~540nm)または近赤外線レーザ(波長1050~1080nm)などのレーザを、前記エッチングレジストを塗布したグラビア製版ロールの画線部となる部位に照射し、照射されたエッチングレジストを焼き飛ばして除去することである。
代表的な照射条件は、製版ロール回転速度が200~2800rpm、照射解像度が5080~25400dpiである。
The laser ablation performed in the present invention is performed in accordance with a known procedure by irradiating a laser such as a green laser (wavelength 525 to 540 nm) or a near-infrared laser (wavelength 1050 to 1080 nm) onto the portion of the gravure plate-making roll coated with the etching resist that will become the printing area, and burning off and removing the irradiated etching resist.
Typical irradiation conditions are a plate-making roll rotation speed of 200 to 2800 rpm and an irradiation resolution of 5080 to 25400 dpi.
画線部となる部位にあるエッチングレジストが除去されたグラビア製版ロールは、前記クリーニング剤を接触させて当該画線部のクリーニングを行う。クリーニング剤の液温は15~35℃、好ましくは20~30℃で使用する。当該画線部とクリーニング剤とを接触させる方法としては、公知の塗布装置を用いる方法が使用できるが、例えば、スプレー噴霧装置を用いる方法を例示できる。
代表的な操作条件は、スプレー圧が0.03~0.20MPa、揺動が1~15rpm、スプレー距離(=ノズルと製版ロールとの距離)が50~150mm、噴霧角(=扇形スプレーパターンの中心角)が20~120度、ねじれ角(=スプレーノズルの傾き)が0~45度、製版ロール回転速度が10~120rpm、噴霧時間は5~60秒である。スプレー噴霧中にスプレーを揺動させることが、特に均一な噴霧に効果的である。
The gravure plate-making roll from which the etching resist has been removed from the portion that will become the image area is brought into contact with the cleaning agent to clean the image area. The liquid temperature of the cleaning agent is 15 to 35° C., preferably 20 to 30° C. As a method for bringing the image area into contact with the cleaning agent, a method using a known coating device can be used, and an example of the method is a method using a spraying device.
Typical operating conditions are: spray pressure 0.03-0.20MPa, oscillation 1-15rpm, spray distance (= distance between nozzle and plate-making roll) 50-150mm, spray angle (= central angle of fan-shaped spray pattern) 20-120 degrees, twist angle (= inclination of spray nozzle) 0-45 degrees, plate-making roll rotation speed 10-120rpm, spray time 5-60 seconds. Oscillating the spray during spraying is particularly effective for uniform spraying.
クリーニングされたグラビア製版ロールは、公知のエッチング液に浸漬などして、グラビア製版ロールの表面の画線部をエッチングし、グラビア製版ロール表面にセルが形成される。エッチング液としては、例えば、塩化第二銅、または塩化第二鉄(いずれも日本化学産業株式会社などから市販されている)の水溶液に塩酸、酸化剤を添加したものが挙げられる。好ましくは塩化第二銅エッチング液が用いられ、代表的な液条件は、銅濃度が30~150g/L、塩酸濃度が5~70g/L、液温が30~40℃である。液組成の銅濃度、塩酸濃度、酸化剤濃度は、自動濃度制御装置にて設定した値に調整される。
スプレー式エッチング装置を使用する場合の代表的な操作条件は、スプレー圧が0.03~0.30MPa、揺動が1~15rpm、スプレー距離が50~200mm、噴霧角が20~120度、ねじれ角が0~45度、製版ロール回転速度が10~120rpmである。製版ロール表面に形成されるセルの深度は、スプレーの噴霧時間または流量計測器による噴霧液量管理にて制御される。
The cleaned gravure plate-making roll is immersed in a known etching solution to etch the image area on the surface of the gravure plate-making roll, forming cells on the surface of the gravure plate-making roll. Examples of the etching solution include an aqueous solution of cupric chloride or ferric chloride (both of which are commercially available from Nippon Kagaku Sangyo Co., Ltd., etc.) to which hydrochloric acid and an oxidizing agent have been added. A cupric chloride etching solution is preferably used, and typical solution conditions are a copper concentration of 30 to 150 g/L, a hydrochloric acid concentration of 5 to 70 g/L, and a solution temperature of 30 to 40° C. The copper concentration, hydrochloric acid concentration, and oxidizing agent concentration of the solution composition are adjusted to values set by an automatic concentration control device.
Typical operating conditions when using a spray-type etching device are: spray pressure 0.03-0.30MPa, oscillation 1-15rpm, spray distance 50-200mm, spray angle 20-120 degrees, twist angle 0-45 degrees, and plate-making roll rotation speed 10-120rpm. The depth of the cells formed on the plate-making roll surface is controlled by the spray time or by managing the amount of spray liquid using a flow meter.
エッチングされ、セルが形成されたグラビア製版ロールは、非画線部のレジスト層を公知のレジスト剥離液で剥離し、クロムめっき、研磨などの後処理をして、グラビア印刷用の版として、印刷に供される。 After the gravure platemaking roll is etched and cells are formed, the resist layer in the non-printing areas is stripped off using a known resist stripper, and the roll is then subjected to post-processing such as chrome plating and polishing, and is then used for printing as a gravure printing plate.
本発明のクリーニング剤を用いてクリーニングし、エッチングされてセルが形成されたグラビア製版ロールは、優れたセル形状を有しており、優れたグラビア印刷物を供することができる。 A gravure platemaking roll that has been cleaned and etched with the cleaning agent of the present invention to form cells has an excellent cell shape and can provide excellent gravure prints.
以下に、実施例および比較例により、一層具体的に説明するが、本発明はこれらの実施例によりなんら限定されるものではない。
光吸収剤(カーボンブラック)と、ニトロセルロースと、ポリエステル樹脂を含む、レーザアブレーションが可能なレジスト形成用の塗工液を準備した。
銅めっきを付けたグラビア製版ロール版材を酸および水、溶剤で表面洗浄した後、前記塗工液をリングコーターで塗布し、常温乾燥後の膜厚が2.5μmとなるレジスト層を全面に形成したグラビア製版ロールを得た。
前記レジスト層を形成したグラビア製版ロールに、レーザ光(波長535nm)を照射してレジスト層のアブレーションを行ない、線数500線/inchの格子パターンを形成した。
The present invention will be explained in more detail below with reference to examples and comparative examples, but the present invention is not limited to these examples in any way.
A coating liquid for forming a resist capable of being laser ablated was prepared, which contained a light absorbing agent (carbon black), nitrocellulose, and a polyester resin.
After the copper-plated gravure platemaking roll plate material was surface-washed with acid, water, and a solvent, the coating liquid was applied to it using a ring coater to obtain a gravure platemaking roll having a resist layer formed on the entire surface, the thickness of which after drying at room temperature was 2.5 μm.
The gravure plate-making roll on which the resist layer was formed was irradiated with laser light (wavelength 535 nm) to ablate the resist layer, thereby forming a grid pattern with a line count of 500 lines/inch.
<クリーニング剤組成物1の調製例>
水に、過マンガン酸カリウム(強無機酸化剤)を4重量%、塩化第二銅(塩化第二金属塩)を2重量%、ポリオキシエチレンノニルフェニルエーテル(界面活性剤)を0.02重量%の配合で加えて混合し、酸でpHを調整してクリーニング剤組成物1とした。
表1に示す配合比にて、クリーニング剤組成物1の調製例と同様の方法でクリーニング剤組成物2~7を調製した。
<Preparation Example of Cleaning Composition 1>
4% by weight of potassium permanganate (strong inorganic oxidizing agent), 2% by weight of cupric chloride (secondary metal chloride salt), and 0.02% by weight of polyoxyethylene nonylphenyl ether (surfactant) were added to water and mixed, and the pH was adjusted with acid to obtain cleaning agent composition 1.
Cleaning compositions 2 to 7 were prepared in the same manner as in the preparation example of cleaning composition 1 using the blending ratios shown in Table 1.
(実施例1)
前記製版ロールに、ノズル間隔が50mmのスプレー式薬液噴霧装置を使用して、スプレー圧0.1MPa、揺動5rpm、スプレー距離100mm、噴霧角40~50度、ねじれ角20度、ロール回転速度50rpmの条件で、クリーニング剤組成物1を15秒間噴霧後、水洗し、画線部銅表面上をクリーニングした。
前記製版ロールに、スプレー式エッチング装置で塩化第二銅水溶液を噴霧して、版深が15μmとなる条件で流量計測器にて噴霧液量を管理して前記アブレーション部の銅をエッチングした。
水洗後に製版ロールに残った非アブレーション部のレジスト層を剥離し、表面に銅めっきが露出しているグラビア製版ロールを得た。
形成した凹部(セル)の深度を非接触式のレーザ顕微鏡で測定し、深度の均一性を評価した。結果を表2に示す。
深度の均一性は、製版ロールに形成した凹部(セル)の深さを、レーザ顕微鏡で測定し、以下の判定基準で評価した。
◎:中央と端部とのばらつきが±3%未満
○:中央と端部とのばらつきが±3~5%
△:中央と端部とのばらつきが±5%以上
×:エッチングが進行せず、凹部(セル)の形成が不可
Example 1
Using a spray-type chemical spraying device with a nozzle spacing of 50 mm, cleaning agent composition 1 was sprayed onto the plate-making roll for 15 seconds under conditions of a spray pressure of 0.1 MPa, oscillation of 5 rpm, spray distance of 100 mm, spray angle of 40 to 50 degrees, twist angle of 20 degrees, and roll rotation speed of 50 rpm, followed by rinsing with water to clean the copper surface of the printing area.
An aqueous solution of cupric chloride was sprayed onto the plate-making roll using a spray etching device, and the copper in the ablation portion was etched under conditions such that the plate depth became 15 μm, while controlling the amount of the sprayed liquid using a flow meter.
After washing with water, the resist layer remaining on the non-ablated portion of the plate-making roll was peeled off to obtain a gravure plate-making roll with the copper plating exposed on its surface.
The depth of the formed recesses (cells) was measured with a non-contact laser microscope to evaluate the uniformity of the depth. The results are shown in Table 2.
The uniformity of the depth was evaluated by measuring the depth of the recesses (cells) formed in the plate-making roll with a laser microscope and using the following criteria.
◎: Variation between the center and the edge is less than ±3%. ○: Variation between the center and the edge is ±3 to 5%.
△: Variation between center and end is ±5% or more ×: Etching does not progress, and recesses (cells) cannot be formed
(実施例2~4)
表1に示すクリーニング剤組成物2~4を使用し、実施例1と同様のクリーニング方法を経てグラビア製版ロールを製造し、評価した結果を表2に示す。
(Examples 2 to 4)
Using the cleaning compositions 2 to 4 shown in Table 1, gravure plate-making rolls were produced through the same cleaning method as in Example 1, and the evaluation results are shown in Table 2.
(実施例5)
スプレー圧0.03MPaの条件で、実施例1と同様のクリーニング方法を経てグラビア製版ロールを製造し、評価した結果を表2に示す。
Example 5
A gravure plate-making roll was produced through the same cleaning method as in Example 1 under the condition of a spray pressure of 0.03 MPa, and the evaluation results are shown in Table 2.
(実施例6)
揺動1rpmの条件で、実施例1と同様のクリーニング方法を経てグラビア製版ロールを製造し、評価した結果を表2に示す。
Example 6
Under the condition of an oscillation speed of 1 rpm, a gravure plate-making roll was produced through the same cleaning method as in Example 1, and the evaluation results are shown in Table 2.
(比較例1~3)
表1に示すクリーニング剤組成物5~7を使用し、実施例1と同様のクリーニング方法を経てグラビア製版ロールを製造し、評価した結果を表2に示す。
(Comparative Examples 1 to 3)
Using the cleaning compositions 5 to 7 shown in Table 1, gravure plate-making rolls were produced through the same cleaning method as in Example 1, and the evaluation results are shown in Table 2.
(比較例4)
クリーニング剤を使用せず、製版ロールを製造し、評価した。
表2の結果より、実施例1~4は深度の均一性に優れたグラビア製版ロールを得ることができた。
(Comparative Example 4)
No cleaning agent was used and the plate making roll was manufactured and evaluated.
As can be seen from the results in Table 2, in Examples 1 to 4, gravure plate-making rolls excellent in uniformity of depth were obtained.
Claims (5)
強無機酸化剤、塩化第二金属塩、界面活性剤、及び水よりなることを特徴とするクリーニング剤。 A cleaning agent for cleaning a surface of a gravure plate-making roll after removing an etching resist by laser ablation in a manufacturing process of the gravure plate-making roll, comprising:
A cleaning agent comprising a strong inorganic oxidizing agent, a metal chloride salt, a surfactant, and water.
5. The method of claim 4, wherein the cleaning agent is brought into contact with the image area by a spray device.
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JP2000204396A (en) | 1998-10-14 | 2000-07-25 | Merck Patent Gmbh | Roller cleaning composition |
JP2004058483A (en) | 2002-07-30 | 2004-02-26 | Toppan Printing Co Ltd | Intaglio plate and its manufacturing method |
JP2011517629A (en) | 2008-03-20 | 2011-06-16 | ヘル グラビア システムズ ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | Gravure printing cylinder processing method and processing apparatus |
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