JP7006290B2 - Enamel wire manufacturing method - Google Patents

Enamel wire manufacturing method Download PDF

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JP7006290B2
JP7006290B2 JP2018005404A JP2018005404A JP7006290B2 JP 7006290 B2 JP7006290 B2 JP 7006290B2 JP 2018005404 A JP2018005404 A JP 2018005404A JP 2018005404 A JP2018005404 A JP 2018005404A JP 7006290 B2 JP7006290 B2 JP 7006290B2
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enamel wire
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rolling
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JP2019122988A (en
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巧 佐藤
泰弘 船山
昌平 秦
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Hitachi Metals Ltd
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Description

本発明は、エナメル線の製造方法に関する。 The present invention relates to a method for producing an enamel wire.

横断面が平角状からなる導体上に皮膜を有するエナメル線の製造方法として、例えば、横断面が円形状からなる導体を横断面が平角状に圧延する圧延工程と、平角状に圧延した導体上にエナメル線塗料を塗布焼付する工程とを備えた方法がある(特許文献1参照。)。 As a method for manufacturing an enamel wire having a film on a conductor having a flat cross section, for example, a rolling process in which a conductor having a circular cross section is rolled into a flat cross section and a conductor having a flat cross section are rolled. There is a method including a step of applying and baking an enamel wire coating material (see Patent Document 1).

特開平6-302237号公報Japanese Unexamined Patent Publication No. 6-302237

しかし、従来のエナメル線の製造方法では、導体を円形状から平角状に圧延するときに、平角状からなる導体の表面(特に角部)に割れが発生することがある。この割れにエナメル線塗料が入ると、割れが生じた部分の皮膜で発泡が生じることがある。すなわち、平角状からなる導体の表面に生じた割れの内部に空気や水分が残留し、それらが発泡の原因となってエナメル線塗料を塗布焼付けされた平角線の外観を悪くすることがある。 However, in the conventional method for manufacturing an enamel wire, when the conductor is rolled from a circular shape to a flat shape, cracks may occur on the surface (particularly the corner portion) of the flat conductor. When the enamel wire paint enters the cracks, foaming may occur in the film of the cracked portion. That is, air and moisture may remain inside the cracks generated on the surface of the flat conductor, which may cause foaming and deteriorate the appearance of the flat wire coated with the enamel wire paint.

よって、本発明は、導体を平角状に圧延するときに生じ得る割れによって皮膜に発泡等の外観不良(以下、「クラック」ともいう。)が発生することを抑制することができるエナメル線の製造方法を提供することを目的とする。 Therefore, the present invention is to manufacture an enamel wire capable of suppressing the occurrence of appearance defects (hereinafter, also referred to as "cracks") such as foaming in the film due to cracks that may occur when the conductor is rolled into a flat shape. The purpose is to provide a method.

本発明は、上記目的を達成するために、下記の[1]~[3]のエナメル線の製造方法を提供する。 The present invention provides the following methods for producing an enamel wire [1] to [3] in order to achieve the above object.

[1]所定の断面を有する導体に対して前記導体の加工応力を緩和するための加熱処理を行う加工応力緩和工程と、前記加熱処理を行った前記所定の断面を有する導体を平角状の導体に圧延する圧延工程と、前記平角状の導体に皮膜を形成してエナメル線にする皮膜形成工程と、を含む、エナメル線の製造方法。
[2]前記加工応力緩和工程は、前記所定の断面が円形状である導体を熱処理する工程であり、前記皮膜形成工程は、前記平角状の導体が平角伸線され、洗浄され、加熱により導体表面が清浄化された後に、前記平角状の導体に皮膜を形成して前記エナメル線にする皮膜形成工程である、前記[1]に記載のエナメル線の製造方法。
[3]前記加工応力緩和工程は、前記平角状の導体の角部に加えられる加工応力を低減するように、前記所定の断面が円形状である導体を加熱する加熱装置を備えており、前記加熱装置は、前記皮膜形成工程に入る前の前記平角状の導体をも加熱する、前記[2]に記載のエナメル線の製造方法。
[1] A machining stress relaxation step of heat-treating a conductor having a predetermined cross section to relieve the machining stress of the conductor, and a flat conductor having the heat-treated conductor having the predetermined cross section. A method for producing an enamel wire, which comprises a rolling step of rolling into an enamel wire and a film forming step of forming a film on the flat conductor to form an enamel wire.
[2] The processing stress relaxation step is a step of heat-treating a conductor having a predetermined circular shape in a predetermined cross section, and in the film forming step, the flat-angled conductor is drawn into a flat-angled wire, washed, and heated to be a conductor. The method for producing an enamel wire according to the above [1], which is a film forming step of forming a film on the flat conductor to form the enamel wire after the surface is cleaned.
[3] The machining stress relaxation step includes a heating device for heating a conductor having a predetermined circular cross section so as to reduce the machining stress applied to the corners of the flat conductor. The method for producing an enamel wire according to the above [2], wherein the heating device also heats the flat conductor before entering the film forming step.

本発明のエナメル線の製造方法によれば、導体を平角状に圧延するときに生じ得る割れによって皮膜に発泡等の外観不良が発生することを抑制したエナメル線を提供することができる。 According to the method for producing an enamel wire of the present invention, it is possible to provide an enamel wire in which appearance defects such as foaming are suppressed from occurring in the film due to cracks that may occur when the conductor is rolled into a flat shape.

本発明の実施の形態に係るエナメル線の製造方法の一例を示すフローチャートである。It is a flowchart which shows an example of the manufacturing method of the enamel wire which concerns on embodiment of this invention.

〔エナメル線の製造方法〕
図1は、本発明の実施の形態に係るエナメル線の製造方法の一例を示すフローチャートである。なお、以下では、エナメル線用に供給される心線として、横断面が円形状の導体を用いる場合を例に挙げて説明する。ここで、「横断面」とは、導体の中心線方向(長手方向)と直交する断面をいう。また、本発明の実施の形態において使用される導体の素材には、例えば、銅、銅合金等を使用することができる。
[Manufacturing method of enamel wire]
FIG. 1 is a flowchart showing an example of a method for manufacturing an enamel wire according to an embodiment of the present invention. In the following, a case where a conductor having a circular cross section is used as the core wire supplied for the enamel wire will be described as an example. Here, the "cross section" means a cross section orthogonal to the center line direction (longitudinal direction) of the conductor. Further, for example, copper, a copper alloy, or the like can be used as the material of the conductor used in the embodiment of the present invention.

(縮径加工工程)
図1に示されるように、本発明の実施の形態に係るエナメル線の製造方法では、まず、横断面が円形状の導体を、例えば、圧延ロールや伸線ダイスに通し、導体に縮径加工を施す(S1)。縮径加工とは、導体をその中心方向に向かって略均一に導体の横断面の直径が縮小するように加工することをいう。つまり、横断面が円形状の導体を縮径加工すると、横断面が円形状の導体の直径が小さくなる。具体的には、一例として、縮径加工により、導体の直径は、約6.3mmから4.0mm以上5.5mm以下に縮小される。なお、縮径加工工程では、縮径加工が施される横断面が円形状の導体として銅荒引き線が使用される。この銅荒引き線は、その表面に皮剥ぎが施されていてもよい。また、縮径加工は、複数の圧延ロールや伸線ダイスを使用して行われることであってもよい。
(Diameter reduction processing process)
As shown in FIG. 1, in the method for manufacturing an enamel wire according to an embodiment of the present invention, first, a conductor having a circular cross section is passed through, for example, a rolling roll or a wire drawing die to reduce the diameter of the conductor. (S1). The diameter reduction processing means processing the conductor so that the diameter of the cross section of the conductor is reduced substantially uniformly toward the center direction. That is, when the diameter of a conductor having a circular cross section is reduced, the diameter of the conductor having a circular cross section becomes smaller. Specifically, as an example, the diameter of the conductor is reduced from about 6.3 mm to 4.0 mm or more and 5.5 mm or less by the diameter reduction processing. In the diameter reduction processing step, a copper rough drawn wire is used as a conductor having a circular cross section to be subjected to diameter reduction processing. The surface of the copper rough drawn wire may be peeled off. Further, the diameter reduction processing may be performed using a plurality of rolling rolls or wire drawing dies.

(加工応力緩和工程)
縮径加工工程において縮径加工を行った後の導体あるいは銅荒引き線からなる導体を、例えば、加熱炉に供給し、加工応力を緩和するために加熱炉内で縮径加工後の導体に加熱処理を施す(S2)。加熱炉は、加熱装置の一例である。導体の加熱処理は、例えば、500℃以上、より好ましくは550℃以上600℃以下の温度下で行う。このような温度で加熱処理することにより、導体に内在する加工応力が緩和されるため、当該導体は、加熱処理前の状態と比較して柔軟な状態、すなわち、変形し易い状態となる。換言すれば、加熱処理した導体は、加熱処理前の状態と比較して伸び易い状態となる。具体的には、加熱処理により、導体の引張強さ(N/mm)が小さくなるとともに、破断伸び(%)が大きくなる。
(Processing stress relaxation process)
A conductor after diameter reduction processing in the diameter reduction processing process or a conductor made of copper rough drawn wire is supplied to a heating furnace, for example, and used as a conductor after diameter reduction processing in the heating furnace in order to relieve the processing stress. Heat treatment is applied (S2). The heating furnace is an example of a heating device. The heat treatment of the conductor is performed, for example, at a temperature of 500 ° C. or higher, more preferably 550 ° C. or higher and 600 ° C. or lower. By heat-treating at such a temperature, the processing stress inherent in the conductor is relaxed, so that the conductor becomes a flexible state, that is, a state in which it is easily deformed as compared with the state before the heat treatment. In other words, the heat-treated conductor is in a state of being easily stretched as compared with the state before the heat treatment. Specifically, the heat treatment reduces the tensile strength (N / mm 2 ) of the conductor and increases the elongation at break (%).

加工応力緩和工程における加熱処理は、前述の縮径加工により加工硬化した導体あるいは銅荒引き線からなる導体を所望の硬さまで柔らかくする工程である。つまり、加工応力緩和工程における加熱処理により、導体は、所定の柔らかさ(例えば、引張強さが約240N/mm、破断伸びが40%)を有する状態となる。なお、加工応力緩和工程では、後工程の平角圧延工程において平角状の導体の角部にクラックが生じない柔らかさを有する状態にするとの観点から、加熱処理を行うときの導体の速度を20m/min以下とすることが好ましい。 The heat treatment in the work stress relaxation step is a step of softening a conductor made of a work-hardened conductor or a copper rough drawn wire by the above-mentioned diameter reduction work to a desired hardness. That is, the heat treatment in the machining stress relaxation step brings the conductor into a state having a predetermined softness (for example, a tensile strength of about 240 N / mm 2 and a breaking elongation of 40%). In the machining stress relaxation step, the speed of the conductor during heat treatment is 20 m / m / It is preferably min or less.

(平角圧延工程)
次に、加工応力緩和工程における加熱処理後の所定の柔らかさを有する導体に平角圧延を施す(S3)。平角圧延には、例えば、圧延ロールを用いることができる。平角圧延とは、厚さと幅とが所定の寸法になるように横断面が円形状の導体の上下及び左右を圧延し、厚さと幅とが所定の寸法(例えば、厚さが2.5mm、幅が4.0mm)からなる横断面が平角状の導体に加工することをいう。平角圧延は、1回のみでなく、例えば、多段圧延機を用いて複数に亘って段階的に行ってもよい。
(Flat angle rolling process)
Next, flat-angle rolling is performed on a conductor having a predetermined softness after heat treatment in the machining stress relaxation step (S3). For flat angle rolling, for example, a rolling roll can be used. Flat-angle rolling means rolling the top, bottom, left and right of a conductor having a circular cross section so that the thickness and width have predetermined dimensions, and the thickness and width have predetermined dimensions (for example, the thickness is 2.5 mm. It means processing into a conductor having a flat cross section with a width of 4.0 mm). The flat-angle rolling may be performed not only once but also in a plurality of steps using, for example, a multi-stage rolling mill.

加工応力緩和工程(S2)における加熱処理によって柔軟な状態、すなわち変形し易い状態となった導体に対して平角圧延を施すことにより、圧延時に平角状の導体の角部等に局部的に急激に圧力がかかったとしても、硬い状態の導体(すなわち、加工応力緩和工程(S2)における加熱処理を行っていない導体)に平角圧延を施す場合と比較して導体にかかる加工応力が低減するため、導体にクラックが生ずることを抑制することができる。前述した加工応力緩和工程(S2)における加熱処理の後に平角圧延工程(S3)を連続的に行うことが、平角状の導体の角部に生じ得るクラックの抑制にとって有効である。 By performing flat-angle rolling on a conductor that has become flexible, that is, easily deformed by the heat treatment in the machining stress relaxation step (S2), the corners of the flat-angled conductor are locally and rapidly rolled during rolling. Even if pressure is applied, the machining stress applied to the conductor is reduced as compared with the case where the conductor in a hard state (that is, the conductor not subjected to the heat treatment in the machining stress relaxation step (S2)) is subjected to flat rolling. It is possible to suppress the occurrence of cracks in the conductor. It is effective to continuously perform the flat-angle rolling step (S3) after the heat treatment in the above-mentioned machining stress relaxation step (S2) for suppressing cracks that may occur in the corners of the flat-square conductor.

(平角伸線工程)
次に、導体を、例えば、平角伸線機(例えば、伸線ダイス)に通し、導体に平角伸線を施す(S4)。平角伸線工程(S4)では、平角圧延工程(S3)において平角圧延して横断面が平角状の導線は、平角状の導体を所望の寸法からなる導体(例えば、厚さが2.0mm、幅が3.4mmの導体)に加工される。この工程では、導体を伸線ダイスに円滑に通すために、例えば、エマルジョン系潤滑油を用いることができる。なお、平角伸線における減面率は、一例として、約20%~25%とすることができる。
(Flat angle wire drawing process)
Next, the conductor is passed through, for example, a flat wire drawing machine (for example, a wire drawing die), and the conductor is subjected to flat wire drawing (S4). In the flat wire drawing step (S4), in the flat angle rolling step (S3), the conductor having a flat cross section is a conductor having a desired dimension (for example, a thickness of 2.0 mm). It is processed into a conductor with a width of 3.4 mm). In this step, for example, an emulsion-based lubricating oil can be used in order to smoothly pass the conductor through the wire drawing die. The reduction rate of the flat wire drawing can be, for example, about 20% to 25%.

(洗浄工程)
次に、導体を洗浄する(S5)。洗浄に用いる洗浄液には、例えば、水を用いることができる。洗浄工程では、導体を洗浄することにより、前述の平角伸線工程で潤滑油を用いた場合に導体の表面に付着する潤滑油を概ね除去することができる。
(Washing process)
Next, the conductor is washed (S5). For example, water can be used as the cleaning liquid used for cleaning. In the cleaning step, by cleaning the conductor, it is possible to generally remove the lubricating oil adhering to the surface of the conductor when the lubricating oil is used in the above-mentioned flat angle wire drawing step.

(導体表面清浄化工程)
次に、導体の表面を清浄化する(以下、「導体表面清浄化」ともいう。)ために洗浄工程において洗浄が行われた導体を加熱処理する(S6)。導体表面清浄化では、前述の洗浄工程で除去しきれなかった潤滑油が、加熱されて分解されることにより除去される。この導体表面清浄化は、加工応力緩和と同様に、例えば、500℃以上の温度で行うことができる。好ましくは、導体表面清浄化は、加工応力緩和を行った加熱炉内で行う。このようにすることにより、2つの加熱炉を設ける必要がなくなるため、設備コストを節約することができる。
(Conductor surface cleaning process)
Next, in order to clean the surface of the conductor (hereinafter, also referred to as “conductor surface cleaning”), the conductor cleaned in the cleaning step is heat-treated (S6). In the conductor surface cleaning, the lubricating oil that could not be completely removed in the above-mentioned cleaning step is removed by being heated and decomposed. This conductor surface cleaning can be performed, for example, at a temperature of 500 ° C. or higher, similar to the machining stress relaxation. Preferably, the conductor surface cleaning is performed in a heating furnace in which machining stress is relaxed. By doing so, it is not necessary to provide two heating furnaces, so that the equipment cost can be saved.

(皮膜形成工程)
次に、導体の表面に皮膜を形成する(S7)。具体的には、平角状の導体の表面にエナメル線塗料を塗布し、塗布したエナメル線塗料を焼付することにより、平角状の導体を皮膜で被覆してエナメル線にする。エナメル線塗料の焼付は、例えば、硬化炉を備える焼付炉を用いて行うことができる。また、焼付炉は、乾燥炉及び硬化炉を備える焼付炉を用いて行うこともできる。なお、乾燥炉及び硬化炉は、一体として設けてもよく、別体として設けてもよい。導体の表面に皮膜を形成する皮膜形成工程は、一例として、塗料塗布機による導体の表面にエナメル線塗料の塗布する塗布工程、乾燥炉によるエナメル線塗料中の溶剤を蒸発させる蒸発工程(すなわちエナメル線塗料を乾燥させる工程)、及び硬化炉によるエナメル線塗料中の樹脂を硬化させる硬化工程(すなわち皮膜を焼付ける工程)を含む。また、これらの工程は、皮膜が所望の厚さとなるまで繰り返し行ってもよい。
(Film formation process)
Next, a film is formed on the surface of the conductor (S7). Specifically, an enamel wire paint is applied to the surface of a flat conductor, and the applied enamel wire paint is baked to coat the flat conductor with a film to form an enamel wire. The baking of the enamel wire paint can be performed, for example, by using a baking furnace equipped with a curing furnace. Further, the baking oven can be carried out by using a baking oven including a drying oven and a curing oven. The drying furnace and the curing furnace may be provided integrally or separately. As an example, the film forming step of forming a film on the surface of a conductor is a coating step of applying an enamel wire paint to the surface of a conductor by a paint coater, and an evaporation step of evaporating a solvent in the enamel wire paint by a drying furnace (that is, enamel). It includes a step of drying the wire coating material) and a curing step of curing the resin in the enamel wire coating material by a curing furnace (that is, a step of baking a film). Further, these steps may be repeated until the film has a desired thickness.

エナメル線塗料には、エナメル線の皮膜に使用可能なものであれば特に限定されることなく用いることができる。エナメル線塗料中の溶剤には、例えば、N-メチル-2-ピロリドン(NMP)、クレゾール、N,N-ジメチルアセトアミド(DMAc)、シクロヘキサノン等を用いることができる。また、エナメル線塗料中の樹脂には、ポリアミドイミド、ポリイミド、ポリエステルイミド等を用いることができる。 The enamel wire coating material can be used without particular limitation as long as it can be used for the enamel wire film. As the solvent in the enamel wire coating material, for example, N-methyl-2-pyrrolidone (NMP), cresol, N, N-dimethylacetamide (DMAc), cyclohexanone and the like can be used. Further, as the resin in the enamel wire coating material, polyamide-imide, polyimide, polyesterimide and the like can be used.

以上をまとめると、本発明の実施の形態に係るエナメル線の製造方法は、一例として、縮径加工工程と、加工応力緩和工程と、平角圧延工程と、平角伸線工程と、洗浄工程と、導体表面清浄化工程と、皮膜形成工程とをこの順に含む。なお、縮径加工工程は、適宜省略してもよい。 Summarizing the above, the enamel wire manufacturing method according to the embodiment of the present invention includes, for example, a diameter reduction machining step, a machining stress relaxation step, a flat angle rolling step, a flat angle wire drawing step, and a cleaning step. The conductor surface cleaning step and the film forming step are included in this order. The diameter reduction processing step may be omitted as appropriate.

前述の各工程は、同一の製造ライン上で実施してもよく、別の製造ライン上で実施してもよい。例えば、平角圧延工程と平角伸線工程との間で製造ラインを切り分け、縮径加工工程、加工応力緩和工程及び平角圧延工程を第1の製造ライン上で実施し、平角伸線工程、洗浄工程、導体表面清浄化工程及び皮膜成形工程を第2の製造ライン上で実施してもよい。 Each of the above-mentioned steps may be carried out on the same production line or may be carried out on another production line. For example, the production line is separated between the flat angle rolling process and the flat angle wire drawing process, and the diameter reduction processing process, the processing stress relaxation process, and the flat angle rolling process are carried out on the first production line, and the flat angle wire drawing process and the cleaning process are performed. , The conductor surface cleaning step and the film forming step may be carried out on the second production line.

(実験結果)
発明者らは、実施例として前述の本発明の実施の形態に係るエナメル線の製造方法で製造したエナメル線と、比較例に係るエナメル線の製造方法で製造したエナメル線とにおいて、発生したクラック数を比較する実験を行った。なお、比較例に係るエナメル線の製造方法として、前述した加工応力緩和工程を有しない工程を採用した。すなわち、実施例に係るエナメル線の製造方法では、横断面が円形状の導体を約6.3mmから約4.5mmに縮径する縮径加工工程と、縮径加工した導体を500℃以上の温度によって加熱処理する加工応力緩和工程と、加工応力緩和工程で加熱処理を行った導体を平角状の横断面に圧延する平角圧延工程と、平角状の導体を伸線ダイスによって伸線する平角伸線工程と、伸線した導体の表面を水によって洗浄する洗浄工程と、洗浄した導体を500℃以上の温度によって表面清浄化する導体表面清浄化工程と、表面清浄化した導体の表面にエナメル線塗料を塗布し焼付することによって皮膜を形成する皮膜形成工程と、をこの順に行い、横断面が平角状の導体上に皮膜を有するエナメル線を製造した。一方、比較例に係るエナメル線の製造方法では、実施例と同様に、縮径加工工程と、平角圧延工程と、平角伸線工程と、洗浄工程と、導体表面清浄化工程と、皮膜形成工程と、をこの順に行い、平角圧延工程の直前に加工応力緩和工程を行わずに、横断面が平角状の導体上に皮膜を有するエナメル線を製造した。
(Experimental result)
As an example, the inventors have generated cracks in the enamel wire produced by the method for producing an enamel wire according to the embodiment of the present invention described above and the enamel wire produced by the method for producing an enamel wire according to a comparative example. An experiment was conducted to compare the numbers. As a method for producing the enamel wire according to the comparative example, a process without the above-mentioned processing stress relaxation process was adopted. That is, in the method for manufacturing an enamel wire according to an embodiment, a diameter reduction processing step of reducing the diameter of a conductor having a circular cross section from about 6.3 mm to about 4.5 mm and a diameter reduction processing of the conductor having a diameter reduction of 500 ° C. or higher are performed. A processing stress relaxation process in which heat treatment is performed by temperature, a flat angle rolling process in which a conductor heat-treated in the processing stress relaxation process is rolled into a flat cross section, and a flat angle drawing process in which a flat conductor is drawn with a wire drawing die. A wire process, a cleaning process for cleaning the surface of the drawn conductor with water, a conductor surface cleaning process for surface cleaning the cleaned conductor at a temperature of 500 ° C or higher, and an enamel wire on the surface of the surface-cleaned conductor. A film forming step of forming a film by applying a paint and baking was performed in this order to produce an enamel wire having a film on a conductor having a flat cross section. On the other hand, in the enamel wire manufacturing method according to the comparative example, the diameter reduction processing step, the flat angle rolling step, the flat angle wire drawing step, the cleaning step, the conductor surface cleaning step, and the film forming step are the same as in the examples. In this order, an enamel wire having a film on a conductor having a flat cross section was manufactured without performing a machining stress relaxation step immediately before the flat rolling step.

両者間において発生したクラックを目視で確認した結果、実施例に係るエナメル線の製造方法で製造したエナメル線で発生したクラック数は、比較例に係るエナメル線の製造方法で製造したエナメル線で発生したクラック数よりも約3割低減したことを確認した。 As a result of visually confirming the cracks generated between the two, the number of cracks generated in the enamel wire manufactured by the enamel wire manufacturing method according to the example is generated in the enamel wire manufactured by the enamel wire manufacturing method according to the comparative example. It was confirmed that the number of cracks was reduced by about 30%.

〔本発明の実施の形態の効果〕
本発明の実施の形態によれば、導体に平角圧延を行う直前に導体の加工応力を緩和することにより、変形し易い状態となった柔軟な導体に平角圧延を行うことができ、これにより、圧延時に導体の表面において角部等に局所的に生じ得るクラックの発生を抑制することができる。この結果、導体の表面にクラックが生じている場合に、皮膜形成工程中にこのクラックに空気や水分が混入し、クラックに残留する空気や水分が上述した乾燥工程や硬化工程時に膨張することによって皮膜に発泡等が引き起こされることを抑制することができる。また、導体の表面に生じたクラックにエナメル線塗料が入って膜厚が局部的に厚くなることも抑制することができる。
[Effects of Embodiments of the present invention]
According to the embodiment of the present invention, by relaxing the processing stress of the conductor immediately before performing the flat-angle rolling on the conductor, it is possible to perform the flat-angle rolling on the flexible conductor which is easily deformed. It is possible to suppress the generation of cracks that may occur locally on the corners and the like on the surface of the conductor during rolling. As a result, when cracks are generated on the surface of the conductor, air and moisture are mixed into the cracks during the film forming step, and the air and moisture remaining in the cracks expand during the above-mentioned drying step and curing step. It is possible to prevent foaming and the like from being caused in the film. In addition, it is possible to prevent the enamel wire paint from entering the cracks generated on the surface of the conductor and locally increasing the film thickness.

なお、本発明は、上記実施の形態に限定されず種々に変形実施が可能である。例えば、本発明の効果を奏する限りにおいて、加工応力緩和工程としては、例えば、導体に所定の量の熱を発生させることによって導体を加熱処理を行う工程であってもよい。 The present invention is not limited to the above embodiment, and various modifications can be made. For example, as long as the effect of the present invention is exhibited, the machining stress relaxation step may be, for example, a step of heat-treating the conductor by generating a predetermined amount of heat in the conductor.

また、上記実施の形態に係るエナメル線の製造方法において、皮膜形成工程で用いる各種機器を構成する製造設備のタイプは、縦型に配置されたものでもよく、横型に配置されたものでもよい。 Further, in the method for manufacturing an enamel wire according to the above embodiment, the type of manufacturing equipment constituting various devices used in the film forming step may be vertically arranged or horizontally arranged.

Claims (3)

所定の断面を有する導体に対して前記導体の加工応力を緩和するための加熱処理を行う加工応力緩和工程と、
前記加熱処理を行った前記所定の断面を有する導体を平角状の導体に圧延する圧延工程と、
前記平角状の導体を平角伸線したときに前記平角状の導体の表面に付着した潤滑油を加熱によって除去する導体表面清浄化工程と、
前記平角状の導体に皮膜を形成してエナメル線にする皮膜形成工程と、
を含む、エナメル線の製造方法。
A machining stress relaxation step in which a heat treatment is performed on a conductor having a predetermined cross section to relax the machining stress of the conductor.
A rolling step of rolling a conductor having the predetermined cross section subjected to the heat treatment into a flat conductor, and a rolling step.
A conductor surface cleaning step of removing the lubricating oil adhering to the surface of the flat conductor by heating when the flat conductor is drawn flat.
A film forming step of forming a film on the flat conductor to form an enamel wire,
A method for manufacturing an enamel wire, including.
前記加工応力緩和工程は、前記所定の断面が円形状である導体を加熱処理する工程であり、
前記皮膜形成工程は、前記平角状の導体が平角伸線され、洗浄され、加熱により導体表面が清浄化された後に、前記平角状の導体に皮膜を形成して前記エナメル線にする皮膜形成工程であり、
前記導体表面清浄化工程は、前記加工応力緩和工程で前記導体の加熱処理を行った加熱装置内で前記潤滑油の加熱を行う、
請求項1に記載のエナメル線の製造方法。
The machining stress relaxation step is a step of heat -treating a conductor having a predetermined circular cross section.
The film forming step is a film forming step of forming a film on the flat conductor to form the enamel wire after the flat conductor is drawn flat, washed, and the surface of the conductor is cleaned by heating. And
In the conductor surface cleaning step, the lubricating oil is heated in a heating device in which the conductor is heat-treated in the processing stress relaxation step.
The method for manufacturing an enamel wire according to claim 1.
前記加工応力緩和工程は、前記平角状の導体の角部に加えられる加工応力を低減するように、前記加熱装置によって前記所定の断面が円形状である導体を500℃以上の温度で加熱し、
前記導体表面清浄化工程は、前記加熱装置によって前記皮膜形成工程に入る前の前記平角状の導体を500℃以上の温度で加熱する、
請求項2に記載のエナメル線の製造方法。
In the machining stress relaxation step, the conductor having a predetermined circular cross section is heated at a temperature of 500 ° C. or higher by the heating device so as to reduce the machining stress applied to the corners of the flat conductor.
In the conductor surface cleaning step, the flat conductor before entering the film forming step is heated by the heating device at a temperature of 500 ° C. or higher .
The method for manufacturing an enamel wire according to claim 2.
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