JP6917706B2 - Measurement method of adsorption pressure distribution - Google Patents

Measurement method of adsorption pressure distribution Download PDF

Info

Publication number
JP6917706B2
JP6917706B2 JP2016252406A JP2016252406A JP6917706B2 JP 6917706 B2 JP6917706 B2 JP 6917706B2 JP 2016252406 A JP2016252406 A JP 2016252406A JP 2016252406 A JP2016252406 A JP 2016252406A JP 6917706 B2 JP6917706 B2 JP 6917706B2
Authority
JP
Japan
Prior art keywords
metal foil
measuring
magnet array
support
distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016252406A
Other languages
Japanese (ja)
Other versions
JP2018105722A (en
Inventor
裕利 中尾
裕利 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2016252406A priority Critical patent/JP6917706B2/en
Publication of JP2018105722A publication Critical patent/JP2018105722A/en
Application granted granted Critical
Publication of JP6917706B2 publication Critical patent/JP6917706B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Measuring Magnetic Variables (AREA)

Description

本発明は、吸着圧力分布の測定方法に関し、より詳しくは、複数個の磁石を列設してなる磁石アレイによって金属箔を吸着したときの吸着圧力の分布を測定するものに関する。 The present invention relates to a method for measuring an adsorption pressure distribution, and more particularly to a method for measuring an attraction pressure distribution when a metal foil is adsorbed by a magnet array in which a plurality of magnets are arranged in a row.

例えば、有機ＥＬデバイスを製造する方法の一つとして真空蒸着法が知られている。この真空蒸着法では、真空雰囲気の形成が可能な真空チャンバ内に、ガラス基板等の基板と蒸着（処理）範囲を規定するマスクプレートとを重ね合わせて配置し、蒸着源より蒸着物質を昇華または気化させ、この昇華または気化した蒸着物質をマスクプレート越しに基板の一方の面（即ち、成膜面）に付着、堆積させることで、各種の薄膜が所定のパターンで成膜される（例えば、特許文献１参照）。この場合、製品歩留まりを考慮して、数十μｍの板厚を持つ金属箔からなるマスクプレートの下方に蒸着源を配置し、所謂デポアップ式で成膜することが通常である。このとき、所謂マスクボケを可及的に抑制しつつ所定のパターンで成膜するには、真空蒸着による成膜時、基板の一方の面にマスクプレートをその全面に亘って密着させていることが好ましい。 For example, a vacuum vapor deposition method is known as one of the methods for manufacturing an organic EL device. In this vacuum vapor deposition method, a substrate such as a glass substrate and a mask plate that defines a vapor deposition (processing) range are superposed and arranged in a vacuum chamber capable of forming a vacuum atmosphere, and the vaporized material is sublimated or sublimated from the vapor deposition source. By vaporizing and adhering and depositing this sublimated or vaporized vaporized material on one surface (that is, the film-forming surface) of the substrate through the mask plate, various thin films are formed in a predetermined pattern (for example,). See Patent Document 1). In this case, in consideration of the product yield, the vapor deposition source is usually arranged below the mask plate made of a metal foil having a plate thickness of several tens of μm, and the film is formed by a so-called depot-up method. At this time, in order to form a film with a predetermined pattern while suppressing so-called mask blur as much as possible, it is necessary that the mask plate is adhered to one surface of the substrate over the entire surface during the film formation by vacuum vapor deposition. preferable.

このことから、マスクプレートから基板に向かう方向を上として、基板とマスクプレートとを上下方向で位置合わせして重ね、基板上にタッチプレートを介して保持手段を配置することで当該基板を挟み込むようにしてタッチプレートにマスクプレートを保持させることが知られており、保持手段として、少なくとも１方向に間隔を存して複数個の棒状の磁石を列設してなる磁石アレイを用いることが知られている。 From this, the substrate and the mask plate are vertically aligned and overlapped with the direction from the mask plate toward the substrate facing up, and the holding means is arranged on the substrate via the touch plate so as to sandwich the substrate. It is known that the mask plate is held by the touch plate, and as the holding means, it is known to use a magnet array in which a plurality of rod-shaped magnets are arranged in a row at intervals in at least one direction. ing.

ここで、上記磁石アレイによって金属箔（マスクプレート）を吸着保持した場合、金属箔内部の磁束密度が略常時飽和しているので、各磁石の磁極付近では吸着圧力が発生するが、隣り合う磁石の間の中央位置では、吸着圧力が殆ど発生していないような吸着圧力の分布となる。また、磁石アレイを構成する各磁石の個体差により吸着圧力に差ができる場合もある。そして、例えば、吸着圧力が殆ど発生していないような箇所では、金属箔と基板との間にギャップが生じる。このため、上記成膜に用いると、マスクプレートと基板との間のギャップによっては、マスクボケが発生して製品歩留まりを低下させてしまう。そこで、例えば、磁石アレイを構成する各磁石の配列を最適化できるように、磁石アレイによって金属箔を吸着したときの吸着圧力の分布を測定する方法の開発が望まれていた。 Here, when the metal foil (mask plate) is attracted and held by the magnet array, the magnetic flux density inside the metal foil is almost always saturated, so that an adsorption pressure is generated near the magnetic poles of each magnet, but adjacent magnets. At the central position between the two, the adsorption pressure is distributed so that almost no adsorption pressure is generated. In addition, the suction pressure may differ due to the individual difference of each magnet constituting the magnet array. Then, for example, in a place where almost no suction pressure is generated, a gap is generated between the metal foil and the substrate. Therefore, when used for the above-mentioned film formation, mask blurring occurs depending on the gap between the mask plate and the substrate, and the product yield is lowered. Therefore, for example, it has been desired to develop a method for measuring the distribution of the suction pressure when the metal foil is sucked by the magnet array so that the arrangement of each magnet constituting the magnet array can be optimized.

特開２０１３−９３２７８号公報Japanese Unexamined Patent Publication No. 2013-93278

本発明は、以上の点に鑑み、複数個の磁石を列設してなる磁石アレイによって金属箔を吸着したときの吸着圧力の分布を測定することができる吸着圧力分布の測定方法を提供することをその課題とする。 In view of the above points, the present invention provides a method for measuring the suction pressure distribution, which can measure the distribution of the suction pressure when the metal foil is sucked by the magnet array in which a plurality of magnets are arranged in a row. Is the subject.

上記課題を解決するために、複数個の磁石を列設してなる磁石アレイによって金属箔を吸着したときの吸着圧力の分布を測定するための本発明の吸着圧力分布の測定方法は、磁石アレイ上に、支持体を介して金属箔を設置することで、各磁石からの磁力で支持体上面に金属箔を吸着保持させる工程と、支持体から金属箔に向けて気体圧力を付与し、金属箔に対しその下面の所定範囲全体に亘って同等の抗力を作用させる工程と、抗力が作用する金属箔の範囲にてこの金属箔の変位量を測定し、この測定した変位量から吸着圧力の分布を得る工程とを含むことを特徴とする。 In order to solve the above problems, the method for measuring the attraction pressure distribution of the present invention for measuring the distribution of the attraction pressure when the metal foil is attracted by the magnet array in which a plurality of magnets are arranged in a row is a magnet array. above, by installing the metal foil through the support, the gas pressure was applied toward adsorbing hold the metal foil to the support upper surface by the magnetic force from the magnet, from the support to the metal foil, metal The displacement amount of the metal foil is measured in the step of applying the same resistance force to the foil over the entire predetermined range of the lower surface thereof and in the range of the metal foil on which the resistance force acts, and the suction pressure is calculated from the measured displacement amount. It is characterized by including a step of obtaining a distribution.

本発明によれば、磁石アレイによって支持体上の金属箔を吸着保持し、金属箔の自重から抗力としての気体圧力を徐々に昇圧していき、この気体圧力と、磁石アレイによる吸着圧力との差が負から正に転じるところで、金属箔に上下方向の変位として現れることを利用し、このときの変位量を金属箔の面内全体に亘って測定すれば、磁石アレイによる吸着圧力の分布を測定することができる。この場合、金属箔の変位量の測定には、光学式や超音波式等の非接触の変位計が利用でき、このような変位計は、金属箔の一方の面内で互いに直交する２方向をＸ軸方向及びＹ軸方向とし、起点位置から変位計を金属箔に対してＸ軸方向及びＹ軸方向の少なくとも一方向に相対的に走査できるものに設置すればよい。 According to the present invention, the metal foil on the support is attracted and held by the magnet array, and the gas pressure as a resistance force is gradually increased from the weight of the metal foil itself, and this gas pressure and the attraction pressure by the magnet array are combined. Utilizing the fact that the difference changes from negative to positive and appears as a vertical displacement on the metal foil, if the amount of displacement at this time is measured over the entire in-plane of the metal foil, the distribution of the attraction pressure by the magnet array can be obtained. Can be measured. In this case, a non-contact displacement meter such as an optical type or an ultrasonic type can be used to measure the displacement amount of the metal foil, and such a displacement meter has two directions orthogonal to each other in one surface of the metal foil. Is set to the X-axis direction and the Y-axis direction, and the displacement meter may be installed so as to be able to scan relative to the metal foil in at least one direction of the X-axis direction and the Y-axis direction from the starting point position.

なお、本発明においては、前記支持体として、上面に窪み部が凹設された基台と、窪み部を覆うように基台の上面に設けられた多孔質板とを備えるものを用い、窪み部に気体を供給することで、金属箔に対し多孔質板の各孔を通して気体圧力を付与するように構成しておけば、金属箔に対しその下面全面に亘って同等の気体圧力を作用させる構成を実現できる。 In the present invention, the support is provided with a base having a recessed portion on the upper surface and a porous plate provided on the upper surface of the base so as to cover the recessed portion. If a gas is supplied to the portion to apply a gas pressure to the metal foil through each hole of the porous plate, the same gas pressure is applied to the entire lower surface of the metal foil. The configuration can be realized.

本発明の実施形態の吸着圧力分布の測定方法を実施できる測定装置の平面図。The plan view of the measuring apparatus which can carry out the measuring method of the suction pressure distribution of embodiment of this invention. 磁石アレイの吸着圧力の分布を測定するときの状態を示す断面図。The cross-sectional view which shows the state at the time of measuring the distribution of the attraction pressure of a magnet array.

以下、図面を参照して、本発明の磁場強度測定方法の実施形態を説明する。以下においては、磁石アレイから金属箔に向かう方向をＺ軸方向の上として、Ｚ軸に直交する金属箔の面内で互いに直交する２方向をＸ軸方向及びＹ軸方向とする。 Hereinafter, embodiments of the magnetic field strength measuring method of the present invention will be described with reference to the drawings. In the following, the direction from the magnet array to the metal foil is above the Z-axis direction, and the two directions orthogonal to each other in the plane of the metal foil orthogonal to the Z-axis are the X-axis direction and the Y-axis direction.

図１を参照して、Ｍｓは、金属箔の面内における変位量を測定し得る測定装置である。測定装置Ｍｓは、測定部１と、後述の測定対象物に対して測定部１をＸ軸方向及びＹ軸方向に相対移動可能な移動部２とで構成されている。移動部２は、水平に設置される支持台２１上にＸ軸方向に沿って敷設された２本のレール２２，２２に摺動自在に係合するスライダ（図示せず）を有する門型のフレーム２３を備え、フレーム２３が図示省略のモータにより所定のピッチでＸ軸方向に進退できるようになっている。また、フレーム２３には、Ｙ軸方向にのびる送りねじ２４が設けられ、送りねじ２４には支持台２５の取付部（図示せず）が螺合し、支持台２５が図示省略のモータにより所定のピッチでＹ軸方向に進退できるようになっている。そして、支持台２５に測定部１が配置されている。測定部１は、投光素子と受光素子とを有する光学式の変位センサで構成されている。なお、このような変位センサ自体は公知のものが利用できるため、その変位量の測定方法を含め、これ以上の詳細な説明は省略する。 With reference to FIG. 1, Ms is a measuring device capable of measuring the amount of displacement of the metal foil in the plane. The measuring device Ms is composed of a measuring unit 1 and a moving unit 2 that can move the measuring unit 1 relative to the measurement object described later in the X-axis direction and the Y-axis direction. The moving portion 2 is a gate type having a slider (not shown) slidably engaged with two rails 22 and 22 laid along the X-axis direction on a support base 21 installed horizontally. A frame 23 is provided, and the frame 23 can move forward and backward in the X-axis direction at a predetermined pitch by a motor (not shown). Further, the frame 23 is provided with a feed screw 24 extending in the Y-axis direction, a mounting portion (not shown) of the support base 25 is screwed into the feed screw 24, and the support base 25 is designated by a motor (not shown). It is possible to move forward and backward in the Y-axis direction at the pitch of. Then, the measuring unit 1 is arranged on the support base 25. The measuring unit 1 is composed of an optical displacement sensor having a light emitting element and a light receiving element. Since a known displacement sensor itself can be used, further detailed description including a method for measuring the displacement amount will be omitted.

両レール２２，２２の間で測定部１の下方に位置させて、かつ、後述の棒状の磁石の各々がＹ軸方向に一致するように位相決めした姿勢で磁石アレイ３を備える測定対象物が設置される。図２に示すように、測定対象物は、磁石アレイ３に加えて支持体４と金属箔５とを含む。磁石アレイ３は、板状のヨーク３１と、ヨーク３１の上面に、同一形状で同種のＹ軸方向に長手の棒状磁石３２をＸ軸方向に等間隔でかつ上側の磁極を交互に変えて列設して構成されている。磁石アレイ３上には支持体４が設置される。支持体４は、透磁率が小さい金属材料から選択され、例えば、オーステナイト系ステンレスが用いられる。支持体４は、上面に窪み部４１ａが凹設された基台４１と、窪み部４１ａを覆うように基台４１の上面に取り付けられ、窪み部４１ａに連通する複数の孔４２ａを有する多孔質板４２とで構成される。また、基台４１の側面には、窪み部４１ａに連通する２個の気体導入口４３が開設され、特に図示して説明しないが、気体導入口４３に接続された供給管を介して窒素や圧縮空気等の気体を窪み部４１ａに供給できるようにしている。この場合、気体導入口４３は、窪み部４１ａに供給される気体が均等に分布するように複数箇所設けるようにしてもよく、また、多孔質板４２の各孔４２ａから同等の気体圧力を金属箔５に作用させるために、窪み部４１ａ内に、気体導入口４３から供給される気体を分散させる分散板（図示せず）を設けてもよい。 A measurement object having a magnet array 3 positioned between the rails 22 and 22 below the measuring unit 1 and in a posture in which the rod-shaped magnets described later are phased so as to coincide with each other in the Y-axis direction. Will be installed. As shown in FIG. 2, the object to be measured includes the support 4 and the metal foil 5 in addition to the magnet array 3. In the magnet array 3, a plate-shaped yoke 31 and a rod-shaped magnet 32 having the same shape and long in the Y-axis direction are arranged on the upper surface of the yoke 31 at equal intervals in the X-axis direction and the upper magnetic poles are alternately changed. It is set up and configured. A support 4 is installed on the magnet array 3. The support 4 is selected from a metal material having a low magnetic permeability, and for example, austenitic stainless steel is used. The support 4 is a porous body having a base 41 having a recessed portion 41a recessed on the upper surface and a plurality of holes 42a attached to the upper surface of the base 41 so as to cover the recessed portion 41a and communicating with the recessed portion 41a. It is composed of a plate 42. Further, on the side surface of the base 41, two gas introduction ports 43 communicating with the recessed portion 41a are opened, and although not particularly illustrated, nitrogen or nitrogen or the like is provided through a supply pipe connected to the gas introduction port 43. A gas such as compressed air can be supplied to the recess 41a. In this case, the gas introduction ports 43 may be provided at a plurality of locations so that the gas supplied to the recessed portion 41a is evenly distributed, and the same gas pressure may be applied from each hole 42a of the porous plate 42 to the metal. In order to act on the foil 5, a dispersion plate (not shown) for dispersing the gas supplied from the gas introduction port 43 may be provided in the recessed portion 41a.

多孔質板４２の各孔４２ａは、金属箔５に対して気体圧力を付与するときに、磁石アレイ３によって吸着保持される金属箔５の範囲全体に亘って同等の気体圧力（抗力）を作用させるように開設されていれば、特に制限はない。更に、多孔質板４２の上面は、金属箔５を吸着保持したときに、金属箔５の平坦度を所定範囲に担保できるように加工されている。金属箔５は、常温付近で熱膨張率が小さい材質で、かつ、例えば数十μｍ〜数百μｍの範囲の板厚を持つものであり、例えば、インバー製のものが用いられる。この場合、金属箔５は、多孔質板４２の輪郭より大きくなるように設定される。以下に、磁石アレイ３の吸着圧力の分布の測定方法を具体的に説明する。 When a gas pressure is applied to the metal foil 5, each hole 42a of the porous plate 42 acts on the same gas pressure (drag) over the entire range of the metal foil 5 attracted and held by the magnet array 3. There are no particular restrictions as long as it is set up so that it can be used. Further, the upper surface of the porous plate 42 is processed so that the flatness of the metal foil 5 can be ensured within a predetermined range when the metal foil 5 is adsorbed and held. The metal foil 5 is made of a material having a small coefficient of thermal expansion near room temperature and has a plate thickness in the range of, for example, several tens of μm to several hundreds of μm. For example, a metal foil made of Invar is used. In this case, the metal foil 5 is set to be larger than the contour of the porous plate 42. Hereinafter, a method for measuring the distribution of the suction pressure of the magnet array 3 will be specifically described.

先ず、測定対象物をセットする。この場合、図外の組付台上に磁石アレイ３をそのヨーク３１側を鉛直方向下側にして設置する。次に、磁石アレイ３上に支持体４を重ね合わせて設置した後、支持体４上に金属箔５を設置する、これにより、磁石アレイ３の磁力によって支持体４の多孔質板４２の上面に金属箔５が吸着保持され、測定対象物が準備される。測定対象物が準備されると、両レール２２，２２の間で測定部１の下方に位置させて、かつ、棒状磁石３２の各々がＹ軸方向に一致するように位相決めした姿勢で測定対象物を設置する。 First, the object to be measured is set. In this case, the magnet array 3 is installed on an assembly table (not shown) with its yoke 31 side downward in the vertical direction. Next, the support 4 is placed on the magnet array 3 in an overlapping manner, and then the metal foil 5 is placed on the support 4. Thus, the magnetic force of the magnet array 3 causes the upper surface of the porous plate 42 of the support 4 to be placed on the upper surface. The metal foil 5 is adsorbed and held on the surface, and the object to be measured is prepared. When the object to be measured is prepared, the object to be measured is positioned between the rails 22 and 22 below the measuring unit 1 and is phased so that each of the rod-shaped magnets 32 coincides with the Y-axis direction. Install things.

測定対象物が設置されると、気体導入口４３から窪み部４１ａ内に気体を供給する。これにより、多孔質板４２の各孔４２ａを通して金属箔５に対し気体圧力が付与され、磁石アレイ３の磁力で吸着される金属箔５の範囲全体に亘って同等の気体圧力が作用する。ここで、当初の気体圧力は、例えば金属箔５の材質（密度）及び厚さから、金属箔５が平坦に保持されるように適宜設定される。この状態で、例えば、金属箔５のいずれかの隅部を起点位置とし、この起点位置から移動部２により測定部１をＸ軸方向及びＹ軸方向に走査し、そのときの金属箔５上面における変位量のデータを取得する。このとき、比較的磁力が局所的に強い箇所が存在すると、この箇所では、金属箔５が多孔質板４２へと強く吸着されて下方に撓むことで変位量が多くなる。 When the object to be measured is installed, gas is supplied from the gas introduction port 43 into the recess 41a. As a result, gas pressure is applied to the metal foil 5 through each hole 42a of the porous plate 42, and the same gas pressure acts over the entire range of the metal leaf 5 attracted by the magnetic force of the magnet array 3. Here, the initial gas pressure is appropriately set so that the metal foil 5 is held flat, for example, from the material (density) and thickness of the metal foil 5. In this state, for example, any corner of the metal leaf 5 is set as the starting position, and the measuring unit 1 is scanned in the X-axis direction and the Y-axis direction by the moving unit 2 from this starting position, and the upper surface of the metal leaf 5 at that time is scanned. Acquire the data of the amount of displacement in. At this time, if there is a portion where the magnetic force is relatively strong locally, the metal foil 5 is strongly attracted to the porous plate 42 and bends downward, so that the displacement amount increases.

次に、気体導入口４３から窪み部４１ａ内に供給される気体圧力を所定値だけ高くし、上記と同様にして、起点位置から移動部２により測定部１をＸ軸方向及びＹ軸方向に走査し、そのときの金属箔５上面における変位量のデータを取得する。このとき、比較的磁力が局所的に弱い箇所があると、この箇所では、磁力より気体圧力の抗力が勝って金属箔５が上方に撓むことで逆方向の変位量が多くなる。そして、気体圧力を更に高くし、金属箔５上面における変位量のデータを取得することを繰り返せば、磁石アレイ３のＸ軸方向及びＹ軸方向の吸着圧力の分布が詳細に測定できる。 Next, the gas pressure supplied from the gas introduction port 43 into the recessed portion 41a is increased by a predetermined value, and in the same manner as described above, the measuring portion 1 is moved in the X-axis direction and the Y-axis direction by the moving portion 2 from the starting point position. Scan and acquire data on the amount of displacement on the upper surface of the metal foil 5 at that time. At this time, if there is a portion where the magnetic force is relatively weak locally, the drag force of the gas pressure prevails over the magnetic force and the metal foil 5 bends upward, so that the amount of displacement in the reverse direction increases. Then, if the gas pressure is further increased and the data of the displacement amount on the upper surface of the metal foil 5 is repeatedly acquired, the distribution of the attraction pressure in the X-axis direction and the Y-axis direction of the magnet array 3 can be measured in detail.

以上説明したように、本実施形態によれば、磁石アレイ３によって支持体４上の金属箔５を吸着保持し、金属箔５の自重から気体圧力を徐々に昇圧していき、この気体圧力と、磁石アレイ３による吸着圧力との差が負から正に転じるところで、金属箔５に上下方向の変位として現れることを利用し、このときの変位量を金属箔５の面内全体に亘って測定することで、磁石アレイ３の磁石列設方向及びこれに直交する方向での磁石アレイ３による吸着圧力の分布を測定することができる。 As described above, according to the present embodiment, the metal foil 5 on the support 4 is attracted and held by the magnet array 3, and the gas pressure is gradually increased from the weight of the metal foil 5 to obtain the gas pressure. , The amount of displacement at this time is measured over the entire in-plane of the metal foil 5 by utilizing the fact that the difference from the attraction pressure due to the magnet array 3 turns from negative to positive and appears as a vertical displacement on the metal foil 5. By doing so, it is possible to measure the distribution of the attraction pressure by the magnet array 3 in the direction in which the magnet array 3 is arranged and in the direction orthogonal to the row direction.

以上、本発明の実施形態について説明したが、本発明は上記のものに限定されるものではなく、本発明の技術思想を逸脱しない範囲であれば、適宜変形が可能である。上記実施形態では、磁場強度の分布が測定される磁石アレイ３として、棒状磁石３２をＸ軸方向に列設したものを例に説明したが、これに限定されるものではなく、磁石片の複数個をランダムに配置、または、Ｘ軸方向及びＹ軸方向に規則正しく列設したものでも、本発明を適用して吸着圧力の分布を測定することができる。 Although the embodiments of the present invention have been described above, the present invention is not limited to the above, and can be appropriately modified as long as it does not deviate from the technical idea of the present invention. In the above embodiment, as the magnet array 3 in which the distribution of the magnetic field strength is measured, a magnet array 3 in which rod-shaped magnets 32 are arranged in a row in the X-axis direction has been described as an example, but the present invention is not limited to this, and a plurality of magnet pieces are used. The distribution of the suction pressure can be measured by applying the present invention even if the magnets are randomly arranged or regularly arranged in the X-axis direction and the Y-axis direction.

また、上記実施形態では、支持体４を基台４１と多孔質板４２とで構成したものを例に説明したが、金属箔５の所定範囲に同等の気体圧力を付与できるものであれば、これに限定されるものではない。更に、上記実施形態では、測定装置Ｍｓは測定部１として、光学式の変位センサを用いるものを例に説明したが、これに限定されるものではなく、超音波式等の非接触の変位計であれば、その形態は問わない。また、測定装置Ｍｓは移動部２として、直交２軸で測定部１を移動できるものを例に説明したが、金属箔５の全面に亘って走査できるものであれば、特に限定されるものではなく、例えば多関節型ロボットを用いることができる。更に、また、上記実施形態では、磁石アレイ３を鉛直方向下側に設置した状態で測定するものを例に説明したが、金属箔５が鉛直方向下側になる状態で測定することもできる。 Further, in the above embodiment, the support 4 composed of the base 41 and the porous plate 42 has been described as an example, but if the metal foil 5 can be applied with the same gas pressure in a predetermined range, it is described. It is not limited to this. Further, in the above embodiment, the measuring device Ms has been described as an example in which an optical displacement sensor is used as the measuring unit 1, but the present invention is not limited to this, and a non-contact displacement meter such as an ultrasonic type is used. If so, the form does not matter. Further, the measuring device Ms has been described as an example of a moving unit 2 capable of moving the measuring unit 1 on two orthogonal axes, but it is not particularly limited as long as it can scan the entire surface of the metal foil 5. Instead, for example, an articulated robot can be used. Further, in the above embodiment, the measurement is performed with the magnet array 3 installed on the lower side in the vertical direction as an example, but the measurement can also be performed with the metal foil 5 on the lower side in the vertical direction.

更に、上記実施形態では、金属箔５を用いるものを例に説明したが、これに限定されるものではなく、例えば、真空蒸着法により基板に成膜するときに使用される箔状のマスクプレートを用い、本発明を適用して吸着圧力の分布を測定することができる。この場合、特に図示して説明しないが、マスクプレートにはその板厚方向に貫通する複数個の透孔が開設されているため、気体圧力が抜けないように、支持体４と金属箔５との間に、例えばポリイミドからなる薄膜状の樹脂を介在させるようにすればよい。 Further, in the above embodiment, the case where the metal foil 5 is used has been described as an example, but the present invention is not limited to this, and for example, a foil-shaped mask plate used when forming a film on a substrate by a vacuum vapor deposition method. The distribution of adsorption pressure can be measured by applying the present invention. In this case, although not particularly illustrated and described, since the mask plate is provided with a plurality of through holes penetrating in the plate thickness direction, the support 4 and the metal foil 5 are provided so that the gas pressure does not escape. A thin-film resin made of, for example, polyimide may be interposed between the two.

３…磁石アレイ、３２…磁石アレイを構成する磁石、４…支持体、４１…基台、４１ａ…窪み部、４２…多孔質板、４２ａ…孔、５…金属箔。
3 ... Magnet array, 32 ... Magnets constituting the magnet array, 4 ... Support, 41 ... Base, 41a ... Recessed portion, 42 ... Porous plate, 42a ... Hole, 5 ... Metal leaf.

Claims (2)

複数個の磁石を列設してなる磁石アレイによって金属箔を吸着したときの吸着圧力の分布を測定するための吸着圧力分布の測定方法であって、
磁石アレイ上に、支持体を介して金属箔を設置することで、各磁石からの磁力で支持体上面に金属箔を吸着保持させる工程と、
支持体から金属箔に向けて気体圧力を付与し、金属箔に対しその下面の所定範囲全体に亘って同等の抗力を作用させる工程と、
抗力が作用する金属箔の範囲にてこの金属箔の変位量を測定し、この測定した変位量から吸着圧力の分布を得る工程とを含むことを特徴とする測定方法。 It is a method of measuring the suction pressure distribution for measuring the distribution of the suction pressure when the metal foil is sucked by the magnet array in which a plurality of magnets are arranged in a row.
On a magnet array, by installing the metal foil via a support, adsorbing hold the metal foil to the support upper surface by the magnetic force from the magnet,
A step of applying a gas pressure from the support toward the metal foil and exerting an equivalent drag force on the metal foil over a predetermined range of the lower surface thereof.
A measuring method comprising a step of measuring the displacement amount of the metal leaf in the range of the metal foil on which the drag force acts, and obtaining the distribution of the suction pressure from the measured displacement amount. 前記支持体として、上面に窪み部が凹設された基台と、窪み部を覆うように基台の上面に設けられた多孔質板とを備えるものを用い、窪み部に気体を供給することで、金属箔に対し多孔質板の各孔を通して気体圧力を付与するようにしたことを特徴とする請求項１記載の吸着圧力分布の測定方法。 As the support, a base having a recessed portion on the upper surface and a porous plate provided on the upper surface of the base so as to cover the recessed portion are used, and gas is supplied to the recessed portion. The method for measuring an adsorption pressure distribution according to claim 1, wherein a gas pressure is applied to the metal foil through each hole of the porous plate.
JP2016252406A 2016-12-27 2016-12-27 Measurement method of adsorption pressure distribution Active JP6917706B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2016252406A JP6917706B2 (en) 2016-12-27 2016-12-27 Measurement method of adsorption pressure distribution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016252406A JP6917706B2 (en) 2016-12-27 2016-12-27 Measurement method of adsorption pressure distribution

Publications (2)

Publication Number Publication Date
JP2018105722A JP2018105722A (en) 2018-07-05
JP6917706B2 true JP6917706B2 (en) 2021-08-11

Family

ID=62784618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016252406A Active JP6917706B2 (en) 2016-12-27 2016-12-27 Measurement method of adsorption pressure distribution

Country Status (1)

Country Link
JP (1) JP6917706B2 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5570537A (en) * 1978-11-22 1980-05-28 Inoue Japax Res Inc Magnet chuck
JPH06201808A (en) * 1992-12-26 1994-07-22 Daido Steel Co Ltd Detecting apparatus for magnetic force of raw material of magnet
JP5448375B2 (en) * 2008-06-18 2014-03-19 株式会社セイホー Magnetic attractive force measuring device and magnetic attractive force measuring method
JP5665336B2 (en) * 2009-04-06 2015-02-04 キヤノン株式会社 Substrate holding device and lithography apparatus using the same

Also Published As

Publication number Publication date
JP2018105722A (en) 2018-07-05

Similar Documents

Publication Publication Date Title
JP4375232B2 (en) Mask deposition method
US20190244842A1 (en) Position And Temperature Monitoring Of ALD Platen Susceptor
KR102091560B1 (en) Substrate holding device, film forming device and substrate holding method
CN107109621A (en) The fixing of supporting substrate carrier and mask carrier is arranged, for the equipment of sedimentary on substrate and for the method for the substrate carrier and mask carrier that are directed at supporting substrate during for layer deposition in the processing chamber
WO2010106958A1 (en) Positioning method and vapor deposition method
KR20160015214A (en) Actively-aligned fine metal mask
JP2014225669A5 (en) Substrate holder, lithographic apparatus, and manufacturing method of substrate holder
CN109154062A (en) It is used for transmission the device and method of carrier or substrate
JP2008147293A (en) Substrate supporting apparatus, substrate supporting method, substrate working apparatus, substrate working method, and manufacturing method of display device component
JP7120545B2 (en) Film forming apparatus, film forming method, and method for manufacturing organic EL display device using the same
US9048460B2 (en) Deposition apparatus and method for manufacturing organic light emitting display apparatus by using the same
JP6917706B2 (en) Measurement method of adsorption pressure distribution
KR101390063B1 (en) Leveling apparatus and atomic force microscope including the same
JP4774025B2 (en) Adsorption device, transfer device
TWI731102B (en) Device for positioning an integrated circuit wafer and equipment for inspecting an integrated circuit wafer comprising such a positioning device
JP6927860B2 (en) Suction force measuring device and suction force measuring method
JP2019113341A (en) Gap measurement method
US20210340663A1 (en) Apparatus for processing a substrate, system for processing a substrate, and methods therefor
JP6342570B1 (en) Gap measurement method
JPH0556013B2 (en)
JP2018162985A (en) Evaluation method and measurement device
KR20190007044A (en) Multiple miniature pick-up elements for component stacking and / or pick-and-place processes
JP2002530866A (en) Substrate transfer and holding device
KR20170003133U (en) Aligner and aligning method using electrostatic chuck
JP2019019369A5 (en)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20191211

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20201007

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20201201

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210105

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20210713

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210720

R150 Certificate of patent or registration of utility model

Ref document number: 6917706

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150