JP7220248B2 - アルカリ非含有ボロアルミノシリケートガラス - Google Patents
アルカリ非含有ボロアルミノシリケートガラス Download PDFInfo
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- JP7220248B2 JP7220248B2 JP2021068193A JP2021068193A JP7220248B2 JP 7220248 B2 JP7220248 B2 JP 7220248B2 JP 2021068193 A JP2021068193 A JP 2021068193A JP 2021068193 A JP2021068193 A JP 2021068193A JP 7220248 B2 JP7220248 B2 JP 7220248B2
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- glass sheet
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- glasses
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- 239000005354 aluminosilicate glass Substances 0.000 title description 4
- 239000011521 glass Substances 0.000 claims description 397
- 238000000137 annealing Methods 0.000 claims description 65
- 238000000034 method Methods 0.000 claims description 60
- 239000000203 mixture Substances 0.000 claims description 34
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 33
- 238000004519 manufacturing process Methods 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 29
- 238000002844 melting Methods 0.000 claims description 27
- 230000008018 melting Effects 0.000 claims description 27
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 20
- 229910052593 corundum Inorganic materials 0.000 claims description 17
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 17
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 238000003280 down draw process Methods 0.000 claims description 11
- 239000004973 liquid crystal related substance Substances 0.000 claims description 8
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 94
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 78
- 239000000395 magnesium oxide Substances 0.000 description 47
- 235000012245 magnesium oxide Nutrition 0.000 description 47
- 239000000292 calcium oxide Substances 0.000 description 40
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 29
- 238000007499 fusion processing Methods 0.000 description 29
- 230000008569 process Effects 0.000 description 28
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 22
- 229920001621 AMOLED Polymers 0.000 description 17
- 239000000470 constituent Substances 0.000 description 17
- 238000005056 compaction Methods 0.000 description 16
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 16
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 description 14
- 238000004031 devitrification Methods 0.000 description 13
- 150000004820 halides Chemical class 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 13
- 239000006025 fining agent Substances 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 239000002994 raw material Substances 0.000 description 12
- 229910011255 B2O3 Inorganic materials 0.000 description 11
- 229910021417 amorphous silicon Inorganic materials 0.000 description 11
- 229910052681 coesite Inorganic materials 0.000 description 11
- 229910052906 cristobalite Inorganic materials 0.000 description 11
- 239000007789 gas Substances 0.000 description 11
- 235000012239 silicon dioxide Nutrition 0.000 description 11
- 229910052682 stishovite Inorganic materials 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
- 229910052905 tridymite Inorganic materials 0.000 description 11
- 239000003513 alkali Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- 230000007547 defect Effects 0.000 description 9
- 230000002829 reductive effect Effects 0.000 description 9
- 239000000356 contaminant Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 238000006722 reduction reaction Methods 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 230000009467 reduction Effects 0.000 description 7
- 229910052717 sulfur Inorganic materials 0.000 description 7
- 239000011593 sulfur Substances 0.000 description 7
- 238000006124 Pilkington process Methods 0.000 description 6
- 229910006404 SnO 2 Inorganic materials 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000007791 liquid phase Substances 0.000 description 6
- 150000002823 nitrates Chemical class 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- -1 tin halide Chemical class 0.000 description 6
- 238000013459 approach Methods 0.000 description 5
- 238000003286 fusion draw glass process Methods 0.000 description 5
- 238000010309 melting process Methods 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910000323 aluminium silicate Inorganic materials 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 229910052863 mullite Inorganic materials 0.000 description 4
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 4
- 239000011819 refractory material Substances 0.000 description 4
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 3
- 229910052661 anorthite Inorganic materials 0.000 description 3
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 3
- 239000010433 feldspar Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 description 3
- 239000010970 precious metal Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 description 3
- 231100000331 toxic Toxicity 0.000 description 3
- 230000002588 toxic effect Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 235000019738 Limestone Nutrition 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 229910001597 celsian Inorganic materials 0.000 description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 2
- 239000010459 dolomite Substances 0.000 description 2
- 229910000514 dolomite Inorganic materials 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 230000012010 growth Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000012804 iterative process Methods 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000006028 limestone Substances 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000003303 reheating Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000003283 slot draw process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- NGCDGPPKVSZGRR-UHFFFAOYSA-J 1,4,6,9-tetraoxa-5-stannaspiro[4.4]nonane-2,3,7,8-tetrone Chemical compound [Sn+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O NGCDGPPKVSZGRR-UHFFFAOYSA-J 0.000 description 1
- 238000007088 Archimedes method Methods 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229910004774 CaSnO3 Inorganic materials 0.000 description 1
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229910020203 CeO Inorganic materials 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910018143 SeO3 Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 229910003069 TeO2 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 230000003698 anagen phase Effects 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000004630 atomic force microscopy Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000005619 boric acid group Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 235000012215 calcium aluminium silicate Nutrition 0.000 description 1
- 235000012241 calcium silicate Nutrition 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 235000013766 direct food additive Nutrition 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 description 1
- QZQVBEXLDFYHSR-UHFFFAOYSA-N gallium(III) oxide Inorganic materials O=[Ga]O[Ga]=O QZQVBEXLDFYHSR-UHFFFAOYSA-N 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 230000009021 linear effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- VASIZKWUTCETSD-UHFFFAOYSA-N manganese(II) oxide Inorganic materials [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 231100001049 no known adverse-effect Toxicity 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000007652 sheet-forming process Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical group [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000004781 supercooling Methods 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 1
- 229910001407 tin (II) carbonate Inorganic materials 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/10—Melting processes
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- Liquid Crystal (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Description
SiO2 65~72
Al2O3 10~14
B2O3 3~8
MgO 2~6
CaO 3~9
SrO 0~6
BaO 0~<1
を含む。
SiO2 67~70
Al2O3 11~13
B2O3 4~6
MgO 3~5.5
CaO 5.5~7
SrO 3~5
BaO 0~<1
を含む。
最小T35kP-Tliq=0.25T35k-225 (1)
ここで全ての温度は℃で表される。従って、例示的なガラスの1つ以上の実施形態では、T35k-Tliq>30℃、T35k-Tliq>40℃、T35kP-Tliq>50℃、T35kP-Tliq>60℃、T35kP-Tliq>65℃、又はT35kP-Tliq>70℃である。
log(η)=A+B/(T-TO)
を用いた高粘度データへのフィットから決定され、ここでTは温度であり、A、B及びTOはフィッティングパラメータである。液相粘度を決定するために、Tのための値として液相線温度を用いる。GPaで表されるヤング率の値は、ASTM E1875~00e1に記載された一般的なタイプの共鳴超音波分光法を用いて決定した。
SO4 =→SO2+O2+2e-
のように書くことができ、ここでe-は電子を表す。この半反応に関する「平衡定数」は:
Keq=[SO2][O2][e-]2/[SO4 =]
であり、ここで角括弧は化学活性を表す。理想的には、SO2、O2及び2e-から硫酸を生成するために上記反応を推し進めることが望ましい。硝酸塩、過酸化物又は他の酸素に富む原材料の添加は有益であり得るが、これはまた、溶融の早期における硫酸塩の還元に対抗して作用する場合があり、これはそもそも、これらを添加することによる主たる利益に対して反作用し得る。SO2はほとんどのガラスにおいて可溶性が極めて低く、従ってガラス溶融プロセスへの添加は非実際的である。電子は、還元された多価分子によって「添加」できる。例えば第1鉄(Fe2+)に関する電子供与半反応は:
2Fe2+→2Fe3++2e-のように表される。
酸化物ベースのモルパーセントで:
SiO2 65~72、
Al2O3 10~14、
B2O3 3~8、
MgO 2~6、
CaO 3~9、
SrO 0~6、及び
BaO 0~<1
を含む、ガラスであって、
上記ガラスは、>650℃の歪み点、約730℃以上のアニール点、>78GPaのヤング率、>30℃のT35kP-Tliq、<約2.55g/cm3の密度、及び約39×10-7/℃未満のCTEを示す、ガラス。
上記ガラスのアニール点は、約735℃、740℃又は750℃超である、実施形態1に記載のガラス。
上記ガラスの歪み点は、約680℃、690℃又は700℃以上である、実施形態1又は2に記載のガラス。
上記ガラスの軟化点は、約950℃、970℃、980℃又は990℃以上である、実施形態1~3のいずれか1つに記載のガラス。
上記ガラスのT200Pは、約1650℃、1625℃又は1610℃未満である、実施形態1~4のいずれか1つに記載のガラス。
上記ガラスのT35kPは、約1300℃、1260℃又は1250℃未満である、実施形態1~5のいずれか1つに記載のガラス。
上記ガラスのT35kP-Tliqは、>40℃、>50℃、>60℃、>65℃又は>70℃である、実施形態1~6のいずれか1つに記載のガラス。
上記ガラスの比弾性率は、31、31.5又は32超である、実施形態1~7のいずれか1つに記載のガラス。
上記ガラスのCTEは、約38×10-7/℃未満又は約36×10-7/℃未満である、実施形態1~8のいずれか1つに記載のガラス。
上記ガラスのヤング率は、79GPa、80GPa又は81GPa以上である、実施形態1~9のいずれか1つに記載のガラス。
酸化物ベースのモルパーセントで:
SiO2 67~70、
Al2O3 11~13
B2O3 4~6、
MgO 3~5.5、
CaO 5.5~7、
SrO 3~5、及び
BaO 0~<1
を含む、ガラスであって、
上記ガラスは、>700℃の歪み点、約750℃以上のアニール点、>79GPaのヤング率、>65℃のT35kP-Tliq、<約2.55g/cm3の密度、及び約36×10-7/℃未満のCTEを示す、ガラス。
上記ガラスの軟化点は、約950℃、970℃、980℃又は990℃以上である、実施形態11に記載のガラス。
上記ガラスのT200Pは、約1650℃、1625℃又は1610℃未満である、実施形態11又は12に記載のガラス。
上記ガラスのT35kPは、約1300℃、1260℃又は1250℃未満である、実施形態11~13のいずれか1つに記載のガラス。
上記ガラスのT35kP-Tliqは、>70℃である、実施形態11~14のいずれか1つに記載のガラス。
上記ガラスの比弾性率は、31、31.5又は32超である、実施形態11~15のいずれか1つに記載のガラス。
上記ガラスのヤング率は、80GPa又は81GPa以上である、実施形態11~16のいずれか1つに記載のガラス。
酸化物ベースのモルパーセントで:
SiO2>60、
Al2O3>10、
B2O3>0.1、及び
(MgO+CaO+SrO+BaO)/Al2O3>1.0
を含む、ガラスであって、
上記ガラスは、約730℃以上のアニール点、約650℃以上の歪み点、約950℃以上の軟化点、約1650℃未満のT200P、約1300℃未満のT35kP、>30℃のT35kP-Tliq、31超の比弾性率、及び78GPa以上のヤング率を示す、ガラス。
(MgO+CaO+SrO+BaO)/Al2O3≧1.05、≧1.08又は≧1.10である、実施形態18に記載のガラス。
上記ガラスは、約735℃、740℃又は750℃以上のアニール点を示す、実施形態18又は19に記載のガラス。
上記ガラスは、約680℃、690℃又は700℃以上の歪み点を示す、実施形態18~20のいずれか1つに記載のガラス。
上記ガラスは、約970℃、980℃又は990℃以上の軟化点を示す、実施形態18~21のいずれか1つに記載のガラス。
上記ガラスは、約1625℃又は1610℃未満のT200Pを示す、実施形態18~22のいずれか1つに記載のガラス。
上記ガラスは、約1260℃又は1250℃未満のT35kPを示す、実施形態18~23のいずれか1つに記載のガラス。
上記ガラスは、>40℃、>50℃、>60℃、>65℃又は>70℃のT35kP-Tliqを示す、実施形態18~24のいずれか1つに記載のガラス。
上記ガラスは、31.5又は32超の比弾性率を示す、実施形態18~25のいずれか1つに記載のガラス。
上記ガラスは、2.55g/cm3以下の密度を示す、実施形態18~26のいずれか1つに記載のガラス。
上記ガラスは、約39×10-7/℃未満、約38×10-7/℃未満又は約36×10-7/℃未満のCTEを示す、実施形態18~27のいずれか1つに記載のガラス。
上記ガラスは、79GPa、80GPa又は81GPa以上のヤング率を示す、実施形態18~28のいずれか1つに記載のガラス。
実施形態1~29のいずれか1つのガラスを含む、物体であって、
上記物体は、ダウンドロー型シート製作プロセスによって製造される、物体。
実施形態1~29のいずれか1つのガラスを含む、物体であって、
上記物体は、フュージョンプロセスによって製造される、物体。
実施形態1~29のいずれか1つのガラスを含む、液晶ディスプレイ基板。
2 トラフ
3 堰止壁
4 圧縮端部
6 切断線
7 縁部配向器
10 先端部
Claims (18)
- ガラスシートを構成するガラスが、酸化物ベースのモルパーセントで:
SiO2 65~72、
Al2O3 10~14、
B2O3 3~8、
MgO 2~6、
CaO 3~9、
SrO 0~6、及び
BaO >0~<1
を含むようにバッチ材料を選択、溶融、および清澄することを含むダウンドロープロセスによってアルカリ非含有ガラスシートを製造する方法であって、
前記バッチ材料は、複数のガラス組成物について、T 35kP 、T 35kP -T liq 、およびアニール点の値を決定し、前記ガラスが以下の特性を有するように、前記複数のガラス組成物から前記ガラスシートを構成するガラスの組成物を選択することによって、少なくとも一部選択される、アルカリ非含有ガラスシートを製造する方法:
(1)1260℃未満のT35kP
(2)T35kP-Tliq>65℃、および
(3)750℃超のアニール点。 - 前記ガラスシートを構成するガラスが1250℃未満のT35kPを有する請求項1記載の方法。
- 前記ガラスシートを構成するガラスがT35kP-Tliq>70℃を有する請求項1記載の方法。
- 前記ガラスシートを構成するガラスが700℃以上の歪み点を有する請求項1記載の方法。
- 前記ガラスシートを構成するガラスが1650℃未満のT200Pを有する請求項1記載の方法。
- 前記ガラスシートを構成するガラスが>78GPaのヤング率、<2.55g/cm3の密度、及び39×10-7/℃未満のCTEを有する請求項1記載の方法。
- 前記ガラスシートを構成するガラスが31GPa/g/cm3超の比弾性率を有する請求項1記載の方法。
- 前記ガラスシートを構成するガラスが(MgO+CaO+SrO+BaO)/Al2O3≧1.05を満たす請求項1記載の方法。
- 前記ガラスシートを液晶ディスプレイ基板として使用することをさらに含む請求項1記載の方法。
- ガラスシートを構成するガラスが、酸化物ベースのモルパーセントで:
SiO2 67~70、
Al2O3 11~13
B2O3 4~6、
MgO 3~5.5、
CaO 5.5~7、
SrO 3~5、及び
BaO >0~<1
を含むようにバッチ材料を選択、溶融、および清澄することを含むダウンドロープロセスによってアルカリ非含有ガラスシートを製造する方法であって、
前記バッチ材料は、複数のガラス組成物について、T 35kP 、T 35kP -T liq 、およびアニール点の値を決定し、前記ガラスが以下の特性を有するように、前記複数のガラス組成物から前記ガラスシートを構成するガラスの組成物を選択することによって、少なくとも一部選択される、アルカリ非含有ガラスシートを製造する方法:
(1)1260℃未満のT35kP
(2)T35kP-Tliq>65℃、および
(3)750℃超のアニール点。 - 前記ガラスシートを構成するガラスが1250℃未満のT35kPを有する請求項10記載の方法。
- 前記ガラスシートを構成するガラスがT35kP-Tliq>70℃を有する請求項10記載の方法。
- 前記ガラスシートを構成するガラスが700℃以上の歪み点を有する請求項10記載の方法。
- 前記ガラスシートを構成するガラスが1650℃未満のT200Pを有する請求項10記載の方法。
- 前記ガラスシートを構成するガラスが>78GPaのヤング率、<2.55g/cm3の密度、及び39×10-7/℃未満のCTEを有する請求項10記載の方法。
- 前記ガラスシートを構成するガラスが31GPa/g/cm3超の比弾性率を有する請求項10記載の方法。
- 前記ガラスシートを構成するガラスが(MgO+CaO+SrO+BaO)/Al2O3≧1.05を満たす請求項10記載の方法。
- 前記ガラスシートを液晶ディスプレイ基板として使用することをさらに含む請求項10記載の方法。
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WO2020068457A1 (en) | 2018-09-25 | 2020-04-02 | Corning Incorporated | Dimensionally stable glasses |
KR20210091715A (ko) * | 2018-11-13 | 2021-07-22 | 코닝 인코포레이티드 | 유리 조성물 |
JP2022539144A (ja) * | 2019-06-26 | 2022-09-07 | コーニング インコーポレイテッド | 熱履歴の影響を受けにくい無アルカリガラス |
CN110963675B (zh) * | 2019-09-29 | 2022-06-07 | 彩虹显示器件股份有限公司 | 一种溢流砖薄板成型厚度控制方法 |
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JP2009286689A (ja) | 2008-05-30 | 2009-12-10 | Corning Inc | ボロアルミノシリケートガラス |
US20140264356A1 (en) | 2013-03-14 | 2014-09-18 | Corning Incorporated | Dimensionally-stable, damage-resistant, glass sheets |
US20150064472A1 (en) | 2013-08-27 | 2015-03-05 | Corning Incorporated | Damage resistant glass with high coefficient of thermal expansion |
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JP2021120342A (ja) | 2021-08-19 |
TW201733944A (zh) | 2017-10-01 |
EP3419940A1 (en) | 2019-01-02 |
TWI774655B (zh) | 2022-08-21 |
WO2017146926A1 (en) | 2017-08-31 |
TW202304826A (zh) | 2023-02-01 |
KR20240010577A (ko) | 2024-01-23 |
CN108698911A (zh) | 2018-10-23 |
KR20180115749A (ko) | 2018-10-23 |
EP4234504A2 (en) | 2023-08-30 |
US11655180B2 (en) | 2023-05-23 |
KR102623926B1 (ko) | 2024-01-11 |
EP3419940B1 (en) | 2023-10-11 |
EP4234504A3 (en) | 2023-09-13 |
US20200339468A1 (en) | 2020-10-29 |
US20190047898A1 (en) | 2019-02-14 |
JP2019507095A (ja) | 2019-03-14 |
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