JP7219780B2 - 基板コーティング用真空蒸着設備及び方法 - Google Patents
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
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Description
-前記真空チャンバ内で、金属蒸気が、走行する基板の両面に向かって、少なくとも2つの蒸気噴射器を通して噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が各面に形成され、互いに対向する少なくとも2つの蒸気噴射器が基板の両面に配置され、これら蒸気噴射器は、基板平面内にある軸線Aであって、基板の走行方向に直角な軸線Aと蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
ここでα及びα’は絶対値で0°より大きく、
D1及びD2は、軸線(A)に沿った、噴射器と各基板端部との間の小さい方の距離であり、Wsは基板の幅であり、D1及びD2は0mmより大きい工程を備え、
-前記蒸気噴射器は細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定され、前記蒸気噴射器は同じ回転軸を有する。
-基板の両面に配置され、互いに対向する少なくとも2つの蒸気噴射器であって、これら蒸気噴射器は基板平面内にある軸線Aであって、基板の走行方向に直角な軸線Aと蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
α及びα’(αは絶対値)は0°より大きく、
D1及びD2は、軸線(A)に沿った、噴射器と各基板端部との間の小さい方の距離であり、Wsは基板幅であり、D1及びD2は0mmより大きい少なくとも2つの蒸気噴射器を備え、
蒸気噴射器は細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定され、前記蒸気噴射器は、同じ回転軸を有する。
亜鉛蒸気を噴射する2つの蒸気噴射器を含む方法の効率を評価するために、真空蒸着設備でテストを実施した。幅Wsが1300mmの鋼基板の両面に、Le=24mmかつWe=1750mmの2つの蒸気噴射器を備える真空チャンバ内で、亜鉛蒸気を堆積させた。試験では、D1及びD2は同じであり、-10mm~+20mmの間に固定した。ここで、-10mmとは、蒸気の端部が基板端部を10mm超えて延在していることを意味し、α及びα’は、本発明による数式を用いて、各試験について算出した。真空圧は10-1ミリバールであった。亜鉛コーティングの所望の厚さは8μmであり、100%に相当する。金属の厚さは、蛍光X線分光法によって測定した。結果を以下の表1に示す。
Claims (14)
- 真空チャンバ(2)を備える真空蒸着設備(1)内で、走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させる方法であって、方法が、
-前記真空チャンバ内で、金属蒸気が、走行する基板の両面に向かって、少なくとも2つの蒸気噴射器(3、3’)を通して噴射され、噴射された蒸気の凝縮によって、少なくとも1つの金属の層が各面に形成され、互いに対向する少なくとも2つの蒸気噴射器が基板の両面に配置され、これら蒸気噴射器は基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
α及びα’は絶対値で0°より大きく、α’が、絶対値でα-α’<10°であり、
D1及びD2は、軸線(A)に沿った、噴射器と各基板端部との間の小さい方の距離であり、Wsは基板幅であり、D1及びD2は0mmより大きく、すなわち、噴射器端部が基板端部を超えず、前記蒸気噴射器は細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定され、前記蒸気噴射器が同じ回転軸を有する工程を備える方法。 - 噴射器と基板端部との間の距離D1及びD2が1mmより大きい、請求項1に記載の方法。
- 基板幅Wsが最大2200mmである、請求項1又は2に記載の方法。
- Wsが最小200mmである、請求項1~3のいずれか一項に記載の方法。
- αが絶対値で5°~80°である、請求項1~4のいずれか一項に記載の方法。
- αが絶対値で20°~60°である、請求項5に記載の方法。
- αが絶対値で35°~55°である、請求項6に記載の方法。
- 蒸気噴射器のスロットの長さLeが5mm~50mmである、請求項1~7のいずれか一項に記載の方法。
- 噴射器が長方形又は台形である、請求項1~8のいずれか一項に記載の方法。
- D1がD2と同じである、請求項1~9のいずれか一項に記載の方法。
- 真空チャンバが、基板を囲む中央ケーシング(6)をさらに備え、前記中央ケーシングが、中央ケーシングの2つの反対側に配置された基板入口(7)及び基板出口(8)と、少なくとも2つの蒸気噴射器と、を備える、請求項1~10のいずれか一項に記載の方法。
- 中央ケーシング(6)の内壁が、金属又は金属合金の蒸気の凝縮温度よりも高い温度で加熱されるのに適している、請求項11に記載の方法。
- 走行する基板(S)上に、少なくとも1つの金属から形成されたコーティングを連続的に蒸着させるための、請求項1~12のいずれか一項に記載の方法のための真空蒸着設備であって、設備(1)は、基板(3)が所定の経路に沿って走行可能な真空チャンバ(2)を備え、真空チャンバが、
-基板の両面に配置され、互いに対向する少なくとも2つの蒸気噴射器をさらに備え、これら蒸気噴射器は基板平面内にある軸線(A)であって、基板の走行方向に直角な軸線(A)と蒸気噴射器との角度α及びα’でそれぞれが位置決めされ、α及びα’は以下の式、
α及びα’は0°より大きく、α’が、絶対値でα-α’<10°であり、
D1及びD2は、軸線(A)に沿った、噴射器と各基板端部との間の小さい方の距離であり、Wsは基板幅であり、D1及びD2は0mmより大きく、すなわち、噴射器端部が基板端部を超えず、前記蒸気噴射器は、細長形状を有し、スロットを備え、スロットの長さLeとスロットの幅Weとによって画定され、前記蒸気噴射器が、同じ回転軸を有する、真空蒸着設備。 - 少なくとも2つの噴射器が、α及びα’が調整されるように、蒸気源に連結された供給管を中心に回転可能に取り付けられる、請求項13に記載の真空蒸着設備。
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PCT/IB2019/053339 WO2019239228A1 (en) | 2018-06-13 | 2019-04-23 | Vacuum deposition facility and method for coating a substrate |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004311065A (ja) | 2003-04-02 | 2004-11-04 | Sanyo Electric Co Ltd | 有機el表示装置の製造方法 |
WO2010067603A1 (ja) | 2008-12-10 | 2010-06-17 | パナソニック株式会社 | 薄膜の形成方法 |
US20110000431A1 (en) | 2007-10-12 | 2011-01-06 | Arcelormittal France | Industrial vapour generator for the deposition of an alloy coating onto a metal strip |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0723535B2 (ja) * | 1985-06-12 | 1995-03-15 | 三菱重工業株式会社 | 複合膜形成装置 |
JPS6296669A (ja) | 1985-10-23 | 1987-05-06 | Nisshin Steel Co Ltd | 合金化蒸着亜鉛めっき鋼板の製造方法 |
JPS6326351A (ja) | 1986-07-18 | 1988-02-03 | Kawasaki Steel Corp | 真空蒸着用の蒸発源装置 |
DD287615A7 (de) * | 1988-04-27 | 1991-03-07 | ��@ �K@�K@������� k�� | Verfahren zur bandbedampfung mit einem elektronenstrahllinienverdampfer |
JPH024963A (ja) | 1988-06-23 | 1990-01-09 | Kawasaki Steel Corp | イオンプレーティング装置 |
JPH06102828B2 (ja) * | 1990-10-23 | 1994-12-14 | 日本鋼管株式会社 | 帯板の皮膜形成装置 |
JP3463693B2 (ja) * | 1992-10-29 | 2003-11-05 | 石川島播磨重工業株式会社 | 連続帯状物用真空蒸着装置 |
JP3371454B2 (ja) | 1993-01-13 | 2003-01-27 | 石川島播磨重工業株式会社 | 連続真空蒸着装置 |
US5803976A (en) * | 1993-11-09 | 1998-09-08 | Imperial Chemical Industries Plc | Vacuum web coating |
BE1010351A6 (fr) * | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US6202591B1 (en) * | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
WO2003012161A1 (en) * | 2001-08-01 | 2003-02-13 | Danieli Technology, Inc. | Metal vapor coating |
SE527385C2 (sv) * | 2003-11-04 | 2006-02-21 | Sandvik Intellectual Property | Belagd bandprodukt av rostfrit stål för användning i lastbärande applikationer |
NO20040302D0 (no) * | 2004-01-23 | 2004-01-23 | Juell Per A | Kvickskate. Skoyte til bruk pa is og annet underlag, herunder rulleskoyter |
WO2006007706A1 (en) * | 2004-07-16 | 2006-01-26 | Dofasco Inc. | Monitor system for coating apparatus |
JP2007262540A (ja) | 2006-03-29 | 2007-10-11 | Jfe Steel Kk | 化学蒸着処理の原料ガス供給用ノズルと被膜形成方法および方向性電磁鋼板 |
DE102006056984A1 (de) | 2006-11-30 | 2008-06-05 | Leybold Optics Gmbh | Laufende Beschichtung |
US20080245300A1 (en) * | 2006-12-04 | 2008-10-09 | Leybold Optics Gmbh | Apparatus and method for continuously coating strip substrates |
EP1972699A1 (fr) | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
EP2199425A1 (fr) | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
US8557328B2 (en) | 2009-10-02 | 2013-10-15 | Ppg Industries Ohio, Inc. | Non-orthogonal coater geometry for improved coatings on a substrate |
KR20120029895A (ko) | 2010-09-17 | 2012-03-27 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101439694B1 (ko) | 2012-12-26 | 2014-09-12 | 주식회사 포스코 | Zn-Mg 합금도금강판 및 그의 제조방법 |
JP2014132102A (ja) | 2013-01-04 | 2014-07-17 | Panasonic Corp | 蒸着装置 |
DE102013206598B4 (de) * | 2013-04-12 | 2019-06-27 | VON ARDENNE Asset GmbH & Co. KG | Vakuumbeschichtungsanlage |
KR101746956B1 (ko) * | 2015-10-29 | 2017-06-14 | 주식회사 포스코 | 미립자 발생장치 및 이를 포함하는 코팅 시스템 |
CN107723663B (zh) * | 2017-09-26 | 2019-11-12 | 常州大学 | 一种在高强度钢表面连续真空蒸镀金属锑的装置和方法 |
WO2019239186A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
WO2019239184A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
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2018
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004311065A (ja) | 2003-04-02 | 2004-11-04 | Sanyo Electric Co Ltd | 有機el表示装置の製造方法 |
US20110000431A1 (en) | 2007-10-12 | 2011-01-06 | Arcelormittal France | Industrial vapour generator for the deposition of an alloy coating onto a metal strip |
WO2010067603A1 (ja) | 2008-12-10 | 2010-06-17 | パナソニック株式会社 | 薄膜の形成方法 |
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KR102486851B1 (ko) | 2023-01-09 |
BR112020025035A2 (pt) | 2021-03-23 |
CA3103071A1 (en) | 2019-12-19 |
US11492695B2 (en) | 2022-11-08 |
CN112262226B (zh) | 2023-03-21 |
RU2755327C1 (ru) | 2021-09-15 |
KR20210008071A (ko) | 2021-01-20 |
WO2019239185A1 (en) | 2019-12-19 |
CA3103071C (en) | 2022-10-25 |
CN112262226A (zh) | 2021-01-22 |
EP3807438A1 (en) | 2021-04-21 |
US20210230736A1 (en) | 2021-07-29 |
MX2020013546A (es) | 2021-02-26 |
MA52865A (fr) | 2021-04-21 |
ZA202007535B (en) | 2021-10-27 |
JP2021526589A (ja) | 2021-10-07 |
WO2019239228A1 (en) | 2019-12-19 |
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