JP7038570B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP7038570B2 JP7038570B2 JP2018037573A JP2018037573A JP7038570B2 JP 7038570 B2 JP7038570 B2 JP 7038570B2 JP 2018037573 A JP2018037573 A JP 2018037573A JP 2018037573 A JP2018037573 A JP 2018037573A JP 7038570 B2 JP7038570 B2 JP 7038570B2
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- Prior art keywords
- semiconductor chip
- semiconductor
- inductor element
- main surface
- adhesive layer
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Description
<モーター制御システム>
図1は、本実施の形態におけるモーター制御システムの構成図である。
図3は、本実施の形態における半導体装置SDの上面図である。正確には、図3は、透視上面図であり、封止体BDは、その外形のみを示している。図4は、本実施の形態の半導体装置の半導体チップCHaの平面図であり、図5は、本実施の形態の半導体装置の半導体チップCHbの平面図であり、図6は、本実施の形態の半導体装置の半導体チップCHcの平面図である。図7は、図4のX3-X3´に沿う要部断面図であり、図8は、図3のX1-X1´に沿う要部断面図であり、図9は、図3のX2-X2´に沿う要部断面図であり、図10は、図3のY1-Y1´に沿う要部断面図である。
図11は、本実施の形態の半導体装置の製造工程を示すプロセスフロー図である。図12は、本実施の形態の半導体装置の製造工程中の要部断面図であり、図13は、図12に続く半導体装置の製造工程中の要部断面図であり、図14は、図13に続く半導体装置の製造工程中の要部断面図であり、図15は、図14に続く半導体装置の製造工程中の要部断面図である。図12~15は、図3のX1-X1´に沿う断面に対応している。
図16は、変形例1における半導体装置の平面図であり、図17は、図16のY2-Y2´に沿う要部断面図である。変形例1の半導体装置SD1では、絶縁性接着層DAF1およびDAF2の間において、半導体チップCHaの保護膜13aにスリットSL1が設けられている。上記実施の形態と同様の構成には、同様の符号を付している。
図18は、変形例2における半導体装置の平面図であり、図19は、図18のY3-Y3´に沿う要部断面図である。変形例2の半導体装置SD2では、半導体チップCHbおよびCHcは、1枚の絶縁性接着層DAF3で半導体チップCHaに接着されており、半導体チップCHbおよびCHcの間において、絶縁性接着層DAF3にスリットSL2が設けられている。上記実施の形態と同様の構成には、同様の符号を付している。
図20は、変形例3における半導体装置の平面図であり、図21は、図20のY4-Y4´に沿う要部断面図である。変形例3の半導体装置SD3では、半導体チップCHbおよびCHcの間において、絶縁性接着層DAF5が絶縁性接着層DAF4上に重なっている。上記実施の形態と同様の構成には、同様の符号を付している。
図22は、変形例4における半導体装置の平面図であり、図23は、図22のY5-Y5´に沿う要部断面図である。変形例4の半導体装置SD4では、半導体チップCHbおよびCHcの間において、絶縁性接着層DAF6の表面にスリットSL4が形成されている。
(a)断面視にて、第1半導体基板と第1主面との間に第1インダクタ素子および第2インダクタ素子を有する第1半導体チップと、断面視にて、第2半導体基板と第2主面との間に第3インダクタ素子を有する第2半導体チップと、断面視にて、第3半導体基板と第3主面との間に第4インダクタ素子を有する第3半導体チップと、を準備する工程、
(b)複数の外部端子とダイパッドとを有するリードフレームを準備する工程、
(c)前記ダイパッド上に前記第1半導体チップを搭載する工程、
(d)前記第1半導体チップ上に第1絶縁性接着層を介して前記第2半導体チップを搭載し、前記第1半導体チップ上に第2絶縁性接着層を介して前記第3半導体チップを搭載する工程、
(e)前記第1半導体チップ、前記第2半導体チップ、前記第3半導体チップ、前記第1絶縁性接着層および前記第2絶縁性接着層を封止して封止体を形成する工程、
を有し、
前記第1インダクタ素子と前記第2インダクタ素子とは、前記第1主面の第1方向において互いに離間して配置されており、
前記(d)工程では、前記第1主面と前記第2主面とを対向させ、平面視にて、前記第1インダクタ素子と前記第3インダクタ素子とが互いに重なり、かつ、前記第1主面と前記第3主面とを対向させ、平面視にて、前記第2インダクタ素子と前記第4インダクタ素子とが互いに重なる、半導体装置の製造方法。
付記1に記載の半導体装置の製造方法において、
前記第2半導体チップと前記第3半導体チップとの間の沿面距離は、前記第2半導体チップと前記第3半導体チップとの間の第1離間距離よりも大きい、半導体装置の製造方法。
付記2に記載の半導体装置の製造方法において、
前記第1絶縁性接着層と前記第2絶縁性接着層との第2離間距離は、前記第1離間距離よりも小さい、半導体装置の製造方法。
付記1に記載の半導体装置の製造方法において、
前記工程(a)において、前記第1半導体チップは、前記第1インダクタ素子および前記第2インダクタ素子を覆い、前記第1インダクタ素子と前記第2インダクタ素子との間において、スリットを有する保護膜を有し、
前記工程(e)において、前記封止体は、前記スリット内にも形成される、半導体装置の製造方法。
付記1に記載の半導体装置の製造方法において、
前記工程(d)において、前記第2半導体チップと前記第3半導体チップの間において、前記第1絶縁性接着層と前記第2絶縁性接着層とが重なるように配置する、半導体装置の製造方法。
(a)断面視にて、第1半導体基板と第1主面との間に第1インダクタ素子および第2インダクタ素子を有する第1半導体チップと、断面視にて、第2半導体基板と第2主面との間に第3インダクタ素子を有する第2半導体チップと、断面視にて、第3半導体基板と第3主面との間に第4インダクタ素子を有する第3半導体チップと、を準備する工程、
(b)複数の外部端子とダイパッドとを有するリードフレームを準備する工程、
(c)前記ダイパッド上に前記第1半導体チップを搭載する工程、
(d)前記第1半導体チップ上に絶縁性接着層を介して前記第2半導体チップおよび前記第3半導体チップを搭載する工程、
(e)前記第1半導体チップ、前記第2半導体チップ、前記第3半導体チップ、前記絶縁性接着層を封止して封止体を形成する工程、
を有し、
前記第1インダクタ素子と前記第2インダクタ素子とは、前記第1主面の第1方向において互いに離間して配置されており、
前記(d)工程では、前記第1主面と前記第2主面とを対向させ、平面視にて、前記第1インダクタ素子と前記第3インダクタ素子とが互いに重なり、かつ、前記第1主面と前記第3主面とを対向させ、平面視にて、前記第2インダクタ素子と前記第4インダクタ素子とが互いに重なり、
前記第2半導体チップと前記第3半導体チップの間において、前記絶縁性接着層の表面には、スリットが配置されている、半導体装置の製造方法。
付記6に記載の半導体装置の製造方法において、
前記工程(e)において、前記スリット内を前記封止体で埋め、
前記第2半導体チップと前記第3半導体チップとの間の沿面距離は、前記第2半導体チップと前記第3半導体チップとの間の離間距離よりも大きい、半導体装置の製造方法。
2P p型ウエル
2N n型ウエル
3 素子分離溝
4 素子分離膜
5、6、8、10 絶縁膜
7 第1層Cu配線
9 第2層Cu配線
10a、10b、10c 絶縁膜
11 第3層Al配線
12a、12b、12c 表面保護膜(無機絶縁膜)
13a、13b、13c 保護膜(有機絶縁膜)
100 モーター制御システム
110a、110b アイソレータ
120 MCU
130a、130b ゲートドライバ
140a、140b IGBT
150 モーター
210 第1送信回路
212 第1変調処理部
214 第1ドライバ回路
216 第1受信回路
218 第3ドライバ回路
220 第2送信回路
222 第2変調処理部
224 第2ドライバ回路
226 第2受信回路
228 第4ドライバ回路
AD 接着層
BD 封止体
BDa 上面
BDb 下面
BDs1、BDs2、BDs3、BDs4 側面
CD1、CD2、CD3、CD4、CD5 沿面距離
CHa、CHb、CHc 半導体チップ
DAF1、DAF2 絶縁性接着層(絶縁性接着シート)
DP ダイパッド
Dbc 離間距離
L1、L2、L3、L4 インダクタ(インダクタ素子)
LR1、LR2、LR3、LR4 インダクタ領域
nd ドレイン領域
ni ゲート絶縁膜
ng ゲート電極
ns ソース領域
PAa、PAb、PAc パッド電極(パッド、電極パッド)
pd ドレイン領域
pi ゲート絶縁膜
pg ゲート電極
ps ソース領域
PSa、PSb、PSc 主面
p1、p2、p3 プラグ
Qn nチャネル型MISトランジスタ
Qp pチャネル型MISトランジスタ
RSa、RSb、RSc 裏面
Sa1、Sa2、Sa3、Sa4 辺
Sb1、Sb2、Sb3、Sb4 辺
Sc1、Sc2、Sc3、Sc4 辺
SD 半導体装置
SL1、SL2、SL3、SL4 スリット
Ta、Ta(H)、Ta(L)、Tb、Tc、TNC 外部端子
TL1a、TL2a、TL3a、TL4a 端子
TL1b、TL2b、TL3b、TL4b 端子
W ワイヤ
Claims (13)
- 断面視にて、第1半導体基板と第1主面との間に第1インダクタ素子および第2インダクタ素子を有する第1半導体チップと、
断面視にて、第2半導体基板と第2主面との間に第3インダクタ素子を有する第2半導体チップと、
断面視にて、第3半導体基板と第3主面との間に第4インダクタ素子を有する第3半導体チップと、
を有し、
前記第1インダクタ素子と前記第2インダクタ素子とは、前記第1主面の第1方向において互いに離間して配置されており、
前記第1主面と前記第2主面とは対向し、平面視にて、前記第1インダクタ素子と前記第3インダクタ素子とは互いに重なっており、
前記第1主面と前記第3主面とは対向し、平面視にて、前記第2インダクタ素子と前記第4インダクタ素子とは互いに重なっており、
前記第2半導体チップと前記第3半導体チップとの間の沿面距離は、前記第2半導体チップと前記第3半導体チップとの間の離間距離よりも大きい、半導体装置。 - 断面視にて、第1半導体基板と第1主面との間に第1インダクタ素子および第2インダクタ素子を有する第1半導体チップと、
断面視にて、第2半導体基板と第2主面との間に第3インダクタ素子を有する第2半導体チップと、
断面視にて、第3半導体基板と第3主面との間に第4インダクタ素子を有する第3半導体チップと、
前記第1半導体チップと前記第2半導体チップとの間に介在する第1絶縁性接着層と、
前記第1半導体チップと前記第3半導体チップとの間に介在する第2絶縁性接着層と、
前記第1半導体チップ、前記第2半導体チップ、前記第3半導体チップ、前記第1絶縁性接着層および前記第2絶縁性接着層を封止する封止体と、
を有し、
前記第1インダクタ素子と前記第2インダクタ素子とは、前記第1主面の第1方向において互いに離間して配置されており、
前記第1主面と前記第2主面とは対向し、平面視にて、前記第1インダクタ素子と前記第3インダクタ素子とは、前記第1絶縁性接着層を介して互いに重なっており、
前記第1主面と前記第3主面とは対向し、平面視にて、前記第2インダクタ素子と前記第4インダクタ素子とは、前記第2絶縁性接着層を介して互いに重なっており、
前記第2半導体チップと前記第3半導体チップとの間の沿面距離は、前記第2半導体チップと前記第3半導体チップとの間の第1離間距離よりも大きい、半導体装置。 - 請求項2に記載の半導体装置において、
前記第1方向において、前記第1絶縁性接着層と前記第2絶縁性接着層とは、互いに離間して配置されており、
前記第1絶縁性接着層と前記第2絶縁性接着層との第2離間距離は、前記第1離間距離よりも小さい、半導体装置。 - 請求項2に記載の半導体装置において、
前記第1絶縁性接着層と前記第2絶縁性接着層との間で、前記封止体は、前記第1主面と接触している、半導体装置。 - 請求項2に記載の半導体装置において、
前記第1半導体チップは、前記第1インダクタ素子および前記第2インダクタ素子を覆
う保護膜を有し、
前記第2半導体チップと前記第3半導体チップとの間において、前記保護膜には、スリットが形成されている、半導体装置。 - 請求項5に記載の半導体装置において、
前記スリット内は、前記封止体で埋まっている、半導体装置。 - 請求項6に記載の半導体装置において、
前記スリットの深さは、前記保護膜の膜厚よりも小さい、半導体装置。 - 請求項5に記載の半導体装置において、
前記第2半導体チップは、前記第1半導体チップと重なっており、
前記スリットは、前記第1方向と直交する第2方向に延在し、
前記第2方向において、前記スリットの長さは、前記第1半導体チップと前記第2半導体チップとが重なった距離よりも長い、半導体装置。 - 請求項2に記載の半導体装置において、
前記第2半導体チップと前記第3半導体チップとの間において、前記第1絶縁性接着層と前記第2絶縁性接着層とは、それぞれの一部分が互いに重なっている、半導体装置。 - 断面視にて、第1半導体基板と第1主面との間に第1インダクタ素子および第2インダクタ素子を有する第1半導体チップと、
断面視にて、第2半導体基板と第2主面との間に第3インダクタ素子を有する第2半導体チップと、
断面視にて、第3半導体基板と第3主面との間に第4インダクタ素子を有する第3半導体チップと、
前記第1半導体チップと前記第2半導体チップとの間、および、前記第1半導体チップと前記第3半導体チップとの間に介在する絶縁性接着層と、
前記第1半導体チップ、前記第2半導体チップ、前記第3半導体チップ、前記絶縁性接着層を封止する封止体と、
を有し、
前記第1インダクタ素子と前記第2インダクタ素子とは、前記第1主面の第1方向において互いに離間して配置されており、
前記第1主面と前記第2主面とは対向し、平面視にて、前記第1インダクタ素子と前記第3インダクタ素子とは、前記絶縁性接着層を介して互いに重なっており、
前記第1主面と前記第3主面とは対向し、平面視にて、前記第2インダクタ素子と前記第4インダクタ素子とは、前記絶縁性接着層を介して互いに重なっており、
前記第2半導体チップと前記第3半導体チップとの間において、前記絶縁性接着層は、第1スリットを有し、
前記第2半導体チップと前記第3半導体チップとの間の沿面距離は、前記第2半導体チップと前記第3半導体チップとの間の離間距離よりも大きい、半導体装置。 - 請求項10に記載の半導体装置において、
前記第2半導体チップと前記第3半導体チップとの間において、前記封止体は、前記絶縁性接着層と接触している、半導体装置。 - 請求項10に記載の半導体装置において、
前記第2半導体チップは、前記第1半導体チップと重なっており、
前記第1スリットは、前記第1方向と直交する第2方向に延在し、
前記第2方向において、前記第1スリットの長さは、前記第1半導体チップと前記第2半導体チップとが重なった距離よりも長い、半導体装置。 - 請求項10に記載の半導体装置において、
前記第1半導体チップは、前記第1インダクタ素子および前記第2インダクタ素子を覆う保護膜を有し、
前記保護膜には、第2スリットが形成されており、
前記第1方向において、前記第2スリットの幅は、前記第1スリットの幅よりも大きく、平面視にて、前記第1スリットは、前記第2スリットの内側に位置している、半導体装置。
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