JP7282721B2 - 光学自由曲面を含む投影装置および投影方法 - Google Patents
光学自由曲面を含む投影装置および投影方法 Download PDFInfo
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- JP7282721B2 JP7282721B2 JP2020140483A JP2020140483A JP7282721B2 JP 7282721 B2 JP7282721 B2 JP 7282721B2 JP 2020140483 A JP2020140483 A JP 2020140483A JP 2020140483 A JP2020140483 A JP 2020140483A JP 7282721 B2 JP7282721 B2 JP 7282721B2
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3141—Constructional details thereof
- H04N9/315—Modulator illumination systems
- H04N9/3152—Modulator illumination systems for shaping the light beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/13—Projectors for producing special effects at the edges of picture, e.g. blurring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/206—Control of light source other than position or intensity
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
- F21W2103/00—Exterior vehicle lighting devices for signalling purposes
- F21W2103/60—Projection of signs from lighting devices, e.g. symbols or information being projected onto the road
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
- F21W2121/00—Use or application of lighting devices or systems for decorative purposes, not provided for in codes F21W2102/00 – F21W2107/00
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Projection Apparatus (AREA)
- Lenses (AREA)
- Microscoopes, Condenser (AREA)
Description
(B)光学系の厚みを重視した小型、小型化された光学系
(C)光学系を通した高出力伝送/パワー効率
(D)ほとんどの異なる光分布を生成する方法:
-粗い分布、滑らかな分布、弱く変化する分布
-作品における例えば高解像度画像のような、高い解像度を有する、微細な、高度にパターン化された光分布
-小さいコントラストから非常に高いコントラストまでの範囲(照明なしの照明範囲内のターゲット領域など)
-任意の辺の幾何学
-組合せの異なる要件の大部分
(E)空間的な光源の不均質性、特に色混合の方法に対する均質化効果、特に光源位置および光源配置に対する十分な許容
- ここで、各チャネルは、少なくとも2つの光学的に屈折する自由曲面と、投影レンズ/光学系と、1つまたは複数の強度変調された構造とから構成されており、
- 入力側に配置された光学的自由曲面が、一方で空間的な実光および/または仮想光パターンを形成し、他方で下流の投影レンズ/光学系のケーラー照明が許可されるように、空間的な光の再分配とビーム角制御の両方を引き起こし、
- 投射レンズ/光学系が、自由形状の光再分配および強度変調ユニットによって生成された光パターンを、所望の方法で、1つまたは複数の実または仮想のターゲットにもたらし、
- すべてのチャネルの個々の光分布を、1つまたは複数の実物および/または仮想ターゲット上に重畳すると、所望の全体的な光分布が得られる、ビーム整形器または投影ユニット
参考文献
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[Oliker] V. I. Oliker. "Mathematical aspects of design of beam shaping surfaces
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[Ricoh]https://www.ricoh.com/technology/tech/040_projection.html, looked up on
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[US8717671B2] Hibiki Tatsuno, "Projection optical system and image projection
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n zum Anzeigen eines Gesamtbilds fuer Projektionsfreiformflaechen oder verkippte Projektionsflaechen"
[Sieler] Sieler, Marcel; Schreiber, Peter; Dannberg, Peter; Braeuer, Andreas; Tuennermann, Andreas, "Ultraslim fixed pattern projectors with inherent homogenization of illumination", Applied optics 51, 64-74 (2012).
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Claims (4)
- ターゲット面上に全体的な光分布を生成するための投影装置であって、
少なくとも1つの光源と、
互いに隣接する光学投影チャネルのアレイであって、
各チャネルは投影光学系、ならびに前記少なくとも1つの光源と前記投影光学系との間に配置された第1および第2の屈折光学自由曲面を備え、
前記第1および第2の屈折光学自由曲面は前記光源が生成する光を使用して、前記投影光学系のターゲット面に所望の出力強度パターンをもたらす対物光パターンによって下流の投影光学系のケーラー照明を引き起こし、ここで前記全体的な光分布は各チャネルの前記所望の出力強度パターンの重畳から生じ、前記対物光パターンは前記投影光学系による結像に付される光パターンを表し、前記光パターンは光の空間分布を表し、
各チャネルにおいて、前記第1および第2の屈折光学自由曲面は光強度分布およびビーム方向を制御し、前記第1の屈折光学自由曲面は、入射ビームがコリメートしないような形で、前記第2の屈折光学自由曲面に前記所望の出力強度パターンを生成し、前記第2の屈折光学自由曲面は前記入射ビームの方向を変更させて、前記入射ビームをケーラー照明に従って前記投影光学系にガイドする、投影装置。 - 前記投影装置は、遮蔽なしでエテンデューを実質的に維持して動作する、請求項1に記載の投影装置。
- 各光学的投影チャネルは、ターゲット面への前記所望の出力強度パターンの達成に資するために遮蔽物を備える、請求項1に記載の投影装置。
- すべての光学的投影チャネルがほぼ同じ前記所望の出力強度パターンを生成する、請求項1ないし3のいずれかに記載の投影装置。
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DE102015216985.5A DE102015216985A1 (de) | 2015-09-04 | 2015-09-04 | Projektionsvorrichtung und Verfahren zur Projektion mit optischen Freiformflächen |
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US (1) | US10764545B2 (ja) |
EP (1) | EP3345049B1 (ja) |
JP (2) | JP2018527620A (ja) |
KR (1) | KR102363017B1 (ja) |
CN (1) | CN108369367B (ja) |
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CN108345107B (zh) * | 2017-01-24 | 2020-03-17 | 清华大学 | 自由曲面照明***的设计方法 |
JP2018151832A (ja) * | 2017-03-13 | 2018-09-27 | キヤノン株式会社 | 情報処理装置、情報処理方法、および、プログラム |
DE102017004562A1 (de) | 2017-05-14 | 2018-11-15 | Docter Optics Se | Verfahren zum Herstellen eines Mikroprojektors und eines Projektionsdisplays |
US20210222854A1 (en) * | 2017-07-07 | 2021-07-22 | Sato Light Industrial Co., Ltd. | Illumination device |
AT519863B1 (de) * | 2017-09-27 | 2018-11-15 | Zkw Group Gmbh | Kraftfahrzeubeleuchtungsvorrichtung mit unterteilte Mikro-Eintrittsoptiken aufweisenden Mikrooptik-Systemen |
AU2019206621A1 (en) | 2018-01-14 | 2020-07-30 | Light Field Lab, Inc. | Systems and methods for transverse energy localization in energy relays using ordered structures |
US10234689B1 (en) | 2018-03-09 | 2019-03-19 | Mitsubishi Electric Research Laboratories, Inc. | Compound optics with freeform optical surface |
EP3608585A1 (de) * | 2018-08-07 | 2020-02-12 | ZKW Group GmbH | Projektionseinrichtung aus einer vielzahl von mikro-optiksystemen und ein lichtmodul für einen kraftfahrzeugscheinwerfer |
EP3918424A4 (en) * | 2019-01-28 | 2022-09-14 | Stanley Electric Co., Ltd. | BALLISTIC LIGHT MODULATIONS FOR IMAGE ENHANCEMENT THROUGH FOG |
DE102019001922A1 (de) * | 2019-03-15 | 2020-09-17 | Friedrich-Schiller-Universität Jena | Verfahren und Vorrichtung zur Projektion von Mustern |
DE102019130994B4 (de) * | 2019-11-15 | 2021-09-09 | Docter Optics Se | Verfahren zum Herstellen eines Mikroprojektors, eines Projektionsdisplays, eines Fahrassistenzsystems und eines Fahrzeugs |
DE102021104578A1 (de) | 2021-02-25 | 2022-08-25 | Carl Zeiss Jena Gmbh | Bedienelement |
DE102021108339B4 (de) | 2021-04-01 | 2023-12-07 | Hochschule Anhalt, Körperschaft des öffentlichen Rechts | Lichtfeld-Display, Verfahren, Computerprogramm und Vorrichtung zum Kalibrieren eines solchen Lichtfeld-Displays |
CN114153075B (zh) * | 2022-01-11 | 2023-06-30 | 荣仪尚科光电技术(哈尔滨)有限公司 | 单平面与自由曲面或锯齿光栅的自然光匀化照明装置和方法 |
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- 2015-09-04 DE DE102015216985.5A patent/DE102015216985A1/de not_active Ceased
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- 2016-08-31 WO PCT/EP2016/070490 patent/WO2017037101A1/de active Application Filing
- 2016-08-31 JP JP2018512143A patent/JP2018527620A/ja active Pending
- 2016-08-31 CN CN201680064264.0A patent/CN108369367B/zh active Active
- 2016-08-31 EP EP16760698.7A patent/EP3345049B1/de active Active
- 2016-08-31 KR KR1020187009473A patent/KR102363017B1/ko active IP Right Grant
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JP2013190514A (ja) | 2012-03-13 | 2013-09-26 | Seiko Epson Corp | プロジェクター |
US20140104317A1 (en) | 2012-10-11 | 2014-04-17 | Young Optics Inc. | Image displaying device and method |
WO2014180991A1 (de) | 2013-05-10 | 2014-11-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Multiapertur-projektionsdisplay und einzelbilderzeuger für ein solches |
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WO2017037101A1 (de) | 2017-03-09 |
DE102015216985A1 (de) | 2017-03-09 |
US20180199017A1 (en) | 2018-07-12 |
US10764545B2 (en) | 2020-09-01 |
EP3345049B1 (de) | 2021-10-06 |
KR102363017B1 (ko) | 2022-02-16 |
JP2021006905A (ja) | 2021-01-21 |
CN108369367B (zh) | 2021-06-04 |
EP3345049A1 (de) | 2018-07-11 |
KR20180050364A (ko) | 2018-05-14 |
JP2018527620A (ja) | 2018-09-20 |
CN108369367A (zh) | 2018-08-03 |
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