JP7207833B2 - 装飾部材用フィルムの製造方法 - Google Patents
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- JP7207833B2 JP7207833B2 JP2020570838A JP2020570838A JP7207833B2 JP 7207833 B2 JP7207833 B2 JP 7207833B2 JP 2020570838 A JP2020570838 A JP 2020570838A JP 2020570838 A JP2020570838 A JP 2020570838A JP 7207833 B2 JP7207833 B2 JP 7207833B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/22—Removing surface-material, e.g. by engraving, by etching
- B44C1/227—Removing surface-material, e.g. by engraving, by etching by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/107—Post-treatment of applied coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Description
Claims (12)
- フィルムの一面に2以上の島(island)を蒸着するステップと、
前記島をマスクとしてフィルムをドライエッチング(Dry etching)してパターン部を形成するステップと、
を含み、
前記フィルム上に2以上の島(island)を蒸着するステップは、
10℃~100℃の温度条件で行われ、追加の熱処理工程なしに材料を島形状に蒸着させるステップ、
を含み、
前記島は、インジウム(In)を含むものであり、
前記フィルム上に2以上の島(island)を蒸着するステップは、エバポレーション(Evaporation)方法またはスパッタリング(sputtering)方法によるものである、
装飾部材用フィルムの製造方法。 - 前記島の幅が10nm~1,000nmであり、
島の高さが5nm~1,000nmである、
請求項1に記載の装飾部材用フィルムの製造方法。 - 前記島の水平断面積は800,000nm2以下である、
請求項1または2に記載の装飾部材用フィルムの製造方法。 - 前記島の垂直断面積は800,000nm2以下である、
請求項1から3のいずれか1項に記載の装飾部材用フィルムの製造方法。 - 前記スパッタリング(sputtering)方法は、
前記フィルムとスパッタターゲットとの最短距離(d1)が200mm以下であり、
0.1W/cm2~10W/cm2のターゲットの単位面積あたりに印加される電力条件で10秒~1,000秒間電力を印加するものである、
請求項1から4のいずれか1項に記載の装飾部材用フィルムの製造方法。 - 前記スパッタリング(sputtering)方法は、
前記フィルムとスパッタターゲットとの最短距離(d2)が200mm超過であり、
c1W/cm2~10W/cm2のターゲットの単位面積あたりに印加される電力条件で10秒~1,200秒間電力を印加するものである、
請求項1から4のいずれか1項に記載の装飾部材用フィルムの製造方法。 - 前記スパッタリング(sputtering)方法は、スパッタガスとして、アルゴン(Ar)、ヘリウム(He)、または窒素(N2)を用いるものである、
請求項1から6のいずれか1項に記載の装飾部材用フィルムの製造方法。 - 前記ドライエッチングは、チャンバ内に前記フィルムを投入し、
エッチングガスを5sccm~100sccmの流量で供給し、
0.5mTorr~100mTorr以下の圧力条件下、
50W~1,000Wの電力を印加するものである、
請求項1から7のいずれか1項に記載の装飾部材用フィルムの製造方法。 - 前記ドライエッチングは、容量結合型プラズマ(CCP)エッチング、反応性イオンエッチング(RIE)、誘導結合型プラズマ(ICP)エッチング、電子サイクロトロン共鳴(ECR)プラズマエッチング方法、またはマイクロ波エッチング方法である、
請求項1から8のいずれか1項に記載の装飾部材用フィルムの製造方法。 - 前記フィルムは、金属;有機物;または無機物である、
請求項1から9のいずれか1項に記載の装飾部材用フィルムの製造方法。 - 前記金属は、チタン(Ti)、スズ(Sn)、アルミニウム(Al)、ニッケル(Ni)、バナジウム(V)、タングステン(W)、タンタル(Ta)、モリブデン(Mo)、ネオジム(Nb)、鉄(Fe)、クロム(Cr)、およびコバルト(Co)からなる群より選択された1または2以上である、
請求項10に記載の装飾部材用フィルムの製造方法。 - 前記無機物は、インジウム(In)、チタン(Ti)、スズ(Sn)、シリコン(Si)、ゲルマニウム(Ge)、アルミニウム(Al)、銅(Cu)、ニッケル(Ni)、バナジウム(V)、タングステン(W)、タンタル(Ta)、モリブデン(Mo)、ネオジム(Nb)、鉄(Fe)、クロム(Cr)、コバルト(Co)、および銀(Ag)のいずれか1つの窒化物;その酸化物;その酸窒化物;またはGaAs、AlAs、AlGaAs、GaP、InP、InAs、InGaAs、InSb、CdSe、CdTe、CdS、ZnSe、ZnS、ZnO、GaN、AlGaN、InAlN、HgCdTe、およびgrapheneからなる群より選択された1以上である、
請求項10に記載の装飾部材用フィルムの製造方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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KR10-2018-0103960 | 2018-08-31 | ||
KR1020180103960A KR102507549B1 (ko) | 2018-08-31 | 2018-08-31 | 장식 부재의 제조방법 및 장식 부재 |
KR1020180103951A KR102474038B1 (ko) | 2018-08-31 | 2018-08-31 | 장식 부재용 필름의 제조 방법 |
KR10-2018-0103951 | 2018-08-31 | ||
PCT/KR2019/011259 WO2020046087A1 (ko) | 2018-08-31 | 2019-09-02 | 장식 부재용 필름의 제조 방법 |
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JP2021528565A JP2021528565A (ja) | 2021-10-21 |
JP7207833B2 true JP7207833B2 (ja) | 2023-01-18 |
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US (1) | US11634821B2 (ja) |
EP (1) | EP3845683A4 (ja) |
JP (1) | JP7207833B2 (ja) |
CN (1) | CN112654730A (ja) |
WO (1) | WO2020046087A1 (ja) |
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KR102507549B1 (ko) * | 2018-08-31 | 2023-03-07 | 주식회사 엘지화학 | 장식 부재의 제조방법 및 장식 부재 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006297853A (ja) | 2005-04-25 | 2006-11-02 | Teijin Dupont Films Japan Ltd | 成形用フィルム |
CN105097441A (zh) | 2014-05-23 | 2015-11-25 | 比亚迪股份有限公司 | 半导体层表面粗化方法及具有表面粗化的led结构形成方法 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5635037A (en) | 1993-08-02 | 1997-06-03 | Industrial Technology Research Institute | Method of texture by in-situ masking and etching for thin film magnetic recording medium |
US5753420A (en) * | 1995-09-18 | 1998-05-19 | Texas Instruments Incorporated | Rough dielectric film by etchback of residue |
JP3755809B2 (ja) | 2000-10-27 | 2006-03-15 | 本田技研工業株式会社 | 電波透過性外装部品及びその製造方法 |
KR100521911B1 (ko) | 2001-07-09 | 2005-10-13 | 다이니폰 인사츠 가부시키가이샤 | 전자파 차폐용 부재 및 그 제조방법 |
DE602005019835D1 (de) | 2004-01-15 | 2010-04-22 | Panasonic Corp | Struktur und prozess zu ihrer herstellung |
US20070026205A1 (en) | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
JP4706596B2 (ja) | 2005-10-31 | 2011-06-22 | 豊田合成株式会社 | 樹脂製品及びその製造方法並びに金属皮膜の成膜方法 |
DE102006056578A1 (de) | 2006-11-30 | 2008-06-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Nanostruktur an einer Kunststoffoberfläche |
JP2009078458A (ja) | 2007-09-26 | 2009-04-16 | Toyoda Gosei Co Ltd | 干渉色膜を有する機器用筐体及び機器用装飾体 |
US20090096106A1 (en) | 2007-10-12 | 2009-04-16 | Air Products And Chemicals, Inc. | Antireflective coatings |
JP5079722B2 (ja) | 2008-03-07 | 2012-11-21 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
JP5543692B2 (ja) | 2008-03-21 | 2014-07-09 | 株式会社東芝 | 有機エレクトロルミネッセンス素子を用いた表示装置および照明装置 |
JP4697900B2 (ja) | 2008-09-30 | 2011-06-08 | 日本写真印刷株式会社 | 装飾材の製造方法 |
JP5401132B2 (ja) | 2009-01-20 | 2014-01-29 | 信越ポリマー株式会社 | 電波透過性装飾部材およびその製造方法 |
US8854583B2 (en) * | 2010-04-12 | 2014-10-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and liquid crystal display device |
US8968972B2 (en) | 2010-11-22 | 2015-03-03 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, process for production of photomask, and chromium-containing material film |
KR101377393B1 (ko) * | 2011-01-13 | 2014-03-25 | (주)엘지하우시스 | 금속 광택의 비전도성 전사 필름 |
GB2487917B (en) * | 2011-02-08 | 2015-03-18 | Seren Photonics Ltd | Semiconductor devices and fabrication methods |
JP5140169B2 (ja) | 2011-03-01 | 2013-02-06 | Jx日鉱日石金属株式会社 | インジウムターゲット及びその製造方法 |
JP6219557B2 (ja) | 2012-05-16 | 2017-10-25 | スリーエム イノベイティブ プロパティズ カンパニー | 装飾シート及び構造体 |
JP5795992B2 (ja) * | 2012-05-16 | 2015-10-14 | 信越化学工業株式会社 | フォトマスクブランク及びフォトマスクの製造方法 |
KR101463541B1 (ko) | 2013-06-10 | 2014-11-19 | 주식회사 화진 | 복수 개의 금속층을 구비한 장식 부재 및 장식 부재 제조 방법 |
US10359175B2 (en) | 2014-08-14 | 2019-07-23 | Lg Chem, Ltd. | Light-emitting film |
WO2016085182A1 (en) * | 2014-11-27 | 2016-06-02 | Samsung Electronics Co., Ltd. | Flexible display device |
JP6627781B2 (ja) | 2015-02-03 | 2020-01-08 | ソニー株式会社 | 筐体部品、電子機器、筐体部品の製造方法 |
CN114712642A (zh) | 2016-01-11 | 2022-07-08 | Syqe医药有限公司 | 个人用蒸发装置 |
TWI719122B (zh) | 2016-01-19 | 2021-02-21 | 美商艾克塞利斯科技公司 | 改良式離子源陰極遮罩及包含改良式離子源陰極遮罩之電弧箱與離子源 |
KR101808175B1 (ko) | 2016-04-28 | 2017-12-12 | (주)세경하이테크 | 터치 윈도우용 데코필름의 제조 방법 |
KR102195648B1 (ko) | 2016-08-17 | 2020-12-28 | 주식회사 쎄코 | 패턴 마스크를 이용한 진공증착 코팅방법 |
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2019
- 2019-09-02 WO PCT/KR2019/011259 patent/WO2020046087A1/ko unknown
- 2019-09-02 CN CN201980047499.2A patent/CN112654730A/zh active Pending
- 2019-09-02 EP EP19854551.9A patent/EP3845683A4/en active Pending
- 2019-09-02 JP JP2020570838A patent/JP7207833B2/ja active Active
- 2019-09-02 US US17/261,777 patent/US11634821B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006297853A (ja) | 2005-04-25 | 2006-11-02 | Teijin Dupont Films Japan Ltd | 成形用フィルム |
CN105097441A (zh) | 2014-05-23 | 2015-11-25 | 比亚迪股份有限公司 | 半导体层表面粗化方法及具有表面粗化的led结构形成方法 |
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EP3845683A1 (en) | 2021-07-07 |
US20210292913A1 (en) | 2021-09-23 |
WO2020046087A1 (ko) | 2020-03-05 |
EP3845683A4 (en) | 2021-11-17 |
JP2021528565A (ja) | 2021-10-21 |
US11634821B2 (en) | 2023-04-25 |
CN112654730A (zh) | 2021-04-13 |
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