JP7145765B2 - 光導波路構造 - Google Patents
光導波路構造 Download PDFInfo
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- JP7145765B2 JP7145765B2 JP2018567454A JP2018567454A JP7145765B2 JP 7145765 B2 JP7145765 B2 JP 7145765B2 JP 2018567454 A JP2018567454 A JP 2018567454A JP 2018567454 A JP2018567454 A JP 2018567454A JP 7145765 B2 JP7145765 B2 JP 7145765B2
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- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
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- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
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- H01S5/2206—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on III-V materials
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- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3434—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer comprising at least both As and P as V-compounds
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Description
Wwg≦Wmesa≦3×Wwg
が成り立つことを特徴とする。
図1は、実施形態に係る光導波路構造を含む波長可変レーザ素子の構成を示す模式図である。波長可変レーザ素子100は、共通の基部S上に形成された、第1光導波路部10と第2光導波路部20とを備えている。基部Sはたとえばn型InPからなる。なお、基部Sの裏面にはn側電極30が形成されている。n側電極30は、たとえばAuGeNiを含んで構成され、基部Sとオーミック接触する。
Wwg≦Wmesa≦3×Wwg
が成り立つ。これにより、メサ構造の幅方向において、第2の上部クラッド層12eaを構成する材料(InP)よりも熱伝導率が低い材料(GaInAsP)で構成される光導波層11caが占める割合が大きいので、マイクロヒータ14による回折格子層11cbの加熱効率を高くすることができる。
本発明に係る光導波路構造は、上記実施形態の態様に限られず、様々な態様に変形することができる。図7は、光導波路構造の変形例1を示す図である。実施形態に係る光導波路構造の変形例1である光導波路構造110Cは、第3光導波路構造部10Cの半導体メサ部12における回折格子層11cbの位置と光導波層11caの位置とを入れ換えた構造の半導体メサ部112を有する。すなわち、光導波路構造110Cでは、回折格子層11cbは、光導波層11caに対して下部クラッド層12a側に位置する。光導波路構造110Cにおいても、メサ構造のメサ幅Wmesa、光導波層11caの幅Wwgについて、Wwg≦Wmesa≦3×Wwgが成り立つ。また、Wmesaが4μm以下となっている。これにより、回折格子層11cbが光導波層11caに対してマイクロヒータ14とは反対側に位置する構造であっても、マイクロヒータ14による回折格子層11cbの加熱効率を高くすることができる。
10A 第1光導波路構造部
10B 第2光導波路構造部
10C 第3光導波路構造部
10D サポートメサ部
11 光導波路
11a 活性コア層
11b、11ca 光導波層
11cb 回折格子層
12、212、312、412 半導体メサ部
12a、312a312aa、312ab、412a 下部クラッド層
12b 第1の上部クラッド層
12c p型InP埋め込み層
12cb 回折格子層
12d n型InP電流ブロッキング層
12e p型半導体層
12ea、212ea 第2の上部クラッド層
12eb コンタクト層
12f スペーサ層
13 p側電極
14、25、26 マイクロヒータ
15 電極パッド
16 SiN保護膜
16a 開口部
17 絶縁部材
20 第2光導波路部
21a MMI導波路
22、23 アーム部
24 リング状導波路
27 位相調整部
30 n側電極
100 波長可変レーザ素子
110C、210C、310C、410C 光導波路構造
312g 低熱伝導率層
412aa 支持領域
412h 支持層
412i 空洞領域
C1 光共振器
L1 レーザ光
M1 反射ミラー
RF1 リング共振器フィルタ
S 基部
Claims (9)
- 基板上に直接形成された下部クラッド層と、
前記下部クラッド層上に位置する光導波層と、
前記光導波層上に位置する上部クラッド層と、
前記上部クラッド層上に位置するヒータと、
を備え、前記上部クラッド層と前記下部クラッド層との間に前記光導波層が配置されており、前記下部クラッド層、前記光導波層、および前記上部クラッド層はメサ構造を構成しており、前記光導波層は前記上部クラッド層よりも熱伝導率が低い材料で構成されており、前記光導波層はGaInAsPで構成され、前記下部クラッド層および前記上部クラッド層はInPで構成されており、前記メサ構造のメサ幅をWmesa、前記光導波層の幅をWwgとすると、下記式が成り立ち、前記メサ構造の幅方向において、前記光導波層が占める割合が1/3以上であり、さらに、前記上部クラッド層の上面から熱量を加えた際に、前記上部クラッド層の上面の温度がどの程度上昇するかを示す熱抵抗が、下記式が成り立つ範囲で前記メサ幅が小さくなると上昇し、実効屈折率については、Wmesaが大きくなるとWmesaの値に依らずに略一定であるものがあり、
前記メサ構造を覆うように、前記メサ構造の半導体とは異なる材料からなる保護膜が設けられ、かつ前記保護膜が形成された前記メサ構造の側部は絶縁部材で埋められており、
さらに、前記光導波層は、両脇が電流ブロッキング構造によって埋め込まれることを特徴とする光導波路構造。
W wg <W mesa ≦3×Wwg - Wmesa≦4μm
が成り立つことを特徴とする請求項1に記載の光導波路構造。 - 1μm≦Wwg≦3μm、かつ、2μm≦Wmesa≦4μm
が成り立つことを特徴とする請求項1または2に記載の光導波路構造。 - 前記光導波層に対して前記上部クラッド層側または前記下部クラッド層側に位置する回折格子層をさらに備えることを特徴とする請求項1~3のいずれか一つに記載の光導波路構造。
- 前記光導波層に対して前記基板側に位置する低熱伝導率領域をさらに備えることを特徴とする請求項1~4のいずれか一つに記載の光導波路構造。
- 前記光導波層と接続する活性コア層をさらに備えることを特徴とする請求項1~5のいずれか一つに記載の光導波路構造。
- 前記活性コア層を伝搬する所定の波長の光のモードフィールド径または伝搬定数と、前記光導波層を伝搬する前記所定の波長の光のモードフィールド径または伝搬定数とが、互いに異なることを特徴とする請求項6に記載の光導波路構造。
- 前記活性コア層と前記光導波層とがモードフィールド変換構造を介して接続していることを特徴とする請求項7に記載の光導波路構造。
- 前記上部クラッド層の幅は、前記光導波層および前記両脇の前記電流ブロッキング構造で規定される幅と等しいことを特徴とする請求項1~8のいずれか一つに記載の光導波路構造。
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JP2017020621 | 2017-02-07 | ||
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PCT/JP2018/004124 WO2018147307A1 (ja) | 2017-02-07 | 2018-02-07 | 光導波路構造 |
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