JP7097934B2 - カソードルミネッセンス光学部品の軸合わせのための系および方法 - Google Patents
カソードルミネッセンス光学部品の軸合わせのための系および方法 Download PDFInfo
- Publication number
- JP7097934B2 JP7097934B2 JP2020177035A JP2020177035A JP7097934B2 JP 7097934 B2 JP7097934 B2 JP 7097934B2 JP 2020177035 A JP2020177035 A JP 2020177035A JP 2020177035 A JP2020177035 A JP 2020177035A JP 7097934 B2 JP7097934 B2 JP 7097934B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- mirror
- axis
- focus
- focal point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination and light collection take place in the same area of the discharge
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2254—Measuring cathodoluminescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2204—Specimen supports therefor; Sample conveying means therefore
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/29—Reflection microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/08—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring cathode luminescence (U.V.)
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/102—Different kinds of radiation or particles beta or electrons
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/104—Different kinds of radiation or particles ions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/303—Accessories, mechanical or electrical features calibrating, standardising
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/024—Moving components not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/049—Focusing means
- H01J2237/0492—Lens systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/21—Focus adjustment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2808—Cathodoluminescence
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2826—Calibration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Description
Claims (3)
- 電子顕微鏡系内で生成される電子ビームと一致する垂直軸を有する前記電子顕微鏡(EM)系内のカソードルミネッセンス(CL)ミラーの焦点に対する、第1の試料部分の自動垂直軸合わせのための方法であって、
試料部分に前記EMの焦点を合わせることと、
EM対物レンズ電流および電子加速電圧に基づいて、前記EM対物レンズ組立体内のフィーチャから前記第1の試料部分までの作動距離を計算することと、
試料ステージの垂直位置を記録することと、
前記作動距離、および前記EMの座標系と前記CLミラー焦点との間の事前に判断された関係に基づいて、前記第1の試料部分を前記CLミラーの前記焦点に移動するために、前記試料ステージの前記垂直位置を変更するための距離を計算することと、
前記ステージ系の前記垂直位置を前記計算された距離の一部だけまたはすべて変更することとを含む方法。 - 前記CLミラーの物理的特徴または前記試料の高さに基づいて、前記ステージ系の垂直位置における前記変更を制限することを含む請求項1に記載の方法。
- 前記EMの前記座標系と前記CLミラー焦点との間の前記事前に判断された関係が、
較正試料部分を前記CLミラー焦点に配置してCL焦点を最適化するために、前記試料ステージまたは前記CLミラーを調整することと、
第1の試料ステージ較正垂直位置を記録することと、
前記EMを用いて、前記較正試料部分の焦点を合わせることと、
少なくともEM対物レンズ電流および電子加速電圧のEM条件を用いて、前記EM対物レンズ組立体内のフィーチャから前記較正試料部分までの較正作動距離を、計算することとによって取得される、請求項1に記載の方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022082814A JP7401595B2 (ja) | 2019-10-23 | 2022-05-20 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
JP2023206630A JP2024037815A (ja) | 2019-10-23 | 2023-12-07 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962924891P | 2019-10-23 | 2019-10-23 | |
US62/924,891 | 2019-10-23 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022082814A Division JP7401595B2 (ja) | 2019-10-23 | 2022-05-20 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021068707A JP2021068707A (ja) | 2021-04-30 |
JP7097934B2 true JP7097934B2 (ja) | 2022-07-08 |
Family
ID=73013180
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020177035A Active JP7097934B2 (ja) | 2019-10-23 | 2020-10-22 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
JP2022082814A Active JP7401595B2 (ja) | 2019-10-23 | 2022-05-20 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
JP2023206630A Pending JP2024037815A (ja) | 2019-10-23 | 2023-12-07 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022082814A Active JP7401595B2 (ja) | 2019-10-23 | 2022-05-20 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
JP2023206630A Pending JP2024037815A (ja) | 2019-10-23 | 2023-12-07 | カソードルミネッセンス光学部品の軸合わせのための系および方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US11205559B2 (ja) |
EP (1) | EP3823004A3 (ja) |
JP (3) | JP7097934B2 (ja) |
CN (1) | CN112697831A (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112697831A (zh) * | 2019-10-23 | 2021-04-23 | 加坦公司 | 对准阴极发光光学器件的***和方法 |
US11688581B2 (en) * | 2020-04-07 | 2023-06-27 | Gatan, Inc. | Apparatus for transmission electron microscopy cathodoluminescence |
US20240177962A1 (en) * | 2022-11-30 | 2024-05-30 | Applied Materials Israel Ltd. | Using laser beam for sem base tools, working distance measurement and control working distance sem to target |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007171193A (ja) | 2005-12-21 | 2007-07-05 | Carl Zeiss Nts Gmbh | 距離を測定するための方法および装置 |
JP2008311216A (ja) | 2007-05-15 | 2008-12-25 | Jeol Ltd | 走査型荷電粒子ビーム装置のオートフォーカス方法 |
JP2011069719A (ja) | 2009-09-25 | 2011-04-07 | Horiba Ltd | 光検出装置及び光伝送装置 |
WO2015178774A1 (en) | 2014-05-23 | 2015-11-26 | Delmic B.V. | Method for positioning a focal plane of a light imaging device and apparatus arranged for applying said method |
JP2018195592A (ja) | 2015-12-03 | 2018-12-06 | 松定プレシジョン株式会社 | 荷電粒子線装置及び走査電子顕微鏡 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61284649A (ja) * | 1985-06-11 | 1986-12-15 | Shimadzu Corp | カソ−ドルミネツセンス測定装置 |
JPH0619967B2 (ja) * | 1986-12-01 | 1994-03-16 | 日本電子株式会社 | X線マイクロアナライザ等における試料位置設定方法 |
JP2602523B2 (ja) * | 1988-03-16 | 1997-04-23 | 日本電信電話株式会社 | カソードルミネッセンス測定装置 |
JP2642124B2 (ja) * | 1988-03-16 | 1997-08-20 | 日本電信電話株式会社 | カソードルミネッセンス測定装置 |
JPH05332934A (ja) * | 1992-06-03 | 1993-12-17 | Jasco Corp | 分光装置 |
JP3342580B2 (ja) * | 1994-07-25 | 2002-11-11 | 日本電子株式会社 | 荷電粒子ビーム装置 |
JP3217637B2 (ja) * | 1995-03-31 | 2001-10-09 | 日本電子株式会社 | 自動焦点合わせ機構付き電子プローブマイクロアナライザ |
JPH1010046A (ja) * | 1996-06-25 | 1998-01-16 | Topcon Corp | 試料分析装置 |
JP4696197B2 (ja) * | 2005-09-06 | 2011-06-08 | 独立行政法人産業技術総合研究所 | カソードルミネッセンス検出装置 |
JP4920539B2 (ja) * | 2006-09-26 | 2012-04-18 | 株式会社堀場製作所 | カソードルミネッセンス測定装置及び電子顕微鏡 |
US9679741B2 (en) * | 2010-11-09 | 2017-06-13 | Fei Company | Environmental cell for charged particle beam system |
US20130140459A1 (en) * | 2011-12-01 | 2013-06-06 | Gatan, Inc. | System and method for sample analysis by three dimensional cathodoluminescence |
US20130141803A1 (en) * | 2011-12-01 | 2013-06-06 | Gatan, Inc. | Apparatus for collection of cathodoluminescence signals |
EP2991097B1 (en) * | 2014-08-25 | 2016-11-23 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Method and device for time-resolved pump-probe electron microscopy |
WO2018025849A1 (ja) * | 2016-08-02 | 2018-02-08 | 松定プレシジョン株式会社 | 荷電粒子線装置及び走査電子顕微鏡 |
CN109979793B (zh) * | 2017-12-27 | 2023-11-07 | Fei 公司 | 复合型sem-cl和fib-ioe显微术 |
US10896802B2 (en) * | 2017-12-27 | 2021-01-19 | Fei Company | Combined SEM-CL and FIB-IOE microscopy |
US10692694B2 (en) * | 2017-12-27 | 2020-06-23 | Fei Company | Method and apparatus for enhancing SE detection in mirror-based light imaging charged particle microscopes |
US10707051B2 (en) * | 2018-05-14 | 2020-07-07 | Gatan, Inc. | Cathodoluminescence optical hub |
CN112697831A (zh) * | 2019-10-23 | 2021-04-23 | 加坦公司 | 对准阴极发光光学器件的***和方法 |
-
2020
- 2020-10-22 CN CN202011141351.6A patent/CN112697831A/zh active Pending
- 2020-10-22 EP EP20203237.1A patent/EP3823004A3/en active Pending
- 2020-10-22 US US17/077,217 patent/US11205559B2/en active Active
- 2020-10-22 JP JP2020177035A patent/JP7097934B2/ja active Active
-
2022
- 2022-05-20 JP JP2022082814A patent/JP7401595B2/ja active Active
-
2023
- 2023-12-07 JP JP2023206630A patent/JP2024037815A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007171193A (ja) | 2005-12-21 | 2007-07-05 | Carl Zeiss Nts Gmbh | 距離を測定するための方法および装置 |
JP2008311216A (ja) | 2007-05-15 | 2008-12-25 | Jeol Ltd | 走査型荷電粒子ビーム装置のオートフォーカス方法 |
JP2011069719A (ja) | 2009-09-25 | 2011-04-07 | Horiba Ltd | 光検出装置及び光伝送装置 |
WO2015178774A1 (en) | 2014-05-23 | 2015-11-26 | Delmic B.V. | Method for positioning a focal plane of a light imaging device and apparatus arranged for applying said method |
JP2018195592A (ja) | 2015-12-03 | 2018-12-06 | 松定プレシジョン株式会社 | 荷電粒子線装置及び走査電子顕微鏡 |
Non-Patent Citations (2)
Title |
---|
Gray Nichols,Applications of cathodluminrscence spectroscopy and imaging in the characterisation of phamaceutical materials,EUROPEAN JOURNAL OF PHARMACEUTICAL SCIENCES,NL,ELSEVIER,2011年10月31日,vol.45, No.1,pp. 19-42 |
Y. Cho et al.,Low-energy Cathodoluminescence for (Oxy)Nitride Phosphors,Journal of Visualized Experiments,米国,Journal of Visualized Experiments,2016年11月15日,e54249,pp. 1-11 |
Also Published As
Publication number | Publication date |
---|---|
JP7401595B2 (ja) | 2023-12-19 |
US11205559B2 (en) | 2021-12-21 |
EP3823004A2 (en) | 2021-05-19 |
CN112697831A (zh) | 2021-04-23 |
JP2022119864A (ja) | 2022-08-17 |
JP2024037815A (ja) | 2024-03-19 |
US20210125807A1 (en) | 2021-04-29 |
JP2021068707A (ja) | 2021-04-30 |
EP3823004A3 (en) | 2021-07-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7097934B2 (ja) | カソードルミネッセンス光学部品の軸合わせのための系および方法 | |
JP6951298B2 (ja) | 荷電粒子ビームに光ビームをアライメントするための方法 | |
JP6275704B2 (ja) | 顕微鏡検査撮像システムにおいて対物レンズの焦点位置を決定するためのシステム、方法、およびデバイス | |
US20110069382A1 (en) | Optical system that selectively provides either of a collimated light beam or a convergent light beam | |
US7817335B2 (en) | Microscope apparatus | |
JP6848995B2 (ja) | 全反射顕微鏡及び全反射顕微鏡の調整方法 | |
JP4892294B2 (ja) | 微***の深さ測定方法 | |
CN114441531B (zh) | 带图像识别的自动聚焦方法、装置、计算机及存储介质 | |
CN114778514B (zh) | 基于拉曼分析的无损高深宽比结构的测量装置及方法 | |
KR100334636B1 (ko) | 노출된 시료의 표면 상에 부분적인 불균일이 있는 경우에도 고도로 정밀한 노출을 할 수 있는 대전 입자빔 노출 장치 및 노출 방법 | |
JP2008261829A (ja) | 表面測定装置 | |
US9091525B2 (en) | Method for focusing an object plane and optical assembly | |
JP2021189061A (ja) | 顕微鏡システム及びこの顕微鏡システムを用いた試料の観察方法 | |
JP7036396B1 (ja) | オートフォーカス装置 | |
JP2002228609A (ja) | モノクロームx線光電子分光装置 | |
KR101138648B1 (ko) | 고속기판검사장치 및 이를 이용한 고속기판검사방법 | |
JP7382904B2 (ja) | マイクロリソグラフィ用マスクを測定するためのデバイス、および自動合焦方法 | |
US20230126577A1 (en) | Transfer Device and Analysis System | |
US20230071801A1 (en) | Electron beam application apparatus and inspection method | |
JP2004226771A (ja) | 全反射蛍光顕微測定装置 | |
CN114675514A (zh) | 调平调焦装置 | |
CN116819892A (zh) | 一种光学量测装置及方法 | |
CN117705808A (zh) | 一种光学检测装置及其最佳焦面确定方法、介质 | |
JP2010169473A (ja) | レンズの光軸位置検出方法および偏芯測定方法 | |
JP2010169471A (ja) | レンズ収差測定方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20201221 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20211130 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20211221 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20220316 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220520 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220602 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220628 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7097934 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |